Patents Issued in May 20, 2008
-
Patent number: 7374845Abstract: A method of forming a color filter layer having a light-scattering effect. First, substrate is provided, and a color filter layer is coated on the substrate. Then, an exposure-and-development process is performed to pattern the color filter layer. Subsequently, the color filter layer is post-baked to render the color filter layer a rough surface to provide the light-scattering effect, wherein the color filter layer has a surface roughness index Rz in the range of 0.5 to 2.0 ?m.Type: GrantFiled: August 29, 2006Date of Patent: May 20, 2008Assignee: HannStar Display Corp.Inventors: Szu-Yu Fang, Chia-Hua Yu, Tean-Sen Jen
-
Patent number: 7374846Abstract: The present invention relates to a non-magnetic monocomponent color toner composition and a method for preparing the same, and more particularly to a non-magnetic monocomponent color toner composition having a narrow charge distribution, good charging characteristics, good environmental independence, superior image characteristics, high transfer efficiency and long-term stability caused by significantly improved charge maintenance capability, and a method for preparing the same. The non-magnetic monocomponent color toner composition of the present invention is prepared by coating organic particles having an average particle size of 0.3 to 2.0 ?m, organic particles having an average particle size of 0.05 to 0.25 ?m, and silica on toner mother particles.Type: GrantFiled: October 21, 2005Date of Patent: May 20, 2008Assignee: LG Chem, Ltd.Inventors: Hyeung-Jin Lee, Tae-Hee Yoon, Joo-Yong Park, Chang-Soon Lee
-
Patent number: 7374847Abstract: A toner for developing an electrostatic image is disclosed. The toner contains an amount of not less than 0.1% by weight of an element selected from elements of the Groups of 1B, 2B, 4B, 5B, 6B, 7B, 8, 3A and 4A of the fourth and fifth periodic of the long periodic table of the elements, and the isolation ratio of the element is not more than 10% by number.Type: GrantFiled: December 12, 2003Date of Patent: May 20, 2008Assignee: Konica CorporationInventors: Tomomi Oshiba, Ken Ohmura, Shigenori Kouno, Hiroshi Yamazaki
-
Patent number: 7374848Abstract: A toner including a binder; a colorant; and a wax, wherein the binder includes a polyester resin; and a reaction product of a polymer having a group capable of reacting with an active hydrogen with a compound having an active hydrogen, wherein the polyester resin includes tetrahydrofuran(THF)-soluble resin components in an amount of from 50 to 85% by weight; and chloroform-insoluble components in an amount of from 0 to 30% by weight, and wherein the toner satisfies the following relationship (1): 5% by weight<(C1-C2)<60% by weight ??(1) wherein C1 represents a content of chloroform-insoluble components in the toner in units of % by weight and C2 represents a content of the colorant therein in units of % by weight.Type: GrantFiled: June 22, 2004Date of Patent: May 20, 2008Assignee: Ricoh Company, LimitedInventors: Sonoh Matsuoka, Ryohta Inoue, Masahiro Ohki, Takeshi Takada, Chiaki Tanaka, Naohiro Watanabe, Masahide Yamada
-
Patent number: 7374849Abstract: A carrier comprised of a core, and thereover a polymer coating containing antimony tin oxide with an average diameter of from about 5 to about 90 nanometers.Type: GrantFiled: January 26, 2005Date of Patent: May 20, 2008Assignee: Xerox CorporationInventors: Vladislav Skorokhod, Maria N V. McDougall, Richard P N. Veregin, Cuong Vong, Jackie B. Parker
-
Patent number: 7374850Abstract: Carrier comprised of a core, a polymer coating, and wherein said coating contains a mixture of an alkali metal lauryl sulfate and a conductive component.Type: GrantFiled: April 29, 2005Date of Patent: May 20, 2008Assignee: Xerox CorporationInventors: Christopher M. Pattison, Thomas C. Dombroski, Deepak R. Maniar
-
Patent number: 7374851Abstract: A toner which includes a toner material, wherein the toner satisfies the following formula: 0° C.??Tm?20° C. where ?Tm represents Tma (° C.)?Tmb (° C.), Tma (° C.) is ½ flown-out temperature of the toner by a capillary type flow tester, and Tmb (° C.) is ½ flown-out temperature of a melt kneaded mixture of the toner by the capillary type flow tester, and wherein Tma is from 130° C. to 200° C.Type: GrantFiled: March 20, 2006Date of Patent: May 20, 2008Assignee: Ricoh Company, Ltd.Inventors: Shinya Nakayama, Satoshi Mochizuki, Yasuaki Iwamoto, Yasuo Asahina, Akihiro Kotsugai, Masayuki Ishii, Osamu Uchinokura, Hisashi Nakajima, Tomoyuki Ichikawa, Tomoko Utsumi, Koichi Sakata, Hideki Sugiura, Shigeru Emoto, Junichi Awamura, Masami Tomita, Takahiro Honda, Shinichiro Yagi, Tomomi Suzuki, Hiroshi Yamada, Toshiki Nanya, Hiroto Higuchi, Fumihiro Sasaki, Naohito Shimota
