Concentration Of Coating Material In Carrier Medium Patents (Class 118/689)
  • Patent number: 10345757
    Abstract: An image forming apparatus includes an image forming unit, an execution unit that executes dew condensation elimination operation for eliminating dew condensation in the image forming unit, a setting unit that sets a dew condensation prevention mode for executing the dew condensation elimination operation to an enabled state, a display unit, and a control unit that causes the display unit to display a warning screen and selects a type of image forming job to be restricted during execution of the dew condensation elimination operation in a case where the dew condensation prevention mode is set to an enabled state, wherein, in a case where an image forming job is received during execution of the dew condensation elimination operation, the control unit determines whether the received image forming job is executable based on the type of job selected.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: July 9, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yojiro Mandachi
  • Patent number: 10331058
    Abstract: An image forming apparatus includes a developer unit, a toner container, a capacitance sensor, a toner amount detector, and a determining unit. The toner container is located to be removably attachable to the image forming apparatus. The toner container supplies a toner to the developer unit. The capacitance sensor is located on a supply passage for the toner from the toner container to the developer unit. The capacitance sensor detects an electric charge amount and a relative dielectric constant of the toner. The electric charge amount is an electric charge amount when the toner passes through the supply passage. The toner amount detector detects an amount of the toner passing through the supply passage based on the electric charge amount detected by the capacitance sensor. The determining unit determines whether the relative dielectric constant of the toner detected by the capacitance sensor is in a predetermined range.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: June 25, 2019
    Assignee: Kyocera Document Solutions Inc.
    Inventor: Keisuke Maeyama
  • Patent number: 10295618
    Abstract: Each of the oscillation frequency of a first oscillation circuit performing oscillation in a state of including a coil and a capacitor and the oscillation frequency of a second oscillation circuit performing oscillation in a state of including a coil and a capacitor different from the coil and the capacitor of the first oscillation circuit is measured. Then, the difference of the measured oscillation frequencies is calculated and then the calculated difference is converted into a magnetic permeability or a dielectric permittivity. One sensor selectively detects a change in the magnetic permeability or a change in the dielectric permittivity of a subject material.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: May 21, 2019
    Assignee: Hitachi Metals, Ltd.
    Inventors: Kazuhiko Osumi, Yuuzo Maruyama, Osamu Shimoe
  • Patent number: 10248045
    Abstract: An object of the invention is to accurately grasp the fluidity of a developer and give proper feedback to an image forming process. An image forming device has a developing unit developing a latent image by transferring a developer to an image carrier, a fluidity measuring unit measuring fluidity of the developer, a correction amount computing unit computing a fluidity correction amount for correcting the fluidity of the developer measured by the fluidity measuring unit, and a process control unit changing a process condition of an image forming process. The process control unit selects, on the basis of the fluidity of the developer corrected based on the fluidity correction amount, an image forming process of changing a process condition from a plurality of image forming processes.
    Type: Grant
    Filed: February 21, 2018
    Date of Patent: April 2, 2019
    Assignee: KONICA MINOLTA, INC.
    Inventor: Katsuya Toyofuku
  • Patent number: 10175610
    Abstract: A developing device includes a rotatable developer carrying member, first and second chambers configured to accommodate developer supplied to the developer carrying member, and first and second rotatable feeding members provided in the first and second chambers, respectively. A first communication port permits feeding of the developer from the second chamber to the first chamber, and a second communication port permits feeding of the developer from the first chamber to the second chamber. In addition, a toner content detecting portion includes a planar detecting surface including at least a planar coil generating a magnetic field and detects the toner content. The detecting surface is provided in the first communication port above a bottom of the first communication port and is disposed substantially in a central portion of the first communication port.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: January 8, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shinya Suzuki
  • Patent number: 9817335
    Abstract: A powder amount detector includes a vibration plate secured to a powder container to contain powder and positioned at a predetermined position in a stationary state, a shaft to rotate inside the powder container, a contact member attached to the shaft, a vibration detector to detect vibration of the vibration plate, and a detection result processor to determine an amount of the powder in the powder container according to a detection result generated by the vibration detector. The contact member is to flip the vibration plate to cause the vibration plate to repeat elastic deformation and reversion to vibrate. The contact member is to exit an area opposed to the vibration plate after the contact member flips the vibration plate by the time the vibration plate returns to the predetermined position.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: November 14, 2017
    Assignee: Ricoh Company, Ltd.
