Condition Of Coated Material Patents (Class 118/665)
  • Patent number: 10145014
    Abstract: Provided is a film forming apparatus including a placement stage; a processing container that defines a processing chamber which accommodates the placement stage and includes a first region and a second region; a gas supply section that supplies a precursor gas to the first region; and a plasma generation section that generates plasma of a reactive gas in the second region. The plasma generation section includes: at least one waveguide that defines a wave guiding path above the placement stage and above the second region, a microwave generator connected to the at least one waveguide, and a plurality of protrusions made of a dielectric material. The protrusions pass through a plurality of openings formed in a lower conductive part of the at least one waveguide to extend into the second region. The protrusions are arranged in a radial direction with respect an axis of the placement stage.
    Type: Grant
    Filed: April 17, 2013
    Date of Patent: December 4, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Toshihisa Nozawa, Masahide Iwasaki, Toshihiko Iwao
  • Patent number: 9957607
    Abstract: An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: May 1, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Fu-Ching Tung, Ching-Chiun Wang, Shih-Hsiang Lai
  • Patent number: 9896755
    Abstract: The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1?) of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23); a first valve aperture setter (13) that sets the valve aperture of the first valve (17); a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1?) matches a set gas pressure (P1), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: February 20, 2018
    Assignees: PRIMETALS TECHNOLOGIES JAPAN, LTD., NISSHIN STEEL CO., LTD.
    Inventors: Hideaki Suemori, Masayoshi Tanaka, Norikatsu Kakemizu, Takashi Yamamoto, Hisao Morishita, Ryuuichi Yamashita
  • Patent number: 9870933
    Abstract: An apparatus and method for processing wafer-shaped articles utilizes at least first and second liquid-dispensing nozzles, wherein a first liquid-dispensing nozzle is positioned closer to an axis of rotation than the second liquid-dispensing nozzle. A liquid supply system supplies heated process liquid to the nozzles such that process liquid dispensed from the first nozzle has a temperature that differs by an amount within a predetermined range from a temperature of process liquid dispensed from the second liquid-dispensing nozzle.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: January 16, 2018
    Assignee: LAM RESEARCH AG
    Inventors: Philipp Engesser, David Henriks, Anders Joel Bjoerk
  • Patent number: 9808823
    Abstract: A device for applying a free-flowing medium to a continuously conveyed web, wherein the medium can be transferred to the web by a continuously rotating transfer (gravure) roll. An application head is provided in order to transfer the free-flowing medium to the circumference of the gravure roll. The application head includes a chamber which is open toward the circumference of the gravure roll and has an inlet and an outlet for the medium to be applied. The front outer face, in the direction of rotation, of the chamber is delimited by a front doctor blade and the rear outer face, in the direction of rotation, is delimited by a rear doctor blade. Both doctor blades are seated against the circumference of the gravure roll. The front doctor blade can be pressed against the circumference of the gravure roll by a pressing body with an adjustable pressing force.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: November 7, 2017
    Assignee: OLBRICH GMBH
    Inventors: Ralph Pagendarm, Peter Rose
  • Patent number: 9695512
    Abstract: In one embodiment, a semiconductor manufacturing system includes a film forming apparatus configured to form a film on a surface of a wafer. The system further includes a gas supply module configured to supply at least a type of source gas for the film into the film forming apparatus. The system further includes a measurement module configured to measure a discharge amount of an exhaust gas from the film forming apparatus. The system further includes a controller configured to calculate a value corresponding to a surface area of the wafer based on the discharge amount of the exhaust gas from the film forming apparatus, and to control a supply amount of the source gas to the film forming apparatus based on the value corresponding to the surface area of the wafer.
