Method for removing layers of organic material

- IBM

organic materials, such as organic polymer resist layers, are removed from substrates by contacting the materials with a mixture consisting essentially of an alkali metal persulfate and concentrated (96%) sulfuric acid wherein the mixture contains from above about 13 to about 50 grams of alkali metal persulfate per 100 milliliters of sulfuric acid.

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Description
Patent History
Patent number: T973008
Type: Grant
Filed: Dec 9, 1977
Date of Patent: Aug 1, 1978
Assignee: International Business Machines Corporation (Armonk, NY)
Inventors: Leon H. Kaplan (Yorktown Heights, NY), Nungavaram S. Viswanathan (Lancaster, CA), Steven M. Zimmerman (Wappingers Falls, NY)
Application Number: 5/858,985
Classifications
Current U.S. Class: Including Acidic Agent (134/3); Paints, Varnishes, Lacquers, Or Enamels, Removal (134/38)
International Classification: B08B 308;