Patents Issued in October 20, 2016
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Publication number: 20160304999Abstract: A method for processing a metal-cast article according to an aspect of the present invention includes a correcting step of starting to pressurize the metal-cast article by a press machine (10, 20) before a temperature of the metal-cast article 40 decreases to 200° C. or lower after casting is finished. Distortion can be accurately removed in a correction of a metal-cast article. Further, since there is no need to heat the metal-cast article again for the correction, the productivity and energy efficiency can be improved.Type: ApplicationFiled: March 31, 2016Publication date: October 20, 2016Applicant: Toyota Jidosha Kabushiki KaishaInventors: Yoshitaka TANAKA, Yusuke YOKOTA, Takashi TOMITA
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Publication number: 20160305000Abstract: The present invention relates to an Al—Mg—Si-based aluminum alloy plate for molding which contains, in mass %, Mg: 0.3-1.3%, Si: 0.5-1.5% and Sn: 0.005-0.2%, the remainder being Al and unavoidable impurities, wherein when the Sn content in the residue compound separated by a hot phenol residue extraction method and having a particle size exceeding 0.1 ?m is subtracted from the Sn content in the aluminum alloy plate, the resulting difference is a 0.005 mass % or greater quantity of Sn. The aluminum alloy plate for molding combines moldability and BH properties after long-term aging at room temperature.Type: ApplicationFiled: December 8, 2014Publication date: October 20, 2016Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)Inventors: Yasuhiro ARUGA, Hisao SHISHIDO, Katsushi MATSUMOTO
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Publication number: 20160305001Abstract: A copper alloy sheet material, having an alloy composition containing at least one of Ni and Co in an amount of 1.80 to 8.00 mass % in total, Si in an amount of 0.40 to 2.00 mass %, and at least one element selected from the group consisting of Sn, Zn, Ag, Mn, P, Mg, Cr, Zr, Fe, and Ti in an amount of 0.000 to 2.000 mass % in total, with the balance being copper and unavoidable impurities, wherein the major axis of the grains in the matrix is 12 ?m or less; and wherein the orientation density of the {110}<001> orientation is 4 or more, and the orientation density of the {110}<112> orientation is 10 or more; a connector using thereof; and a method of producing the copper alloy sheet material.Type: ApplicationFiled: June 24, 2016Publication date: October 20, 2016Applicant: FURUKAWA ELECTRIC CO., LTD.Inventor: Hiroshi KANEKO
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Publication number: 20160305002Abstract: A copper alloy sheet material, having an alloy composition containing at least one of Ni and Co in an amount of 1.80 to 8.00 mass % in total, Si in an amount of 0.40 to 2.00 mass %, and at least one element selected from the group consisting of Sn, Zn, Ag, Mn, P, Mg, Cr, Zr, Fe, and Ti in an amount of 0.000 to 2.000 mass % in total, with the balance being copper and unavoidable impurities, wherein the orientation density of the {121}<111> orientation is 6 or less, and the orientation density of the {110}<001> orientation is 4 or more; and wherein the density of grains having the {110}<001> orientation is 0.40 grains/?m2 or more; a connector using thereof; and a method of producing the copper alloy sheet material.Type: ApplicationFiled: June 24, 2016Publication date: October 20, 2016Applicant: FURUKAWA ELECTRIC CO., LTD.Inventor: Hiroshi KANEKO
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Publication number: 20160305003Abstract: This hot-dip Zn-alloy-plated steel sheet comprises: a steel sheet; a hot-dip Zn-alloy-plated layer arranged on a surface of the steel sheet; and a complex oxide coating film arranged on a surface of the hot-dip Zn-alloy-plated layer. The complex oxide coating film includes vanadium and a constituent component of the hot-dip Zn-alloy-plated layer, and the entire surface of the coating film satisfies the following formula (1): S[Hydroxide]/(S[Hydroxide]+S[Oxide])×100?40. In formula (1): S[Oxide] is the area exhibited by a peak having a center at approximately 1022 eV ascribable to a Zn oxide in an intensity profile in XPS analysis of the surface of the complex oxide coating film; and S[Hydroxide] is the area exhibited by a peak having a center at approximately 1023 eV ascribable to a Zn hydroxide in an intensity profile in XPS analysis of the surface of the complex oxide coating film.Type: ApplicationFiled: November 13, 2014Publication date: October 20, 2016Applicant: Nisshin Steel Co., Ltd.Inventors: Atsuo SHIMIZU, Masanori MATSUNO, Masaya YAMAMOTO, Hirofumi TAKETSU
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Publication number: 20160305004Abstract: Coated substrates and methods of producing the same are provided. In an exemplary embodiment, a method of coating a substrate includes brazing a first bond coat layer to the substrate, where the substrate includes a ceramic material. A second bond coat layer is plasma sprayed overlying the first bond coat layer to form a composite bond coat with the first bond coat layer positioned between the second bond coat layer and the substrate. An environmental barrier coating layer is applied overlying the second bond coat layer such that the first and second bond coat layers are positioned between the substrate and the environmental barrier coating layer.Type: ApplicationFiled: April 20, 2015Publication date: October 20, 2016Applicant: HONEYWELL INTERNATIONAL INC.Inventors: Don Olson, Reza Oboodi, Natalie Kruk, Bradley Reed Tucker
