Patents Issued in July 20, 2004
  • Patent number: 6764765
    Abstract: A fire-retardant adhesive and a fire-retardant adhesive film, which are suitable for producing flat cables using a non-halogen flame-retardant and have fire-retardant properties rivaling those of halogen flame-retardants while maintaining good electrical insulating properties, comprises (A) a polyester resin, (B) a nitrogen-containing organic flame-retardant and (C) a boron compound.
    Type: Grant
    Filed: December 18, 2000
    Date of Patent: July 20, 2004
    Assignee: Sony Chemicals Corporation
    Inventors: Yoshifumi Ueno, Masayuki Kumakura
  • Patent number: 6764766
    Abstract: There is provided an acrylic resin film having good matted appearances and good printing characteristics, e.g., little suffering missing prints when printed. There is provided an acrylic resin film having a differential 60° surface gloss of 5% or more between the front and back sides, and thickness of 300 &mgr;m or less; a method of producing the above-described acrylic resin film, where a molten acrylic resin composition is extruded, and then rolled between a mirror-ground roll and rubber or embossed roll into the film; and a laminate (formed article coated with the acrylic resin film) with a side having a higher 60° surface gloss coming into contact with a base.
    Type: Grant
    Filed: March 14, 2002
    Date of Patent: July 20, 2004
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Yukio Kitaike, Hideyuki Fujii, Kazuhiko Nakagawa
  • Patent number: 6764767
    Abstract: A graphite powder suitable for a negative electrode material of a lithium ion secondary battery which assures a high discharging capacity not lower than 320 mAh/g is to be manufactured at a lower cost. Specifically, a graphite powder containing 0.01 to 5.0 wt % of boron and having a looped closure structure at an end of a graphite c-planar layer on the surface of a powder, with the density of the interstitial planar sections between neighboring closure structures being not less than 100/&mgr;m and not more than 1500/&mgr;m, and with d002 being preferably not larger than 3.3650 Å, is manufactured by (1) heat-treating a carbon material pulverized at an elevated speed before or after carbonization for graphization at temperature exceeding 1500° C. or by (2) heat-treating the carbon material pulverized before or after carbonization at a temperature exceeding 1500° C.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: July 20, 2004
    Assignee: Sony Corporation
    Inventors: Koji Moriguchi, Mitsuhara Yonemura, Kazuhito Kamei, Masaru Abe, Hideya Kaminaka, Noriyuki Negi, Atsuo Omaru, Masayuki Nagamine
  • Patent number: 6764768
    Abstract: An alkanethiol of formula (1): HS—L—Q1—T—Q2—M—G—Z  (1), may for a SAM. Under application of a potential to the surface, the leaving group —Z is released.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: July 20, 2004
    Assignee: Arch Development Corporation
    Inventors: Milan Mrksich, Christian Hodneland
  • Patent number: 6764769
    Abstract: The invention relates to a novel apatite-coated metallic material having improved surface quality and biocompatibility, a process for its preparation, and the use of the material for bone implants, in particular dental implants, artificial joints and fixative material for accident surgery (osteosynthesis material). The coating in this case consists of a thick covering of hydroxyapatite crystals and/or amorphous calcium phosphate spheres having a specific surface area of less than 15 m2/g.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: July 20, 2004
    Assignee: Biomet Merck GmbH
    Inventors: Bernd Kotte, Jürgen Hofinger, Tanja Hebold
  • Patent number: 6764770
    Abstract: Materials for depositing buffer layers on biaxially textured and untextured metallic and metal oxide substrates for use in the manufacture of superconducting and other electronic articles comprise RMnO3, R1−xAxMnO3, and combinations thereof; wherein R includes an element selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and Y, and A includes an element selected from the group consisting of Be, Mg, Ca, Sr, Ba, and Ra.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: July 20, 2004
    Assignee: UT-Battelle, LLC
    Inventors: Mariappan P. Paranthaman, Tolga Aytug, David K. Christen, Roeland Feenstra, Amit Goyal
  • Patent number: 6764771
    Abstract: The invention relates to a product (1), particularly a gas turbine blade that can be exposed to a hot aggressive gas (7). The product (1) has a metallic basic body (2), which is provided with a thermal barrier coating (4) having a spinel of the composition AB2O4.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: July 20, 2004
    Assignee: Siemens Aktiengesellschaft
    Inventors: Beate Heimberg, Wolfram Beele, Karl Kempter, Ulrich Bast, Thomas Haubold, Michael Hoffmann, Axel Endriss, Peter Greil, Chu-Wan Hong, Fritz Aldinger, Hans J. Seifert
  • Patent number: 6764772
    Abstract: A sandwich material comprising two metal plates affixed to and separated by a fibrous core, is characterised in that the core comprises a three-dimensional porous network comprising metal fibres, wherein substantially all of the fibres are inclined at an acute angle to the plates. The sandwich material is lightweight, thin and handles like a monolithic sheet. It displays high beam stiffness and is easy to weld. It as therefore particularly useful in the manufacture of aircraft and vehicle parts.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: July 20, 2004
    Assignee: Cambridge University Technical Services Ltd.
