Patents Issued in December 14, 2004
  • Patent number: 6830834
    Abstract: A compound having a host moiety chemically bonded to at least one guest moiety according to the following general molecular structure: Ho—(L—G)n. Ho represents a host moiety that receives hole and/or electron recombination energy and transfers that energy to a guest moiety; G represents a guest moiety that contains a luminescent chromophore; L represents a chemical moiety that links the host and guest moiety and n is from 1 to 4. The compound can be used in the emissive layer of an OLED, or as a dopant dispersed in a host material that forms the emissive layer, wherein the host material has the same chemical structure as Ho.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: December 14, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiao-Chang Charles Li, Jian Ping Chen, Kazunori Ueno
  • Patent number: 6830835
    Abstract: A display film is capable of displaying different images between under a condition with luminous source and under a condition with a luminous source in a small space and capable of clear display by emission under a condition without a luminous source. The display film comprises: a first display layer which has a phosphorescent agent 5 or a shade agent 6 on at least a part of a surface of an opaque and nonporous substrate sheet 4 composed of a phosphorescent material as necessary and on which a first image 10 visible under a condition without a luminous source, a second display layer including a porous sheet 7 having a plurality of pores, which is disposed on the first display layer 1 in a condition such that the second display layer 2 partially conceals the first image 10 and on which a second image 11 visible under a luminous source is formed on the other hand, and a transparent protective layer disposed on the second display layer 2.
    Type: Grant
    Filed: September 18, 2003
    Date of Patent: December 14, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Masafumi Saito, Hideki Yaguchi
  • Patent number: 6830836
    Abstract: Disclosed is a material for a light emitting device excellent in color purity, good in light emitting characteristics and excellent in stability, which consists of a compound represented by the following general formula (I): L&Parenopenst;A)m  (I) wherein A represents a heterocyclic group in which two or more aromatic heterocycles are condensed; m represents an integer of 2 or more, and the heterocyclic groups represented by A may be the same or different; and L represents a connecting group.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hisashi Okada, Toshihiro Ise
  • Patent number: 6830837
    Abstract: It is an object of the present invention to provide a high reliability magnetic storage apparatus capable of performing writing and reading back of high density information. The magnetic storage apparatus is so configured as to have a longitudinal magnetic recording medium including: a magnetic layer formed on a non-magnetic substrate via a plurality of underlayers; the magnetic layer including a lower magnetic layer containing Ru in an amount of not less than 3 at % to not more than 30 at %, and Cr in an amount of not less than 0 at % to not more than 18 at %, and further containing at least one of B or C in an amount of not less than 0 at % to not more than 20 at %, and an upper magnetic layer containing Co as a main component disposed thereon via a non-magnetic intermediate layer.
    Type: Grant
    Filed: January 17, 2002
    Date of Patent: December 14, 2004
    Assignee: Hitachi Global Storage Technologies Japan, Ltd.
    Inventors: Tetsuya Kanbe, Hiroyuki Suzuki, Yotsuo Yahisa, Yoshiyuki Hirayama, Hidekazu Kashiwase
  • Patent number: 6830838
    Abstract: A titanium layer is formed on a substrate with chemical vapor deposition (CVD). First, a seed layer is formed on the substrate by combining a first precursor with a reducing agent by CVD. Then, the titanium layer is formed on the substrate by combining a second precursor with the seed layer by CVD. The titanium layer is used to form contacts to active areas of substrate and for the formation of interlevel vias.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: December 14, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej Singh Sandhu, Donald L. Westmoreland
  • Patent number: 6830839
    Abstract: The invention relates to a method for coating shaped bodies made of a superconducting material based on (Y/SE)BaCuO. The invention is characterized in that a coating consisting of a coating material is applied to at least one part of a surface of the shaped body, whereby the coating material at least partially melts at a lower temperature than that of the material of the shaped body and/or is flowable at a lower temperature than that of said material. The shaped body with the applied coating material is heated to a temperature at which the material of the shaped body does not yet melt and/or is not yet flowable, however at which the coating material is at least partially melted thereon and/or is in a flowable state.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: December 14, 2004
    Assignee: Nexans Superconductors GmbH
