Abstract: There is provided a film-forming device capable of advantageously superimposing and securing a substrate, a weight member, and/or a magnetic body while maintaining the precisely aligned substrate and mask in a superimposed state. The film-forming device is provided with a film-forming mask 5 and film-forming means for forming a thin film on the substrate 6 on which the film-forming mask 5 has been superimposed.

Abstract: An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of forming a substrate electrostatically held on the chuck surface with a surface layer including a substance having volatility in a vacuum chamber. The protective surface may be provided when a low vacuum pumping mode of operation is performed in a vacuum environment surrounding the chuck surface.

Abstract: An apparatus and method for treating a substrate to provide grease and oil resistance the substrate. The apparatus and method includes, applying a first film layer of a non-fluoro grease and oil resistant chemical on the surface of the substrate to form a first film layer on the surface of the substrate. The apparatus also includes applying a second film layer of a water resistant chemical over the first film layer to prevent the first layer from being contacted by water and to hold the first layer to the surface of the substrate.

Abstract: A clamping unit for depositing a thin film solar cell and a signal feed-in method are provided. The clamping unit comprises an electrode plate module, a signal feed-in module (201), and a supporting frame. The electrode plate module is set with a shielding cover (204). The signal feed-in module (201) comprises a waist section and a head section, wherein the head section is a rectangular-shaped signal feed-in surface. The head section of the signal feed-in module (201) is surface contacted with and is connected to the feed-in port of the electrode plate module. The feed-in port is set on the concave rectangular surface which is arranged in the central region of the back side of the cathode plate of the electrode plate module. The clamping unit can effectively remove standing wave effect and skin effect, improve the yields and reduce the costs.

Abstract: Devices and methods for coating wheel rims for the production of both standard rims and special rims, are provided. An example of a device for coating wheel rims includes a pre-treating station that is followed by a powder priming station followed by a basecoat application station and a final coating station, in particular an acrylate powder station, with the final coating station being coupled to both the power priming station and the pre-treating station by at least one conveyor, respectively. The device permits a proportion of special rims to be introduced in addition to standard rims without any impairment of the spindle-synchronous operation of the device.

Abstract: A wafer-supporting device for supporting a wafer thereon adapted to be installed in a semiconductor-processing apparatus includes: a base surface; and protrusions protruding from the base surface and having rounded tips for supporting a wafer thereon. The rounded tips are such that a reverse side of a wafer is supported entirely by the rounded tips by point contact. The protrusions are disposed substantially uniformly on an area of the base surface over which a wafer is placed, wherein the number (N) and the height (H [?m]) of the protrusions as determined in use satisfy the following inequities per area for a 300-mm wafer: (?0.5N+40)?H?53; 5?N<100.

Abstract: A mounting apparatus including: a holding portion capable of holding and releasing an electronic component including a plurality of electrodes; a movement mechanism configured to move the holding portion; a coating portion in which a coating object to be applied onto the plurality of electrodes is set; and a controller configured to control the holding portion to hold the electronic component, control the movement mechanism to move the holding portion to a position above the coating portion, control the holding portion to release the electronic component above the coating portion so that the coating object is applied onto the electrodes, control the holding portion to hold the released electronic component again, control the movement mechanism to move the holding portion to a position above one of a substrate and another electronic component, and control the electronic component to be mounted on one of the substrate and the another electronic component.

Abstract: By means of the device for coating a substrate (2; 102) according to the present invention, a homogeneous coating of the substrate (2; 102) can be achieved. The device comprises a holding and rotating means for holding and rotating the substrate (2; 102) about an axis (A). A disk (3) is provided below the substrate (2; 102). Said disk (3) is arranged coaxially with respect to the substrate (2; 102), has at least the same diameter as the substrate (2; 102) and is able to rotate synchronously with the substrate (2; 102). By means of the disk (3), air swirls at the edge of and below the substrate (2; 102) are avoided during coating of the substrate (2; 102). Thus, it is possible to obtain a homogeneous coating. For being able to load and unload a substrate (2; 102) into and out of the device by means of a conventional gripper system (6), the distance between substrate (2; 102) and disk (3) is increased during loading and unloading.

Abstract: A device for protecting electrode holders in CVD reactors includes an electrode suitable for accommodating a filament rod on an electrode holder which includes an electrically conductive material and is installed in a recess of a bottom plate, wherein an intermediate space between an electrode holder and a bottom plate is sealed by means of a sealing material, and the sealing material is protected by a protective body which is made up of one or more parts and is arranged in a ring-like manner around the electrodes, and the height of the protective body increases at least in sections in the direction of the electrode holder.

Abstract: A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance.

