Abstract: Methods and apparatus for manufacturing a semiconductor light-emitting device that emits white light by forming a phosphor layer on an emission surface of the semiconductor light-emitting device at a wafer-level. The method includes: forming a plurality of light-emitting devices on a wafer; thinning the wafer, on which the plurality of light-emitting devices are formed; disposing the thinned wafer on a carrier film; and forming a phosphor layer on an emission surface of the plurality of light-emitting devices on the wafer.

Abstract: An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

Abstract: A system and method for applying a protective layer to a cotton module of compacted cotton moving in an unloading direction from a cotton module builder through an open end thereof along an unloading surface, the system including application apparatus having at least one applicator in fluid communication with at least one tank for applying a fluid contained in the at least one tank to at least a top surface of the cotton module, the fluid being applied to an exterior of the cotton module in a fluid state and solidifying into a water resistant layer prior to significantly permeating the exterior of the module, so as to capable of being removed therefrom prior to processing of the module.

Abstract: The invention relates to a process and an apparatus for coating a plurality of catalyst support bodies.

Abstract: Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate.

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, a cluster tool for processing a substrate includes a first processing rack, a first robot assembly and a second robot assembly operable to transfer substrates to substrate processing chambers in the first processing rack, and a horizontal motion assembly. The horizontal motion assembly includes one or more walls that form an interior region in which a motor is enclosed. The one or more walls defining an elongated opening through which a robot support interface travels, the robot support interface supporting a robot of the horizontal motion assembly.

Abstract: Apparatus for treating wafers using a wafer carrier rotated about an axis is provided with a ring which surrounds the wafer carrier during operation. Treatment gasses directed onto a top surface of the carrier flow outwardly away from the axis over the carrier and over the ring, and pass downstream outside of the ring. The outwardly flowing gasses form a boundary over the carrier and ring. The ring helps to maintain a boundary layer of substantially uniform thickness over the carrier, which promotes uniform treatment of the wafers.

Abstract: A wafer carrier for use in a chemical vapor deposition apparatus includes at least one region on its outer surface having a substantially different (e.g., lower) emissivity than other regions on the outer surface. The modified emissivity region may be located on the outer edge, the top surface, and/or the bottom surface of the carrier. The region may be associated with one or more wafer pockets of the wafer carrier. The modified emissivity region may be shaped and sized so as to modify the heat transmission through the region, and thereby increase the temperature uniformity across portions of the top surface of the wafer carrier or across individual wafers. The modified emissivity region may be provided by a coating on the outer surface of the wafer carrier.

Abstract: A paint supplying system and apparatus for delivering paint to a container system from a supply of paint at a remote location by a paint delivery system to permit application of the paint delivered to the container by a separate coating implement is provided. The container system includes a vessel having a bottom and a peripheral side wall, the peripheral side wall and the bottom define an open interior space. A connector includes a body with opposed first and second ends, a first port on the first end, a second port on the second end, and a through passage connecting the first and second ports, the body being attached at the first end to the bottom such that the first port is in fluid communication with the open interior space, and connectable at the second end to the hand wand such that the second port is in fluid communication with the supply passage.

Abstract: An alignment tool is used to ensure proper alignment of a component on a rotating gear relative to a non-rotating platter. The alignment tool includes a first arm member coupled to a locating feature on the gear, and a second arm member that is coupled to the first arm member such that the second arm member is movable relative to the first arm member. When the first arm member is coupled to the locating feature, the second arm member locates off the platter to verify proper alignment. The second arm member is cannot be fitted to the platter when there is improper alignment.

Abstract: Provided are a susceptor for a chemical vapor deposition (CVD) apparatus, including: a susceptor body having an upper surface opposed to a lower surface thereof and formed of a light transmitting material, the upper surface thereof having at least one pocket part formed to receive a substrate therein; and a light absorbing unit formed of a light absorbing material on the upper surface of the susceptor body.

Abstract: A coating device includes a shell, a plurality of shaft groups, a plurality of first bases, a second base, and a driving device. The shell defines a coating chamber. The shaft groups are parallelly arranged in a first circle and housed in the coating chamber. Each shaft group includes a plurality of holding shafts parallelly arranged in a second circle and configured for holding workpieces. The first bases are housed in the coating chamber and surround the shaft groups. The second base is housed in the coating chamber and surrounded by the shaft groups. The first and second bases are configured for receiving targets. The driving device is configured for driving each holding shaft to spin.

Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.

Abstract: A method for preparing a surface of a YAG crystal for thermal bonding includes performing an ion implantation process to introduce nitrogen into a surface layer of the YAG crystal to replace depleted oxygen therein, to change surface energy of the surface layer of the YAG crystal and to provide desired bonding characteristics for the surface layer; and joining the ion implanted surface layer with a thermal management device configured to dissipate heat from the YAG crystal. Also, a micro-chip device having a YAG crystal whose surface is prepared with the above disclosed method is provided and a device for forming a metallization pattern on a surface of the YAG crystal is provided.

