Abstract: The present invention provides an extrusion coating apparatus which can control the coating shape in end portions regardless of the coating thickness and can suppress high edges. The extrusion coating apparatus includes a coating width regulating plate inserted into both end portions of a slit, a slit die discharging the coating solution from a discharge opening of the slit, and a chamber depressurizing in a web running direction on an upstream side. The coating width regulating plate has a protruded portion bent toward the web downstream side and facing the web. The coating solution is applied to the web in a state in which the coating solution is oozed on a web facing surface of the protruded portion of the coating width regulating plate by depressurization of the chamber.

Abstract: The present invention provides film forming method and a droplet discharge method for removing bubbles in a pressurizing chamber to prevent defective discharge without disposing a large amount of materials in a droplet discharging device. Before a material is discharged in the droplet discharging device, a step is provided in which reduced pressure is kept in a pressurizing chamber and a material supply portion, which are connected, to remove bubbles that exist in the pressurizing chamber. A flow path connected to the outside such as an opening of a nozzle surface of the pressurizing chamber or a material supply port of the material supply portion is sealed, and pressure in the pressurizing chamber and the material supply portion is reduced from an inlet and outlet connected to the material supply portion with the use of a reduced pressure means such as a pump.

Abstract: A device for dispersing a sample of dry powder onto a surface in a dispersion chamber. The device includes a dispersion chamber situated in an environment, and a pressure source that provides a pressure difference between the environment and an inside of the dispersion chamber. The surface is positioned in the dispersion chamber. The sample of dry powder is introduced into the dispersion chamber through a membrane that is interposed between the environment and the inside of the dispersion chamber and on which the sample is disposed. The membrane is rupturable so as to open into the dispersion chamber when a predetermined pressure difference across the membrane is exceeded. This permits entry of a fluid in the environment through the ruptured membrane, and movement of the dry powder sample in an evenly dispersed manner without producing an ordered movement of powder grains in the dispersion chamber.

Abstract: A method and apparatus for applying a uniform membrane coating to a substrate, such as a honeycomb structure, having a plurality of through-channels, wherein the through-channels have an average diameter of less than or equal to 3 mm. The method includes providing a liquid precursor comprising membrane-forming materials to the substrate and applying a pressure differential across the substrate. The pressure differential causes the liquid precursor to travel uniformly through the through-channels, depositing the membrane-forming materials on the walls of the through-channels and forming the membrane on the walls of the through-channels. The apparatus includes a chamber capable of holding the substrate and of maintaining a pressure differential across the plurality of through-channels.

Abstract: A method and apparatus for forming a batt of particulate material which may be used in an absorbent article. The apparatus may include a vacuum zone, an air impermeable fence zone adjacent to the vacuum zone, and an air permeable fence zone adjacent to the vacuum zone. The air permeable fence zone may comprise an ambient air entry conduit in communication with an ambient air exit port. The method may include providing a laydown drum and a first web of material, positioning the first web of material substantially adjacent to the laydown drum, generating a vacuum through the laydown drum, depositing particulate matter onto the first web of material, and rotating the laydown drum.

Abstract: Disclosed herein is an apparatus for manufacturing a substrate, including: a first chamber supplying an insulation layer; a second chamber including a roughening roller roughening at least one side of the insulation layer supplied from the first chamber, an evaporator depositing a metal layer on the roughened insulation layer, and a pressing roller pressing the insulation layer and the metal layer; and a third chamber storing the insulation layer including the metal layer formed thereon, the insulation layer being taken out from the second chamber. The apparatus for manufacturing a substrate is advantageous in that substrates are continuously produced, thus increasing the productivity of the substrates and preventing the substrates from being contaminated by the air.

Abstract: The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.

Abstract: To provide a vacuum processing apparatus capable of supporting and conveying a substrate by a method suitable for a processing content in each processing step and capable of suppressing various mechanisms provided within a processing chamber from being adversely affected. More particularly, the CVD chamber of the apparatus is configured to be horizontal, and hence the above-mentioned problem can be solved. Further, by configuring a sputtering apparatus as the vertical type processing apparatus, problems with abnormal electrical discharge can be solved.

