Abstract: A lens shift mechanism includes a movable portion configured to support a projection lens and movable in two directions orthogonal to each other in a plane orthogonal to an optical axis; first and second operating units configured to generate drive forces for moving the movable portion in the two directions, respectively, first and second rotating portions to which the drive forces generated by the first and second operating units are transmitted, and a lock mechanism configured to be capable of switching between a locked state in which the two operating units are locked and an unlocked state in which the two rotating portions are rotatable, and the lock mechanism includes first and second locking members configured to lock the first and second rotating portions respectively and a lever mechanism configured to move the two locking members.

Abstract: A projection apparatus for projection in a liquid environment comprises a projection surface adapted to be positioned in the liquid environment and a projector adapted to be positioned in the liquid environment. The projector is adapted to project an image on the projection surface.

Abstract: A projector system using a screen comprised of either a plurality of miniature, reflective, and concave or convex curved surfaces that are arranged in a pattern to create a screen surface for front projection, or a plurality of miniature, transparent, and curved convex or concave lenses that are arranged in a pattern to create a screen surface for rear projection, and a projector system with the pixel capacity to control the color and brightness focused onto many different subsections of each curved surface. Each curved lens or curved mirror surface is small enough so that when viewed from the viewing area, the lit and unlit areas seen within each individual curved surface blend together so that only the average brightness and color of each curved surface can be seen by a viewer.

Abstract: A method of fabricating a color filter array including providing substrate, forming a multilevel structure that is attached to the substrate, etching the multilevel structure to expose first wells in the multilevel structure, filling at least the first wells in the multilevel structure with the first color component, curing the first color component, etching the multilevel structure to expose second wells in the multilevel structure, filling at least the second wells in the multilevel structure with a second color component, and curing the second color component.

Abstract: The present disclosure provides one embodiment of a mask for a lithography exposure process. The mask includes a mask substrate; a first mask material layer patterned to have a first plurality of openings that define a first layer pattern; and a second mask material layer patterned to have a second plurality of openings that define a second layer pattern.

Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.

Abstract: This invention provides a reflective mask blank capable of preventing peeling-off of a multilayer reflective film due to cleaning or the like in a mask manufacturing process or during mask use. The reflective mask blank includes a multilayer reflective film, a protective film, an absorber film, and a resist film formed in this order on a substrate. Assuming that a distance from the center of the substrate to an outer peripheral end of the multilayer reflective film is L(ML), that a distance from the center of the substrate to an outer peripheral end of the protective film is L(Cap), that a distance from the center of the substrate to an outer peripheral end of the absorber film is L(Abs), and that a distance from the center of the substrate to an outer peripheral end of the resist film is L(Res), L(Abs)>L(Res)>L(Cap)?L(ML) and the outer peripheral end of the resist film is located inward of an outer peripheral end of the substrate.

Abstract: A method includes providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle. The pre-OPC layout defines a test cell including a first test cell area having a plurality of first target features having a first pitch and a second test cell area having a plurality of second target features having a second pitch. A post-OPC layout of the portion of the reticle is formed on the basis of the pre-OPC layout. The formation of the post-OPC layout includes performing a rule-based OPC process, wherein a plurality of first reticle features for the first test cell area are provided on the basis of the plurality of first target features, and performing a model-based OPC process, wherein a plurality of second reticle features for the second test cell area are provided on the basis of the plurality of second target features.

Abstract: Provided is a method of manufacturing a mask blank that is improved in cleaning resistance to ozone cleaning or the like, thus capable of preventing degradation of the mask performance due to the cleaning. The method is for manufacturing a mask blank having, on a substrate, a thin film which is formed at its surface with an antireflection layer made of a material containing a transition metal, and carries out a treatment of causing a highly concentrated ozone gas with a concentration of 50 to 100 vol % to act on the antireflection layer to thereby form a surface modified layer comprising a strong oxide film containing an oxide of the transition metal at a surface of the antireflection layer.

