Abstract: A method for removing particulates from a plurality of substrates includes opening a first access port in a top of a first container holding a cleaning fluid bath, inserting a first substrate through the first access port to a first support, closing the first access port, opening a second access port in the top of the first container, inserting a second substrate through the second access port to a second support, closing the second access port, opening the first access port, removing the first substrate through the first access port and delivering the first substrate into a rinsing station, closing the first access port, opening the second access port, removing the second substrate through the second access port and delivering the second substrate into the rinsing station, and closing the second access port.

Abstract: A method of contaminant detection comprises exposing a wafer comprising one or more contaminants to microdroplets of an oxidizer to form an oxide on a surface of the wafer, exposing the oxide to an etchant to remove the oxide and leave the one or more contaminants on the surface of the wafer, and determining a composition of the one or more contaminants. Additional methods and related tools are also disclosed.

Abstract: A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.

Abstract: An apparatus for supporting and maneuvering a wafer comprises a handle having a gas inlet adapted to couple to a gas supply, a supporting surface coupled to the handle section including a frame structure having edge segments connecting at vertices and spoke elements extending from a center of the frame structure to the vertices, a gas supply channel coupled to the gas inlet that extends from the handle and branches into channels that run through the spoke elements, and a plurality of nozzles positioned at the vertices on the supporting surface and coupled to the channels in the spoke elements. Gas provided to the plurality of nozzles exits the nozzles in a stream directed parallel to the supporting surface and the stream of gas generates forces that enable wafers to be securely supported in a floating manner over the supporting surface without coming into direct contact with the supporting surface.

Abstract: The present disclosure provides a photoresist stripping device and a photoresist stripping method. The photoresist stripping device including a conveyor belt, a liquid storage tank, a filtering device, a lighting device and a stripping tank. Through disposing a metal-organic framework (MOF) material in a filter element, the MOF material is configured to adsorb a dissolved oxygen of the stripping solution in a visible light environment, thereby reducing the difference in oxygen concentration between the inside and outside of the gap, and alleviating hollowing out phenomenon of copper caused by stripping the photoresist of the substrate. Further, when reaching a saturation step, can heat or emit ultraviolet light to release the dissolved oxygen to make the filter material recyclable.

Abstract: A fluid collection and disposal device for a transfer cart used for transporting wet articles is comprised of a tray disposed below articles to be transported on a transfer cart. The tray has a drain opening. A conduit extends from the drain opening to an exterior side of the transfer cart. A valve assembly is connected to the conduit for controlling fluid flow through the conduit. The valve assembly is comprised of a valve element moveable between a closed, first position restricting flow of fluid through the conduit and an opened, second position allowing flow of fluid through the conduit. An actuator is provided for moving the valve element from the closed position to the open position. The actuator is moveable by physical engagement with an external stop.

Abstract: The controller of a substrate processing apparatus carries out a liquid column forming step in which cleaning liquid is discharged through a lower surface nozzle when a spin chuck is not holding a substrate, to form a liquid column extending upward from the lower surface nozzle, and, in parallel with the liquid column forming step, a first dropping portion cleaning step in which an upper surface nozzle is reciprocated horizontally between a first position where a dropping portion of the upper surface nozzle does not contact the liquid column and a second position where the dropping portion of the upper surface nozzle does not contact the liquid column, so as to cause the upper surface nozzle to pass through a first middle position where the upper discharge port of the upper surface nozzle overlaps with the liquid column in a plan view.

Abstract: A sink-type washing machine includes a case, a drain board, a water pump and a rotary spray arm; the case includes a sink body and a cover plate; the sink body has a recess which forms a drain region, the water pump is inside the drain region, the drain board covers the drain region, the rotary spray arm is above the drain board, water outlets being in communication with the flow channel in the water pump so that water in the drain region can be sprayed into the washing space and above the drain region. A drain board covers the drain region and a water pump is disposed inside the drain region, the water pump is isolated from the washing region by the drain board, so that the water flowing back to the water pump is firstly filtered by the drain board.