Abstract: The invention relates to a device for the continuous coating of a strip-like substrate in a vacuum, especially for producing coating patterns on the substrate, with a printing roller and a backing roller, the substrate guided between the printing roller and the backing roller. The invention device includes a coating or release agent transferable to the substrate via the printing roller and a servo unit that has a controllable servo motor, wherein in a working position adjustable with the servo unit, the printing roller and the backing roller are in operative connection with one another. The object of the invention is to improve the abadjustability of the generic device. The object is achieved by the servo unit's having a controllable servo motor.

Abstract: The present invention provides a method for forming a silicon oxide film, with a substantially uniform film thickness and without being so influenced by dense sites and scattered sites in a pattern provided on an object to be processed, while keeping advantageous points of a plasma oxidation process performed under a lower-pressure and lower-oxygen-concentration condition. In this method, plasma of a processing gas is applied to a surface of the object having a concavo-convex pattern, in a processing chamber of a plasma processing apparatus, so as to oxidize silicon on the surface of the object, thereby forming the silicon oxide film. The plasma is generated under the condition that a ratio of oxygen in the processing gas is within a range of 0.1% to 10% and pressure is within a range of 0.133 Pa to 133.3 Pa.

Abstract: The present invention discloses a composite wood processing method and equipment for unidirectionally pressurizing and filling wood. Original ducts of wood which transport water and nutrients are used primarily to make wood into the composite wood by a unidirectional pressurization method. The processing method puts the wood longitudinally into a pressure vessel, allowing front end parts of the wood to be connected with atmosphere. Next, the wood is sealed with the pressure vessel and a solution is pressurized and filled into the pressure vessel, such that the solution can enter into the wood through the ducts of wood that transport water and nutrients. The composite wood processing method utilizes the original ducts of wood transporting water and nutrients; therefore, the composite wood can be formed by lower pressure and with a saving of energy, thereby having multiple advantages of fast processing, stability, labor saving and time saving.

Abstract: The inventors of this invention conducted a test and found out that to prevent peel-off of an adherent film, it is not of essential importance to set the radius of curvature equal to or larger than a predetermined threshold. The inventors of the present invention also found out that peel-off of an adherent film occurs in the region in which the curvature of a shield changes and is less likely to occur when the change in curvature of the shield is small. Accordingly, the key to the problem is the magnitude of a change in curvature of the shield, so changing the curvature stepwise makes it possible to suppress a large change in curvature, and thus to prevent peel-off of an adherent film free from any disadvantages such as deterioration in film thickness distribution, which may occur due to an increase in size of the shield.

Abstract: The present invention proposes a vacuum/high pressure filling apparatus which can improve the filling rate and shorten the impregnating time period in immersing a porous workpiece into a filling liquid. The vacuum/high pressure filling apparatus includes: an openable and closable hermetic partition chamber unit constituted by two upper and lower split partition wall unit portions, a partition chamber unit opening and closing mechanism to open and close the partition chamber unit, a vacuum suction opening and a pressurizing opening provided for the partition chamber unit, a liquid vessel arranged in the partition chamber unit to receive a filling liquid, a holder arranged, in the partition chamber unit, for the porous workpiece, an elevator unit to move the filling liquid in the liquid vessel and the porous workpiece relative to each other inside the partition chamber unit so as to immerse the porous workpiece into the filling liquid in the liquid vessel and pull up the workpiece from the filling liquid.

Abstract: A device for treating wafers on assembly carriers is disclosed. A wafer to be treated can be fixed on a liquid film that is located between the front side of the wafer and the assembly carrier by freezing of the film.

Abstract: A vacuum processing apparatus has a degassing chamber and does not need a large-sized vacuum evacuation device. In the process of heating and degassing an object to be processed in the degassing chamber, transferring the object to be processed into a processing chamber through a buffer chamber; and performing vacuum processing, the degassing chamber is connected to an vacuum evacuation system having a low evacuation speed and degassing processing is performed in a vacuum atmosphere of 1 to 100 Pa (time 0 to t2). Next, the object to be processed is moved to the buffer chamber, and the pressure inside the buffer chamber is lowered to near the pressure of the processing chamber (time t2 to t3), then the buffer chamber and the processing chamber are connected, and the object to be processed is transferred into the processing chamber.

Abstract: To provide a manufacturing method for an epitaxial wafer that alleviates distortions on a back surface thereof due to sticking between a wafer and a susceptor, thereby preventing decrease in flatness thereof due to a lift pin. A manufacturing method for an epitaxial wafer according to the present invention includes: an oxide film forming step in which an oxide film is formed on a back surface thereof; an etching step in which a hydrophobic portion exposing a back surface of the semiconductor wafer is provided by partially removing the oxide film; a wafer placing step in which the semiconductor wafer is placed; and an epitaxial growth step in which an epitaxial layer is grown on a main surface of the semiconductor wafer; and the diameter of the lift pin installation circle provided on a circle on a bottom face of a susceptor is smaller than that of the hydrophobic portion.