    Inventors: Trevor William Clyne, Athina Markaki
  • Patent number: 6764773
    Abstract: A heat-dissipating substrate is made of a composite material comprising a first composition primarily composed of aluminum and a second composition primarily composed of silicon carbide and/or silicon The heat-dissipating substrate has a recess in one of its main faces. The main faces have fine unevenness, and the maximum amplitude of the fine unevenness in the depth direction of a main face is smaller than the maximum length in the depth direction of composite particles comprising the first composition and the second composition or particles of the second composition, the particles being exposed at the surface of the main face.
    Type: Grant
    Filed: August 28, 2002
    Date of Patent: July 20, 2004
    Assignee: Sumitomo Electric Industrial Co., Ltd.
    Inventors: Masahiro Omachi, Akira Fukui
  • Patent number: 6764774
    Abstract: A semiconductor device structure and method for manufacture includes a substrate having a top first layer of dielectric material; a second layer of material selected from the group including: amorphous Silicon (a-Si), amorphous Ge (a-Ge) or alloys thereof, located on top of the first layer; and, a third layer located on top of the a-Si, a-Ge, or alloys thereof layer, wherein the second layer provides adhesion between the first and third layers of the structure. Additionally, a semiconductor device structure and method for manufacture includes an insulating structure comprising a multitude of dielectric and conductive layers with respective a-Si, a-Ge, or alloys thereof bonding layers disposed to enhance adhesion between the different layers.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: July 20, 2004
    Assignee: International Business Machines Corporation
    Inventors: Alfred Grill, Michael Lane, Vishnubhai V. Patel
  • Patent number: 6764775
    Abstract: An article is coated with a multi-layer decorative and protective coating having the appearance of stainless steel. The coating comprises a polymeric basecoat layer on the surface of said article and vapor deposited on the polymeric basecoat layer a stack layer containing layers of refractory metal or refractory metal alloy alternating with layers containing the reaction products of refractory metal or refractory metal alloy, nitrogen and oxygen. Over the stack layer is vapor deposited at relatively low pressures a protective color layer comprised of the reaction products of refractory metal or refractory metal alloy, oxygen and nitrogen wherein the total nitrogen and oxygen content of these reaction products is from about 4 to about 32 atomic percent, with the nitrogen content being at least about 3 atomic percent.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: July 20, 2004
    Assignee: Vapor Technologies, Inc.