Abstract: A path planning apparatus and method of a robot, in which a path, along which the robot accesses an object to grasp the object, is planned. The path planning method includes judging whether or not a robot hand of a robot collides with an obstacle when the robot hand moves along one access path candidate selected from plural access path candidates along which the robot hand accesses an object to grasp the object, calculating an access score of the selected access path candidate when the robot hand does not collide with the obstacle, and determining an access path plan using the access score of the selected access path candidate.

Abstract: A system is provided that is capable of supporting an object during application of surface coating that would enable access to multiple surfaces of the object while minimizing the impact on any surface that has not dried. The system provides stable support for the object during the application process and allows the coatings of all surfaces to dry with minimal effect on the coated surface. The system comprises a plurality of support units. Each support unit comprises a base portion and a contact portion. Each base portion is adapted to rest stably upon a work platform and contact portion is adapted to contact an underside of the object during application of surface coating. The plurality of support units together supports the object above the work platform.

Abstract: A stent mounting device and a method of coating a stent using the device are provided. The mandrel is made from or is coated with a hydrophobic or hydrophilic material, depending on the type of coating composition that is employed.

Abstract: The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

Abstract: A method for positioning wafers in dual wafer transport, includes: simultaneously moving first and second wafers placed on first and second end-effectors to positions over lift pins protruding from first and second susceptors, respectively; and correcting the positions of the first and second wafers without moving any of the lift pins relative to the respective susceptors or without moving the lift pins relative to each other, wherein when the first and second wafers are moved to the respective positions, the distance between the first wafer and tips of the lift pins of the first susceptor is substantially smaller than the distance between the second wafer and tips of the lift pins of the second susceptor.

Abstract: A deposition mask is used to pattern a thin film 3 on a substrate 10 by depositing deposition particles through a plurality of openings K having a stripe pattern. The deposition mask includes a frame 65; a plurality of mask layers 70 provided in the frame so as to overlap each other; and a support layer 71 provided between the mask layers 70. Each of the mask layers 70 is formed by arranging a plurality of mask wires 72 in a stripe pattern in a tensioned state, and the support layer 71 is formed by arranging a plurality of support wires 74 in a tensioned state so as to cross the mask wires 72. A plurality of gaps 73 in each of the plurality of mask layers 70 overlap each other to form a plurality of through gaps 73a that linearly extend through all of the plurality of mask layers 70. The openings K are formed by the through gaps 73a.

Abstract: A method is disclosed for spin coating a stent. The method comprises conducting the following acts at the same time: applying a coating substance to the stent; rotating the stent about a first axis of rotation; and rotating the stent about a second axis of rotation.

Abstract: There is disclosed a system for forming a superconductor material on a substrate. The system may comprise a dispensing reel; a spooling reel; and at least two modular reaction chambers, wherein at least one modular reaction chamber is connected to a supply of buffer precursor material and at least one other modular reaction chamber is connected to a supply of superconductor precursor material. The modular reaction chambers may include connections capable of being modified to add or remove adjacent components. It is understood that at least one of the spooling reel and/or the dispensing reel are exposed to normal atmosphere. The deposition chamber may also comprise a distribution head that provides a laminar flow of precursor materials onto the substrate, as well as at least one lamp comprising a reflector that directs UV and/or visible light towards the tape substrate to enhance a growth rate of material.

Abstract: A system for forming one or more layers of material on one or more substrates is disclosed. The system includes a susceptor that rotates around a central susceptor axis. One or more holder gears are located on the susceptor. The holder gears may rotate around the central susceptor axis with the susceptor. A central gear engaged to the holder gears may cause the holder gears to rotate around holder axes of the respective holder gears while the holder gears rotate around the central susceptor axis. The susceptor and the central gear may rotate independently.

Abstract: System and method for forming one or more layers of one or more materials on one or more substrates. The system includes a rotating shell, a susceptor component supported by the rotating shell, and a driving component below the susceptor component and configured to drive the rotating shell and the susceptor component to rotate around a susceptor axis. Additionally, the system includes one or more holder gears located on the susceptor component and configured to rotate around the susceptor axis with the susceptor component and support the one or more substrates, and a central gear engaged to the one or more holder gears and configured to cause the one or more holder gears to rotate around one or more holder axes respectively if the one or more holder gears rotate around the susceptor axis. The susceptor axis is different from the one or more holder axes.

Abstract: A system for forming one or more layers of material on one or more substrates is disclosed. The system includes a susceptor that rotates around a central susceptor axis. One or more holder gears are located on the susceptor. The holder gears may rotate around the central susceptor axis with the susceptor. Teeth of at least two adjacent holder gears at least partially overlap without touching. A central gear engaged to the holder gears may cause the holder gears to rotate around holder axes of the respective holder gears while the holder gears rotate around the central susceptor axis.

