Abstract: In a photoresist dispensing apparatus for use in manufacturing a semiconductor device, to coercively emit photoresist from a bottle by using a dispensing pump and to pass it through a supply line and a filter to obtain a filtering operation, and to spray the filtered photoresist to a wafer through a spraying nozzle; a bubble removal unit is equipped with the supply line, before the dispensing pump. Large and micro bubbles generated in the midst of flow of photoresist, and foreign substances, are substantially filtered off so as to supply photoresist of a good quality. A floating load in a foreign substance removal filter is substantially removed, thus spraying photoresist under an always uniform and stabilized pressure by using a dispensing pump, to cover a wafer with photoresist in a uniform thickness and obtain a precise pattern formation.

Abstract: An electroless deposition system and electroless deposition stations are provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured to clean and activate a surface of a substrate, a second processing station configured to electrolessly deposit a layer onto the surface of the substrate, and a substrate shuttle positioned to transfer substrates between the first and second processing stations. The electroless deposition station also includes various fluid delivery and substrate temperature controlling devices to perform a contamination free and uniform electroless deposition process.

Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.

Abstract: An apparatus for processing microelectronic topographies, a method of use of such an apparatus, and a method for passivating hardware of microelectronic processing chambers are provided. The apparatus includes a substrate holder configured to support a microelectronic topography and a rotatable case with sidewalls arranged on opposing sides of the substrate holder. The method of using such an apparatus includes positioning a microelectronic topography upon a substrate holder of a processing chamber, exposing the microelectronic topography to a fluid within the processing chamber, and rotating a case of the processing chamber. The rotation is sufficient to affect movement of the fluid relative to the surface of the microelectronic topography. A method for passivating hardware of a microelectronic processing chamber includes exposing the hardware to an organic compound and subsequently exposing the hardware to an agent configured to form polar bonds with the organic compound.

Abstract: A coating apparatus is provided in which a coating liquid supplied onto a surface of a substrate such as a semiconductor wafer and a glass substrate can be easily leveled so as to have a uniform thickness without any edge bead. The coating apparatus comprises a tray, a nozzle for supplying a coating liquid, and a squeegee which serves as an applicator for spreading a coating liquid. The tray has a recessed portion into which a substrate is placed, and a spinner chuck is provided in the recessed portion. In the spinner chuck, a chuck for attracting the substrate is attached to the upper end of a spinner shaft which can be lifted and lowered, and the upper surface of the chuck and the bottom surface of the recessed portion are arranged to be in the same plane in a state where the spinner shaft is lowered to the lowest position.

Abstract: In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.

Abstract: A nozzle for use in a coating apparatus for the application of a coating substance to a stent is provided.

Abstract: Apparatus for the flocking of articles, with a central column which has a rotary drive rotating about a vertical axis, with a least one pallet carrier arranged on the central column and having in each case a pallet, arranged on the pallet carrier, for receiving an article to be flocked, with at least one frame carrier, arranged above the pallets revolving around the vertical axis, for receiving a flocking device, the frame carrier and a frame arranged on it and also the pallet being arranged so as to be moveable in the vertical direction in relation to one another, and the pallet carrier on the central column assuming a plurality of rotary positions predetermined in steps along a circular path with respect to the frame, characterized in that a mechanical actuating device is provided, which lifts off the flocking device at least partially from the frame, so that a stencil arranged on the frame is accessible.

Abstract: As a substrate transportation robot transports an unprocessed substrate W to a substrate transfer position P1, inert gas ejected from a substrate floating head 71 toward the bottom surface of the substrate W floats up the unprocessed substrate W. Driven by an actuator 74, the substrate floating head 71 floating up the unprocessed substrate W then moves down. Upon arrival of the unprocessed substrate W at a substrate processing position P3, a bottom rim portion of the substrate W engages with support pins 3, and as the substrate floating head 71 further moves down, the unprocessed substrate W is transferred to and mounted on the support pins 3. The substrate W is thus positioned at the substrate processing position P3, whereby the bottom rim portion of the substrate W and an opposing surface 5b of a spin base 5 are positioned close to each other and opposed against each other.

