Abstract: A can curing oven including a housing assembly, a transfer assembly, and a number of heating units. The housing assembly defines a generally enclosed space. The transfer assembly is structured to support and move a number of can bodies. The transfer assembly includes an elongated transfer belt. The transfer belt is movably coupled to the housing assembly and is structured to move through the housing assembly enclosed space. The number of heating units are structured to generate an effective amount of received heat.

Abstract: A surf wax handling assembly having a base member that is an elongated, rigid body having a slanted scraper at one end and a top portion that includes a pressing surface disposed between two opposing raised side edges; a hollow receptacle member that is a rigid container having an open top, an open bottom, and a hollow interior, with the receptacle member configured to selectively engage with the top portion of the base member such that the pressing surface of the base member encloses the open bottom of the receptacle member; and a press member configured to slide into the open top of the receptacle member and through the hollow interior of the receptacle member so as to press individual wax pieces present into the hollow portion away from the open top and against the pressing surface to form a larger piece that can be immediately reused.

Abstract: A curing apparatus and a curing method are provided. The curing apparatus comprises: a chamber, configured for accommodating a substrate provided with a polyimide adhesive; an air extracting unit, configured for evacuating the chamber; and a heating unit, configured for performing a first heating on the substrate in the case that a first predetermined pressure is reached in the chamber during a evacuating process of the air extracting unit so as to remove organic gases from the polyimide adhesive, and performing a second heating on the substrate after the first heating so as to cure the polyimide adhesive.

Abstract: A system for coating a heat transfer tube for a condenser is disclosed. The system simplifies a process of coating the heat transfer tube, and is able to uniformly coat a plurality of heat transfer tubes. In addition, the system is economically feasible in that coating solution can be reused by collecting and circulating it. Due to super-hydrophobic coating, the size of a droplet condensed on the surfaces of the heat transfer tubes coated by the system can be reduced, and a condensation heat transfer coefficient can be increased.

Abstract: A glaze resistant to wax block bonding, a ceramic resistant to wax block bonding and a preparation process thereof are disclosed. The components of the disclosed glaze are made up of potassium feldspar, lithium feldspar, calcium carbonate, talc, kaolin, wollastonite, quartz, alumina and nanopowder, the components being in the following parts by weight: potassium feldspar 30, lithium feldspar 8, calcium carbonate 10, talc 6, kaolin 10, wollastonite 10, quartz 26, alumina 1 and nanopowder 20. Sources of the starting materials required are abundant, the price is low, the production cost is low, and a glaze surface layer resistant to wax block bonding is formed on the surface of the ceramic resistant to wax block bonding produced, thereby effectively solving the problem of the difficulty of removal of molten wax from the burning of candles which has dripped down and hardened on the surface of ceramic.

Abstract: A spray booth (100) for providing a controlled environment for spraying of particulate material is disclosed. The spray booth (100) is mounted on a support rail, and is movable along the support rail.

Abstract: A process for producing polyurethane coated fertilizer granules having core granules in a rotating drum, wherein the drum has an inlet and an outlet and n application zones arranged along the longitudinal direction of the drum between the inlet and the outlet, n being an integer of at least 2 and wherein each of the application zones is followed by a curing zone. The curing zone after each application zone is arranged to allow an interval of 2-15 minutes, preferably 3-5 minutes, before the application in the successive application zone, wherein the polyol and the isocyanate are applied in the first application zone at a ratio of 0.5-4 wt %, preferably 1-3 wt % of the core granules.

Abstract: The invention relates to a device for coating or encapsulating particles, including a drum (2) which is mounted in a drum chamber (1) of the device in a rotationally drivable manner and which drum (2) can be filled with the product to be coated or to be encapsulated, at least one spray nozzle, which is provided for applying a liquid to the product that is located in the drum (2), at least one drying gas inlet (5) that penetrates the chamber wall of the drum chamber (1), through which drying gas inlet a drying gas can be introduced into the drum chamber (1) and including at least one drying gas outlet (9) that is near the drum (2) on the outer side for channeling the drying gas out of the device.

