Abstract: An infrared sensor includes an infrared generator for generating infrared radiation within a detecting area, a pyroelectric sensor, a microprocessor, and an integrated detecting processor. The pyroelectric sensor is electrically communicated with the infrared generator, wherein the infrared radiation as an input signal is converted into a DC signal as an output signal having a real signal with low frequency and a noise signal mixed therewith. The microprocessor includes an A/D converter electrically connected with the pyroelectric sensor, wherein the microprocessor is arranged to receive the DC signal for data processing. The integrated detecting processor, which is electrically connected with the microprocessor, is adapted for stripping out the DC signal from the pyroelectric sensor to control a DC level of the DC signal, such that the real signal is allowed to be accurately processed in the microprocessor without data overflowing.

Abstract: An energy signal detection device includes a pyroelectric sensor sensing an infrared radiation within a detecting area, a microprocessor, and an integrated detecting processor. The infrared radiation as an input signal is converted into a DC signal as an output signal having a real signal with low frequency and a noise signal mixed therewith. The microprocessor includes an ADC converter electrically connected with the pyroelectric sensor, wherein the microprocessor is arranged to receive the DC signal for data processing. The integrated detecting processor is adapted for stripping out the DC signal from the pyroelectric sensor to control a DC level of the DC signal, such that the real signal is allowed to be processed in the microprocessor without data overflowing.

Abstract: A method of producing an infrared sensor includes the steps of preparing a base integrally provided with a first electrode, and a plurality of supporting portions made of a material with low thermal conductivity, on one of principal surfaces of the base, preparing a pyroelectric element which has a second electrode conductively connected to the first electrode on one of principal surfaces of the pyroelectric element, applying a predetermined amount of conductive paste on the first electrode so as to be higher than the supporting portions, and mounting the pyroelectric element on upper surfaces of the supporting portions so that the second electrode comes into contact with the conductive paste, and then curing the conductive paste.

Abstract: An infrared ray sensing element, includes: 1) a semiconductor substrate; 2) an infrared ray receiver disposed above the semiconductor substrate in such a manner as to be isolated from the semiconductor substrate, the infrared ray receiver being configured to receive an infrared ray; and 3) a beam configured to support the infrared ray receiver to the semiconductor substrate and include a thermopile configured to sense a temperature increase of the infrared ray receiver, wherein one of the following has a cross sectional shape that includes at least one protruding part: i) the beam, and ii) the thermopile.

Abstract: Correlation spectroscopy measure is improved by correcting for cross interference. This is achieved through applying different gains to the output signals whereby the effect of background interferent species can be calculated and an automatic correction factor applied.

Abstract: A portal for security screening of transport passengers includes a THz trans-receiver. In one example of the portal, the trans-receiver includes a small-spot, reflective scanning arrangement including a single detector in a heterodyne receiver configuration. In another example, the trans-receiver includes a large-beam reflective scanning arrangement with the trans-receiver in a synthetic aperture radar (SAR) configuration.

Abstract: A method for detecting the presence of a target material comprising a source of a beam of terahertz radiation comprising illuminating a suspected subject with THz radiation having been determined to provide sufficiently clustered PCA classification to distinguish the target materials from non-target materials. The method further provides for determining the PCA classification for target materials as being sufficiently clustered and differently placed in n-space coordinates as to permit differentiating target materials from non-target materials. Then the weighting factors along with the n-spaced coordinates can be used for subjects under interrogation.

Abstract: A fire detector and method for generating an alarm signal in response to a fire uses an NDIR CO2 sensor to generate a detector signal based upon a 15? absorption band of CO2 and generates an alarm signal when a signal processor receives the detector signal and a preselected criterion is met that is indicative of the onset of a fire based upon an analysis of the detector signal using a detection algorithm that relies upon a trending pattern of the detector signal such as recognizing a substantial drop in the detector signal strength. The NDIR CO2 sensor can also generate a reference detector signal based upon a 9.O? neutral band with a FWHM=0.5? while the signal processor utilizes a detection algorithm that is based upon a synchronized output signal representative of CO2 concentration to generate an alarm signal when a preselected criterion indicative of the onset of a fire is met.