Abstract: According to one embodiment, a substrate processing apparatus includes a first liquid supplier, a second liquid supplier, and a controller. The first liquid supplier supplies a substrate with a sulfuric acid solution having a first temperature equal to or higher than the boiling point of hydrogen peroxide water. The second liquid supplier supplies a surface to be treated of the substrate with a mixture of sulfuric acid solution and hydrogen peroxide water having a second temperature lower than the first temperature. The controller controls the first liquid supplier to supply the sulfuric acid solution so as to heat the substrate to the boiling point of hydrogen peroxide water or higher. When the temperature of the substrate becomes equal to or higher than the second temperature, the controller controls the first liquid supplier to stop supplying the sulfuric acid solution and controls the second liquid supplier to supply the mixture.

Abstract: A waste fluid containment and draining system may have a black waste water holding structure for holding black waste water and a grey waste water holding structure for holding grey waste water. First and second valves may be included for enabling selective emptying of the two holding structures. A macerator pump may be used which has an input in flow communication with both of the first and second valves. A discharge conduit may be in flow communication with an output of the macerator pump. A control subsystem may be in communication with the first and second valves and the macerator pump for controlling the first and second valves, together with the macerator pump, to enable selective pumping out of the holding structures by the macerator pump through the discharge conduit.

Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.

Abstract: Digitally imagable flexographic printing elements for producing flexographic printing plates, which comprise an organically soluble relief-forming layer, a water-soluble barrier layer for oxygen, and a water-soluble laser-ablatable mask layer. A method for producing flexographic printing plates using such flexographic printing elements, which comprises a two-stage washout procedure using aqueous and organic washout media.

Abstract: A jointed car wash gravity hose boom is provided. The jointed car wash gravity hose boom has a first frame unit and a second frame unit secured together at a joint and wherein the first frame unit has a lower support beam and an upper support beam wherein the lower support beam extends upward at approximately a ten to forty degree angle. A hose supplying air, water, soap, wax, foam, tire shine or other liquids for washing a car is secured to the second frame and extends downward at the distal end of the second frame. When the hose is pulled into place by a user, the first frame and second frame generally extend at the joint and allow the user to move the hose around a car wash bay. When relaxed, the jointed car wash gravity hose boom folds at the joint and automatically moves parallel to a wall by gravity.

Abstract: A method of operating a dishwasher having a wash tub and a reuse tank for storing liquid for subsequent reuse, wherein the condition of the water in the reuse tank may be monitored and/or acted upon to limit the likelihood of undesired effects associated with the growth of micro-organisms in the liquid.

Abstract: Provided is a substrate cleaning apparatus of cleaning a substrate. The substrate cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation unit, and an exhaust unit. The main cleaning chamber has a cleaning space in which the substrate is cleaned and includes a sidewall in which a first vent hole is defined. The first cleaning nozzle is disposed in the main cleaning chamber to spray a first cleaning solution. The cover member covers the main cleaning chamber and has one side in which a second vent hole is defined. The air flow generation unit supplies air into the cleaning space through the first vent hole. The exhaust unit is coupled to the one side of the cover member to suck and exhaust the air supplied into the cleaning space through the second vent hole.

Abstract: A portable apparatus for sieving, washing, and drying particle samples onsite that are generated from well drill cutting. The apparatus comprises a sievewash chamber to initially remove contaminates from the samples, and a final wash-spin-dry chamber to completely clean and dry the samples for analysis. The two chambers function under the operational control of a computerized system comprising a processor, a user display, and a database storing computer code for operating the apparatus in various cleaning cycles. The sieve-wash chamber comprises two vertically stacked baskets: a coarse basket on top to hold the drill cutting samples; and, a caged basket underneath to catch clean samples as they fall through the coarse mesh screen on the bottom of the coarse basket. The caged basket with the samples is then manually transferred to the wash-spin-dry chamber for processing by motorized rotation of the basket at high rpm's.

