Condition Of Coated Material Patents (Class 118/665)
-
Patent number: 7070657Abstract: This invention provides a stable process for depositing an antireflective layer. Helium gas is used to lower the deposition rate of plasma-enhanced silane oxide, silane oxynitride, and silane nitride processes. Helium is also used to stabilize the process, so that different films can be deposited. The invention also provides conditions under which process parameters can be controlled to produce antireflective layers with varying optimum refractive index, absorptive index, and thickness for obtaining the desired optical behavior.Type: GrantFiled: October 15, 1999Date of Patent: July 4, 2006Assignee: Applied Materials Inc.Inventors: David Cheung, Joe Feng, Judy H. Huang, Wai-Fan Yau
-
Patent number: 6982797Abstract: The invention relates to an apparatus for devices for determining properties of thin layers applied on a substrate. This apparatus comprises two changing magazines wherein one magazine is provided for crystal resonators and the other magazine for test glasses. The changing magazine for crystal resonators has the form of a disk and is encompassed by the annular magazine for test glasses. Both can be rotated independently of one another. Each position of the magazines can be reproduced with the aid of sensors and evaluation devices. Consequently, it is possible to carry out multiple coatings.Type: GrantFiled: January 20, 2003Date of Patent: January 3, 2006Assignee: Leybold Optics GmbHInventor: Eckhard Wirth
-
Patent number: 6977012Abstract: A coating equipment managing system for controlling and monitoring a coating equipment of an automobile manufacturing line, comprising local installations which are provided in the manufacturing lines at a plurality of localities, and a central installation for receiving data from the plurality of local installations, wherein the local installation comprises a sensor installed in the coating equipment, a data acquisition unit for receiving signals from the sensor, a control unit for controlling the coating equipment, and a local communication unit; the central installation comprises a server unit and a central analysis unit; the local communication unit transmits the data from the data acquisition unit to the server unit by E-mail; the server unit transmits correction data for the coating equipment obtained from the analysis of the measured data by the central analysis unit to the local communication unit by E-mail; and the local communication unit converts the correction data into a control code and transmitType: GrantFiled: June 25, 2002Date of Patent: December 20, 2005Assignee: Kansai Paint Co., Ltd.Inventors: Kenichi Nobutoh, Jun Suzuno
-
Patent number: 6946157Abstract: In a method of monitoring the formation of a coating on a single particle (P), an apparatus is used which comprises means (2,5,6,9) for arranging said particle (P) at a given spatial location, and a fluid supply unit (3) adapted to apply a coating fluid to the particle (P) such that the coating is formed. Further, the apparatus has a measurement unit (4) which is adapted to perform a spectrometric measurement on the coating during formation thereof, and to derive a measurement value of at least one principle parameter related to the coating. This, such principle parameters, for example the thickness, thickness growth rate and physical and/or chemical properties related to the quality of the coating, as well as heat, mass and momentum transfer, can be continuously and non-invasively monitored during the coating process on the single particle (P).Type: GrantFiled: January 8, 2001Date of Patent: September 20, 2005Assignee: AstraZeneca ABInventors: Staffan Folestad, Ingela Niklasson Björn, Anders Rasmuson, Daniel Ström
-
Patent number: 6936106Abstract: An integrated paint quality control (IPQC) system for feedback control of paint process for painting vehicle bodies includes a film thickness sensor system for measuring paint film thickness of the painted bodies. The IPQC system also includes a control system communicating with the film thickness sensor system for receiving information of the paint film thickness and combining the paint film thickness information with paint automation parameters on a vehicle identification number (VIN) basis of the painted bodies to control the paint process.Type: GrantFiled: January 13, 2003Date of Patent: August 30, 2005Assignee: Ford Motor CompanyInventors: Dimitar P. Filev, Steve A. Weiner, P. Tomas Larsson
-
Patent number: 6933001Abstract: The optical thickness of a film formed on a substrate is controlled precisely to manufacture an optical filter having an accurate optical thickness. Time is counted during a film being formed on a substrate to note time points t with respect to a reference time set in advance. At least one of two optical characteristics of energy transmittance and energy reflectance when the film being formed on the substrate is irradiated with monitoring light is expressed by a function f(t) of the time points t based on a theoretical formula of the optical characteristic. The optical characteristic is measured by irradiating the film with the monitoring light at the time points t. A designed thickness achieving time at which the optical thickness of the film designed thickness is predicted. The film formation is stopped at the designed thickness achieving time, thereby obtaining the optical filter.Type: GrantFiled: January 14, 2002Date of Patent: August 23, 2005Assignee: The Fukukawa Electric Company, Ltd.Inventors: Abe Hiroyuki, Yu Mimura, Kazuyou Mizuno
