Ion shield plate for plasma processing device
Latest Hitachi High-Tech Corporation Patents:
Description
The broken lines shown in
Claims
The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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- Clean your SEM/TEM Samples and TEM Specimen Holders: Evactron® Easy Plasma SoftClean (EPSC). Online, published date unknown. Retrieved on Mar. 28, 2022 from URL: https://www.azom.com/equipment-details.aspx?EquipID=7728.
Patent History
Patent number: D958401
Type: Grant
Filed: Nov 25, 2020
Date of Patent: Jul 19, 2022
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventor: Kazuumi Tanaka (Tokyo)
Primary Examiner: Omeed Agilee
Application Number: 29/759,815
Type: Grant
Filed: Nov 25, 2020
Date of Patent: Jul 19, 2022
Assignee: Hitachi High-Tech Corporation (Tokyo)
Inventor: Kazuumi Tanaka (Tokyo)
Primary Examiner: Omeed Agilee
Application Number: 29/759,815
Classifications
Current U.S. Class:
Vessel, Specimen Holder Or Reagent Material (65) (D24/224)