-
Patent number: 7374852Abstract: A liquid toner composition and a preparation method utilize a colorant, an organosol, a charge control agent, a carrier liquid, a dispersion assistant agent, and a photoreactive catalyst, in which the dispersion assistant agent is a polymer including an unsaturated functional group to cause photopolymerization in a presence of the photoreactive catalyst, and the photoreactive catalyst produces a free radical through an irradiation of light, and initiates the photopolymerization of the dispersion assistant agent. According to embodiments of the present invention, the toner organosol rarely affects the physical properties required of the liquid toner, and an offset error in a fixing operation is removed, resulting in an improved quality of a printed image.Type: GrantFiled: April 25, 2005Date of Patent: May 20, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Kyung-yol Yon, Min-young Cheong, Ki-won Seok, Jung-wook Kim, Hae-ree Joo, Nam-jeong Lee
-
Patent number: 7374853Abstract: Disclosed is a photoreceptor comprising a cylindrical substrate and a photosensitive layer. The substrate wherein the cylindrical substrate has a cylindricity of 5 to 40 ?m, and the photoreceptor satisfies the relation of 0<(PWS/P2)<5.0×10?4 mm?1, wherein PWS is an average value of power spectrum values of regular reflection light amount in a region of a space frequency from 0 to 2 mm?1 measured at the wave length of imagewise exposing light to the photoreceptor, and P is an average value of reflection light at the measuring point of the photoreceptor. An image forming method employing the photoreceptor is also disclosed, which comprises developing a latent image formed on the photoreceptor, with a developer comprising a toner including toner particles having a variation coefficient of shape coefficient of not more than 16%.Type: GrantFiled: December 2, 2004Date of Patent: May 20, 2008Assignee: Konica Minolta Business Technologies, Inc.Inventor: Shigeki Takenouchi
-
Patent number: 7374854Abstract: The present invention provides an image-forming method, including pseudo-halftone-processing an input signal corresponding to image information to generate an output signal; irradiating a radiation beam corresponding to the output signal onto a latent image-holding member to form a latent image; developing the latent image with a developer including a toner containing a binder resin and a colorant to form a toner image on the latent image-holding member; transferring the toner image onto a recording medium; and fixing the toner image on the recording medium to form an image, wherein: when a halftone image is formed as the image, the toner image formed on the latent image-holding member is composed of plural toner aggregates scattered like dots on the latent image-holding member; the diameter of the radiation beam irradiated onto the latent image-holding member is 35 ?m or more; the pseudo-halftone processing results in the toner aggregates, which have been transferred onto the recording medium, having unevenType: GrantFiled: September 16, 2005Date of Patent: May 20, 2008Assignee: Fuji Xerox Co., Ltd.Inventors: Masanobu Ninomiya, Hiroshi Nakazawa, Takao Ishiyama, Toshiyuki Yano
-
Patent number: 7374855Abstract: Methods for texturing the surface of photoreceptors are provided.Type: GrantFiled: May 10, 2005Date of Patent: May 20, 2008Assignee: Xerox CorporationInventors: William H. Wayman, Douglas A. Lundy, John S. Facci, Moritz Wagner, Michael J. Turan, Charles D. Deichmiller
-
Patent number: 7374856Abstract: A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 ?m of film thickness at a wavelength of 400 nm of 95% or more.Type: GrantFiled: November 15, 2005Date of Patent: May 20, 2008Assignee: Toray Industries, Inc.Inventors: Mitsuhito Suwa, Takenori Fujiwara, Masahide Senoo, Hirokazu Iimori
-
Patent number: 7374857Abstract: The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid generator and a resist composition using said compound and a method for pattern formation using said composition, and further relates to a synthetic n intermediate for a bisimide compound and a bis(N-hydroxy)phthalimide compound useful as an intermediate for a functional compound such as a heat resistant polymer or photosensitive material, and provides a bisimide compound shown by the general formula [1]: (wherein R and A1 are as defined in claim 1).Type: GrantFiled: November 28, 2002Date of Patent: May 20, 2008Assignees: Wako Pure Chemical Industries Ltd., Matsushita Electric Industrial Co., Ltd.Inventors: Tsuneaki Maesawa, Fumiyoshi Urano, Masayuki Endo, Masaru Sasago