Abstract: A gas sensor array includes a housing having a gas measuring chamber. A detector at least partially arranged in the gas measuring chamber measures radiation and generates an output signal as a function of the measured radiation. The detector is arranged on a main axis of the housing. Radiation sources are at least partially arranged in the gas measuring chamber and direct radiation toward the detector. The radiation sources are arranged symmetrically to the main axis at a first focal point and have the same effective radiation path length to the detector. The gas measuring chamber has at least one concave mirror formed by inner walls of the housing. The inner walls form a rotational member produced by a conical section and are configured to bundle the radiation emitted from the radiation source at a second focal point proximate the detector.

Abstract: A system to monitor the health of a structure, sensor nodes, program product, and associated methods are provided. The system includes an array of health monitoring sensor nodes connected to or embedded within a structure to monitor the health of the structure. The health monitoring sensor nodes include sensor elements positioned to sense parameters of the structure and to provide data related to the parameters to a health monitoring sensor node data collector. The sensor nodes can each include an energy harvester to harvest energy to power the sensor node. The system also includes an energy distributing node positioned to provide energy to the sensor nodes, through the structure being monitored, to be harvested by energy harvester of the sensor nodes.

Abstract: A method and an apparatus are disclosed for processing of detector signals, for example in nuclear-medical imaging. In at least one disclosed embodiment, the signals from N photodetectors are transmitted to a total of approximately M=ld(N) output lines, with the signals from the photodetectors each being weighted with +1 or ?1 for the addition onto an output line.

Abstract: An X-ray apparatus is provided for acquisition of images containing spectral information. An X-ray source and a collimator having multiple slits are operable together with a set of line detectors, the line detectors including linear arrays of photon counting channels. Each of the channels includes a photon conversion channel element which is operable to convert photons to electric pulses. A plurality of pulse counters are operable to count pulses in a plurality of different ranges of pulse strength, where the strength of a pulse depends on the energy of the photon. Further, an arrangement is included for an energy subtracting operation.

Abstract: An x-ray imaging source comprises a radiation source (12) providing x-ray radiation. A substrate comprised of a scintillating material (16) responsive to a level of incident radiation provides output light according to the level of incident radiation. A Fresnel lens (40) is disposed proximate to the substrate for directing the output light toward a second lens. The second lens directs the output light to an image sensor for converting light levels to the digital data, forming an image thereby.

Abstract: X-ray detector system 18 with improved spatial resolution for a computed tomography systems is provided. Detector system 18 may include pairs of first and second detector arrays 50 and 52, with each array containing detector elements of a different design. In one embodiment, the first array 50 may comprise a first, relatively thin and continuous (i.e., monolithic) scintillation layer 70 with an array of individual diodes 74 positioned to receive light generated within the scintillation layer 70. The second array may comprise a second, relatively thick scintillation layer 80 formed of separate scintillator elements 82. An array of diodes 86 may be positioned to receive radiation from the scintillation layer 80 such that each diode element 82 is aligned to primarily receive radiation from one scintillator element 82 in the layer 80. The structural arrangements of the detector system may also be adapted for applications involving direct conversion of x-ray energy.

Abstract: An apparatus for radiographic examination includes a detection unit including a detector configured to detect a gamma ray emitted from a radioactive isotope in an object and to output a detected signal, a first measurement unit configured to determine a first crossing time at which a pulse height of the detected signal becomes substantially equal to a first threshold value, a second measurement unit configured to determine a second crossing time at which the pulse height of the detected signal becomes substantially equal to a second threshold value, and an incidence time calculation unit configured to calculate a starting time of the detected signal based on the first crossing time and the second crossing time and to output detection data; and an information processing unit configured to determine distribution of radioactive isotopes in the object based on multiple sets of said detection data.

Abstract: A radiation image capturing condition correction apparatus for use with a) an image-capturing unit which captures a radiation image of a predetermined imaging subject; and b) a radiation generating unit which generates radiation, said radiation image capturing condition correction apparatus comprising: a measuring unit which measures an amount of physical displacement of said radiation generating unit; and a position correction unit for generating a correction value which is used for correcting a position at which said image-capturing unit captures said radiation image.

Abstract: We provide an x-ray detector having a housing with one or more internal surfaces defining an internal volume. The housing is adapted in use to contain a vacuum within the internal volume. An x-ray sensor is located within the internal volume of the housing. A window, located within the housing, is adapted to permit the passage through the window of x-rays to be detected from the external environment to the sensor. A getter material is applied as a coating to the one or more internal surfaces, for absorbing gaseous species present within the vacuum and for substantially preventing outgassing from the parts of the walls coated by the getter material.

