Plasma power transfer rod for a semiconductor deposition apparatus

- ASM IP Holding B.V.
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Description

FIG. 1 is a perspective view of a plasma power transfer rod for a semiconductor deposition apparatus showing our new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a perspective view thereof.

Claims

The ornamental design for a plasma power transfer rod for a semiconductor deposition apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D390579 February 10, 1998 Michener
D576647 September 9, 2008 Furutani
8115136 February 14, 2012 Mather et al.
8304684 November 6, 2012 Currier et al.
8362387 January 29, 2013 Wilson
8395070 March 12, 2013 Merrill et al.
D692402 October 29, 2013 Dalton et al.
20070210034 September 13, 2007 Mather et al.
20070210035 September 13, 2007 Twarog et al.
Foreign Patent Documents
D117378 June 2007 TW
Patent History
Patent number: D702654
Type: Grant
Filed: Jun 13, 2012
Date of Patent: Apr 15, 2014
Assignee: ASM IP Holding B.V. (Almere)
Inventors: Jeong Ho Lee (Seoul), Woo Chan Kim (Daejeon), Sang Jin Jeong (Cheonan), Hyun Soo Jang (Daejeon)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/424,575