Abstract: This invention relates to photosensitive organometallic compounds which are used in the production of metal deposits. In particular, this invention relates to photosensitive organometallic compounds such as bis-(perfluoropropyl)-1,5-cyclooctadiene platinum (II) (i.e. (C3F7)2PtC8H12) which on exposure to UV radiation and then a reduction process forms a platinum metal deposit such as a substantially continuous thin ‘sheet-like’ film or a substantially narrow line which is capable of electrical conduction.

Abstract: A method for fabricating substrate material to include trenches and unreleased beams with submicron dimensions includes etching a first oxide layer on the substrate to define a first set of voids in the first oxide layer to expose the substrate. A second oxide layer is accreted to the first oxide layer to narrow the first set of voids to become a second set of voids on the substrate. A polysilicon layer is deposited over the second oxide layer, the first oxide layer and the substrate. A third set of voids is etched into the polysilicon layer. Further etching widens the third set of voids to define a fourth set of voids to expose the first oxide layer and the substrate. The first oxide layer and the substrate is deeply etched to define beams and trenches in the substrate.

Abstract: A sulfur-containing detergent composition for cleaning a semiconductor device having an aluminum wire, wherein the sulfur-containing detergent composition is capable of forming a protective film containing a sulfur atom on a surface of an aluminum film in a protective film-forming test; a semiconductor device comprising a protective film containing a sulfur atom on a surface of an aluminum wire, wherein sulfur atom is contained within a region of at least 5 nm in its thickness direction from the surface of the protective film; and method for manufacturing a semiconductor device, comprising the step of contacting an aluminum wire of the semiconductor device with the sulfur-containing detergent composition as defined above, thereby forming a sulfur-containing protective film on the surface of the aluminum wire. The semiconductor device can be suitably used in the manufacture of electronic parts such as LCD, memory and CPU.

Abstract: The invention includes a template comprising one or both of CdS and CdSe adhered to a base in a desired pattern. The base can be any transparent or translucent material, and the desired pattern can include two or more separated segments. The template can be utilized for patterning a plurality of substrates. For instance, the substrates can be provided to have masking layers thereover, and the CdS and/or CdSe can be utilized as catalytic material to sequentially impart patterns in the masking layers. The imparting of the patterns can modify some regions of the masking layers relative to others, and either the modified or unmodified regions can be selectively removed to form patterned masks from the masking layers. Patterns from the patterned masks can then be transferred into the substrates.

Abstract: The disclosure relates to a process including depositing an imprintable layer on a substrate. The imprintable layer is imprinted into the pattern of an imprint-fabricated ribbon. The pattern from the imprintable layer is transferred to the substrate to be used to fabricate the imprint-fabricated ribbon.

Abstract: A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.

Abstract: A method of producing a functional device comprising an electrode layer provided as an upper layer of a layer containing an organic material, the layer being as a functional layer, wherein a step of patterning the electrode layer comprises a high speed etching step of etching the electrode layer at a rate of 10 nm/min or more.

Abstract: A method of fabricating a device using a multi-layered wafer that has an embedded etch mask adapted to map a desired device structure onto an adjacent (poly)silicon layer. Due to the presence of the embedded mask, it becomes possible to delay the etching that forms the mapped structure in the (poly)silicon layer until a relatively late fabrication stage. As a result, flatness of the (poly)silicon layer is preserved for the deposition of any necessary over-layers, which substantially obviates the need for filling the voids created by the structure formation with silicon oxide.

Abstract: A manufacturing method for a semiconductor device, includes: preparing a semiconductor wafer having an active surface, a side surface, a rear surface on the side opposite the active surface, and a plurality of semiconductor elements formed on the active surface; forming the side surface of the semiconductor wafer so that an angle defined by at least a portion of the side surface of the semiconductor wafer and the rear surface of the semiconductor wafer becomes an acute angle; and performing a spin etching in which etching liquid is dripped onto the rear surface of the semiconductor wafer while blowing air toward the active surface of the semiconductor wafer and toward the side surface of the semiconductor wafer and while rotating the semiconductor wafer.

