Patents Issued in August 20, 2020
  • Publication number: 20200263280
    Abstract: The present disclosure discloses an yttrium (Y)-added rare-earth permanent magnetic material and a preparation method thereof. A chemical formula of the material expressed in atomic percentage is (YxRE1-x)aFebalMbNc, wherein 0.05?x?0.4, 7?a?13, 0?b?3, 5?c?20, and the balance is Fe, namely, bal=100-a-b-c; RE represents a rare-earth element Sm, or a combination of the rare-earth element Sm and any one or more elements of Zr, Nd and Pr; M represents Co and/or Nb; and N represents nitrogen. In the preparation method, the rare-earth element Y is utilized to replace the element Sm of a samarium-iron-nitrogen material. By regulating a ratio of the element Sm to the element Y, viscosity of an alloy liquid can be reduced, and an amorphous forming ability of the material is enhanced.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 20, 2020
    Inventors: Yang LUO, Xiao LIN, Guiyong WU, Jiajun XIE, Zilong WANG, Wenlong YAN, Zhongkai WANG, Dunbo YU
  • Publication number: 20200263281
    Abstract: Disclosed herein are embodiments of soft magnetic alloy embodiments for use in additive manufacturing and structures fabricated from such alloys. In some embodiments, the fabricated structures comprise a continuous thin wall (or plurality thereof) having a geometry that promotes reduced eddy current losses and other performance enhancements. In some embodiments, the fabricated structures are used to make components, such as transformer cores and/or electric motors.
    Type: Application
    Filed: February 10, 2020
    Publication date: August 20, 2020
    Inventors: Alexander Plotkowski, Ryan Dehoff, Frederick List, III, Jason Pries, Benjamin Stump, Keith Carver, Peeyush Nandwana
  • Publication number: 20200263282
    Abstract: A piercer plug with increased recyclability is provided. A piercer plug (1) has a chemical composition of, in mass %: 0.15 to 0.30% C; 0.4 to 1.2% Si; 0.2 to 1.5% Mn; 0.1 to 2.0% Ni; 0 to 4.0% Mo and 0 to 4.0% W, where the total content of Mo and W is 1.0 to 6.0%; higher than 1.0% and not higher than 4.0% Cr; 0 to 0.2% B; 0 to 1.0% Nb; 0 to 1.0% V; 0 to 1.0% Ti; and balance Fe and impurities, the plug including a tip portion (2) and a trunk portion (3) made of the same material as the tip portion (2) and contiguous to the tip portion (2). The trunk portion (3) includes a cylindrical portion (5) having a hole used to mount a bar. The tip portion (2) is harder than the cylindrical portion (5).
    Type: Application
    Filed: August 9, 2018
    Publication date: August 20, 2020
    Inventors: Yasuyoshi Hidaka, Naoya Shirasawa, Tatsuya Miyai
  • Publication number: 20200263283
    Abstract: The invention relates to an ultrahigh strength multiphase steel having a minimum tensile strength of 980 MPa containing (in wt. %): C?0.075 to ?0.115; Si?0.400 to ?0.500; Mn?1.900 to ?2.350; Cr?0.250 to ?0.400; Al?0.010 to ?0.060; N?0.0020 to ?0.0120; P?0.020; S?0.0020; Ti?0.005 to ?0.060; Nb?0.005 to ?0.060; V?0.005 to ?0.020; B?0.0005 to ?0.0010; Mo?0.200 to ?0.300; Ca?0.0010 to ?0.0060; Cu?0.050; Ni?0.050; Sn?0.040; H?0.0010; and residual iron, including customary steel-accompanying smelting-related impurities, wherein the total content of Mn+Si+Cr is ?1.750 to ?2.250 wt. % with a view to a processing window which is as wide as possible during the annealing process, in particular during the continuous annealing process, of cold strips of said steel.
    Type: Application
    Filed: September 27, 2018
    Publication date: August 20, 2020
    Applicant: Salzgitter Flachstahl GmbH
    Inventor: Thomas Schulz
  • Publication number: 20200263284
    Abstract: The present invention relates to a method for the manufacture of a coated steel sheet comprising the following successive steps: A. the coating of the steel sheet with a first coating consisting of nickel and having a thickness between 600 nm and 1400 nm, the steel sheet having the following composition in weight: 0.10<C<0.40%, 1.5<Mn<3.0%, 0.7<Si<3.0%, 0.05<Al<1.0%, 0.75<(Si+Al)<3.0%, and on a purely optional basis, one or more elements such as Nb?0.5%, B?0.010%, Cr?1.0%, Mo?0.50%, Ni?1.0%, Ti?0.5%, the remainder of the composition making up of iron and inevitable impurities resulting from the elaboration, B. the recrystallization annealing at a temperature between 820 to 1200° C., C. the coating with a second coating based on zinc not comprising nickel.