    Type: Grant
    Filed: February 5, 2015
    Date of Patent: July 4, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kazuhiro Matsuo, Fumiki Aiso
  • Patent number: 9486960
    Abstract: A system to fabricate hierarchical graded materials includes a reservoir to contain a material to be deposited, a print head connected to the reservoir to allow the print head to receive the material to be deposited, the print head having a mixing section, and an actuator connected to the print head, the actuator configured to actuate the print head in six axes of motion.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: November 8, 2016
    Assignee: PALO ALTO RESEARCH CENTER INCORPORATED
    Inventors: John Steven Paschkewitz, Gabriel Iftime, Victor Alfred Beck, David Mathew Johnson
  • Patent number: 9409199
    Abstract: A fluid discharging device that discharges fluid from a plurality of discharge openings towards a continuous sheet member which is continuously transported in a transporting direction. The fluid discharging device includes: a plurality of valves that correspond to the discharge openings and intermittently discharge the fluid from the discharge openings by opening and closing operations; and a controller that controls the opening and closing operations of each of the valves individually depending on a transportation amount of the continuous sheet member. The controller has a shared adjustment value that is represented by a value indicating the transportation amount, the controller shifts open-close timing of at least several valves of the a plurality of valves from a previously-determined open-close timing that the several valves are subject to, based on the shared adjustment value.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: August 9, 2016
    Assignee: UNICHARM CORPORATION
    Inventor: Takumi Nakano
  • Patent number: 9339885
    Abstract: An apparatus for dispensing flux-free solder comprises a dispenser head with a stamp to which ultrasound can be applied. Solder is dispensed by: A) moving the dispenser head above a next substrate place, B) lowering the stamp until the working surface of the stamp touches the substrate place or is located at a predetermined height above the substrate place, C) dispensing solder by: C1) advancing the solder wire until the solder wire touches the substrate place, in such a manner that the tip of the solder wire touches the substrate place within a recess of the stamp, C2) further advancing of solder wire to melt a predetermined quantity of solder, and C3) retracting the solder wire, D) moving the dispenser head to distribute the solder on the substrate place, and simultaneously applying ultrasound to the stamp, and E) raising the stamp.
    Type: Grant
    Filed: June 12, 2013
    Date of Patent: May 17, 2016
    Assignee: Besi Switzerland AG
    Inventors: Heinrich Berchtold, Rene Betschart
  • Patent number: 9334569
    Abstract: To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unit 23 for supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition source 21 for a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention means 23a for preventing the matrix substance that has flown off from the above-described vapor deposition source 21 from adhering to the above-described light amount measurement unit.
    Type: Grant
    Filed: November 12, 2012
    Date of Patent: May 10, 2016
    Assignee: SHIMADZU CORPORATION
    Inventors: Kazuteru Takahashi, Kiyoshi Ogawa
  • Patent number: 9157147
    Abstract: The invention relates to a test glass changing system (10) for selectively coating and optically measuring a test glass (24, 24?) in a coating chamber (1) of a vacuum coating installation (3). In the coating chamber, a movable turntable (2) is used to guide substrates (7) on a path through a stream of a coating material. The test glass changing system (10) comprises a test glass holder (8, 8?) with a test glass plate (26) for holding the test glass (24, 24?), and a cover (28, 28?) for selectively covering the test glass plate (26). The test glass changing system (10) also comprises a rotary apparatus (34) for rotating the test glass plate (26) about an axis (51) which is oriented approximately parallel to the axis of rotation (5) of the turntable (2). The test glass holder (8, 8?) can be positioned on the turntable (2) and removed from the coating chamber (1) in the form of a unit.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: October 13, 2015
    Assignee: LEYBOLD OPTICS GMBH
    Inventor: Michael Scherer
  • Patent number: 9156704
    Abstract: Reactor for producing silicon by chemical vapor deposition, the reactor comprising a reactor body that forms a container, at least one inlet for a silicon-bearing gas, at least one outlet, and at least one heating device as a part of or operatively arranged to the reactor, distinctive in that at least one main part of the reactor, which part is exposed for silicon-bearing gas and which part is heated for deposition of silicon on said part, is produced from silicon. Method for operation of the reactor.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: October 13, 2015
    Assignee: Dynatec Engineering AS
    Inventors: Josef Filtvedt, Werner O. Filtvedt
  • Patent number: 9126216
    Abstract: A system for creating a reference mark on a honeycomb core is disclosed. The core has cells that pass from a top face to a bottom face. The system includes a support surface configured to position the honeycomb core, a mounting plate configured to move along a defined path proximate to the top surface of the honeycomb core when positioned on the support surface, and a first nozzle coupled to the mounting plate. The first nozzle is configured to apply a marking material to a portion of the top face of the honeycomb core as the mounting plate passes along the defined path.