Abstract: A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part.

Abstract: A cap metal forming method capable of obtaining a uniform film thickness on the entire surface of a substrate is provided. A method for forming a cap metal on a processing surface of a substrate provided with two or more regions having different water-repellent properties, includes: holding the substrate horizontally by a rotatable holding mechanism installed in an inner chamber; supplying a gas between the inner chamber and an outer chamber covering the inner chamber via a gas supply hole provided in a top surface of the outer chamber; forming a pressure gradient between the inner chamber and the outer chamber; and supplying a plating solution to a preset position on the processing surface of the substrate after a pressure of the gas inside the inner chamber reaches a preset value so as to form the cap metal on at least one of the regions.

Abstract: The invention is directed to a process for the continuous acetylation of wood elements. The process particularly combines a batchwise impregnation step, with a continuous reaction step. In order to realize this, a collection step is built-in, so as to allow batches of impregnated wood elements to be fed into a reactor in a continuous manner. Very high acetylation contents can be obtained, at a level that had not been achievable before in a continuous and non-catalyzed acetylation process.

Abstract: It is disclosed a process in continuous for the production of film/leaves or composites comprising the following phases a) preparation of a bi-component mixture to spread and feeding of the mixture to the spreading phase wherein the mixture is prepared, fed and disposed in continuous, in the pot-life time of the mixture itself; b) spreading of the mixture on at least a substrate, wherein the spreading on the substrate and the transport to the crosslinking phase are completed in the pot-life time of the mixture; c) crosslinking of the layer of mixture on said substrate carried out under static condition of the environment and at a variable temperature comprised between 50° C. and 100° C., with control of the temperature value of the coated product carried out in continuous, wherein the transport of the substrate spread during the crosslinking phase is achieved with the substrate spread under flatness conditions. The related apparatus is also disclosed.

Abstract: A plating apparatus 20 includes a substrate holding device 110 configured to hold a substrate W; a discharging device 21 configured to discharge a plating liquid 35 toward the substrate W held by the substrate holding device 110; and a plating liquid supplying device 30 connected to the discharging device 21 and configured to supply the plating liquid 35 to the discharging device 21. A gas supplying device 170 is configured to heat a heating gas G having a higher specific heat capacity than air and supply the heated heating gas G toward the substrate W held by the substrate holding device 110. Further, a controller 160 is configured to control at least the discharging device 21, the plating liquid supplying device 30, and the gas supplying device 170.

Abstract: A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.

Abstract: A chemical fluid handling system is defined to supply a number of chemicals to a number of fluid inputs of a mixing manifold. The chemical fluid handling system includes a number of fluid recirculation loops for separately pre-conditioning and controlling the supply of each of the number of chemicals. Each of the fluid recirculation loops is defined to degas, heat, and filter a particular one of the number of chemical components. The mixing manifold is defined to mix the number of chemicals to form the electroless plating solution. The mixing manifold includes a fluid output connected to a supply line. The supply line is connected to supply the electroless plating solution to a fluid bowl within an electroless plating chamber.

Abstract: A fluid bed granulation process and apparatus, wherein a suitable fluid bed of a particulate material is maintained in a granulator (1) fed by an input flow (F) comprising a growth liquid (L) and by a flow (S1) of seeds adapted to promote the granulation, and wherein a part (F2) of said input flow (F) is taken upstream the feeding of the fluid bed, and used in a seeds generator (33), to produce the seeds for the fluid bed.

Abstract: A film forming device for a solar cell includes a chamber including a body configured to receive a substrate, the chamber defining a hollow portion, a heating device at the hollow portion, and a heat insulating member for surrounding the substrate and the heating device.