-
Patent number: 6913781Abstract: A substrate processing apparatus is provided with five inspection devices that perform inspections of different kinds to a substrate. Among the five kinds of inspections, the film quality is measured after resist coating, and before post-coating heat-treatment. As the film quality, the amount of solvent remaining in a resist film is measured. The film thickness is measured after heat-treatment following resist coating and before exposure. Meanwhile, the line width and the superposition precision are measured and macroscopic defect inspection is performed after post-development heat-treatment and before the substrate is returned to an indexer.Type: GrantFiled: June 12, 2002Date of Patent: July 5, 2005Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Koji Kaneyama, Akihiro Hisai
-
Patent number: 6875281Abstract: A system for performing a coating and developing treatment for a substrate. The system includes a processing zone having a coating treatment unit, a developing treatment unit, and a heat treatment unit. An interface section carries the substrate between the processing zone and an aligner not included in the system for performing an exposure processing for the substrate. A unit measures the density of impurities at least inside the processing zone or the interface section, and a reduced-pressure impurity removing unit has a chamber which can be closed airtightly for reducing the pressure inside the chamber to a predetermined pressure before the substrate undergoes the exposure processing to remove the impurities adhering to the coating layer on the substrate inside the chamber for a predetermined time. A reduced-pressure control unit controls at least the predetermined pressure or predetermined time based on the value measured by the density measuring unit.Type: GrantFiled: May 7, 2001Date of Patent: April 5, 2005Assignee: Tokyo Electron LimitedInventors: Junichi Kitano, Yuji Matsuyama, Takahiro Kitano
-
Patent number: 6875283Abstract: Coating an insulating film on a substrate, heating the substrate at a pressure higher than an atmospheric pressure in a chamber, followed by the curing process performed at a pressure lower than the atmospheric pressure in a separate chamber. With this process, the desorption of the porogen from the insulating film during heating can be restrained therefore an insulating film of high quality can be formed.Type: GrantFiled: May 19, 2003Date of Patent: April 5, 2005Assignee: Tokyo Electron LimitedInventor: Takahiro Nishibayashi
-
Patent number: 6869482Abstract: A slurry raw material is applied onto a carrier film 3 in a coating section 4, and a predetermined property related to the thickness of the slurry raw material is measured in a property-measuring section 5 in a wet mode before the slurry raw material is dried in a drying section 6. A processing sub-section 7a calculates an estimated value t of the thickness of a sheet from the target thickness of the sheet, a measurement of the slurry raw material property, and the slurry raw material density, to compare the estimated value t with the target value T of the sheet thickness. An adjusting output sub-section 7b transmits signals for adjusting the thickness to a thickness-adjusting device 9 on the basis of the above comparison result, to efficiently and precisely control the thickness of the slurry raw material applied onto the carrier film 3.Type: GrantFiled: June 23, 2003Date of Patent: March 22, 2005Assignee: Murata Manufacturing Co., Ltd.Inventors: Norio Mutsui, Tamotsu Mitsutani
-
Patent number: 6855206Abstract: A controller for a moisture adjusting device of the present invention reads out a target moisture content set in advance in a data table in accordance with a type of a planographic printing plate; determines, every predetermined control period, a moisture content of an overcoat layer (measured moisture content) based on a measured signal SW; and calculates a difference (deviation) between the measured moisture content and the target moisture content. For example, if the measured moisture content of the overcoat layer is lower than the target moisture content, the controller sets an adjusted moisture content which is higher than the measured moisture content and controls the humidity and the temperature within a humidity conditioning zone so that an interposing paper web (protective sheet material) attains the adjusted moisture content within the humidity conditioning zone.Type: GrantFiled: August 20, 2003Date of Patent: February 15, 2005Assignee: Fuji Photo Film Co., Ltd.Inventor: Shinichiro Minato