    Type: Application
    Filed: November 15, 2018
    Publication date: August 20, 2020
    Inventors: Anirban CHAKRABORTY, Hassan GHASSEMI-ARMAKI, Pascal BERTHO, Christian ALLELY
  • Publication number: 20200263285
    Abstract: This disclosure provides a graded composition including at least a first, second, and third material property zone each having a crystallographic configuration distinct from other zones. In some implementations, the graded composition has a first material in the first material property zone including a metal, the first material composed of metallic bonds between metal atoms present in the first material property zone; a second material that at least partially overlaps the first material in the first material property zone including carbon, the second material composed of covalent bonds between the carbon in the second material and the metal in the first material; and, a third material that at least partially overlaps the second material property zone including carbon, the third material composed of covalent bonds between the carbon of the third material. Each crystallographic configuration may include a cubic crystallographic lattice, a hexagonal lattice, a face or body-centered cubic lattice.
    Type: Application
    Filed: January 27, 2020
    Publication date: August 20, 2020
    Applicant: LytEn, Inc.
    Inventors: Michael W. Stowell, Bruce Lanning, Peter Todd Williams, Daniel Cook
  • Publication number: 20200263286
    Abstract: Tooling for the coating of lips of a turbomachine rotor sector, comprising a support for a rotor sector, a centering plate adapted to be inserted into a rotor sector, said centering plate having a central housing, a tool, said tool comprising a centering arm, adapted to be inserted into the central housing of the centering plate, a torch, adapted to spray a ceramic material, a machining tool, said tooling being configured so as to position the tool relative to the rotor sector via the centering plate, and to simultaneously perform on the rotor sector a spraying of ceramic material and a machining on two distinct sectors of the lips.
    Type: Application
    Filed: February 18, 2020
    Publication date: August 20, 2020
    Applicant: SAFRAN AIRCRAFT ENGINES
    Inventors: Laurent Paul DUDON, Mickaël THIERCELIN
  • Publication number: 20200263287
    Abstract: Provided is a vapor deposition mask that suppresses heat conduction at a frame thereof, that achieves weight reduction, and that can tolerate high stress at a portion of the frame to which particularly high stress is applied. The present invention has: a mask main body (10) at which an opening pattern is formed; and a frame (15) to which at least a portion of a peripheral edge part of the mask main body is joined. At least a portion of the frame is formed as a rod-like lateral frame (15b) that is formed by laminating, via connection surface plates (153), unit structures (155) for a sandwich structure in which a surface plate (152) is stuck to a surface that faces at least portions of core parts (151) that contain vacant space.
    Type: Application
    Filed: December 25, 2017
    Publication date: August 20, 2020
    Inventor: KATSUHIKO KISHIMOTO
  • Publication number: 20200263288
    Abstract: A vapor deposition apparatus disclosed by an embodiment comprises: a vacuum chamber (8); a mask holder (15) for holding a deposition mask 1; a substrate holder (29) for holding a substrate for vapor deposition (2); an electromagnet (3) disposed above a surface; a vapor deposition source 5 for vaporizing or sublimating a vapor deposition material; and a heat pipe (7) including at least a heat absorption part (71) and a heat dissipation part (72), the heat absorption part being in contact with the electromagnet (3), and the heat dissipation part being derived to an outside of the vacuum chamber (8). The heat pipe (7) and the electromagnet (3) are in intimate contact with each other at an area of a contact part between the heat pipe (7) and the electromagnet (3), the area being equal to or more than a cross-sectional area within an inner perimeter of a coil (32).
    Type: Application
    Filed: April 21, 2020
    Publication date: August 20, 2020
    Inventors: Susumu Sakio, Katsuhiko Kishimoto
  • Publication number: 20200263289
    Abstract: A coated metallic substrate including at least a first coating consisting of aluminum is provided. The first coating has a thickness between 1.0 and 4.5 ?m and is directly topped by a second coating based on zinc, such second coating having a thickness between 1.5 and 9.0 ?m. The thickness ratio of the first coating with respect to the second coating is between 0.2 and 1.2.
    Type: Application
    Filed: July 20, 2018
    Publication date: August 20, 2020
    Inventors: Daniel CHALEIX, Christian ALLELY, Eric SILBERBERG, Sergio PACE, Lucie GAOUYAT
  • Publication number: 20200263290
    Abstract: The present invention relates to a method for producing an Al—Cr—O-based coatings comprising at least one Al—Cr—O-based or Al—O-based film on a workpiece surface, wherein the method comprises following steps: a) placing at least one workpiece having a surface to be coated in the interior of a vacuum chamber, and b) depositing a film A comprising aluminum and chromium on the workpiece surface to be coated, wherein the ratio of aluminum to chromium in the film in atomic percentage has a first value corresponding to Al/Cr?2.3 and wherein the method further comprises following steps: c) forming volatile compounds of Cr—O, e.g.
    Type: Application
    Filed: September 17, 2018
    Publication date: August 20, 2020
    Inventors: Robert RAAB, Christian Martin KOLLER, Paul Heinz MAYRHOFER, Mirjam ARNDT, Juergen RAMM
  • Publication number: 20200263291
    Abstract: A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.
