Patents Issued in August 20, 2024
  • Patent number: 12069972
    Abstract: A semiconductor device includes: a first electrode including a carbon layer; a second electrode; a variable resistance layer interposed between the first electrode and the second electrode; and a barrier layer interposed between the first electrode and the variable resistance layer, the barrier layer including nitrogen and carbon. A concentration of the nitrogen in the barrier layer is equal to or higher than that of the carbon in the barrier layer.
    Type: Grant
    Filed: August 2, 2021
    Date of Patent: August 20, 2024
    Assignee: SK hynix Inc.
    Inventor: Ji Sun Han