Abstract: A method of removing an ion implanted photoresist comprises performing first cleaning a semiconductor substrate having the ion implanted photoresist using hot deionized water to which a megasonic process is applied, first rinsing the semiconductor substrate using cold deionized water, drying the semiconductor substrate, removing the ion implanted photoresist, and second cleaning the semiconductor wafer using an SPM solution.

Abstract: Electronic apparatus and methods of forming the electronic apparatus include a lanthanum aluminum oxynitride film on a substrate for use in a variety of electronic systems. The lanthanum aluminum oxynitride film may be structured as one or more monolayers. The lanthanum aluminum oxynitride film may be formed by atomic layer deposition.

Abstract: A method and apparatus for preventing N2O from becoming super critical during a high pressure oxidation stage within a high pressure oxidation furnace are disclosed. The method and apparatus utilize a catalyst to catalytically disassociate N2O as it enters the high pressure oxidation furnace. This catalyst is used in an environment of between five atmospheres and 25 atmospheres N2O and a temperature range of 600° C. to 750° C., which are the conditions that lead to the N2O going super critical. By preventing the N2O from becoming super critical, the reaction is controlled that prevents both temperature and pressure spikes. The catalyst can be selected from the group of noble transition metals and their oxides. This group can comprise palladium, platinum, iridium, rhodium, nickel, silver, and gold.

Abstract: Metal oxide nanowires are being investigated to make nanodevices and nanosensors. High operation temperatures or vacuum is required in the manufacturing of metal oxide nanowires by existing vapor phase evaporation methods. This invention provides a method of manufacturing metal oxide nanowires by first providing a metal to form a non-linear substantially planar structure defining a surface. The metal is then heated and maintained at a temperature from 300 to 800° C., and then exposed to oxygen and water vapor containing air stream for a sufficient period of time to form the metal oxide nanowires. The oxygen containing air stream flows in a direction substantially parallel to the plane of the structure. Relatively low temperatures may be used and no vacuum is required in this method, thereby reducing the overall manufacturing costs. Further, this method is able to manufacture different densities of the metal oxide nanowires simultaneously.

Abstract: Provided are methods for manufacturing silicon rich oxide (SRO) layers useful in the fabrication of semiconductor devices, for example, non-volatile memory devices, and methods for fabricating semiconductor devices incorporating such SRO layers. The methods include absorbing a first silicon source gas onto the substrate, oxidizing the first absorbed layer to form a silicon oxide layer, absorbing a second silicon source gas onto the substrate and reducing the second absorbed layer to form a silicon layer. The combination of the silicon oxide layer(s) and the silicon layer(s) comprise, in turn, a composite SRO layer. These manufacturing methods facilitate control of the oxygen concentration in the SRO, the relative thicknesses of the silicon oxide and silicon layers, and provides improved step coverage, thus allowing the manufacturing of high quality semiconductor devices.

Abstract: The invention relates to processes for producing low-k dielectric films on semiconductors or electrical circuits, which comprises using incompletely condensed polyhedral oligomeric silsesquioxanes of the formula [(RaXbSiO1.

Abstract: A method of forming a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (C?H?X?, wherein ? and ? are natural numbers of 5 or more; ? is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C. which is not substituted by a vinyl group or an acetylene group; introducing the vaporized gas and CO2 gas or H2 gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas, thereby reducing extinction coefficient (k) at 193 nm and increasing mechanical hardness.

Abstract: A method for depositing a low dielectric constant film by flowing a oxidizing gas into a processing chamber, flowing an organosilicon compound from a bulk storage container through a digital liquid flow meter at an organosilicon flow rate to a vaporization injection valve, vaporizing the organosilicon compound and flowing the organosilicon compound and a carrier gas into the processing chamber, maintaining the organosilicon flow rate to deposit an initiation layer, flowing a porogen compound from a bulk storage container through a digital liquid flow meter at a porogen flow rate to a vaporization injection valve, vaporizing the porogen compound and flowing the porogen compound and a carrier gas into the processing chamber, increasing the organosilicon flow rate and the porogen flow rate while depositing a transition layer, and maintaining a second organosilicon flow rate and a second porogen flow rate to deposit a porogen containing organosilicate dielectric layer.