-
Patent number: 7374858Abstract: A polymerizable composition for the production of a resist includes at least one unsaturated, polymerizable monomer. This monomer has at least one silicon atom and at least one carbonyl group.Type: GrantFiled: July 21, 2003Date of Patent: May 20, 2008Assignee: Qimonda AGInventor: Klaus Elian
-
Patent number: 7374859Abstract: This invention relates to novel processes comprising a protective polymer layer in the fabrication of electronic devices using thick film pastes. The protective polymer layer is fabricated from materials which are insoluble after irradiation in the ester-type solvents contained in the thick film paste. By appropriate selection of protective film polymers, the protective film can be compatible with the thick film paste.Type: GrantFiled: November 14, 2003Date of Patent: May 20, 2008Assignee: E.I. du Pont de Nemours and CompanyInventor: Young H. Kim
-
Patent number: 7374860Abstract: The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, and a pattern forming method using the composition, wherein the positive resist composition is a positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases under the action of an acid, the resin comprising a specific repeating unit; and a pattern forming method using the composition.Type: GrantFiled: March 20, 2006Date of Patent: May 20, 2008Assignee: Fuji Film CorporationInventors: Shuji Hirano, Kazuyoshi Mizutani
-
Patent number: 7374861Abstract: The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The photoresist composition further contains b) monomers having a tertiary amino group and a C?C double bond, which form ionic bonds with the remaining hydroxyl groups of the polyimide. The photoresist composition further contains c) a photoinitiator which is also called photosensitizer. The components a) to c) are all dissolved in a solvent.Type: GrantFiled: March 2, 2006Date of Patent: May 20, 2008Assignee: Industrial Technology Research InstituteInventors: Jyh-Long Jeng, Jeng-Yu Tsai, Charng-Shing Lu, Jinn-Shing King
-
Patent number: 7374862Abstract: A photosensitive resin composition that excels in sensitivity to actinic energy rays (photosensitivity), is hardenable within a short period of time and can form pattern through development with a diluted aqueous alkali solution and that gives a cured film through thermal curing in the postcuring step, the cured film having satisfactory flexibility and being suitable to a solder mask ink of high insulation excelling in adherence and resistances of gold plating, electroless gold plating and tin plating; and a curing product thereof.Type: GrantFiled: March 4, 2004Date of Patent: May 20, 2008Assignee: Nippon Kayaku Kabushiki KaishaInventors: Ryutaro Tanaka, Hiroo Koyanagi
-
Patent number: 7374863Abstract: A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsaturated bond, and a polymerizable composition comprising: (A?) a polyurethane resin having an ethylenically unsaturated bond on a side chain, which is a reaction product of an isocyanate compound and a diol compound including a diol compound represented by the formula (G) defiend herein; (B) a neutrally charged compound capable of generating a radical under light or heat; (C) a compound having an ethylenically unsaturated bond; (D?) a 1,4-benzoquinone derivative; and (E?) a dye having a maximum absorption wavelength in a region of from 350 to 450 nm.Type: GrantFiled: February 1, 2005Date of Patent: May 20, 2008Assignee: FUJIFILM CorporationInventors: Atsushi Sugasaki, Kazuto Kunita
-
Patent number: 7374864Abstract: A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.Type: GrantFiled: February 13, 2004Date of Patent: May 20, 2008Assignee: The Regents of the University of MichiganInventors: Lingjie J. Guo, Xing Cheng
-