    Type: Application
    Filed: March 6, 2019
    Publication date: August 20, 2020
    Inventors: Yoshitaka Shibuya, Satoyasu Narita, Hiroki Kajita
  • Publication number: 20200263292
    Abstract: A method and a device for plasma treatment of containers by means of a plurality of treatment segments each having at least one plasma station on a plasma module comprising a plasma wheel, wherein, during an operational malfunction and/or a cut-out in at least one of the plasma stations, the process gas, before being supplied to the plasma station in question, is carried off into the respective plasma chamber and/or the container held therein, by means of at least one bypass line.
    Type: Application
    Filed: March 3, 2020
    Publication date: August 20, 2020
    Inventors: Alexander DISTERHOF, Michael HERBORT, Sebastian KYTZIA
  • Publication number: 20200263293
    Abstract: An apparatus for producing polycrystalline silicon by the Siemens method, includes: a carbon-made core wire holder 14 holding a silicon core wire 13; an electrode portion 10 energizing the core wire holder 14, the electrode portion 10 having a top end 18 in contact with a bottom end of the core wire holder 14; and a first screwing section provided 17a only around a lower part of the core wire holder 14 to be fixed to the electrode portion 10, wherein the core wire holder 14 has a contact surface with the top end 18 of the electrode portion 10, the contact surface being lower in electric resistance than an area of the first screwing section 17a to be fastened.
    Type: Application
    Filed: February 11, 2020
    Publication date: August 20, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuro Okada, Naruhiro Hoshino, Masahiko Ishida
  • Publication number: 20200263294
    Abstract: The invention relates to a method (100) for monitoring the growth conditions of a microwave plasma-assisted deposition for diamond manufacture, said method being implemented by a monitoring device (10) comprising at least one digital image capture means (11), one digital image processing module (12), and one data processing module (13), said method including the steps of: capturing (110) a digital color image of at least one growing diamond, using the digital image capturing means (11), extracting (120) color characteristic values from at least one area of the captured digital image, by the digital image processing module (12), and analyzing (130), by the data processing module (13), the extracted color characteristic values to detect a variation during the microwave plasma-assisted deposition.
    Type: Application
    Filed: June 8, 2018
    Publication date: August 20, 2020
    Inventors: Alix GICQUEL, Olivier DUIGOU, Thomas BIEBER
  • Publication number: 20200263295
    Abstract: A film forming method is provided. In the film forming method, a gas of a carbon precursor containing an organic compound having an unsaturated carbon bond is supplied to a substrate, and a gas of a silicon precursor containing a silicon compound is supplied to the substrate. Further, a carbon-silicon containing film is formed on the substrate by thermally reacting the carbon precursor with the silicon precursor at a temperature lower than 800° C.
    Type: Application
    Filed: February 10, 2020
    Publication date: August 20, 2020
    Inventors: Takahiro MIYAHARA, Susumu YAMAUCHI
  • Publication number: 20200263296
    Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.
    Type: Application
    Filed: May 8, 2020
    Publication date: August 20, 2020
    Inventor: Gary A. BARONE
  • Publication number: 20200263297
    Abstract: Vapor deposition processes such as atomic layer deposition (ALD) processes employing a deposition enhancing precursor can be used to form a variety of oxide and nitride films, including metal oxide, metal nitride, metal oxynitride, silicon oxide and silicon nitride films. For example, the methods can be used to deposit transition metal nitrides, transition metal oxides, and silicon oxides and nitrides. In some embodiments the deposition enhancing precursor comprises a Group II metal such as Mg, Sr, Ba or Ca. Atomic layer deposition processes may comprise a deposition cycle comprising a first sub-cycle in which a substrate is contacted with a deposition enhancing precursor and an oxygen or nitrogen reactant and a second sub-cycle in which the substrate is contacted with a metal or silicon precursor and an oxygen or nitrogen reactant. In some embodiments the methods advantageously enable improved thin film formation, for example increased deposition rates.
    Type: Application
    Filed: January 21, 2020
    Publication date: August 20, 2020
    Inventors: Henri Jussila, Chiyu Zhu, Qi Xie, Jiyeon Kim, Tom E. Blomberg
  • Publication number: 20200263298
    Abstract: An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polari
    Type: Application
    Filed: September 27, 2018
    Publication date: August 20, 2020
    Inventors: Alexander John Topping, James Tiw Shipman, Robert William Jarman
  • Publication number: 20200263299
    Abstract: A surface treatment apparatus includes a chamber defining an accommodation space therein, an injection part provided at a first end of the chamber so as to inject gas into the accommodation space, a discharge part provided at a second end of the chamber that is opposite the first end so as to discharge unreacted gas from the accommodation space, and at least one subchamber loaded in the accommodation space in the chamber between the first end and the second end, where powder is charged in the subchamber, and the subchamber includes a mesh structure provided in at least one surface of the subchamber so as to allow the gas to be introduced into the subchamber, and the subchamber is movable from the first end to the second end.