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Publication number: 20160305005Abstract: In one embodiment, a Metal Injection Molded (MIM) body may have one or more surfaces comprising a zirconium alloy. A method of forming an oxide layer on the zirconium alloy surface(s) of the MIM body may include hot isostatic pressing the MIM body, heat treating the MIM body, machining the MIM body to desired shape dimensions, polishing the surface of the MIM body, and oxidizing the polished surface of the MIM body. In some embodiments, the polishing step may include a first vibratory finishing step; and a second vibratory finishing step.Type: ApplicationFiled: June 28, 2016Publication date: October 20, 2016Inventor: David L. Walker
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Publication number: 20160305006Abstract: A carburizing alloy steel includes 0.1 to 0.35 wt % of carbon (C), 0.1 to 2 wt % of silicon (Si), 0.1 to 1.5 wt % of manganese (Mn), 0.5 to 1.5 wt % of chromium (Cr), 0.2 to 0.5 wt % of molybdenum (Mo), 0.1 to 0.6 wt % of nickel (Ni), more than 0 wt % and less than or equal to 0.07 wt % of niobium (Nb), more than 0 wt % and less than or equal to 0.5 wt % of vanadium (V), more than 0 wt % and less than or equal to 0.5 wt % of titanium (Ti), more than 0 wt % and less than or equal to 0.015 wt % of nitrogen (N), 0.00002 to 0.00005 wt % of boron (B), based on the total weight of the alloy steel, iron (Fe) as a main component.Type: ApplicationFiled: October 26, 2015Publication date: October 20, 2016Inventors: Sung-Chul CHA, Seung-Hyun HONG
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Publication number: 20160305007Abstract: A method of manufacturing a ferrous metal component includes: performing an element removal treatment on a workpiece formed of a ferrous metal material; and performing a surface hardening treatment on the workpiece through a carburizing treatment after the element removal treatment. In this method, the element removal treatment is performed under a condition of a higher temperature and a lower pressure than in the carburizing treatment.Type: ApplicationFiled: December 8, 2014Publication date: October 20, 2016Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Shinichi HIRAMATSU, Koji INAGAKI, Takaaki KANAZAWA
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Publication number: 20160305008Abstract: The present disclosure provides a carbon steel composition for a reduced thermal strain steering rack bar and a method for manufacturing the carbon steel composition. The carbon steel composition for a steering rack bar includes: iron (Fe) as a main component, about 0.39 to 0.43 wt % of carbon (C), approximately 0.15 to 0.35 wt % of silicon (Si), approximately 0.90 to 1.10 wt % of manganese (Mn), approximately 0.02 to 0.04 wt % of niobium (Nb), and approximately 0.10 to 0.15 wt % of vanadium (V). The method for manufacturing a carbon steel composition for a steering rack bar includes: filling and drawing the carbon steel composition; broaching the filled and drawn carbon steel composition; performing nitriding heat-treatment on a surface of the broached carbon steel composition; and inspecting the nitriding heat-treated carbon steel composition.Type: ApplicationFiled: November 19, 2015Publication date: October 20, 2016Applicant: HYUNDAI MOTOR COMPANYInventor: Hyun-Kyu KIM
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Publication number: 20160305009Abstract: An arrangement for the CSS coating of substrates is presented, in which a perforated sheet is arranged between a heated crucible containing a sublimating substance and the substrate to be coated, whereby said perforated sheet has, on the surface facing the crucible and/or the substrate, either a surface structure and/or a coating and/or a covering which increases the thermal emissivity in the direction of the crucible and/or decreases it in the direction of the substrate.Type: ApplicationFiled: April 16, 2015Publication date: October 20, 2016Inventors: Bastian Siepchen, Shou Peng
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Publication number: 20160305010Abstract: An evaporation crucible and an evaporation device are provided. The evaporation crucible includes a crucible body and a plurality of nozzles connected to the crucible body, wherein at least one of the nozzles is provided with a nozzle heating structure at a periphery thereof. The evaporation device includes the above-mentioned evaporation crucible.Type: ApplicationFiled: April 18, 2016Publication date: October 20, 2016Inventors: Fengwei PEI, Ziyi ZHAO
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Publication number: 20160305011Abstract: Method for forming a metallic component surface to achieve lower electrical contact resistance. The method comprises modifying a surface chemical composition and creating a micro-textured surface structure of the metallic component that includes small peaks and/or pits. The small peaks and pits have a round or irregular cross-sectional shape with a diameter between 10 nm and 10 microns, a height/depth between 10 nm and 10 microns, and a distribution density between 0.4 million/cm2 and 5 billion cm2.Type: ApplicationFiled: April 15, 2016Publication date: October 20, 2016Inventors: Conghua WANG, Yong TAO, Lin ZHANG, Gerald A. GONTARZ
