Abstract: Two axially parallel rolls are pressed against each other in a device for producing and/or treating a moving material web. Sensor elements are arranged in the force transmission path running from the force-producing elements via the rolls, outside roll bodies of the two rolls. As a result of displacing the sensor elements out of the roll bodies of the rolls, the production of the rolls is less complicated and less expensive. No sensors have to be embedded in the roll bodies, which opens up the possibility of using standard rolls. In addition, the occasional grinding of the rolls can in this way be performed without any regard to the sensor elements. Nevertheless, the pressure prevailing between the rolls can continue to be measured directly, since the sensor elements are arranged in the transmission path of the pressing force.

Abstract: A conductor forming apparatus includes a reaction container having housed therein a processing target on a surface of which a recess in which a conductor is to be provided is formed, and a process for providing the conductor in the recess being carried out inside the container after a supercritical fluid dissolved with a metal compound is supplied into the container, a supply device which supplies the fluid from an outside to the inside of the container, and a discharge device which discharges the fluid that is not submitted for the process from the inside to the outside of the container, wherein while an amount of the fluid in the container is adjusted by continuously supplying the fluid into the container by the supply device and continuously discharging the fluid that is not submitted for the process to the outside of the container by the discharge device.

Abstract: The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterized in that an on-board camera (54) and pyrometer (70) are used to measure the properties of the jet (16) and the temperature of the deposit (24) on the part (22) and in that the correction to be made to supply parameters of the torch (12) is deduced. Furthermore, the invention is characterized in that the corrected parameters are sent to the cabinet (30) that controls the torch (12).

Abstract: A slit nozzle which is easily manufactured and in which no capillary action occurs, and an apparatus for supplying a treatment liquid using the slit nozzle are disclosed. The slit nozzle is constructed of a left portion and a right portion joined to each other, one of which is made of metal and the other of which is made of resin. In the apparatus for supplying a treatment liquid using one or more of the slit nozzles, the slit nozzles are provided in a circulating passage of a treatment liquid whose temperature is controlled.

Abstract: A method of designing and the resulting thermally stable heated coating die apparatus, the die apparatus including a die having a die geometry and a heating system with heaters and temperature sensors. The method and resultant apparatus provides minimized temperature gradients, flat die lip faces in a die to roll plane and a flat die in a plane perpendicular to die flat lip faces and parallel to substrate width. The method optimizes simultaneously: die geometry, placement of the heaters, placement of temperature sensors, and shielding from operating conditions, using heat transfer and structural numerical modeling and statistical analysis while considering die functionality characteristics, minimum increment of temperature measurement and control accuracy related to minimum acceptable deviation from flatness, coating die material of construction relative to thermo-structural material properties, and desirable coating die material properties.

Abstract: A decorator temperature control system includes a recirculation loop configured to recirculate a solution and a feeder line configured to receive the solution from the recirculation loop and deliver the solution to at least one ink roller on a decorator. A feed valve is located between the recirculation loop and the feeder line and proximate the decorator and is configured to control the flow of the solution from the recirculation loop to the feeder line. The valve is controlled from a location remote from the decorator.

Abstract: A workpiece is processed uniformly, e.g., a uniform plated film is formed on a workpiece, by a processing liquid, e.g., a plating solution, which is maintained in an optimum state while minimizing the amount of the processing liquid to be used. An apparatus for processing the workpiece has a plurality of solution supply tanks 50a, 50b for individually holding a plurality of solutions, respectively, to be mixed into a processing liquid 54 while managing the temperatures of the solutions, a plurality of mixing tanks 52a, 52b for mixing the solutions individually supplied from the solution supply tanks 50a, 50b into the processing liquid 54 while managing the temperatures of the solutions, and a processing bath 56 for introducing the processing liquid 54 therein and processing the workpiece, e.g., a substrate W, by bringing the workpiece into contact with the processing liquid 54 while managing the temperature of the processing liquid 54.

Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).

Abstract: An apparatus for processing a substrate has a liquid supply unit, a nozzle unit, a first valve and a second valve. The liquid supply unit has an output port and an input port, and a processing liquid is output from the output port. The nozzle unit has a first port and a second port, and the first port is connected to the output port of the liquid supply unit. The first valve is connected between the second port of the nozzle unit and the input port of the liquid supply unit. The second valve is connected between the second port of the nozzle unit and the output port of the liquid supply unit. Moreover, the switch states of the first and second valves are opposite in order to control whether the nozzle unit spreads the processing liquid on the substrate.