    Inventor: Guocun Chen
  • Patent number: 6764776
    Abstract: There are provided a light emitting device and an electronic device, which are light, have low consumption power and a low cost. When an organic light emitting material (1204b) is included in the positions between the lattices of a heavy metal complex (1204a) with a lattice structure, the phosphorescence of the organic light emitting material (1204b) in which only fluorescence is generally observed can be promoted. Since the organic EL element obtained thus can utilize phosphorescence, the light emission efficiency is high. Also, since a conventional organic light emitting material can be used, various light emission colors are obtained and the organic EL element can be manufactured at a low cost. A light emitting device and an electronic device are manufactured using such an organic EL element.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: July 20, 2004
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Satoshi Seo
  • Patent number: 6764777
    Abstract: The compound represented by the general formula (I): wherein each of R1 to R12 and RA1 to RA6 represents a hydrogen atom or a substituent group, and adjacent groups of R1 to R11 and RA1 to RA6 may be bonded to each other to form a ring. The light-emitting device of the present invention comprises a pair of electrodes and one or more organic layers disposed therebetween, at least one of the organic layers comprising the above compound.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: July 20, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshihiro Ise
  • Patent number: 6764778
    Abstract: A longitudinal bias layer is laminated above a free magnetic layer with a nonmagnetic layer provided therebetween so that the magnetization direction of the free magnetic layer is oriented by RKKY interaction with the longitudinal bias layer. The RKKY interaction exerts only between the longitudinal bias layer and the regions of the free magnetic layer which are located directly below both ends D of the longitudinal bias layer. Therefore, a thin film magnetic element can be provided, in which the width dimension of a recess formed in the longitudinal bias layer coincides with the magnetic track width.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: July 20, 2004
    Assignee: Alps Electric Co., Ltd.
    Inventors: Masamichi Saito, Naoya Hasegawa, Toshihiro Kuriyama, Eiji Umetsu, Kenichi Tanaka, Yosuke Ide
  • Patent number: 6764779
    Abstract: This invention provides a metallic article with a metallic substrate having a thermal barrier ceramic coating on its surface, the ceramic coating comprising a plurality of first layers of about 6 to 8 wt % yttria stabilized zirconia alternating with a plurality of second layers of about 18 to 22 wt % yttria stabilized zirconia. The alternating layers can be distinct layers or gradient layers.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: July 20, 2004
    Assignee: Chromalloy Gas Turbine Corporation
    Inventors: Yourong Liu, Paul Lawton
  • Patent number: 6764780
    Abstract: A method and apparatus increase the temperature of a fuel cell via reactant starvation at one or both electrodes. Reactant starvation at an electrode results in increased internal heat generation under load. Starvation conditions can be prolonged or intermittent and can be obtained, for example, by suitably reducing the supply rate of a reactant or by operating the fuel cell at sufficiently high current density so as to consume reactant faster than it is supplied. The method can allow for some generation of useful power by the fuel cell during start-up. The method is particularly suitable for starting up a solid polymer electrolyte fuel cell from temperatures below 0° C.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: July 20, 2004
    Assignee: Ballard Power Systems Inc.
    Inventors: Joy Roberts, Marian van der Geest, Jean St-Pierre, David P. Wilkinson, Alvin Lee, Stephanie Moroz
  • Patent number: 6764781
    Abstract: Process for improving the efficiency of a fuel cell system having a liquid coolant and a pump circulating the coolant through the fuel cell and a heat exchanger that extracts heat from the coolant. Improved efficiency is achieved by intermittently shutting off the pump when the fuel cell is operating at less than 25% of its “full power” design point.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: July 20, 2004
    Assignee: General Motors Corporation
    Inventor: Martin Monroe Hoch
  • Patent number: 6764782
    Abstract: An electrical isolation system is provided for a fuel cell stack as well as a method of operating the fuel cell stack. The stack comprises a plurality of fuel cells connected in series and a coolant circuit for cooling said fuel cells in operation using a liquid coolant having a restricted electrical conductivity. The stack is associated with a chassis having a chassis ground and comprising a plurality of coolant passages for said fuel cells. The coolant circuit comprises a plurality of conductive components such as an outer boundary wall of the fuel cell stack, a radiator and/or a pump at least one of which is connected to said chassis ground. A measuring circuit is provided for measuring the resistance between a selected one of the fuel cells and the chassis ground and a monitoring circuit provides a warning signal, or disengages the connection to the output terminals of the stack or shuts down the stack if the resistance reaches a critical value.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: July 20, 2004
    Assignee: General Motors Corporation
    Inventors: Stephen Raiser, Hartmut Hinz
  • Patent number: 6764783
    Abstract: An electrochemical fuel cell stack with improved reactant man folding and sealing includes a pair of separator plates interposed between adjacent membrane electrode assemblies. Passageways fluidly interconnecting the anodes to a fuel manifold and interconnecting the cathodes to an oxidant manifold are formed between adjoining non-active surfaces of the pairs of separator plates. The passageways extend through one or more ports penetrating the thickness of one of the plates thereby fluidly connecting the manifold to the opposite active surface of that plate, and the contacted electrode. The non-active surfaces of adjoining separator plates in a fuel cell stack cooperate to provide passageways for directing both reactants from respective stack fuel and oxidant supply manifolds to the appropriate electrodes. The fuel and oxidant reactant streams passageways are fluidly isolated from each other, although they both traverse adjoining non-active surfaces of the same pair of plates.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: July 20, 2004
    Assignee: Ballard Power Systems Inc.
