Abstract: An apparatus comprises a dielectric layer formed on a first side of a substrate, a first side interconnect structure comprising a first metal line and a pad formed in the dielectric layer, wherein the pad comprises a bottom portion formed of a first conductive metal and an upper portion formed of a second conductive metal, and wherein sidewalls of the upper portion are surrounded by the bottom portion and a top surface of the pad is coplanar with a top surface of the first metal line and a passivation layer formed over the dielectric layer.

Abstract: A bump-equipped electronic component includes a circuit substrate and first and second bumps which are disposed on a principal surface of the circuit substrate and have different cross-sectional areas in a direction parallel or substantially parallel to the principal surface. One of the first and second bumps having a smaller cross-sectional area includes a height adjustment layer disposed in a direction perpendicular or substantially perpendicular to the principal surface.

Abstract: An integrated circuit package may include a package substrate having a surface, first interconnects of a first size that are arranged in a substantially circular shape that is centered on the surface of the package substrate, and second interconnects of a second size that is different from the first size, where the second interconnects are arranged in a ring shape on the surface of the package substrate. The ring shape of the second interconnects is concentric with the substantially circular shape of the first interconnects. The integrated circuit package may further include third interconnects of a third size that are arranged in peripheral corner regions on the surface of the package substrate. The third size may be smaller or bigger than at least one of the first and second sizes.

Abstract: A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes a substrate including a plurality of conductive traces and a semiconductor chip. The semiconductor chip includes a surface facing the plurality of conductive traces and a plurality of conductive pads on the surface and correspondingly electrically connected with the plurality of conductive traces through a plurality of conductive bumps. A height of each of the plurality of conductive bumps is determined by a minimum distance between the plurality of conductive pads and the corresponding conductive traces thereof.

Abstract: A semiconductor device has a first encapsulant deposited over a first carrier. A plurality of conductive vias is formed through the first encapsulant to provide an interconnect substrate. A first semiconductor die is mounted over a second carrier. The interconnect substrate is mounted over the second carrier adjacent to the first semiconductor die. A second semiconductor die is mounted over the second carrier adjacent to the interconnect substrate. A second encapsulant is deposited over the first and second semiconductor die, interconnect substrate, and second carrier. A first interconnect structure is formed over a first surface of the second encapsulant and electrically connected to the conductive vias. A second interconnect structure is formed over a second surface of the second encapsulant and electrically connected to the conductive vias to make the Fo-WLCSP stackable. Additional semiconductor die can be mounted over the first and second semiconductor die in a PoP arrangement.

Abstract: A method forming a packaged semiconductor device includes providing a first semiconductor die (first die) having bond pads thereon mounted face-up on a package substrate or on a die pad of a lead frame (substrate), wherein the substrate includes terminals or contact pads (substrate pads). A first dielectric layer is formed including printing a first dielectric precursor layer including a first ink having a first liquid carrier solvent extending from the substrate pads to the bond pads. A first interconnect precursor layer is printed including a second ink having a second liquid carrier over the first dielectric layer extending from the substrate pads to the bond pads. Sintering or curing the first interconnect precursor layer removes at least the second liquid carrier to form an electrically conductive interconnect including an ink residue which connects respective substrate pads to respective bond pads.

Abstract: A semiconductor package includes a substrate including a core layer having a first surface and a second surface which is opposite to the first surface, a wiring layer formed over the first and second surfaces and in an inside of the core layer, and having a first electrode disposed in the inside of the core layer and exposed from the core layer and a second electrode disposed over the first surface, and a passivation layer formed over the first and second surface of the core layer such that the first and the second electrodes are exposed; a first semiconductor chip disposed over the first surface of the core layer; a second semiconductor chip stacked over the first semiconductor chip; a first connection member for connecting the first semiconductor chip with the first electrode; and a second connection member for connecting the second semiconductor chip with the second electrode.

Abstract: Provided is a bonding stage including: a rigid block (10) having a plurality of projections (11) on a surface (16) of the base body, upper surfaces of the projections being flat; a flat plate (20) fixed to supporting surfaces (18) on the projections (11); a ceramic plate (30) suctioned and fixed to the flat plate (20); a plate-shaped heater (40) disposed on a side of the rigid block (10) of the flat plate (20); and coil springs (50) disposed between the heater (40) and the rigid block (10), the coil springs (50) bringing the heater (40) into close contact with a surface of the flat plate (20) on the side of the rigid block (10).

