Gas supply pipe for manufacturing semiconductor wafers
Latest Tokyo Electron Limited Patents:
- PROCESSING LIQUID SUPPLY SYSTEM, PROCESSING LIQUID SUPPLY METHOD, AND RECORDING MEDIUM
- SUBSTRATE INSPECTION APPARATUS AND SUBSTRATE INSPECTION METHOD
- EXHAUST STRUCTURE AND EXHAUST METHOD FOR FLOW RATE CONTROL DEVICE, AND GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD COMPRISING SAME
- COMMUNICATION SYSTEM, CALCULATION DEVICE, AND COMMUNICATION METHOD
- Substrate processing apparatus and substrate processing method
The rear view of the gas supply pipe for manufacturing semiconductor wafers appears the same as its front view shown in
Claims
The ornamental design for a gas supply pipe for manufacturing semiconductor wafers, as shown and described.
D379404 | May 20, 1997 | Spelts |
6139642 | October 31, 2000 | Shimahara et al. |
D434478 | November 28, 2000 | Sanders |
6187102 | February 13, 2001 | Yamamoto |
20090017638 | January 15, 2009 | Yoshino et al. |
20090291566 | November 26, 2009 | Ueno et al. |
Type: Grant
Filed: Nov 8, 2007
Date of Patent: Jul 20, 2010
Assignee: Tokyo Electron Limited (Tokyo)
Inventor: Mitsuhiro Okada (Yamanashi)
Primary Examiner: T. Chase Nelson
Assistant Examiner: Eric L Goodman
Attorney: Smith, Gambrell & Russell, LLP
Application Number: 29/290,252