    Type: Application
    Filed: June 4, 2019
    Publication date: August 20, 2020
    Inventors: Woong Pyo Hong, Seung Jeong Oh, Jung Yeon Park, Jin Hyeok Cha, Hyung Sang Park, Chae Woong Kim, Tae Ho Yoon, Kun Woo Park
  • Publication number: 20200263300
    Abstract: An atomic layer deposition apparatus, having a first series of high pressure gas injection openings and a first series of exhaust openings that are positioned such that they together create a first high pressure/suction zone within each purge gas zone, wherein each first high pressure/suction zone extends over substantially the entire width of the process tunnel and wherein the distribution of the gas injection openings that are connected to the second purge gas source and the distribution of the gas exhaust openings within the first high pressure/suction zone, as well as the pressure of the second purge gas source and the pressure at the gas exhaust openings are such that the average pressure within the first high pressure/suction zone deviates less than 30% from a reference pressure which is defined by the average pressure within process tunnel when no substrate is present.
    Type: Application
    Filed: March 30, 2020
    Publication date: August 20, 2020
    Inventors: Ernst Hendrik August GRANNEMAN, Leilei HU
  • Publication number: 20200263301
    Abstract: The present disclosure relates to a semiconductor processing apparatus. The processing chamber includes a chamber body and lid defining an interior volume, a substrate support disposed in the interior volume and a showerhead assembly disposed between the lid and the substrate support. The showerhead assembly includes a faceplate configured to deliver a process gas to a processing region defined between the showerhead assembly and the substrate support and an underplate positioned above the faceplate, defining a first plenum between the lid and the underplate, the having multiple zones, wherein each zone has a plurality of openings that are configured to pass an amount of inert gas from the first plenum into a second plenum defined between the faceplate and the underplate, in fluid communication with the plurality of openings of each zone such that the inert gas mixes with the process gas before exiting the showerhead assembly.
    Type: Application
    Filed: May 5, 2020
    Publication date: August 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Amit Kumar BANSAL, Juan Carlos ROCHA-ALVAREZ, Sanjeev BALUJA, Sam H. KIM, Tuan Anh NGUYEN
  • Publication number: 20200263302
    Abstract: A system for chemical vapor densification includes a reaction chamber having an inlet and outlet; a trap; a conduit fluidly coupled between the outlet of the reaction chamber and the trap; a cryogenic cooler fluidly coupled to the trap though a frustoconical conduit; a first exit path from the cryogenic cooler that vents hydrogen gas to an exhaust; and a second exit path from the cryogenic cooler that recirculates silane and hydrocarbon-rich gas back to the inlet of the reaction chamber—and a related method places a substrate in the reaction chamber; establishes a sub-atmospheric pressure inert gas atmosphere within the reaction chamber; densifies the substrate by inputting virgin gas into the reaction chamber; withdraws effluent gas from the reaction chamber; extracts silane and hydrocarbon-rich gas from the effluent gas; and recirculates the silane and hydrocarbon-rich gas back to the reaction chamber.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 20, 2020
    Applicant: GOODRICH CORPORATION
    Inventors: Gavin Charles Richards, Tod Policandriotes, Afshin Bazhushtari
  • Publication number: 20200263303
    Abstract: According to an embodiment of the present invention, a substrate processing apparatus includes: a chamber in which a process for a substrate is performed; a showerhead installed in the chamber to inject a reaction gas toward the substrate; and a susceptor installed below the showerhead to support the substrate. Here, the showerhead includes: a showerhead main body including an inner space to which the reaction gas is supplied from the outside and a plurality of injection holes configured to inject the reaction gas while communicating with the inner space; an inflow plate installed in the inner space to divide the inner space into an inflow space and a buffer space and including a plurality of inflow holes configured to allow the inflow space and the buffer space to communicate with each other; and a plurality of adjustment plates installed on the inflow holes in a movable manner, respectively, and configured to restrict movement of the reaction gas from the inflow space to the buffer space.
    Type: Application
    Filed: September 7, 2018
    Publication date: August 20, 2020
    Applicant: EUGENE TECHNOLOGY CO., LTD.
    Inventors: Sung Tae JE, Chan Yong PARK, Jae Ho LEE, Gil Sun JANG, Chang Hoon YUN, Han June LIM, Woo Young KANG
  • Publication number: 20200263304
    Abstract: An integrated sleeve structure is provided between an electrode configured to feed power to a silicon core wire and a bottom plate part. Sealing members are arranged on at least part of a flange part of an insulating member and on at least part of a straight part of the insulating member.
    Type: Application
    Filed: February 19, 2020
    Publication date: August 20, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naruhiro Hoshino, Tetsuro Okada, Masahiko Ishida
  • Publication number: 20200263305
    Abstract: A system including a rod shaped and configured to be formed into a U-bolt, the rod including a body having a pair of opposed threaded ends. The system further includes a blackening coating on an outer surface of the body, and an anticorrosive coating on the blackening coating.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 20, 2020
    Applicant: L & H Threaded Rods Corp.