    Type: Grant
    Filed: June 17, 2011
    Date of Patent: September 8, 2015
    Assignee: Lockheed Martin Corporation
    Inventors: Craig Scott, Joseph Giannone, Christopher R. Wirz
  • Patent number: 9129843
    Abstract: A method of forming an inductor in a crystal semiconductor layer is provided, including generating an ion beam, directing the ion beam to a surface of the crystal semiconductor layer, applying a magnetic field to the ion beam to generate a helical motion of the ions and forming a three-dimensional helical structure in the crystal semiconductor layer by means of the ions of the ion beam.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: September 8, 2015
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Stefan Flachowsky, Ralf Richter, Peter Javorka, Jan Hoentschel
  • Patent number: 9121705
    Abstract: System for measuring thickness and lateral position of a transparent object. The system includes a camera having a sensor for receiving light, the camera including an objective lens for focusing on an object plane and having an optical axis and a field of view. A source of light is provided to illuminate a surface having variations in reflected light intensity. The surface is spaced apart from the objective lens and disposed at an angle with respect to the optical axis of the objective lens. A transparent object disposed fully or partially between the objective lens and the surface will shift the position of the object plane, the shift in object plane being proportional to the thickness of the object, and the transparent object, when partially inserted between the objective lens and the surface, will focus a fraction of the light on a lower plane, this fraction of light being proportional to the fraction of the lens field of view occupied by the transparent object that is related to lateral position.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: September 1, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Dean Marko Ljubicic, Brian W. Anthony
  • Publication number: 20150114289
    Abstract: A coating equipment for composite membrane without diffusion pump and its thickness gauge for both thick and thin coatings comprises a coating equipment for composite membrane without diffusion pump and a thickness gauge for both thick and thin coatings. A vacuum pump system of the coating equipment for composite membrane without diffusion pump is a roots-type pump system. Compared to conventional diffusion pumps, roots-type pump have advantages of low energy consumption, stable performance, good vacuum-pumping effect, short starting time, etc.
    Type: Application
    Filed: October 25, 2013
    Publication date: April 30, 2015
    Applicant: Shanghai Honghao Enterprise Development CO., LTD
    Inventors: Shengfan Chen, Xiandong Chen, Yuna Jiang, Shengzhen Chen, Fajie Chen
  • Publication number: 20150110949
    Abstract: The system and method of the instant invention utilizes a color sensor in order to monitor and control the application of a coating to a substrate when such coating is transferred onto a substrate from a deposition source. Application of the coating to the substrate is terminated when the color sensor detects a pre-programmed end point evidencing the application of an appropriate coating determined by its color.
    Type: Application
    Filed: September 18, 2014
    Publication date: April 23, 2015
    Inventors: David Konopka, Richard Wang, Jules Abiva, Rod Moore
  • Patent number: 8961690
    Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.
    Type: Grant
    Filed: May 10, 2011
    Date of Patent: February 24, 2015
    Assignee: Applied Materials GmbH & Co. KG
    Inventors: Uwe Hoffmann, Jose Manuel Dieguez-Campo
  • Patent number: 8945666
    Abstract: Systems and methods for adjusting a moisture concentration of veneer are provided. In at least one specific embodiment, the method for adjusting a moisture concentration of a veneer can include estimating a moisture concentration of a veneer surface at one or more locations thereon. The method can also include comparing the one or more estimated locations to a minimum moisture concentration level. The method can also include moisturizing at least a portion of the one or more estimated locations that are below the minimum moisture concentration level to increase the moisture concentration thereof.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: February 3, 2015
    Assignee: Georgia-Pacific Wood Products LLC
    Inventors: Robert E. Jewell, Hudson A. Pope
  • Patent number: 8916241
    Abstract: A can coating machine control system includes a coating control signal that functions as a go/no-go signal based on a plurality of monitored conditions such as can in position, vacuum pressure, gun in position, guard in position and speed condition. Local pressure regulation of the coating material in the spray gun is provided along with optional control of the material temperature. Local pressure regulation allows for optional spray weight control based on a wrap number derived from speed and gun spray durations. A CAN to CAN network buffer is provided as well for primary network isolation. A gun control circuit may be used to select specific gun drive signals and to adjust gun drive signals based on real-time feedback of the actual spray duration.
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: December 23, 2014
    Assignee: Nordson Corporation
    Inventors: James M. Khoury, Charles Nagy, Stephen G. Nemethy, Mark J. Ignatius
  • Publication number: 20140370628
    Abstract: According to the present disclosure, it is possible to prevent particles from being generated and to improve substrate processing quality.