Abstract: A semiconductor device includes a low-adhesion film, a pair of substrates, and a metal electrode. The low-adhesion film has lower adhesion to metal than a semiconductor oxide film. The pair of substrates is provided with the low-adhesion film interposed therebetween. The metal electrode passes through the low-adhesion film and connects the pair of substrates, and includes, between the pair of substrates, a part thinner than parts embedded in the pair of substrates. A portion of the metal electrode embedded in one substrate is provided with a gap interposed between the portion and the low-adhesion film on the other substrate.

Abstract: A package includes a first package component, a second package component over the first package component, and a solder region bonding the first package component to the second package component. At least one ball-height control stud separates the first package component and the second package component from each other, and defines a standoff distance between the first package component and the second package component.

Abstract: This disclosure relates to a transmission line for high performance radio frequency (RF) applications. One such transmission line can include a bonding layer configured to receive an RF signal, a barrier layer, a diffusion barrier layer, and a conductive layer proximate to the diffusion barrier layer. The diffusion barrier layer can have a thickness that allows a received RF signal to penetrate the diffusion barrier layer to the conductive layer. In certain implementations, the diffusion barrier layer can be nickel. In some of these implementations, the transmission line can include a gold bonding layer, a palladium barrier layer, and a nickel diffusion barrier layer.

Abstract: An integrated circuit (IC) device includes an IC and encapsulating material surrounding the IC. Leads are coupled to the IC and extend outwardly from sides of the encapsulating material, with each lead having three contiguous exposed segments with upper and lower bends defining a Z-shape. In another example, the leads include an upper horizontal segment, lower horizontal segment, and intermediate curved segment extending upwardly from the upper horizontal segment and downwardly to the lower horizontal segment.

Abstract: A multiple memory access system is disclosed. The system includes a first die disposed on a package substrate. A second die is stacked above the first die. The first die, the second die and the package substrate form a first package. An IC is placed within a close proximity of the first package where the first die communicates with the second die at a first data rate while the first die communicates with the IC at a second data rate. The first data rate is higher than the second data rate.

Abstract: A connection structure is provided. The connection structure comprises a conductive unit, a solder bump, a first insulating layer, a second insulating layer, a third insulating layer, and a plurality of vias. The solder bump is in direct contact with the conductive unit. The first insulating layer is located under a flange of the conductive unit. The second insulating layer is located under a base of the conductive unit. The third insulating layer is located under the second insulating layer. The third insulating layer has a via zone. A plurality of vias are located in the via zone. The via zone is within a vertical projection of the conductive unit.

Abstract: An integrated circuit (IC) package that includes a first die, a wire bond coupled to the first die, a first encapsulation layer that at least partially encapsulates the first die and the wire bond, a second die, a redistribution portion coupled to the second die, and a second encapsulation layer that at least partially encapsulates the second die. In some implementations, the wire bond is coupled to the redistribution portion. In some implementations, the integrated circuit (IC) package further includes a package interconnect that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package further includes a via that is at least partially encapsulated by the second encapsulation layer. In some implementations, the integrated circuit (IC) package has a height of about 500 microns (?m) or less.

Abstract: A semiconductor device includes a substrate, a first semiconductor package disposed on the substrate, and a second semiconductor package spaced apart from the first semiconductor package on the substrate. The second semiconductor package includes a semiconductor chip stacked on the substrate, an adhesion part covering the semiconductor chip, and a heat-blocking structure disposed between the substrate and the semiconductor chip. Heat generated from the first semiconductor package and transmitted to the second semiconductor package through the substrate is blocked by the heat-blocking structure.

Abstract: A method of forming a reduced volume interconnect for a chip stack including multiple silicon layers, the method including: forming multiple conductive structures, each of at least a subset of the conductive structures having a volume of conductive material for a corresponding under bump metallurgy pad onto which the conductive structure is transferred that is configured such that a ratio of an unreflowed diameter of the conductive structure to a diameter of the corresponding pad is about one third-to-one or less; transferring the conductive structures to the silicon layers; stacking the silicon layers in a substantially vertical dimension such that each of the conductive structures on a given silicon layer is aligned with a corresponding electrical contact location on an underside of an adjacent silicon layer; and heating the interconnect so as to metallurgically bond multiple electrical contact locations of adjacent silicon layers.