Abstract: A dishwasher (10) for the batch washing of wash items (20) comprises a wash chamber (24), which is arranged to accommodate wash items (20) and in which spray members ((34a-b)) for spraying out washing liquid and rinsing liquid are disposed; a wash tank (28), which is arranged to contain washing liquid which during a wash phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); a recirculating rinse tank (52), which is arranged to contain used rinsing liquid which during a rinse phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); members (62) for supplying final-rinse liquid which during a final-rinse phase shall be supplied to the wash chamber (24) via the spray members ((34a-b)); a collecting device (42, 46), which is arranged to collect liquid which has been sprayed out into the wash chamber (24) via the spray members ((34a-b)); and a pump (48), which is arranged to pump used rinsing liquid from the collecting device (42, 46) to the recirculating rinse

Abstract: An apparatus for drying gloves is provided, including a main member, at least one light source, and at least one air source. The main member includes an outer surface configured for receiving a glove, and a plurality of apertures disposed along the outer surface. The light source emits a UV-C light, and the air source blows air. The UV-C light from the light source and air from the air source can at least partially pass through the outer surface. The apertures are in communication with at least the air source.

Abstract: An article of manufacture suitable for cleaning the top of a vehicle, comprising: at least one blower: and a support for said blower, wherein said support positions the blower to blow snow or debris from the top of a vehicle. This invention improves on prior art by using blowers to remove snow from large vehicles.

Abstract: A substrate cleaning apparatus cleans a surface of a substrate such as a semiconductor wafer in a non-contact state by using two-fluid jet cleaning. The substrate cleaning apparatus includes a substrate holding mechanism configured to hold and rotate the substrate, with the front surface facing downward, in a horizontal state, and a two-fluid nozzle configured to jet a two-fluid jet flow, comprising a gas and a liquid, upwardly toward the front surface of the substrate held by the substrate holding mechanism.

Abstract: The wet treatment of wafer-shaped articles is improved by utilizing a droplet generator designed to produce a spray of monodisperse droplets. The droplet generator is mounted above a spin chuck, and is moved across a major surface of the wafer-shaped article in a linear or arcuate path. The droplet generator includes a transducer acoustically coupled to its body such that sonic energy reaches a region of the body surrounding the discharge orifices. Each orifice has a width w of at least 1 ?m and at most 200 ?m and a height h such that a ratio of h to w is not greater than 1.

Abstract: The present application thus provides a compressor wash system for use about a bellmouth of a compressor of a gas turbine engine. The compressor wash system may include a bellmouth wash nozzle positioned about the bellmouth of the compressor and a wash door assembly positioned about a lower half of the bellmouth such that the wash door assembly may be closed when the bellmouth wash nozzle is activated.

Abstract: A selectable washing system, particularly useful for washing of dogs and other pets, is provided. The selectable washing system specifically relates to an improved, multi-port, multi-valve selectable washing system that allows individual selection of multiple solutions individually to create a custom mix of solutions. The washing system includes a manifold having a plurality of inlet openings and an outlet opening disposed therein. Each of the inlet openings in the manifold is connected to a corresponding solution supply container by one or more valves. According to one presently preferred embodiment, both a needle valve and shut-off valve are positioned between each manifold inlet and its corresponding solution supply container. The output of the manifold is connected to a venturi valve which draws the custom solution mix into a stream of water to be applied to the coat of the pet in diluted form.

Abstract: Nozzle apparatus and methods for treating workpieces are disclosed. An example apparatus includes a nozzle module and a first nozzle chamber disposed within the nozzle module. The first nozzle chamber has a first nozzle opening and is to deliver a relatively high pressure fluid to the first nozzle opening. The example apparatus also includes a second nozzle chamber disposed within the nozzle module and having a second nozzle opening, the second nozzle chamber to deliver a relatively low pressure fluid to a second nozzle opening. A first flow of the low pressure fluid at least partially contacts a second flow of the high pressure fluid. The second flow is directed onto a workpiece.

