Abstract: As a negative electrode active material, carbon materials such as natural graphite, artificial graphite, non-graphitized carbon, and cork (charcoal) can be used. Further, a negative electrode comprises an active material layer including a group of particulate negative electrode active materials, and nickel is carried on a surface of the active material layer. Examples of a method of carrying nickel on a negative electrode surface include a method by coating, an evaporation method, and a method of bringing nickel ions into existence in a non-aqueous electrolyte to deposit nickel on a negative electrode surface. The amount of nickel added to the non-aqueous electrolyte is not less than 0.0008 mol/1 nor more than 0.007 mol/1.

Abstract: Disclosed is an additive for an electrochemical cell wherein the additive includes an N—O bond. The additive is most preferably included in a nonaqueous electrolyte of the cell. Also disclosed are cells and batteries including the additive, and methods of charging the batteries and cells. An electrochemical cell including the additive preferably has an anode that includes lithium and a cathode including an electroactive sulfur-containing material.

Abstract: The present invention provides a lithium secondary battery which is improved in cycle characteristics and storage stability at an elevated temperature as well as protection from overcharge. In the battery, generation of a gas is also inhibited to prevent the battery from expansion. A non-aqueous electrolytic solution for the lithium secondary battery has an electrolyte in a non-aqueous solvent. The non-aqueous solvent is composed of a cyclic carbonate compound, a linear carbonate compound and a cyclohexylbenzene compound having a benzene ring to which one or two halogen atoms are attached. A volume ratio of the cyclic carbonate compound and the linear carbonate compound in the non-aqueous solvent is in the range of 20:80 to 40:60, or the non-aqueous solvent further contains a small amount of a branched alkylbenzene compound.

Abstract: The invention relates to masks comprising a multilayer coating of a specified period thickness distribution such as those used in lithography devices for producing semiconductor components. One problem of projection optics concerns pupil apodization which leads to imaging defects. The invention provides that the period thickness in the mask plane is selected so that it is greater than the period thickness ideal for maximum reflectivity. As a result, not only does the apodization over the pupil become more symmetric but the intensity variation also becomes smaller overall.

Abstract: In a photomask formed with a device pattern made of a light-shielding film pattern in a transfer area on a front surface of an optically transparent substrate, the photomask includes a non-device pattern such as a product identification pattern composed of a light-shielding film pattern in a non-transfer area at a peripheral portion, wherein there is provided, at a back surface of the optically transparent substrate opposed to at least a position where the non-device pattern is formed, a light-transmission reducing thin film as light-transmission reducing means for reducing transmission of exposure light entering from the peripheral portion of the back surface of the optically transparent substrate.

Abstract: The present invention discloses a HT-AttPSM (high-transmittance attenuated phase-shift mask) blank with phase-shifters composed of the (Al2O3)x/(TiO2)1-x superlattice film stacks, wherein x preferably ranges 79˜84%. Particularly, the four-stacked superlattice films of the present invention perform superior optical properties including transmittance of 19.9% and a reflectance of 3.2% at the wavelength of 193 nm and an inspection transmittance less than 20% at the wavelength of 257 nm.

Abstract: An optical proximity correction photomask comprises a transparent substrate, a main feature having a first transmitivity disposed on the transparent substrate and at least one assist feature having a second transmitivity disposed beside the main feature and on the transparent substrate, wherein the first transmitivity is not equal to the second transmitivity.

Abstract: A phase shifting mask (PSM) and a trim mask can be used in a dual exposure to form circuits on an integrated circuit. The trim mask can include first structures that define non-critical features of a design (e.g. line ends), second structures that protect areas exposed by phase shifters, wherein such areas including critical features (e.g. transistor gates) of the design, and transitional areas located between the first and second structures. Notably, these transitional areas can include notches. This notched trim mask can advantageously minimize line end widening, thereby improving feature definition and device performance on the resulting integrated circuit. The notched trim mask can also advantageously simplify the optical proximity correction of its associated PSM, thereby minimizing fabrication costs.