Abstract: The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measured by means of a camera (54) and a combined pyrometer (70). The correction to be made to the supply parameters of the torch (12) are deduced therefrom and the corrected parameters are transmitted to the unit (30) controlling the torch (12).

Abstract: The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterised in that an on-board camera (54) and pyrometer (70) are used to measure the properties of the jet (16) and the temperature of the deposit (24) on the part (22) and in that the correction to be made to the supply parameters of the torch (12) is deduced. Furthermore, the invention is characterised in that the corrected parameters are sent to the cabinet (30) that controls the torch (12).

Abstract: An apparatus for measuring withwise ejection uniformity of a slit nozzle comprises a plurality of oil pressure measuring units that are arranged in parallel in a widthwise direction of the slit nozzle so as to measure ejection pressure of fluid to be ejected from an ejection port of the slit nozzle, each oil pressure measuring unit having an oil-pressure detection surface facing the ejection port of the slit nozzle; and a control unit that measures ejection pressure applied to the oil pressure measuring unit so as to calculate the uniformity to display.

Abstract: A resin block has a treating solution channel extending between and opening at front and back surfaces thereof. Heat conductive members are face-bonded to the front and back surfaces of the resin block, respectively, for closing the channel. Consequently, no air is present between the resin block and heat conduction members, thereby improving the efficiency of heat exchange. A nozzle of simple construction is realized only by face-bonding the two heat conductive members to the open front and rear surfaces of the resin block. Temperature control plates hold the heat conductive members along with the resin block to effect a temperature control, whereby the temperature of a treating solution in the treating solution channel is controlled effectively through the heat conductive members. The treating solution adjusted to a desired temperature is delivered from a discharge opening to a substrate for performing substrate treatment with high accuracy.

Abstract: An elevated containment structure in the shape of a wafer edge ring surrounding a surface of a semiconductor wafer is disclosed, as well as methods of forming and using such a structure. In one embodiment, a wafer edge ring is formed using a stereolithography (STL) process. In another embodiment, a wafer edge ring is formed with a spin coating apparatus provided with a wafer edge exposure (WEE) system. In further embodiments, a wafer edge ring is used to contain a liquid over a wafer active surface during a processing operation. In one embodiment, the wafer edge ring contains a liquid having a higher refractive index than air while exposing a photoresist on the wafer by immersion lithography. In another embodiment, the wafer edge ring contains a curable liquid material while forming a chip scale package (CSP) sealing layer on the wafer.

Abstract: Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with deposited layers substantially free of residual compounds from the reaction process. Heating reactant gases prior to introduction to a reaction chamber may be used to improve physical characteristics of the resulting deposited layer, to improve the physical characteristics of the underlying substrate and/or to improve the thermal budget available for subsequent processing.

Abstract: A device for applying a coating medium onto a substrate, includes at least one spray valve that has a nozzle opening that can be adjusted with regard to its effective outlet area using a closing mechanism, whereby the substrate can be moved past the spray valve, which can be supplied with the coating medium under pressure via a supply line, whereby the positioning device is assigned a regulator that has at least one target value input for the instantaneously required outflow rate of the coating medium from the spray valve and at least one actual value input for the mass flow rate through a supply section arranged in front of the nozzle opening, and from the deviation between these values, the regulator forms an adjustment signal that moves the positioning device in the direction to offset the deviation.