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Publication number: 20160305012Abstract: An ion implantation apparatus includes an ion beam directing unit, a substrate support, and a controller. The controller is configured to effect a relative movement between an ion beam passing the ion beam directing unit and the substrate support. A beam track of the ion beam on a substrate mounted on the substrate support includes circles or a spiral.Type: ApplicationFiled: June 22, 2016Publication date: October 20, 2016Inventors: Alexander Breymesser, Stephan Voss, Hans-Joachim Schulze, Werner Schustereder
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Publication number: 20160305013Abstract: Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.Type: ApplicationFiled: June 27, 2016Publication date: October 20, 2016Inventors: Martin A. HILKENE, Roman GOUK, Matthew D. SCOTNEY-CASTLE, Peter I. PORSHNEV
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Publication number: 20160305014Abstract: A process for coating a cylinder or a liner of an internal combustion engine may involve a plasma assisted chemical vapour deposition (PACVD) technique. The process may include placing a component to be coated in a PACVD system; forming a negative pressure within the system in an inert atmosphere including argon, hydrogen, or a mixture thereof; activating a surface of the component at a bias voltage of 300 to 550 Vbias; performing an ionization of the component at a bias voltage of 800 to 1200 Vbias; depositing an adhesive layer having a precursor element on the surface of the component; depositing a transition layer having a gradient content of increasing amorphous carbon and decreasing precursor element; and depositing an upper layer composed of an amorphous carbon with the precursor element.Type: ApplicationFiled: December 1, 2014Publication date: October 20, 2016Inventors: Paulo Jose Da Rocha Mordente, Edney Deschauer Rejowski, Jose Valentim Lima Sarabanda, Robert Richard Field
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Publication number: 20160305015Abstract: In the present embodiment, in the production of a heat-resistant composite material resulting from impregnating a ceramic fiber preform with silicon carbide, a mixed gas containing starting material gas, an additive gas, and a carrier gas is supplied to a substrate having a minute structure such as a preform stored in an electric furnace, silicon carbide is deposited to form a film by means of a chemical vapor deposition method or a chemical vapor infiltration method, and the film formation growth speed and embedding uniformity are controlled by means of the amount of additive gas added to the starting material gas, the starting material gas contains tetramethylsilane, and the additive gas contains a molecule containing chlorine such as methyl chloride or hydrogen chloride. The film formation growth speed and embedding uniformity of the silicon carbide are both achieved.Type: ApplicationFiled: June 28, 2016Publication date: October 20, 2016Applicants: IHI Corporation, The University of TokyoInventors: Takeshi NAKAMURA, Kozue HOTOZUKA, Yasuyuki FUKUSHIMA, Yukihiro SHIMOGAKI, Takeshi MOMOSE, Hidetoshi SUGIURA, Kohei SHIMA, Yuichi FUNATO
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Publication number: 20160305016Abstract: A method for producing patterned metallic coatings, includes an initiator composition having at least one active substance being added to a substrate. A precursor composition including at least one precursor compound for a metallic layer is applied to the initiator composition coating. A metallic layer is then deposited by the active substance. At least one composition is applied as an emulsion in order to obtain a patterning of the resultant metallic layer.Type: ApplicationFiled: December 4, 2014Publication date: October 20, 2016Applicant: Leibniz-Institut für Neue Materialien gemeinnützige GmbHInventors: Peter William de Oliveira, Tobias Dörr, Karsten Moh
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Publication number: 20160305017Abstract: A method of manufacturing a semiconductor device, includes: alternately performing (i) a first step of alternately supplying a first raw material containing a first metal element and a halogen element and a second raw material containing a second metal element and carbon to a substrate by a first predetermined number of times, and (ii) a second step of supplying a nitridation raw material to the substrate, by a second predetermined number of times, wherein alternating the first and second steps forms a metal carbonitride film containing the first metal element having a predetermined thickness on the substrate.Type: ApplicationFiled: June 23, 2016Publication date: October 20, 2016Applicant: HITACHI KOKUSAI ELECTRIC INC.Inventors: Arito OGAWA, Tsuyoshi TAKEDA