    Inventors: Joel A. Ronne, Boguslaw M. Wozniczka, Clarence Y. Chow, Henry H. Voss
  • Patent number: 6764784
    Abstract: A fuel cell generator apparatus contains at least one fuel cell assembly module with at least one subassembly containing fuel cells, where the subassemblies are fueled at their base by a fuel feed injector attached to a fuel feed pre-reformer connected to fuel distribution manifolds; and where a module housing encloses the subassemblies and is in turn surrounded by a vessel having two ends providing a purge gas space between the housing and vessel; and where at least one fuel gas feed inlet, gaseous oxidant-purge gas feed inlet, and vessel exhaust gas outlet pass through the vessel; where the vessel can be used for pressurized or non-pressurized operation and is preferably tubular.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: July 20, 2004
    Assignee: Siemens Westinghouse Power Corporation
    Inventors: James E. Gillett, Paolo R. Zafred
  • Patent number: 6764785
    Abstract: A fuel cell system for providing primary and/or auxiliary/backup power to one or more loads for which a primary and/or backup power source is desirable to enable equipment to function for its intended purpose. The system provides power to the one or more loads upon the occurrence of power outage condition, which includes a disruption in the delivery of primary power to, or power demand condition by, the one or more loads. A controller senses outage of primary power to, or demand for primary power by, the one or more loads, and, responsive thereto, operatively engages one or more fuel cells to provide power to the one or more loads.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: July 20, 2004
    Assignee: Metallic Power, Inc.
    Inventors: Jeffrey A. Colborn, Stuart I. Smedley
  • Patent number: 6764786
    Abstract: The invention is a fuel cell stack having an improved pressure plate and current collector. The fuel cell stack includes a plurality of fuel cell component plates stacked adjacent each other to form a reaction portion of the fuel cell stack. A current collector is secured adjacent a first end of the stack of fuel cell component plates and a pressure plate is secured adjacent to the current collector. The current collector is made from a non-porous, electrically conductive graphite material and includes at least one conductive stud secured to the collector. The pressure plate is made of an electrically non-conductive, non-metallic, fiber reinforced composite material, so that the current collector and pressure plate are light, compact and have a low thermal capacity.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: July 20, 2004
    Assignee: UTC Fuel Cells, LLC
    Inventors: Aaron W. Morrow, Grant M. Erlich, Javier Resto
  • Patent number: 6764787
    Abstract: A stack of plates (121) (such as fuel cells, electrochemical cells, or enthalpy exchange plates) is surrounded by a sleeve manifold (119) which is shaped to provide manifold chambers (34-39; 146-149; 151-153; 156-158; 161-163; 180-187), and including surfaces (142) for seals (143) to isolate the manifold chambers from each other. Sleeve manifolds (119a, 119b, 119c) may be formed of material of varying thickness, by machining, casting, or extrusion, or may be formed of material (119d) of uniform thickness by bending, casting or extrusion. Sleeve manifolds may be formed of metal, graphite, plastic or reinforced plastic.
    Type: Grant
    Filed: September 10, 2002
    Date of Patent: July 20, 2004
    Assignee: UTC Fuel Cells, LLC
    Inventors: Albert P. Grasso, Henry G. Johnson
  • Patent number: 6764788
    Abstract: This invention includes a cover for a rechargeable battery to facilitate charging. The invention provides a means for coupling a charging plug and battery having different mechanical form factors. Hence, when a battery is inserted into the cover, the charging plug may mechanically couple to the cover, allowing power terminals on the charging plug to engage charging contacts on the battery.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: July 20, 2004
    Assignee: Motorola, Inc.