    Inventors: Michael Bäcker, Joachim Bock, Herbert Freyhardt, Andreas Leenders, Martin Ullrich, Heribert Walter
  • Patent number: 6830840
    Abstract: The present invention discloses an operation method for a polymer electrolyte fuel cell in an optimum operating condition by regulating the cell by a function represented by a gas flow rate and the difference between a saturated steam pressure and an actual steam pressure, by regulating an in-plane temperature distribution obtained by a cooling water flow direction and by the regulations of a cooling water inlet temperature and a cooling water flow amount; a gas supply amount; a supplied moisture amount; and a current density.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: December 14, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuhito Hatoh, Osamu Sakai, Hideo Ohara, Junji Niikura, Hisaaki Gyoten, Toshihiro Matsumoto, Teruhisa Kanbara
  • Patent number: 6830841
    Abstract: In a fuel cell system and its controlling method, the fuel cell system includes a stack 21 including fuel cells 11 each having a polymer electrolyte membrane 13, and a controller 61. The controller 61 is responsive to detected outputs of a displacement sensor 27 and a temperature sensor 27 and controls such that, when the polymer electrolyte membrane 13 is discriminated to remain in an excessively dry state, a shut-off valve 37 is applied with a “close” control signal to interrupt the supply of fuel gas to the stack 21 and, concurrently, a shut-off valve 41 is applied with an “open” control signal to allow air to be supplied to the stack 21 while applying a pump control signal to a pump 57 so as to maximize its rotational speed for thereby increasing the flow rate of pure water 59 to be circulated to the humidifier 35 from a pure water tank 55. Simultaneously, a timer of the controller 61 is operated to begin counting an incremental time.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: December 14, 2004
    Assignee: Nissan Motor Co., Ltd.
    Inventor: Kazuo Saito
  • Patent number: 6830842
    Abstract: A fuel cell system that can be used to power a vehicle is disclosed. The system includes a fuel cell stack, which uses hydrogen and an oxidizer to generate electricity, and a re-circulation loop that returns unreacted hydrogen to the fuel cell stack. The system includes a hermetically sealed assembly having a blower portion that pressurizes hydrogen in the re-circulation loop and a motor portion that drives the blower. The system also includes a source of make-up hydrogen for replenishing hydrogen in the re-circulation loop. The source introduces make-up hydrogen in the motor portion of the assembly at a pressure greater than the pressure in the blower portion of the assembly. Consequently, make-up hydrogen flows from the motor portion of the assembly into the blower portion assembly where it mixes with components in the re-circulation loop. A method of replenishing hydrogen in the fuel cell stack is also disclosed.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: December 14, 2004
    Assignee: General Motors Corporation
    Inventors: James S. Siepierski, Ulrich Dumke
  • Patent number: 6830843
    Abstract: A method for controlling the quality of the coolant for fuel cell systems, it being proposed to measure and monitor the insulation resistance of the load circuit of the fuel cell system. It has become apparent that there is a functional, uniquely defined relationship between the measured insulation resistance and the electrical conductivity of the coolant so that a separate measurement of the electrical conductivity by means of corresponding sensor systems and evaluation means can be dispensed with in the present invention.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: December 14, 2004
    Assignee: Ballard Power Systems AG
    Inventors: Anton Sonntag, Josef Sonntag, Hubert Urban
  • Patent number: 6830844
    Abstract: A fuel cell assembly having means for providing tempered air to, and removing spent air from, air-flow passages across the cathode. The air flow path includes means for reversing the direction of flow across the cathode periodically to reverse the roles of the leading and trailing edges of the cathode to prevent temperature differences across the cathode from exceeding 200° C., and thus to prevent damage to the cathode from thermally-induced stresses during startup heating and steady-state cooling.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: December 14, 2004
    Assignee: Delphi Technologies, Inc.
    Inventor: Kevin R. Keegan
  • Patent number: 6830845
    Abstract: In the process of manufacturing a cylindrical battery, when a tubular separator (3) and bottom separator (5) are inserted into a battery casing (1) in which are accommodated positive electrode mixture pellets (2), by inserting the bottom separator (5) such that it is pushed into the battery casing (1) at the leading end of the tubular separator (3), the peripheral portion of the bottom separator (5) is raised up, so that both separators (3,5) are inserted into the battery casing (1) in a condition with the leading end of the tubular separator (3) surrounded from the outside by this peripheral raised-up portion.