    Type: Application
    Filed: September 3, 2014
    Publication date: December 18, 2014
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventor: Takeo SATO
  • Patent number: 8899174
    Abstract: A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: December 2, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Won-Hyouk Jang, Eu-Gene Kang, Joo-Hwa Lee, Min-Jeong Hwang
  • Patent number: 8875654
    Abstract: The invention provides an apparatus for manufacturing a cylindrical member comprising a cylindrical core body having an outer peripheral surface with a releasing property, the apparatus comprising: a film-forming device that forms a resin film in a region at a central portion from both ends in the axial direction of the outer peripheral surface of the core body; a judging device that judges the deterioration of the releasing property of regions continuous from the region where the resin film is to be formed in the region at the inner side from both ends in the axial direction of the outer peripheral surface of the core body, before the resin film is formed by the film-forming device; and a control device that controls the film-forming device such that the resin film is formed by exposing regions with an undeteriorated releasing property on both ends in the axial direction of the outer peripheral surface of the core body, in accordance with the results of judgment by the judging device.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: November 4, 2014
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yuji Hara, Arimichi Fukuda
  • Patent number: 8826847
    Abstract: According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: September 9, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Takumi Ota
  • Patent number: 8800480
    Abstract: A laser cladding device for applying a coating to a part comprising a laser which can generate laser light, which is adapted to heat the coating and the part, a main body defining a laser light channel adapted to transmit the laser light to the part, a coating channel adapted to transmit the coating to the part, and a vacuum channel and a nozzle having an exit. The nozzle comprises a delivery port at one end of the laser light channel, a coating port at one end of the coating channel, and a vacuum port at one end of the vacuum channel, wherein the vacuum port is positioned generally adjacent the delivery port In operation the vacuum port draws a vacuum, pulling the coating towards the part.
    Type: Grant
    Filed: February 20, 2012
    Date of Patent: August 12, 2014
    Inventors: Ronald Peter Whitfield, Omer Leon Hageniers
  • Publication number: 20140202383
    Abstract: A wafer processing system includes at least one metrology chamber, a process chamber, and a controller. The at least one metrology chamber is configured to measure a thickness of a first layer on a back side of a wafer. The process chamber is configured to perform a treatment on a front side of the wafer. The front side is opposite the back side. The process chamber includes therein a multi-zone chuck. The multi-zone chuck is configured to support the back side of the wafer. The multi-zone chuck has a plurality of zones with controllable clamping forces for securing the wafer to the multi-zone chuck. The controller is coupled to the metrology chamber and the multi-zone chuck. The controller is configured to control the clamping forces in the corresponding zones in accordance with measured values of the thickness of the first layer in the corresponding zones.
    Type: Application
    Filed: March 20, 2014
    Publication date: July 24, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Nai-Han CHENG, Chi-Ming YANG, You-Hua CHOU, Kuo-Sheng CHUANG, Chin-Hsiang LIN
  • Patent number: 8784935
    Abstract: A hot melt adhesive system includes a melting unit configured to liquefy a bulk form of hot melt adhesive and deliver the liquefied hot melt adhesive to an application location. The melting unit includes a controller for establishing and/or verifying at least one system condition, such as temperatures associated with system operation. A machine reading unit is coupled with the controller and is capable of receiving information from a machine readable element and communicating the information to the controller for use in establishing and/or verifying the system condition. A method of operating the system includes scanning information on at least one system condition into the controller from a machine readable element, and using the scanned information during operation of the melting unit.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: July 22, 2014
    Assignee: Nordson Corporation
    Inventors: Rick Pallante, John M. Raterman
  • Patent number: 8747558
    Abstract: The purpose of the invention is increasing the efficiency of utilizing an EL material and providing a deposition method and a vapor deposition apparatus which is one of the film formation systems which are excellent in throughput and uniformity in film thickness in forming an EL layer. According to the invention, evaporation is performed by moving or reciprocating an evaporation source holder in which a plurality of containers (crucible) each encapsulating an evaporation material are set only in an X direction while moving a substrate at regular intervals. Further, in the plurality of evaporation source holders, film thickness meters of adjacent evaporation sources are disposed alternately so as to sandwich the movement pathway of the substrate.