Abstract: This is a mandrel used to fabricate seamless belts including those used in electrophotographic marking systems. The mandrel has a center core unit with two circular caps on each side. In between the caps is sandwiched a deformable O-ring which is outwardly deformed upon tightening of the two caps together. Once a tubular sheet is placed over the mandrel, the elastomeric O-ring will hold the sheet in place for further processing.

Abstract: An object of the invention is to provide a medium processing device which carries out a plurality of processes, such as plotting and cutting, on a medium, such as paper, wherein there is no need to attach and detach units which carry out the plurality of processes, thus simplifying the structure of the device. A medium processing device, which carries out two kinds of processes on paper with a pen and a cutter, includes a carriage including a pen holder which holds the pen, a cutter holder which holds the cutter, and a changeover unit which, in a condition in which the pen holder is holding the pen and the cutter holder is holding the cutter, reduces and increases the distance between one of the pen and cutter and the paper in comparison with the distance between the other and the paper.

Abstract: A wet-coating apparatus includes a main body, a cleaning agent bin, a coating agent storage bin, a hot-air injector, a heater, and a transport. The main body defines a coating chamber. The coating chamber includes a first sub-chamber, a second sub-chamber, and a third sub-chamber located between the first and second sub-chambers. The cleaning agent storage bin is received in the first sub-chamber. The coating agent storage bin is received in the first sub-chamber and located adjacent to the third sub-chamber. The hot-air injector is received in the third sub-chamber. The heater is received in the second sub-chamber. The transport is located over the cleaning agent storage bin and the coating agent storage bin, and configured to transport a substrate from the first sub-chamber to the second sub-chamber.

Abstract: A system for treating surfaces of objects, in particular for painting objects, in particular vehicle body parts, comprising a treatment booth, which defines a treatment space. The objects are conveyed into and back out of the treatment space by means of a conveying device. The conveying device comprises a conveying element, by means of which a first surface having a first retaining device for at least one object and at least one second surface having a second retaining device for at least one object are provided. The first and the second surface are arranged in such a way that the first or the second surface bounds the treatment space at least in some areas depending on the position of the conveying element.

Abstract: Systems and methods for forming components with thermal barrier coatings are provided. In this regard, a representative method includes: providing a component having a first side and an opposing second side; and using a preformed mask to obstruct vapors from being deposited on the second side of the component while moving the component relative to the vapors such that the vapors form a thermal barrier coating on the first side of the component.

Abstract: The present invention relates to an electro-optical device provided with an electrode (10). The electrode comprising an electrically conductive structure extending in a plane. The structure comprises a grid of elongated elements (12) with length L and a width dimension D in said plane. The electrically conductive structure further comprises one or more contactfields (14) having an inscribed circle with a radius of at least 2D and a circumscribed circle with a radius of at most three times L. The area occupied by the contactfields (14) is at most 20% of the area occupied by the grid of elongated elements (12).

Abstract: Coating systems and processes are disclosed for uniformly coating objects. The system comprises a pre-treatment unit, a first processing unit, a first post-treatment unit and one or more coating apparatus each configured to engage an object and rotate the object around or about two or more axes. The coating apparatus used in the system can comprise a first, second and/or third gimbals connected to rotational mechanisms to allow rotation of the gimbals around or about first, second and/or third axis. An object holder is connected to the third gimbal. When an object is present in the object holder, it can be immersed in a coating solution to form a coated object. The coated object is then rotated around or about two or three axes which produces a multidirectional centrifugal force which causes the coating solution to spread evenly over the surface of the object to produce a uniform thin film.

Abstract: Provided is a full-automatic working apparatus which has a work-object conveying mechanism and can be used on a desk. The desktop working apparatus works a work-object as desired by moving relatively the work-object and a working head.

Abstract: Disclosed are coating apparatus and coating methods to uniformly coat complex objects. The coating apparatus comprises first, second and/or third gimbals connected to rotational mechanisms to allow rotation of the gimbals around or about first, second and/or third axis. When three gimbals are used, an object holder is connected to the third gimbal. When an object is present in the object holder, it can be immersed in a coating solution to form a coated object. After removal from the coating solution, the coated object is then rotated around or about two or three axes which produces a multidirectional centrifugal force which causes the coating solution to spread evenly over the surface of the object to produce a uniform thin film. Coating methods based on the forgoing are also disclosed.