Abstract: Various structures having a dielectric film containing Zr—Sn—Ti—O formed by atomic layer deposition using a TiI4 precursor and a method of fabricating structures having such a dielectric film produce the structures with a reliable dielectric layer having an equivalent oxide thickness thinner than attainable using SiO2. Dielectric films containing Zr—Sn—Ti—O formed by atomic layer deposition using TiI4 are thermodynamically stable such that the Zr—Sn—Ti—O will have minimal reactions with a silicon substrate or other structures during processing.

Abstract: A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process, one or more alcohols, and one or more metal-containing precursor compounds.

Abstract: A system for of aligning a mask to a substrate comprising: a fixture for holding the mask and the substrate in fixed positions relative to each other; means for holding the substrate, the means for holding the substrate protruding through openings in a table and the fixture, the means for holding fixedly mounted on a stage, the stage moveable in first and second directions and rotatable about an axis relative to the table; means for affixing the fixture containing the mask and the substrate to the table; means for controlling the means for temporarily affixing so as to generate a uniform force around a perimeter of the fixture to effectuate the temporarily affixing; means for aligning the mask to the substrate, the means for aligning controlling movement of the stage in the first and second directions and rotation about the axis; and means for fastening the fixture together.

Abstract: A non-woven flame retardant barrier can be prepared from low denier, charring fibers and substantially free of polymers made from halogenated monomers. The charring fibers can be modified viscose fibers, for example Visil®. The blend of low denier fibers can be, for example, a blend of 1.5 denier fibers and 3.0 denier fibers.

Abstract: The invention is directed to highly crystalline, frit-sintered glass-ceramic compositions having a coefficient of thermal expansion in the range of 85-115×10?7° C. The primary crystal phases of the glass-ceramics of the invention possess a cyclosilicate structure. The glass-ceramic of the invention are useful as metal-to-metal, metal-to-ceramic and ceramic-to-ceramic sealing agents, and also as high-performance coating for metals and ceramics. In their broadest composition the glass-ceramic contain, in weight percent, 30-55% SiO2, 5-40% CaO, 0-50% BaO, 0.1-10% Al2O3, and 0-40% SrO, wherein the sum of CaO+BaO+SrO is in the range of 35-65 wt. %. Optionally, the glass-ceramic compositions may contain at least one from the group of >0-15 wt. % MgO and >0-10 wt. % ZnO. Also optionally, the glass ceramic compositions may contain >0-10 wt. % of at least one transition metal or rare earth metal oxide.

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., an OH group concentration of at most 600 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.

Abstract: A highly corrosion-resistant SiC material is formed on a base body by a CVD process. The SiC material contains ?-SiC crystals so oriented that the ratio of the sum of peak intensities of x-ray diffraction for (220) and (311) planes of the ?-Sic csystals to the sum of peak intensities of x-ray diffraction for (111), (200), (220), (311) and (222) planes Of the ?-SiC crystals is 0.15 or above. The SiC material may contain both ?-SiC crystals and ?-SiC crystals of 6H structure. A base body with a SiC material by a CVD process is used as an internal component member of a semiconductor device fabricating system.

Abstract: The invention relates to a hydrocracking catalyst containing: a hydrogenative component which is selected from at least one group VIB metal, at least one group VIII metal and combinations of same; at least one matrix comprising at least one oxide which is selected from an amorphous oxide, an oxide with low crystallinity and a mixture of both; and at least one microporous crystalline solid material which, in the calcined and anhydrous state, has molar composition X2O3:nYO2:mZO2, wherein X is a trivalent element, Y is at least one tetravalent element that is different from Ge and Z is Ge, and which, im the calcined and anhydrous state, has an X-ray diffractogram containing at least diffraction lines with d values=13.64, 7.87, 4.82, 4.55, 4.11 and 3.41 ?. The invention also relates to the method of preparing the inventive catalyst and to the use of same in hydrocarbon hydrocracking processses.