-
Patent number: 6852551Abstract: A method of forming a ferroelectric film includes the steps of forming a layer by a material that takes a metal state in a reducing ambient and an oxide state in an oxidizing ambient, and depositing a ferroelectric film on a surface of the layer by supplying gaseous sources of the ferroelectric film and an oxidizing gas and causing a decomposition of the gaseous sources at the surface of said layer, wherein the step of depositing the ferroelectric film is started with a preparation step in which the state of the surface of said layer is controlled substantially to a critical point in which the layer changes from the metal state to the oxide state and from the oxide state to the metal state.Type: GrantFiled: January 30, 2004Date of Patent: February 8, 2005Assignee: Fujitsu LimitedInventor: Hideki Yamawaki
-
Patent number: 6841005Abstract: The invention relates to an apparatus and a method for producing a sprayed layer on the surface of a substrate, wherein an admixture material which may have started to melt or is molten, is guided onto the surface of the substrate to be coated using a gas or gas mixture, as well as a relevant installation for producing the sprayed layer by means of a thermal spraying method, wherein the installation comprises means for supplying the admixture material or the gas or gas mixture. According to the invention, at least one feature of the thermal spraying process which influences the quality of the sprayed layer and which is responsible for the formation of the layer and its properties, is recorded, evaluated and assessed, checked, monitored and/or regulated. Both analogue and digital spectroscopic arrangements can be used as optical emission spectroscopic arrangements.Type: GrantFiled: January 31, 2003Date of Patent: January 11, 2005Assignee: Flumesys GmbH Fluidmess-und SystemtechnikInventor: Karsten Schutte
-
Publication number: 20040265493Abstract: Film coating unit has a substrate holder for holding a wafer, a coating solution discharge nozzle, and anti-drying boards opposed to a surface of the wafer. The coating solution is applied to the surface of the wafer in a direction from a front end toward a rear end of the wafer while relatively moving the substrate holder with respect to the coating solution discharge nozzle. During that time, the anti-drying boards are disposed at height of maximum 2 mm from the surface of the wafer so as to form dense atmosphere of a solvent between the surface of the wafer and the anti-drying board. Thereby the coating solution on or over the surface of the wafer is restrained from being dried and a coating film is formed with even thickness on or over the surface of the wafer.Type: ApplicationFiled: June 23, 2004Publication date: December 30, 2004Inventors: Tsuyoshi Mizuno, Yuuichi Mikata, Kimihide Saito
-
Patent number: 6830774Abstract: A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder.Type: GrantFiled: June 1, 2004Date of Patent: December 14, 2004Assignee: Tokyo Electron LimitedInventors: Shinichi Hayashi, Hirofumi Ookuma, Kouichi Suefuji
-
Publication number: 20040241320Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part.Type: ApplicationFiled: July 8, 2004Publication date: December 2, 2004Applicant: TOKYO ELECTRON LIMITEDInventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
-
Patent number: 6824813Abstract: A substrate processing apparatus comprises a chamber 28 capable of processing a substrate 20. A radiation source 58 provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector 62 is provided to detect the reflected radiation and generate a signal. A controller 100 is adapted to receive the signal and determine a property of the substrate 20 in situ during processing, before an onset of during or after processing of a material on the substrate 20.Type: GrantFiled: April 6, 2000Date of Patent: November 30, 2004Assignee: Applied Materials IncInventors: Thorsten B. Lill, Michael N. Grimbergen, Jitske Trevor, Wei-Nan Jiang, Jeffrey Chinn
-
Patent number: 6814809Abstract: A coating and developing apparatus has an interface section equipped with a temperature adjuster (a cooling unit). A temperature-raised substrate due to exposure on periphery of the substrate outside a circuit-forming area thereon is adjusted to a predetermined temperature by the temperature adjuster and then transferred to an exposing apparatus. The temperature adjustments before exposure provide almost the same temperature over many substrates to be transferred to the exposing apparatus for less thermal effects to exposing processing, thus achieving high yields. The interface section is further provided with first and second transfer mechanisms, the first serving to transfer substrates between the processor and the exposing apparatus and the second serving to transfer substrates to each unit of a shelf section, for high transfer performance, thus achieving high throughput.Type: GrantFiled: December 7, 2001Date of Patent: November 9, 2004Assignee: Tokyo Electron LimitedInventors: Michiaki Matsushita, Masataka Matsunaga, Seiji Kozawa