Abstract: An apparatus for extracting a bell jar chamber from a processing station of a thin film photovoltaic material is provided. The apparatus includes a rack fixture coupled to a robot loader. The rack fixture is configured to support the bell jar chamber to be moved using the robot loader in a horizontal direction and in a vertical direction. The apparatus further includes at least two support members configured within a vicinity of an upper region of the rack fixture.

Abstract: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.

Abstract: A chemical bath deposition apparatus includes: a reaction vessel for containing a reaction solution for chemical bath deposition to form a film on a surface of a substrate; a substrate holding section for holding the substrate such that at least the surface of the substrate contacts the reaction solution, the substrate holding section including a fixing surface made of stainless steel on which a back side of the substrate is closely fixed; a heater disposed at a rear side of the fixing surface, the heater heating the substrate from the back side of the substrate; and a reaction solution temperature control unit for controlling temperature of the reaction solution in the reaction vessel.

Abstract: The current invention discloses a novel spray booth containing a plurality of spacers disposed on the walls or ceiling, and a plurality of fans attached to the spacers. A spacer allows a fan to be disposed at an angle and at a certain distance away from the wall or ceiling, allowing sufficient airflow for spraying or curing an object within the housing. Having fans emit airflow toward both the top and the sides of an object allows optimal coating and heating of the object. A ceiling fan may also be disposed within a plenum in the ceiling of the spray booth.

Abstract: A device and a method for chemically or electrolytically treating work pieces (1) are proposed in an effort to avoid irregular contours of finest conductive structures, pads and lands as well as bridges (shorts) on the one side or breaks on printed circuit boards on the other side. The device comprises processing tanks (2) for the treating of work pieces and a conveyor system for the transport thereof. The conveyor system comprises at least one transport carriage (18), at least one holding element (14, 25) and at least one connection means (12, 13, 35) between the transport carriage(s) and the holding element(s). The processing tanks adjoined with a clean room zone (3). The work pieces are conveyed through the clean room zone using the conveyor system.

Abstract: Embodiments relate to a fine particle applicator including a loading vessel, a metering roller positioned adjacent the loading vessel, a first stippling roller in contact with the metering roller, a high speed roller, positioned adjacent the metering roller such that bristles of the metering roller and bristles of the high speed roller overlap sufficient to form an interference zone, a second stippling roller, in contact with the high speed roller, a stippling shoe positioned adjacent at least the metering roller and high speed roller and a housing. At least a portion of a surface of the stippling shoe closest to at least the metering roller and high speed roller includes substantially the same curvature as the roller nearest the surface.

Abstract: A method for producing apparatus for producing and photovoltaic device including semiconductor layers with halide heat treated surfaces that increase grain growth within at least one of the semiconductor layers and improve the interface between the semiconductor layers. The halide heat treatment includes applying and heating multiple coatings of a halide compound on surfaces adjacent to or part of the semiconductor layers.

Abstract: The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes.

Abstract: A system and method allows for processing of two groups of medical devices, both groups being alternatingly spray coated within the same enclosure. The two groups repeatedly move back and forth between a spray area and a drying area which is isolated from the spray area. One group moves into the spray area as the other group moves out and into the drying area. Thereafter, the group in the spray area moves out and into the drying area and the other group moves back into the spraying area for a second coating. The alternating process may be repeated any number of times. The spray area may be located inside a sealed spray isolator enclosure and surrounded by gas discharge nozzles.

Abstract: Technologies are generally described for methods and systems of forming a palladium sulfide film on a substrate including flexible substrate. A palladium sulfide precursor may be applied to the substrate. The palladium sulfide precursor may comprise a palladium organothiolate. The palladium sulfide precursor may be heated under reaction conditions sufficient to decompose the palladium sulfide precursor to form the palladium sulfide film or patterns, the latter using various lithography techniques.

Abstract: To provide an apparatus and method of curtain coating for applying onto a running web a coating solution from a lip top in the form of curtain to form a coating thereon, wherein a fluid is blown to remove excessive deposits of the coating solution that are formed at the edges in the width direction of the coating, and the deposits blown away by the fluid are ejected.