Abstract: The imprint apparatus of the present invention molds an uncured resin on a substrate using a mold to form a resin pattern on the substrate. The apparatus includes a measuring device configured to project a light onto the mold, to receive a light scattered by the mold, and to measure the scattered light; and a controller. The controller is configured to store a reference signal, to cause the measuring device to measure the mold to obtain a measurement signal, and to obtain an index indicating a discrepancy between the measurement signal and the reference signal.

Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

Abstract: By a lithographic printing plate precursor including a support having provided thereon an image-recording layer capable of forming an image by supplying at least any of printing ink and dampening water on a printing machine after image exposure to remove an unexposed area thereof, wherein the image-recording layer contains an infrared absorbing agent, a polymerization initiator, a polymerizable compound and a polysaccharide having a sulfonic acid group or a group made by a salt thereof and a plate making method of a lithographic printing plate using the same, a lithographic printing plate precursor which exhibits good development property while maintaining printing durability of a lithographic printing plate after development and a plate making method of a lithographic printing plate using the same can be provided.

Abstract: A heat-sensitive color-developing layer of a heat-sensitive recording medium and a coating liquid for forming the heat-sensitive color-developing layer each contain a leuco dye, a color developing agent and a polyvinyl alcohol resin containing an acetoacetyl group and a sulfonic acid group or a combination of a polyvinyl alcohol resin containing an acetoacetyl group and a polyvinyl alcohol resin containing a sulfonic acid group. Therefore, the heat-sensitive recording medium and the coating liquid for forming the heat-sensitive color-developing layer are excellent in light resistance, and free from unintended color development and discoloration even when exposed to ultraviolet radiation.

Abstract: The present invention provides the onium salt comprises the material represented by the following general formula (0-1), wherein Rf represents a fluorine atom or a trifluoromethyl group; Y represents a cyclic hydrocarbon group having 3 to 30 carbon atoms, the hydrogen atom in the cyclic hydrocarbon group may be substituted by a hetero atom itself or a monovalent hydrocarbon group which may be substituted by a hetero atom(s), and the hetero atom(s) may be interposed into the cyclic structure of the cyclic hydrocarbon group and the monovalent hydrocarbon group; and M+ represents a monovalent cation. There can be provided an onium salt which can improve resolution at the time of forming a pattern and give a pattern with less line edge roughness (LER) when it is used in a chemically amplified positive resist composition.

Abstract: The inventive concepts provide methods of forming a semiconductor device. The method includes forming a neutral layer having a photosensitive property and a reflow property on an anti-reflective coating layer, performing an exposure process and a development process on the neutral layer to form a preliminary neutral pattern at least partially exposing the anti-reflective coating layer, heating the preliminary neutral pattern to form a neutral pattern, forming a block copolymer layer on the neutral pattern, and heating the block copolymer layer to form a block copolymer pattern. The block copolymer pattern includes a first pattern disposed on the anti-reflective coating layer exposed by the neutral pattern, and a second pattern disposed on the neutral pattern and chemically bonded to the first pattern.

Abstract: A method for fabricating a semiconductor device, includes dividing a pattern region of a desired pattern that is to be formed on a semiconductor substrate into a plurality of sub-regions; calculating combination condition including a shape of illumination light for transferring and a mask pattern obtained by correcting a partial pattern in the sub-region of the desired pattern formed on a mask used during transferring for each of the plurality of sub-regions, to make a dimension error of the partial pattern of each of the plurality of sub-regions smaller when transferred to the semiconductor substrate; and forming the desired pattern by making multiple exposures on the semiconductor substrate in such a way that the partial patterns of the sub-regions divided are sequentially transferred by transferring a pattern to the semiconductor substrate using the combination conditions calculated for each of the sub-regions.

Abstract: According to one embodiment, a developing apparatus and method comprises moving a first nozzle from a scan start position to a scan end position, with holding a second nozzle for supplying a rinse solution to be adjacent to the scan start position for the first nozzle, while supplying a developing solution from the first nozzle onto a wafer being rotated; and supplying the rinse solution from the second nozzle onto the wafer being rotated.