-
Patent number: 6805747Abstract: A method and apparatus for coating hams is provided. Sugar is uniformly dispensed on an inclined plate that is heated to melt the sugar. The sugar flows into a reservoir from which it is poured onto hams passing below the reservoir on a conveyor. Spices are poured onto the melted sugar that sticks to the ham to form a glaze. Jets of water can cool the glaze to increase retention on the ham. The process can be repeated.Type: GrantFiled: January 30, 2003Date of Patent: October 19, 2004Assignee: Honey Baked Ham, Inc.Inventors: Richard E. Gore, Allen Mottershead
-
Publication number: 20040182312Abstract: A method of forming a coating for an implantable medical device, such as a stent, is provided which includes applying a composition to the device in an environment having a selected pressure. An apparatus is also provided for coating the devices. The apparatus comprises a chamber for housing the device wherein the pressure of the chamber can be adjusted during the coating process.Type: ApplicationFiled: March 30, 2004Publication date: September 23, 2004Inventor: Stephen D. Pacetti
-
Patent number: 6790283Abstract: A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder.Type: GrantFiled: October 17, 2002Date of Patent: September 14, 2004Assignee: Tokyo Electron LimitedInventors: Shinichi Hayashi, Hirofumi Ookuma, Kouichi Suefuji
-
Patent number: 6790281Abstract: The present invention provides a finely-divided powder spray apparatus having a spray nozzle pipe for discharging finely-divided powders from the tip together with a gas stream, which is disposed at a prescribed distance from the member to be sprayed and inclined in a prescribed direction to the member; and a moving-speed control means which controls the moving-speed of the tip of the spray nozzle pipe in accordance with the quadratic function, which indicates the reduction rate of the density of the deposited finely-divided powders based on the distance between a peak point of the density of the finely-divided powders deposited on the member to be sprayed in a trial spray and a spray point at which an extension from the spray nozzle pipe intersects with the member to be sprayed.Type: GrantFiled: June 21, 2001Date of Patent: September 14, 2004Assignee: Nisshin Engineering Co., Ltd.Inventors: Shin Doi, Masaki Ban, Goro Watanabe
-
Publication number: 20040161531Abstract: During the application of glue, in particular hot-melt glue, to a material web (21) for blanks, the transfer of glue is dependent on the conveying speed of the material web (21) and other parameters. In particular, a glue pressure, which is exerted on the glue in accordance with the movement of the material web, is regulated by means of a pressure control valve (37) which is connected to a central machine control unit (31). This ensures a uniform delivery of glue.Type: ApplicationFiled: January 5, 2004Publication date: August 19, 2004Applicant: FOCKE & CO (GmbH & Co.)Inventors: Ingo Ferber, Thomas Kracke
-
Patent number: 6776845Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part.Type: GrantFiled: May 23, 2002Date of Patent: August 17, 2004Assignee: Tokyo Electron LimitedInventors: Tomohide Minami, Shinichi Sugimoto, Takahiro Kitano, Jun Ookura, Hiroaki Kurishima
-
Publication number: 20040151978Abstract: A direct-write method and apparatus for depositing a functional material with a preferred orientation onto a target surface. The method comprises the following steps: (1) forming a precursor fluid to the functional material, with the fluid containing a liquid component; (2) operating a dispensing device to discharge and deposit the precursor fluid onto the target surface in a substantially point-by-point manner and at least partially removing the liquid component from the deposited fluid to form a thin layer of the functional material which is substantially solidified and is of a predetermined pattern; and (3) during the liquid-removing step, subjecting the deposited fluid to a highly localized electric or magnetic field for poling until a preferred orientation is attained in the deposited functional material.Type: ApplicationFiled: January 30, 2003Publication date: August 5, 2004Inventor: Wen C. Huang
-
Publication number: 20040149207Abstract: A slurry raw material is applied onto a carrier film 3 in a coating section 4, and a predetermined property related to the thickness of the slurry raw material is measured in a property-measuring section 5 in a wet mode before the slurry raw material is dried in a drying section 6. A processing sub-section 7a calculates an estimated value t of the thickness of a sheet from the target thickness of the sheet, a measurement of the slurry raw material property, and the slurry raw material density, to compare the estimated value t with the target value T of the sheet thickness. An adjusting output sub-section 7b transmits signals for adjusting the thickness to a thickness-adjusting means 9 on the basis of the above comparison result, to control the thickness of the slurry raw material applied onto the carrier film 3.Type: ApplicationFiled: June 23, 2003Publication date: August 5, 2004Applicant: Murata Manufacturing Co., Ltd.Inventors: Norio Mutsui, Tamotsu Mitsutani