Abstract: The subject invention provides a system and method for improving the process margin of a lithographic imaging system. The process margin improvement is achieved through the novel placement of discrete assist features and/or the use of forbidden pitches and specific pitch orientations. Novel geometries are utilized, which take advantage of line-end pull back and/or a lack of resolution of pitches perpendicular to an axis of a dipole illumination source. The strategic placement of a series of discrete scatterbar segments on a mask near positions of critical features, such as, for example, contacts, mitigates resist residue that can result from the use of a contiguous scatterbar.

Abstract: A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam as a transmitted light beam and for shifting a phase of the transmitted light beam by a predetermined amount, and a phase shifter film for forming the phase shifter portion. The halftone phase shift mask has an optical characteristic such that light beams passing through the light transmitting portion and through the phase shifter portion cancel each other in the vicinity of a boundary portion therebetween, thereby maintaining and improving an excellent contrast at a boundary portion of an exposure pattern to be transferred onto the surface of an object to be exposed.

Abstract: Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.

Abstract: The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model. Finally a pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified. The predicting of thermally-induced field deformation information by the model includes predicting of deformation effects of selected points on the substrate. It is based on a time-decaying characteristic as energy is transported across substrate; and a distance between the selected points and an edge of the substrate.

Abstract: One embodiment of the present invention provides a system that accurately determines a critical dimension of a feature in a layout by compensating for the effects of topography variation on the performance of an optical lithography process. During operation, the system first receives a layout. Next, the system computes an aerial-image intensity at an evaluation point in the layout using an optical lithography model that models the optical lithography process. Note that the aerial-image intensity is typically compared with a constant intensity threshold to determine a critical dimension of a feature in the layout. The system then computes an intensity threshold based on features in the proximity of the evaluation point, which compensates for the effects of topography variations on the performance of the optical lithography process.

Abstract: An electrophotographic imaging member having a charge generating layer and a charge transport layer overlayed thereon is provided. The charge transport layer has a lower surface and an upper surface, wherein the lower surface is in contiguous contact with the charge generating layer. The charge transport layer comprises a film forming polymer binder and a charge transport compound molecularly dispersed or dissolved therein to form a solid solution. The concentration of the charge transport compound in the charge transport layer decreases from the lower surface to the upper surface. In such a construction, the resulting charge transport layer exhibits enhanced cracking suppression, improved wear resistance, excellent imaging member electrical performance, and improved copy print out quality.

Abstract: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates copolymers to that provide electron transporting functionality to improve image quality.

Abstract: The present invention describes novel metal complexes with bipolar ligands. Compounds of this type can be employed as functional materials in a number of different applications which can be ascribed to the electronics industry in the broadest sense.

Abstract: A resin microparticle for a toner raw material that has a small particle diameter and a narrow particle diameter distribution and has a low odor is provided. The resin microparticle for a toner raw material has the following requirements (i) to (iii) satisfied: Requirement (i): A particle diameter of 50% volume (D50) satisfies the relationship 0.05 ?m?D50?1 ?m; Requirement (ii): A particle diameter of 10% volume (D10) and a particle diameter of 90% volume (D90) satisfy the relationship D90/D10?7; and Requirement (iii): The content of an organic solvent is not more than 70 ppm.

Abstract: A carrier including a magnetic core material and a layer located on a surface of the magnetic core material, wherein the carrier satisfies the following relationships (1) to (3): 0.90?(?a/?b)<1.00 (1); 200?(?b·?c)?400 (2); 10?(?b/?c)?20 (3), wherein ?b represents a magnetization of the carrier at 1,000 Oe, ?a represents a magnetization of the carrier after frictionized with a cylindrical sleeve under a specific condition and ?c represents a true specific gravity of the carrier, wherein the carrier has a weight-average particle diameter of about 25 to about 65 ?m and includes carrier particles having a weight-average particle diameter not greater than about 12 ?m in an amount of not greater than about 0.3% by weight, wherein a ratio between the weight-average particle diameter and a number-average particle diameter of the carrier is about 1 to about 1.3, and wherein an electric resistance is from about 1.0×109 to about 1.