Abstract: A method for making patterns on a substrate, includes forming an assembly guide on first and second areas of the substrate, the assembly guide having, compared to a reference surface, openings with an opening ratio in the first area greater than that of the second area; depositing a block copolymer layer on the substrate to entirely fill the assembly guide and form an over-thickness on the reference surface; assembling the block copolymer, resulting in an organised portion of the block copolymer layer inside the openings; thinning uniformly the block copolymer layer, until a thickness corresponding to the organised portion of the block copolymer layer is reached; eliminating one of the phases of the assembled block copolymer, resulting in a plurality of initial patterns extending into the layer of block copolymer; and transferring the initial patterns of the block copolymer layer into the substrate to form the final patterns.

Abstract: A stripping solution for photolithography including hydrofluoric acid, a basic compound represented by general formula (b-1), and water. In the formula, R1b to R5b represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like, and at least one of R1b to R5b represents a hydrogen atom. One of R1b to R4b may bind with R5b to form a ring structure. Y1b and Y2b represent an alkylene group having 1 to 3 carbon atoms, and n is an integer of 0 to 5.

Abstract: An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes, relative to the optical beam path downstream of the mirror arrangement, at least one deflection surface at which a deflection of the optical axis occurs. The at least one deflection surface has refractive power.

Abstract: A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108) and which has an absorber material, the mask structure (109) having a maximum thickness of less than 100 nm, preferably not exceeding a maximum thickness of 30 nm, particularly preferably 20 nm, in particular 10 nm. Also disclosed is an EUV lithography system having such a mask (105) and a method for optimizing the imaging of such a mask (105).

Abstract: A maskless exposure device includes a plurality of exposure heads, each exposure head including a digital micro-mirror device configured to scan an exposure beam to a substrate, the exposure heads being disposed in staggered first and second rows, a plurality of reflecting members disposed on side surfaces of the exposure heads and having reflecting surfaces parallel with each other, a light emitting part configured to light to the reflecting members, and a light receiving part configured to receive light via the reflecting members.

Abstract: The present disclosure provides a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a binary phase mask (BPM) to a lithography system, wherein the BPM includes two phase states and defines an integrated circuit (IC) pattern thereon; setting an illuminator of the lithography system in an illumination mode according to the IC pattern; configuring a pupil filter in the lithography system according to the illumination mode; and performing a lithography exposure process to a target with the BPM and the pupil filter by the lithography system in the illumination mode.

Abstract: An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.

Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Abstract: An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.

Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and ?1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.

Abstract: An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.

Abstract: A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element.

Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern featur

Abstract: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements, and a first type of correction is applied to reduce the influence on the measured intensities, caused by differences in the optical path to and from different positions. A plurality of structures may be imaged simultaneously within the field of view of the optical system, and each corrected for its respective position. The measurements may comprise first and second images of the same target under different modes of illumination and/or imaging, for example in a dark field metrology application.

Abstract: An image forming method satisfies the following Expressions: 0.01<Rmf<0.20??Expression (A1): 0.005<Rmf/Wh<5.000??Expression (B1): 0.002<Rmf/Wl<1.000??Expression (B2): 1.0<Whmax/Whmin<2.5??Expression (C1): 1.0<Wlmax/Wlmin<2.5??Expression (C2): wherein, when a content of the fatty acid metal salt particles with respect to the entire weight of the toner is set as Rmf, an average abrasion rate of the electrophotographic photoreceptor is set as Wh, a maximum abrasion rate of the electrophotographic photoreceptor is set as Whmax, and a minimum abrasion rate of the electrophotographic photoreceptor is set as Whmin, and an average abrasion rate of the electrophotographic photoreceptor is set as Wl, a maximum abrasion rate of the electrophotographic photoreceptor is set as Wlmax, and a minimum abrasion rate of the electrophotographic photoreceptor is set as Wlmin.

Abstract: A photoconductor is used for an image-forming apparatus, and the photoconductor has a surface including irregularities having an arithmetic average roughness of 0.1 ?m or more and 0.5 ?m or less in a cycle length from 867 to 1,654 ?m.