Abstract: The object of the invention is to provide a method and system for impregnating a liner, simultaneously reducing the risk of a void inside the liner after curing. This object is achieved by an impregnation plant (10) comprising a vacuum lock (16) comprising a housing having an inlet (14) and an outlet and defining an ambient pressure space (15) near the inlet and low pressure space (24) near the outlet. The pressure spaces are separated by a seal (20) comprising a first and a second sealing element (22, 23), allowing the fibrous liner (12) to be conveyed there between from the inlet (14) towards the outlet. The liner is degassed by compressing it between the first and second sealing elements (22, 23) and is subsequently relaxed in an uncompressed state inside the low pressure space (24).

Abstract: The present invention refers to a multilayer barrier film capable of encapsulating a moisture and/or oxygen sensitive electronic or optoelectronic device, the barrier film comprises at least one nanostructured layer comprising reactive nanoparticles capable of interacting with moisture and/or oxygen, the reactive nanoparticles being distributed within a polymeric binder, and at least one ultraviolet light neutralizing layer comprising a material capable of absorbing ultraviolet light, thereby limiting the transmission of ultraviolet light through the barrier film

Abstract: A film forming apparatus includes a film forming chamber for performing a film formation; an exhaust unit connected to the film forming chamber to discharge a gas out of the film forming chamber; a holder provided in the film forming chamber to hold a process-objective material; a jetting nozzle provided in the film forming chamber on which a jetting port is formed in a slit shape, and jetting an aerosol containing particulate material to form a film made of the particulate material on the process-objective material; and a shielding member provided at a side of the jetting port in a longitudinal direction of the jetting port to cover a side of a jet flow of the aerosol jetted from the jetting port. Accordingly, it is possible to suppress a turbulence of a flow of the aerosol due to an exhaust flow, and to form the film uniformly.

Abstract: In one embodiment, a system includes a pressure cell adapted for enclosing a porous structure; an inert pressure medium within the pressure cell; and a heat source for heating the porous structure. In another embodiment, a composition of matter includes a crystalline porous structure having a density of about 30 to about 50 mg/cm3. A method according to one embodiment includes positioning an amorphous porous structure in a pressure cell; injecting an inert pressure medium within the pressure cell; and pressurizing the pressure cell to a pressure that thermodynamically favors a crystalline phase of the porous structure over an amorphous phase of the porous structure to transition the amorphous porous structure into a crystalline porous structure. Additional embodiments are also presented.

Abstract: A device for dispersing a sample of dry powder onto a surface in a dispersion chamber. The device includes a dispersion chamber situated in an environment, and a pressure source that provides a pressure difference between the environment and an inside of the dispersion chamber. The surface is positioned in the dispersion chamber. The sample of dry powder is introduced into the dispersion chamber through a membrane that is interposed between the environment and the inside of the dispersion chamber and on which the sample is disposed. The membrane is rupturable so as to open into the dispersion chamber when a predetermined pressure difference across the membrane is exceeded. This permits entry of a fluid in the environment through the ruptured membrane, and movement of the dry powder sample in an evenly dispersed manner without producing an ordered movement of powder grains in the dispersion chamber.

Abstract: In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.

Abstract: A thin film forming apparatus (100) includes: a vacuum chamber (1); a substrate transfer mechanism (40) that is provided in the vacuum chamber (1) and feeds an elongated substrate (8) to a predetermined film forming section (4) that faces a film forming source (27); an endless belt (10) capable of moving in accordance with the feeding of the substrate (8) by the substrate transfer mechanism (40), and configured to define, along an outer peripheral surface of the endless belt itself, a transfer path of the substrate (8) in the film forming section (4) so that a thin film is formed on a surface of the substrate (8) that is being transferred linearly; a through-hole (16) formed in the endless belt (10); and a substrate cooling unit (30) for introducing a cooling gas between the endless belt (10) and a back surface of the substrate (8) through the through-hole (16) from a side of an inner peripheral surface of the endless belt (10) that is moving.