    Type: Grant
    Filed: September 10, 2002
    Date of Patent: December 14, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yasuhiko Shoji, Seiji Wada, Shigeto Noya, Tadahiro Sawada, Takayuki Aoi, Minoru Koda, Saburo Nakatsuka, Tsutomu Moriwaki
  • Patent number: 6830846
    Abstract: A unique discontinuous cathode sheet structure is incorporated within thin-film electrochemical halfcells and full cells. A thin-film electrochemical cell structure includes a cathode sheet layer comprising a series of discontinuous cathode sheets. In a monoface configuration, each of the cathode sheets includes one cathode layer in contact with a current collector layer. In a biface configuration, each of the cathode sheets includes a pair of cathode layers each contacting a current collector layer. A gap is defined between adjacent ones of the cathode sheets. A solid electrolyte layer contacts a surface of one or both cathode layers, depending on the configuration, and extends across the gaps defined between the adjacent cathode sheets. The cathode sheets may be arranged in a number of rows to define a matrix of the cathode sheets.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: December 14, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: David C. Kramlich, Alan P. Miller
  • Patent number: 6830847
    Abstract: A zinc/air button cell comprising a cathode casing and an anode casing wherein the anode casing is inserted into the cathode casing. The anode casing is formed of multiclad metal layers, for example nickel/stainless steel/copper. A protective metal is plated onto the exposed peripheral edge of the anode casing. The protective metal is desirably selected from copper, tin, indium, silver, brass, bronze or gold. The application of the protective metal covers the multiclad metals exposed along the peripheral edge surface. The protective metal is also desirably plated onto the portion of the outside surface of the anode casing abutting the insulating material placed between the anode and cathode casing. Application of the protective metal to the anode casing peripheral edge eliminates the potential gradients caused by exposure of the different metals comprising the multiclad material.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: December 14, 2004
    Assignee: The Gillette Company
    Inventors: Karthik Ramaswami, Daniel Gibbons, Keith Buckle
  • Patent number: 6830848
    Abstract: A molded electrode into one-piece is obtained by hot pressing an electrode material obtained by mixing a polymer active material, a conductivity-enhancing agent and a plasticizer, and a current collector sheet. The electrode structure permits significant freedom when designing a secondary battery which uses this electrode with a high energy density and a high power density.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: December 14, 2004
    Assignee: NEC Tokin Corporation
    Inventors: Masaki Fujiwara, Yuji Nakagawa, Masato Kurosaki, Shinako Kaneko, Gaku Harada, Toshihiko Nishiyama
  • Patent number: 6830849
    Abstract: The present invention relates to a high crystalline polypropylene microporous membrane and a preparation method of the same, and it provides a preparation method of a polypropylene microporous membrane comprising the steps of preparing a precursor film using high crystalline polypropylene having a crystallinity of 50% or more and a very high isotacticity, annealing, stretching at a low temperature, stretching at a high temperature, and heat setting, and a polypropylene microporous membrane having superior permeability and mechanical properties prepared by the preparation method.
    Type: Grant
    Filed: September 7, 2001
    Date of Patent: December 14, 2004
    Assignee: LG Chemical Co., Ltd.