    Inventors: Naohiro Kawashima, Koichi Yamazaki, Nobuo Takami, Atsushi Nakamoto, Shinnosuke Koshizuka, Tatsuya Kubo, Kazunori Suzuki, Hiroshi Hosokawa, Tetsuro Hirota, Kenji Kikuchi
  • Patent number: 9791805
    Abstract: A developing device includes a developer container for storing developer containing carrier and toner, the developer container including a first compartment and a second compartment in which the developer is stirred and fed, a developing roller, and a sensor including a coil. A pair of communication portion is disposed on both ends in a longitudinal direction of the compartments. In addition, a gap is formed between the first compartment and the second compartment, and a part of the first compartment adjacent to the gap is a cylindrical portion through which the developer passes. A flat cable as a coil passes through the gap and is wound around the cylindrical portion so as to form a winding by overlapping both end portions of the flat cable in a state where terminals of wires are shifted by one pitch.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: October 17, 2017
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Masami Mashiki
  • Patent number: 9785078
    Abstract: This disclosure relates to an electrostatic ink composition comprising: a liquid carrier, and particles dispersed in the liquid carrier, wherein the particles comprise a resin and a substantially spherical silver pigment; wherein the substantially spherical silver pigment constitutes at least 30 wt % of the solids of the electrostatic ink composition. Print substrates are also disclosed herein.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: October 10, 2017
    Assignee: Hewlett-Packard Indigo B.V.
    Inventors: Yaron Grinwald, Yana Reznick, Reut Avigdor, Gregory Katz
  • Patent number: 9772580
    Abstract: A development device includes a developer accommodating part that accommodates a developer, a developer detection member that is rotatably supported inside the developer accommodating part and is for detecting an amount of the developer accommodated inside the developer accommodating part, a rotational drive member that rotates the developer detection member around an rotational axis, and a conductive contact member that is formed of a conducive material. Wherein, defining a rotary track through which the developer detection member passes while rotating, a free edge of the contact member is arranged within the rotary track such that the contact member comes in contact with the developer detection member once while the developer detection member makes one rotation, the free edge being distal from where the contact member is fixed.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: September 26, 2017
    Assignee: Oki Data Corporation
    Inventor: Shun Hatanaka
  • Patent number: 9684477
    Abstract: According to an aspect of the invention, an image processing device includes a storage that stores character information, which is information affecting legibility of a character, on a character-by-character basis, and circuitry configured to determine a toner saving ratio for each character contained in a to-be-printed image so that legibility of the character achieves a preset target value at the determined toner saving ratio by assessing the legibility of the character based on the character information.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: June 20, 2017
    Assignee: RICOH COMPANY, LIMITED
    Inventor: Tasuku Nagai
  • Patent number: 9673061
    Abstract: A method for thermal process in packaging assembly of semiconductor is disclosed. The high-pressure overheated vapor is injected into the process chamber. The overheated vapor becomes saturated vapor in atmosphere (1 ATM) immediately and generates condensed liquid film onto all the surface of semiconductor work and also the chamber walls as condensation phenomenon occurs. The process temperature of vapor condensation is very close to and never exceeds the boiling point of perfluorinated compounds (PFC). Therefore, the latent heat of the saturated vapor is transferred to semiconductor work through the surface of liquid film evenly and uniformly.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: June 6, 2017
    Inventor: Shun-Ping Huang
  • Patent number: 9645527
    Abstract: An image forming apparatus includes an image bearing member, a developing device, a driving device, and a controller. The developing device includes a developing container, a first feeding member, a second feeding member, a developer carrying member, a content sensor, and a sealing member. Wherein when the controller executes an initializing operation for removing the sealing member from the first opening and the second opening while driving the first feeding member and the second feeding member, the controller provides notification of abnormality when the controller discriminates that an amount of the developer in the second chamber is larger than a predetermined amount at a predetermined timing on the basis of an output of the content sensor.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: May 9, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fumiyoshi Saito, Noriyuki Okada