    Inventors: John C. GRAY, Thomas L. RATERMAN
  • Publication number: 20200263306
    Abstract: A method for producing open-pored molded bodies made of a metal. The surface of the metal open-pored molded body being used as a semi-finished product, is coated with particles of the same metal with which the semi-finished product is made or with particles of a chemical compound of the metal the semi-finished product is made, wherein the compound or particles can be reduced or thermally or chemically decomposed in a thermal treatment. After the coating process, a thermal treatment in a suitable atmosphere is carried out, in which the particles are connected to the surface of the semi-finished product and/or adjacent particles such that the specific surface area of the obtained open-pore molded body is increased to at least 30 m2/l and/or at least by a factor of 5 in comparison to the starting material.
    Type: Application
    Filed: September 14, 2018
    Publication date: August 20, 2020
    Applicants: Alantum Europe GmbH, Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung e.V.
    Inventors: Tilo BUETTNER, Gunnar WALTHER, Hans-Dietrich BOEHM, Thomas WEISSGAERBER, Bernd KIEBACK, Christian Immanuel MÜLLER, Robin KOLVENBACH, Lars TORKUHL
  • Publication number: 20200263307
    Abstract: Various embodiments include a dense abradable coating, a method of reducing rub damage to a turbine engine part by applying the dense abradable coating thereto, and a turbine engine part having the abradable coating thereon. Particular embodiments include a dense abradable coating including a pore-free metallic composite, a high-aluminum containing brittle alloy, and a plurality of hollow abradable particles.
    Type: Application
    Filed: February 20, 2019
    Publication date: August 20, 2020
    Inventors: Krishnamurthy Anand, Eklavya Calla, Biju Dasan, Surinder Singh Pabla, Priyanka Saxena
  • Publication number: 20200263308
    Abstract: A microetching agent is an acidic aqueous solution containing an organic acid, cupric ions, and halide ions. The molar concentration of halide ion of the microetching agent is 0.005 to 0.1 mol/L. By bringing the microetching agent into contact with a copper surface, the copper surface is roughened. An average etching amount in the depth direction during roughening is preferably 0.4 ?m or less. The microetching agent can impart on copper surfaces a roughened shape having excellent adhesiveness to resins and the like, even with a low etching amount.
    Type: Application
    Filed: August 20, 2018
    Publication date: August 20, 2020
    Applicant: MEC COMPANY LTD.
    Inventors: Yuki OGINO, Takahiro SAKAMOTO, Kaoru URUSHIBATA
  • Publication number: 20200263309
    Abstract: An etching method includes: providing a substrate including a silicon oxide film on a stage; controlling a surface temperature of the substrate to be ?70° C. or lower; and etching the silicon oxide film with plasma generated by supplying a radio-frequency power to a gas containing fluorine and hydrogen, after the controlling the surface temperature of the substrate; and increasing the surface temperature of the substrate to volatilize a by-product generated by the etching.
    Type: Application
    Filed: February 18, 2020
    Publication date: August 20, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Koki TANAKA, Maju TOMURA
  • Publication number: 20200263310
    Abstract: A system for controlling an electrochemical production process includes a variable controllable power circuit and an electrolytic cell. The cell includes two electrodes and operates in different states dependent on the potential difference across the electrodes. The system includes a power circuit controller that causes the power circuit to apply a given potential difference across the electrodes to initiate operation of the cell in the one of multiple possible states associated with the given potential difference. The possible states include a production state associated with a first non-zero potential difference in which a product of interest is produced, and an idle state associated with a second non-zero potential difference in which the product of interest is not produced. A monitoring and control subsystem maintains a predefined set of production process conditions, including a predefined operating temperature range, while the cell operates in both the production state and the idle state.
    Type: Application
    Filed: February 19, 2019
    Publication date: August 20, 2020
    Inventor: Deóis Chiaráin Mac Séamuis Ua Cearnaigh
  • Publication number: 20200263311
    Abstract: An electrolyser arrangement with at least one electrolytic cell, having two electrodes, namely an anode and a cathode, each of the two electrodes being in contact with an electrode compartment for filling with a liquid electrolyte, the two electrode compartments being separated by a membrane and a conveying device being provided, one for each of the two electrodes, for conveying the electrolyte in each case in a circuit, a cathode circuit and an anode circuit, through the electrode compartment via at least one collection vessel per circuit and back into the electrode chamber. A device is provided outside the electrolytic cell, for conveying an auxiliary volume flow between the cathode circuit and the anode circuit.
    Type: Application
    Filed: September 13, 2018
    Publication date: August 20, 2020
    Applicant: Siemens Aktiengesellschaft
    Inventors: Marc Hanebuth, Günter Schmid, Katharina Meltzer, Dan Taroata
  • Publication number: 20200263312
    Abstract: An electrolytic ozone generator for use with a faucet and methods for assembling and using the same.