Abstract: Disclosed is a liquid processing apparatus and a liquid processing method, which can process an entire wafer at a sufficiently high temperature and can sufficiently suppress adhesion of particles on a surface of the wafer, when the peripheral portion of the wafer is processed. The liquid processing apparatus includes a holding part to hold the substrate, a rotation driving part to rotate the holding part, and a shield unit. The shield unit includes an opposed plate opposed to the substrate held by the holding part, a heating part to heat the substrate through the opposed plate, and a heated gas supplying part to supply heated gas to a surface of the substrate held by the holding part.

Abstract: A cloth treating apparatus is disclosed, including a cabinet having a housing space for housing cloth, a water supply unit for supplying steam to the housing space selectively, and a water spray unit movably provided to one side of the cabinet to be connected to the water supply unit selectively for supplying the steam from the water supply unit to the cloth.

Abstract: Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

Abstract: A dishwashing appliance is provided that adjusts the pH during the cleaning process so as to allow for cleaning with both alkaline and acidic wash fluids. Alkali and acidic additives are used to improve the removal of substances that are pH sensitive. Such additives can be provided in predetermined amounts and/or a pH sensor can be used to regulate the amount of such additives that are utilized during the cleaning process.

Abstract: A system, apparatus, and method for home brewing equipment including a basin for holding a cleaning solution and a support assembly mountable in the basin, the support assembly sized and configured to support a container in an upside down position and above the cleaning solution. A plumbing assembly may be coupled to the basin to receive cleaning solution from the basin and the plumbing assembly may be coupled to at least one channel configured to extend into the body of the container. The plumbing assembly may include a pump so that when the pump is activated pressurized cleaning solution is released from the channel inside the container against the inner walls of the container so that the inside of the container is sanitized. The basin may have support elements defining footprints for supporting at least two different sizes of containers.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: A substrate treating apparatus is provided which includes a housing which provides a space in which a process is performed; a spin head which supports and rotates a substrate; and a spray unit which sprays a fluid on the substrate. The spray unit comprises a first nozzle mistily spraying a first fluid; and second nozzle spraying a second fluid.

Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.

Abstract: Provided is a method for a resist removal system comprising a processing chamber and treatment liquid delivery system for single substrate processing. A primary stripping chemical is flowed in the treatment liquid delivery system at a primary temperature and flow rate; a secondary stripping chemical is injected at a first mixing point at a secondary temperature and flow rate. A tertiary stripping chemical is injected at a second mixing point at a tertiary temperature and a tertiary flow rate. The treatment liquid is dispensed onto a portion of the surface of the substrate wherein one or more of the primary temperature, secondary temperature, tertiary temperature, the primary flow rate, the secondary flow rate, and the tertiary flow rate are adjusted to meet a target strip rate and selectivity of strip over etch of silicon nitride and silicon oxide.

Abstract: A dishwasher machine with a compact device for spraying items to be rinsed is provided whereby the rinsing liquid is regularly sprayed in the rinsing container and the spray jets created by the spray device can be varied. To this end, the rinsing device comprises at least one spray channel which guides a rinsing liquid and comprises, on a side thereof facing the inside of the rinsing container, openings for the rinsing liquid and two open ends via which rinsing liquid can be supplied in a pressurized manner. At least one distributor is provided for regulating the supply of rinsing liquid to the spray channel in lieu of conventional mobile components such as spray arms, and various spray patterns can be produced by means of the distributor, improving the cleaning action of the dishwasher machine.