    Inventors: Sang-Young Lee, Byeong-In Ahn, Sung-Gap Im, Soon-Yong Park, Heon-Sik Song, You-Jin Kyung
  • Patent number: 6830850
    Abstract: An interferometric lithography method includes providing a first layer of material over a substrate and providing a second layer of material over the first layer of material. The method further includes providing a layer of photoresist over the first and second layers of material and providing coherent light to the first and second layers. The coherent light has an intensity insufficient to chemically transform the photoresist. The coherent light reflects off the first and layers to interfere with an intensity sufficient to chemically transform the photoresist.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: December 14, 2004
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Zoran Krivokapic, Bhanwar Singh
  • Patent number: 6830851
    Abstract: A method of making a photolithographic mask includes forming a metal-silicon layer on a substrate, and processing at least a portion of the metal-silicon layer. The metal-silicon layer has a first thickness and the portions of the metal-silicon layer are processed to a second thickness that is less than the first thickness. The method also includes forming a reflector layer on the metal-silicon layer to produce a mask blank and then forming the mask from the mask blank. The mask blank includes the substrate, metal-silicon layer, and reflector layer.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: December 14, 2004
    Assignee: Intel Corporation
    Inventor: Pei-Yang Yan
  • Patent number: 6830852
    Abstract: Methods are provided for complementarily dividing, on a divided stencil reticle as used in charged-particle-beam (CPB) microlithography, certain pattern elements into complementary pattern-element portions, and for exposing the pattern-element portions without significantly reducing throughput. For example, a large-area pattern element, having length and width equal to or greater than a division criterion L, is complementarily divided into linear pattern-element portions each having a width<L, and length≧L. Each pattern-element portion can have respective overlap regions along edges at which the portions as projected are conjoined on a lithographic substrate. The pattern-element portions are defined on at most two complementary reticles (or reticle portions) thereby imposing less adverse effect on throughput than conventionally.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: December 14, 2004
    Assignee: Nikon Corporation
    Inventors: Shintaro Kawata, Koichi Kamijo, Shinichi Takahashi
  • Patent number: 6830853
    Abstract: A method of forming photomasks is described which provides good critical dimension control for critical pattern elements and provides good throughput and low defect levels for etching relatively large areas of opaque material. The pattern is first modified to form a frame around the pattern elements which require good critical dimension control. The opaque material, such as chrome, in this frame is then etched away using dry anisotropic etching. The dry anisotropic etching provides good critical dimension control. The remainder of the opaque material to be removed is then etched away using wet isotropic etching. The wet isotropic etching provides good defect control in this region of the mask and good throughput. This method provides good critical dimension control at the edges of the pattern elements, good throughput in mask fabrication, and good defect level control in removing the relatively large areas of opaque material which do not affect critical dimension control.
    Type: Grant
    Filed: August 7, 2002
    Date of Patent: December 14, 2004
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: San-De Tzu, Sheng-Chi Chin, Chung-Hsing Chang, Hsin-Chang Li
  • Patent number: 6830854
    Abstract: An accurate, cost-effective system and method for correcting 3D effects on an alternating phase-shifting mask (PSM) is provided. To facilitate this correction, a library can be built to include a first group of 180 degree phase-shifting regions, wherein these regions have a common first size. Based on this first size, 3D simulation is performed. A transmission and a phase are altered in a 2D simulation based on this first size until a shape dependent transmission and a shape dependent phase allow the 2D simulation to substantially match the 3D simulation. Finally, a modified first size is chosen using the shape dependent transmission and the shape dependent phase such that a 2D simulation based on the modified first size substantially matches the 3D simulation based on the first size. The library associates the first size with the modified first size, the shape dependent transmission, and the shape dependent phase.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: December 14, 2004
    Assignee: Numerical Technologies, Inc.
    Inventors: Yong Liu, Hua-Yu Liu
  • Patent number: 6830855
    Abstract: The invention provides a color filter which includes a light shielding region having sufficient light shielding performance, and a transmitting region having no color mixing, and which has high contrast without pixel defect and irregularity in color tone. A color filter of the present invention can include a pixel region and a spotting precision test region. The pixel region includes a light shielding region and a transmitting region partitioned by the light shielding region. The light shielding region includes a first light shielding layer. The transmitting region includes a color element. The spotting precision test region is positioned apart from the pixel region and includes a second light shielding layer and a spotting precision test layer provided to cover at least the second light shielding layer. The spotting precision test layer region includes an evaluation region partitioned by the second light shielding layer.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: December 14, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Satoru Katagami, Tatsuya Ito, Hisashi Aruga
  • Patent number: 6830856
    Abstract: This invention relates to a method for fabricating a color filter by using the theory of surface tension. The surface tension is very small when hydrophobic material is on hydrophobic surface and the surface tension is very large when hydrophobic material is on hydrophilic surface. It avoids to blurry with the printed hydrophobic color materials and can get fine color filter with excellent color reappearance when the surface of pixel area is a hydrophobic surface and the surface of non-pixel area is a hydrophilic surface. This invention comprises: forming a dielectric layer on substrate; forming a plurality of scan lines and a plurality of data lines on substrate to define a plurality of pixel areas and a non-pixel area; forming a hydrophobic surface on the plurality of pixel areas; forming a hydrophilic surface on the non-pixel area; and using ink-jet printing method to print the hydrophobic color materials on the plurality of areas.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: December 14, 2004
    Assignee: Toppoly Optoelectronics Corp.