Patent number: 7374865Abstract: Method for using chromeless phase shift lithography (CPL) masks to pattern contacts on semiconductor substrates and corresponding CPL masks for performing the method. The method for patterning contacts includes illuminating a CPL mask comprising a reticle having a plurality of phase-shifting features interspersed with non-phase-shifting areas using a short wavelength UV light source, wherein the phase-shifting features are configured in a pattern corresponding to a target pattern of the contacts on the semiconductor substrate. Phase-shifted and non-phase-shifted light passing through the reticle are projected as an aerial image onto a layer of a negative tone resist applied over the semiconductor substrate to pattern the contacts in the resist. The phase-shifting features are recesses which cause light passing therethrough to be phase-shifted by approximately 180° from light passing through non-phase-shifting areas of the mask.Type: GrantFiled: November 25, 2002Date of Patent: May 20, 2008Assignee: Intel CorporationInventors: Paul Nyhus, Sam Sivakumar
-
Patent number: 7374866Abstract: According to one embodiment of the present invention, a method of forming a semiconductor device includes forming a photoresist layer on a surface of a wafer. The wafer includes an array of die that includes a plurality of complete die and at least one partial edge die. The wafer has an edge that has a substantially rounded profile causing undersized patterns in semiconductor devices formed on partial edge die. A first exposure intensity is assigned to a first group of die on the surface of the wafer. The first group of die includes a group of complete die, and the first exposure intensity is assigned based at least in part on the location of the first group of die on the surface of the wafer. A second exposure intensity is assigned to a second group of die on the surface of the wafer. The second group of die includes at least one partial edge die. The second exposure intensity less than the first exposure intensity to compensate for reduced line width due to the wafer edge topography.Type: GrantFiled: October 8, 2004Date of Patent: May 20, 2008Assignee: Texas Instruments IncorporatedInventors: Chris D. Atkinson, Richard L. Guldi, Shangting Detweiler
-
Patent number: 7374867Abstract: Electric fields may be advantageously used in various steps of photolithographic processes. For example, prior to the pre-exposure bake, photoresists that have been spun-on the wafer may be exposed to an electric field to orient aggregates or other components within the unexposed photoresist. By aligning these aggregates or other components with the electric field, line edge roughness may be reduced, for example in connection with 193 nanometer photoresist. Likewise, during exposure, electric fields may be applied through uniquely situated electrodes or using a radio frequency coil. In addition, electric fields may be applied at virtually any point in the photolithography process by depositing a conductive electrode, which is subsequently removed during development. Finally, electric fields may be applied during the developing process to improve line edge roughness.Type: GrantFiled: October 6, 2003Date of Patent: May 20, 2008Assignee: Intel CorporationInventors: Robert Bristol, Heidi Cao, Manish Chandhok, Robert Meagley, Vijayakumar S. Ramachandrarao
-
Patent number: 7374868Abstract: Disclosed are a composition for an organic bottom anti-reflective coating able to improve the uniformity of a photoresist pattern with respect to an ultra-fine pattern formation process among processes for manufacturing semiconductor device, which prevents scattered reflection from the bottom film layer and eliminating the standing wave effect due to alteration of the thickness of the photoresist film itself resulting in increase of uniformity of the photoresist pattern. The composition for organic bottom anti-reflective coating is able to reduce amount of polyvinylphenol by introducing a specific light absorbent agent having an etching velocity higher than of the polyvinylphenol, thus notably improving the etching velocity for the organic anti-reflective coating by about 1.5 times, so that and the present composition prevents over-etching of the photoresist to make it possible to conduct a smooth etching process for a layer to be etched.Type: GrantFiled: August 3, 2004Date of Patent: May 20, 2008Assignee: Hynix Semiconductor Inc.Inventor: Jae-chang Jung
-
Patent number: 7374869Abstract: A lithographic double exposure processing method for providing to a device layer a pattern comprises the steps of expanding each feature of a first mask pattern and second mask pattern with a preselected dilatation distance before the first and second exposure steps, resist-processing the exposed radiation sensitive layer of a substrate to provide resist-processed features corresponding to said pattern whereby each resist-processed feature is expanded with respect to its nominal size, and shrinking said resist-processed features over a preselected shrinking distance by applying supplementary resist-processing to said resist-processed features.Type: GrantFiled: April 23, 2004Date of Patent: May 20, 2008Assignee: ASML Netherlands B.V.Inventors: Carsten Andreas Kohler, Jan Bernard Plechelmus Van Schoot