  • Patent number: 9500982
    Abstract: The detection sensitivity of a variation in resonant frequency is increased, and thus a toner concentration is accurately detected. In a sensor device that includes an LC resonant circuit which outputs a pulse signal having a frequency corresponding to the toner concentration, a multiplier portion which multiplies the pulse signal output from the LC resonant circuit and a concentration detection portion which detects the toner concentration based on the pulse signal multiplied by the multiplier portion, the LC resonant circuit includes a detection coil and a capacitor and outputs a pulse signal having a frequency corresponding to the toner concentration. The multiplier portion multiplies the frequency of the pulse signal output from the LC resonant circuit. The concentration detection portion subtracts a predetermined offset pulse number from the pulse signal multiplied by the multiplier portion and detects the toner concentration based on the subtracted pulse number.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: November 22, 2016
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Masami Mashiki
  • Patent number: 9447497
    Abstract: Disclosed are apparatus and methods for supplying a constant flow of precursor gas to a processing chamber. The apparatus described, and methods of use, allow a precursor ampoule to be removed from the gas delivery system without interrupting the process.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: September 20, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Dien-Yeh Wu, Mark S. Johnson, David M. Santi, Hyman Lam
  • Patent number: 9317011
    Abstract: An image forming apparatus is provided with an image forming portion, a collecting duct, a toner collecting device, a toner collecting device, and a first control portion. Into the collecting duct, unnecessary toner generated in the image forming portion flows together with an airflow. The toner collecting device communicates with the collecting duct, has a path of the airflow formed therein, and collects, by using a filter, the toner together with the airflow generated by an airflow generating portion. The first control portion controls an operation condition of a vibrating operation of a vibrating portion that vibrates the filter, in accordance with at least one of setting conditions relating to environment of the image forming portion, a coverage rate of a toner image, the number of printed sheets, and an image density of the toner image.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: April 19, 2016
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Hisashi Mukataka
  • Publication number: 20140137799
    Abstract: A deposition apparatus and a method of forming a thin film are provided. The deposition apparatus includes a reaction gas supply unit supplying a reaction gas, a buffer unit temporarily storing the reaction gas supplied from the reaction gas supply unit, and a deposition unit forming a thin film by using the reaction gas supplied from the buffer unit.
    Type: Application
    Filed: January 9, 2012
    Publication date: May 22, 2014
    Applicant: LG INNOTEK CO., LTD.
    Inventors: Yeong Deuk JO, Moo Seong KIM, Seok Min KANG
  • Patent number: 8722141
    Abstract: High-purity polysilicon granules are prepared by depositing reaction gas on silicon granules in a fluidized bed reactor having: a reactor space comprising at least two zones lying one above the other, the lower zone weakly fluidized by introduction of a silicon-free gas into silicon granules in the lower zone by a plurality of individual dilution gas nozzles, and a second, reaction zone directly abutting the lower zone, the reaction zone heated via its outwardly bounding wall, introducing silicon-containing reaction gas as a vertical high speed gas jet into the reaction zone by reaction gas nozzle(s), forming local reaction gas jets surrounded by bubble-forming fluidized bed, gas decomposing leading to particle growth, wherein the reaction gas has fully or almost fully reacted to chemical equilibrium conversion before reaching the wall or bed surface.
    Type: Grant
    Filed: April 29, 2008
    Date of Patent: May 13, 2014
    Assignee: Wacker Chemie AG
    Inventors: Dieter Weidhaus, Rainer Hauswirth, Harald Hertlein
  • Publication number: 20130302527
    Abstract: One or more aspects of this invention pertain to fabrication of electronic devices. One aspect of the present invention is a system for electroless deposition of metal on a substrate. According to one or more embodiments of the present invention, the system comprises a main subsystem in combination with one or more subsystems for electroless deposition on a substrate. Another aspect of the present invention is a method of making an electronic device. According to one or more embodiments of the present invention, the method comprises one or more processes. Descriptions according to one or more embodiments of the system and the processes are presented.