    Inventors: Yaw-Ming Tsai, Shih-Chang Chang
  • Patent number: 6830857
    Abstract: An image forming method including charging an upper surface of a photoconductor having a photoconductive layer with a charger located in contact with or spaced apart a distance of not greater than 100 &mgr;m from the upper surface, and scanning the charged upper surface with a light beam having a wavelength of &lgr; &mgr;m and a spot diameter &phgr; &mgr;m to form an electrostatic latent image thereon. The upper surface of the photoconductor and a lower surface of the photoconductive layer have such roughness that the maximum heights in a unit length of &phgr; &mgr;m give minimum values R1 and R2, respectively, satisfying the following conditions: R1≦&lgr;/2n &mgr;m, R2≦&lgr;/2n &mgr;m and (R1+R2)≧&lgr;/2n &mgr;m.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: December 14, 2004
    Assignee: Ricoh Company, Ltd.
    Inventors: Toshiyuki Kabata, Toshio Fukagai
  • Patent number: 6830858
    Abstract: An electrophotographic photosensitive member having a photosensitive layer provided on an electro-conductive supporting substrate and a protection layer provided on the photosensitive layer. The protection layer includes a kind of finely divided metal oxide particle, an organic acid, and a binder resin. The binder resin is a thermo-curable resin. The organic acid is contained in an amount of 0.05 wt. % to 5 wt. % for the amount of the thermo-curable resin. The photosensitive member has a high durability capable of stable image productions for a long period of utilizable time, due to the protection layer.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: December 14, 2004
    Assignee: RICOH Company, Ltd.
    Inventors: Akihiro Sugino, Yasuo Suzuki
  • Patent number: 6830859
    Abstract: A charge control agent containing a barium salt of a sulfoisophthalic acid compound and optionally a metal salt of a salicylic acid compound. A toner for developing an electrostatic latent image comprising such a charge control agent, a binder resin and a colorant.
    Type: Grant
    Filed: June 7, 2002
    Date of Patent: December 14, 2004
    Assignees: Ricoh Company, Ltd., Takemoto Yushi Kabushiki Kaisha
    Inventors: Keiko Shiraishi, Masanori Suzuki, Yohichiroh Watanabe, Toyoshi Sawada, Takuya Saito, Tatsuhiko Osaki, Satoshi Aratani, Hiroki Ogiso
  • Patent number: 6830860
    Abstract: A toner comprised of a branched amorphous resin, a crystalline resin, and a colorant.
    Type: Grant
    Filed: January 22, 2003
    Date of Patent: December 14, 2004
    Assignee: Xerox Corporation
    Inventors: Guerino G. Sacripante, Hadi K. Mahabadi, Fatima M. Mayer, Edward G. Zwartz, T. Brian McAneney
  • Patent number: 6830861
    Abstract: A photopolymerizable composition that is highly sensitive not only to ultraviolet light, but also light in the range from visible light to infrared light, and a recording material containing the photopolymerizable composition, which is excellent in sensitivity and decolorization property in the background part, and which is capable of forming sharp images with high contrast. The photopolymerizable composition contains a polymerizable compound having an ethylenic unsaturated bond and a radical generator capable of forming a radical by the action of the compound and the radical generator upon each other.