Abstract: Film coating unit has a substrate holder for holding a wafer, a coating solution discharge nozzle, and anti-drying boards opposed to a surface of the wafer. The coating solution is applied to the surface of the wafer in a direction from a front end toward a rear end of the wafer while relatively moving the substrate holder with respect to the coating solution discharge nozzle. During that time, the anti-drying boards are disposed at height of maximum 2 mm from the surface of the wafer so as to form dense atmosphere of a solvent between the surface of the wafer and the anti-drying board. Thereby the coating solution on or over the surface of the wafer is restrained from being dried and a coating film is formed with even thickness on or over the surface of the wafer.

Abstract: A film forming apparatus by which uniform and large area films can be formed according to the AD method. The film forming apparatus includes: a film forming chamber; a substrate holder located in the film forming chamber, for holding a substrate on which a structure is to be formed; an exhaust pump for exhausting an interior of the film forming chamber; an aerosol generating unit for generating an aerosol by blowing up a raw material powder placed in a container with a gas; a carrier pipe for introducing the generated aerosol into the film forming chamber; a nozzle for spraying the aerosol introduced via the carrier pipe toward the substrate; and a control unit for chaotically changing a relative position of the substrate held by the substrate holder and the nozzle.

Abstract: Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within a catch cup. A robotic dispense arm and gripper assembly may be positioned within the coating module for gripping and positioning a fluid syringe. An array of syringes may be stored on a solution tray within the wafer track coating module for holding a plurality of fluid syringes containing photoresist solutions.

Abstract: A CoWB film is formed as a cap metal on a Cu interconnection line formed on a substrate or wafer W, by repeating a plating step and a post-cleaning step a plurality of times. The plating step is arranged to apply electroless plating containing CoWB onto the Cu interconnection line. The post-cleaning step is arranged to clean the wafer W by use of a cleaning liquid, after the plating step.

Abstract: The present invention provides a method for applying a coating solution by discharging a coating solution from a slit provided at a tip of a slot-die toward a surface of a web fitted onto a backup roller, the method comprising: a stand-by step of staying the slot-die at a stand-by position having a larger clearance between the slot-die and the web than that of a standard coating process; and a two-stage moving operation including a first moving step in which the slot die is moved to a coating initiation position having a smaller clearance than that of the standard coating process to initiate application of a coating solution, and a second moving step in which the slot die is moved away from the coating initiation position to a standard coating position having the clearance of the standard coating process to perform constant application of the coating solution.

Abstract: An apparatus for dispensing fluid during semiconductor substrate processing operations. The apparatus includes a central fluid dispense bank comprising a plurality of dispense nozzles coupled to a plurality of fluid sources and a first processing chamber positioned to a first side of the central fluid dispense bank. The apparatus also includes a second processing chamber positioned to a second side of the central fluid dispense bank and a dispense arm adapted to translate between the central fluid dispense bank, the first processing chamber, and the second processing chamber.

Abstract: A method of coating a medical appliance is provided that includes vibrating the medical appliance and contacting a material with the medical appliance to form the coating. A medical appliance is provided having a coating applied by a method. The method includes vibrating the medical appliance and contacting a material with the medical appliance to form the coating. A system is provided for coating a medical appliance. The system includes an arrangement for holding the medical appliance and an arrangement for at least one of moving and rotating the arrangement for holding the medical appliance. The system also includes an arrangement for vibrating the medical appliance.

Abstract: A forward direction-only path (first substrate transport path) is formed for transporting substrates in a forward direction to pass the substrates on to an exposing apparatus. A separate, substrate transport path (second substrate transport path) is formed exclusively for post-exposure bake (PEB). Substrate transport along each path is carried out independently of substrate transport along the other. A fourth main transport mechanism is interposed as a predetermined substrate transport mechanism between transfer points consisting of a buffer acting as a temporary storage module for temporarily storing the substrates and a post-exposure bake (PEB) unit corresponding to a predetermined treating unit. This arrangement forms the path for transporting the substrates between the buffer and the PEB unit, to allow PEB treatment of the substrates to be performed smoothly. Similarly, the substrates are transported smoothly to the buffer.

Abstract: An apparatus for introducing a testing material into an optical disc production includes a vessel for holding a test material and a regulator for pressurizing the vessel, wherein the vessel and regulator are connectable to a disc production for using the test material in lieu of bonding material in the disc production.

Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The nozzle of the invention has a plurality of liquid-flow interior discharge-passageways each of which has an inlet connected to a sub-branch tube, which sub-branch tube is, in turn, is fluidly connected to a main branch that, in turn, is connected to a main inlet-passageway having the inlet that is directly connected to mixing head. Each discharge-passageway, or exit-passageway, changes in cross-sectional shape along the longitudinal axis thereof from its inlet to its outlet such that the cross-sectional area from the inlet to the outlet thereof gradually and minimally increases, whereby at least substantial laminar flow of the liquid is achieved with the concomitant reduced dwell-time of the liquid therein, in order to reduce in-nozzle reaction and subsequent clogging of the nozzle.

Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.

Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.

Abstract: An information layer for an optical information storage medium is formed in a centrifuge. A photopolymerizable composition is applied to a solid base having a relief pattern, and a flexible, transparent film layer is applied on top of the composition. The three are spun in a centrifuge to cause a thin, even distribution of the photopolymerizable composition, which is photopolymerized. The resulting replica is separated from the relief pattern and has a fluorescent material applied thereto. Alternatively, the replica has a non-fluorescent material applied thereto, and the non-fluorescent material is made fluorescent through diffusion. Multiple information layers thus formed can be glued together to form a multilayer optical information storage medium.

Abstract: A machine for applying sealant material to non-circular closures using a rotating chuck connected to a rotational motor and a fixedly mounted dispensing apparatus. The chuck is also moved in at least one linear direction in a plane normal to the rotational axis of the chuck. The rotational motor may be connected to the chuck using various mechanisms while minimizing the moving mass of the machine. Sealant applicators are also disclosed that are mounted on a turret and use independently controlled motors, or fully integrated servomotors to rotate the chuck.

Abstract: The machine (4) operates continuously and is a single unit having a prismatic construction and a body with an upper base that incorporates a large rotary platen (1), a number of workstations (5) that are placed in said platen and are provided with diametrically opposite curling and sealing compound lining devices (6) and (7), one or more sets of feeding (8) and discharge (9) devices and common actuation means for these stations (5), internal to the machine (4), which machine may operate with any lids (2) or bases of any profile, adapting to any shape of these by rotating the lids (2) in the workstations (5).

Abstract: The invention provides an apparatus for coating a device comprising a coating chamber and a device rotator having at least one device mount wherein the apparatus allows insertion and retraction of the device on the device mount into and out of the coating chamber. In another aspect, the invention provides a method of applying a substantially uniform coating on a device comprising the steps of providing an apparatus for coating a device, mounting the device onto the device mount, purging the coating chamber to reduce humidity in the coating chamber, maintaining a reduced humidity content in the coating chamber, inserting the device into the coating chamber, disposing a coating material on the device and rotating the device mounts about the device axis.

Abstract: A chemical pump includes a pressure chamber, a partition member for dividing the pressure chamber into a cleaning pressure chamber and a discharging pressure chamber, a filter part disposed on the primary side of the discharging pressure chamber, and a single drive mechanism. A pair of openings with respective check valves mounted therein are provided in each of the cleaning and discharging pressure chambers, and are positioned so as to cause a resist solution to flow only in the +Z direction. The drive mechanism moves the partition member in the ?X direction to cause the resist solution to be sucked into the cleaning pressure chamber and to cause the resist solution to be discharged from the discharging pressure chamber.

Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The outlet of the nozzle is a narrow, elongated slit or opening. However, the interior passageway of the nozzle continually changes shape from the inlet to the outlet thereof, in order to ensure a constant cross-sectional area of the interior passageway along the length thereof, and in order to arrive at the desired narrow, elongated outlet-opening, whereby laminar flow of the liquid polyurethane is achieved with the concomitant reduced dwell-time of the liquid polyurethane therein, in order to reduce build up and clogging of the nozzle.

Abstract: Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within a catch cup. A robotic dispense arm and gripper assembly may be positioned within the coating module for gripping and positioning a fluid syringe. An array of syringes may be stored on a solution tray within the wafer track coating module for holding a plurality of fluid syringes containing photoresist solutions.

