Control Means Responsive To A Randomly Occurring Sensed Condition Patents (Class 118/663)
  • Patent number: 10879095
    Abstract: An apparatus includes an L-shaped structure and a bar-shaped member. The L-shaped structure has a first portion extending a first length and a second portion extending a second length. The first length is greater than the second length, and both the first length and the second length are greater than the width of L-shaped structure. The L-shaped structure detachably connects to one end of the bar-shaped member with an attachment structure, with a handle on an opposite end of the bar-shaped member. The L-shaped structure is shaped such that the L-shaped structure is configured to contact a lid of a processing chamber, and the L-shaped structure contacting the lid of the processing chamber indicates the lid is sagging out of tolerance.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: December 29, 2020
    Inventors: Sean L. Zumkeller, Robert J. Duperier
  • Patent number: 10549998
    Abstract: Some embodiments are directed to a method and device for reducing a component composed of at least one graphene oxide and a matrix consisting of at least one polymer, characterized in that the method includes at least the following steps: introducing a mixture of polymer(s) and graphene oxide GO into a reactor subject to a value of temperature T and a value of pressure P suitable for placing a fluid under supercritical or subcritical conditions for a given period, the temperature T being suitable for not degrading the polymer; and cooling the reactor and removing the obtained product R consisting of reduced polymer(s) and graphene oxide rGO.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: February 4, 2020
    Assignee: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Philippe Poulin, Suchithra Padmajan Sasikala, Cyril Aymonier
  • Patent number: 10488243
    Abstract: A method of characterizing gas flow within a housing includes: positioning one or more gas flow sensors in the housing; introducing a gas flow into the housing; using the one or more gas flow sensors to generate two or more gas flow measurements at spaced-apart locations within the housing; and recording the two or more measurements to create a gas flow map.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: November 26, 2019
    Assignee: General Electric Company
    Inventors: Scott Alan Gold, James Harding Shealy, Lucas Christian Jones
  • Patent number: 10372096
    Abstract: A method, user interface control arrangement, and a computer program product for controlling a stationary user interface in an industrial process control system as well as to such a process control system. The user interface control arrangement obtains a first live video stream from a video camera monitoring an industrial process at a first location, obtains a process control view for the first location, overlays the process control view on the first live video stream and displays the first live video stream with the overlaid process control view on a display of the user interface.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: August 6, 2019
    Assignee: ABB Schweiz AG
    Inventor: Torbjörn Ottosson
  • Patent number: 10332727
    Abstract: A plasma processing method is provided. The method includes receiving a substrate in a substrate support that is configured to be movable along a linear path. The method includes providing at least one process gas into a plasma microchamber. The plasma microchamber is disposed in a processing head having a length that is at least longer than a diameter of the substrate, and said length is perpendicular to said linear path. The method includes generating a plasma in the plasma microchamber by applying power to the plasma microchamber and applying a bias power to the substrate support. The plasma microchamber has an open side process area that is oriented and directed over a surface to be processed, and the open side process area is less than an area of the surface to be processed. The method includes translating said substrate support along said linear path while said microchamber generates the plasma in the plasma microchamber for exposing said plasma over the substrate.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: June 25, 2019
    Assignee: Lam Research Corporation
    Inventors: Richard Gottscho, Rajinder Dhindsa, Mukund Srinivasan
  • Patent number: 10274975
    Abstract: The present invention discloses an acid concentration control method and device for cold rolling pickling production line. In the method, the acid circulating tank of the pickling production line are provided with three acid-filling tanks. And the three acid-filling tanks are interconnected with each other. An acid concentration measuring device is concatenated on the acid solution back-flow pipeline of each acid-filling tank and acid tank, through which the actual acid concentration of the acid solution in the acid tank of the production line may be measured. The measured acid concentration, after being analyzed by the analyzer, will be transmitted to the multi-variable controller where it is compared to the specified acid concentration as per process requirements. The difference between the measured acid concentration and the specified acid concentration will be used as the input value for the model of the multi-variable controller.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: April 30, 2019
    Assignee: BAOSHAN IRON & STEEL CO., LTD.