Abstract: A metal compound obtained by a process comprising the step of contacting, in a specific ratio, a compound represented by the formula BiL1r, a compound represented by the formula R1s-1TH, and a compound represented by the formula R23-nJ(OH)n; a catalyst component for addition polymerization comprising the metal compound; a catalyst for addition polymerization using the catalyst component; and a process for producing an addition polymer using the catalyst.

Abstract: The present invention relates to a supported, treated catalyst system and its use in a process for polymerizing olefin(s). More particularly, it provides a supported, treated catalyst system produced by a process comprising the steps of: (a) forming a supported bimetallic catalyst system comprising a first catalyst component and a metallocene catalyst compound; and (b) contacting the supported bimetallic catalyst system of (a) with at least one methylalumoxane-activatable compound.

Abstract: This invention relates to the field of olefin polymerization catalyst compositions, and methods for the polymerization and copolymerization of olefins, including polymerization methods using a catalyst composition. One aspect of this invention is the formation and use of a catalyst composition comprising a transition metal compound and an activator for olefin polymerization processes.

Abstract: The instant invention is directed to the preparation of a catalyst composition suitable for the hydroconversion of heavy oils. The catalyst composition is prepared by a series of steps, involving mixing a Group VIB metal oxide particularly molybdenum oxide and aqueous ammonia to form an aqueous mixture, and sulfiding the mixture to form a slurry. The slurry is then promoted with a Group VIII metal. Subsequent steps involve mixing the slurry with a hydrocarbon oil and combining the resulting mixture with hydrogen gas and a second hydrocarbon oil having a lower viscosity than the first oil. An active catalyst composition is thereby formed.

Abstract: A cell structure 10 having a plurality of cells 2 which are partitioned with partition walls 1 to form a honeycomb and which are flow paths of fluid, an outer wall 5 which encloses the cells 2 and a cavity 3 which pierces in the direction of a central axis P of the structure through a portion including the central axis P or a given axis parallel to the central axis P, where the cell structure further has an inner wall 4 on the inner surface of the cavity 3, a method for producing the cell structure, and a catalyst structure. The cell structure having the cavity has an excellent isostatic breaking strength and can exhibit proper sealing function in its cavities. Furthermore, a method for producing the cell structure, the catalyst structure, etc. are provided.

Abstract: The present invention is a method for recovering a catalyst from a catalyst body comprising a carrier having a catalyst layer formed on at least a part of the surface thereof, which comprises (a) a step of forming an overcoat layer on the surface of the catalyst layer, and (b) a step of allowing the catalyst body having the overcoat layer formed thereon to stand under the condition to result in a difference in expansibility or contractility exhibited by the overcoat layer from that exhibited by the carrier, wherein exfoliation of the catalyst layer from the carrier is permitted by means of the resulting difference in expansibility or contractility under the condition.

Abstract: A composition is provided that can be used, for example, in a fuel processor for a fuel cell system. The composition includes a first material such as a catalyst, and a second material such as a desiccant. The second material is capable of sorbing and desorbing a heat transfer material such as water, and is present in an amount sufficient to sorb an amount of the heat transfer material sufficient to remove a portion of the heat generated when the first material undergoes an exothermic reaction.

Abstract: An appliqué and associated method of applying an appliqué an improved sublimated and screen printed image on a substrate of a An improved appliqué suitable for applying a graphic to a material a first printing layer and a second polyurethane layer. The appliqué is cut the graphic imparted thereon and adhered to a garment.

Abstract: The invention relates to novel substituted thiene-3-ylsulphonylamino(thio)carbonyl-triazolin(ethi)ones of the formula (I) in which Q1, Q2, R1, R2, R3 and R4 are as defined in the disclosure, except for prior-art compounds. The invention further relates to the preparation of the compounds, to their use as herbicides, and to herbicidal compositions comprising the novel compounds.