    Type: Grant
    Filed: February 1, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanobu Takashima, Yuuichi Fukushige
  • Patent number: 6830862
    Abstract: A positive working, multi-layer thermally imageable element is disclosed. The element comprises a substrate, an underlayer, and a top layer. The top layer comprises a crosslinked polymeric material. The element may be thermally imaged and developed to form a lithographic printing plate.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: December 14, 2004
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Paul Kitson, Jayanti Patel, Jianbing Huang, Paul West, Ken-ichi Shimazu
  • Patent number: 6830863
    Abstract: A multicolor image-forming material comprises: an image-receiving sheet having an image-receiving layer; and at least four thermal transfer sheets each including a support, a light-to-heat converting layer and an image-forming layer, in which each of the thermal transfer sheets has a different color, wherein an image is formed by: superposing the image-forming layer in each of the at least four thermal transfer sheets on the image-receiving layer in the image-receiving sheet, in which the image-forming layer is opposed to the image-receiving layer; irradiating the image-forming layer in the thermal transfer sheet with a laser beam; and transferring the irradiated area of the image-forming layer onto the image-receiving layer in the image-receiving sheet, and each of the light-to-heat converting layers in the at least four thermal transfer sheets has a ratio of an optical density (OD) to a layer thickness: OD/layer thickness (&mgr;m unit) of 0.57 or more.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naotaka Wachi, Akihiro Shimomura, Kazuhito Miyake, Yasutomo Goto, Mitsuru Yamamoto
  • Patent number: 6830864
    Abstract: A method for transferring a transparent conductive film onto one surface of a sheet base material made of a plastic material, wherein the transparent conductive film as an object to be transferred is preliminarily formed on a substrate side which is superior in heat resistance to the plastic material, the transparent conductive film being sandwiched between a peelable layer which can be peeled off at the time of transfer and a protective film for protecting the transparent conductive film on the substrate side which is superior in heat resistance to the plastic material.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: December 14, 2004
    Assignee: Kyodo Printing Co., Ltd.
    Inventors: Ichiro Bekku, Tadahiro Furukawa, Akiyoshi Murakami, Kazumi Arai, Hisashi Sato
  • Patent number: 6830865
    Abstract: A positive-type image-forming material and a planographic printing plate precursor having a recording layer composed of the material on a support. The material includes (a) a water-insoluble, aqueous alkaline solution-soluble polymer compound, (b) a light-heat converting agent, and (c) a phenol including a partial structure represented by the following formula (I). Solubility of the material in an aqueous alkaline solution is increased upon heating. In the formula (I), X represents a monovalent terminal group having 2 or more carbon atoms or a linking group of —CY1Y2— or —CHY1— in which Y1 and Y2 each represent a monovalent terminal group having 1 or more carbon atoms, W represents a monovalent terminal group, and n represents an integer from 1 to 4.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomotaka Tsuchimura, Ippei Nakamura, Akio Oda
  • Patent number: 6830866
    Abstract: A resist composition comprising a hydrogenated product of ring-opening metathesis polymer and a poly(meth)acrylic acid derivative as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etch resistance, and lends itself to micropatterning with electron beams or deep-UV.
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: December 14, 2004
    Assignee: Shi-Etsu Chemical Co., Ltd.
    Inventors: Tomohiro Kobayashi, Tsunehiro Nishi, Satoshi Watanabe, Takeshi Kinsho, Shigehiro Nagura, Toshinobu Ishihara
  • Patent number: 6830867
    Abstract: A positive photosensitive composition containing (A) an acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kunihiko Kodama
  • Patent number: 6830868
    Abstract: A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: December 14, 2004
    Assignee: JSR Corporation
    Inventors: Tomoki Nagai, Tsutomu Shimokawa
  • Patent number: 6830869
    Abstract: A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: wherein R1 and R3 are the same or different and are a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; R2 is an atom or a group that is not released by an acid and is selected from the group consisting of a hydrogen atom, an alkyl group, a cyclic aliphatic group, an aromatic group, a heterocycle, an ester group and an ether group; R4 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0<a<1, 0<b<1 and 0<a+b≦1.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: December 14, 2004
    Assignee: Atsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 6830870
    Abstract: A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: wherein R1, R4, R5 and R6 are each independently H, lower alkyl, CH2CO2R10, cyano, CH2CN, or halogen, wherein R10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R2 is CHR11R12 where R11 and R12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R3 is linear, branched or cyclic fluoroalkyl group or SiR13R14R15 where R13, R14, and R15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(═O)—O—(CH2)x where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cycl
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: December 14, 2004
    Assignee: Arch Speciality Chemicals, Inc.
    Inventors: Sanjay Malik, Stephanie J. Dilocker, Binod B. De
  • Patent number: 6830871
    Abstract: A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution by the action of an acid, (b) a compound capable of generating an acid upon irradiation with actinic rays or a radiation, (c) a low-molecular compound having a molecular weight of 3,000 or lower, wherein the value determined with the specific calculation formula is from 0.1 to 0.5, and (d) a solvent.