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Publication number: 20160305018Abstract: A coated cutting insert for a chipforming material removal operation wherein the coated insert has a substrate and a coating scheme on the substrate. The coating scheme includes a CVD transition coating layer. The coating scheme further includes a CVD multi-layered coating scheme having a plurality of coating sets. Each one of the coating sets has an aluminum oxide coating layer and a nitrogen-containing coating layer.Type: ApplicationFiled: April 20, 2015Publication date: October 20, 2016Inventors: Rodrigo A. Cooper, Zhenyu Liu, Peter R. Leicht, Yixiong Liu
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Publication number: 20160305019Abstract: A vessel for conveying a precursor-containing fluid stream from a precursor material contained within the vessel using a carrier gas. The vessel defines an interior volume segmented into an upper volume and a lower volume, the upper volume being in fluid communication with the lower volume, the lower volume containing substantially all of the precursor material and being separated from the upper volume by a separator. The vessel includes a diffuser tube that extends from an inlet port, through the separator and has a distal end having a plurality of openings formed therein and extends along the bottom interior wall of the vessel.Type: ApplicationFiled: April 8, 2016Publication date: October 20, 2016Applicant: Air Products and Chemicals, Inc.Inventors: Charles Michael Birtcher, Thomas Andrew Steidl, Sergei Vladimirovich Ivanov
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Publication number: 20160305020Abstract: Condensable metal halide materials, such as but not limited to tungsten chloride (WCl6), can be used deposit films metal or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity compositions comprising condensable materials and methods to purify condensable materials. In one aspect, there is provided a composition comprising: tungsten hexachloride which is substantially free of at least one impurity and wherein the tungsten hexachloride comprises at least 90%, preferably 95% and more preferably 99% by weight or greater of a ?-WCl6 and 5% by weight or less of the ?-WCl6 as measured by X-ray diffraction.Type: ApplicationFiled: April 12, 2016Publication date: October 20, 2016Applicant: Air Products and Chemicals, Inc.Inventors: Xiaoxi Wu, Sergei Vladimirovich Ivanov
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Publication number: 20160305021Abstract: A CVD process for depositing a silica coating is provided. The process includes providing a float glass ribbon in a float glass manufacturing process. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger. The gaseous mixture is directed toward and along the float glass ribbon and is reacted over the float glass ribbon to form the silica coating thereon. The silica coating comprises silicon dioxide.Type: ApplicationFiled: June 29, 2016Publication date: October 20, 2016Inventors: Douglas Martin Nelson, Michael Martin Radtke, Steven Edward Phillips
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Publication number: 20160305022Abstract: There is disclosed a substrate processing apparatus which can align a center of a substrate, such as a wafer, with a central axis of a substrate stage with high accuracy. The substrate processing apparatus includes: an eccentricity detector configured to obtain an amount of eccentricity and an eccentricity direction of a center of the substrate, when held on a centering stage, from a central axis of the centering stage; and an aligner configured to perform a centering operation of moving and rotating the centering stage until the center of the substrate on the centering stage is located on a central axis of a processing stage. The aligner is configured to calculate a distance by which the centering stage is to be moved and an angle through which the centering stage is to be rotated, based on an initial relative position of the central axis of the centering stage with respect to the central axis of the processing stage, the amount of eccentricity, and the eccentricity direction.Type: ApplicationFiled: April 11, 2016Publication date: October 20, 2016Applicant: Ebara CorporationInventors: Yu ISHII, Du FONG-JIE, Makoto KASHIWAGI
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Publication number: 20160305023Abstract: A method of manufacturing a semiconductor device includes alternately performing supplying a first process gas containing silicon and a halogen element to a substrate having a surface on which monocrystalline silicon and an insulation film are exposed and supplying a second process gas containing silicon and not containing a halogen element to the substrate, and supplying a third process gas containing silicon to the substrate, whereby a first silicon film is homo-epitaxially grown on the monocrystalline silicon and a second silicon film differing in crystal structure from the first silicon film is grown on the insulation film.Type: ApplicationFiled: June 23, 2016Publication date: October 20, 2016Applicant: HITACHI KOKUSAI ELECTRIC INC.Inventors: Atsushi MORIYA, Naoharu NAKAISO, Yugo ORIHASHI, Kotaro MURAKAMI
