Abstract: In some embodiments, apparatuses and methods are provided herein useful to processing online orders. In some embodiments, a system for processing online order comprises an order processing server configured to receive an online order including grocery items and transmit, to a control circuit, the online order, the control circuit configured to receive the online order, determine the grocery items included in the online order, determine a number of grocery items that require refrigeration and a number of grocery items that require freezing, determine a number of totes required for the online order, assign to the online order the number of totes required, transmit, to the totes, a command, wherein each of the number of totes is configured to receive, from the control circuit, the command, and in response to the receipt of the command, one of maintain its temperature, enter the refrigeration state, and enter the freezer state.

Abstract: Embodiments of the inventive concept described herein relate to an apparatus and method for removing an adhesive exposed to the outside from an object being processed. The apparatus for removing the adhesive exposed to the outside from an edge region of the object being processed, in which the object has a patterned substrate and a support plate bonded together by the adhesive. The cover liquid nozzle dispenses the cover liquid onto a cover area of a top surface of the object other than the exposed area, and the controller controls the cover liquid dispensing member to adjust a flow rate of the cover liquid to cause a removal rate of the adhesive to remain constant.

Abstract: A blow molding machine is subjected to a sterilizing treatment in a simple manner. A liquid sterilizer is filled into preforms of at least the same number as the number of spindles. In a heating unit that heats the preforms to a molding temperature, some of the liquid sterilizer is caused to diffuse, and blow air is blasted into preforms in which the liquid sterilizer remains to cause the liquid sterilizer to diffuse in a molding unit, and molded bottles are discharged.

Abstract: A substrate processing apparatus includes a processing tub configured to perform an etching processing therein by immersing multiple substrates in a processing liquid; a first and second discharge opening groups disposed under the substrates within the processing tub, and configured to discharge the processing liquid into the processing tub; a first adjusting device configured to change a flow rate of the processing liquid discharged from the first discharge opening group; a second adjusting device configured to change a flow rate of the processing liquid discharged from the second discharge opening group; a controller configured to control the first and second adjusting devices to perform, during the etching processing, a flow rate adjusting processing of increasing and decreasing the flow rate of the processing liquid discharged from the first discharge opening group and the flow rate of the processing liquid discharged from the second discharge opening group to different values.

Abstract: A dishwasher and method of operating a dishwasher according to a cycle of operation are described herein. The dishwasher includes a tub at least partially defining a treating chamber, a rotatable spray arm comprising a nozzle outlet, and a liquid supply conduit fluidly coupled to the spray arm. A pump can be fluidly coupled to the liquid supply conduit and operated to flow liquid through an aperture in the liquid supply conduit.

Abstract: A method for the dosing of cleaning agents in cleaning machines, including the steps: receiving control information items, wherein the control information items are dependent on information about a cleaning machine; determining the progress of a cleaning operation; dosing of cleaning agent depending on the received control information items and the determined progress of the cleaning operation; wherein the information about the cleaning machine can be determined via a sensor-based automatic recognition.

Abstract: A substrate treatment apparatus according to an embodiment includes: a tank configured to store a liquid chemical with which a plurality of substrates are treated; a piping having an ejection port that ejects the liquid chemical or bubbles into the tank; a plurality of rods that support the plurality of substrates in the tank; and a converter that is provided in the plurality of rods or the tank and that converts vibration applied to each substrate by the liquid chemical or the bubbles ejected from the piping into rotation in one direction around a center of the substrate as a rotational axis.

Abstract: In some embodiments, the present disclosure relates to method for trimming and cleaning an edge of a wafer. The method includes trimming an outer edge portion of the wafer with a blade along a continuously connected trim path to define a new sidewall of the wafer. The trimming produces contaminant particles on the wafer. Further, the method includes applying deionized water to the new sidewall of the wafer with water nozzles to remove the contaminant particles. The method also includes applying pressurized gas to the wafer at a first top surface area of the wafer with an air jet nozzle. The pressurized gas is directed outward from a center of the wafer to remove remaining contaminant particles. The applying of deionized water and the applying of pressurized gas are performed in a same chamber as the trimming.

Abstract: A dishwasher appliance includes a sump that collects wash fluid and a circulation pump for urging the wash fluid through a supply conduit to a plurality of spray arms. A diverter assembly is operably coupled to the supply conduit for selectively diverting the flow of wash fluid to the plurality of spray arms and a rotation detection system monitors rotation of the spray arms. A controller detects rotation of the plurality of spray arms and determines a position of the diverter assembly based on the rotation.