Abstract: Disclosed is a photoresist coating apparatus capable of preventing a substrate from being contaminated and preventing a pattern bridge phenomenon from being created in the substrate during an exposure process by shielding backflow of photoresist through forcibly exhausting photoresist to an exterior. The photoresist coating apparatus includes a vacuum chuck for holding a substrate by using vacuum, a driving motor connected to the vacuum chuck through an arm, a first nozzle for coating photoresist onto the substrate, a second nozzle for performing a rinse process, a bath surrounding the vacuum chuck to prevent photoresist from being discharged to an exterior, a first drain pipe connected to both lower ends of the bath in order to discharge photoresist contained in the bath, and a photoresist discharge section for forcibly discharging photoresist contained in the bath to the exterior.

Abstract: A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissolution speed is a desired speed or more from the relation, and developing in a state in which the resist dissolution concentration in the developing solution is the estimated dissolution concentration or less.

Abstract: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The outlet of the nozzle is a narrow, elongated slit or opening. However, the interior passageway of the nozzle continually changes shape from the inlet to the outlet thereof, in order to ensure a constant cross-sectional area of the interior passageway along the length thereof, and in order to arrive at the desired narrow, elongated outlet-opening, whereby laminar flow of the liquid polyurethane is achieved with the concomitant reduced dwell-time of the liquid polyurethane therein, in order to reduce build up and clogging of the nozzle.

Abstract: A processor for processing integrated circuit wafers, semiconductor substrates, data disks and similar units requiring very low contamination levels. The processor has an interface section which receives wafers in standard wafer carriers. The interface section transfers the wafers from carriers onto novel trays for improved processing. The interface unit can hold multiple groups of multiple trays. A conveyor having an automated arm assembly moves wafers supported on a tray. The conveyor moves the trays from the interface along a track to several processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

Abstract: A process and system for applying an adhesive to a core during the production of rolled paper products is disclosed. The system of the present invention is generally directed to the use of pumping devices that meter out constant volumetric amounts of an adhesive onto a core through a plurality of adhesive applicators simultaneously. The systems includes, for instance, a positive displacement pump system in which a fluid at substantially constant pressure is fed to a pumping device for dispensing the adhesive to a plurality of adhesive applicators in constant volumetric amounts.

Abstract: A liquid material supply system in which an inert gas is injected into a material tank accommodating a liquid material so as to discharge the liquid material into a liquid material discharge pipe connected to the material tank and that the inert gas dissolved or mixed in the discharged liquid material is trapped by a gas trap provided on the liquid material discharge pipe, is constructed in such a manner that when a dissolution temperature characteristic of the inert gas with respect to the liquid material is negative, an upstream side of the liquid material discharge pipe with respect to the gas trap is heated while the downstream side of the liquid material discharge pipe with respect to the gas trap is cooled.

Abstract: A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel dispenser with its opened nozzle pointing towards the output face. Uncured gel components contained in the dispenser are outgased prior to application of the gel on the output face while a vacuum is maintained in the chamber. Outgasing takes place at a first chamber orientation with the nozzle pointing upwards through which the outgasing air ventilates. The gel is applied at a second chamber orientation where the output face is horizontal and upwards pointing. Immediately following the gel application, the vacuum is unmade to prevent cooking of the mixed and uncured gel. A glass plate is then pressed against the applied fluid gel.

Abstract: A resin application station has processing units for heating dynamo-electric machine components. In one or more of the processing units batches of components are placed in fixtures on vertically rotating support plates. The vertically rotating support plates are mounted in cabinets. Heated air is circulated in the cabinets to control the ambient temperature. The components travel through regions of the controlled temperature ambient as the support plates rotate and are heated to process temperatures. Intermittent rotation of a support plate in a unit allows loading and unloading of an individual component from the unit while the support plate is stationary. The support plate rotations in all the units are synchronized to increase the station throughput.