-
Publication number: 20040147103Abstract: A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced into a chemical vapor deposition chamber. A reactant is also introduced into the chamber that reacts with residue organic compounds on the conductive element so as to remove the organic compounds from the nucleating sites to thereby permit more efficient subsequent chemical vapor deposition of conductive elements.Type: ApplicationFiled: January 13, 2004Publication date: July 29, 2004Inventors: Weimin Li, Sam Yang
-
Publication number: 20040144164Abstract: The invention relates to a method and system in control of coating mix. According to the method, the amount of at least one coating mix component and/or the ratios of two or more components are measured by means of a measuring device arranged in conjunction with the coating mix. The measurement is taken from finished coating mix and/or coating mix to be recycled for use in the manufacture of mew coating mix, and that on the basis of the measurement result the ratios and/or amount of the components fed into the coating mix to be manufactured and/or recycled are controlled. The system according to the present invention comprises means for controlling the coating mix in accordance with the method.Type: ApplicationFiled: March 1, 2004Publication date: July 29, 2004Inventor: John Bergman
-
Patent number: 6746712Abstract: The present invention pertains to an arrangement for the controlled application of adhesive to substrate. In at least one embodiment, the arrangement comprises a) an adhesive reservoir, b) a pump, c) an applicator head having at least one applicator nozzle, d) a volume throughput sensor, and e) a monitoring unit. The reservoir, the pump, and the applicator head are connected together by a conduit system carrying the adhesive. The volume throughput sensor and the monitoring unit are connected together by a pulse transmission line. The monitoring unit, the feed pump, and the applicator head are connected together by control lines. In at least one embodiment, the application of adhesive to substrates is controlled by measuring the volume throughput of the adhesive, transmitting signals indicative of volume throughout to the monitoring unit, and controlling the amount of adhesive applied to the substrate material in-line in response to the signals.Type: GrantFiled: December 31, 2002Date of Patent: June 8, 2004Assignee: Henkel Kommanditgesellschaft auf Aktien (Henkel KGaA)Inventors: Gunter Hoffmann, Volker Kels, Joerg Hurdelbrink, Richard Scholta, Willi Borst, Roland Heume
-
Publication number: 20040086648Abstract: A metal oxide layer can be deposited onto metallic or ceramic surfaces of a structure in situ, by exposing the surfaces to a precursor solution at an elevated temperature. The precursor solution contains: an organometallic, an oxidant, a surfactant, a chelating agent and water. The precursor solution is injected into the structure and maintained at a specific temperature, pH level and pressure for a predetermined period of time. The resulting in situ metal oxide layer is permanently bonded to the surface structure and does require post deposition heat treatment.Type: ApplicationFiled: June 11, 2003Publication date: May 6, 2004Inventors: Xiangyang Zhou, Zhuang Fei Zhou, Serguei N. Lvov, Digby D. MacDonald
-
Publication number: 20040083958Abstract: Apparatus and methods for monitoring the application of a viscous material onto at least one moving strand or other narrow substrates. A detection unit, such as a machine vision system, an infrared sensor, an ultraviolet detector, or a light curtain with multiple detectors, senses radiation originating from the viscous material after it is applied to the strand or strands and, typically, before each strand is contacted with a substrate. The detection unit determines a detected value representative of a characteristic of the pattern from the sensed radiation, compares the detected value with a reference value representative of a desired standard for the characteristic, and outputs a signal in accordance with the result of the comparison.Type: ApplicationFiled: October 31, 2002Publication date: May 6, 2004Applicant: Nordson CorporationInventors: Laurence B. Saidman, David Zgonc, Patrick L. Crane
-
Publication number: 20040083951Abstract: An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in close proximity to the surface of the workpiece, but spaced a finite distance therefrom. The input gas is dissociated by the beam producing a high flux point of use generated reactive gas species that reacts with a surface reactant formed on the surface of the workpiece by a direct flow of the precursor gas flown from the dispensing unit. The surface reactant and reactive gas species react to form a desired monolayer of a material on the surface of the workpiece.Type: ApplicationFiled: October 30, 2003Publication date: May 6, 2004Inventor: Gurtej S. Sandhu