Abstract: A loading device which is used in coating processes includes a base, a loading plate, and a reversing assembly. The base includes an outer frame and a ring-shaped inner frame rotatably positioned on the outer frame. The loading plate defines a number of holes for loading components. The reversing assembly connects the inner frame to the loading plate. The reversing assembly includes two reversing motors and two shafts. The reversing motors are opposite to each other and fixed on the inner frame. The reversing shafts are opposite to each other and positioned in a straight line. One end of each reversing shaft is coupled with a corresponding reversing motor, the other end of each reversing shaft is fixed on the loading plate. The reversing shafts are driven by the reversing motors to reverse the loading plate relative to the inner frame.

Abstract: Coating systems and processes are disclosed for uniformly coating objects. The system comprises a pre-treatment unit, a first processing unit, a first post-treatment unit and one or more coating apparatus each configured to engage an object and rotate the object around or about two or more axes. The coating apparatus used in the system can comprise a first, second and/or third gimbals connected to rotational mechanisms to allow rotation of the gimbals around or about first, second and/or third axis. An object holder is connected to the third gimbal. When an object is present in the object holder, it can be immersed in a coating solution to form a coated object. The coated object is then rotated around or about two or three axes which produces a multidirectional centrifugal force which causes the coating solution to spread evenly over the surface of the object to produce a uniform thin film.

Abstract: A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.

Abstract: A coating device includes a main body defining a first and a second receiving rooms, a base received in the first receiving room for supporting work-pieces, a cleaning device opposing the first receiving room, a spraying device positioned on the top of the first receiving room for spraying coating materials to the work-pieces, a rotary drum device received in the first receiving room for uniformly coating the coating materials on the work-pieces, a heating device opposing the first receiving room for heating the coating materials to form a first film, a drive device for rotating, raising and lowering the base, a transportation device positioned in the second receiving room for transporting the base from the first receiving room to the second receiving room, a vacuum coating device opposing the second receiving room for coating a second film on the work-pieces after completing coating the first film on the work-pieces.

Abstract: A coating apparatus includes a housing, a number of coating chambers, a first lifting rod, a second lifting rod, and a third lifting rod. The housing includes a bottom wall with an opening defined thereon, a first side wall, and a second side wall opposite to the first side wall. The coating chambers are vertically aligned with each other and received in the housing. Each coating chamber defines an inlet and an outlet at two opposite sides thereof, two inlets of each two adjacent coating chambers faces the first side wall and the second side wall respectively. The first lifting rod and the second lifting rod are disposed adjacent to the second side wall and the first side wall respectively for moving a substrate among the coating chambers. The third lifting rod is disposed between the first lifting rod and the second lifting rod for carrying the substrate into and out of the housing through the opening.

Abstract: A sleeve is positioned over a radially-expandable rod assembly and a stent is positioned over the sleeve. A mandrel is inserted into the rod assembly to thereby press the sleeve against the inner surface of the stent and expand the stent. A coating (such as a solvent, a polymer and/or a therapeutic substance) is then applied to the outer (abluminal) surfaces of the stent, by spraying, for example. The sleeve advantageously prevents the coating material from being applied to inner (luminal) surfaces of the stent and also allows the coating material to be efficiently applied to the abluminal surfaces.

Abstract: A support assembly for a stent and a method of using the same to coat a stent are provided. The support assembly provides for minimum contact between the stent and the support assembly so as to reduce or eliminate coating defects.

Abstract: Disclosed is a printed circuit board production apparatus which comprises a first working unit, a second working unit, and a control section. The first working unit includes a board conveying section, and a working mechanism section for subjecting the board conveyed to a given working process, wherein the board conveying section and the working mechanism section are configured to be relatively displaceable between a machine-setup position where a gap defined between the board conveying section and the working mechanism section and leading to the second working unit becomes equal to or less than a given value, and a position where the gap becomes greater than the given value. The board conveying section and the working mechanism section are arranged in the machine-setup position by the control section when machine setup for the first working unit is performed during operation of the second working unit.

Abstract: Jet lines C1, C3, C5, . . . extending in an X-direction and suction lines C2, C4, C6, . . . extending in the X-direction are arranged alternately at a fixed pitch W in a Y-direction. Jet openings 88 are arranged at fixed intervals 3D on the jet lines C2n?1, suction openings 90 are arranged at fixed intervals 3D on the suction lines C2n, and the jet openings 88 and the suction openings 90 on the adjacent ones of the jet lines C2n?1 and the suction lines C2n are spaced apart from each other by a fixed distance D with respect to the X-direction. Slots 88a and 90a are extended straight from the upper ends of the jet openings 88 and the upper ends of the suction openings 90, respectively, in a carrying direction (the X-direction) and a direction opposite the carrying direction.