Abstract: An apparatus for coating a fabric substrate comprising a housing frame, a continuous moving conveyor moving along a generally circular path and mounted to the housing frame; a plurality of vertically oriented mandrels removably mounted on the conveyor for receiving an article to be coated; a fixed coating station adjacent the path for applying a quantity of a coating to at least a portion of the article to be coated, the coating station including a solenoid for controlling the amount and pattern of the coating substance onto the article to be coated; a pivotable arm for gripping and removing the article to be coated after the coating station, the pivotable arm including a pair of cooperating gripping members for gripping the article to be coated. The coating is a non-sticky, high coefficient of friction polymer with additional components.

Abstract: Methods of coating an implantable device and a system for performing such methods are disclosed. An embodiment of the method includes applying a coating substance to the surface of an implantable device, and rotating the implantable device in a centrifuge. The method can uniformly coat the implantable device with the coating substance and to remove unwanted accumulations of coating substance entrained between struts or crevices in the implantable device body. This system is applicable to methods for coating intraluminal stents, synthetic grafts, and stent coverings with therapeutic compositions comprising therapeutic agents mixed with a polymeric matrix and a solvent.

Abstract: An apparatus and method which is suitable for the bubble-free application of a resin to a substrate. The apparatus typically includes an airtight chamber which receives the substrate and a resin dispenser for dispensing the liquid resin onto the substrate. After a vacuum pressure is induced in the chamber, the resin is dispensed onto the substrate. Accordingly, air is substantially incapable of becoming trapped between the resin and the substrate and forming air bubbles during subsequent processing of the substrate.

Abstract: An apparatus for electroless spray deposition of a metal layer on a substrate, e.g., a Co shunt or barrier layer on a Cu layer on a semiconductor wafer, includes a processing chamber to hold the substrate, the processing chamber including at least one section movable between an open position to allow the substrate to be introduced into and removed from the processing chamber and a closed position to seal the processing chamber to allow for pressurization of the processing chamber. The processing chamber has an inlet to provide pressurizing gas, an exhaust line to exhaust pressurizing gas, a pressure regulator to regulate pressure there-within, and a sprayer to spray an electroless plating solution onto the substrate. A method for electroless spray deposition includes providing the in a processing chamber, sealing the processing chamber, pressurizing the processing chamber, regulating the pressure, and spraying an electroless plating solution onto the substrate.

Abstract: A method and apparatus for plating substrates, wherein the apparatus includes a central substrate transfer enclosure having at least one substrate transfer robot positioned therein. A substrate activation chamber in communication with the central substrate transfer enclosure is provided and is accessible to the at least one substrate transfer robot. A substrate plating chamber in communication with the central substrate transfer enclosure is provided and is accessible to the at least one substrate transfer robot. A substrate spin rinse dry chamber in communication with the central substrate transfer enclosure is provided and is accessible to the at least one substrate transfer robot, and an annealing chamber in communication with the central substrate transfer enclosure is provided and is accessible to the at least one substrate transfer robot. At least one substrate pod loader in communication with the substrate transfer chamber and accessible to the at least one substrate transfer robot is also provided.

Abstract: A thin film of metal or metal compound is produced by preparing an ultrafine particle dispersion liquid by dispersing ultrafine particles at least partly made of metal into a given organic solvent, applying the ultrafine particle dispersion liquid to a substrate, drying the ultrafine particle dispersion liquid to leave metal or metal compound particles on the substrate, heating the metal or metal compound particles to join the metal or metal compound particles, and annealing the metal or metal compound particles into a thin film.

Abstract: In a PECVD (plasma enhanced chemical vapor deposition) apparatus including a reaction chamber; plural susceptors installed inside the reaction chamber and horizontally mounted with a wafer respectively; a heating means for heating the susceptors; a power supply unit installed outside of the reaction chamber; a plasma electrode receiving RF power from the power supply unit, generating and maintaining plasma inside the reaction chamber; and a rotation jet spray having two spray injectors horizontally rotating and supplying gas inside the reaction chamber, a thin film is deposited by supplying BTMSM vapor and oxygen retaining gas through the spray injector, supplying hydrogen retaining gas through the other spray injector and horizontally rotating the spray injectors in the supply. Herein, a pressure in the reaction chamber is in the range of 0.1 Torr˜1 Torr, the wafer is heated at 25° C.˜400° C., and RF power in the range of 100 W˜2000 W is applied.