Abstract: A solution of a gallium phthalocyanine contains a compound of formula (1) and a gallium phthalocyanine of formula (2), H2N—CH2—R1—CH2—NH2??(1) wherein R1 represents a single bond, or a substituted or unsubstituted alkylene group having 1 to 10 main-chain carbon atoms, a substituent of the substituted alkylene group is an alkyl group having 1 to 3 carbon atoms, an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, or a hydroxy group, one of the carbon atoms in the main chain of the alkylene group may be replaced with an oxygen atom, a sulfur atom, or a bivalent group represented by the formula —NR2—, and R2 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkyl group having 1 to 3 carbon atoms and being substituted with an amino group, and wherein X1 represents a chlorine atom or hydroxy group.

Abstract: An electrophotographic photosensitive member has an undercoat layer containing a polymerized product of a composition including electron transporting substance having a polymerizable functional group and a crosslinking agent, and resin particles. The content of the electron transporting substance is 30% by mass or more and 70% by mass or less based on the total mass of the composition. Protrusions derived from the resin particles in the undercoat layer are formed at an interface between the undercoat layer and the charge generating layer.

Abstract: In order to provide an electrophotographic photosensitive member with which a ghost is suppressed even under a low temperature and low humidity environment, and a process cartridge and an electrophotographic apparatus having the electrophotographic photosensitive member, the electrophotographic photosensitive member has a support, an undercoat layer formed on the support, and a photosensitive layer formed on the undercoat layer and comprising a charge generating material and a hole transporting material, wherein the undercoat layer comprises a particular amine compound.

Abstract: A continuous coalescence process for preparing a sustainable toner is described which features toner with lowered melt properties and higher toner surface carbon to oxygen (C/O) ratios than previously described sustainable resins coalesced in a batch reactor.

Abstract: An electrostatic charge image developing toner includes a toner particles containing a binder resin and a metallic pigment and aliphatic acid metal salt particles as an external additive in an amount of from 0.1 parts by weight to 2.0 parts by weight with respect to 100 parts by weight of the toner particles, wherein the toner particles have an average circle equivalent diameter D longer than an average C of a maximum thickness of the toner particles.

Abstract: Toner of one aspect of the present invention has a weight average molecular weight Mw of 30,000?Mw?95,263 as determined from a molecular weight distribution based on GPC, includes a THF-insoluble gel component at a weight proportion of less than 5%, and includes components each having a molecular weight of 500 to 1500 which components have an area occupancy of 4% to 10% on a chart of the molecular weight distribution based on GPC.

Abstract: An electrostatic latent image developing toner includes toner particles that each include a toner mother particle. The toner mother particle includes a toner core, a shell layer disposed over a surface of the toner core, and inorganic particles. The inorganic particles are located at an interface between the toner core and the shell layer, or within the shell layer. The shell layer contains a thermosetting component. The toner mother particle has a BET specific surface area of at least 0.95 m2/g.

Abstract: A developer mix formulation having tribocharge uniformity across varying temperature and humidity conditions is provided. A developer mix used in a dual component development (DCD) system is a mixture of toner particles and magnetic carrier particles. Tribocharge uniformity is achieved in the developer mix by using magnetic carrier particles having surface additives on its surface. Surface additives include but are not limited to silica, titania and alumina.

Abstract: A conductive roller in which dripping of a water-based coating during the manufacture thereof is restrained, and a manufacturing method thereof. The conductive roller includes a shaft, at least one elastic layer formed on the outer periphery of the shaft and a surface layer formed on the outer peripheral surface of the elastic layer. The elastic layer is formed by using a coating for elastic layers containing a liquid absorbing agent, and the surface layer is formed by using a coating for surface layers. The method comprises forming an elastic layer by applying a coating for elastic layers containing a liquid absorbing agent on the outer periphery of the shaft and drying to form the elastic layer; and forming a surface layer by, after forming the elastic layer, applying a coating for surface layers on the formed elastic layer and drying to form the surface layer.