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Publication number: 20160305024Abstract: The present invention relates to a copper metal film to be used as a seed layer for electrodeposition for forming a copper interconnect for a semiconductor device, a method for preparing the same, and a method for forming a copper interconnect for a semiconductor device using the copper metal film.Type: ApplicationFiled: June 24, 2016Publication date: October 20, 2016Inventors: Won-Jun Lee, Jae-Min Park
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Publication number: 20160305025Abstract: A method and apparatus for providing an electrically symmetrical ground or return path for electrical current between two electrodes is described. The apparatus includes at least on radio frequency (RF) device coupled to one of the electrodes and between a sidewall and/or a bottom of a processing chamber. The method includes moving one electrode relative to another and realizing a ground return path based on the position of the displaced electrode using one or both of a RF device coupled to a sidewall and the electrode, a RF device coupled to a bottom of the chamber and the electrode, or a combination thereof.Type: ApplicationFiled: June 29, 2016Publication date: October 20, 2016Inventors: Soo Young CHOI, Robin L. TINER, Shinichi KURITA, John M. WHITE, Carl A. SORENSEN, Jeffrey A. KHO, Suhail ANWAR, Makoto INAGAWA, Gaku FURUTA
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Publication number: 20160305026Abstract: Provided is a treatment solution for chromium-free tension coating that can simultaneously achieve excellent moisture absorption resistance and a high iron loss reduction effect obtained by imparting sufficient tension, by using an inexpensive Ti source instead of expensive Ti chelate. The treatment solution for chromium-free tension coating contains: one or more of phosphates of Mg, Ca, Ba, Sr, Zn, Al, and Mn; colloidal silica in an amount of 50 parts by mass to 120 parts by mass per 100 parts by mass of the phosphate in terms of solid content of Ti source in an amount of 30 parts by mass to 50 parts by mass per 100 parts by mass of the phosphate in terms of solid content of TiO2; and H3PO4, and the number of moles of metallic elements in the phosphate and of phosphorus in the treatment solution satisfy: 0.20?[Mg]+[Ca+[Ba]+Sr]+[Zn]+[Mn]+1.5[Al])/[P]?0.45??(1).Type: ApplicationFiled: January 14, 2015Publication date: October 20, 2016Applicant: JFE STEEL CORPORATIONInventors: Takashi TERASHIMA, Makoto WATANABE, Masanori UESAKA, Ryuichi SUEHIRO, Toshito TAKAMIYA
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Publication number: 20160305027Abstract: Flat products may have a core layer comprising a metal material and a coating system that is applied to the core layer. The coating system may comprise a conversion layer with inorganic constituents that enhance adhesion of an outer polymer layer to the core layer. To provide an environmentally-friendly coating system that also offers optimum conditions for adhesion of the outer polymer layer, the coating system may comprise an adhesion promoter component that includes an organosilane and shields the adhesion-promoting inorganic constituents of the conversion layer relative to the surroundings. The present disclosure likewise provides processes for producing the flat products.Type: ApplicationFiled: December 9, 2014Publication date: October 20, 2016Applicants: ThyssenKrupp Steel Europe AG, ThyssenKrupp AGInventors: Matthias Kimpel, Thomas Lostak
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Publication number: 20160305028Abstract: This invention relates to novel corrosion inhibitors which are capable of sequestering metal ions such as calcium and magnesium and are derived in part from renewable carbohydrate feedstocks. The corrosion inhibitors are mixtures containing one or more hydroxycarboxylic acid salts and one or more suitable oxoacid anion salts.Type: ApplicationFiled: June 29, 2016Publication date: October 20, 2016Inventors: Tyler N. Smith, Donald E. Kiely, Kylie Kramer-Presta
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Publication number: 20160305029Abstract: A method for co-processing H2S and CO2 in an electrolyzer includes feeding a first gas stream having H2S to an anode and feeding a second gas stream having CO2 to a cathode. The H2S is split into hydrogen and elemental sulfur. The hydrogen is transferred from the anode to the cathode, and the CO2 is hydrogenated with the transferred hydrogen. A method for producing electricity in a fuel cell includes feeding a first gas stream having H2S and CO to an anode, and feeding a second gas stream having oxygen to a cathode. The H2S and CO forms hydrogen and carbonyl sulfide. The hydrogen is transferred from the anode to the cathode. The transferred hydrogen is oxidized with the oxygen of the second gas stream, and electricity formed from the oxidation is collected.Type: ApplicationFiled: April 16, 2015Publication date: October 20, 2016Applicant: SAUDI ARABIAN OIL COMPANYInventors: Stamatios Souentie, Alberto Lozano Ballesteros, Fritz Simeon