Abstract: [Object] To provide a deposition apparatus and a deposition method that are capable of reducing an evacuation time in an evacuation system having a large condensing load to improve productivity. [Solving Means] A deposition apparatus that forms a film on a plurality of base materials at the same time, includes a support unit including a support section that rotatably supports the plurality of base materials around a rotation shaft, a vacuum chamber including a cylindrical processing chamber that rotatably accommodates the support unit, deposition sources provided inside the vacuum chamber, a low temperature evacuation section including a low temperature condensation source provided opposed to an upper support member on an upper surface of the vacuum chamber, and auxiliary pumps.

Abstract: A film formation apparatus includes: a film forming chamber in which a desired film is formed on a substrate in a vacuum; a loading-ejecting chamber fixed to the film forming chamber with a first opening-closing section interposed therebetween, being capable of reducing a pressure inside the loading-ejecting chamber so as to form a vacuum atmosphere; a second opening-closing section provided at a face opposite to the face of the loading-ejecting chamber on which the first opening-closing section is provided; and a carrier holding the substrate so that a film formation face of the substrate is substantially parallel to a direction of gravitational force, wherein the carrier or the substrate passes through the second opening-closing section, and is transported to the loading-ejecting chamber and is transported from the loading-ejecting chamber; a plurality of carriers is disposed in the loading-ejecting chamber in parallel to each other; the plurality of carriers is transported in parallel between the loading-e

Abstract: Provided is a plasma processing apparatus including: an electrostatic chuck configured to hold a substrate inside a vacuum container, a pulse power source configured to apply a pulse having positive and negative polarities as a bias voltage and a controller configured to control the positive and negative polarities of the pulse.

Abstract: For decades books and other paper documents have been deteriorating in archives and libraries around the world because the acidity of the paper is increasing so much (wherein the pH decreases) that the paper cellulose is decomposing so that the paper loses its cohesion and thereby degenerates in terms of quality. The invention relates to an improved method for de-acidifying paper. The invention also relates to a device for applying such a method.

Abstract: A method and apparatus for surface treatment of footwear, bags, gloves, other leather items or leather-like items. The method includes optional covering a surface or a part of the items which are not to be treated; optional selecting time of operation of a spraying unit; placing items to be treated in a chamber; shutting the chamber and thereby manually or automatically initiating; activating the spraying unit for forming a mist of impregnating agent inside the chamber for applying impregnating agent onto the surfaces of the items; activating an air pump, ventilator or corresponding means for removal of excess impregnating agent from the chamber; and retaining excess impregnating agent in a filter which preferably is a filter containing activated carbon.

Abstract: A powder painting cabin (10) of the type which comprises: a mantle (11) closed above by a roof (12) and below by a base (13), in said mantle (11) there being a passage (14) through which the pieces to be painted (15) pass and passages (19) for retractable powder supplier elements (18), and an air suction duct (30) of the cabin (10). Inside said mantle (11) there is a movable septum (22) between a lowered position close to said base (13) and a raised position close to said roof (12), said two lowered and raised positions defining, with the mantle (11), roof (12) and bottom (13), peripheral passages (26) for the air sucked through the duct (30).

Abstract: An apparatus for producing a multilayer sheet including a resin film, a vapor-deposited metal film and a vapor-deposited polymer film at a low cost and with excellent productivity is provided which comprises: a vacuum chamber which is made to be in a vacuum state by exhaust means; a feeding roller; a take up roller; a first to third rollers, first metal vapor deposition means for forming a first vapor-deposited metal film on one surface of a resin film at a periphery of the first roller; vapor deposition polymerization means for forming a vapor-deposited polymer film on the first vapor-deposited metal film by vapor deposition polymerization at a periphery of the second roller; and second metal vapor deposition means for forming the second vapor-deposited metal film on the other surface of the resin film at a periphery of the third roller.

Abstract: An apparatus and method for solution coating layers onto a substrate of an electronic device. A slot die coater in conjunction with a vacuum assist device is used in priming, coating and cleaning stations to produce thin layers having performance advantages over competing technologies.

Abstract: A seal (40) for sealing an interface between a container and a lid of a process chamber. The seal (40) comprises a metallic or polymeric sealing element (50) and an elastomeric sealing element (60) that are arranged to seal the interface in series, with the metallic or polymeric sealing element (50) being situated to encounter processing activity upstream of the elastomeric sealing element (60).