Abstract: Shaped metal deposition apparatus comprises a mounting head for mounting a shaped metal deposition device, an inert gas shield for providing an inert atmosphere around shaped metal deposited in use by the shaped metal deposition device, and a rotatable coupling between the mounting head and the inert gas shield to permit relative rotation therebetween.

Abstract: An approach is described for manufacturing wavelength conversion components for lighting devices which employ in-line process controls to minimize the amount of perceptible variation in the amount of photo-luminescent material that is deposited in the wavelength conversion components. Weight measurements are utilized in the manufacturing process to control and minimize the amount of the variations. In this approach, the weight of the product during manufacturing is used as a surrogate to a measure of the amount of photo-luminescent material in the component, and hence a surrogate for the expected color properties of the manufactured product. By measuring and checking for weight variations for the component, one can quickly determine with reasonable confidence whether there are any variations in the amount of photo-luminescent in the component.

Abstract: A semiconductor wafer electroless plating apparatus includes a platen and a fluid bowl. The platen has a top surface defined to support a wafer, and an outer surface extending downward from a periphery of the top surface to a lower surface of the platen. The fluid bowl has an inner volume defined by an interior surface so as to receive the platen, and wafer to be supported thereon, within the inner volume. A seal is disposed around the interior surface of the fluid bowl so as to form a liquid tight barrier when engaged between the interior surface of the fluid bowl and the outer surface of the platen. A number of fluid dispense nozzles are positioned to dispense electroplating solution within the fluid bowl above the seal so as to rise up and flow over the platen, thereby flowing over the wafer when present on the platen.

Abstract: A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate; a chamber having a coating section in which the coating part applies the liquid material on the substrate and a transport section into which the liquid material is transported; an adjusting part which adjusts at least one of oxygen concentration and humidity inside the chamber; and a control part which stops an operation of the coating part in response to the entrance of foreign object into the chamber.

Abstract: A coating device includes a table, a number of coating housings, a carrier, a number of conveyors, and a number of turntables. The coating housings are separately mounted on the table, and each including a hatch formed thereon. The hatches of all the coating housings face towards a same direction. The carrier are used for carrying one or more products to be coated. The conveyors are distributed on the table around each of the coating housing, and respectively extend into the inside of the coating housing through the hatch for delivering the carrier into the coating housings in turn. The turntables are installed between every two adjacent conveyors for transporting the carrier from a preceding conveyor to a succeeding conveyor according to a predefined route, respectively.

Abstract: In a powder spraycoating cabin or substructure for same, a cabin bottom contains bottom flaps configured near outer longitudinal walls and a walk-on bottom part situated between the bottom flaps. The bottom flaps are rotatable about an axis of rotation running in the lengthwise cabin direction, as a result of which the width of lengthwise bottom gaps situated bilaterally about the flaps can be varied. A suction duct is situated underneath. The walk-on bottom part is fitted with compressed-air outlets to blow compressed air toward/into the lengthwise bottom gaps.

Abstract: A system and method for lubricating components where the lubricant is applied in mist form within a substantially enclosed cavity. The cavity contains a draining aperture which collects excess lubricant for subsequent re-use by the system. The cavity is defined by a spray head that includes a base having attached thereto a cover plate with an opening adapted to receive therethrough a component to be lubricated. The cavity and lubrication chamber prevents the escape of excess lubricant. The collection and reuse of excess lubricant provides a closed loop system that reduces lubricant waste.

Abstract: A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air.

Abstract: An apparatus includes an enclosure, at least one process chamber, a robot and at least one valve. The enclosure has a gas therein and at least one door configured to cover an opening into the enclosure. The gas includes at least one reduction gas. The robot is disposed within the enclosure and configured to transfer a substrate between the door and the process chamber. The valve is coupled to the enclosure.

Abstract: A substrate etching apparatus includes a supporting unit for supporting substrate in a vertical position and an etching solution supply unit disposed above the substrate to supply an etching solution to the top of the substrate such that the etching solution runs down both of faces of the substrate from the top of the substrate.