Abstract: A diameter of a mounting unit of the stage of an ashing processing apparatus is less than a diameter of a mounting unit of the stage of an etching processing apparatus, and the diameter of the mounting unit of the stage of the etching processing apparatus is less than a diameter of an objective item.

Abstract: A stent mandrel fixture for supporting a stent during the application of a coating substance is provided. A method supporting a stent during the application of a coating substance is also provided.

Abstract: A clamping unit for depositing a thin film solar cell and a signal feed-in method are provided. The clamping unit comprises an electrode plate module, a signal feed-in module (201), and a supporting frame. The electrode plate module is set with a shielding cover (204). The signal feed-in module (201) comprises a waist section and a head section, wherein the head section is a rectangular-shaped signal feed-in surface. The head section of the signal feed-in module (201) is surface contacted with and is connected to the feed-in port of the electrode plate module. The feed-in port is set on the concave rectangular surface which is arranged in the central region of the back side of the cathode plate of the electrode plate module. The clamping unit can effectively remove standing wave effect and skin effect, improve the yields and reduce the costs.

Abstract: Provided is a device for treating the inner surface of a cylinder barrel. A cover member (32) is provided, at the lower surface (59) thereof, with seal rings (54, 55, 56). The seal rings (54, 55, 56) are disposed concentrically about the center axis (63) of a cylinder barrel (43, 67). The lower ends of the seal rings (54, 55, 56) are disposed at different levels of height in such a manner that the farther away from the center axis (63), the higher the positions of the lower ends relative to the seal ring (54) closest to the center axis (63).

Abstract: A tool used for covering or shielding a length of baseboard, trim or molding that is connected to a wall being painted. The adjustable protective paint shield has a fixed length center section from which are adapted two telescopic inner sections that extend to a desired length in order to cover or shield varying lengths of baseboard or trim. Each section has a general appearance of an elongated inverted L-shape. The center section has a plurality of pivotally affixed legs used in securing the shield in an upright position. The legs have an outwardly arched shape. The ached shape allows the bottom of the leg to sit securely flat against a floor while supporting the adjustable paint protection shield upright and tightly against a section of baseboard or trim being covered.

Abstract: A mask for masking a stent during a coating procedure may include a mask body that has a negative pattern or an approximate negative pattern of a stent pattern being masked by the mask body. An apparatus for selectively coating a predetermined portion of a medical article may include a dispenser of a coating composition, a mask, a device for creating a relative movement between the mask and the medical article.

Abstract: A support assembly for a stent and a method of using the same to coat a stent are provided. The support assembly provides for minimum contact between the stent and the support assembly so as to reduce or eliminate coating defects.

Abstract: An apparatus for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, a smaller system footprint, and a more repeatable wafer history. Embodiments provide for a cluster tool comprising first and second processing racks, each having two or more vertically stacked substrate processing chambers, a first robot assembly able to access the first processing rack from a first side, a second robot assembly able to access the first processing rack from a second side and the second processing rack from a first side, a third robot assembly able to access the second processing rack from a second side, and a fourth robot assembly able to access the first and second processing racks and to load substrates in a cassette.

Abstract: The present invention relates to an apparatus for applying a coating, preferably a high viscosity coating to a supported web, preferably tissue. The apparatus of the present invention comprises a sealed coating chamber that can be supplied with coating material under pressure. The chamber further comprises a metering device at its trailing edge, which applies a thin layer of coating material to an applicator roll. In general, the coater is designed to have a small footprint, allowing it to fit into tight locations and be readily adapted for use in existing tissue manufacturing and converting processes. The coater also has the advantage of having a sealed coating chamber, which permits coating material to be supplied under pressure and preventing contamination of the coating material by debris common to the coating process.

Abstract: A fixture that allows for quickly preparing, painting and finishing a plurality of door panels that have opposed side surfaces interconnected by a relatively narrow edge. The fixture includes upper and lower horizontal support bars. A plurality of spaced vertical support bars extend between and are slidably attached to the upper and lower horizontal support bars so that the spacing between vertical support bars may be adjusted to accommodate the size of the door panels. A plurality of mounting stations are on the vertical supports. A pair of pins are received by the mounting stations and engage the opposite edges of a panel for pivotal movement, painting and finishing of the panel there between.

Abstract: A production assembly and associated process for mass producing such as a thermoplastic pallet and which utilizes a multiple insert supporting and continuously moving carousels inter-faceable with an input line upon which is transported a plurality of rigid and planar shaped inserts, as well as an output line a spaced relationship from the input line for removing, from the carousel, the resin coated articles. The invention further teaches a series of subset variants for spray applying a two part resin and hardener upon the insert according to a selected thickness, following which the inserts are cured and dried prior to transferring to the output line and in order to create a finished product.