    Inventors: William H. Robertson, Jr., Wiling Tan
  • Patent number: 6764789
    Abstract: The present invention provides a redox flow type battery which a liquid-circulating battery comprising a battery cell and storage tanks for positive and negative electrolytes, wherein the battery cell is separated by a membrane to provide a positive cell and a negative cell, each cell having a liquid-permeable porous electrode disposed therein, wherein the positive and negative electrolytes are sulfuric acid aqueous solutions with vanadium ion concentrations of 0.5 mol/l to 8 mol/l and the electrolyte which migrates through the membrane over cycles of charge and discharge is returned from the storage tank where the liquid increases to the storage tank where the liquid decreases in order to keep the change in the amounts of the positive and negative electrolytes in a certain range while charge and discharge are carried out.
    Type: Grant
    Filed: May 25, 2001
    Date of Patent: July 20, 2004
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Sumie Sekiguchi, Kouichi Furusato, Mitsutaka Miyabayashi, Kanji Satou, Toshihiko Tanimoto, Shouzou Naitou
  • Patent number: 6764790
    Abstract: A lithium secondary battery using a lithium manganese oxide for a positive active material having a cubic spinel structure which has a crystallite size of 58 nm or greater and/or a lattice distortion of 0.09% or less. The ratio of Li/Mn in the lithium manganese oxide is preferably greater than 0.5. In synthesizing the lithium manganese oxide, a mixed compound including salts and/or oxides of each of the elements is fired in an oxidizing atmosphere in a range of 650° C. to 1000° C. for 5 to 50 hours, with the properties of the crystal being improved by firing two or more times, preferably with an increase in firing temperature over the temperature of the previous firing.
    Type: Grant
    Filed: January 4, 2002
    Date of Patent: July 20, 2004
    Assignee: NGK Insulators, Ltd.
    Inventor: Michio Takahashi
  • Patent number: 6764791
    Abstract: A rechargeable lithium battery using an Li alloying metal as the active material of at least one of its positive and negative electrodes. The metal active material is covered with a thin film which is nonreactive with Li ions, permits passage of Li ions but does not have an Li ion conductivity.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: July 20, 2004
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Noriyuki Tamura, Masahisa Fujimoto, Maruo Kamino, Shin Fujitani, Hiromasa Yagi, Yoichi Domoto, Hisaki Tarui, Ryuji Ohshita, Ikuo Yonezu
  • Patent number: 6764792
    Abstract: The invention relates to a halftone phase shift photomask which is controlled with precision in terms of its transmittance at a wavelength applied to inspection, and measuring equipment, so that its quality can easily be assured even when its phase difference at an exposure wavelength is controlled at 180° C. with precision and its transmittance is set at 1 to 20% as desired at that wavelength. The halftone phase shift photomask (107) comprises on a transparent substrate (101) and a halftone phase shift film containing at least tantalum, oxygen, carbon and nitrogen, and has a multilayer structure comprising at least two or more different layers (102) and (103).
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: July 20, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Junji Fujikawa, Yoshinori Kinase, Takafumi Okamura, Hiroshi Mohri, Toshifumi Yokoyama, Haruo Kokubo
  • Patent number: 6764794
    Abstract: A photomask for focus monitoring of the present invention is provided with a substrate that allows the exposure light to pass through and a unit mask structure for focus monitoring. Unit mask structure for focus monitoring has two patterns, and that are formed on the surface of substrate and a light blocking film that has a rear surface pattern that is formed on the rear surface of substrate for substantially differentiating the incident directions of the exposure light that enters two patterns, and for position measurement. When the dimension of rear surface pattern is L and the wavelength of the exposure light is &lgr;, L/&lgr; is 10, or greater.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: July 20, 2004
    Assignee: Renesas Technology Corp.
    Inventors: Shuji Nakao, Yuki Miyamoto, Naohisa Tamada, Shinroku Maejima
  • Patent number: 6764795
    Abstract: A method and system for mask pattern correction are disclosed. A portion of a mask pattern is segmented into segments (22) that include a base segment (22a) and a relational segment (22b). The relational segment (22b) is matched with the base segment (22a). A proximity correction is determined for the base segment (22a), and a critical dimension correction is determined for the relational segment (22b). The critical dimension correction is determined with respect to the proximity correction of the matching base segment (22a).