-
Patent number: 7374870Abstract: Systems and methods treat plasma carrying contaminants and cellular matter that are capable of entraining contaminants. The systems and methods separate cellular matter from the plasma by filtration, thereby removing contaminants entrained within the cellular matter. The system and methods add to the plasma a photoactive material. The systems and methods emit radiation at a selected wavelength into the plasma to activate the photoactive material and thereby eradicate the contaminant that is free of entrainment by cellular matter.Type: GrantFiled: February 11, 2005Date of Patent: May 20, 2008Assignee: Fenwal, Inc.Inventors: Robert E. Herman, John Chapman, Chong-Son Sun, Jean M Mathias, Daniel F. Bischof
-
Patent number: 7374872Abstract: The susceptibility of human macrophages to human immunodeficiency virus (HIV) infection depends on cell surface expression of the human CD4 molecule and CC cytokine receptor 5. CCR5 is a member of the 7-transmembrane segment superfamily of G-protein-coupled cell surface molecules. CCR5 plays an essential role in the membrane fusion step of infection by some HIV isolates. The establishment of stable, nonhuman cell lines and transgenic mammals having cells that coexpress human CD4 and CCR5 provides valuable tools for the continuing research of HIV infection. In addition, antibodies which bind to CCR5, CCR5 variants, and CCR5-binding agents, capable of blocking membrane fusion between HIV and target cells represent potential anti-HIV therapeutics for macrophage-tropic strains of HIV.Type: GrantFiled: November 7, 2006Date of Patent: May 20, 2008Assignee: The United States of America as represented by the Department of Health and Human ServicesInventors: Christophe Combadiere, Philip M. Murphy
-
Patent number: 7374873Abstract: A method for analyzing a substance, comprising: a step of obtaining a dispersion complex by co-existing fine particles having a dispersion property higher than that of lyophobic fine particles in a dispersion phase of the lyophobic fine particles at a concentration sufficient for covering a periphery of a lyophobic fine particle group; a step of contacting the dispersion complex and a fluid containing an analyte; and a step of analyzing the analyte using an optical measuring means, wherein the lyophobic fine particles exist in the dispersion phase in a group for providing the surface enhancing effect. The method is effective for analysis of a slight amount substance or a low concentration substance.Type: GrantFiled: March 12, 2007Date of Patent: May 20, 2008Inventors: Takao Fukuoka, Keitaro Nakamura, Yasushige Mori
-
Patent number: 7374874Abstract: The invention provides bacteriophages that infect Bacillus bacteria, including Bacillus anthracis, and compositions containing the bacteriophages. The invention also provides methods for using the bacteriophages of the invention to prevent and treat infection of an organism by Bacillus bacteria. Methods and materials to decontaminate a surface or an organism that is contaminated with Bacillus bacteria or Bacillus spores is also provided.Type: GrantFiled: April 22, 2003Date of Patent: May 20, 2008Assignee: University of Northern Iowa Research FoundationInventor: Michael H. Walter
-
Patent number: 7374875Abstract: The present invention relates to a family of peptides exhibiting high affinity and specificity for the viral protein gp120, to methods for producing these peptides, and to the use of these peptides.Type: GrantFiled: January 21, 2002Date of Patent: May 20, 2008Assignee: Commissariat a l'Energie AtomiqueInventors: Claudio Vita, Loic Martin, Christian Roumestand, Francisco Veas
-
Patent number: 7374876Abstract: The present invention provides methods for the diagnosis, prognosis and treatment of HCV-related disease. The method takes advantage of a novel reactive mechanism of the murine monoclonal antibody (mAb) 1F7 against human antibodies specific for different proteins of the Hepatitis C Virus (HCV) and Human immunodeficiency virus (HIV). 1F7 recognizes antibodies against HCV core protein in a majority of HCV-infected individuals and antibodies against HCV non-structural proteins 3 (NS3) and NS4 in some HCV-infected individuals. 1F7 also recognizes antibodies against the putative principle neutralizing determinant (hypervariable and conserved region 1 of the HCV E2 protein) of HCV. The antibody can be used in various methods to detect HCV related disease and formulated with physiologically acceptable carriers in various compositions to treat HCV infection.Type: GrantFiled: April 2, 2002Date of Patent: May 20, 2008Assignee: Rapid Medical Diagnostic CorporationInventor: Michael D Grant