    Type: Application
    Filed: May 11, 2012
    Publication date: November 14, 2013
    Inventor: Shijan LI
  • Patent number: 8459291
    Abstract: To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: June 11, 2013
    Assignees: HORIBA, Ltd., HORIBA STEC, Co., Ltd.
    Inventors: Masakazu Minami, Masaki Inoue
  • Patent number: 8459290
    Abstract: A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: June 11, 2013
    Assignees: Horiba, Ltd., Horiba Stec, Co., Ltd.
    Inventors: Masakazu Minami, Daisuke Hayashi, Yuhei Sakaguchi, Katsumi Nishimura, Masaki Inoue, Kotaro Takijiri
  • Publication number: 20120272898
    Abstract: Methods and apparatus for gas delivery are disclosed herein. In some embodiments, a gas delivery system includes an ampoule for storing a precursor in solid or liquid form, a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit, a second conduit coupled to the first conduit at a first junction located downstream of the ampoule and having a first end coupled to a second gas source and a second end coupled to a process chamber, and a heat source configured to heat the ampoule and at least a first portion of the first conduit from the ampoule to the second conduit and to heat only a second portion of the second conduit, wherein the second portion of the second conduit includes the first junction.
    Type: Application
    Filed: July 26, 2011
    Publication date: November 1, 2012
    Inventors: Zhiyuan Ye, Yihwan KIM
  • Patent number: 8207051
    Abstract: Methods, systems, and devices associated with surface modifying a semiconductor material are taught. One such method includes providing a semiconductor material having a target region and providing a dopant fluid layer that is adjacent to the target region of the semiconductor material, where the dopant fluid layer includes at least one dopant. The target region of the semiconductor material is lased so as to incorporate the dopant or to surface modify the semiconductor material. During the surface modification, the dopant in the dopant fluid layer is actively replenished.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: June 26, 2012
    Assignee: SiOnyx, Inc.
    Inventors: Jason Sickler, Keith Donaldson
  • Publication number: 20100285206
    Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.
    Type: Application
    Filed: March 29, 2010
    Publication date: November 11, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Egbert Woelk, Ronald L. DiCarlo, JR.
  • Patent number: 7823534
    Abstract: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.
    Type: Grant
    Filed: December 24, 2004
    Date of Patent: November 2, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Atsushi Ookouchi, Taro Yamamoto, Hirofumi Takeguchi, Hideharu Kyouda, Kousuke Yoshihara
  • Publication number: 20100270635
    Abstract: Methods, systems, and devices associated with surface modifying a semiconductor material are taught. One such method includes providing a semiconductor material having a target region and providing a dopant fluid layer that is adjacent to the target region of the semiconductor material, where the dopant fluid layer includes at least one dopant. The target region of the semiconductor material is lased so as to incorporate the dopant or to surface modify the semiconductor material. During the surface modification, the dopant in the dopant fluid layer is actively replenished.
    Type: Application
    Filed: April 28, 2009
    Publication date: October 28, 2010
    Inventors: Jason Sickler, Keith Donaldson
  • Patent number: 7666479
    Abstract: An apparatus and method for gas injection sequencing in order to increase the gas injection total pressure while satisfying an upper limit to the process gas flow rate, thereby achieving gas flow uniformity during a sequence cycle and employing practical orifice configurations. The gas injection system includes a gas injection electrode having a plurality of regions, through which process gas flows into the process chamber. The gas injection system further includes a plurality of gas injection plenums, each independently coupled to one of the aforesaid regions and a plurality of gas valves having an inlet end and an outlet end, where the outlet end is independently coupled to one of the aforesaid plurality of gas injection plenums. The gas injection system includes a controller coupled to the plurality of gas valves for sequencing the flow of process gas through the aforesaid plurality of regions.