Abstract: A lens holding jig (3) includes a lower holding portion (15) that holds the lower surface of a lens base material (1). The upper surface of the lower holding portion (15) forms support surfaces (16) that support the lower edges (S1, S2) of a cut end surface (1a) of the lens base material (1) at two points. An application liquid release portion (17) running downward is provided at the center of the support surfaces (16). The application liquid release portion (17) is formed from a long hole, a long groove, or a projection.

Abstract: A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.

Abstract: Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.

Abstract: A continuous roll-to-roll apparatus for providing a patterned deposit of a material onto a moving substrate web includes a payout station for feeding out a substrate web, a take-up station for taking up the substrate web, and a web transport system for advancing the web through the apparatus from the payout station to the take-up station. The apparatus includes at least one deposition station disposed between the payout station and the take-up station, and the deposition station is operative to deposit a material onto the web as it moves therethrough. The apparatus includes a masking system associated with a deposition station. The masking system is operative to dispose a deposition mask in registry with a portion of the length of the moving web. The deposition mask is comprised of a plurality of filaments which are aligned with the longitudinal axis of the web.

Abstract: Provided is thin-film formation system including: a first conveying mechanism to convey a substrate and a deposition mask to a substrate carry-in position; a second conveying mechanism to convey the substrate and the deposition mask aligned by an alignment mechanism placed at the substrate carry-in position; a film formation mechanism to laminate a layer of organic material on the substrate in a film formation interval of the second conveying mechanism; and a third conveying mechanism to convey the substrate and the deposition mask which have passed the film formation interval from a carry-out position, in which at least one of the first conveying mechanism and the third conveying mechanism is placed parallel to the second conveying mechanism.

Abstract: Provided is a film formation apparatus capable of causing a substrate and a mask to be in a substantially horizontal state and brought into intimate contact with each other without deforming mask apertures. A region inside a mask frame and outside aperture regions of a mask on a rear surface of a substrate is pressed by a pressing body in lines along two opposing sides of the substrate.

Abstract: The invention relates to systems and methods for forming coatings that can elute active agents and coating produced by the same. In an embodiment, the invention includes an apparatus for applying a coating to a medical device including a first spray nozzle, a first coating composition supply conduit, a second spray nozzle, and a second coating composition supply conduit. In an embodiment, the invention includes a method of applying a coating to a medical device including forming a first spray stream, forming a second spray stream, and directing the spray streams toward the medical device so that the first spray stream intersects the second spray stream before hitting the medical device. In an embodiment, the invention includes an apparatus for applying a coating to a medical device including a spray nozzle, a first coating composition supply conduit and a second coating composition supply conduit.

Abstract: A coating apparatus includes a first coating device, a number of second coating devices and a number of substrate holders. Each of the substrate holders is rotatable relative to the first coating device and the second coating devices such that one of two opposite holding surfaces of the substrate holder alternately faces the first coating device and the second coating devices.

Abstract: This invention relates to a multi-purpose holding device to handle, support and rotate one or more hollow cylindrical objects. The holding device consists of a rigid frame and support members for precise alignment and rotation of one or more objects within the frame structure. A method is also provided to reproducibly support, rotate and inspect the hollow cylindrical objects.

Abstract: A workpiece carrier includes a first carrier and a second carrier. The first carrier includes a plurality of first posts substantially parallel to each other. Each of the first posts is rotatable about a central axis thereof. The second carrier includes a plurality of second posts substantially parallel to each other. Each of the second posts is rotatable about a central axis thereof. The first carrier surrounds the second carrier therein. The workpiece carrier further includes at least one connecting arm interconnected between the first carrier and the second carrier, such that the first carrier and the second carrier are jointly rotatable about a rotation axis.

Abstract: A substrate depositing system comprises a substrate loading chamber for receiving a substrate, a substrate unloading chamber for withdrawing the substrate, at least one process chamber disposed between the substrate loading chamber and the substrate unloading chamber for processing the substrate, and a mask keeping chamber connected to one side of the process chamber(s). A substrate depositing method comprises inputting a substrate into a process chamber, transferring a mask to the process chamber from a mask keeping chamber connected to the process chamber, aligning the substrate and the mask, depositing a depositing material on the substrate while moving a deposition source in the process chamber, and withdrawing the substrate from the process chamber.