-
Patent number: 7374877Abstract: Sequences of nucleic acid oligonucleotides for amplifying different portions of gag and pol genes of HIV-1 and for detecting such amplified nucleic acid sequences are disclosed. Methods of amplifying and detecting HIV-1 nucleic acid in a biological sample using the amplification oligonucleotides specific for gag and pol target sequences are disclosed.Type: GrantFiled: June 3, 2005Date of Patent: May 20, 2008Assignees: Gen-Probe Incorporated, BioMerieux S.A.Inventors: Yeasing Y. Yang, Steven T. Brentano, Odile Babola, Nathalie Tran, Guy Vernet
-
Patent number: 7374878Abstract: The use of sensory G protein-coupled receptors that recognize chemical sensants, parti-cularly those involving olfactory and taste receptors; polypeptide fragments and mutants thereof; classes of such receptors; polynucleotides encoding such receptors, fragments and mutants thereof, and representatives of receptor classes; genetic vectors including such polynucleotides; and cells and non-human organisms engineered to express such receptor complexes, fragments and mutants of an olfactory or taste receptor, and representatives of receptor classes to simulate sensory perception of odorants and tastants is described. The use of such products as a biosensor or a component thereof to detect, identify, measure, or otherwise process the event of binding between the receptor and its cognate ligand (i.e., chemical sensant) is also described. The invention has application, for example, in the design and formulation of odorant and tastant compositions.Type: GrantFiled: June 22, 2001Date of Patent: May 20, 2008Assignee: Senomyx, Inc.Inventors: Lubert Stryer, Sergey Zozulya
-
Patent number: 7374879Abstract: A method for detecting the occurrence of nucleic acid syntheses using an enzyme through the use of a generated insoluble substance as an indicator.Type: GrantFiled: April 25, 2001Date of Patent: May 20, 2008Assignee: Eiken Kagaku Kabushiki KaisyaInventors: Yasuyoshi Mori, Kentaro Nagamine
-
Patent number: 7374880Abstract: The invention provides a method of identifying therapeutic compounds in a genetically defined setting. The method consists of contacting a cell indicative of a pathological condition from a diseased individual and a cell from a genetically related normal individual with a plurality of candidate therapeutic compounds under suitable assay conditions, and identifying a compound that preferentially alters a predetermined property of the cell from the diseased individual.Type: GrantFiled: February 3, 2003Date of Patent: May 20, 2008Inventor: Bernhard O Palsson
-
Patent number: 7374881Abstract: The present invention is related to a novel method of detecting mRNA, based on the fact that the newly synthesized mRNA is confined inside the cell nucleus. According to the novel method cells are captured on a membrane and then treated by a cell membrane permeation solution, thereby increasing permeability of cell membranes. After the cytoplasm is washed away, nuclei are dissolved with a cell dissolving solution, and then mRNA can be successfully recovered from the obtained solution.Type: GrantFiled: October 25, 2001Date of Patent: May 20, 2008Assignees: Hitachi Chemical Research Center, Inc., Hitachi Chemical Co., LtdInventor: Masato Mitsuhashi
-
Patent number: 7374882Abstract: Aptamers are nucleic acids and similar molecules, such as peptide-nucleic acids, that specifically bind to a ligand such as a protein or peptide. The present invention provides aptamers comprising at least one base capable of base pairing and different from the standard Watson-Crick bases. The present invention also relates to a method for preparation of such aptamers and to methods for sequencing nucleic acids that comprise at least one base capable of base pairing and different from the standard Watson-Crick bases.Type: GrantFiled: November 11, 2001Date of Patent: May 20, 2008Assignee: RikenInventor: Yoshihide Hayashizaki
-
Patent number: 7374883Abstract: The instant invention relates to a quantitative real time RT-PCR method for detecting Severe Acute Respiratory Syndrome-associated virus (SARS-associated virus) and to oligonucleotides and kits for detecting SARS-associated virus.Type: GrantFiled: April 30, 2004Date of Patent: May 20, 2008Assignee: QIAGEN Diagnostics GmbHInventor: Thomas Laue