Abstract: The invention concerns an aqueous viscoelastic fluid for use in the recovery of hydrocarbons. According to the invention, the aqueous viscoelastic fluid comprises a monomer, a dimer or an oligomer of a viscoelastic surfactant able to form a viscoelastic gel under downhole conditions, said surfactant comprising a hydrophobic tail and a hydrophilic head, and being of the following formulae: R—X—Y-Z where R is the hydrophobic tail of the surfactant, Z is the hydrophilic head of the surfactant, said hydrophilic head being charged, X is a stabilising group and Y chain is a linear, saturated or unsaturated, hydrocarbon chain of 1, 2 or 3 carbon atoms or a branched, saturated or unsaturated hydrocarbon chain wherein the main chain is of 1, 2 or 3 carbon atoms, possibly incorporating an aromatic ring.

Abstract: A gear fluid composition for extreme pressure applications. The composition includes a base oil component and a friction modifier mixture. The mixture is provided by an alkyl phosphonic acid diester of the formula: wherein R1 is a hydrocarbyl group containing from about 8 to about 24 carbon atoms, R2 and R3 are selected from a hydrocarbyl group containing from about 1 to about 8 carbon atoms, an alkyl phosphonic acid monoester of the formula wherein R4 is a hydrocarbyl group containing from about 8 to about 24 carbon atoms, R5 is hydrogen or hydrocarbyl group containing from about 1 to about 8 carbon atoms, and an amine salt of a partial ester of phosphoric acid represented by the formula wherein each of R6 and R8 is a hydrocarbyl group, and R7 is hydrogen or a hydrocarbyl group, and wherein the ratio of (i) to (ii) ranges from about 3 to about 5.5.

Abstract: Disclosed are stabilized body care products, household products, textiles and fabrics which comprise certain sterically hindered amine salt compounds. Dyed products and articles are effectively stabilized against color degradation. The products are for example skin-care products, hair-care products, dentifrices, cosmetics, laundry detergents and fabric softeners, non-detergent based fabric care products, household cleaners and textile-care products.

Abstract: This invention provides heavy-duty cleansers (HDHC), with a high level of biodegradability and little or no ecotoxicity, with a high level of efficiency and a maximum skin tolerance and no systemic toxicity. In the broadest aspect of the invention there is provided a cleansing formulation comprising 5 to 10% of one or more methylesters of vegetable saturated and/or unsaturated fatty acids which may be from several natural sources including sunflower seed oil, soybean oil, rape seed oil, or coconut oil. The formulation includes between about 10% to 30% of one or more surfactants and a preferred combination of surfactants includes at least one ethoxylated fatty alcohol, one alkyl polyoxyethylene glycol, one alkanolamide and one polymeric quaternary ammonium salt.

Abstract: A solid calcium hypochlorite composition comprising a mixture of: solid calcium hypochlorite; a scale-inhibiting effective amount of a primarily scale-inhibiting alkali metal phosphate; and an effective residue-dispersing amount of primarily residue-dispersing alkali metal phosphate.

Abstract: A cleaner composition which comprises at least one surfactant, at least one builder and at least one nitrogen-containing polymer is described. The nitrogen-containing polymer is, for example, an alkoxylated polyvinylamine, an alkoxylated, acylated or alkylated polyaminoamide or a polyurethane-urea with tertiary amino groups. The nitrogen-containing polymers facilitate soil release.

Abstract: The invention relates to cleaning compositions comprising (a1) a phenolic antioxidant of the formula (1) and/or (2); and/or (a2) an antioxidant of the formula (3); and (b) a surfactant comprising a long alkyl or alkenyl chain. The antioxidants used according to the invention have excellent reactivity, good stability to hydrolysis, particularly in an alkaline medium, and, because of their solubility, can be easily incorporated into the soap formulations.