Abstract: Continuous processes for producing toner compositions are provided utilizing spinning disc reactors, rotating tubular reactors, or combinations thereof.

Abstract: Radiation curable thermal transfer elements including a substrate and a light-to-heat conversion layer overlaying the substrate, and processes to make the thermal transfer elements. The light-to-heat conversion layer is derived from a radiation curable material capable of being cured by exposure to radiation at a curing wavelength and an imaging radiation absorber material not substantially increasing radiation absorbance at the curing wavelength. The radiation curable transfer elements can be used in processes for making organic microelectronic devices.

Abstract: A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.

Abstract: The invention provides a planographic printing plate precursor including a photosensitive layer containing an infrared absorbent, a polymerization initiator, a polymerizable compound, and a binder polymer, and a protective layer containing an inorganic layered compound, formed in this order on a surface of a hydrophilic aluminum support, wherein at least one of the photosensitive layer and the protective layer contains a phosphonium compound.

Abstract: An image-recording material containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having an image-recording layer containing the compound (A), and a lithographic printing method using the lithographic printing plate precursor, are provided.

Abstract: A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate, and a water-soluble film made of a water-soluble material including a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator is formed on the resist film. Thereafter, pattern exposure is carried out by selectively irradiating the resist film with exposing light through the water-soluble film, the resultant resist film is developed and the water-soluble film is removed. Thus, a resist pattern made of the resist film is formed.

Abstract: The present invention relates to a method of producing high contrast optical storage discs. The method comprises usage of so-called liquid embossing technology process steps that turn out to be beneficial for mass-producing fluorescent optical data storage discs. The present invention also relates to a high contrast optical storage disc comprising an information layer that includes a fluorescent dye on a substrate. The information layer comprises a structure of lands and pits and wherein the lands have a thickness of substantially zero; and the pits have a finite thickness. The optical storage disc may well be multi-layered. The present invention also relates to an apparatus suitable for producing high contrast optical fluorescent storage discs.

Abstract: The present invention provides an inorganic composition for use in information recording medium disc substrate and such, having an excellent surface property capable of sufficiently corresponding with a ramp load system for high density recording, a high degree of tolerability to high speed rotation, and high productivity at a low melting point. Specifically, this invention provides an inorganic composition containing one crystalline phase selected from the group consisting of ?-quartz (?-SiO2), lithium disilicate (Li2Si2O5) and lithium monosilicate (Li2SiO3), or that contain at least a crystalline phase of lithium monosilicate (Li2SiO3), in which a mean particle diameter of a particle showing a crystalline phase contained in the inorganic composition is 1 ?m or less, a ring flexural strength is 300 MPa or more, and a surface roughness (an arithmetic mean roughness) thereof after a polishing process is 10 ? or less.

Abstract: A method of manufacturing a semiconductor device using immersion exposure in which exposure is carried out with an immersion exposure liquid interposed between a projection lens and a substrate, includes preparing a photomask on which a plurality of patterns are formed, projecting the patterns formed on the photomask, on a predetermined surface via the projection lens and the immersion exposure liquid, acquiring dimensional information on dimension acquiring patterns based on the patterns projected on the predetermined surface, adjusting a refractive index of the immersion exposure liquid on the basis of the dimensional information, and projecting patterns formed on the photomask, on a substrate via the projection lens and the immersion exposure liquid with the refractive index adjusted.

Abstract: Provided is a method of forming micro-patterns using a multi-photolithography process, including: providing an etch target layer where micro-patterns are to be formed; forming a mask layer on the etch target layer; forming a first mask pattern including engraved portions and embossed portions by etching a predetermined region of the mask layer; forming a final mask pattern in the first mask pattern by etching a predetermined region of the residual embossed portions of the mask layer; and forming micro-patterns by etching the etch target layer using the final mask pattern as an etch mask.

Abstract: A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a photoresist may include a specific chemical structure. The top coating composition may include a solvent and a polymer of having the specific chemical structure. The immersion lithography process includes forming a photoresist layer on a wafer, forming a top coating layer on the photoresist layer, immersing the wafer in water, performing an exposure process on the photoresist layer and forming a photoresist pattern by removing the top coating layer and the photoresist layer with a developer.