-
Patent number: 7374884Abstract: The present invention relates generally to the field of human genetics. Specifically, the present invention relates to methods and materials used to isolate and detect human diabetes mellitus predisposing gene, specifically the angiotensinogen (AGT) gene, some mutant alleles of which cause susceptibility to insulin-dependent diabetes mellitus (IDDM). More specifically, the invention relates to germline mutations in the AGT gene and their use in the diagnosis of predisposition to diabetes. The invention also relates to the prophylaxis and/or therapy of diabetes associated with a mutation in the AGT gene. The invention further relates to the screening of drugs for diabetes therapy. Finally, the invention relates to the screening of the AGT gene for mutations, which are useful for diagnosing the predisposition to diabetes.Type: GrantFiled: May 13, 2004Date of Patent: May 20, 2008Assignee: Myriad Genetics, Inc.Inventors: Maura McGrail, Deanna L. Russell, Donna M. Shattuck
-
Patent number: 7374885Abstract: The present invention is directed to novel methods of synthesizing multiple copies of a target nucleic acid sequence which are autocatalytic (i.e., able to cycle automatically without the need to modify reaction conditions such as temperature, pH, or ionic strength and using the product of one cycle in the next one). In particular, the present invention discloses a method of nucleic acid amplification which is robust and efficient, while reducing the appearance of side-products. The method uses only one primer, the “priming oligonucleotide,” a promoter oligonucleotide modified to prevent polymerase extension from its 3?-terminus and, optionally, a means for terminating a primer extension reaction, to amplify RNA or DNA molecules in vitro, while reducing or substantially eliminating the formation of side-products. The method of the present invention minimizes or substantially eliminates the emergence of side-products, thus providing a high level of specificity.Type: GrantFiled: August 26, 2005Date of Patent: May 20, 2008Assignee: Gen-Probe IncorporatedInventors: Michael M. Becker, Wai-Chung Lam, Kristin W. Livezey, Steven T. Brentano, Daniel P. Kolk, Astrid R. W. Schroder
-
Patent number: 7374886Abstract: The present invention describes a method for determining whether an individual is suffering from cancer by determining a parameter representing the TIMP-1 concentration in body fluid samples from the individual. The present invention furthermore describes a method for determining whether an individual is suffering from minimal residual disease or recurrent cancer after being treated for the primary cancer by determining a parameter representing the post-operative TIMP-1 concentration in body fluid samples from the individual. In addition, the invention describes the additive effect of combined post-operative measurements of plasma TIMP-1 and serum CEA.Type: GrantFiled: April 8, 2002Date of Patent: May 20, 2008Assignees: Rigshospitalet, Hvidovre HospitalInventors: Mads Nikolaj Holten-Andersen, Ib Jarle Christensen, Nils Brünner, Hans Jørgen Nielsen
-
Patent number: 7374888Abstract: This invention pertains to methods for detecting B. anthracis and antibodies to B. anthracis, the causative agent of anthrax, in a subject.Type: GrantFiled: January 8, 2003Date of Patent: May 20, 2008Assignee: Biosite IncorporatedInventors: Gunars Edwin Valkirs, Kenneth Buechler
-
Patent number: 7374889Abstract: The present invention provides polynucleotides and polypeptides of a human sphingosine-1-phosphate phosphatase, referred to herein as hSPP1. The polynucleotides and polypeptides are used to further provide expression vectors, host cells comprising the vectors, probes and primers, antibodies against the hSPP1 protein and polypeptides thereof, assays for the presence or expression of hSPP1 and assays for the identification of compounds that interact with hSPP1.Type: GrantFiled: February 6, 2002Date of Patent: May 20, 2008Assignee: Merck & Co., Inc.Inventors: Suzanne M. Mandala, Rosemary A. Thornton
-
Patent number: 7374890Abstract: Truncated thyroid hormone receptors ?TR?1 and ?TR?2 have been discovered to play a role in actin-based endocytosis, e.g., in the nervous system. The invention relates to methods of discovering ligands effective in modulating endocytosis and transgenic mice with altered expression of ?TR?1 and ?TR?2. The invention is useful for the discovery and testing of compounds for treating disorders of the nervous system such as depression.Type: GrantFiled: April 12, 2004Date of Patent: May 20, 2008Assignee: University of MassachusettsInventors: Jack L. Leonard, Alan P. Farwell