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Publication number: 20160305030Abstract: An apparatus for chlor-alkali electrolysis, comprising a cathode half-cell, an oxygen-consuming electrode arranged therein, a conduit for supply of gaseous oxygen to the cathode half-cell and a conduit for purging the cathode half-cell with inert gas, enables the flexible use of power by a method in which chlorine is produced in the apparatus by chlor-alkali electrolysis, wherein, when power supply is low, the oxygen-consuming electrode is supplied with gaseous oxygen, and oxygen is reduced at the oxygen-consuming electrode at a first cell voltage, and when power supply is high, the oxygen-consuming electrode is not supplied with any oxygen, and hydrogen is generated at the cathode at a second cell voltage which is higher than the first cell voltage.Type: ApplicationFiled: November 28, 2014Publication date: October 20, 2016Applicant: Evonik Degussa GmbHInventors: GEORG MARKOWZ, IMAD MOUSSALLEM, RÜDIGER SCHÜTTE, JÜRGEN ERWIN LANG
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Publication number: 20160305031Abstract: A apparatus includes a first stack having: a porous metallic current collector; a first electrode layer on the porous metallic current collector; a second electrode layer; a first electrolyte layer between the first electrode layer and the second electrode layer; a third electrode layer on the porous metallic current collector, the third electrode layer sandwiching the porous metallic current collector therebetween with the first electrode layer; a fourth electrode layer; and a second electrolyte layer between the third and the fourth electrode layers. A method includes: providing (he apparatus; applying a first electric field between the first electrode layer and the second electrode layer; applying a second electric field between the third and the fourth electrode layers; and introducing nitrogen oxide to the apparatus to be decomposed into nitrogen and oxygen in the apparatus.Type: ApplicationFiled: November 20, 2014Publication date: October 20, 2016Inventors: Shizhong Wang, Qunjian Huang, Hai Yang, Qijia Fu, Andrew Philip Shapiro, Hua Zhang
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Publication number: 20160305032Abstract: Provided are a plating apparatus and a container bath, which have a simpler structure than a conventional system and are capable of improving uniformity of a plating thickness. The plating apparatus includes a plating tank which stores a plating liquid, a cathode member arranged inside the plating tank, a plating object arranged inside the plating tank to face the cathode member, an anode jig which contacts with the plating object, and a space formed between the cathode member and the plating object to be a flow passage to which the plating liquid flows from the plating tank. The plating liquid flows into the space from above relative to the space, and is sucked by a pump from below relative to the space.Type: ApplicationFiled: April 16, 2015Publication date: October 20, 2016Applicants: Yamamoto-MS., Co. LTD., Kiyokawa Plating Industry Co., Ltd.Inventors: Wataru YAMAMOTO, Fumio HARADA, Hajime KIYOKAWA
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Publication number: 20160305033Abstract: The present invention provides a method for producing a coated stainless steel member, comprising: performing Wood's strike nickel plating on a stainless steel substrate, and then performing cationic electrodeposition on a formed Wood's strike nickel plating layer.Type: ApplicationFiled: June 23, 2016Publication date: October 20, 2016Applicant: HONDA MOTOR CO., LTD.Inventors: Mitsutada Kaneta, Yasuhiro Arai, Manabu Inoue, Tsutomu Miyadera
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Publication number: 20160305034Abstract: The present invention relates to a process for producing a marked layer structure comprising: a) providing a product surface or a substrate with an appropriate surface; providing a support; b) contacting the support with a mixture comprising inert particles, in which particles a marking agent is substantially inseparably enclosed; c) electrochemically or chemically coating the support, the inert particles being incorporated into the layer produced by the coating; and also a layer structure obtained in this way and its use for quality control and/or as a wear indicator and/or as a marker.Type: ApplicationFiled: December 8, 2014Publication date: October 20, 2016Inventors: Thomas BAQUE, Jochen MOESSLEIN
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Publication number: 20160305035Abstract: The invention relates to a method for producing a metal chalcogenide thin film electrode, comprising the steps: (a) contacting a metal or metal oxide with an elementary halogen in a non-aqueous solvent, producing a metal halide compound in the solution, (b) applying a negative electric voltage to an electrically conducting or semiconducting substrate which is in contact with the solution from step (a), and (c) during and/or after step (b) contacting the substrate with an elementary chalcogen forming a metal chalcogenide layer on the substrate. The invention also relates to a metal chalcogenide thin film electrode which can be produced by the method and its use as an anode for releasing oxygen during (photo)electrochemical water splitting.Type: ApplicationFiled: December 4, 2014Publication date: October 20, 2016Inventors: Michael LUBLOW, Anna FISCHER, Matthias DRIESS, Thomas SCHEDEL-NIEDRIG, Marcel-Philip LUECKE