    Inventors: Anxiang Tang, Lifeng Shen Tu
  • Patent number: 10066288
    Abstract: An evaporation apparatus includes a holder, a source, a first sensor, a calculating unit, and an actuator. The holder is configured to hold a substrate. The source is configured to evaporate an evaporation material to be deposited on the substrate. The first sensor is configured to detect evaporation rates of the evaporation material at plural detection positions. The calculating unit is configured to estimate an evaporation angle based on the detected evaporation rates of the evaporation material at the detection positions. The actuator is configured to move the source based on the estimated evaporation angle.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: September 4, 2018
    Assignee: AU OPTRONICS CORPORATION
    Inventor: Chih-Hung Hsiao
  • Patent number: 10058023
    Abstract: A system for electronically pulsing agricultural product with seed includes a seed transport mechanism affixed to a seed planter row unit. A seed sensing device senses dispensation of the seed from the seed transport mechanism. An agricultural product conduit dispenses agricultural products into the seed transport mechanism to provide dispensing of the products with the seed as the seed and product exit the seed transport mechanism. A control interface electronic system dispenses a particular quantity of product with the seed in the seed transport mechanism. A pulsing valve dispenses products from the conduit when the seed sensing device senses the dispensation of the seed. A seed release speed is provided which is proportional to the ground speed of the seed planter row unit to minimize seed tumbling and optimize accurate placement of seed and product at varying ground speeds of the row unit.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: August 28, 2018
    Assignee: AMVAC CHEMICAL CORPORATION
    Inventors: Larry M. Conrad, Richard L. Rice, Rex A. Rysdam, Richard M. Porter
  • Patent number: 9937520
    Abstract: A nozzle starts discharging a processing liquid while a spin chuck holds and rotates a substrate having a water-repellent film being formed on a surface thereof. The processing liquid is discharged to a position spaced away from the center of the substrate by a preset distance, and flows so as to converge into one stream on the substrate immediately after discharge of the processing liquid starts. This achieves suppression of the minute water droplets. Moreover, the nozzle is moved toward outside of the substrate while discharging the processing liquid successively. This allows entire flow of the processing liquid to move toward outside of the substrate while the processing liquid converging into one stream on the substrate is maintained. Here, inside the flow of the processing liquid is a dried region.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: April 10, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masashi Kanaoka, Takehiro Wajiki, Shinichi Takada
  • Patent number: 9797039
    Abstract: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: October 24, 2017
    Assignee: The Regents of the University of Michigan
    Inventors: Stephen R. Forrest, Gregory McGraw
  • Patent number: 9785756
    Abstract: A communication apparatus includes a tuner, a content storage, and a controller that acquires content from the tuner, for one of providing the content to a terminal or recording the content to the content storage, and registers the terminal, in association with a registration date, to a home network. The terminal requests the content from outside the home network. The controller provides the content to the registered terminal based on a request, from the registered terminal, for the content, where the providing of the content to the registered terminal is based on the request, before an expiration date, for the content. The expiration date is based on the registration date of the registered terminal. The providing of the content to the registered terminal is restricted based on the request, after the expiration date, for the content.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: October 10, 2017
    Assignee: SONY CORPORATION
    Inventor: Takehiko Nakano
  • Patent number: 9645273
    Abstract: A method, a system and an apparatus of semi-permeable terrain geophysical data acquisition is disclosed. In one embodiment, a method of geophysical data acquisition over a semi-permeable terrain includes placing an apparatus housing geophysical data measuring instruments over a semi-permeable terrain. The method adjusts and calibrates low frequency unshielded dipole antennas with a transmitter and a receiver in a pre-determined interval distance depending on central frequency. The method selects a time data trigger type and/or a unit data trigger type to scan and/or trace where a data signal is sent to a ground at selected intervals. The method causes a linear movement of the apparatus over the semi-permeable terrain. The method determines an optimal position for geophysical data acquisition over the semi-permeable terrain. Further, the method captures geophysical data with measuring instruments housed on the apparatus.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: May 9, 2017