Abstract: A microelectronic assembly (300) or system (1500) includes at least one microelectronic package (100) having a microelectronic element (130) mounted face up above a first surface (108) of a substrate (102), one or more columns (138, 140) of contacts (132) extending in a first direction (142) along the microelectronic element front face. Columns (104A, 105B, 107A, 107B) of terminals (105 107) exposed at a second surface (110) of the substrate extend in the first direction. First terminals (105) exposed at surface (110) in a central region (112) thereof having width (152) not more than three and one-half times a minimum pitch (150) of the columns of terminals can be configured to carry address information usable to determine an addressable memory location. An axial plane of the microelectronic element can intersect the central region.

Abstract: A semiconductor device includes a MOSFET including a PN junction diode. A unipolar device is connected in parallel to the MOSFET and has two terminals. A first wire connects the PN junction diode to one of the two terminals of the unipolar device. A second wire connects the one of the two terminals of the unipolar device to an output line, so that the output line is connected to the MOSFET and the unipolar device via the first wire and the second wire. In one embodiment the connection of the first wire to the diode is with its anode, and in another the connection is with the cathode.

Abstract: Forming a semiconductor package includes coupling electrically conductive elements with a substrate, coupling a first die with one or more of the electrically conductive elements, and at least partially encapsulating the first die and electrically conductive elements in a first mold layer. A first redistribution layer (RDL) is placed over the first mold layer and electrically coupled with the first die. A second die is coupled with the first RDL, and the second die and first RDL are at least partially encapsulated in a second mold layer. A second RDL is formed over the second mold layer and is electrically coupled with the second die. A third mold layer at least partially encapsulates the second RDL. A portion of the substrate is removed to expose (and a solder mask is applied to) surfaces of the electrically conductive elements and of the first mold layer to form a stacked embedded package.

Abstract: Provided is a LED light-emitting device including: a carrier, which is a transparent body, and on a carrying surface of which conductors are provided; a plurality of LED chips, which are electrically connected to the conductors by way of eutectic bonding, so as to realize electrical connection among the plurality of LED chips; an encapsulation structural member, which is a transparent body and encapsulates on the periphery of the carrier and the LED chips; and a pair of electrodes, wherein positive electrode/negative electrodes in the pair of electrodes are electrically connected to the LED chips located at the most upstream/most downstream of a current transmission in the plurality of LED chips by means of the conductors, and extend to the outside of the encapsulation structural member.

Abstract: A semiconductor device according to an embodiment includes a normally off transistor having a first source, a first drain, a first gate connected to a common gate terminal, and a body diode, a normally on transistor having a second source connected to the first drain, a second drain, and a second gate, a capacitor provided between the common gate terminal and the second gate, a first diode having a first anode connected to between the capacitor and the second gate and a first cathode connected to the first source, and a second diode having a second anode connected to the first source and a second cathode connected to the second drain.

Abstract: A semiconductor wafer has a plurality of first semiconductor die with a stress sensitive region. A masking layer or screen is disposed over the stress sensitive region. An underfill material is deposited over the wafer. The masking layer or screen prevents formation of the underfill material adjacent to the sensitive region. The masking layer or screen is removed leaving a cavity in the underfill material adjacent to the sensitive region. The semiconductor wafer is singulated into the first die. The first die can be mounted to a build-up interconnect structure or to a second semiconductor die with the cavity separating the sensitive region and build-up interconnect structure or second die. A bond wire is formed between the first and second die and an encapsulant is deposited over the first and second die and bond wire. A conductive via can be formed through the first or second die.

Abstract: A method of multi-chip wafer level packaging comprises attaching a first semiconductor die to a top side of a wafer, forming a first reconfigured wafer by embedding the first semiconductor die into a first photo-sensitive material layer, forming a first group of through assembly vias in the first photo-sensitive material layer, attaching a second semiconductor die to the first photo-sensitive material layer, forming a second photo-sensitive material layer on top of the first photo-sensitive material layer, wherein the second semiconductor die is embedded in the second photo-sensitive material layer and forming a second group of through assembly vias in the second photo-sensitive material layer.

Abstract: An integrated circuit includes a bottom substrate, a metal layer disposed over the bottom substrate and a hollow metal pillar disposed on the metal layer. The metal layer and the hollow metal pillar are electrically connected.

Abstract: An ESD protecting circuit comprising: a first and a second voltage pad; an I/O pad; a first ESD protecting module, comprising a first terminal coupled to the first voltage pad, and comprising a second terminal; a switch, comprising a first terminal coupled to the second terminal of the first ESD protecting module, comprising a second terminal coupled to the I/O pad, and comprising a control terminal for receiving a control signal; a second ESD protecting module, comprising a first terminal coupled to the first terminal of the MOS transistor, and comprising a second terminal coupled to the second voltage pad; and an ESD detecting circuit, for detecting if an ESD voltage exists, for generating the control signal to control the MOS transistor to be conductive when an ESD voltage is detected and to control the MOS transistor to be nonconductive when the ESD voltage is not detected.