Abstract: A capsule dusting system is designed to expose capsules to a dusting agent in a controlled manner. The system incorporates a tumbling basket positioned within an enclosure. The tumbling basket is loaded with capsules and is rotatably connected to a drive shaft. A dust injection system meters the dusting agent into the dust injection system. The dust injection system may include a dusting injector that translates between two positions. At one position, the dusting injector is loaded with dusting agent by a powder supply system. At the other position, the dusting injector is positioned to inject the dusting agent into the tumbling basket. A gas is fluidly connected to the dusting injector to cause the dusting agent to disperse into the tumbling basket. The enclosure contains the dusting agent within the system to reduce the environmental, health, and safety hazards associated with airborne particulates.

Abstract: A film forming apparatus including a film forming chamber which forms a film, a jetting mechanism which jets aerosol containing material particles onto a substrate in the film forming chamber, a measuring chamber communicating with the film forming chamber, a measuring mechanism which measures a thickness of the film in the measuring chamber, a pressure adjusting mechanism which controls an internal pressure of the film forming chamber and the measuring chamber, a conveyor which transports the substrate between the film forming chamber and the measuring chamber, and a blocking section which blocks a communication between the film forming chamber and the measuring chamber. Accordingly, inside of the measuring chamber is maintained clean without being polluted with the aerosol, and the measurement precision can be maintained. In the film forming process, the film thickness can be easily and precisely measured, and fed back to the film forming condition.

Abstract: A vacuum processing apparatus includes an evacuatable vacuum chamber, a substrate holder which is provided in the vacuum chamber, has a substrate chuck surface vertically facing down, and includes an electrostatic chuck mechanism which electrostatically chucks a substrate, a substrate support member which is provided in the vacuum chamber to keep the substrate parallel to the substrate chuck surface and support the substrate in an orientation that allows the substrate chuck surface to chuck the substrate, and a moving mechanism which moves at least one of the substrate holder and the substrate supported by the substrate support member so as to bring the substrate and the substrate holder into contact with each other, thereby causing the substrate holder to chuck the substrate.

Abstract: A system (10) is disclosed for treating and consolidating with hardenable resins stone blocks (1) comprising at least one liquid- and gas-tight sheet (2) adapted to form a containing housing (3) of a block (1); at least one permeable layer to the resin arranged between the block (1) and the sheet (2) adapted to create a distance between the block (1) and the sheet (2) through which resin can flow; at least one closing manifold (20), comprising a central body (5) and a cover (6), such closing manifold (20) being equipped with connecting means adapted to connect the interior of the containing housing (3) to at least one pressure control duct, at least one duct (15) connected to a first vacuum pump (21), at least one air inserting duct (19) inside the containing housing (3) and sealingly passing means of at least one resin supplying duct (17) supplied by resin storing, conditioning and mixing means; and an autoclave (13). A process using the system is further disclosed.

Abstract: A thin film deposition apparatus used to manufacture large substrates on a mass scale and that allows high-definition patterning, and a method of manufacturing an organic light-emitting display apparatus using the same, the apparatus includes a loading unit fixing a substrate onto an electrostatic chuck; a deposition unit including a chamber maintained in a vacuum state and a thin film deposition assembly disposed in the chamber, separated from the substrate by a predetermined distance, to deposit a thin film on the substrate fixed on the electrostatic chuck; an unloading unit separating the substrate on which a deposition process is completed, from the electrostatic chuck; a first circulation unit sequentially moving the electrostatic chuck on which the substrate is fixed, to the loading unit, the deposition unit, and the unloading unit; and a second circulation unit returning the electrostatic chuck separated from the substrate to the loading unit from the unloading unit, wherein the first circulation unit

Abstract: A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set.

Abstract: In a process for manufacturing wet wipes and the like products dry cotton pads are formed (1) and delivered to a vacuum chamber (2). Within the vacuum chamber (2) the dry pads are impregnated with liquid under vacuum conditions to evenly distribute liquid throughout the dry pads to form wet pads. The wet pads are then delivered to a packing station (4). The wet pads may be briefly separated at a parting station (5), by air knives for example, prior to delivery to the packing station (4).

Abstract: A method for perfusing a biocompatible material graft with a perfusion liquid includes the steps of: introducing the graft (100) in a perfusion chamber (2), arranging a transfer chamber (3) partly filled with the perfusion liquid (101), coupling in a tight manner the perfusion chamber (2) and the transfer chamber (3) for establishing a fluid communication between them, lowering the pressure in the transfer chamber (3) for transferring therein part of the air existing in the perfusion chamber (2), increasing the pressure within the transfer chamber (3) for injecting in the perfusion chamber (2) the perfusion liquid (101) existing in the transfer chamber (3).