    Assignee: KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
    Inventors: Tariq Ali Mohammed Alkhalifah, Khaled Faraj Rashdan Almutairi, Faisal Mojari Almotiri
  • Patent number: 9518339
    Abstract: A method for growing an epitaxial film on a surface of a semiconductor wafer by mounting the wafer within a susceptor pocket and supplying source gas and carrier gas to the upper surface side of the susceptor and supplying carrier gas to the lower surface side of the susceptor. The susceptor includes a substantially circular bottom wall and a sidewall encompassing the bottom wall to form a pocket for mounting the wafer, wherein a plurality of circular through-holes are formed in the bottom wall in an outer peripheral region a distance of up to about ½ the radius toward the center of the bottom wall. The total opening surface area of the through-holes is 0.05 to 55% of the surface area of the bottom wall, the opening surface area of each through-hole is 0.2 to 3.2 mm2 and the density of the through-holes is 0.25 to 25 per cm2.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: December 13, 2016
    Assignee: SUMCO Corporation
    Inventors: Masayuki Ishibashi, John F. Krueger, Takayuki Dohi, Daizo Horie, Takashi Fujikawa
  • Patent number: 9493872
    Abstract: The present invention provides a vapor deposition apparatus capable of preventing abnormal film formation due to scattering in vapor deposition streams; and a method for producing an organic electroluminescent element which includes forming a patterned thin film with the vapor deposition apparatus. The present invention relates to a vapor deposition apparatus that includes a vapor deposition source equipped with a nozzle that ejects vapor deposition particles; an integrated limiting plate equipped with a first limiting plate including an opening that is in front of the nozzle, and with second limiting plates placed in the opening in the first limiting plate; and a mask including slits. The present invention also relates to a method for producing electroluminescent elements that includes a vapor deposition step of forming a patterned thin film with the vapor deposition apparatus.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: November 15, 2016
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Shinichi Kawato, Satoshi Inoue, Takashi Ochi, Yuhki Kobayashi, Katsuhiro Kikuchi, Eiichi Matsumoto, Masahiro Ichihara
  • Patent number: 9496808
    Abstract: A method and apparatus (2) for masking a portion (36) of a component (30), the apparatus (2) comprising: a sacrificial masking element (4) for masking the portion (36); and a locating jig (6) detachably connectable to the sacrificial masking element (4) and configured to position the sacrificial masking element (4) over the portion (36) of the component (30).
    Type: Grant
    Filed: February 2, 2012
    Date of Patent: November 15, 2016
    Assignee: ROLLS-ROYCE plc
    Inventor: Jeffrey C. Bishop
  • Patent number: 9425028
    Abstract: A plasma processing apparatus includes an upper electrode arranged at a processing chamber and including a plurality of gas supplying zones, a branch pipe including a plurality of branch parts, an addition pipe connected to at least one of the branch parts, and a plurality of gas pipes that connect the branch parts to the gas supplying zones. The upper electrode supplies a processing gas including a main gas to the processing chamber via the gas supplying zones. The branch pipe divides the processing gas according to a predetermined flow rate ratio and supplies the divided processing gas to the gas supplying zones. The addition pipe adds an adjustment gas. A gas flow path of the gas pipe connected to the branch part to which the addition pipe is connected includes a bending portion for preventing a gas concentration variation according to an adjustment gas-to-main gas molecular weight ratio.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: August 23, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Yusei Kuwabara, Nobuaki Shindo, Sachie Ishibashi, Takahiko Kato, Noboru Maeda
  • Patent number: 9355857
    Abstract: Provided are a substrate manufacturing method and a substrate manufacturing apparatus used therefor. The substrate manufacturing method includes providing a substrate having a mask film into a chamber. A plasma reaction is induced in the chamber. A first gas and a second gas are alternately provided into the chamber to etch the substrate. Each of the first and second gases is provided into the chamber at a stabilized feed pressure including a pressure fluctuation profile comprising a square wave shape.