Abstract: Disclosed are systems, devices, circuits, components, mechanisms, and processes in which a switching mechanism can be coupled between components. The switching mechanism is configured to have an on state or an off state, where the on state allows current to pass along a current path. A monitoring mechanism has one or more sensing inputs coupled to sense an electrical characteristic at the current path. The electrical characteristic can be a current, voltage, and/or power by way of example. The monitoring mechanism is configured to output a reporting signal indicating the sensed electrical characteristic. The monitoring mechanism can be integrated with the switching mechanism on a chip.

Abstract: An electrostatic discharge (ESD) protection device includes a substrate including a plurality of active fins and a plurality of grooves. The ESD protection device includes an insulation layer on the active fins and the grooves, and a gate electrode on the active fins. The ESD protection device includes a first impurity region adjacent to a first side of the gate electrode, and a second impurity region adjacent to a second side of the gate electrode. The second side of the gate electrode may be arranged opposite to the first side. The ESD protection device includes an electrode pattern of a capacitor overlapping the first impurity region, a resistor overlapping the second impurity region, and a connection structure electrically connecting the electrode pattern, the gate electrode, and the resistor to each other.

Abstract: A device is disclosed that includes a first transistor, a second transistor, and a first PODE device. The second transistor is electrically coupled to the first transistor. The first PODE device is adjacent to a drain/source region of the second transistor. A control end of the first PODE device is electrically coupled to a drain/source end of the second transistor.

Abstract: An electrostatic discharge (ESD) device for an integrated circuit includes a substrate having a longitudinally extending fin dispose thereon. A first n-type FinFET (NFET) is disposed within the fin. The NFET includes an n-type source, an n-type drain and a p-well disposed within the substrate under the source and drain. A p-type FinFET (PFET) is disposed within the fin. The PFET includes a p-type source/drain region and an n-well disposed within the substrate under the source/drain region. The n-well and p-well are located proximate enough to each other to form an np junction therebetween. The p-type source/drain region of the PFET and the n-type drain of the NFET are electrically connected to a common input node.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes providing a substrate; forming a well region on the substrate; forming at least one first gate structure on the well region, wherein the first gate structure includes a gate insulating layer and a first gate electrode formed on the gate insulating layer, wherein the first gate electrode is formed having a first enclosed pattern on a surface of the well region; wherein an area inside the first enclosed pattern is defined as a first region, and an area outside the first enclosed pattern is defined as a second region; performing ion implantation on the first region such that the first region has a first conductivity type, and performing ion implantation on the second region such that the second region has a second conductivity type, wherein the first conductivity type and the second conductivity type are different.

Abstract: In one general aspect, an apparatus can include a semiconductor substrate, and a trench defined within the semiconductor substrate and having a depth aligned along a vertical axis, a length aligned along a longitudinal axis, and a width aligned along a horizontal axis. The apparatus includes a dielectric disposed within the trench, and an electrode disposed within the dielectric and insulated from the semiconductor substrate by the dielectric. The semiconductor substrate can have a portion aligned vertically and adjacent the trench, and the portion of the semiconductor substrate can have a conductivity type that is continuous along an entirety of the depth of the trench. The apparatus is biased to a normally-on state.

Abstract: ESD protection circuitry is disclosed. In one embodiment, an integrated circuit includes first and second sensor circuits. The first sensor circuit has a first resistive-capacitive (RC) time constant, while the second sensor circuit has a second RC time constant. The RC time constant of the first sensor circuit is at least one order of magnitude greater than that of the second sensor circuit. A first clamp transistor is coupled to and configured to be activated by the first sensor circuit responsive to the latter detecting an ESD event. A second clamp transistor is coupled to and configured to be activated by the second sensor circuit responsive to the latter detecting the ESD event.

Abstract: A reverse blocking semiconductor device is manufactured by introducing impurities of a first conductivity type into a semiconductor substrate of the first conductivity type through a process surface to obtain a process layer extending into the semiconductor substrate up to a first depth, and introducing impurities of a second, complementary conductivity type into the semiconductor substrate through openings of an impurity mask provided on the process surface to obtain emitter zones of the second conductivity type extending up to a second depth deeper than the first depth and channels of the first conductivity type between the emitter zones. Exposed portions of the process layer are removed above the emitter zones.