-
Publication number: 20040050323Abstract: An apparatus for controlling coating weight on a steel strip in a continuous hot dip galvanizing process, in which the coating weight is controlled through air wiping after the steel strip passes through a molten zinc coating bath. More particularly, the apparatus keeps the steel strip equidistant from each air knife, uniformly distributes a spray pressure of the air knives in a widthwise direction of the steel strip, and minimizes variation in coating weights on both surfaces of the steel strip. Furthermore, when two steel strips that are different in thickness are continuously hot dip galvanized, the apparatus predicts the movement of the passing line of the steel strips and accurately controls the positions of the air knives. As a result, product deficiencies such as insufficient coating can be reduced and zinc loss due to excess coating can be minimized.Type: ApplicationFiled: May 30, 2003Publication date: March 18, 2004Inventor: Hong-Kook Chae
-
Patent number: 6691759Abstract: A method and apparatus for making and/or decorating bowling balls and the like includes flexible transfer sheets with heat-activated ink applied to at least portions thereof. A form or mold with opposite halves, which shift between open and closed positions, includes a cavity sized to closely receive therein the article to be decorated. At least one transfer sheet is positioned in the mold with the article, such that when the mold is closed, the same are captured in the mold cavity in an overlying relationship. Heat is applied to the mold to a predetermined temperature causing the article to expand through thermal expansion, which expansion is resisted by the mold to uniformly press the transfer sheet against the underlying outer surface of the article, and also causing the heat-activated ink to transfer from the transfer sheet to the outer surface of the article to form the design thereon.Type: GrantFiled: December 9, 2002Date of Patent: February 17, 2004Assignee: Brunswick Bowling & Billards CorporationInventors: Alfred J. Dabrowski, Jr., Daniel L. LaPres, Phillip G. Syer
-
Patent number: 6676756Abstract: A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced into a chemical vapor deposition chamber. A reactant is also introduced into the chamber that reacts with residue organic compounds on the conductive element so as to remove the organic compounds from the nucleating sites to thereby permit more efficient subsequent chemical vapor deposition of conductive elements.Type: GrantFiled: August 30, 2002Date of Patent: January 13, 2004Assignee: Micron Technology, Inc.Inventors: Weimin Li, Sam Yang
-
Patent number: 6645301Abstract: An ion source for use in ion assisted deposition of films, has an ionization region, a gas supply supplying ionizable gas to the ionization region, a gas excitation system causing ionization of the gas, ion influencing means forming the ions into a current directed at a target, and an ion source controller controlling the ion source so as to intermittently produce the ion current.Type: GrantFiled: August 9, 2001Date of Patent: November 11, 2003Assignee: Saintech Pty LimitedInventor: Wayne G Sainty
-
Patent number: 6627043Abstract: The invention relates to a method and an apparatus for measuring the amount of silicone coating on a moving paper or board web. In the invention, the characteristics of the coating (4a) are measured by means of reflection measurement or transmission measurement. The amount of the silicone in the coating is measured by measuring an absorption peak that is characteristic of the silicone in the mid-infrared range.Type: GrantFiled: March 23, 2001Date of Patent: September 30, 2003Assignee: Metso Automation OyInventor: Markku Mäntylä
-
Patent number: 6610364Abstract: A liquid crystal dispensing apparatus and a method of controlling a liquid crystal dropping amount are provided to drop liquid crystal onto a substrate corresponding to at least one unit panel area. In one aspect, the apparatus uses a liquid crystal dispensing unit to dispense liquid crystal. The liquid crystal dispensing unit includes a nozzle having a discharging hole through which the liquid crystal is dropped onto the substrate, a needle moveable between a down position in which the needle blocks the discharging hole and an up position in which the needle is separated from the discharging hole, a spring member to bias the needle toward the down position, and a solenoid coil to provide a magnetic force to move the needle to the up position. The dropping amount liquid crystal dispensing unit may be electrically controlled by controlling the solenoid coil or by controlling a gas pressure used to drive the liquid crystal through the discharging hole.Type: GrantFiled: April 30, 2002Date of Patent: August 26, 2003Assignee: LG. Philips LCD Co., Ltd.Inventors: Hyug-Jin Kweon, Hae-Joon Son
-