    Type: Grant
    Filed: August 18, 2003
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shinichi Kanna, Kazuyoshi Mizutani, Tomoya Sasaki
  • Patent number: 6830872
    Abstract: Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuyoshi Mizutani, Shiro Tan
  • Patent number: 6830873
    Abstract: A method for adjusting and exposing the second level of a phase-shift mask includes the steps of depositing a thin conductive layer over a photoresist layer only on the alignment structures and their surroundings, and covering the chip structures exposed in the first step in a suitable way by a covering for the purpose of depositing the thin conductive layer. Grounding the thin conductive layer means that no charging of the substrate takes place during alignment by an electron-beam writer.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: December 14, 2004
    Assignee: Infineon Technologies AG
    Inventors: Gernot Goedl, Dirk Löffelmacher
  • Patent number: 6830874
    Abstract: A method for preparing a lithographic printing plate which comprises imagewise exposing to light a presensitized plate useful for making a lithographic printing plate having an intermediate layer and a photosensitive layer on an aluminum substrate in this order and developing the imagewise exposed plate with a developer, wherein said intermediate layer comprises a polymer compound comprising at least a structure unit having an acid group and a structure unit having an onium group and said developer comprises an inorganic alkali salt and a nonionic surfactant having polyoxyalkylene ether group and pH of the developer ranges from 11.0 to 12.7. The method provides a lithographic printing plate, which shows good contrast between an image area and non-image area, no background contamination during printing, good stability with time and good printing durability.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shun-ichi Kondo, Yuichi Shiraishi
  • Patent number: 6830875
    Abstract: A method for forming an electronic structure. Provides is a layer that includes a cylindrical volume of a photoimageable dielectric (PID) material, an annular volume of the PID material circumscribing the cylindrical volume, and a remaining volume of the PID material circumscribing the annular volume. The layer is photolithograhically exposed to radiation. The annular volume is fully cured by the radiation. The remaining volume is partially cured by the remaining volume by said radiation. The method prevents curing of the cylindrical volume, wherein the PID material in the cylindrical volume remains uncured.
    Type: Grant
    Filed: October 7, 2002
    Date of Patent: December 14, 2004
    Assignee: International Business Machines Corporation
    Inventors: Stephen J. Fuerniss, Gary Johansson, Ross W. Keesler, John M. Lauffer, Voya R. Markovich, Peter A. Moschak, David J. Russell, William E. Wilson
  • Patent number: 6830876
    Abstract: An acoustic resistor or damper and method of manufacturing the same is disclosed. The damper has mesh material and mounting material attached to the mesh material. The mounting material defines an open region for transmission of sound through the mesh material, and has a mounting surface for mounting the damper on a surface surrounding an acoustic port or tube. The mounting surface is located on a plane different from the mesh material, thereby shielding the mesh material from adhesive applied between the mounting surface and the surface surrounding the acoustic port or tube. The method of manufacturing an acoustic damper comprises exposing emulsion applied to a mesh material through at least one opening in a photographic mask to ultraviolet light and removing the emulsion exposed. A portion of the remaining emulsion and mesh material is cut in a shape surrounding the removed emulsion.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: December 14, 2004
    Assignee: Etymotic Research, Inc.
    Inventors: Mead C. Killion, Andrew J. Haapapuro
  • Patent number: 6830877
    Abstract: A method for forming via openings or contact holes with improved aspect ratios by using a deep UV photoresist is described. In the method, after a deep UV photoresist layer is deposited on top of a thick oxide layer, the deep UV photoresist layer is pre-treated by a curing process with UV radiation for a time period of at least 1 min, and preferably between about 1 min and about 10 min at a temperature of at least 100° C., and preferably at least 160° C. The curing process stabilizes the structure of the deep UV photoresist material and thus reduces the formation of fluorocarbon polymers by the carbon component in the photoresist material and the fluorine component in the etchant gas, and subsequently, reduces the coating of such fluorocarbon polymers at the bottom of the via openings which would otherwise stop the etching process during via or contact formation.