Abstract: A coating equipment managing system for controlling and monitoring a coating equipment of an automobile manufacturing line, comprising local installations which are provided in the manufacturing lines at a plurality of localities, and a central installation for receiving data from the plurality of local installations, wherein the local installation comprises a sensor installed in the coating equipment, a data acquisition unit for receiving signals from the sensor, a control unit for controlling the coating equipment, and a local communication unit; the central installation comprises a server unit and a central analysis unit; the local communication unit transmits the data from the data acquisition unit to the server unit by E-mail; the server unit transmits correction data for the coating equipment obtained from the analysis of the measured data by the central analysis unit to the local communication unit by E-mail; and the local communication unit converts the correction data into a control code and transmit

Abstract: A method and apparatus for coating a work piece. The system comprising an applicator adapted to travel over a portion of the work piece. The system being operable to heat the work piece and/or apply a coating onto the work piece as the applicator travels over the work piece. The system may comprise an induction heating system to heat the work piece. The system may be adapted to apply a variety of coatings, such as a liquid coating and a dry powder coating. The applicator being operable to heat the work piece prior to applying the coating or heating the work piece after the coating has been applied. The applicator may also be adapted to apply heat to heat shrink a coating material onto the work piece.

Abstract: A method of forming a ferroelectric film includes the steps of forming a layer by a material that takes a metal state in a reducing ambient and an oxide state in an oxidizing ambient, and depositing a ferroelectric film on a surface of the layer by supplying gaseous sources of the ferroelectric film and an oxidizing gas and causing a decomposition of the gaseous sources at the surface of said layer, wherein the step of depositing the ferroelectric film is started with a preparation step in which the state of the surface of said layer is controlled substantially to a critical point in which the layer changes from the metal state to the oxide state and from the oxide state to the metal state.

Abstract: A chemical treating apparatus for performing a predetermined treatment of a principal surface of a substrate by delivering a treating solution thereto. The apparatus includes a treating solution delivery nozzle for delivering the treating solution to the principal surface of a substrate. The nozzle has a treating solution reservoir adjacent a tip end thereof for storing the treating solution. A temperature control device holds the treating solution reservoir to control the temperature of the treating solution in the treating solution reservoir through heat exchange with the treating solution.

Abstract: A method of designing and the resulting thermally stable heated coating die apparatus, the die apparatus including a die having a die geometry and a heating system with heaters and temperature sensors. The method and resultant apparatus provides minimized temperature gradients, flat die lip faces in a die to roll plane and a flat die in a plane perpendicular to die flat lip faces and parallel to substrate width. The method optimizes simultaneously: die geometry, placement of the heaters, placement of temperature sensors, and shielding from operating conditions, using heat transfer and structural numerical modeling and statistical analysis while considering die functionality characteristics, minimum increment of temperature measurement and control accuracy related to minimum acceptable deviation from flatness, coating die material of construction relative to thermo-structural material properties, and desirable coating die material properties.

Abstract: An automated hot melt adhesive application apparatus useful in the manufacture of furniture padding. The apparatus includes a glue head attached to an X-Y-Z positioner. A conveyor belt positions a padding article near the glue head and a bead of adhesive is sprayed in a preselected pattern on the article.

Abstract: The invention relates to a method of preparing a surface to be treated such as a surface to be painted. The surface is initially divided into so-called patches by a method known. Subsequently, the patches are grouped in so-called main faces by the method according to the invention. The main faces are used for defining a number of so-called virtual surfaces, also by the method according to the invention, and the virtual surfaces are used to establish lines of treatment along the surface, such as paint lines, said lines of treatment defining the subsequent motion of the tool for treatment.

Abstract: A method and apparatus for coating hams is provided. Sugar is uniformly dispensed on an inclined plate that is heated to melt the sugar. The sugar flows into a reservoir from which it is poured onto hams passing below the reservoir on a conveyor. Spices are poured onto the melted sugar that sticks to the ham to form a glaze. Jets of water can cool the glaze to increase retention on the ham. The process can be repeated.

Abstract: Methods and apparatus for fabricating and cleaning in-process semi-conductor wafers are provided. An in-process wafer is placed within a closed chamber. A reactant gas is incorporated in a liquid solvent to form a “reactant mixture” that is capable of reacting with photoresist material (or other material) on a wafer surface to facilitate removal of the material from the wafer surface. The reactant mixture is condensed on one or more of the in-process wafer surfaces to form a thin film on the surface(s) of the wafer. The solvent in the reactant mixture acts as a transport medium to place the reactant gas on the wafer surface. The reactant gas is then able to react with the photoresist material (or other material) on the in-process wafer surface to effect removal the material. Following reaction of the reactant gas with the photoresist, the thin film of reactant mixture is removed from the wafer surface by flash heating, rinsing, draining, or other suitable means.