Abstract: A substrate support for receiving substrates or wafers to be processed and for transporting said substrates or wafers in or through processing installations has universal application, is easily adaptable for specific tasks and is economical in use of material. Within a frame made of longitudinal and transverse supports, a plurality of longitudinal and transverse members are arranged intersecting in a grid-like manner, such that a base grid for directly or indirectly receiving substrates is formed. Both the longitudinal and transverse supports and the longitudinal and transverse members are positively connected to one another.

Abstract: The present invention is directed to an apparatus and method for rapid cooling of a large substrate in a vacuum environment. A first cooled plate is brought into close proximity with one surface of a flat substrate. The spatial volume between the first cooling plate and the substrate is sealed and brought to a higher pressure than the surrounding vacuum level to increase the cooling efficiency. A second cooled plate is brought into close proximity with the opposite surface of the flat substrate. A second spatial volume between the second cooling plate and the substrate is sealed and the gas pressure is equalized to the gas pressure in the first spatial volume. The equalization of the gas pressure on both sides of the flat substrate eliminates deflection of the substrate and bending stress in the substrate.

Abstract: A platen for contacting a liquid to a surface of a substantially flat substrate is disclosed. The platen includes a liquid application station and a stripping element at an end of the liquid application station, wherein the stripping element includes an intersecting gap and an air barrier. Also disclosed are an apparatus including the platen and a method of using the platen to contact a substrate with a liquid.

Abstract: Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks.

Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.

Abstract: A non-adherence coating is applied to portions of article carriers used in paint and coating operations to prevent the adherence of paint, undercoat or other coatings applied to the articles from accumulating on the carrier and requiring high pressure fluid streams to remove the accumulated paint and coatings. Article contact surfaces on the carrier frames are left uncovered. Substantially all of the remaining portions of the carrier frames are coated with the non-adherence coating which can be fluoropolymer. The non-adherence coating can be a fluropolymer, such as tetrofluropolyethylene. A method of cleaning the article carrier from accumulated but non-adhered paint and/or undercoat uses a low pressure fluid stream.

Abstract: A pipe conditioning tool comprising a drive unit to move the tool along a pipe and a work head rotatable about an axis of the pipe to condition a surface of the pipe, the drive unit includes a frame extending to opposite sides of the pipe, the frame having legs extending radially beyond the work head to provide support for the tool upon removal from said pipe.

Abstract: A bandoleer of article carriers includes a carrier band, and a plurality of carrier racks connected with a bottom edge of the carrier band each by means of a connecting plate and arranged at regular intervals. Each carrier rack shows a substantially inverted-V shape and has a pair of elastic arms extending downward from two ends of a bottom edge of the connecting plate and gradually inclined away from each other. Two distal ends of the elastic arms protrude oppositely to each other to form a pair of hook portions. Upper portions of two opposite side edges of the connecting plate oppositely protrude sideward to form two blocking portions. Lower portions of the two opposite side edges of the connecting plate oppositely protrude sideward and then are bent towards two opposite directions perpendicular to the plane of the connecting plate to form two lying-L shaped resisting portions.

Abstract: A method for electrostatic coating of medical devices such as stents and balloons is described. The method includes applying a composition to a polymeric component of a medical device which has little or no conductivity. The polymeric component could be a material from which the body or a strut of the stent is made or could be a polymeric coating pre-applied on the stent. The polymeric component could be the balloon wall. A charge can then be applied to the polymeric component or the polymeric component can be grounded. Charged particles of drugs, polymers, biobeneficial agents, or any combination of these can then be electrostatically deposited on the medical device or the coating on the medical device. One example of the composition is iodine, iodine, iodide, iodate, a complex or salt thereof which can also impart imaging capabilities to the medical device.

Abstract: An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas to the gas inlet of the deposition chamber. At least a portion of the gas system is positioned above the deposition chamber. The gas system includes a mixer configured to mix a plurality of gas streams. A transfer member is in fluid communication with the mixer and the gas inlet. The transfer member comprising a pair of horizontally divergent walls configured to spread the gas in a horizontal direction before entering the gas inlet.

Abstract: A substrate supporting apparatus includes a plate member of an aluminum alloy having a flat upper surface, bottomed pits formed in the plate member, and spacer members held in the pits, individually. The spacer members are sapphire spheres. The diameter of each spacer member is a little smaller than that of each pit. The upper end of each spacer member projects from the upper surface of the plate member. A spot facing is formed in a region that includes the open edge portion of the pit. A bending portion which is obtained by plastically deforming the open edge portion of the pit toward the spacer member is formed on a bottom surface of the spot facing. A V-shaped groove is formed behind the bending portion.