Abstract: Voltages are applied to an image bearing member using at least three application voltage values which are larger than a discharge start voltage value and which have different magnitudes, at least one of the application voltage values having a value at which a direction of a current corresponding to the one of the application voltage values is reverse to those of currents corresponding to the other application voltage values. A relation between the application voltage value and the detection current value in a discharge area is calculated based on at least three application voltage values Vd1, Vd2, Vd3 and at least three detection current values Id1, Id2, Id3 detected by a current detection portion in relation to at least three application voltage values Vd1, Vd2, Vd3 and a voltage value V0 at which the detection current value is zero is calculated based on the relation in the discharge area.

Abstract: In the case where development is performed by a two-component developing method, a previous charge removal light-emitting portion applies charge removal light to a first charge removal target region of an effective outer circumferential surface of a photosensitive member on which effective outer circumferential surface an electrostatic latent image can be formed. The first charge removal target region includes a part of a magnetic brush contact region of the effective outer circumferential surface and a region of the effective outer circumferential surface between the magnetic brush contact region and a transfer position of a toner image.

Abstract: An image forming apparatus has an image carrier, a charger, a developing device, a voltage application unit, and a controller. The developing device includes a developing roller. The voltage application unit applies a voltage to the developing roller and to the charger. The controller controls the voltage application unit. The controller controls the voltage application unit such that a developing bias having an AC voltage superposed on a DC voltage is applied to the developing roller and a charging bias including at least a DC voltage and having superposed thereon a compensation AC voltage with an opposite phase to an AC voltage induced in the charger by the developing bias is applied to the charger.

Abstract: In a corona charger including a housing that encloses a discharge electrode and has an open portion on a charging-object side and a shutter that opens and closes the open portion, if discharge products dropped from ends of the shutter adhere to a photosensitive member and absorbs moisture, an image defect called “image deletion” may occur. A charging device includes a corona charger including a discharge electrode and shields provided on two respective sides of the discharge electrode. The corona charger has an open portion on a charging-object side thereof. The open portion is opened and closed by a sheet-type shutter in a longitudinal direction of the charger. The sheet-type shutter is curled in a transverse direction such that a central portion bulges, with respect to two ends, in a thickness direction of the shutter from a front surface that is nearer to the discharge electrode toward a back surface.

Abstract: A system and method to compensate for ghost appearances on a print due to a previous job, the method comprising defining areas in which ghosting is expected or detected and recording the image on a photoreceptor by selectively changing the parameters of the system as a function of position, to compensate for the effects of ghosting in ex-image and ex-nonimage areas.

Abstract: An image forming apparatus comprises: a plurality of exposure units, each of the exposure units including a plurality of light emitting elements that are arranged in a main scanning direction; a calculating unit that, with respect to each of the exposure units, calculates a pre-charge period that is a period during which a pre-charge is performed on at least any of the light emitting elements included in a corresponding exposure unit; and an emission control unit that, with respect to each of the exposure units, causes the light emitting elements included in a corresponding exposure unit to emit light such that a pre-charge period of at least any of the exposure units is shifted with respect to pre-charge periods of remaining ones of the exposure units.

Abstract: An image forming apparatus, including: a polygon mirror; a first optical sensor; a second optical sensor; and a controller configured to (a) determine a second-beam exposure standby time which is a time period from a timing when the first beam deflected by a first surface of the polygon mirror has been detected by the first sensor to a timing when scanning exposure of the second beam deflected by a second surface of the polygon mirror is started, based on a measured time which is a time period from the timing of detection by the first sensor to a timing of detection of the second beam by the second sensor and (b) start the scanning exposure of the second beam deflected by the second surface when the second-beam exposure standby time elapses after the first beam deflected by the first surface has been detected by the first optical sensor.

Abstract: A carrier set for electrostatic charge image developer, includes: a first carrier that satisfies Expression (1); 160 mJ?x?200 mJ, and a second carrier that satisfies Expression (2); 210 mJ?y?250 mJ, wherein x is a total energy amount, which is measured by a powder rheometer, of a developer which is prepared by mixing the first carrier and a toner for measurement such that a weight ratio of the toner is 8% by weight based on the developer, and y is a total energy amount, which is measured by the powder rheometer, of a developer which is prepared by mixing the second carrier and the toner for measurement such that a weight ratio of the toner is 8% by weight based on the developer.