Patent number: 6582975Abstract: In one illustrative embodiment, the method comprises performing at least one electrical performance test on an integrated circuit device, determining, based upon data obtained from said at least one electrical performance test, a target thickness for at least one inter-level dielectric layer to be formed above a wafer, and performing a deposition process to form said at least one inter-level dielectric layer to said target thickness. In other embodiments, the method comprises determining a duration of a deposition process to be performed to form the at least one inter-level dielectric layer, and performing the deposition process for the determined duration.Type: GrantFiled: August 9, 2001Date of Patent: June 24, 2003Assignee: Advanced Micro Devices, Inc.Inventor: Matthew Ryskoski
-
Patent number: 6579422Abstract: A whole organic EL display fabricating apparatus is provided inside a vacuum chamber. In this case, a first patterning unit B through a third patterning unit D for sequentially forming luminescent layer patterns of GREEN, BLUE, and RED on an anode pattern on a strip-shaped flexible substrate 1, and a fourth patterning unit E for forming a cathode pattern on the subsequent stage are provided. The first patterning unit B is provided with a first cooling can 21 and a vacuum vapor deposition unit below for forming the luminescent layer pattern of GREEN. The structures of the second patterning unit through the fourth patterning unit are similar to that of the first patterning unit. In fabricating a display, the substrate 1 is caused to travel from the first cooling can 21 toward a fourth cooling can 64 by the roll-to-roll system.Type: GrantFiled: March 6, 2001Date of Patent: June 17, 2003Assignee: Sony CorporationInventor: Masayasu Kakinuma
-
Patent number: 6573031Abstract: A substrate coated with a coating solution is placed on a heating plate in a processing chamber in which an inert gas is circulating. The substrate is heated on the heating plate while the inert gas is circulating at an extremely small first circulating amount. The substrate is heated further on the heating plate while the inert gas is circulating at a second circulating amount larger than the first circulating amount. Detected is the density of the solvent in the processing chamber. The supply and exhaust amounts of the inert gas are controlled based on the density detected after the start of heating, so that an exhaust amount of the inert gas becomes a predetermined amount for a predetermined period until the solvent density reaches a predetermined density. A necessary control process is performed so that the solvent density reaches the predetermined density when the solvent density has not reached or exceeded the predetermined density after the predetermined period has elapsed.Type: GrantFiled: December 18, 2001Date of Patent: June 3, 2003Assignee: Tokyo Electron LimitedInventors: Hiroshi Shinya, Kazuyoshi Mizumoto, Kazuhisa Hayashida, Eiichi Sekimoto
-
Patent number: 6541184Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a multiple tip nozzle and a movement system that moves the nozzle to an operating position above a central region of a photoresist material layer located on a substrate, and applies a volume of developer as the nozzle scan moves across a predetermined path. The movement system moves the nozzle in two dimensions by providing an arm that has a first arm member that is pivotable about a first rotational axis and a second arm member that is pivotable about a second rotational axis or is movable along a translational axis. The system also provides a measurement system that measures the thickness uniformity of the developed photoresist material layer disposed on a test wafer. The thickness uniformity data is used to reconfigure the predetermined path of the nozzle as the developer is applied.Type: GrantFiled: September 6, 2000Date of Patent: April 1, 2003Assignee: Advanced Micro Devices, Inc.Inventors: Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur
-
Publication number: 20030047135Abstract: The invention relates to a method and an apparatus for measuring a coating from paper or board. The measurement is carried out by one detector at different times or by two detectors simultaneously. IR radiation directed at the coating and radiation emerging from the coating are chopped synchronously in blocks. A wavelength band sensitive and insensitive to the absorption are bandpass filtered and measured in both the MIR and NIR region. The absorption strength is measured in a digital signal processing block by comparing the radiation sensitive to absorption to the radiation insensitive to absorption, and the amount of each coating component is determined in the digital signal processing block on the basis of the absorption strength.Type: ApplicationFiled: August 9, 2002Publication date: March 13, 2003Inventors: Markku Kansakoski, Markku Mantyla, Jussi Tenhunen
-
Publication number: 20030041969Abstract: A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.Type: ApplicationFiled: September 3, 2002Publication date: March 6, 2003Inventors: Claus Schneider, Ralph Trunk, Lothar Pfitzner, Heinz Schmid