Abstract: Methods and systems for controlling evaporative drying processes using environmental equivalency control process parameters to provide a specified product quality. In an environmental equivalency-based control system, measured values are received by environmental equivalency calculation hardware or software. An environmental equivalency value is calculated based on the measured parameters. One or more of the process parameters may then be varied to maintain the environmental equivalency value for the process within a predetermined range of environmental equivalency values.

Abstract: A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.

Abstract: An applicator device and method where on the one hand adherence of particles in the dispensing area of the applicator nozzle, and on the other hand a thermal deflection of applicator device components can be prevented, or at least minimized. At least one thermal control channel through which a fluid flows is integrated into at least one of the two nozzle lips of the applicator device. Water or air can be used as temperature controlling fluids.

Abstract: Temperature control of the coating medium is performed to influence the processability of coating media in an applicator system. In order to operate without losing efficiency, devices acting directly from the inside or the outside for heat supply or dissipation are connected to the elements guiding the coating medium. The temperature of the coating medium is influenced by measuring the temperature within the coating medium and, if necessary, at the elements guiding the coating medium.

Abstract: The present invention is a film forming unit for applying a coating solution to a substrate to form a coating film on the substrate, which has a heating and/or cooling member brought into direct or indirect contact with said substrate for changing a temperature of at least a peripheral portion of the substrate. By changing the temperature of a perimeter portion of the substrate by means of it, a temperature of the coating solution applied on the substrate can be changed. Consequently, surface tension of the coating solution decreases or increases, and swelling of the coating solution occurring at the substrate perimeter portion and reduction in film thickness can be prevented. As a result, a coating film with a predetermined film thickness is formed also on the perimeter portion of the substrate, thus making it possible to enhance yield.

Abstract: The present invention disclosed the deposition source installed in a chamber, heated by applied electric power to transfer heat to a vapor deposition material received therein and applying a vaporized deposition material generated therein to a substrate to form deposition organic electroluminescent layers onto the substrate, and comprising a vessel consisted of a top plate on which a vapor efflux aperture is formed, a side wall, and a bottom wall; a heating means for supplying heat to the deposition material received in the vessel, the heating means being capable of moving vertically; and a means for moving the heating means (or the bottom wall), the moving means (or the bottom wall) being operated in response to the signal of a sensing means on varied distances between the heating means and the surface of said deposition material.

Abstract: An apparatus for processing a substrate of the present invention comprises a holder holding a substrate, a supply pipe being supplied with a processing solution from a first end and supplying the processing solution to the substrate from a second end, a first temperature controller having a first temperature controlled water circulated inside which controls a first temperature around the second end of the supply pipe and a second temperature controller having a second temperature controlled water drained from the first temperature controller circulated inside, which controls a second temperature around the first end of the supply pipe. With such a configuration, the temperature controlled water used for controlling the temperature of the processing solution just before its application onto the substrate can be recycled for controlling the temperature of the processing solution just after being supplied to a supply pipe.

Abstract: A coating system for supplying a coating medium to sheet material in a printing press. The coating system includes a tempering system operable for influencing the temperature of both a coating medium processed through the applicator system and rinsing mediums supplied to the applicator system for cleaning the system. The tempering system includes and intermediate container connected to the metering system of the applicator system, a first storage container connected to the intermediate container for containing a stored quantity of coating medium, and a second storage or discharge container connected to the intermediate container for a rinsing medium. The intermediate container includes a heat exchanger such that upon selected connection of either the first or second storage containers to the intermediate container, the cleaning medium or the rinsing medium can be individually tempered for optimum processing.

Abstract: An applicator for applying a coating substance to an implantable medical device, such as a stent, is provided. The applicator comprises a nozzle and a temperature controller in communication with the nozzle for adjusting the temperature of the coating substance. A method of using the applicator is also provided.

Abstract: The present invention relates to a process for making disposable absorbent articles comprising adhering two components materials to each other using an improved roll printing process to provide an adhesive to one of the two components, the adhesive has an application temperature which is greater than a print roll temperature.