    Type: Grant
    Filed: March 21, 2007
    Date of Patent: June 10, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Junichiro Sakata, Shunpei Yamazaki
  • Patent number: 8746171
    Abstract: A substrate treating system includes a coating apparatus having a resist coating unit, an exposing apparatus having an exposing machine and a heat-treating unit, and a controller for controlling the resist coating unit, exposing machine and heat-treating unit. The controller coordinates schedules of treatment in the coating apparatus and exposing apparatus, such that the coating apparatus can operate efficiently despite an increase in the processing time of the exposing machine.
    Type: Grant
    Filed: August 14, 2008
    Date of Patent: June 10, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Joichi Nishimura
  • Publication number: 20140154402
    Abstract: Silicon sintering method, without applying an external force, comprising placement of a silicon sample in a furnace, then heat treatment of this sample at, at least one temperature and at least one partial pressure of oxidising species to control the thickness of a silicon oxide layer on its surface.
    Type: Application
    Filed: October 14, 2011
    Publication date: June 5, 2014
    Applicants: Commissariat A L'energie Atomique ET Aux Energies Alternatives, Universite Joseph Fourier
    Inventors: Jean-Marie Lebrun, Jean-Michel Missiaen, Celine Pascal, Jean-Paul Garandet, Florence Servant
  • Patent number: 8689731
    Abstract: Disclosed is an apparatus and process for coating a component with aligning device. Alignments or checking of the spray cone take place within the coating apparatus via an optically transparent reference plate which is optically evaluated.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: April 8, 2014
    Assignee: Siemens Aktiengesellschaft
    Inventor: Falk Stadelmaier
  • Patent number: 8642136
    Abstract: A substrate processing method includes performing a deposition process of depositing a thin film on the substrate while depressurizing the inside of the processing chamber and introducing the gas thereinto; and, while the deposition process is being performed, irradiating light, which is transmitted through a monitoring window installed at the processing chamber, toward the inside of the processing chamber through the monitoring window, and monitoring a reflection light intensity of reflection light by receiving the reflection light through the monitoring window. The substrate processing method further includes measuring a temporal variation in the reflection light intensity during the deposition process and calculating a termination time of the deposition process based on a measurement value of the temporal variation; and terminating the deposition process by setting the termination time as an end point of the deposition process.
    Type: Grant
    Filed: October 7, 2009
    Date of Patent: February 4, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Masato Kushibiki, Eiichi Nishimura, Akitaka Shimizu
  • Patent number: 8609442
    Abstract: A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space between a plurality of control plates (81) of a control plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate, while the substrate (10) is moved relative to the vapor deposition mask (70) in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. A difference in the amount of thermal expansion between the vapor deposition source and the control plate unit is detected and corrected. It is thereby possible to form, at a desired position on a large-sized substrate, the coating film in which edge blur and variations in the edge blur are suppressed.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: December 17, 2013
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Inoue, Shinichi Kawato, Tohru Sonoda
  • Publication number: 20130323407
    Abstract: An apparatus for depositing a material layer on a sample inside a vacuum chamber comprises a sample stage (100) for arranging at least one sample (103a, 103b, 103c, 103d); an evaporation source (101, 201), connected to a current source, for a thread-shaped evaporation material (102, 202); a quartz oscillator (105) for measuring the deposited material layer thickness; and an evaluation device (113) associated with the oscillator (105). An electronic control system (112) associated with the evaporation source (101, 201) is configured to deliver electric current in the form of at least two current pulses having a pulse length less than or equal to 1 s. The evaluation device (113) takes into account transient decay behavior of the oscillator (105) immediately after a current pulse to derive the material layer thickness deposited after each pulse. The invention further relates to a method that can be carried out using said apparatus.
    Type: Application
    Filed: May 31, 2013
    Publication date: December 5, 2013
    Inventors: Paul WURZINGER, Anton LANG
  • Patent number: 8578878
    Abstract: A can coating machine control system includes a coating control signal that functions as a go/no-go signal based on a plurality of monitored conditions such as can in position, vacuum pressure, gun in position, guard in position and speed condition. Local pressure regulation of the coating material in the spray gun is provided along with optional control of the material temperature. Local pressure regulation allows for optional spray weight control based on a wrap number derived from speed and gun spray-durations. A CAN to CAN network buffer is provided as well for primary network isolation. A gun control circuit may be used to select specific gun drive signals and to adjust gun drive signals based on real-time feedback of the actual spray duration.