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Publication number: 20160305036Abstract: A method of treating a surface of an aluminum busbar includes pre-conditioning the surface of the busbar, anodizing one portion of the surface of the busbar, and plating another portion of the surface of the busbar with at least one metal. A fixture used to secure a busbar for a treatment process is also disclosed.Type: ApplicationFiled: December 3, 2013Publication date: October 20, 2016Inventors: Kristian Silberbauer, Claus Aabjerg Andersen
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Publication number: 20160305037Abstract: A second heat-shielding film 20 produced by anodizing treatment of both surfaces of pure Al foil with an Al purity equal to or larger than 99.0% is disposed on a surface of a first heat-shielding film 12 that is formed by anodizing treatment of a surface of a combustion chamber configuring component 10 formed from an Al alloy (Al purity of less than 99.0%) as a based material. A heat resistant adhesive is poured from between these heat-shielding films, and the heat resistant adhesive is heated and cured (an intermediate layer 22). Since the second heat-shielding film has low surface roughness Ra of an average of approximately 1.0 ?m even in an unpolished state, polishing or the like for the film with an objective of smoothing after bonding of the second heat-shielding film can be omitted. Further, the heat-shielding film structure with a smoothed surface can be provided.Type: ApplicationFiled: April 8, 2016Publication date: October 20, 2016Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Manabu TATENO
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Publication number: 20160305038Abstract: An electroplating apparatus has a vessel for holding electrolyte. A head has a rotor including a contact ring for holding a wafer having a notch. The contact ring includes a perimeter voltage ring having perimeter contact fingers for contacting the wafer around the perimeter of the wafer, except at the notch. The contact ring also has a notch contact segment having one or more notch contact fingers for contacting the wafer at the notch. The perimeter voltage ring is insulated from the notch contact segment. A negative voltage source is connected to the perimeter voltage ring, and a positive voltage source connected to the notch contact segment. The positive voltage applied at the notch reduces the current crowding effect at the notch. The wafer is plated with a film having more uniform thickness.Type: ApplicationFiled: April 14, 2015Publication date: October 20, 2016Inventors: Paul R. McHugh, Gregory J. Wilson
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Publication number: 20160305039Abstract: The invention relates to a transport member for transporting plate-shaped substrates which are to be electrolytically galvanized in a bath, comprising a carrier belt with first contact members fastened thereto which each have a first contact portion that contacts a first side of a substrate under prestress and with electrical conduction in an active position and that is clear of the substrate in an inactive position. The transport member further comprises second contact members which each have a second contact portion that in an active position conductively contacts a second side of the same substrate under prestress and that in an inactive position lies free from said substrate, while the transport member further comprises blocking means for blocking the first contact members and the second contact members in the inactive positions thereof during the electrolytic galvanizing process.Type: ApplicationFiled: June 18, 2014Publication date: October 20, 2016Inventors: Robert KLOOSTERBOER, Marc Henricus Marinus KIVITS
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Publication number: 20160305040Abstract: A method of manufacturing a silicon wafer includes extracting an n-type silicon ingot over an extraction time period from a silicon melt comprising n-type dopants, adding p-type dopants to the silicon melt over at least part of the extraction time period, so as to compensate an n-type doping in the n-type silicon ingot by 20% to 80%, and slicing the silicon ingot.Type: ApplicationFiled: June 22, 2016Publication date: October 20, 2016Inventors: Nico Caspary, Hans-Joachim Schulze
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Publication number: 20160305041Abstract: A preparation method and application of a Na3Ba2(B3O6)2F birefringent crystal, the crystal having a chemical formula of Na3Ba2(B3O6)2F, and belonging to a hexagonal crystal system, the space group being P63/m, and the lattice parameters comprising a=7.3490(6) ?, c=12.6340(2) ?, V=590.93(12) ?3, Z=2; the crystal is used for an infrared/deep ultraviolet waveband, and is an uniaxial negative crystal, ne<no, the transmission range being 175-3,350 nm, the birefringence of 0.090 (3,350 nm)-0.240 (175 nm), and the crystal being grown by employing a melting method or a flux method; the crystal prepared via the method has a short growth cycle, high crystal quality and large crystal size, is easy to grow, cut, polish and store, is stable in the air, and difficult to deliquesce, and can be used for preparation of various polarization beam polarization beam splitter prism and infrared/deep ultraviolet waveband optical communication elements.Type: ApplicationFiled: May 28, 2014Publication date: October 20, 2016Applicant: Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of ScienceInventors: Shilie PAN, Hui ZHANG, Min ZHANG