Abstract: A machine for one of manufacturing and processing a fiber web includes an input end which receives a fiber suspension or a fiber web. The input end includes a plurality of control modules, with each control module controlling at least one of a plurality of adjustable input parameters. A plurality of sensors are provided, with each sensor being configured to sense a physical characteristic of one of the fiber suspension and the fiber web and provide an output signal indicative thereof. A chemistry process controller is coupled with each sensor and each control module to define a closed loop control system. The chemistry process controller controls operation of each control module.

Abstract: An apparatus for performing in-situ curvature measurement of a substrate during a deposition process is provided which includes a clamp for retaining the substrate near one end while leaving the opposite end free. A plurality of displacement sensors are arranged in a spaced apart fashion along the length of the substrate and are directed to a surface of the substrate opposite a surface to be coated. Each sensor provides a signal to a computer corresponding to a position of the substrate relative to the sensor. The computer receives and stores data from the displacement sensors to determine a stress evolution during a deposition process and to determine a coating modulus based upon a resultant curvature of the substrate.

Abstract: A vacuum lubricant deposition station coats a lubricant onto the back side of a moving web prior to coating the front side with emulsions. The deposition station has a sidewall creating a chamber containing a heat source along its bottom and an evaporating tray above the heater which holds the lubricant to be vacuum vapor deposited on the web. A water cooled jacket fits about the top of the sidewall and receives the film through a narrow slot between its top and bottom plates to expose the back side of the film to a vapor cloud of lubricant in the chamber. Lubricant from the cloud deposits on the back side of the web. Stray lubricant from the cloud condenses on the bottom plate which receives cooling water through an inlet. The cooling water traverses the length of the bottom plate, enters the top plate through a water loop connecting the top and bottom plates, and exits through the top plate. The vapor cloud condenses on the bottom plate before reaching the front side of the film.

Abstract: A system for distributing liquid coatings such as epoxys and urethanes onto a substrate base. The system includes a hose for transporting the liquid coating material from a storage container to a spray gun. A heating element within the hose heats the liquid coating material to facilitate transport and distribution of the liquid coating material. The heating element contacts the liquid coating material and can be activated by electrical resistance heating or by other techniques. By placing the heating element directly in contact with the liquid coating material, long line cooling losses are avoided, and heating energy is efficiently transferred to the liquid coating material immediately before distribution. Sensors along the hose length can monitor the liquid coating material temperature at different positions, and heating control over different hose sections can be controlled to efficiently accomplish optimum liquid coating material temperature before the liquid coating material is sprayed.

Abstract: A method for controlling a plating process includes plating a process layer on a wafer in accordance with a recipe; measuring a thickness of the process layer; and determining at least one plating parameter of the recipe for subsequently formed process layers based on the measured thickness. A processing line includes a plating tool, a metrology tool, and a process controller. The plating tool is adapted to form a process layer on a wafer in accordance with a recipe. The metrology tool is adapted to measure a thickness of the process layer. The process controller is adapted to determine at least one plating parameter of the recipe for subsequently formed process layers based on the measured thickness.

Abstract: An applicator has a rubber heater (51) attached to the outer peripheral surface of the application member (4) in the vicinity of a nozzle (3). Thereby, the temperature in the vicinity of the nozzle (3) is controlled by a control unit by detecting the temperature using a thermal resistor (52). A change in the viscosity of the viscous material (2) is prevented by keeping the temperature substantially constant, so that the volume of the viscous material from the nozzle (3) is stabilized.

Abstract: The invention relates to a method and a device for the production of a strip-like metallic composite material by the high-temperature dip coating of a metallic carrier strip, consisting of a metallurgic vessel for receiving the liquid depositing material, through which the carrier strip is capable of being led in a preferably vertical run-through direction by means of pairs of rollers arranged on the entry and the exit side, and of a preheating device for the carrier strip, said preheating device being located upstream of the metallurgic vessel. At the same time, the preheating device (41) is arranged in a housing (61) which is arranged in the entry region upstream of the metallurgic vessel (11) and surrounds the carrier strip (21) and into which the medium coming from a media supply (52) is capable of being introduced via at least one feed (51) led into the housing.

Abstract: In each of a first block where processing for applying an antireflection film on a wafer is performed and a second block where processing for applying a resist film on the wafer is performed, clean air in a down flow is supplied from the top thereof through a temperature and humidity controller for controlling temperature and humidity, in a third block where processing for developing an exposed resist film is performed, clean air in a down flow is supplied from the top thereof through a temperature controller for controlling only temperature, and in a fourth block where transfer of the wafer between the blocks is performed, clean air in a down flow is supplied directly. Thereby, the cost of forming a system environment can be reduced.