    Type: Grant
    Filed: May 10, 2007
    Date of Patent: February 23, 2010
    Assignee: Tokyo Electron Limited
    Inventor: Eric J. Strang
  • Patent number: 7647886
    Abstract: Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber, first and second traps each in fluid communication with the first exhaust line, and a vacuum pump coupled to the first exhaust line to remove gases from the reaction chamber. The first and second traps are operable independently to individually and/or jointly collect byproducts from the reaction chamber. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: January 19, 2010
    Assignee: Micron Technology, Inc.
    Inventors: David J. Kubista, Trung T. Doan, Lyle D. Breiner, Ronald A. Weimer, Kevin L. Beaman, Er-Xuan Ping, Lingyi A. Zheng, Cem Basceri
  • Patent number: 7628861
    Abstract: A system for delivering pulses of a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber. A controller is programmed to receive the desired mass for each pulse through an input interface, close the second valve and open the first valve, receive chamber pressure measurements from a pressure transducer, and close the first valve when pressure within the chamber rises to a predetermined upper level. The controller is also programmed to deliver pulses of gas using just the second valve, wherein, for each pulse, the second valve is opened until a calculated mass for the pulse equals the desired mass for the pulse. The first valve is not required to be opened and closed for each pulse and is, therefore, used less frequently and has an extended life.
    Type: Grant
    Filed: December 17, 2004
    Date of Patent: December 8, 2009
    Assignee: MKS Instruments, Inc.
    Inventor: William R. Clark
  • Patent number: 7628860
    Abstract: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.
    Type: Grant
    Filed: April 12, 2004
    Date of Patent: December 8, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Ali Shajii, Siddharth P. Nagarkatti, Matthew Mark Besen, William R. Clark, Daniel Alexander Smith, Bora Akgerman
  • Publication number: 20090288598
    Abstract: A supply system for a chambered doctor blade assembly makes possible the sequential use of water-based and non-water-based coating materials through automated functions programmed in a PLC that controls the system. A pair of pneumatically driven diaphragm pumps serve as supply pump and return pump between the doctor blade chamber and a coating reservoir A PLC controls the pulse rate of pneumatic pressure to the pumps to control the rate of flow of the coating material into, and out of the doctor blade chamber. An ultrasonic sensor mounted detects the liquid level in the trough collection area. The PLC is programmed to modify the pulse rate of the supply pump and return pump to maintain the liquid level in the trough collection area above the drain thereof and below the maximum tolerance.
    Type: Application
    Filed: May 21, 2008
    Publication date: November 26, 2009
    Inventors: Thomas James Riga, JR., Danny Richard Gubbels, Robert Burgard
  • Patent number: 7615120
    Abstract: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: November 10, 2009
    Assignee: MKS Instruments, Inc.
    Inventors: Ali Shajii, Siddharth P. Nagarkatti, Matthew Mark Besen, William R. Clark, Daniel Alexander Smith, Bora Akgerman
  • Patent number: 7597763
    Abstract: Electroless plating systems and methods are described herein.
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: October 6, 2009
    Assignee: Intel Corporation
    Inventors: Valery M. Dubin, Arnel Fajardo, Chin-Chang Cheng
  • Patent number: 7588641
    Abstract: A droplet formation method of a mixed liquid is a method that the droplets 71, 72 and 73 are each delivered from each capillary tip to form the droplet 74 of the mixed liquid consisting of a raw material liquid on a substrate by applying a pulse voltage between the raw material liquids stored for each of a plurality of capillaries 1, 2 and 3 and the substrate disposed opposite to each capillary tip. In addition, a droplet formation device of the mixed liquid is provided with a plurality of capillaries for realizing formation of the droplet 74 of the aforementioned mixed liquid, a substrate, a voltage applying device for applying a pulse voltage and a controller for controlling the voltage applying device.