Abstract: A hands-free cleaning apparatus enabling a user to clean various roller pads and/or paintbrushes using a single apparatus. The apparatus includes a main housing and a lid. The housing has a bottom drain hole and legs. An attachment mechanism is provided to receive and retain a roller pad or paintbrush in a desired position within the apparatus. A spraying mechanism is provided within the housing having one or more spray nozzles arranged to spray water (or other cleaning solution) on the pad or brush in a desired spray pattern for spinning and cleaning the pad or brush. In one configuration, each spray nozzle has a spray direction that is slightly offset from other nozzles in relation to the surface of the roller pad or brush being cleaned, helping to force rotation. The spraying mechanism receives water from a hose through a hose attachment.

Abstract: A unit for cleaning, drying and disinfecting equipment. The unit comprises a cabinet, a baffle disposed in the cabinet spaced apart from a rear wall of the cabinet, a plurality of adjustable nozzles for directing chemically treated air at the equipment, and a means for applying atomized chemicals into the flow of air.

Abstract: A turbine engine cleaning system includes a source of cleaning fluid, a source of rinse fluid, a pump configured to deliver the cleaning fluid and rinse fluid under pressure, and a wash harness. The wash harness is connected in flow communication with a plurality of turbine engines. The wash harness is configured to direct cleaning fluid from the source of cleaning fluid and rinse fluid from the source of rinse fluid from the pump to the turbine engines in sequence.

Abstract: An elongated solution injection bar operable in a cleaning system as a combination dry vacuum and fluid carpet cleaner. The elongated solution injection bar having an upper solution distribution and pressure equalization chamber in fluid communication with a lower solution discharge chamber through a solution flow restrictor structured for distributing hot liquid cleaning solution in a substantially uniform flow along substantially the entire length of a cleaning head operating surface. The hot liquid cleaning solution being discharged from the lower solution discharge chamber at a volumetric flow rate of or about 1 gallon per minute (gpm) or less, so that the liquid cleaning solution is discharged to the operating surface as a flood under pressure.

Abstract: Inside a single apparatus main body (100), a surface treatment apparatus includes: a treatment cell (11); a vertical rotation shaft (12); an attachment/detachment device; a receiving tank (15); a cover body (16); a plurality of tanks (21); a plurality of surface treatment liquid supply devices (22); a cleaning water supply device; a drain device (3); and a first cleaning device. Upon operation of the surface treatment liquid supply device while the treatment cell (11) containing small objects is rotated by the vertical rotation shaft (12), a surface treatment is carried out on the small objects, upon operation of the cleaning water supply device, the small objects inside the treatment cell (11) are cleaned, and upon operation of the first cleaning device, the inner face of the cover body and the outer face of the treatment cell are cleaned, thus providing circulation use of surface treatment liquids in the tanks.

Abstract: The present invention provides a substrate processing system in which a processing liquid is supplied to a substrate W from a processing nozzle 50a situated above the substrate W so as to process the substrate W, and which makes it possible to prevent unintended dripping of the processing liquid from the processing nozzle. A substrate processing system 20 comprises a processing nozzle 50a capable of supplying a processing liquid to a substrate to be processed, an arm 54 supporting the processing nozzle, and droplet removing nozzles 60, 62 capable of blowing a gas to the processing nozzle. The arm is movable between a processing position and a waiting position, the processing nozzle being above a substrate when the arm is in the waiting position and being outside a substrate when the arm is in the processing position. The droplet removing nozzles are so situated that they are in the vicinity of the processing nozzle when the arm is in the waiting position.

Abstract: A cleaning system which includes an enclosure and having a door with a transparent window. The door is opened and closed to load and unload products to be cleaned. An operator puck on the outside of the enclosure couples magnetically to another actuator puck on the inside of the enclosure. This coupling allows an operator to move and direct the inside puck to actuate spray or air blast functions, without opening the enclosure. The outside operator puck includes one or more switches which turn on the various electronic components such as the liquid pump, light, or air blast valve. The cleaning system enables a user to efficiently direct cleaning action to parts inside to minimize the cleaning time, and to prevent exposure of chemicals. The cleaning fluid is cycled out of the enclosure continuously, and into a “trap” box, through a pump and back into the cleaner box in a closed loop cycle.