Abstract: A method of applying a coating material to a moving strip of substrate comprising the steps of: (a) providing a supply signal from a controller to a coating supply unit to control the supply of coating material from the coating supply unit through a liquid usage detector and a liquid meter unit and to a coater for application to the moving strip; (b) providing a measure signal from the liquid usage detector to the controller to measure the flow rate of coating material through the liquid usage detector; (c) providing a delivery control signal from the controller to the liquid meter unit to control the amount of coating material delivered from the coater to the moving strip; (d) providing a heating signal from the controller to the inline heater to control the heating of coating material within the inline heater; and (e) providing a dispense signal from the controller to the coater to dispense coating material from the coater for application to the moving strip.

Abstract: A resin coating method for applying resin to a predetermined region of a wiring board includes the steps of imaging an external appearance of the resin extruded from a resin application device; and automatically adjusting an amount of the resin extruded from the resin application device based on the external appearance of the resin obtained in the imaging step.

Abstract: A method and apparatus that combines the coating spray booth with process heating and radiation to increase the efficiency of the processing of powder coatings on wood, wood-based composite materials and plastic substrates. The temperature of the parts in process can be maintained within the booth after preheating or elevated in temperature within the booth before, during, and after the application of the coating material. The invention allows for the control of the rate of thermal expansion of heat sensitive materials, thereby reducing substrate damage from cracking. Increased efficiencies permit a significant reduction of processing energy expense. Multiple coatings can be applied and cured to parts in process within the invention while experiencing an overall reduction in the length of the processing system compared to the prior art.

Abstract: An apparatus, method and control system involve treating articles in one or more of a plurality of liquid treatment bath chambers. The apparatus includes one or more article raising and lowering devices and a plurality of treatment bath chambers, preferably having separate heaters, temperature and level monitors, filling and draining devices, and devices for keeping treatment bath components in suspension. The method preferably includes treating articles, preferably eyeglass lenses, by supporting the articles on an arm and dipping them into one or more of the plurality of treatment bath chambers, which may separately contain assorted coating liquids such as tint coatings, UV protection coatings, scratch resistance coatings, neutralizing liquids for removing tinting, and rinsing liquids.

Abstract: Temperature regulation is performed at a buffer cassette in which a wafer is temporarily housed before and after being delivered to/from an aligner, or at an inlet-side delivery stage of a portion for delivering a wafer to the aligner, in reference with a state of temperature regulation of the wafer in the aligner, so that the temperature of the wafer can be more accurately regulated on a temperature regulating plate in the aligner in a shorter time. Therefore, circuit patterns can be accurately transferred, and throughput can be improved by speeding up the processing.

Abstract: A first cooling unit group and a second cooling unit group are disposed in the vicinity of a resist coating unit group. Each of the first cooling unit group and the second cooling unit group is composed of various cooling units. Each of the cooling units cools a wafer. A first heating unit group and a second heating unit group are disposed in the vicinity of a developing unit group. Each of the first heating unit group and the second heating unit group is composed of various heating units. Each of the heating units heats a wafer. A first conveying unit is disposed between the cooling unit groups. A second conveying unit is disposed between the heating unit groups. A transfer table is disposed between the conveying units. The transfer table temporarily holds a wafer. The first conveying unit conveys a wafer among the resist coating unit group, the transfer table, and the cooling unit groups.

Abstract: Inspection equipment for detecting defects in a wafer is provided in a coating and developing system including a plurality of kinds of processing units for performing processing necessary for coating a wafer with a resist and processing necessary for developing the resist on the wafer. The transfer of the wafer between the processing units and the inspection equipment is performed by means of a main transfer device. The inspection equipment sends an inspection result as a detection signal to a controller, and the controller which receives the detection signal controls exposure conditions for an aligner according to the presence or absence of defects and adjusts a frequency regulating mechanism to control inspection frequency. The wafer is transferred between the processing units and the inspection equipment by the main transfer device, whereby the wafer is not artificially contaminated.