    Type: Application
    Filed: May 4, 2020
    Publication date: August 20, 2020
    Inventors: Patrick B. Jonte, Michael Scot Rosko, Todd Andrew Huffington, Kurt Judson Thomas, Derek Allen Brown
  • Publication number: 20200263313
    Abstract: Metallurgical assemblies and systems according to the present technology may include a refractory vessel including sides and a base. The base may define a plurality of apertures centrally located within the base. The sides and the base may at least partially define an interior volume of the refractory vessel. The assemblies may include a lid removably coupled with the refractory vessel and configured to form a seal with the refractory vessel. The lid may define a plurality of apertures through the lid. The assemblies may also include a current collector proximate the base of the refractory vessel. The current collector may include conductive extensions positioned within the plurality of apertures centrally located within the base.
    Type: Application
    Filed: September 17, 2018
    Publication date: August 20, 2020
    Inventors: Robert Hyers, Guillaume Lambotte, Matthew Humbert, Richard Bradshaw
  • Publication number: 20200263314
    Abstract: The present invention provides a zinc or zinc alloy electroplating method comprising: performing energizing in an alkaline zinc or zinc alloy electroplating bath provided with a cathode and an anode, wherein the anode is an anode in which a conductive substrate is coated in a conductive state with alkali-resistant ceramics, the alkaline zinc or zinc alloy electroplating bath is an alkaline zinc plating bath containing an organic compound additive or an alkaline zinc alloy electroplating bath containing an amine chelating agent or an organic compound additive, oxidation decomposition, on a surface of the anode caused by the energizing, of the organic compound additive in the alkaline zinc plating bath or the amine chelating agent and the organic compound additive in the alkaline zinc alloy electroplating bath is suppressed as compared with a case of using as an anode the same conductive substrate uncoated with the alkali-resistant ceramics.
    Type: Application
    Filed: September 20, 2019
    Publication date: August 20, 2020
    Inventors: Toshihiro NIIKURA, Akira HASHIMOTO, Manabu INOUE
  • Publication number: 20200263315
    Abstract: Systems and methods for generating return journey notifications include obtaining a request for navigational directions to a target destination. An outbound journey route from an initial location to the target destination can be determined, wherein the outbound journey route includes an estimated outbound journey time. A return journey route from the target destination to a return destination can be determined, wherein the return journey route includes an estimated return journey time. The outbound journey route and/or return journey route can be determined at least in part from one or more of current traffic conditions or historical traffic conditions. One or more notifications regarding the return journey route can be generated when comparing the estimated outbound journey time to the estimated return journey time results in a determination that one or more predetermined criteria are met.
    Type: Application
    Filed: April 20, 2020
    Publication date: August 20, 2020
    Inventors: Matthew Sharifi, Jakob Foerster
  • Publication number: 20200263316
    Abstract: A substrate holder prevents a substrate to be bent or damaged owing to inward declining of a seal lip. The substrate holder with an opening includes a seal, and a seal support which has a seal support surface, and is formed on an outer circumference of the opening. The seal includes a seal body and a seal lip. At least a part of the seal support surface has an inclination angle that allows an inner end of the seal support surface to approach the plane on which the substrate is to be positioned. The inner end of the seal support surface is positioned on an inner side than the seal lip.
    Type: Application
    Filed: February 13, 2020
    Publication date: August 20, 2020
    Inventors: Shoichiro Ogata, Matsutaro Miyamoto
  • Publication number: 20200263317
    Abstract: A method of manufacturing a group-III nitride crystal includes: a seed crystal preparation step of preparing a plurality of dot-shaped group-III nitrides on a substrate as a plurality of seed crystals for growth of a group-III nitride crystal; and a crystal growth step of bringing surfaces of the seed crystals into contact with a melt containing an alkali metal and at least one group-III element selected from gallium, aluminum, and indium in an atmosphere containing nitrogen and thereby reacting the group-III element with the nitrogen in the melt to grow the group-III nitride crystal.
    Type: Application
    Filed: February 6, 2020
    Publication date: August 20, 2020
    Applicants: OSAKA UNIVERSITY, Panasonic Corporation
    Inventors: Yusuke MORI, Masayuki IMANISHI, Masashi YOSHIMURA, Kousuke MURAKAMI, Shinsuke KOMATSU, Masahiro TADA, Yoshio OKAYAMA
  • Publication number: 20200263318
    Abstract: A bulk SiC single crystal is produced by placing an SiC seed crystal in a crystal growth region of a growth crucible, and introducing SiC source material into an SiC reservoir region, and the bulk SiC single crystal is grown on from an SiC growth gas phase by deposition. The growth crucible is surrounded by an insulation that extends rotationally symmetrically and axially towards the central middle longitudinal axis. The insulation has mutually concentric insulation cylinder components and the insulation is notionally divided into insulation ring segments that are in turn notionally divided into volume elements. The insulation cylinder components are selected and positioned relative to one another such that every volume element of the insulation ring segment in question has a volume element density varying by not more than 10% from an average insulation ring segment density of the insulation ring segment in question.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 20, 2020
    Inventors: BERNHARD ECKER, RALF MUELLER, MATTHIAS STOCKMEIER, MICHAEL VOGEL, ARND-DIETRICH WEBER
  • Publication number: 20200263319
    Abstract: A ScAlMgO4 monocrystalline substrate that is highly cleavable and that does not easily cause cracking in the GaN film id grown on the substrate and a method for manufacturing such a ScAlMgO4 monocrystalline substrate are provided. The ScAlMgO4 monocrystalline substrate has a crystal oxygen concentration of 57 atom % or less as measured by inductively coupled plasma atomic emission spectroscopy analysis.