Abstract: The invention concerns a method which consists in maintaining the two ends (2, 4) of the bar (1) on the end supports (3, 5) of a frame (10), one of the ends (2) being maintained fixed, and in driving the bar in rotation. The invention is characterised in that it consists further in drawing the bar (1) while spraying a coat on the bar, the drawing of the bar corresponding to an elongation of about 0.2 to 0.001%.

Abstract: A substrate (W) is held in an approximately horizontal position by a substrate holder (10) and is rotated by a spinning motor (13). A rinsing liquid supply nozzle (140) is rotatably supported at its one end by a second nozzle movement mechanism (150) and is rotated to pass over the substrate (W). The rinsing liquid supply nozzle (140) is rotated to pass over the substrate (W) and at the same time to discharge a rinsing liquid from its discharge unit. At this time, the rinsing liquid supply nozzle (140) and the substrate (W) are rotated so that a virtual scanning direction (La) of the substrate (W) is substantially perpendicular to a direction of extension of the rinsing liquid supply nozzle (140). That is, since the rinsing liquid supply nozzle (140) is shifted in the virtual scanning direction (La), a non-supplying area of the substrate (W) where a rinsing liquid is not supplied can successively be made up and eliminated as the scanning by the nozzle (140) proceeds.

Abstract: A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.

Abstract: A resist coating unit includes a coater cup surrounding a wafer W held by a spin chuck and an air supply mechanism for blowing an air into the coater cup. The air supply mechanism includes a hollow frame having a first open portion formed in the vertical wall, an air blowing device for blowing an air into the hollow frame, and a filter chamber unit into which the air within the frame is introduced. The filter chamber unit includes a first air introducing chamber having a heater arranged therein, a second air introducing chamber, an air stream control mechanism, and a filter unit. The air flowing within the frame flows into the first air introducing chamber through the first open portion so as to be uniformly heated by the heater and, then, is introduced into the second air introducing chamber. Then, the air uniformly heated by the heater is blown into the coater cup through the air stream control mechanism and the filter unit.

Abstract: A magnetic sealant liner applicator used for applying sealant to a plurality of metal lids. The applicator receiving the metal lids from an infeed conveyor and discharging the metal lids with sealant thereon to a discharge conveyor. The applicator includes a motor driven starwheel. The starwheel is mounted on top of a tabletop and driven in one direction. The starwheel has a plurality of cam followers spaced apart and extending outwardly from its circumference. The cam followers include cam follower bearings adapted for receiving a portion of individual metal lids thereagainst. A plurality of sealant guns are mounted on the starwheel. The sealant guns are under computer control and are disposed next to said cam followers. The sealant guns apply the sealant inside the metal lids. A motor driven magnetic wheel is mounted on top of the tabletop and disposed under the starwheel. The magnetic wheel is driven in an opposite direction from the starwheel.

Abstract: A powder spray booth includes a booth canopy wall arrangement to contain powder during a spraying operation; and a booth floor that is rotatable relative to the booth wall during a spraying operation. The floor can be rotated about an axis that is also the longitudinal axis of the spray booth. The booth may be generally cylindrical in shape with a round floor. The booth canopy and top are supported on a base frame separately from the floor. By this arrangement, the floor can be rotated relative to the booth canopy. A powder extraction apparatus in the form of a low pressure duct suspended off the floor draws up powder that has collected on the floor. The extraction duct is stationary with respect to the rotating floor during a spraying operation. The floor may also be translated along the axis of rotation between a first position in which the floor can rotate and a second position in which the floor is sealed against a lower edge of the booth canopy wall.

Abstract: The invention provides a device for holding a substrate during deposition processes that includes a rotation member rotatable about a first, central axis, and a plurality of substrate holders positioned on the rotation member, the substrate holders being rotatable about second axes. In another aspect, the invention provides a method of applying a substantially uniform coating on a substrate including the steps of providing a device of the invention; mounting a substrate onto the substrate mounts; providing at least one substrate coating station in spaced relation to the substrate mounts; rotating the rotation member about a central axis to position one or more of the substrate mounts at the substrate coating station; supplying the coating through the nozzle; moving the nozzle of the coating station in a direction parallel to the substrate at a predetermined rate to apply a uniform coating on the substrate; and rotating the substrate mounts about the second axes during the coating process.