Ion shield plate for plasma processing device

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a front, top, and right side perspective view of an ion shield plate for plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8.

The broken lines shown in FIGS. 8 and 9 represent the boundary of enlarged view and form no part of the claimed design.

Claims

The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
D240120 June 1976 Pasquarette
D638550 May 24, 2011 Bedingham
D638951 May 31, 2011 Bedingham
D667561 September 18, 2012 Bedingham
D675330 January 29, 2013 Lee
D776295 January 10, 2017 Wainwright
D794753 August 15, 2017 Miller
D868993 December 3, 2019 Isozaki
D877931 March 10, 2020 DaCosta
D891636 July 28, 2020 Isozaki
D900760 November 3, 2020 Kouzuma
D901407 November 10, 2020 Kouzuma
D901714 November 10, 2020 Yamauchi
D907235 January 5, 2021 Liu
D924824 July 13, 2021 Kouzuma
D927015 August 3, 2021 Thomas
20160122995 May 5, 2016 Corder
Other references
  • Clean your SEM/TEM Samples and TEM Specimen Holders: Evactron® Easy Plasma SoftClean (EPSC). Online, published date unknown. Retrieved on Mar. 28, 2022 from URL: https://www.azom.com/equipment-details.aspx?EquipID=7728.
Patent History
Patent number: D958401
Type: Grant
Filed: Nov 25, 2020
Date of Patent: Jul 19, 2022
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventor: Kazuumi Tanaka (Tokyo)
Primary Examiner: Omeed Agilee
Application Number: 29/759,815