    Type: Application
    Filed: January 9, 2020
    Publication date: August 20, 2020
    Inventors: KENTARO MIYANO, NAOYA RYOKI, AKIHIKO ISHIBASHI, MASAKI NOBUOKA
  • Publication number: 20200263320
    Abstract: An object of the present invention is to provide a method for producing a group III nitride crystal in which generation of breaking or cracks is less likely to occur. To achieve the object, the method for producing a group III nitride crystal includes: seed crystal preparation including disposing a plurality of crystals of a group III nitride as a plurality of seed crystals on a substrate; and crystal growth including growing group III nitride crystals by contacting a surface of each of the seed crystals with a melt containing at least one group III element selected from gallium, aluminum, and indium and an alkali metal in an atmosphere containing nitrogen. In the seed crystal preparation, the plurality of seed crystals are disposed within a hexagonal region provided on the substrate.
    Type: Application
    Filed: February 17, 2020
    Publication date: August 20, 2020
    Inventors: Yoshio OKAYAMA, Shinsuke KOMATSU, Masahiro TADA, Yusuke MORI, Masayuki IMANISHI, Masashi YOSHIMURA
  • Publication number: 20200263321
    Abstract: A gallium-containing nitride crystals are disclosed, comprising: a top surface having a crystallographic orientation within about 5 degrees of a plane selected from a (0001) +c-plane and a (000-1) ?c-plane; a substantially wurtzite structure; n-type electronic properties; an impurity concentration of hydrogen greater than about 5×1017 cm?3, an impurity concentration of oxygen between about 2×1017 cm?3 and about 1×1020 cm?3, an [H]/[O] ratio of at least 0.3; an impurity concentration of at least one of Li, Na, K, Rb, Cs, Ca, F, and Cl greater than about 1×1016 cm?3, a compensation ratio between about 1.0 and about 4.0; an absorbance per unit thickness of at least 0.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 20, 2020
    Inventors: Wenkan JIANG, Dirk EHRENTRAUT, Mark P. D'EVELYN
  • Publication number: 20200263322
    Abstract: Reduced and low work function materials capable of optimizing electron emission performance in a range of vacuum and nanoscale electronic devices and processes and a method for reducing work function and producing reduced and low work function materials are described. The reduced and low work function materials advantageously may be made from single crystal materials, preferably metals, and from amorphous materials with optimal thicknesses for the materials. A surface geometry is created that may significantly reduce work function and produce a reduced or low work function for the material. It is anticipated that low and ultra-low work function materials may be produced by the present invention and that these materials will have particular utility in the optimization of electron emissions in a wide range of vacuum microelectronics and other nanoscale electronics and processes.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 20, 2020
    Applicant: Borealis Technical Limited
    Inventors: Michael J. Hinton, Joseph M. Fine, Peter Vanderwicken, Jonathan S. Edelson, John D. Birge
  • Publication number: 20200263323
    Abstract: An electrospinning apparatus for the production of fibrous materials includes a compartment having at least one chamber to contain a substance from which fibers are to be formed. The chamber is electrically charged at a chamber potential. The apparatus also includes a collector to collect the fibers from the chamber. The collector is electrically charged at a ground potential different from the chamber potential, thereby establishing an electric field between the chamber and the collector. The chamber includes a forming layer having a plurality of openings through which the substance is extruded into the fibers.
    Type: Application
    Filed: October 24, 2018
    Publication date: August 20, 2020
    Applicant: S2MEDICAL AB
    Inventors: Petter SIVLER, Marten SKOG, Luca CONTI, Daniel AILI, Ranjithkumar RAVICHANDRAN
  • Publication number: 20200263324
    Abstract: What is shown is a spinning device (1) and a method for spinning up a spinning device (1) for the continuous extrusion of molded bodies (3) from a spinning solution (6), as well as a spin-up device (11) for the execution of the method, in which method the molded bodies (3) are extruded from the spinning solution (6) through spinnerets (7) of the spinning device (1) in the form of a loose spinning curtain (2), the molded bodies (3) of the loose spinning curtain (2) are, after the extrusion, combined into a molded body bundle (4), and the molded body bundle (4) is, in a further step, fed to a draw-off member (10) of the spinning device (1) in order to start a continuous extrusion of the molded bodies (3). In order to make the method for spinning up the spinning device (1) simpler and more reproducible, it is proposed that the molded bodies (3) be combined into the molded body bundle (4) by twisting the spinning curtain (2) around a torsion axis (20).