    Type: Grant
    Filed: August 28, 2002
    Date of Patent: September 15, 2009
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Osamu Yogi, Tomonori Kawakami, Mitsuru Ishikawa
  • Patent number: 7588643
    Abstract: A method and an apparatus for measuring the amount (CW) of a coating (2) on a paper web (1). The amount (CA) of at least one component in the coating (2) on the paper web (1) is measured and the composition (CC) of the coating (2) to be transferred to the paper web (1) is determined. The amount (CW) of the coating (2) on the paper web (1) is determined on the basis of the amount (CA) of at least one component in the coating (2) on the paper web (1) and the composition (CC) of the coating (2) to be transferred to the paper web (1).
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: September 15, 2009
    Assignee: Metso Automation OY
    Inventor: Markku Mäntylä
  • Patent number: 7527827
    Abstract: A method for performing a predetermined process on a substrate having coating film formed thereon includes preparing a data base denoting a relationship between each of parameters and a processing time of a predetermined process and storing the data base in a control section. The parameters include the temperature of a disposing plate, a supply rate of an ammonia gas, and an amount of a water vapor contained in the ammonia gas. The method further includes inputting a preset specific time value of the process into the control section; calculating candidate values of the parameters to finish the predetermined process by the specific time value; and determining specific values of the parameters to be used, based on the candidate values.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: May 5, 2009
    Assignee: Ricoh Company, Ltd.
    Inventor: Yuji Ueda
  • Patent number: 7485189
    Abstract: This invention provides a thin film deposition process making it possible to form a thin film having a desired composition with good reproducibility and high efficiency; a thin film deposition device therefore; a FTIR gas analyzer used in the thin film deposition process; and a mixed gas supplying device used in the thin film deposition process. The thin film deposition process comprises the steps of mixing a plurality of organic metal gases in a gas mixing chamber and supplying the mixed gas into a reaction chamber to deposit a thin film on a substrate positioned in the reaction chamber, wherein the mixture ratio between/among the organic metal gases supplied into the gas mixing chamber is measured with a FTIR gas analyzer fitted to either the gas mixing chamber or the reaction chamber and then on the basis of results of the measurement, the flow rates of the organic metal gases are individually adjusted.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: February 3, 2009
    Assignee: Horiba, Ltd.
    Inventors: Tsukasa Satake, Koji Tominaga, Hiroshi Funakubo
  • Patent number: 7323063
    Abstract: According to the present invention, in changing the concentration of a treatment solution supplied to a substrate, a volume of an existing treatment solution in a tank connected to a treatment solution supply section for supplying the treatment solution to the substrate is first measured. Based on this measured value, a minimum drain volume of the existing treatment solution to be drained out from the tank and a supply volume of either a treatment solution with a predetermined concentration or a diluting fluid to be supplied into the tank is calculated respectively in order to change the treatment solution in the tank to be in an intended volume and to have an intended concentration. Then, the calculated drain volume of the existing treatment solution is drained out from the tank. Meanwhile, the calculated supply volume of either the treatment solution with the predetermined concentration or the diluting fluid is supplied into the tank.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: January 29, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Okubo, Hiroyuki Miyamoto
  • Publication number: 20070175391
    Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second processing gas branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; a first and a second additional gas branch line; a flow path switching unit; and a control unit. Before processing the substrate to be processed, the control unit performs a pressure ratio control on the branch flow control unit while the processing gas supply unit supplies the processing gas. After the inner pressures of the first and the second processing gas branch line become stable, the control unit switches the pressure ratio control to a fixed pressure control, and then the additional gas supply unit supplies the additional gas.