    Type: Grant
    Filed: April 23, 2007
    Date of Patent: November 12, 2013
    Assignee: Nordson Corporation
    Inventors: James M. Khoury, Charles Nagy, Stephen G. Nemethy, Mark J. Ignatius
  • Patent number: 8573149
    Abstract: An apparatus for depositing a ta-C thin film for a magnetic recording medium includes a film deposition chamber; a plasma beam formation portion for supplying a plasma beam to the film deposition chamber to form the ta-C thin film on a substrate with a magnetic recording layer thereon; a substrate holder rotatably arranged in the film deposition chamber; a tilting member for continuously changing an inclination angle of the plasma beam to a surface of the magnetic recording layer; and a rotating member for rotating the substrate about a rotation axis of the substrate holder. A control member rotates the substrate holder with the substrate thereon and operates the tilting member to continuously change the inclination angle from a minimum inclination angle to a maximum inclination angle according to an increase in film thickness of the ta-C thin film being formed by the plasma beam formation portion.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: November 5, 2013
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Katsunori Suzuki, Takeshi Watanabe
  • Patent number: 8574674
    Abstract: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: November 5, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Takashi Tanaka
  • Publication number: 20130280918
    Abstract: Described are apparatus and methods for forming silicon interfacial layers on germanium or III-V materials. Such silicon layers may be deposited by atomic layer deposition at specific temperatures to avoid interdiffusion of silicon and the germanium or III-V material.
    Type: Application
    Filed: April 18, 2013
    Publication date: October 24, 2013
    Inventor: Khaled Z. AHMED
  • Patent number: 8561571
    Abstract: A method of applying a coating solution onto an upper surface of a glass plate that is transported in a substantially horizontal attitude, according to the first aspect of the present invention, the method including the steps of transporting the glass plate into a coating chamber, and opening the plurality of coating nozzles which are positioned in a row at constant intervals therebetween along a curved shape of the upper surface of the glass plate in a width direction of the glass plate perpendicular to the direction of transporting the glass plate by the nozzle position adjusting means and the nozzle height adjusting means, to thereby inject the coating solution when the coating nozzles are located in a region of the upper surface of the glass plate which extends from the leading edge of the glass plate to the rear edge of the glass plate.
    Type: Grant
    Filed: January 21, 2009
    Date of Patent: October 22, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Takafumi Shioi, Tadaaki Nakano, Shigeo Hamaguchi, Yoshinori Akamatsu, Nobuyuki Itakura
  • Patent number: 8561570
    Abstract: A droplet discharge device is configured to control the drive corresponding to a prescribed set of the nozzles selected to discharge droplets during a main scan when the droplets are arranged in the first partition regions, based on a pre-measured distribution of a droplet discharge amount of each of the prescribed set of the nozzles so that the droplet discharge amount approximates a predetermined optimal amount, and to control the drive waveforms corresponding to the nozzles included in a plurality of potential combinations of the nozzles selected to discharge droplets during a main scan when the droplets are arranged in the second partition regions, based on a pre-measured distribution of an average droplet discharge amount calculated from an amount of droplets discharged from the each of the nozzles in all the potential combinations so that the droplet discharge amount approximates the predetermined optimal amount.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: October 22, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Sadaharu Komori, Tsuyoshi Kato, Tamotsu Goto
  • Publication number: 20130264308
    Abstract: A chuck and a wafer supported thereon are rotated during a plasma process or a film deposition process to reduce thickness non-uniformity of a film processed or deposited on the wafer.
    Type: Application
    Filed: April 4, 2012
    Publication date: October 10, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yu-Lung YANG, Ying XIAO, Chin-Hsiang LIN
  • Patent number: 8518209
    Abstract: An apparatus for determining an endpoint of a process by measuring a thickness of a layer is provided. The layer is disposed on the surface by a prior process. The apparatus includes means for providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The apparatus also includes means for exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and means for determining the thickness as a function of time. The apparatus further includes means for ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: August 27, 2013
    Assignee: Lam Research Corporation
    Inventors: Eric Hudson, Douglas Keil, Alexei Marakhtanov
  • Patent number: 8430055
    Abstract: Embodiments of the invention relate to a method and apparatus for coating a medical device. In one embodiment, the method for preparing a substantially uniform coated medical device includes (1) preparing a coating solution comprising a solvent, a therapeutic agent, and an additive; (2) loading a metering dispenser with the coating solution; (3) rotating the medical device about the longitudinal axis of the device and/or moving the medical device along the longitudinal or transverse axis of the device; (4) dispensing the coating solution from the metering dispenser onto a surface of the medical device and flowing the coating solution on the surface of the medical device while the medical device is rotating and/or linearly moving; and (5) evaporating the solvent, forming a substantially uniform coating layer on the medical device.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: April 30, 2013
    Assignee: Lutonix, Inc.