    Type: Grant
    Filed: April 3, 2015
    Date of Patent: May 31, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kangmin Jeon, Kyung-Sun Kim, Dougyong Sung, Tae-Hwa Kim, Heungsik Park, Jung Min Kim
  • Patent number: 9241372
    Abstract: The invention concerns a device for heating an object (6) in an intense magnetic field, comprising:—a light source (1), an optic fiber (2) for transporting the light emitted by said light source (1) and emitting a beam of light in the direction of the object (6) to be heated, a converging optical system (3), a diaphragm (4) positioned at the focusing point of the optical system (3),—a reflector (5), whereof the inner wall is defined by the revolution of a semi-parabola around an axis perpendicular to the optical axis of the parabola and passing through the focal point of said parabola, the optical axis of said reflector (5) coinciding with the optical axis (A) of the optical system (3) and the focal point (F?) of said reflector coinciding with the focusing point of said optical system (3).
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: January 19, 2016
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), UNIVERSITE JOSEPH FOURIER—GRENOBLE 1
    Inventors: Pierre-Frederic Sibeud, Eric Beaugnon, Gilles Pont
  • Patent number: 9079739
    Abstract: An apparatus for controlling the nip force between a fixed roll having a first longitudinal axis and a pivoting roll pivotable about a pivot axis and having a second longitudinal axis is disclosed.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: July 14, 2015
    Assignee: The Procter & Gamble Company
    Inventors: George Vincent Wegele, Frederick Edward Lockwood
  • Patent number: 9073282
    Abstract: The present disclosure provides a process for monitoring and controlling the nip force between a fixed roll having a first longitudinal axis and a pivoting roll having a second longitudinal axis.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: July 7, 2015
    Assignee: The Procter & Gamble Company
    Inventors: George Vincent Wegele, Frederick Edward Lockwood
  • Publication number: 20150132505
    Abstract: A plasma processing apparatus is provided. According to the apparatus, a main antenna connected to a high frequency power source and an auxiliary antenna electrically insulated from main antenna is arranged. Moreover, projection areas when the main antenna and the auxiliary antenna are seen in a plan view are arranged so as not to overlap with each other. More specifically, the auxiliary antenna is arranged on a downstream side in a rotational direction of the turntable relative to the main antenna. Then, a first electromagnetic field is generated in the auxiliary antenna by way of an induction current flowing through the main antenna, and a second induction plasma is generated even in an area under the auxiliary antenna in addition to an area under the main antenna by resonating the auxiliary antenna.
    Type: Application
    Filed: November 12, 2014
    Publication date: May 14, 2015
    Inventors: Hitoshi KATO, Shigehiro MIURA, Chishio KOSHIMIZU, Jun YAMAWAKU, Yohei YAMAZAWA
  • Publication number: 20150126046
    Abstract: A processing system is disclosed, having a multiple power transmission elements with an interior cavity that may be arranged around a plasma processing chamber. Each of the power transmission elements may propagates electromagnetic energy that may be used to generate plasma within the plasma process chamber. The power transmission elements may be designed to accommodate a range of power and frequency ranges that range from 500W to 3500W and 0.9 GHz to 9 GHz. In one embodiment, the power transmission elements may include a rectangular interior cavity that enables the generation of a standing wave with two or more modes. In another embodiment, the power transmission elements may have a cylindrical interior cavity that may be placed along the plasma processing chamber or have one end of the cylinder placed against the plasma processing chamber.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 7, 2015
    Inventors: Merritt Funk, Megan Doppel, John Entralgo, Jianping Zhao, Toshihisa Nozawa
  • Patent number: 9021983
    Abstract: According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: May 5, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ryoichi Inanami, Shinichi Ito, Hiroshi Koizumi, Akihiro Kojima
  • Patent number: 9011636
    Abstract: A controller 90 of an automatic matching unit includes a first and a second matching control unit 100, 102 for respectively variably controlling the electrostatic capacitances of a first and a second variable capacitors 80, 82 through a first and a second stepping motor 86, 88 such that a measured absolute value ZMm and a measured phase Z?m of a load impedance obtained by an impedance measuring unit 84 become close to a predetermined reference absolute value ZMs and a predetermined reference phase Z?s, respectively; and a gain control unit 112. The gain control unit 112 variably controls a proportional gain of at least one of the first and the second matching unit based on current electrostatic capacitances NC1 and NC2 of the first and the second variable capacitors 80, 82 obtained by a first and a second electrostatic capacitance monitoring unit 108, 110, respectively.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: April 21, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Mitsutoshi Ashida
  • Patent number: 9010272
    Abstract: A device for depositing a mixture of powders to form an object with composition gradients, including: a plurality of tanks respectively configured to contain different powders; a powder mixer placed under the tanks and including a rotatably mounted mixing member; a plurality of powder dispensing mechanisms respectively cooperating with the tanks, and each configured to regulate mass flow rate of the powder escaping from a respective of the tanks towards the mixer; a powder mixture collector placed under the mixer; and a powder mixture dispenser placed under the collector.