    Type: Grant
    Filed: August 22, 2002
    Date of Patent: July 20, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: Thomas J. Aton, Robert A. Soper
  • Patent number: 6764796
    Abstract: The present invention is a maskless photolithography system and method using a plasma display for creating two-dimensional and three-dimensional structures. Advantageously, the invention does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three-dimensional structure. The invention employs a plasma display having individually addressable pixels to generate and direct light onto an object that has photoreactive or photoresist compounds applied to the exposed surface. Unlike conventional plasma displays that generate visible light, the plasma display of the current invention lacks the phosphor coating conventionally used to convert ultraviolet (UV) light to visible light. Therefore, the instant plasma display generates UV light appropriate for reactive processes typically used in photolithography.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: July 20, 2004
    Assignee: University of South Florida
    Inventor: David P. Fries
  • Patent number: 6764797
    Abstract: A toner for MICR comprises at least a binder resin, magnetite particles comprising a mixture of granular magnetite and acicular magnetite, and a wax, wherein a ratio by weight of said acicular magnetite in said magnetite particles is 0.1-0.5 to the granular magnetite of 1.0, said magnetite particles are contained in an amount of 15-50% by weight in the toner, said granular magnetite has residual magnetization of 5-15 emu/g and saturation magnetization of 70-95 emu/g, and said acicular magnetite has residual magnetization of 20-50 emu/g and saturation magnetization of 70-95 emu/g.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: July 20, 2004
    Assignee: Tomoegawa Paper Co., Ltd.
    Inventors: Takayuki Sano, Tatsuru Matsumoto
  • Patent number: 6764798
    Abstract: A two-component developer comprising a toner onto which a hydrophobic silica having an average particle size of 25 nm or more is externally added, and a carrier having a saturation magnetization of from 50 to 95 Am2/kg, wherein the carrier has a ratio of surface resistivity to volume resistivity of from 1×102 to 1×104 m−1 at an electric field strength of 100 V/cm; and a method for development comprising applying the above two-component developer to an electrophotographic device comprising a photoconductor having a peripheral speed of 400 mm/sec or more, and developing a latent image. The two-component developer can be used for the development of a latent image formed in electrophotography, electrostatic recording method, electrostatic printing method or the like.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: July 20, 2004
    Assignee: Kao Corporation
    Inventors: Masahito Yamazaki, Koji Kameyama, Koji Akiyama
  • Patent number: 6764799
    Abstract: A carrier comprised of a core and thereover a polymer coating, and which coating is generated by the emulsion polymerization of one or more monomers and a surfactant, and wherein said polymer coating is of a diameter of equal to or less than about 100 nanometers.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: July 20, 2004
    Assignee: Xerox Corporation
    Inventors: Vladislav Skorokhod, Richard P. N. Veregin, Michael S. Hawkins, John G. VanDusen, Mary L. McStravick, Deepak R. Maniar
  • Patent number: 6764800
    Abstract: In an electrophotographic image process, a latent image is formed on a photosensitive drum, and a toner image is formed on the latent image. The toner image is temporarily transferred onto an intermediate image-transfer element. The photosensitive drum and the intermediate image-transfer element are brought into contact at an intended contact pressure and are rotated at a prescribed relative speed. At the contact portion, fine vibrations of the photosensitive drum and the intermediate image-transfer element, which can be caused by repeated contact and separation are prevented by controlling the contact temperature between the photosensitive member and the intermediate image-transfer element to be in the range of 15 to 60° C. A kinetic frictional deviation (a standard deviation of a kinetic frictional force) is controlled to be less than the average value of the kinetic frictional force. By suppressing the fine vibration, deviation in image transfer is prevented.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: July 20, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Koji Yamazaki, Hiroyuki Kobayashi, Masaya Kawada, Tetsuya Karaki, Hironori Owaki
  • Patent number: 6764801
    Abstract: A printing machine for recording an image on a recording medium with marking particles, wherein process of making marking particles includes a method for dispersing pigment aggregates in a solution. The method employs an ultrasonic device to efficiently breakup particle agglomerates by driving the ultrasonic signal over a small range of frequencies around the acoustic slow wave frequency of the saturated agglomerate. At this frequency, the fluid vibrates out of phase with the solid and is forced out through the pore structure in the agglomerate. This relative fluid motion to exert high viscous stresses at the particle-particle contact points which leads to fracture of the agglomerate.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: July 20, 2004
    Assignee: Xerox Corporation
    Inventor: Robert J. Meyer
  • Patent number: 6764802