    Inventors: Jeffrey Wang, Harrison Malinoff, Lixiao Wang, Christopher M. Barry, Dennis W. Wahr, Scott R. Naisbitt
  • Patent number: 8394447
    Abstract: The apparatus and method use an optical feedback system to align a brush assembly with a stent strut. Once alignment is achieved, a coating is dispensed onto the stent strut via the brush assembly and the brush assembly is moved along the stent strut to coat the stent strut.
    Type: Grant
    Filed: July 27, 2009
    Date of Patent: March 12, 2013
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventors: Grayson Morris, Svava Maria Atladottir, Carla Pienknagura
  • Patent number: 8381676
    Abstract: A method and apparatus for controlling coating material deposition on to a medical device. Images of material drops in flight are captured and an average single drop volume value is calculated by conversion of the captured drop images to a volume measurement. The average single drop volume value is used to calculate a total number of drops necessary to apply a desired amount of coating. Alternately, material is applied and the amount of material deposited is accumulated and adjustments are made to deposit only a desired amount of coating material. A drop volume is determined for either every drop or a sampling of drops as the drops are being applied. Adjustments to the coating process include changing drop size and changing a number of drops to be deposited.
    Type: Grant
    Filed: June 29, 2010
    Date of Patent: February 26, 2013
    Assignee: Boston Scientific Scimed, Inc.
    Inventors: Eyal Teichman, Avner Schrift
  • Publication number: 20120301601
    Abstract: Systems and methods for adjusting a moisture concentration of veneer are provided. In at least one specific embodiment, the method for adjusting a moisture concentration of a veneer can include estimating a moisture concentration of a veneer surface at one or more locations thereon. The method can also include comparing the one or more estimated locations to a minimum moisture concentration level. The method can also include moisturizing at least a portion of the one or more estimated locations that are below the minimum moisture concentration level to increase the moisture concentration thereof.
    Type: Application
    Filed: May 24, 2012
    Publication date: November 29, 2012
    Applicant: GEORGIA-PACIFIC WOOD PRODUCTS LLC
    Inventors: Robert E. Jewell, Hudson A. Pope
  • Publication number: 20120276282
    Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.
    Type: Application
    Filed: May 10, 2011
    Publication date: November 1, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Uwe HOFFMANN, Manuel CAMPO
  • Publication number: 20120261563
    Abstract: A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.
    Type: Application
    Filed: April 13, 2011
    Publication date: October 18, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Hung Lai, Biow-Hiem Ong, Chia-Shih Lin, Jong-Yuh Chang, Chih-Chiang Tu
  • Publication number: 20120258261
    Abstract: A method for depositing a film includes arranging a substrate in a plasma enhanced chemical vapor deposition chamber. A first ashable hardmask (AHM) layer that is carbon-based is deposited on the substrate. During the depositing of the first AHM layer, doping is performed with at least one dopant selected from a group consisting of silicon, silane, boron, nitrogen, germanium, carbon, ammonia, and carbon dioxide. An atomic percentage of the at least one dopant is greater than or equal to 5% of the first AHM layer.
    Type: Application
    Filed: April 10, 2012
    Publication date: October 11, 2012
    Applicant: Novellus Systems, Inc.
    Inventors: Sirish Reddy, Alice Hollister, Pramod Subramonium, Jon Henri, Chunhai Ji, Zhi Yuan Fang
  • Patent number: 8281735
    Abstract: A squeegee holder including a self-cleaning sliding mechanism, a squeegee blade, two end caps at each end of the squeegee blade. The end caps include a flange and a hole. Two actuating motors are attached to the flanges, the motors include drive shafts pointing downwards. A wiper blade is attached to a blade mount slidable along the squeegee blade and a drill rod is secured at each end with press fittings into the holes in the end caps.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: October 9, 2012
    Assignee: Transition Automation, Inc.
    Inventor: Mark Curtin