Abstract: Methods and compositions are provided for protecting or enhancing excitable tissue function in mammals by systemic administration of an erythropoietin receptor activity modulator, such as erythropoietin, which signals via an EPO-activated receptor to modulate the function of excitable tissue. Excitable tissues include central neuronal tissues, such as the brain, peripheral neuronal tissues, retina, and heart tissue. Protection of excitable tissues provides treatment of hypoxia, seizure disorders, neurodegenerative diseases, hypoglycemia, and neurotoxin poisoning. Enhancement of function is useful in learning and memory. The invention is also directed to compositions and methods for facilitating the transport of molecules across endothelial cell tight junction barriers, such as the blood-brain barrier, by association of molecules with an erythropoietin receptor activity modulator, such as an erythropoietin.

Abstract: The present invention is directed to novel ketone and alcohol compounds and the use of these novel compounds in creating fragrances, and scents in items such as perfumes, colognes and personal care products.

Abstract: The invention relates to compounds of formula (I): and their use as targeting vectors that bind to receptors associated with angiogenesis. Such compounds may thus be used for diagnosis or therapy of, for example, malignant diseases, heart diseases, endometriosis, inflammation-related diseases, rheumatoid arthritis and Kaposi's sarcoma.

Abstract: The present invention relates generally to the field of human genetics. Specifically, the present invention relates to methods and materials used to isolate and detect a human depression predisposing gene, specifically the apoptotic protease activating factor 1 (APAF1) gene, some mutant alleles of which cause susceptibility to depression. More specifically, the invention relates to germline mutations in the APAF1 gene and their use in the diagnosis of predisposition to depression. The invention also relates to the prophylaxis and/or therapy of depression associated with a mutation in the APAF1 gene. The invention further relates to the screening of drugs for depression therapy. Finally, the invention relates to the screening of the APAF1 gene for mutations/alterations, which are useful for diagnosing the predisposition to depression.

Abstract: This invention relates to methods of treatment of inflammatory bowel disease, and especially to treatment of this condition with cyclic peptidic and peptidomimetic compounds which have the ability to modulate the activity of G protein-coupled receptors. The compounds preferably act as antagonists of the C5a receptor, and are active against C5a receptors on polymorphonuclear leukocytes and macrophages. Particularly preferred compounds for use in the methods of the invention are disclosed.

Abstract: This invention relates to a method for treating skin damage, comprising the step of administration of a pharmaceutical or dermatological composition of basic milk factors to the area of the skin of a subject in need of such treatment. The invention further relates to a method for cosmetically treating the aged appearance of skin. The skin damage may be the result of normal biological ageing, environmental factors, dermatological disorders, medical treatments, surgical treatments and/or medical conditions. The aged appearance of skin may be attributed to wrinkles, blemishes, sagging, hyperpigmentation, changes to skin thickness and/or a rough appearance. In a preferred embodiment, the subject in need of such treatment requires the enhancement of the youthful appearance of their skin. The invention further relates to compositions for the treated of these conditions.

Abstract: Disclosed herein are improved osteogenic devices and methods of use thereof for repair of bone and cartilage defects. The devices and methods promote accelerated formation of repair tissue with enhanced stability using less osteogenic protein than devices in the art. Defects susceptible to repair with the instant invention include, but are not limited to: critical size defects, non-critical size defects, non-union fractures, fractures, osteochondral defects, subchondral defects, and defects resulting from degenerative diseases such as osteochondritis dessicans.

Abstract: The present invention is directed to peptide analogues of fragment of parathyroid hormone (PTH) or parathyroid hormone-related protein (PTHrP), a method of using said analogues alone or in combination with a bisphosphonate or calcitonin to treat osteoporosis and pharmaceutical compositions comprising said analogues alone or in combination with a bisphosphonate or calcitonin.

Abstract: Provided herein are neuropeptide-2 receptor agonists of the formula (I): Y—R1—R2—X—R3—R4—R5—R6—R7—R8—R9—R10—R11—R12—R13—R14—NH2, ??(I) as well as pharmaceutically acceptable salts, derivatives and fragments thereof, wherein the substituents are as those disclosed in the specification. These compounds, and the pharmaceutical compositions containing them, are useful for the treatment of diseases such as, for example, obesity.