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Publication number: 20160305042Abstract: A wafer is produced from a compound single crystal ingot having end surface. A separation plane is formed by setting the focal point of a laser beam inside the ingot at a predetermined depth from the end surface. The depth corresponds to the thickness of the wafer to be produced. The laser beam is applied to the end surface to form a modified layer parallel to the end surface and cracks extending from the modified layer, thus forming the separation plane. The ingot has first atoms having a larger atomic weight and second atoms having a smaller atomic weight, and the end surface of the ingot is set as a polar plane where the second atoms are arranged in forming the separation plane. After producing the wafer from the ingot, the first end surface is ground to be flattened.Type: ApplicationFiled: April 14, 2016Publication date: October 20, 2016Inventor: Kazuya Hirata
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Publication number: 20160305043Abstract: Devices and methods for high-throughput manufacture of concentrically layered nanoscale and microscale fibers by electrospinning are disclosed. The devices include a hollow tube having a lengthwise slit through which a core material can flow, and can be configured to permit introduction of sheath material at multiple sites of Taylor cone formation formation.Type: ApplicationFiled: March 3, 2015Publication date: October 20, 2016Inventors: Quynh PHAM, Upma Sharma, John Marini, Xuri Yan, Lee Core
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Publication number: 20160305044Abstract: The invention provides a fiber which is superior in safety, can be conveniently produced, and has organic solvent resistance, as well as a starting material composition for producing the fiber and a biocompatible material containing the fiber. The fiber is produced by spinning a composition containing (A) a condensation product obtained by condensing one or more kinds of a compound represented by the formula (1), and (B) an acid compound: wherein each symbol is as defined herein.Type: ApplicationFiled: December 19, 2014Publication date: October 20, 2016Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takahiro KISHIOKA, Makiko UMEZAKI, Ayako OTANI
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Publication number: 20160305045Abstract: Polylactide fibers are made from a blend of polylactides. One of the polylactides has a ratio of R-lactic and S-lactic units from 8:92 to 92:8. The second polylactide has a ratio of the R-lactic and S-lactic units of ?97:3 or ?3:97. The ratio of the R-lactic units to S-lactic units in the blend is from 7:93 to 25:75 or from 75:25 to 93:7. The polylactide fiber contains at least 5 Joules of polylactide crystallites per gram of polylactide resin in the fiber.Type: ApplicationFiled: June 28, 2016Publication date: October 20, 2016Inventors: Chad Henry Kamann, Robert A. Green
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Publication number: 20160305046Abstract: The lint cleaning system is a modified jet-type lint cleaner that includes a supplemental air control vane. The supplemental air control vane (among other things) segregates discharged foreign materials from incoming supplemental air so that the incoming supplemental air is not contaminated by the discharged materials. The current system also enables a user to more effectively control the volume and the pathway of supplemental air entering the cleaner and thereby optimize the function of the air cleaner.Type: ApplicationFiled: April 17, 2015Publication date: October 20, 2016Inventors: John D. Wanjura, Craig Bednarz, Gregory A. Holt, Mathew G. Pelletier
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Publication number: 20160305047Abstract: Nozzle (1) for manufacturing knotted yarn (11), having a yarn duct (2) in which knots are producible with the aid of air entanglement. The nozzle includes at least one air bore (3) having a longitudinal axis (A), which merges with the yarn duct (2) in a merging opening (4). Air is introducible into the yarn duct (2) through the air bore. The longitudinal axis (A) of the air bore (3) is disposed at an angle of less than 90°, preferably 65-85°, particularly preferably 78° in relation to a conveying direction (B) of the knotted yarn (11). A baffle face (5) is configured on the opposite side of the merging opening (4) of the air bore (3) in the yarn duct (2), so as to be substantially perpendicular in relation to the longitudinal axis (A) of the air bore (3).Type: ApplicationFiled: October 28, 2014Publication date: October 20, 2016Inventor: Patrick BUCHMÜLLER
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Publication number: 20160305048Abstract: A method of preparing a fiber for use in forming a ceramic matrix composite material comprises the steps of removing a polymer coating from an outer surface of glass or ceramic fibers by providing heated and humidified gas across the glass or ceramic fibers for a period of time.Type: ApplicationFiled: January 13, 2015Publication date: October 20, 2016Inventors: Neal Magdefrau, Paul Sheedy, Tania Bhatia Kashyap