    Type: Application
    Filed: January 30, 2007
    Publication date: August 2, 2007
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Kenetsu MIZUSAWA
  • Patent number: 7087118
    Abstract: A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: August 8, 2006
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Masateru Morikawa, Yukihiko Esaki, Nobukazu Ishizaka, Norihisa Koga, Kazuhiro Takeshita, Hirofumi Ookuma, Masami Akimoto
  • Patent number: 6977012
    Abstract: A coating equipment managing system for controlling and monitoring a coating equipment of an automobile manufacturing line, comprising local installations which are provided in the manufacturing lines at a plurality of localities, and a central installation for receiving data from the plurality of local installations, wherein the local installation comprises a sensor installed in the coating equipment, a data acquisition unit for receiving signals from the sensor, a control unit for controlling the coating equipment, and a local communication unit; the central installation comprises a server unit and a central analysis unit; the local communication unit transmits the data from the data acquisition unit to the server unit by E-mail; the server unit transmits correction data for the coating equipment obtained from the analysis of the measured data by the central analysis unit to the local communication unit by E-mail; and the local communication unit converts the correction data into a control code and transmit
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: December 20, 2005
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Kenichi Nobutoh, Jun Suzuno
  • Patent number: 6921436
    Abstract: An aging unit (DAC) for processing a wafer W having a coated film formed thereon includes a disposing plate, a temperature control circulating device for controlling the temperature of the disposing plate, a chamber, a gas supply mechanism for supplying an ammonia gas containing a water vapor into the chamber, an input section for inputting the processing time of the wafer W, and a control device for controlling the temperature of the disposing plate, the supply rate of the ammonia gas, and the amount of the water vapor contained in the ammonia gas so as to permit the processing of the wafer W to be finished in the processing time inputted into the input section.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: July 26, 2005
    Assignee: Tokyo Electron Limited
    Inventor: Yuji Ueda
  • Publication number: 20040002170
    Abstract: An apparatus for manufacturing a semiconductor device, comprising a process chamber which holds a substrate to be subjected to a prescribed process, a gas inlet pipe which introduces a process gas into the process chamber, a gas outlet pipe which discharges the gas from the process chamber to outside the process chamber, component-measuring devices which measure components of the gas in the process chamber or at least two different gases, concentration-measuring devices which measure concentration of each component of the gas in the process chamber, or the concentration of each component of at least two different gases, and a control device which adjusts the components of the process gas, the concentration of each component of the process gas and an atmosphere in the process chamber, on the basis of values measured by the composition-measuring device and concentration-measuring device.
    Type: Application
    Filed: April 29, 2003
    Publication date: January 1, 2004
    Inventors: Takashi Shimizu, Akihito Yamamoto
  • Publication number: 20030200924
    Abstract: A system and method for real time deposition process control based on resulting product detection, where the system and method detect an amount of at least one reaction product in real time, while the deposition process is being performed, the detected amount of reaction product is compared with a reference amount, and a comparison result is fed back in real time to adjust a supply of one or more reactants. The system and method provide real time control over the deposition process and/or reduce the number of wafers produced that do not meet processing target values.
    Type: Application
    Filed: April 30, 2002
    Publication date: October 30, 2003
    Inventors: Chang-Hyun Ko, Jai-Dong Lee, Jin-Hee Lee
  • Patent number: 6620247
    Abstract: A method of forming a thin polycrystalline silicon film and a thin film forming apparatus allowing inexpensive formation of a thin polycrystalline silicon film at a relatively low temperature with high productivity. More specifically, a method of forming a thin polycrystalline silicon film and a thin film forming apparatus in which a state of plasma is controlled to achieve an emission intensity ratio of hydrogen atom radicals (H&bgr;) of one or more to the emission intensity of SiH* radicals in the plasma.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: September 16, 2003
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Akinori Ebe, Naoto Kuratani, Eiji Takahashi
  • Patent number: 6620248
    Abstract: In a coating apparatus for supplying a mixed solution of a resist solution and a thinner onto a wafer from a nozzle, the nozzle is connected to a mixed solution supply pipe, and the resist solution and the thinner are supplied to the mixed solution supply pipe from a resist solution supply pipe and a thinner supply pipe respectively through a junction pipe. The diameter of the junction pipe is set smaller than those of other supply pipes, whereby the resist solution and the thinner can be mixed efficiently in the junction pipe, and as a result the wafer is coated with the mixed solution so that a uniform film thickness can be obtained within the surface of the wafer.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: September 16, 2003
    Assignee: Toyko Electron Limited
    Inventors: Takahiro Kitano, Yuji Matsuyama, Junichi Kitano, Hiroyuki Hara
  • Publication number: 20030124253
    Abstract: A wire coloring method and a wire coloring apparatus are provided. The wire coloring apparatus 1 has a coloring portion 10, a colorant-supplying portion 11, and a control unit 12. The coloring portion 10 has a mixing tank 23. The mixing tank 23 mixes first to fourth colorants B,R,Y,BL supplied from the colorant-supplying portion 11. The coloring portion 10 colors an outer surface 5a of an electric wire 3 with the mixed colorant in a mixing tank 23. The colorant-supplying portion 11 has a first to fourth adjusting valves 26,27,28,29 to increase and decrease flow rates of the first to fourth colorants B,R,Y,BL to the mixing tank 23. The control unit 12 controls opening ratios of the first to fourth adjusting valves 26,27,28,29.