    Abstract: A process including: agitating a mixture including a liquid and a plurality of resin particles within a vessel at a first shear condition; circulating a portion of the mixture from the vessel through a mixer; adding not all at once an aggregating agent for the resin particles and mixing the aggregating agent with the circulating mixture portion within the mixer at a second shear condition more intensive than the first shear condition to result in a post-mixer circulating composition; and returning the post-mixer circulating composition to the vessel wherein the post-mixer circulating composition undergoes the agitating at the first shear condition.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: July 20, 2004
    Assignee: Xerox Corporation
    Inventors: Milan Maric, Alan E. J. Toth, Thomas E. Enright, Marko D. Saban
  • Patent number: 6764803
    Abstract: Laser transfer film for durable inscription on components made from at least one backing layer, where on at least part of the underside of the backing layer there is an adhesion layer, wherein a pigment layer which comprises at least one laser-sensitive pigment has been applied to at least part of the adhesion layer and/or backing layer.
    Type: Grant
    Filed: November 20, 2001
    Date of Patent: July 20, 2004
    Assignee: tesa AG
    Inventors: Arne Koops, Sven Reiter
  • Patent number: 6764804
    Abstract: The invention relates to an imaging element comprising a pragmatic imaging sheet comprising paper having a resin coat on each side, adhesively adhered to a carrier sheet with a pressure-sensitive adhesive, comprising at least one core layer of polyester and a rough lower surface layer.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Cheryl J. Kaminsky, John M. Palmeri, William Baum, Philip J. Smith, Timothy J. Giarrusso
  • Patent number: 6764805
    Abstract: An apparatus and method for applying at least one solution of a predetermined viscosity to photosensitive material. The apparatus includes at least an application roller that applies the coating solution onto the photosensitive material. The application roller partially extends into a solution tray of the coating apparatus and is partially submerged in solution in the solution tray. In an arrangement of the present invention, a cascade wall and metering blade are positioned within the solution tray so as to define a first section at which solution enters the tray, and a second section which receives solution that spills over from the first section and includes a port which leads coating solution back to a coating solution tank for recycling or leads cleaning solution to drain. The apparatus further includes a washing arrangement that washes the coating apparatus in an efficient manner.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Ralph L. Piccinino, Jr., Kevin H. Blakely
  • Patent number: 6764806
    Abstract: The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: July 20, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Cha Won Koh, Jin Soo Kim, Ki Ho Baik
  • Patent number: 6764807
    Abstract: A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I), wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group; an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: July 20, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Barry Ray, Mark John Spowage, Christopher David McCullough
  • Patent number: 6764808
    Abstract: An integrated circuit fabrication process for patterning features at sub-lithographic dimensions is disclosed herein. The process includes sequentially exposing a of a film of arylalkoxysilane with a photobase generator, and catalytic amount of water coated on top of a conventional lipophilic photoresist layer provided over a substrate and exposed to a radiation at a first and a second lithographic wavelengths. The first lithographic wavelength is shorter than the second lithographic wavelength. Exposure to the first lithographic wavelength causes a self-aligned mask to form within the photoresist layer.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: July 20, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Uzodinma Okoroanyanwu, Armando C. Bottelli
  • Patent number: 6764809
    Abstract: A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; then subjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: July 20, 2004
    Assignees: North Carolina State University, University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall, Christopher L. McAdams
  • Patent number: 6764810
    Abstract: A method for improving a photolithographic patterning process in a dual damascene process including providing at least one via opening in a substrate including a low dielectric constant material; blanket depositing a photo-sensitive resinous layer to fill the at least one via opening; partially removing the photo-sensitive resinous layer to form an at least partially filled via plug; photo-curing the via plug such that an activating light source causes a polymer cross-linking chemical reaction; and, forming a trench line opening disposed substantially over the at least one via opening using a trench line photoresist to pattern the trench line opening.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: July 20, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Ching-Tien Ma, Tsung-Chuan Chen, Chun-Liang Fan
  • Patent number: 6764811
    Abstract: A resist film is formed from a chemically amplified resist material including a base polymer having a lactone group and having neither a hydroxyl group nor a carboxylic group as an adhesion group bonded to a polymer side chain; and an acid generator for generating an acid through irradiation with light. The resist film is irradiated with extreme UV of a wavelength of a 1 nm through 30 nm band for pattern exposure. The resist film is developed after the pattern exposure, so as to form a resist pattern from an unexposed portion of the resist film.