    Type: Grant
    Filed: November 26, 2009
    Date of Patent: April 21, 2015
    Assignee: Commissariat a l'energie atomique et aux energies alternatives
    Inventors: Olivier Gillia, Basile Caillens
  • Publication number: 20150096684
    Abstract: In a plasma processing apparatus, when pulse-modulating the high frequency power RF1 for plasma generation and the high frequency power RF2 for ion attraction with a first pulse PS1 and a second pulse PS2 having different frequencies, respectively, an impedance sensor 96A in a matching device 40 of a plasma generation system calculates an average value (primary moving average value ma) of an load impedance on a high frequency transmission line 43 for each cycle of the second pulse PS2 having a lower frequency, and outputs a load impedance measurement value based on those average values of the load impedance. Then, a matching controller 94A controls reactances of reactance elements XH1 and XH2 within a matching circuit 88A such that the load impedance measurement value is equal or approximate to a matching point (50?).
    Type: Application
    Filed: October 8, 2014
    Publication date: April 9, 2015
    Inventors: Koichi Nagami, Koji Itadani, Tsuyoshi Komoda
  • Patent number: 8973525
    Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: March 10, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jong-Won Hong, Seok-Rak Chang, Chang-Mog Jo, Young-Mook Choi, Jae-Kwang Ryu
  • Publication number: 20150053553
    Abstract: The antenna has a structure that the high frequency electrode is received in a dielectric case. The high frequency electrode has a go-and-return conductor structure that two electrode conductors are disposed close to and in parallel to each other with a gap therebetween to form a rectangular plate shape as a whole, and the two electrode conductors are connected by a conductor at an end in the longitudinal direction. A high frequency current flows in the two electrode conductors in opposite directions. A plurality of openings are formed on edges of the two electrode conductors on the side of the gap, and the openings are dispersed and arranged in the longitudinal direction of the high frequency electrode. The antenna is disposed in a vacuum container in a direction that a main surface of the high frequency electrode and a surface of the substrate are substantially perpendicular to each other.
    Type: Application
    Filed: August 22, 2014
    Publication date: February 26, 2015
    Inventors: YASUNORI ANDO, KAZUHIKO IRISAWA, SHIGEAKI KISHIDA, MASAKI CHIBA
  • Patent number: 8960123
    Abstract: Disclosed are coating apparatus including flow coating and roll-coating that may be used for uniform sol-gel coating of substrates such as glass, solar panels, windows or part of an electronic display. Also disclosed are methods for substrate preparation, flow coating and roll coating. Lastly systems and methods for skin curing sol-gel coatings deposited onto the surface of glass substrates using a high temperature air-knife are disclosed.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: February 24, 2015
    Assignee: Enki Technology, Inc.
    Inventors: Brenor L. Brophy, Sina Maghsoodi, Patrick J. Neyman, Peter R. Gonsalves, Jeffrey G. Hirsch, Yu S. Yang
  • Patent number: 8957759
    Abstract: A system, method, and computer-usable medium are disclosed for providing information relating to damage incurred by a vehicle in an accident. A first plurality of markers with a first set of identifiers is embedded in a coating applied to a component of a first vehicle and a second plurality of markers with a second set of identifiers is embedded in a coating applied to a component of a second vehicle. Markers from the first vehicle are transferred to the second vehicle upon impact during an accident. The transferred markers are read by a marker reader and then processed to determine the identity of the first vehicle.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: February 17, 2015
    Assignee: United Services Automobile Association
    Inventors: Reynaldo Medina, III, Michael P. Bueche, Jr.