Abstract: In this disclosure, a reactor system is described. The reaction system comprises (a) a reaction vessel having an inner wall, wherein said reaction vessel is configured to receive reactants and export products and byproducts; (b) a primary quench device (PQD) configured to receive a coolant and disperse said coolant into said reaction vessel; and (c) a secondary quench device (SQD) configured to receive a coolant and disperse said coolant into said reaction vessel; wherein said PQD comprises an array of spray nozzles fixed on the inner wall of said reaction vessel at a first axial position; and wherein said SQD comprises (1) an axially movable pipe having a coolant entry end and a nozzle end, wherein said pipe is configured to be removably fixed inside said reaction vessel; and (2) a spray nozzle that is fluidly connected to said pipe at its nozzle end via a fluid tight seal connection.

Abstract: A cleaning or care device for the cleaning or care of medical or dental instruments, having a cleaning or care chamber in which at least two connections for the instruments to be cleaned are provided, and a supply device for supplying the at least two connections with a cleaning or care agent. The at least two connections and the supply device can be moved relative to one another in such a way that one of the connections can be connected to the supply device and supplied with a cleaning or care agent, while another of the connections is not connected to the supply device and cannot be supplied with a cleaning or care agent. A corresponding method for the cleaning or care of medical or dental instruments with such a cleaning or care device is also described.

Abstract: The present disclosure provides a method and apparatus for cleaning a semiconductor wafer. In an embodiment of the method, a single wafer cleaning apparatus is provided and a wafer is positioned in the apparatus. A first chemical spray is dispensed onto a front surface of the wafer. A back surface of the wafer is cleaned while dispensing the first chemical spray. The cleaning of the back surface may include a brush and spray of cleaning fluids. An apparatus operable to clean the front surface and the back surface of a single semiconductor wafer is also described.

Abstract: A cleaning device for cleaning respirators, in particular breathing regulators and/or breathing masks, is proposed. The cleaning device comprises at least one cleaning chamber for receiving at least one respirator. The cleaning device also has at least one fluid device for applying at least one cleaning fluid to the respirator. The cleaning device also has at least one pressure application device with at least one pressure connection. The pressure connection can be connected to at least one gas carrying element of the respirator. The pressure application device is set up for applying pressurized gas to the gas carrying element.

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.

Abstract: There is provided a liquid processing apparatus capable of efficiently processing a pattern formation surface of a wafer, while preventing diffusion of a chemical-liquid atmosphere which might possibly occurs during a chemical-liquid process.

Abstract: A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a liquid droplet nozzle which generates droplets of a treatment liquid which are sprayed on a spouting region on an upper surface of the substrate held by the substrate holding unit; and a protective liquid nozzle which spouts a protective liquid obliquely onto the upper surface of the substrate held by the substrate holding unit for protection of the substrate to cause the protective liquid to flow toward the spouting region on the upper surface of the substrate, whereby the spouting region is covered with a film of the protective liquid and, in this state, the treatment liquid droplets are caused to impinge on the spouting region.

Abstract: Provided is a photomask cleaning apparatus. The apparatus may include a photomask chuck, a cleaning arm and a nozzle set. The nozzle set may be installed in an end portion of the cleaning arm. The nozzle set may include a first nozzle and a second nozzle. The first nozzle and the second nozzle may be a bar-type shape and parallel to each other.

Abstract: A dishwasher is disclosed. The dishwasher includes a tub to provide a washing space, a dish rack positioned in the washing space, to receive washing objects therein, a spraying arm to spray washing water toward the washing objects received in the dish rack, a supply path to provide washing water to the spraying arm, and a rack spraying arm provided in the dish rack, in communication with the supply path, to spray the washing water only to predetermined washing objects received in the rack. As a result, the dishwasher may realize an effect of intensive washing performed for washing objects with a high contamination level.