    Type: Application
    Filed: October 28, 2002
    Publication date: July 3, 2003
    Applicant: YAZAKI CORPORATION
    Inventors: Takeshi Kamata, Shigeharu Suzuki, Keigo Sugimura
  • Publication number: 20030047135
    Abstract: The invention relates to a method and an apparatus for measuring a coating from paper or board. The measurement is carried out by one detector at different times or by two detectors simultaneously. IR radiation directed at the coating and radiation emerging from the coating are chopped synchronously in blocks. A wavelength band sensitive and insensitive to the absorption are bandpass filtered and measured in both the MIR and NIR region. The absorption strength is measured in a digital signal processing block by comparing the radiation sensitive to absorption to the radiation insensitive to absorption, and the amount of each coating component is determined in the digital signal processing block on the basis of the absorption strength.
    Type: Application
    Filed: August 9, 2002
    Publication date: March 13, 2003
    Inventors: Markku Kansakoski, Markku Mantyla, Jussi Tenhunen
  • Publication number: 20030041969
    Abstract: A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.
    Type: Application
    Filed: September 3, 2002
    Publication date: March 6, 2003
    Inventors: Claus Schneider, Ralph Trunk, Lothar Pfitzner, Heinz Schmid
  • Patent number: 6524659
    Abstract: The invention relates to a method for electrically controlling a flow of material, wherein a single- or multi-component, essentially polymer-based material (1), such as plastics, elastomer or the like, is charged electrically (I) and sprayed (II) in an electrical field (E) to a three-dimensional mould (2)/target (3). The method of the invention makes use of the mould (2)/target (3) set at an electric potential and provided with two or more treatment blocks (Li) to be set at voltage levels different from each other, especially for coordinating the courses of sprayed material particles and the electrical field (E) affecting the same, in such a manner that each section/area of the mould/target surface forms a material layer of desirable thickness in the spraying cycle (II). The invention relates also to an apparatus operating in accordance with the method.
    Type: Grant
    Filed: November 15, 2000
    Date of Patent: February 25, 2003
    Assignee: Oy OMS Optomedical Systems Ltd.
    Inventors: Leo Hatjasalo, Jarkko Valtanen
  • Patent number: 6521112
    Abstract: A method of controlling the content of a chemical bath includes the steps of: determining a replenishment condition for the chemical bath; defining a unit of the replenishment condition; establishing a pacing factor corresponding to a replenishment volume of a replenishment medium per unit of the replenishment condition; and defining a replenishment threshold corresponding to the product of a predetermined number of the defined units of the replenishment condition and the pacing factor. The rate of continued replenishment of the predetermined constituent of the chemical bath is determined in response to the replenishment condition, which may be elapsed time, ampere-hours (or coulombs), number of product loads, product surface area, or line speed over time. The method replenishes constituents as they actually are consumed. It also prevents depletion (or buildup in the case of decanting a by-product) and the associated time delay related to detection and correction.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: February 18, 2003
    Assignee: Dj Parker Company, Inc.
    Inventor: Todd Alan Balisky