  • Patent number: 8943998
    Abstract: An apparatus for cladding the interior surfaces of a curved pipe section includes a flexible track that is positioned longitudinally within the curved pipe and supported at opposite ends to corresponding opposite ends of the curved pipe. The flexible track is caused to bend and conform to the radius of curvature of an interior surface of the curved pipe. A robotic crawler is supported on the track section and carries a material applicator head. The robotic crawler is driven back-and-forth across the track section while the material applicator head applies an overlay material to the interior surface of the curved pipe. In a method, the position of the curved pipe in space, the travel direction and speed of the crawler and the position of the application head are all coordinated to maintain the application of the overlay material in the “flat plane” position.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 3, 2015
    Inventor: Don Gano
  • Patent number: 8931431
    Abstract: A first device is provided. The device includes a print head. The print head further includes a first nozzle hermetically sealed to a first source of gas. The first nozzle has an aperture having a smallest dimension of 0.5 to 500 microns in a direction perpendicular to a flow direction of the first nozzle. At a distance from the aperture into the first nozzle that is 5 times the smallest dimension of the aperture of the first nozzle, the smallest dimension perpendicular to the flow direction is at least twice the smallest dimension of the aperture of the first nozzle.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: January 13, 2015
    Assignee: The Regents of The University of Michigan
    Inventors: Stephen R. Forrest, Gregory McGraw
  • Patent number: 8925481
    Abstract: Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of a total mass flow and a corresponding change in a chamber pressure accepting the mixture flow, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to a vacuum processing chamber, enabling precision semiconductor processing.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: January 6, 2015
    Assignee: Intermolecular, Inc.
    Inventors: ShouQian Shao, Jay DeDontney, Jason Wright
  • Publication number: 20140377450
    Abstract: An ultrasonic transmitting and receiving device is provided for measuring the transmission and/or reflection of ultrasonic waves on a thin material sheet, or a coating applied thereto. The device may include a plurality of ultrasonic transmitters, a plurality of ultrasonic receivers, wherein the number of the ultrasonic transmitters corresponds to the number of the ultrasonic receivers, and one receiver electronics respectively for each of the ultrasonic receivers or a group receiver electronics respectively for a predetermined number of ultrasonic receivers. A method is provided for ultrasonic absorption and/or transmission measurement, in which signals are emitted by multiple ultrasonic transmitters at the same time or nearly at the same time which are received by ultrasonic receivers and in which the received signals are evaluated in parallel.
    Type: Application
    Filed: September 4, 2014
    Publication date: December 25, 2014
    Inventor: Helmut Knorr
  • Patent number: 8904957
    Abstract: An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., ?400 to ?600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: December 9, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Akihiro Kikuchi, Satoshi Kayamori, Shinya Shima, Yuichiro Sakamoto, Kimihiro Higuchi, Kaoru Oohashi, Takehiro Ueda, Munehiro Shibuya, Tadashi Gondai
  • Patent number: 8899174
    Abstract: A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: December 2, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Won-Hyouk Jang, Eu-Gene Kang, Joo-Hwa Lee, Min-Jeong Hwang
  • Patent number: 8901012
    Abstract: According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: December 2, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Hatano, Hiroshi Tokue
  • Patent number: 8893649
    Abstract: The imprint apparatus of the present invention includes a holding unit configured to hold a mold; a particle inspection unit configured to inspect whether or not particle is present on an imprint area, in which the resin pattern is formed, of the substrate; a dispenser configured to apply an uncured resin to the imprint area; a movable unit configured to move the imprint area with respect to the holding unit; and a controller. The movable unit is capable of moving the imprint area to each of an inspection position by means of the inspection unit, an application position by means of the dispenser, and a contacting position by means of the holding unit. Also, the controller causes the inspection unit to perform inspection of the imprint area in association with the movement of the imprint area by means of the movable unit.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: November 25, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroshi Sato
  • Patent number: 8887657
    Abstract: According to one embodiment, a film forming system includes: a stage including a placement surface on which an object to be coated is placed; a rotating mechanism rotating the stage in a rotational direction along the placement surface; an application nozzle discharging a material onto the object placed on the stage for application; a moving mechanism relatively moving the stage and the application nozzle along the placement surface in a cross direction crossing the rotational direction; a controller performing a control to rotate the stage on which the object is placed through the rotating mechanism while relatively moving the stage and application nozzle along the placement surface in the cross direction through the moving mechanism and applying the material to the object on the stage through the application nozzle; and a cleaning apparatus cleaning the application nozzle.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: November 18, 2014
    Assignees: Kabushiki Kaisha Toshiba, Chugai Ro Co., Ltd.