Abstract: In an image detector that includes the following layers arranged on top of another: a charge generation layer that generates charges when exposed to a recording electromagnetic wave representing image information; and a charge detection layer that includes multitudes of detection elements disposed two-dimensionally, each having a switch element and a pixel electrode used for reading out the charges generated in the charge generation layer, a smoothing layer formed by a wet coating process is provided between the charge generation layer and charge detection layer.

Abstract: A composite material and related methods are described, the composite material configured to exhibit at least one of a negative effective permittivity and a negative effective permeability for incident radiation of at least one wavelength. The composite material comprises an arrangement of electromagnetically reactive cells of small dimension relative to the wavelength, each cell having a plurality of quantum dots associated therewith for enhancing a resonant response thereof to the incident radiation at the wavelength.

Abstract: A detector is disclosed for sensing an intensity of an electron beam generated along a path. An exemplary detector includes an exposed conductor attached to a support which is configured to locate the exposed conductor within a path of an electron beam; a grounded conductor isolated from the exposed conductor, the grounded conductor partly surrounding the exposed conductor to form a plasma shield having a window positioned at least in a direction of the electron beam path.

Abstract: The present invention refers to a sensor (10) for sensing an intensity of an electron beam generated by an electron beam generator along a path, the electron beam being exited from the generator through an exit window (24). The invention is characterized in that the sensor (10) comprises a conductor (26) located within the path and exposed to the exit window (24), and an insulating housing (28) for shielding the conductor (26), said housing (28) being engaged with the exit window (24) forming a chamber (30) with said exit window (24), and that the conductor (26) is positioned within said chamber (30). The invention also refers to a system for sensing an intensity of an electron beam.

Abstract: Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.

Abstract: A filament member configured to discharge thermions may be employed in an ion source of an ion implantation apparatus. A filament member may include an anode disposed around a central portion of the filament member, a cathode disposed around a periphery of the filament and/or enclosing the anode, and at least one conductive path disposed between the anode and the cathode to discharge the thermions.

Abstract: A filament member, ion source, and an ion implantation apparatus. The filament member may have a plate shape, and the thermoelectron emitter may include slots and a plurality of conductive paths disposed around the slots to emit thermoelectrons.

Abstract: A MALDI/LDI source includes an ion collection device, e.g., a skimmer, orifice, mass analyzer, ion transfer optics and/or ion guide, configured for use with a short focal length lens with a large aperture. In some embodiments, the ion collection device includes an outer edge that can be disposed approximately parallel to a beam envelope between a lens and a focal point positioned at a MALDI/LDI sample. This configuration of the outer edge allows the ion collection device to be placed in close proximity to the focal point. This placement results in favorable collection efficiencies of laser desorbed analyte from the MALDI/LDI sample.

Abstract: The invention relates to the automatic cleaning of ion sources inside mass spectrometers, especially the cleaning of ion sources where the ions are generated by matrix-assisted laser desorption (MALDI). The invention consists in cleaning the electrodes of the ion source, which are contaminated with organic material, in the mass spectrometer itself by etching with reactive ions produced by an electrically generated gas discharge in a specially admitted reactant gas.

Abstract: An Atmospheric Pressure Chemical Ionisation (“APCI”) ion source is disclosed comprising a housing 14 having a corona discharge chamber 1, a reaction chamber 2 and a passage 6 connecting the corona discharge chamber 1 to the reaction chamber 2. Reagent ions are formed in the corona discharge chamber 1 and pass to the reaction chamber 2 via the passage 6. Analyte is sprayed into a heated tube 3. Low to moderately polar analyte molecules pass from the heated tube 3 into the reaction chamber 2 whereupon the analyte molecules are ionised by interacting with reagent ions. In contrast, highly polar analytes are ionised by thermal ionisation processes within the heated tube 3 and hence highly polar analyte ions pass into the reaction chamber 2. Analyte ions entering the reaction chamber 2 are substantially shielded from the effects of an electric field generated in the corona discharge chamber 1 as part of the process of generating reagent ions.

Abstract: Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.

Abstract: A scanning stage for a scanning probe microscope includes a specimen support that holds an observation specimen and a scanning mechanism that is configured to move the specimen support in X, Y, and Z directions. The specimen support is fixed to the scanning mechanism by wax.