Abstract: A plurality of substrate processing devices are disposed in a separated manner within a shared ambient environment. A conveyance device is disposed within the shared ambient environment and is defined to move a substrate through and between each of the substrate processing devices in a continuous manner. Some substrate processing devices are defined to perform dry substrate processing operations in which an energized reactive environment is created in exposure to the substrate in an absence of liquid material. Some substrate processing devices are defined to perform wet substrate processing operations in which at least one material in a liquid state is applied to the substrate. In one embodiment, a complementary pair of dry and wet substrate processing devices are disposed in the shared ambient environment in a sequential manner relative to movement of the substrate by the conveyance device.

Abstract: A head mount for use in a digital manufacturing system, where the head mount comprises a first component supported by at least one gantry of the digital manufacturing system, and a second component configured to retain a deposition head of the digital manufacturing system, and to move relative to the first component in response to a load applied to the deposition head from a platform assembly of the digital manufacturing system.

Abstract: A platform assembly for use in a digital manufacturing system, where the platform assembly comprises a deformable platform having a surface configured to operably receive a deposited material from a deposition head, and at least one mechanism configured to adjust at least a portion of the first surface to compensate for at least one vertical deviation from at least one horizontal axis that the deposition head is directed to move in.

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract: A method of coating the junction area between elongated elements, in particular between electric cables. This method includes the steps of: arranging a rigid tubular support having two axially separable tubular halves; mounting an elastic tubular sleeve in an elastically radially expanded condition on an outer surface of the support; interposing a lubricating material between the support and sleeve; arranging a circumferentially continuous sealing element between the halves to prevent the lubricant from percolating between the halves; positioning the support around the junction area; and moving the halves apart from each other to enable the sleeve to collapse on the junction area. A device for coating the junction area between elongated elements and a method of making the device and a joint for electric cables.

Abstract: An apparatus for electrostatic chucking and dechucking of a semiconductor wafer includes an electrostatic chuck with a number of zones. Each zone includes one or more polar regions around a lift pin that contacts a bottom surface of the semiconductor wafer. The apparatus also includes one or more controllers that control the lift pins and one or more controllers that control the polar regions. The controller for the lift pins receives data from one or more sensors and uses the data to adjust the upward force of the lift pins. Likewise, the controller for the polar regions receives data from the sensors and uses the data to adjust the voltage in the polar regions.

Abstract: A holding device adapted for holding a mask and a substrate during processing is described. The holding device includes a substrate carrier adapted for carrying the substrate; and a mask for masking the substrate, wherein the mask is releasably connected to the substrate carrier; wherein the substrate carrier or the mask has at least one recess adapted for receiving a cover for covering the substrate carrier during deposition.

Abstract: A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.

Abstract: The present invention generally relates to a transport unit for transporting a print support, or substrate, through a plant that deposits print tracks on a surface of the print support. The plant has at least one print station having at least one print head to deposit the print track onto the print support according to a predetermined pattern. The transport unit comprises a transport element having a transport surface facing, during use, toward the print head and on which the print support is disposed during processing. The transport surface comprises a portion covered with an adhesive surface layer upon which the print support is positioned.

Abstract: The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier.

Abstract: A paint cart for transporting at least one component, the paint cart has a frame assembly, and at least one support extending upward from the frame assembly; the support is operable for supporting the component. The paint cart also includes a rotary device mounted to the frame assembly, the rotary device is operable for rotating the support and the component as the paint cart moves along a cart path. The paint cart moves through a paint booth located on the cart path, and there is a paint applicator inside the paint booth used for applying primer or paint to the component mounted to the support. The rotary device rotates the component as the paint cart moves along the cart path through the paint booth.

Abstract: Disclosed herein is a doping apparatus for manufacturing an electrode of an energy storage device. The doping apparatus according to the exemplary embodiment of the present invention includes: a doping chamber body providing a doping space where a process of doping lithium ions onto an electrode plate is performed; a plurality of doping plates laminated vertically in the doping chamber body and containing lithium; and an electrode plate feeder feeding the electrode plate so that the electrode plate passes through gaps among the doping plates.

Abstract: A vacuum coating unit having a pair of side by side transport devices for transporting substrates in a transport direction. Each transport device includes at least one first endless conveyor running in the transport direction and having a conveying element guided around at least two guide rollers or pulleys. The conveying element is located at a distance from a guide device extending in the transport direction parallel to the conveying element in such a way that the ends of the substrates can be introduced into the gap between the conveying element and the guide device of the transport devices and can be moved in the transport direction by the displacement of the conveying elements.

Abstract: Carriers for substrates and to methods for assembling the same in the field of vacuum deposition of thin films. In particular, a carrier for a substrate to be coated in a vacuum chamber includes a first frame comprising two vertical sections and two horizontal sections being dimensioned to surround the substrate; a second dimensioned to define an area of the substrate to be coated, and to cover at least a first part of the first frame to prevent the first part of the first frame from being coated when the second frame is mounted to the first frame. The second frame is detachably mounted to the first frame.