-
Patent number: 7374891Abstract: Provided are methods to detect of modulators of the Receptor for Advanced Glycated Endproducts (RAGE). The invention comprises a method for detection of RAGE modulators comprising: adsorbing a RAGE ligand onto a solid surface; adding a compound of interest and a protein comprising RAGE or fragment thereof, to the preadsorbed ligand; adding an antibody which binds to RAGE or fragment thereof and a secondary antibody which binds to the anti-RAGE antibody; measuring the secondary antibody bound to the anti-RAGE antibody; and comparing the amount of RAGE bound to the ligand in the presence of varying amounts of the compound of interest. In an embodiment, the fragment of RAGE is sRAGE. In one aspect, the invention use of compounds detected by the method for treatment of AGE-related syndromes including complications associated with diabetes, kidney failure, lupus nephritis or inflammatory lupus nephritis, amyloidoses, Alzheimer's disease, cancer, inflammation, and erectile dysfunction.Type: GrantFiled: December 7, 2004Date of Patent: May 20, 2008Assignee: TransTech Pharma, Inc.Inventor: Manouchehr M. Shahbaz
-
Patent number: 7374892Abstract: Methods and compositions are provided for the diagnosis and treatment of iron overload diseases and iron deficiency diseases.Type: GrantFiled: August 8, 2006Date of Patent: May 20, 2008Assignees: Bio-Rad Laboratories, Inc., California Institute of TechnologyInventors: John N. Feder, Pamela J. Bjorkman, Randall C. Schatzman
-
Patent number: 7374893Abstract: The present invention includes methods for producing magnetic nanocrystals by using a biological molecule that has been modified to possess an amino acid oligomer that is capable of specific binding to a magnetic material.Type: GrantFiled: July 17, 2007Date of Patent: May 20, 2008Assignee: Board of Regents, University of Texas System-Inventors: Angela M. Belcher, Brian D. Reiss, Chuanbin Mao, Daniel J. Solis
-
Patent number: 7374894Abstract: The present provides compounds capable of modulating IL-4 receptor-mediated IgE production, as well as IL 4 induced processes associated therewith, methods and kits for identifying such compounds that utilize a chloride intracellular channel 1 (CLIC1) as a surrogate analyte and methods of using the compounds in a variety of in vitro, in vivo and ex vivo contexts.Type: GrantFiled: July 16, 2002Date of Patent: May 20, 2008Assignee: Rigel Pharmaceuticals, Inc.Inventors: Esteban Masuda, Todd M. Kinsella, Justin E. Warner, Taisei Kinoshita, Mark K. Bennett, David C. Anderson
-
Patent number: 7374895Abstract: A full-length cDNA encoding a human-derived G protein-coupled receptor protein is isolated by screening a human hippocampus library. Also, a rat-derived cDNA corresponding to the human-derived cDNA is isolated. Proteins encoded by these cDNAs have an activity of lowering intracellular cAMP concentration under stimulation with histamine. These proteins are usable as tools in screening ligands thereof or in screening candidate compounds for drugs capable of regulating signal transduction from the above proteins.Type: GrantFiled: June 6, 2006Date of Patent: May 20, 2008Assignee: Banyu Pharmaceutical Co., Ltd.Inventors: Hiraku Itadani, Tetsuo Takimura, Takao Nakamura, Masahiko Kobayashi, Ken-Ichi Tanaka, Yusuke Hidaka, Masataka Ohta
-
Patent number: 7374896Abstract: The present invention provides a nucleic acid molecule which contains a nucleotide sequence encoding a SNAP-25 substrate which includes (i) a green fluorescent protein; (ii) a first partner of an affinity couple; and (iii) a portion of SNAP-25 that includes a BoNT/A, BoNT/C1 or BoNT/E recognition sequence containing a cleavage site, where the cleavage site intervenes between the green fluorescent protein and the first partner of the affinity couple. Further provided herein is a nucleic acid molecule which contains a nucleotide sequence encoding a tagged toxin substrate which includes (i) a fluorescent protein; (ii) a first partner of an affinity couple; and (iii) a clostridial toxin recognition sequence containing a cleavage site, where the cleavage site intervenes between the fluorescent protein and the first partner of the affinity couple.Type: GrantFiled: August 13, 2004Date of Patent: May 20, 2008Assignee: Allergan, Inc.Inventors: Lance E. Steward, Marcella A. Gilmore, Kei R. Aoki