Abstract: The invention discloses a positive and negative wind pressure automatic cleaning method for an optical device and belongs to the field of generator rotors. The invention discloses a positive and negative wind pressure automatic cleaning method for an optical device, which utilizes fast-flowing air in a parallel direction to form alternating positive and negative wind pressure on the surface of the optical device in a pit structure of a rotatory component to cause dust particle vibration to realize automatic cleaning.

Abstract: The invention provides a highly reliable automatic analyzer and dispenser probe cleaning method that allows for the removal of leftover cleaning water from the outer wall surfaces of a probe without increasing the size of a cleaning bath and contaminating the outer wall surfaces of the probe. A cleaning bath 113 (108, 106) comprises: a cleaning water outlet 203 for discharging into the cleaning bath 113 (108, 116) the cleaning water supplied from a cleaning water supply mechanism 123; and a compressed air outlet 204, disposed on the trajectory of the cleaning water discharged from the cleaning water outlet 203, for discharging the compressed air supplied from a compressed air supply mechanism 124 toward a sample probe 111b or a reagent probe 120 inserted in the cleaning bath 113 (108, 106).

Abstract: A method for cleaning an object having a surface, the method including steps of (1) delivering acoustic waves to the object to dislodge debris from the surface; (2) delivering a cleaning medium to the surface to collect dislodged debris; (3) delivering the acoustic waves to the object to acoustically treat and atomize the cleaning medium and the dislodged debris; (4) applying a vacuum airflow to collect atomized cleaning medium and dislodged debris; (5) delivering a rinsing medium to the surface; (6) delivering the acoustic waves to the object to acoustically treat and atomize the rinsing medium; and (7) applying the vacuum airflow to collect atomized rinsing medium.

Abstract: A wash hood for a baffle-type grease filter and a pollution control system for cleaning baffle-type grease filters outside or inside without contaminating the environment or soaking the operator with cleaning solution. The hood includes ridges on the inside for supporting the filters at an angle to a rear wall. A channel around the ridges guides the effluent towards a drain hole. A separator box with a filter connected to the drain hole separates the grease from the water such that the water may be discharged into a mop sink connected to a sanitary sewer system.

Abstract: A charging device for the heat treatment of workpieces being provided with a hub, comprising a charging support, a shaft and at least one auxiliary hub, wherein the workpiece can be vertically supported on the shaft by auxiliary hub(s) precisely fitted into the hub, and the shaft being supported by the charging support as well as use of auxiliary hubs for the dimensionally stable hardening of gear-wheels in vertical position.

Abstract: A lubrication information management device includes: a lubrication detector provided to a lubrication unit; an instrument wireless tag provided to an instrument; and a read-write unit which is either an antenna or a reader-writer. Moreover, the read-write unit communicates lubrication information to the instrument wireless tag when the lubrication detector detects any of lubrication of the instrument and an operation for lubrication. This makes it possible to reliably manage the lubrication of a dental instrument.

Abstract: A concentrator, wherein the concentrator comprises an air processor that includes a sampled airflow inlet slot that receives a sampled airflow that contains particles containing target material. A secondary airflow inlet slot that is located downstream from the sampled airflow inlet slot. The sampled airflow inlet slot uses centrifugal force to concentrate particles containing target material into a central portion of the sampled airflow, and produces a non-collimated sampled airflow. The secondary airflow inlet slot is operable to divide a secondary airflow from at least a part of the central portion of the sampled airflow that is received by the secondary airflow inlet slot from the sampled airflow inlet slot, and is operable to divide side primary airflows from the non-collimated sampled airflow produced by the sampled airflow inlet slot. Finally, the secondary airflow flows through the secondary airflow inlet slot.

Abstract: Laundry washing machine (1) having an outer casing (2), a washing tub (3), arranged inside the casing (2), a rotatable drum (4), arranged in axially rotating manner inside the washing tub (3) and designed to receive laundry to be washed, and a detergent dispensing assembly (12), designed for supplying laundry detergent into the washing tub (3). The washing machine also has a water softening system (14), designed to receive fresh water from a water mains (13) and reduce the hardness degree of the fresh water in order to supply softened water to the detergent dispensing assembly (12) and/or to the washing tub (3), during one or more softened water laundry washing phases of a laundry washing program.

Abstract: A unitary or one-piece integral image sensor and washing nozzle assembly or module 100, 300, 400 is configured to enclose, protect, and aim multiple image sensors and effectively clean multiple lenses (e.g., 102, 104) simultaneously while using only one nozzle head (e.g., 120, 320 or 420) with at least one optimized spray pattern (e.g., 122). The module includes a housing with a cover or bezel (e.g., 106) that supports and orients the lenses and the nozzle head aims spray at the lenses along a spray axis, with the relative heights and spacings of the nozzle's outlet orifice (e.g., 174) and the surfaces of the lenses (e.g., 102, 104) selected so that a particular spray either glances across and washes a nearest lens (e.g., 102) or impacts and washes over a farthest lens (e.g., 104).