Abstract: In a method of manufacturing a semiconductor device, a semiconductor wafer is provided. The wafer has semiconductor chip regions, a scribing line region and a predetermined region. A passivation layer is formed on the wafer. A photoresist film is formed on the passivation layer. A first pattern in a reticle is transferred to a first portion of the photoresist film above the scribing line region. The first pattern is transferred to a second portion of the photoresist film above the predetermined region. The photoresist film is developed. The passivation layer is etched using the photoresist film as a mask. The wafer is diced along the scribing line region to form semiconductor chips and a piece. Each of the semiconductor chips corresponds to each of chip regions. The piece group includes a piece which corresponds to the predetermined region.

Abstract: Methods and systems for defining metal features to be part of a liquid crystal display (LCD) is provided. The method is applied to a glass substrate, and the glass substrate has a blanket conductive metal layer (e.g., a barrier layer) defined on the glass substrate or a layer of the glass substrate. An inverse photoresist mask is applied over the blanket conductive metal layer. A plating meniscus is then formed over the inverse photoresist mask. The plating meniscus contains at least an electrolytic solution and a plating chemistry, where the plating meniscus forms metal features in regions over the blanket conductive metal layer not covered by the inverse photoresist mask.

Abstract: A method of forming an image comprising the steps of: (a) irradiating an silver salt photothermographic material with a laser beam emitted by a scanning exposing device in a laser imager, provided that the scanning exposing device comprises a laser diode, a polygon mirror, and an imaging lens made of a resin; and (b) developing the irradiated silver salt photothermographic material to obtain an image by applying heat, wherein the silver salt photothermographic material comprises a first radiation absorbing compound on a side of the support which is provided with the photosensitive layer, provided that a total absorbance of the first radiation absorbing compound is from 0.3 to 1.00 at an irradiation wavelength; and a second radiation absorbing compound on a side of the support opposite the photosensitive layer, provided that a total absorbance of the second radiation absorbing compound is from 0.20 to 1.50 at an irradiation wavelength.

Abstract: Provided is an image forming method including providing a photothermographic material having image forming layers containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on both surfaces of a support, imagewise exposing the photothermographic material with a fluorescent intensifying screen, and thermally developing the photothermographic material in a thermal developing apparatus having a heating section, wherein the heating section has at least two heating means and a difference between a sensitivity when the photothermographic material is developed at 25° C. and relative humidity of 75% and a sensitivity when the photothermographic material is developed at 25° C. and relative humidity of 20% is 0.20 or less. An image forming method similar to that described above in which the photothermographic material has an antistatic layer is also provided.

Abstract: A photothermographic material having a Dmin and Dmax optical density. The material includes a support having hereon one or more thermally-developable imaging layers which are developable to produce an image when the photothermographic material is thermally processed; and an area disposed along a length of at least one edge of the photothermographic material, wherein the area has an optical density less than the Dmax and greater than the Dmin of the photothermographic material.

Abstract: The present invention provides a silver salt particle of a nitrogen-containing heterocyclic compound having a shape of A or B, and a photothermographic material including at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent, wherein the non-photosensitive organic silver salt is a silver salt particle of a nitrogen-containing heterocyclic compound having the shape of A or B: A) a rectangular particle in which a major axis a, a medium axis b, and a minor axis c of the rectangle satisfy a?b, and a ratio of the medium axis b to the minor axis c (b/c) is from 1.1 to 10; B) a rod-like particle in which a cross section of the rod is circular or elliptic, and a major axis d of the rod and an equivalent circular diameter e of the cross section of the rod satisfy d/e>2.

Abstract: In a method of and system for controlling the air/gas ratio in a lag-lead combustion plant the lead and lag parameters are monitored to provide lead and lag signals representative of the values of the parameters. These are compared to provide an error signal representative of the deviation of the ratio of the lead and lag parameters from a preselected ratio. The lag parameter is then adjusted to reduce the deviation in response to the deviation exceeding a preselected deviation.