    Type: Grant
    Filed: January 2, 2002
    Date of Patent: July 20, 2004
    Assignee: Matsushita Electric Industry Co., Ltd.
    Inventors: Masayuki Endo, Masaru Sasago
  • Patent number: 6764812
    Abstract: A selective wetting material is formed by plasma depositing a film on a substrate from a two-component reaction of a silicon donor and organic precursor, and photo-oxidizing selected regions of the deposited film to form wetting regions to which a liquid will selectively adhere. When the liquid is an electrically conductive material, the process may be used to form printed circuits on a circuit board. When the substrate is optically transparent and the non-photo-oxidized regions of the film are removed, the process may be used to form a photomask.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: July 20, 2004
    Inventor: Ronald M. Kubacki
  • Patent number: 6764813
    Abstract: A photothermographic film and a method for making same is taught. The film includes a support, a photothermographic imaging layer coated on the support, and a complement film generally confining the photothermographic imaging layer between the support and the complement film. The complement film is applied to the photothermographic imaging layer prior to exposure of the photothermographic imaging layer. The complement film retains any volatile materials present in the photothermographic imaging layer generated when thermal energy is applied thereto to develop a latent image exposed on the photothermographic imaging layer.
    Type: Grant
    Filed: May 17, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Aparna V. Bhave, Karissa L. Eckert, Kenneth W. Metz, Lawrence B. Wallace, Mridula Nair, Thomas M. Smith, Barry M. Brown
  • Patent number: 6764814
    Abstract: A photographic developer composition for use in the development of a black and white silver halide photographic element said composition comprises at least one developing agent and, in an amount sufficient to inhibit sludge deposition, one or more compounds selected from compounds having the formula X—R1—CONH—A—S—S—B—NHCO—R2—Y  (I) wherein A and B are each independently a substituted or unsubstituted aliphatic, alicyclic, aromatic or heterocyclic group; R1 and R2 are each independently a substituted or unsubstituted aliphatic, alicyclic, aromatic or heterocyclic group; X and Y are each independently a solubilising group; and compounds having the formula X—R1—CONH—A—S—M  (II) wherein A, R1 and X are as defined above, and M is either a hydrogen atom or a cationic species if the sulfur atom is in its ionized form.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: July 20, 2004
    Assignee: Eastman Kodak Company
    Inventors: Paul M. Magee, Brian J. Parker, Nicholas A. Pightling
  • Patent number: 6764815
    Abstract: A color photographic print material which contains a cyan coupler of the formula in which R1 means a hydrogen atom or an alkyl group, R2 means OR3 or NR4R5, R3 means an unsubstituted or substituted alkyl group with 1 to 6 C atoms, R4 means an unsubstituted or substituted alkyl group with 1 to 6 C atoms, R5 means a hydrogen atom or an unsubstituted or substituted alkyl group with 1 to 6 C atoms, R6 means an unsubstituted or substituted alkyl group and Z means a hydrogen atom or a group eliminable under the conditions of chromogenic development, wherein the total number of the C atoms of the alkyl groups R3 to R6 in a coupler molecule is 8 to 18, is simultaneously distinguished by good light and dark stability as well as by good color reproduction. The couplers furthermore exhibit very good solubility in conventional coupler solvents.
    Type: Grant
    Filed: May 9, 2003
    Date of Patent: July 20, 2004
    Assignee: AGFA-Gevaert
    Inventor: Ralf Weimann