Abstract: A tool includes a chamber, a network, a sensor, a tool controller, and a pressure controller. The network carries messages to and from devices on the network. A header portion of a message indicates a sender of the message and at least one intended recipient of the message. The sensor measures a pressure within the chamber. The sensor, tool controller, and pressure controller are on the network. The pressure controller controls the pressure within the chamber in response to measurements provided by the sensor and in response to a set point provided by the tool controller. The pressure controller processes header portions of all messages carried on the network to determine the intended recipients of each message and processes at least part of data portions of both messages intended for the pressure controller and at least some messages not intended for the pressure controller.

Abstract: The inventive method for dispersing a dry powder sample in a dispersion chamber consists in vacuuming the chamber with respect to the environment, in dispersing a dry powder in the chamber, by means of a suction generated by the rupture of a membrane which is torn.

Abstract: To provide a method of manufacturing a dielectric film having a high dielectric constant. In an embodiment of the present invention, an HfN/Hf laminated film is formed on a substrate on which a thin silicon oxide film is formed and a dielectric film of a metal nitride made of a mixture of Hf, Si, O and N is manufactured by annealing treatment. According to the present invention, it is possible to (1) reduce an EOT, (2) reduce a leak current to Jg=1.0×10?1 A/cm2 or less, (3) suppress hysteresis caused by the generation of fixed charges, and (4) prevent an increase in EOT even if heat treatment at 700° C. or more is performed and obtain excellent heat resistance.

Abstract: There is provided a substrate processing apparatus equipped with a metallic component, with at least a part of its metallic surface exposed to an inside of a processing chamber and subjected to baking treatment at a pressure less than atmospheric pressure. As a result of this baking treatment, a film which does not react with various types of reactive gases, and which can block the out diffusion of metals, is formed on the surface of the above-mentioned metallic component.

Abstract: A method and apparatus by which flowers or food products are treated for the elimination of pathogenic and spoilage bacteria, the scavenging of free radicals that cause oxidative decay, the enhancement of flavor, the stabilization of fats, and the extension of shelf life that consists of alternately exposing the product to a vacuum environment and a saline solution containing organic acids for a predetermined period of time, including such method and means that includes automated devices that is pre-programmed to maximize effectiveness of the process for its intended purpose while minimizing any associated damage to the processed product.

Abstract: A coating device includes a treatment tank capable of being hermetically-sealed, a substrate holder contained in the treatment tank, a rotation mechanism for rotating the substrate holder, a nozzle for spraying a coating material to a substrate held by the substrate holder, and a partial pressure reducer for reducing partial pressure of a volatile component derived from the coating material inside the treatment tank. The coating device not only prevents dust from entering a treatment tank by sealing the treatment tank hermetically, but also reduces unevenness in thickness of the coating film in the case where the coating treatment is performed to a plurality of lenses.

Abstract: A substrate processing apparatus for heating a substrate is provided. The substrate processing apparatus can include a top and bottom planar member. A heater layer can be disposed between the top and the bottom planar member and held in place by evacuating a region between the two planar members. The heater layer can be made of alternating insulating and conducting layers with heater elements formed on the conducting layers in predetermined pattern.

Abstract: A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.

Abstract: A phase-change memory element includes a perovskite layer formed by a material having a perovskite structure, and a phase-change recording material layer which is formed on the perovskite layer, and changes the phase to a crystal state or amorphous state when supplied with an electric current via the perovskite layer.

Abstract: There is provided a liquid processing apparatus capable of preventing an atmospheric air of a lower surface side of a substrate, to which a processing liquid is supplied, from circulating and being introduced into an upper surface side of the substrate, to which the processing liquid is not supplied, and capable of decreasing a fuzzy gas consumption supplied to separate the atmospheres between the lower and upper surface sides from each other. An upper plate 5 is disposed at an opposite side to the upper surface of the substrate maintained horizontally and a gas supplier 53, 531 supplies a pressurized gas into a space formed between the upper plate and the substrate. Also, due to a negative pressure built in a space formed between the upper plate and the substrate, an atmospheric gas outside the space is introduced into the space via a gas inlet port.