-
Patent number: 6527927Abstract: A vacuum treatment system in which a part (9) is provided inside a vacuum treatment chamber (1). A potential (&phgr;9) which deviates from the system reference potential (&phgr;0) by approximately at least ±12 V is applied to said part. A sensor and/or an actuator (11) is/are arranged on said part. In addition, the invention comprises an electronic unit (13) which is connected to the sensor and/or actuator. Processing signals on the unit (13) is considerably simplified in that the electronic unit (13) is operated as a reference potential on the potential (&phgr;9) of said part (9).Type: GrantFiled: June 5, 2000Date of Patent: March 4, 2003Assignee: Unaxis Balzers AktiengesellschaftInventor: Felix Mullis
-
Patent number: 6528109Abstract: An integrated paint quality control (IPQC) system for feedback control of paint process for painting vehicle bodies includes a film thickness sensor system for measuring paint film thickness of the painted bodies. The IPQC system also includes a control system communicating with the film thickness sensor system for receiving information of the paint film thickness and combining the paint film thickness information with paint automation parameters on a vehicle identification number (VIN) basis of the painted bodies to control the paint process.Type: GrantFiled: September 13, 2000Date of Patent: March 4, 2003Assignee: Ford Global Technologies, Inc.Inventors: Dimitar P. Filev, Steve A. Weiner, P. Tomas Larsson
-
Patent number: 6524659Abstract: The invention relates to a method for electrically controlling a flow of material, wherein a single- or multi-component, essentially polymer-based material (1), such as plastics, elastomer or the like, is charged electrically (I) and sprayed (II) in an electrical field (E) to a three-dimensional mould (2)/target (3). The method of the invention makes use of the mould (2)/target (3) set at an electric potential and provided with two or more treatment blocks (Li) to be set at voltage levels different from each other, especially for coordinating the courses of sprayed material particles and the electrical field (E) affecting the same, in such a manner that each section/area of the mould/target surface forms a material layer of desirable thickness in the spraying cycle (II). The invention relates also to an apparatus operating in accordance with the method.Type: GrantFiled: November 15, 2000Date of Patent: February 25, 2003Assignee: Oy OMS Optomedical Systems Ltd.Inventors: Leo Hatjasalo, Jarkko Valtanen
-
Patent number: 6524449Abstract: A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile.Type: GrantFiled: December 3, 1999Date of Patent: February 25, 2003Inventors: James A. Folta, Claude Montcalm, Christopher Walton
-
Patent number: 6511544Abstract: A process and system for use during the growth of a thin film upon the surface of a substrate by exposing the substrate surface ti vaporized material in a high vacuum (HV) facility involves the directing of an electron beam generally toward the surface of the substrate as the substrate is exposed to vaporized material so that electrons are diffracted from the substrate surface by the beam and the monitoring of the pattern of electrons diffracted from the substrate surfaces as vaporized material settles upon the substrate surface. When the monitored pattern achieves a condition indicative of the desired condition of the thin film being grown upon the substrate, the exposure of the substrate to the vaporized materials is shut off of otherwise adjusted. To facilitate the adjustment of the crystallographic orientation of the film relative to the electron beam, the system includes a mechanism for altering the orientation of the surface of the substrate relative to the electron beam.Type: GrantFiled: July 30, 2001Date of Patent: January 28, 2003Assignee: UT-Battelle, LLCInventors: Rodney A. McKee, Frederick J. Walker
-
Patent number: 6508881Abstract: A device for maintaining constant a certain viscosity of an adhesive, that is used for pasting a spine of an inner book or a book cover, by adding a diluent has an adhesive container filled with an adhesive. A rotating conveyor roll is immersed in the adhesive. An applicator roll is positioned downstream of the conveyor roll. It receives the adhesive from the conveyor roll and applies the adhesive onto a spine of an inner book or a book cover passing by the applicator roll. A stirring apparatus is arranged on the container and has a stirrer immersed in the adhesive. The stirring apparatus stirs the adhesive received in the container and also measures the viscosity of the adhesive received in the container. A control unit with a computer is connected to the stirring apparatus. The control unit compares a measured value of the viscosity with a set-point value of the viscosity and meters the diluent to the adhesive in order to regulate the viscosity.Type: GrantFiled: August 30, 2000Date of Patent: January 21, 2003Assignee: Grapha-Holding AGInventors: Hans Müller, Karl Zweig