    Inventors: Kenichi Ooshiro, Tsuyoshi Sato, Takao Tokumoto, Sadao Natsu, Souichirou Iwasaki
  • Publication number: 20140326178
    Abstract: The present disclosure discloses an electromagnetic vapor deposition apparatus comprising a plurality of electromagnets which form a plurality of electromagnetic regions when electronic current passes through. A programmable control equipment is electronically connected to each magnet unit to control magnetic polarity and magnetic intensity of each magnet unit. The programmable control equipment can adjust the magnetic intensity of each of the plurality of electromagnetic regions to adsorb the metal mask tightly. Meanwhile, the problem of colors mixing is overcome.
    Type: Application
    Filed: May 1, 2014
    Publication date: November 6, 2014
    Applicant: EverDisplay Optronics (Shanghai) Limited
    Inventors: ChiaChen LI, TeinWang HUANG
  • Patent number: 8875653
    Abstract: A solar cell extrusion printing system that uses a micro-extrusion printhead to print longer central gridlines and one or more pairs of shorter “side” gridlines such that end points of the gridline sets form step patterns on an octagonal (pseudo-square) substrate. The printhead includes a set of central nozzles that receive ink from a first valve by way of a first flow channel to print the longer central gridlines, and additional sets of side nozzles that receive ink from additional valves by way of additional flow channels to print the shorter “side” gridlines. The central nozzles have outlet orifices that offset in the process direction from side outlet orifices of the side nozzles. A start signal is simultaneously sent to the valves such that ink is substantially simultaneously extruded through both the central and side orifices, whereby the extruded ink produces gridline endpoints having the desired step pattern.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: November 4, 2014
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Corie Lynn Cobb, Scott E. Solberg
  • Patent number: 8875654
    Abstract: The invention provides an apparatus for manufacturing a cylindrical member comprising a cylindrical core body having an outer peripheral surface with a releasing property, the apparatus comprising: a film-forming device that forms a resin film in a region at a central portion from both ends in the axial direction of the outer peripheral surface of the core body; a judging device that judges the deterioration of the releasing property of regions continuous from the region where the resin film is to be formed in the region at the inner side from both ends in the axial direction of the outer peripheral surface of the core body, before the resin film is formed by the film-forming device; and a control device that controls the film-forming device such that the resin film is formed by exposing regions with an undeteriorated releasing property on both ends in the axial direction of the outer peripheral surface of the core body, in accordance with the results of judgment by the judging device.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: November 4, 2014
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Yuji Hara, Arimichi Fukuda
  • Patent number: 8851010
    Abstract: Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of the total gas mixture properties, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to vacuum processing chamber, using either novel ozone sensor or existing mass flow meter or controller.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: October 7, 2014
    Assignee: Intermolecular, Inc.
    Inventors: ShouQian Shao, Jay DeDontney, Jason Wright
  • Patent number: 8833297
    Abstract: The invention relates to a high-pressure device for the application of an expandable reaction mixture on a surface, to a method for producing expandable foams, to a device for producing sandwich composite elements, and to a method for producing expanded sandwich composite elements. The high-pressure device includes a mixing head, a distributor head fluidically connected downstream of the mixing head, at feast three outlet lines attached to the distributor head, a high-pressure feed line of a component to the mixing head, a high pressure feed line of a component B to the mixing head, at least one static mixer for mixing an inert gas to the component A, the component B or a mixture of components A and B, at least one high-pressure feed line for the inert gas, which is under increased pressure, and at least one measurement and control unit for the desired pressure of the components on the mixing head.