Abstract: The invention provides a fluid UV sterilization system capable of automatically and stably keeping the fluid level, which includes a channel, a UV lamp module group, an electrical controller and a mounting bracket for UV lamp module(s), each UV lamp module comprising a frame and a plurality of UV lamps, the orientation of the frame and the lamps is perpendicular to or forms an angle with the general flow direction in the channel. A baffle is provided on either or both of the upstream and downstream of at least one of the UV lamp module(s), and the bottom of the baffle extends to such an extent towards the bottom of the channel that it at least reaches within the effective radiation distance of the UV lamp module group towards the fluid surface. The fluid UV sterilization system according to the present invention can control the fluid level automatically and stably, and can be used for the sterilization of domestic sewage, industrial sewage, recycled water, tap water and other kinds of water.

Abstract: Methods and apparatus for system identification operate by computing phase and amplitude using linear filters. By digitally processing the linearly filtered signals or data, the phase and amplitude based on measurements of the input and output of a system, are determined.

Abstract: A system and method for fluorescence excitation and detection having distinct optical paths is disclosed. A system for detecting fluorescence comprises a light source that emits an excitation light into an illumination tube; a plurality of collection optics located around an aperture in the illumination tube for collecting fluorescence; and a detector for determining the amount of fluorescence. A method for detecting fluorescence comprises emitting an excitation light from a light source into an illumination tube; directing the excitation light to an excitation filter; illuminating a sample with the excitation light to generate an emission light; and detecting the optical characteristics of the emission light using a plurality of collection optics located around the illumination tube.

Abstract: The invention pertains to a dosimeter using a canister-type irradiator having a void area adapted to contain material to be processed by irradiation and absolute dose distribution indicia which indicia comprises (i) a radiochromic, self-developing, radiation sensitive film enclosed in a radiation transmitting leak proof housing and fixedly mounted in the canister and (ii) an absolute dosage measuring amount of alanine fixedly mounted in a leak proof receptacle on the outer surface of the housing at a location overlaying said film. The invention also relates to an improved canister-type irradiator apparatus and its method of operation.

Abstract: A method of producing a phosphor plate comprising the step of vapor depositing a phosphor raw material on a substrate to form a phosphor layer on the substrate in a vacuum container of a vapor deposition apparatus, wherein the vapor deposition is carried out in an atmosphere of a fluorinated solvent gas having a partial pressure of 5×10?4 to 5×10?1 Pa.

Abstract: An object is to provide that a moisture resistance property is maintained, and reduction of sharpness is further avoided. Disclosed is a scintillator plate possessing a support and provided thereon a phosphor layer, and further a protective film provided on the phosphor layer to protect the phosphor layer, wherein an arithmetical mean slope angle ?a of surface roughness of the protective film is 0.01-0.4.

Abstract: A cassette (1) for a storage phosphor plate (2) comprises a cassette housing (4) with an opening (7) and a support (3) disposed movably within the cassette housing (4), wherein the storage phosphor plate (2) lies on the support (3). In order to simplify the structure of the cassette (1) and of the corresponding removal mechanism, provision is made such that the support (3) can be moved, together with the storage phosphor plate (2) lying on top of it, through the opening (7) of the cassette housing (4), at least partially from the inside of the cassette housing (4), and the storage phosphor plate (2) lying on the support (3) can be taken from the support (3) when the support (3) is located, with the storage phosphor plate (2) lying on top of it, at least partially outside of the cassette housing (4).

Abstract: There is provided a standard component used in an electron beam system for performing length measurement calibration with high precision. A one-dimensional grating is disposed on a bonding wafer to enable high-precision calibration at the same height as that of a real wafer to be measured and calibration among systems. A high secondary electron signal intensity can be obtained by applying a constant voltage to the top silicon layer, thereby a good secondary electron signal image can be obtained with a weak electron beam. By disposing a one-dimensional grating on multiple locations on a wafer, calibration at each location on the wafer with a large diameter can be ensured.