Abstract: A fuel system includes a fuel deoxygenator for removing oxygen from a liquid fuel. A vaporizer is in fluid communication with the fuel deoxygenator. The vaporizer vaporizes at least a portion of the liquid fuel to produce vaporized fuel. At least a portion of the vaporized fuel pre-mixes with oxidizer to reduce formation of undesirable emissions.

Abstract: A method of reducing a modified Wobbe index of a fuel stream fed to diffusion combustors of a gas turbine that is used in connection with an IGCC installation in which a nitrogen stream is fed into the head ends of the combustor of NOx control and the modified Wobbe index of the fuel stream has been increased in an amount that is greater than at least about 10 percent of a design Wobbe index for the fuel to be fed to the gas turbine. The reason for the increase is the conversion of the carbon monoxide within the fuel stream to hydrogen and carbon dioxide by a water gas shift reaction and subsequent removal of the carbon dioxide. The nitrogen stream is maintained at the same level both with and without conversion and subsequent removal of carbon atoms. The nitrogen stream is divided to subsidiary streams that are respectively fed into the head end of the combustors and that are mixed with a fuel to lower the modified Wobbe index to acceptable levels for the gas turbine.

Abstract: The aim of the invention is to provide a reliable and efficient operation of a dental furnace (1) for producing compacted ceramics, comprising a hood-shaped firing chamber (3), into which a muffle (5) can be inserted and which is closed during operation by a bottom plate (4), and a pneumatic cylinder (10) whose working pressure can be adjusted by a pressure reducer is mounted on the firing chamber (3). To this end, the invention provides that at least two pressure reducers (9a, 9b) are each provided with a different working pressure or the pressure reducer is provided in the form of a proportional pressure regulator with electronically controllable different working pressures. The pressure reducers (9a, 9b, . . . ) or the proportional pressure regulator are/is coupled to a program unit, particularly to a memory card, inside of which different heating and/or compacting processes are stored.

Abstract: A torch includes a can. A valve is movably installed on the can between a closed position and an open position. A controlling device is movably installed on the can between a releasing position for leaving the valve in the closed position and a lifting position for lifting the valve to the open position. A mount covers the valve so that the fuel can reach the mount from the valve. A nozzle is installed on the mount so that the fuel can reach the nozzle from the mount. An igniter is installed on the can. A switch is installed on the controlling device so that the controlling device and the igniter can only be pushed through the switch after the switch is turned relative to the controlling device.

Abstract: A flame retainer for an inshot burner has a plurality of secondary openings that take full advantage of the space available to limit their size in one dimension to prevent flashbacks but are sufficient in size to allow for the flow of sufficient primary air so as to prevent yellow tipping and soot formation. The slots are elongated in radially cross-sectional shape, and their widths are limited to a dimension of 0.13 inches. The width is also limited to dimensions equal to or greater than 0.09 inches so as to prevent the formation of soot.

Abstract: The present invention comprises a device which utilizes catalytic microcombustion for the production of heat or power and which exhibits a low pressure drop and has a high catalytic surface area. The catalytic microcombustor includes catalyst inserts in the reaction chamber separated by a sub millimeter distance. Thermal spreaders ensure temperature uniformity and maximum thermal efficiency. A mixing zone is prior to the combustion zone. Thermally conductive and/or insulating inserts are in the vicinity of the reaction zone.

Abstract: A method for controlling a heating apparatus whereby the heating apparatus is started up effectively with limited power consumption. A heating priority is determined by multiplying the temperature deviation in each zone by a heat capacity coefficient specific for each zone. The heating priority of each zone is determined alternatively by multiplying an adjacency temperature deviation between adjacent zones by an adjacency coefficient that is set based on the adjacency relationship. The order of zones from the highest to lowest heating priorities is determined, and a plurality of zones are combined in such a manner as to include ones having, respectively, the highest and lowest heating priorities to prepare a group. Similarly, other plurality of zones are combined to prepare groups repeatedly. The power consumption of heaters is limited in each of these groups.