    Type: Grant
    Filed: January 27, 2010
    Date of Patent: September 16, 2014
    Assignee: Bayer MaterialScience AG
    Inventors: Thomas Rub, Uwe Kenzel
  • Patent number: 8833296
    Abstract: A dispensing apparatus includes a dispensing unit having a main body, a channel through the main body, and a plurality of nozzles connected to the main body, the plurality of nozzles being configured to dispense fluid flowing in the channel, a gap sensor unit configured to determine size of gaps between adjacent nozzles in the dispensing unit, and a thermal expansion adjusting unit configured to thermally expand or contract the main body of the dispensing unit to adjust the gap size between adjacent nozzles to a predetermined size, based on the gap size determined by the gap sensor unit.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: September 16, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae-Seok Park, Yun-Mi Lee
  • Publication number: 20140245951
    Abstract: A current detection resistor is connected between an output terminal of a high voltage generator and an air motor. A coater current detector detects a coater current supplied to a coater based on a potential difference taking place on both terminals of the current detection resistor. The high-voltage control device serves to discriminate based on the coater current detected by the coater current detector whether the coater is caused to be close to a coating object. When it is discriminated that the coater is caused to be close to the coating object, the high-voltage control device outputs a shut-off signal for shutting off supply of the power supply voltage to the power supply voltage control device.
    Type: Application
    Filed: January 17, 2013
    Publication date: September 4, 2014
    Applicant: ABB K.K.
    Inventor: Yukio Yamada
  • Patent number: 8807076
    Abstract: This invention discloses apparatus for processing one or more of a Lens Precursor, a Lens Precursor Form and an ophthalmic Lens. The apparatus provides for vapor phase processing of the subject Lens Precursor, a Lens Precursor Form and an ophthalmic Lens.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: August 19, 2014
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: John B. Enns, Michael F. Widman, Joe M. Wood, P. Mark Powell, Ture Kindt-Larsen
  • Publication number: 20140225232
    Abstract: Atomic layer deposition (ALD) techniques typically involve briefly exposing the surface of a substrate to a precursor within an atomic layer deposition chamber, and purging the chamber with a purge gas, such as nitrogen, before exposing the substrate to a second precursor. A series of such cycles results in the deposition of microscopically thin film layers on the substrate surface that are further processed to generate a semiconductor component. In order to reduce unintended oxygen deposition, the chamber is typically evacuated to a vacuum level of 10e?06 torr-liters/second, which is suitable for the related techniques of chemical vapor deposition. However, atomic layer deposition is demonstrably more sensitive to oxygen contamination, due to the exposure of each layer to residual oxygen within the chamber. Tighter process control is achievable by performing atomic layer deposition at a higher vacuum level, not exceeding approximately 10e?06 torr-liters/second, in order to reduce oxygen contamination.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 14, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Su-Horng Lin, Kuang-Kuo Koai
  • Patent number: 8800481
    Abstract: An adhesive application apparatus sets a dot pattern such that an amount of paste applied to an area on the reverse side of an area on which an image is formed and an amount of paste applied to an area on the reverse side of an area on which the image is not formed are different from each other, and controls a paste discharge head so that the dot pattern having been set is formed on an adhesion surface of paper. Through this, the amount of paste applied to paper can be changed between an area where an image is formed and an area where the image is not formed, thereby making it possible to apply the paste to paper more appropriately in accordance with the state of image formation.
    Type: Grant
    Filed: February 1, 2012
    Date of Patent: August 12, 2014
    Assignee: Seiko Epson Corporation
    Inventor: Masaru Hoshino
  • Patent number: 8784935
    Abstract: A hot melt adhesive system includes a melting unit configured to liquefy a bulk form of hot melt adhesive and deliver the liquefied hot melt adhesive to an application location. The melting unit includes a controller for establishing and/or verifying at least one system condition, such as temperatures associated with system operation. A machine reading unit is coupled with the controller and is capable of receiving information from a machine readable element and communicating the information to the controller for use in establishing and/or verifying the system condition. A method of operating the system includes scanning information on at least one system condition into the controller from a machine readable element, and using the scanned information during operation of the melting unit.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: July 22, 2014
    Assignee: Nordson Corporation
    Inventors: Rick Pallante, John M. Raterman