    Type: Application
    Filed: October 8, 2018
    Publication date: August 20, 2020
    Inventors: Franz Alfred Dürnberger, Karl Ladner, Martin Lauber, Daniel Reischl
  • Publication number: 20200263325
    Abstract: A method for improving the quality of a polyester industrial yarn is provided. First, in the cooling process of preparing a polyester industrial yarn prepared by polyester spinning, the longitudinal height is kept unchanged, and the cross-sectional area of the slow cooling chamber is enlarged. The chamber maintains the surface temperature of the spinneret by means of heat preservation, and then uses an oil agent containing 67.30-85.58 wt % crown ether in the oiling process of polyester industrial yarn prepared by polyester spinning. Enlarging the cross-sectional area of the slow-cooling chamber refers to the cross section of the slow cooling chamber is changed from a circular shape to a rectangular shape while keeping the spinneret connected to the slow cooling chamber unchanged. The cleaning cycle of the spinneret is prolonged by 35-45%, the full package rate of polyester industrial yarn is larger than 99%.
    Type: Application
    Filed: July 27, 2018
    Publication date: August 20, 2020
    Applicant: JIANGSU HENGLI CHEMICAL FIBRE CO., LTD.
    Inventors: Hongwei FAN, Damao YANG, Ye ZHANG, Fangming TANG, Huirong ZHAO
  • Publication number: 20200263326
    Abstract: A lightweight heat-preserving fiber and a preparation method thereof are provided, wherein the fiber is prepared by measuring, composite spinneret's extruding, cooling, oiling, drawing, heat setting and winding a polyester melt. The composite spinneret has a hollow spinning hole and a circular spinning hole. The ratio of the micropore length of hollow spinning hole to circular spinning hole equals to the ratio of the equivalent diameter of hollow spinning hole to circular spinning hole multiplies the coefficient K, and the equivalent diameter is the ratio of the cross-sectional area to the circumference of the cross-section, the coefficient K ranges from 0.97 to 1.03. The oil agent contains a crown ether, and the content of the crown ether ranges from 67.30 to 85.58 wt %. The thermal conductivity of a knitted fabric having a basis weight of 100 g/m2 prepared by lightweight heat-preserving fiber is no larger than 0.150 W/m·K.
    Type: Application
    Filed: July 27, 2018
    Publication date: August 20, 2020
    Applicant: JIANGSU HENGLI CHEMICAL FIBRE CO., LTD.
    Inventors: Hongwei FAN, Shanshui WANG, Lixin YIN, Lili WANG
  • Publication number: 20200263327
    Abstract: Provided are: a carbon fiber bundle which has a large value of single-fiber fineness and excellent productivity and which, despite this, contains few interlaced single fibers therein and has excellent spreadability; and precursor fibers which are suitable for use in producing the carbon fiber bundle. The precursor fibers are a carbon-fiber-precursor acrylic fiber bundle which comprises a polyacrylonitrile copolymer comprising 95-99 mol % acrylonitrile units and 1-5 mol % hydroxyalkyl (meth)acrylate units and which has a single-fiber fineness of 1.5-5.0 dtex. In the acrylic fiber bundle, the cross-section of each single fiber which is perpendicular to the fiber axis has a shape that has a roundness of 0.9 or less.
    Type: Application
    Filed: April 28, 2020
    Publication date: August 20, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yuusuke Shinmen, Norifumi Hirota, Takeshi Nii
  • Publication number: 20200263328
    Abstract: A drawing and spinning apparatus of mixed yarns for air spinning machines with multiple feeds comprises at least a first and a second introducer element, an air spinning device, a drawing device, interposed between the introducer elements and the air spinning device, an air spinning chamber, an introducer nozzle shaped to receive the webs from the drawing device into respective insertion channels and introduce the webs into the spinning chamber according to a longitudinal feeding direction. With respect to a cross-section plane perpendicular to the longitudinal feed direction, groove bottoms of each of the two insertion channels of the webs into the chamber are aligned along a segment which is offset by an eccentricity with respect to a geometric centre of the chamber itself, through which a symmetry axis of the spinning chamber passes, the eccentricity being less than 5% of a maximum diameter of the spinning chamber.
    Type: Application
    Filed: October 8, 2019
    Publication date: August 20, 2020
    Applicant: SAVIO MACCHINE TESSILI S.p.A.
    Inventors: Fabio D'AGNOLO, Luca DEOTTO
  • Publication number: 20200263329
    Abstract: The current invention concerns an improved system and method for the manufacturing of alternating S/Z cabled yarn (16) or connected alternating S/Z twist plied yarns, in which tension decrease or increase is avoided by variable longitudinal contraction when twist plying or overtwisting yarns. This longitudinal contraction is very difficult to predict and leads to tension in the yarns, which can affect the quality. This tension can also be reproduced in the installations. This invention tries to improve this by providing a tension compensator (24) that (partially) compensates the tensions and forces between different, subsequent forces for processing yarns.
    Type: Application
    Filed: November 9, 2016
    Publication date: August 20, 2020
    Inventors: Hans Evenepoel, Erik Gilbos, Sigurn Vandenbrande, Björn Quidé