    Type: Grant
    Filed: December 31, 2001
    Date of Patent: December 14, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ching-Tien Ma, Tsung-Chuan Chen, Shew-Tsu Hsu
  • Patent number: 6830878
    Abstract: The present invention relates to a developer comprising a developing agent and a polyalkyleneimine antioxidant being formed by the condensation of a number of alkyleneimine units and having the following formula (I): wherein R1, R2 and R3 independently represent an unsubstituted or substituted alkylene group or R2 may be H; x and y independently represent an integer from 1 to 39,999; the sum of x and y represents an integer from 10 to 40,000; and wherein the amine groups of the antioxidant have been partially oxidized with hydrogen peroxide or a compound capable of generating hydrogen peroxide, prior to the introduction of the developing agent. In a preferred embodiment, the antioxidant has been partially oxidized such that the amount of hydroxylammonium groups formed is less than half the total equivalent of the original amine before the addition of the developing agent. The developer may optionally comprise an alkaline buffer.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: December 14, 2004
    Assignee: Eastman Kodak Company
    Inventor: John R. Fyson
  • Patent number: 6830879
    Abstract: Disclosed is a photothermographic material having a support, at least one photosensitive layer containing a silver halide and a reducing agent and a non-photosensitive layer containing aggregates of a dye, wherein a transmission absorption spectrum of the aggregates has a maximum absorption wavelength within the range of 600-750 nm. The photothermographic material is easy to handle and provide an image having sufficient definition without residual color after development. The photothermographic material is suitable for light exposure with a red laser.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ryo Suzuki, Keiichi Suzuki, Yoshiharu Yabuki
  • Patent number: 6830880
    Abstract: A silver halide color photosensitive material for being subjected to a color development within nine seconds of being imagewise exposed, and comprising a support and a photograph constitution layer provided on the support, the photograph constitution layer containing at least one layer that comprises a yellow dye-forming coupler, at least one layer that comprises a magenta dye-forming coupler, at least one layer that comprises a cyan dye-forming coupler, and at least one non-photosensitive hydrophilic colloid layer. The coupler-comprising layers respectively include silver halide emulsions, and at least one of the silver halide emulsions has the characteristics of: (i) a silver halide content of 90 mol % or more; and (ii) containing at least one specific metal complexes. The color development is preferably completed within 28 seconds.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoto Oshima, Tadanobu Sato, Akito Yokozawa
  • Patent number: 6830881
    Abstract: Compositions, methods and kits for diagnosing and treating cancer are provided. Therapeutic compositions may comprise agents that modulate the expression or activity of a sphingosine-1-phosphate lyase (SPL). Such compositions may be administered to a mammal afflicted with cancer. Diagnostic methods and kits may employ an agent suitable for detecting alterations in endogenous SPL. Such methods and kits may be used to detect the presence of a cancer or to evaluate the prognosis of a known disease. SPL polypeptides, polynucleotides and antibodies are also provided.
    Type: Grant
    Filed: January 17, 2002
    Date of Patent: December 14, 2004
    Assignee: Children's Hospital & Research Institute at Oakland
    Inventors: Julie D. Saba, Henrik Fyrst
  • Patent number: 6830882
    Abstract: In accordance with the present invention, there are provided a class of compounds which are capable of selectively modulating processes mediated by peroxisome proliferator activated receptor-gamma (PPAR-&ggr;). The identification of such compounds makes possible the selective intervention in PPAR-&ggr; mediated pathways, without exerting inadvertent effects on pathways mediated by other PPAR isoforms.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: December 14, 2004
    Assignee: The Salk Institute for Biological Studies
    Inventors: Ronald Mark Evans, Barry Marc Forman
  • Patent number: 6830883
    Abstract: The present invention provides a method for typing of alleles of the Minor Histocompatibility Antigen HA-1 in a sample. The method comprises: a) contacting the genomic polynucleic acids in the sample with at least one pair of primers, whereby the 51- and/or the 31-primer of the at least one pair of primers specifically hybridize to target regions comprising polymorphic nucleotides in the alleles, and performing an amplification reaction; b) for each of the at least one pair of primers detecting whether or not in step a) an amplification product is formed; c) inferring from the result of step b) which HA-1 allele is present in the sample. The present invention also provides a method for genomic typing of alleles of the Minor Histocompatibility Antigen HA-1 in a sample.
    Type: Grant
    Filed: May 21, 1999
    Date of Patent: December 14, 2004
    Assignee: Rijksuniversiteit Leiden
    Inventor: Elsa Afra Julia Maria Goulmy