Abstract: A mask blank has a plurality of pattern formation regions in which mask circuit patterns are to be formed, and a supporting region in which any mask circuit pattern is not to be formed. The supporting region is provided for holding the plurality of pattern formation regions while separating the plurality of pattern formation regions from each other. The supporting region has first and second alignment marks. Exposure of a mask made from the mask blank for forming mask circuit patterns thereon is performed on the basis of the first alignment marks, and exposure of a substrate for forming circuit patterns thereon is performed on the basis of the second alignment marks. With this configuration, a mask used for charged particle beam reduction-and-division transfer exposure can be highly accurately produced at a low cost, and exposure of a substrate can be highly accurately performed by using the mask.

Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

Abstract: Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

Abstract: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on

Abstract: After a scan area for observing or processing a mask is set, a computer of the charged particle beam apparatus determines a plurality of scan lines in the scan area by the following steps of: setting a scan line along the outer circumference of the scan area; determining a scan line inside and along the thus set scan line; determining a scan line inside and along the thus determined scan line; and repeating the step of determining a scan line. After the scan lines are determined, the computer controls a scanning circuit to apply an ion beam to the scan lines while thinning out scan lines and/or pixels.

Abstract: An ion beam apparatus comprises an ion source 2 which extracts an ion beam 4, a mass separation electromagnet 6 which separates an ion beam 4 of desired mass from the ion beam 4 extracted from the ion source 2, a scanner 12 which scans the injected ion beam 4 with a given scan center as center within a given scan surface, an electrostatic deflector 30 which deflects the ion beam through 90° so that an ion beam of desired energy in said ion beam travels in a direction perpendicular to said scan surface within a circular-arc-shaped deflection zone centered on the scan center, and a scanning mechanism 54 which retains a target 50 and which mechanically, reciprocally moves the target 54 in a direction in which the target crosses the ion beam passed from the electrostatic deflector 30 at a given angle.

Abstract: An ion implanter is provided with a system for monitoring parameters of the ion implanter in real time to control respective components in the ion implanter. This system is allowed to have a function of calculating an accumulated dose distribution during ion implantation treatment and correcting a mechanical scan speed of a wafer holding section in a Y direction so as to render an accumulated dose uniform, a function of changing a magnetic field of a mass analyzing section to thereby control a center position of an ion beam, and a function of varying a suppression voltage of an aperture and an ion beam current to control a diameter of the ion beam.

Abstract: The present invention relates to a nano tip and a fabrication method of the nano tip that is generally usable in mechanical, physical, and electrical devices for detecting surface signals or chemical signals, or is usable for a source scanning energy beam. The fabrication method of a nano tip according to the present invention includes providing a supporting holder that is fixed at one end thereof to a mechanical or electrical device, bonding a carbon nanotube to the free end of the supporting holder, and modifying the property or the shape of the carbon nanotube by scanning an energy beam thereto. The nano tip, having improved stiffness and perpendicularity, is fabricated by adjusting the length, the diameter, and the shape of the end of the carbon nanotube tip attached with carbon nanotubes by means of the energy beam so that the nano tip may stably and repeatedly reproduce information of a sample and may minimize a deviation between the tips.

Abstract: This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.

Abstract: A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing regi

Abstract: A reference area that contains a straight contour of a workpiece pattern is irradiated with a beam at a fixed interval to form images. The positions of the contour line in the images before and after a certain time of image formation are compared with each other and the amount of displacement between the positions is calculated. When the workpiece is processed, the beam is applied to the process position corrected by the amount of displacement.

Abstract: There is provided a charged beam drawing apparatus which includes main/sub two-stage deflectors, divides a main deflection drawing region on a sample into sub deflection drawing regions determined by the deflection width of the sub deflector, selects one of the sub deflection drawing regions by use of the main deflector and draws shots in the selected sub deflection drawing region by use of the sub deflector. A sub deflection driving unit includes a sub deflection sensitivity correction circuit, a sub deflection astigmatic correction circuit, an adder circuit which adds an output of the sub deflection sensitivity correction circuit and an output of the sub deflection astigmatic correction circuit, and a deflection amplifier which additionally applies an output of the adder circuit to the sub deflector.

Abstract: A computer sets a process area based on an image obtained by observing a mask, and determines the positions of representative points that form a contour of the process area for each pixel with sub-pixel accuracy that is better than a pixel, the position of each of the representative points being able to be set to either the center position of the pixel or a position displaced therefrom. Furthermore, for the pixels within the process area, the computer sets the center positions of the pixels as the representative points and corrects the positions of the representative points of the pixels within the process area on a sub-pixel basis such that nonuniformity between the representative points is reduced.