Abstract: The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.

Abstract: Embodiments relate to a fine particle applicator including a loading vessel, a metering roller positioned adjacent the loading vessel, a first stippling roller in contact with the metering roller, a high speed roller, positioned adjacent the metering roller such that bristles of the metering roller and bristles of the high speed roller overlap sufficient to form an interference zone, a second stippling roller, in contact with the high speed roller, a stippling shoe positioned adjacent at least the metering roller and high speed roller and a housing. At least a portion of a surface of the stippling shoe closest to at least the metering roller and high speed roller includes substantially the same curvature as the roller nearest the surface.

Abstract: A painting apparatus for applying a coating material to a member surface of a member comprises a housing, at least one slide rail, a rack assembly, a cross beam and a spraying device. The slide rail may be mountable within the housing and may have a plurality of rack positions. The rack assembly is mountable within the housing at one of the rack positions. The rack assembly is configured to support the member such that the member surface is exposed. The cross beam may be coupled to the slide rail. The cross beam is movable along the slide rail and is positionable at the rack positions. The spraying device is mountable on the cross beam and is configured to move along the cross beam while spraying the coating material onto the member surface.

Abstract: Technologies are generally described for methods and systems of forming a palladium sulfide film on a substrate including flexible substrate. A palladium sulfide precursor may be applied to the substrate. The palladium sulfide precursor may comprise a palladium organothiolate. The palladium sulfide precursor may be heated under reaction conditions sufficient to decompose the palladium sulfide precursor to form the palladium sulfide film or patterns, the latter using various lithography techniques.

Abstract: A method for determining of spraying parameters for controlling a painting appliance which sprays and is moved over an area to be painted, in particular a robot with a painting application. A known spraying map is produced, using known spraying parameters and paint amount, for a predetermined movement speed of the painting appliance, and a paint amount is matched to a new movement speed in comparison to the predetermined movement speed. Furthermore, new spraying parameters are calculated for the adapted paint amount, while maintaining a spraying map which is similar to the known spraying map.

Abstract: A chemical bath deposition method and a system are presented to prepare different thin films on continuous flexible substrates in roll-to-roll processes. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This method and the deposition system deposit thin films onto vertically travelling continuous flexible workpieces delivered by a roll-to-roll system. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the flexible substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.

Abstract: An outer peripheral portion of the silicon wafer is supported by the first susceptor part. The second susceptor part is a close fit in the opening of the first susceptor part to support a portion other than the outer peripheral portion of the silicon wafer. The second susceptor part comes into contact with the outer peripheral portion of the first susceptor part and is disposed in such a manner that a clearance having a predetermined size is formed between the first susceptor part and the second susceptor part and between the opening and the outer peripheral portion thereof. A gas exiting the clearance, which was expanded by heating, is expelled into the chamber via through holes.

Abstract: In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.

Abstract: A droplet jetting applicator includes a coating unit jetting and coating droplets to a to-be-coated object; a storage space storing the to-be-coated object coated with the droplets; an exhaust section exhausting gas in the storage space; an adjustment unit adjusting an outlet flow of the gas exhausted by the exhaust section from the storage space; and a control section controlling the adjustment unit so that the outlet flow is changed in a stepwise manner.

Abstract: A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate, a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the substrate is transported, and a removal unit which removes the liquid material from the inside of the chamber when at least one of oxygen concentration and humidity inside the chamber exceeds a threshold value.

Abstract: A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate; a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the liquid material is transported; and an adjusting part which adjusts at least one of oxygen concentration and humidity inside the chamber.

Abstract: A coating method including coating a liquid material including an oxidizable metal on a substrate a plurality of times to laminate a plurality of liquid material layers on the substrate; and adjusting at least one of oxygen concentration and humidity inside a chamber having a coating space in which the coating part applies the liquid material on the substrate and a transport space into which the liquid material is transported.