Gas supply pipe for manufacturing semiconductor wafers

- Tokyo Electron Limited
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Description

FIG. 1 is a perspective view of the design for a gas supply pipe for manufacturing semiconductor wafers in accordance with the invention;

FIG. 2 is a front view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a top view thereof;

FIG. 6 is a bottom view thereof;

FIG. 7 is a sectional view through line 77 of FIG. 2;

FIG. 8 is a sectional view through line 88 of FIG. 2; and,

FIG. 9 is a sectional view through line 99 of FIG. 2.

The rear view of the gas supply pipe for manufacturing semiconductor wafers appears the same as its front view shown in FIG. 1. It supplies reactive gas in a process tube for semiconductor manufacture.

Claims

The ornamental design for a gas supply pipe for manufacturing semiconductor wafers, as shown and described.

Referenced Cited
U.S. Patent Documents
D379404 May 20, 1997 Spelts
6139642 October 31, 2000 Shimahara et al.
D434478 November 28, 2000 Sanders
6187102 February 13, 2001 Yamamoto
20090017638 January 15, 2009 Yoshino et al.
20090291566 November 26, 2009 Ueno et al.
Patent History
Patent number: D620085
Type: Grant
Filed: Nov 8, 2007
Date of Patent: Jul 20, 2010
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Mitsuhiro Okada (Yamanashi)
Primary Examiner: T. Chase Nelson
Assistant Examiner: Eric L Goodman
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/290,252
Classifications
Current U.S. Class: Pipe, Tubing Or Hose (D23/266)