Abstract: A dishwasher may include a spray arm arrangement and a washing chamber. The spray arm arrangement may include a spray arm arranged to rotate around a first axis of rotation within said washing chamber. The spray arm may be provided with one or more spray nozzles arranged to spray washing liquid into said washing chamber. The dishwasher may also include a mechanical switch for detecting an angular position of said spray arm. The spray arm arrangement may further include an activating device arranged to rotate with said spray arm, which activating device may include at least one activating structure arranged to cyclically activate said mechanical switch during rotation of said spray arm.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: Hydraulically-driven dishwasher diverters are disclosed herein. An example hydraulically-driven dishwasher diverter includes a diverter housing having a plurality of wash zone openings defined therethrough corresponding to respective wash zones of a dishwasher, and a rotating cylindrical diverter valve including a valve outlet to fluidly couple a fluid flowing through the cylindrical diverter valve through one of the wash zone openings, a flexible portion adjacent the valve outlet to seal another one of the wash zone openings in response to fluid pressure in the cylindrical diverter valve while the valve outlet is fluidly flowing the fluid through the one of the wash zone openings.

Abstract: A decontamination device for medical material, including a support intended to receive and hold said medical material to be decontaminated on a predefined axis, a spraying means, a drying means and an irradiating means, wherein said spraying means is mounted in rotation about said predefined axis and in translation parallel to said predefined axis, in such a way that the spraying is directed towards said predefined axis, said drying means is mounted in translation parallel to said predefined axis, and said irradiating means is mounted in translation parallel to said predefined axis.

Abstract: The present invention provides a dishwasher appliance and a diverter for a dishwasher appliance. The diverter uses a turbine powered by a flow of fluid from a pump to switch between different outlet ports. In a dishwasher appliance, fluid from the pump that, e.g., supplies one or more spray assemblies can be used to cause the diverter to switch between different fluid outlets and the different spray assemblies or other fluid-using elements. A separate motor to power the diverter or cycling of the pump to change the position of the diverter is not required, which allows a savings in energy usage, costs, and space.

Abstract: A liquefied carbon dioxide producing apparatus that can generate high-purity liquid CO2 free from moisture and organic matter such as oil includes: a recirculating system that carries out a recirculating treatment on CO2; and an introduction device that introduces CO2 from an external source of CO2 into the recirculating system. The recirculating system includes at least an evaporator that vaporizes CO2, a condenser that condenses CO2 from an outlet of the evaporator, and a storage tank that stores liquid CO2 generated by the condenser. The liquid CO2 in the storage tank is fed to a point-of-use and to the evaporator. An adsorption device that removes moisture and organic matter (oil) is provided on a line from the external source of CO2 to the condenser at a position where CO2 gas flows.

Abstract: A dishwasher appliance is provided. The dishwasher appliance includes a rack assembly disposed within a wash chamber of a tub. First and second spray assemblies are positioned adjacent the rack assembly and configured for directing wash fluid towards the rack assembly. The dishwasher appliance also includes features for selectively directing wash fluid from a supply conduit to the second spray assembly.

Abstract: Disclosed are systems and methods for treating a substrate. The method may include supplying supercritical carbon dioxide into a chamber to treat a substrate. Here, temperature and pressure of the chamber is maintained to allow carbon dioxide to be directly changed from a gas state to a supercritical state when the carbon dioxide is supplied into the chamber.

Abstract: A two-way valve with secure structure for dispensing a large bottle of carbonated beverage into a vial comprises a valve body, valve spool, handle and bottle seal ring. The valve body has an inlet with an inner thread which matches an external thread of the large bottle and has an outlet with an inner thread which matches an external thread of the vials. The secure structure is an axial annular groove recessed axially into bottoms of the inner threads of the inlet and outlet of the valve body, one side of the axial recessed annular groove is the inner thread which extends to a bottom of the groove and other side is a groove wall, The bottle secure seal ring is deposited in the annular groove. Since the depth of the axial annular groove is greater than a thickness of the bottle seal ring, the outgoing pressure gas cannot reach the bottle seal ring.

Abstract: A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.

Abstract: A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas.

Abstract: A cleaning device for cleaning a substrate adhering to a support film, including a protective film forming measure for forming a protective film on an exposed surface of the support film, wherein the exposed surface is a portion of a surface of the support film to which a first surface of the substrate adheres, but the substrate does not adheres to the exposed surface; and a cleaning measure for cleaning the substrate by use of a cleaning liquid, the substrate adhering to the support film covered with the protective film. The cleaning device can effectively clean a wafer supported by a dicing tape.