Abstract: In a method of charging fine-grained metals, in particular directly reduced iron (DRI), into an electric-arc furnace (1), the metal is supplied via a downpipe (12) to an opening (10) provided in the furnace roof (4), is introduced into the furnace (1) through this opening (10) as bulk material stream (11), and falls onto the melt (13) merely by gravity. Further, an electric-arc furnace (1) suited for this purpose is described. A rather loss-free introduction even of fine-grained material having a mean grain size of less than 1 mm is achieved by passing the bulk material stream (11) through a dosing orifice (8) after the downpipe (12) and before entering the furnace (1). The bulk material stream (11) then enters the furnace essentially undisturbed.

Abstract: A wafer holder less susceptible to deformation even under high load and having high heat-insulating effect and hence capable of improving positional accuracy, improving thermal uniformity and rapid heating and cooling of chips, as well as a heater unit including the wafer holder and a wafer prober including the heater unit are provided. The wafer holder includes a chuck top having a chuck top conductive layer on its surface and a supporter supporting the chuck top, and has a support member in a space between the chuck top and the supporter. Preferably, the support member is arranged concentric with the supporter or approximately at the center of the supporter, and more preferably, support members arranged concentrically and arranged at the center are both provided.

Abstract: A vertical wafer boat for supporting at least one semiconductor wafer, formed by a process includes forming a plurality of angled support grooves into a plurality of support members with a groove-making machine. Each support member extends along a longitudinal axis and each of the support grooves is spaced apart from one another and extend generally obliquely into the respective support member with respect to the longitudinal axis. The groove-making machine is positioned at a nonperpendicular angle with respect to the longitudinal axis, and thus defines an angled tooth between adjoining support grooves to support at least one wafer, and each support groove includes top and bottom corners inside a base portion that are generally supplementary with respect to each other. Top and bottom portions of the plurality of members are joined to top and bottom end plates that oppose each other respectively, to form the wafer boat.

Abstract: The invention relates to a self-ligating-type orthodontic bracket comprising a closure system that combines a U-shaped clip system with guided rigid systems. The inventive bracket comprises two assembled pieces, namely: a first piece, known as the body, which contains the basic elements of any bracket, such as means for fixing or cementing same to the tooth, the arch groove in the mesial-distal direction, flanges for standard wire ligatures or elastomers and novel lateral grooves forming guides on which runners can slide, said runners belonging to the second piece of the bracket, known as the closure element, which essentially comprises the cover, the closure body and said lateral runners.

Abstract: A device for oral care in showers and baths has a water issuing member, a structure forming a throughoing passage connectable to a water source and supplying water to the water issuing member, a structure for regulating a parameter of the water supplied through the throughgoing passage to the water issuing element to allow a flow of water or to interrupt the flow of water, means forming a chamber fillable with a medium to be introduced into water, and a connecting element for connecting the throughgoing passage to the water source through a hose, so that water flows by a self-flow from the water source without pump, intermediate vessels and the like through the hose and then through the throughgoinog passage to issue from the water issuing member.

Abstract: A spray element of an irrigator includes a support shank and a sleeve. The support shank has a hollow channel and an end wall having an inside formed with at least two water outlet holes and an outside formed with a gathering portion and at least two trenches each connected to a respective one of the water outlet holes and the gathering portion. The sleeve has an end wall rested on the end wall of the support shank and formed with a nozzle connected to the gathering portion. When the fluid flowing in each of the trenches impacts mutually, the fine spray is generated and ejected outwardly from the nozzle of the sleeve.

Abstract: The drilling instrument (10), for cleaning and forming of radicular teeth canals, comprises an end section (11), mounted in a chuck and driven by an electric motor, a distal region (12), a central region (13), provided with cutting flutes (16) and a proximal region (14) with a rounded end (15), serving to guide the instrument in the canal. The envelope (20) around the proximal, central and distal regions has a generally inverted cone shape with a vertex angle (F) identical over the whole length thereof. The junction region (17) between the proximal region (14) and the end section (11) has an incipient fracture (18), calibrated such as to break on application of a given driving torque. The instrument eliminates all risk of jamming and hence breakage in the radicular canal.