Abstract: This disclosure provides a negative capacitance gate stack structure with a variable positive capacitor to implement a hysteresis free negative capacitance field effect transistors (NCFETs) with improved voltage gain. The gate stack structure provides an effective ferroelectric negative capacitor by using the combination of a ferroelectric negative capacitor and the variable positive capacitor with semiconductor material (such as polysilicon), resulting in the effective ferroelectric negative capacitor's being varied with an applied gate voltage. Our simulation results show that the NCFET with the variable positive capacitor can achieve not only a non-hysteretic ID-VG curve but also a better sub-threshold slope.

Abstract: A semiconductor variable resistance device includes: a substrate; a gate formed on the substrate, the substrate further including a first trench the first trench formed outside a side of the gate; first and second doped regions, formed in the substrate, the first and second doped regions formed on two sides of the gate, the first trench formed between the gate and the first doped region; and first and second lightly-doped drain (LDD) regions, formed in the substrate. The first LDD region is formed between the first trench and the first doped region. The second LDD region is formed between the gate and the second doped region. The first and second doped regions form a source and a drain, respectively. The first trench is deeper than the first and the second lightly-doped drain regions.

Abstract: A semiconductor device includes a semiconductor substrate having an outer rim, a plurality of switchable cells defining an active area, and an edge termination region arranged between the switchable cells and the outer rim. Each of the switchable cells includes a gate electrode structure. The semiconductor device further includes a gate metallization in contact with the gate electrode structure. The active area includes at least a first switchable region having a first specific transconductance and at least a second switchable region having a second specific transconductance which is different from the first specific transconductance. The second switchable region is arranged between the gate metallization and the first switchable region. A ratio of the area of the second switchable region to the total area of the switchable regions is in a range from 5% to 50%.

Abstract: A moisture blocking structure includes an active fin disposed on a sealing region of a substrate, the substrate including a chip region and the sealing region surrounding a periphery of the chip region, the active fin continuously surrounding the chip region and having a winding line shape in a plan view. A gate structure covers the active fin and surrounds the periphery of the chip region. A conductive structure is disposed on the gate structure, the conductive structure surrounding the periphery of the chip region.

Abstract: A nanofluidic structure including a semiconductor substrate and a dielectric layer positioned above and in contact with the semiconductor substrate. A first reservoir and a second reservoir are defined by the semiconductor substrate and the dielectric layer. The second reservoir is spaced apart from the first reservoir. Bottom passage fins protrude from the semiconductor substrate and extend from the first reservoir to the second reservoir. Top passage fins, above and spaced apart from the bottom passage fins, extend from the first reservoir to the second reservoir. Nanofluidic passages between the top and bottom fins connect the first reservoir and the second reservoir. Each of the nanofluidic passages includes a bottom wall, a top wall and sidewalls. The bottom wall is defined by a respective bottom passage fin. The top wall is defined by a respective top passage fin. The sidewalls are defined by the dielectric layer.

Abstract: A semiconductor device having metal gate includes a first metal gate structure and a second metal gate structure disposed in a first device region and in a second device region on a substrate respectively. The first metal gate structure includes a gate insulating layer, a first bottom barrier layer, a top barrier layer, and a metal layer disposed on the substrate in order, wherein the top barrier layer is directly in contact with the first bottom barrier layer. The second metal gate structure includes the gate insulating layer, a second bottom barrier layer, the top barrier layer, and the metal layer on the substrate in order, wherein the top barrier layer is directly in contact with the second bottom barrier layer. The first bottom barrier layer and the second bottom barrier layer have different impurity compositions.

Abstract: Integrated circuits are disclosed in which the strain properties of adjacent pFETs and nFETs are independently adjustable. The pFETs include compressive-strained SiGe on a silicon substrate, while the nFETs include tensile-strained silicon on a strain-relaxed SiGe substrate. Adjacent n-type and p-type FinFETs are separated by electrically insulating regions formed by a damascene process. During formation of the insulating regions, the SiGe substrate supporting the n-type devices is permitted to relax elastically, thereby limiting defect formation in the crystal lattice of the SiGe substrate.

Abstract: A semiconductor arrangement and method of formation are provided. A semiconductor arrangement includes a first semiconductor device adjacent a second semiconductor device. The first semiconductor device includes a first gate over a first shallow well in a substrate. A first active area is in the first shallow well on a first side of the first gate. The second semiconductor device includes a second gate over a second shallow well. A third active area is in the second shallow well on a first side of the second gate. The second shallow well abuts the first shallow well in the substrate to form a P-N junction. The P-N junction increases capacitance of the semiconductor arrangement, as compared to a device without such a P-N junction.

Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a substrate, a plurality of active areas, and an isolation structure. The substrate has a device region and a peripheral region surrounding the device region. The active areas are located in the substrate in the device region. When viewed from above, the edges of the ends of the active areas adjacent to the boundary of the device region are aligned with each other, and the width of the ends of the active areas adjacent to the boundary of the device region is greater than the width of the other portions of the active areas. The isolation structure is disposed in the substrate and surrounds the active areas and is located in the peripheral region.

Abstract: A layout of a random access memory is provided. The layer comprises a first sub-layout having a first pattern including a first number (N1) of first patterns and an adjacent second pattern having a second number (N2) of second patterns; a second sub-layout having a first gate pattern and a second gate pattern; and an interchangeable third sub-layout having covering patterns variable for forming different static random access memory when used with the first sub-layout and the second sub-layout.

Abstract: An anti-fuse based on a Field Nitride Trap (FNT) is disclosed. The anti-fuse includes a first active pillar including a first junction, a second active pillar including a second junction, a selection line buried between the first active pillar and the second active pillar, and a trap layer for electrically coupling the first junction to the second junction by trapping minority carriers according to individual voltages applied to the first junction, the second junction and the selection line. As a result, the fuse can be highly integrated through the above-mentioned structure, and programming of the fuse can be easily achieved.

Abstract: A method of manufacturing a semiconductor device includes: forming a conductive film over a semiconductor substrate; forming a first ferroelectric film over the conductive film; forming an amorphous second ferroelectric film over the first ferroelectric film; forming a transition metal oxide material film containing ruthenium over the second ferroelectric film; forming a first conductive metal oxide film over the transition metal oxide material film without exposing the transition metal oxide material film to the air; annealing and crystallizing the second ferroelectric film; and patterning the first conductive metal oxide film, the first ferroelectric film, the second ferroelectric film, and the conductive film to form a ferroelectric capacitor.

Abstract: Integrated circuits and methods of producing the same are provide. In an exemplary embodiment, a method includes determining a memory area of the integrated circuit, and forming a select layer overlying the substrate. A portion of the select layer is selectively etched to form a select gate within the memory area. A concentration of an indicator is measured in an etch off-gas during the selective etching of the select layer, and the selective etching of the select layer is terminated when the concentration of the indicator crosses an end point determination concentration.

Abstract: A monolithic three-dimensional memory device includes a first memory block containing a plurality of memory sub-blocks located on a substrate. Each memory sub-block includes a set of memory stack structures and a portion of alternating layers laterally surrounding the set of memory stack structures. The alternating layers include insulating layers and electrically conductive layers. A first portion of a neighboring pair of memory sub-blocks is laterally spaced from each other along a first horizontal direction by a backside contact via structure. A subset of the alternating layers contiguously extends between a second portion of the neighboring pair of memory sub-blocks through a gap in a bridge region between two portions of the backside contact via structure that are laterally spaced apart along a second horizontal direction to provide a connecting portion between the neighboring pair of memory sub-blocks.

Abstract: A portion of a charge trapping layer adjacent to a select drain gate electrode can be removed employing a differential-rate etch process that provides an accelerated etch rate to a doped portion with respect to an undoped portion. If a silicon nitride layer is employed as the charge trapping layer, then angled ion implantation of boron atoms to an upper portion of the silicon nitride layer can increase the etch rate of the boron-doped portion of the silicon nitride layer in phosphoric acid. The charge trapping layer is etched back such that a remaining portion of the charge trapping layer can be present only at levels of control gate electrodes, and absent at each level of select drain gate electrodes. Threshold voltage shift for the select drain gate electrodes can be eliminated or reduced by removal of the charge trapping layer at each level of the select drain gate electrodes.

Abstract: Provided is a semiconductor device having improved performance. In a semiconductor substrate located in a memory cell region, a memory cell of a nonvolatile memory is formed while, in the semiconductor substrate located in a peripheral circuit region, a MISFET is formed. At this time, over the semiconductor substrate located in the memory cell region, a control gate electrode and a memory gate electrode each for the memory cell are formed first. Then, an insulating film is formed so as to cover the control gate electrode and the memory gate electrode. Subsequently, the upper surface of the insulating film is polished to be planarized. Thereafter, a conductive film for the gate electrode of the MISFET is formed and then patterned to form a gate electrode or a dummy gate electrode for the MISFET in the peripheral circuit region.