Abstract: The assembly (1) comprises an integrated device (2) for dispensing washing agents, comprising a body (2a) intended to be mounted in an opening (G) of a sheet-like wall (F) which delimits the washing chamber (C) of a dishwashing machine (WD) and which has a peripheral formation (2b) which protrudes towards the outside and is intended to abut against the surface of this wall (F) surrounding the opening (G), on the side of this wall (F) which faces the washing chamber (C); and an ozone-generating device (3), with a housing (3a) which has an outlet opening (39) and contains an electric ozone-flow generator (34, 36) suitable for emitting a flow of ozone towards said outlet opening (39), so as to introduce it into the washing chamber (C) of the machine (WD). In the body (A) of the washing-agent dispensing device (2) there is defined an outlet chamber (13) able to communicate, in the condition of use, with the washing chamber (C) and having an inlet passage (45) accessible from the outside.

Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

Abstract: An apparatus comprising: a processing liquid supply unit; a volatile processing liquid supply unit; a substrate heating unit; and a controller to control the volatile processing liquid supply unit and the substrate heating unit, wherein the controller executes a process of supplying the processing liquid to the substrate, a process of heating the substrate on which a liquid film of the processing liquid is formed, a process of supplying a volatile processing liquid, a process of stopping the supply of the volatile processing liquid, and a process of drying the substrate by removing the volatile processing liquid, and wherein the process of heating the substrate starts before the process of supplying the volatile processing liquid, and the substrate heating unit heats the substrate so that the surface temperature of the substrate is higher than a dew point before the surface of the substrate is exposed from the volatile processing liquid.

Abstract: Apparatus and method for removing an ink image from a plastic substrate, particularly a plastic container such as a cup, are provided. A solvent capable of solvating the ink image is utilized in order to de-ink articles so that they can be recycled and re-imprinted thereby reducing waste associated with printing line start up. As the articles may be intended for use with food and beverage products, a safe and non-toxic solvent may be selected. However, to ensure that the article is not contaminated with foreign materials prior to human use, the de-inked article may undergo a rinse and drying operation to remove solvent residues and UV light treatment to eliminate any harmful microorganisms that may be present on the article's surfaces.

Abstract: In a spin-chuck with plural collector levels, a separate exhaust controller is provided for each level. This permits selectively varying gas flow conditions among the collector levels, so that the ambient pressure at one level does not adversely affect device performance in an adjacent level.

Abstract: There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.

Abstract: A dishwasher includes a hot water inlet device for intake of hot water from an external hot water supply and a cold water inlet device for intake of cold water from an external cold water supply. A program control device controls a wash cycle of a selected dishwashing program for cleaning wash items. The program control device is constructed to operate in at least one of first and second operating modes, wherein the first operating mode includes activation of one wash program which, in at least one partial wash cycle of a wash cycle, draws hot water from the external hot water supply, and wherein the second operating mode includes activation of another wash program which, in at least one partial wash cycle of a wash cycle, exclusively draws cold water from the external cold water supply.

Abstract: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.

Abstract: Embodiments of the present invention include a hose handling system having a hose guide plumbed via a wash line to a fluid delivery device. The hose guide includes a pulley installed on a frame member, and a spray nozzle adapted to dispense a wash mixture. The hose guide is adapted to guide a hose as the hose is inserted into or withdrawn from a manhole, with the hose traversing the pulley. The wash mixture can be delivered through a wash line to the hose guide, which sprays the wash mixture on the hose in order to reduce or eliminate gross contamination or microbial contamination on the hose. The wash mixture typically, but not necessarily, has a freezing point below 32 F and includes: a quaternary ammonium compound, an alcohol or glycol, an alcohol ethoxylate, and a fragrance.

Abstract: A substrate processing apparatus includes a first gas supply system provided with a source gas supply control unit; a second gas supply system provided with a reactive gas supply control unit; a third gas supply system provided with a cleaning gas supply control unit; a shower head unit including a buffer chamber connected to the gas supply systems and a dispersion plate installed at a downstream side of the buffer chamber; a substrate support installed at a downstream side of the dispersion plate and electrically grounded; a process chamber accommodating the substrate support; a plasma generation unit including a power supply and a switch configured to switch plasma generation between the buffer chamber and the process chamber; and a control unit configured to control the source gas supply control unit, the reactive gas supply control unit and the plasma generation unit.

Abstract: Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.

Abstract: A clothes-treating apparatus is disclosed. According to the present invention, the clothes-treating apparatus includes a steam spraying unit capable of preventing water condensed from steam from flowing into an accommodating space containing clothes and it has an improved steam spraying unit to enhance work efficiency when a worker assembles parts thereof.

Abstract: A cleaning system configured to use a hydrogen peroxide solution to clean contact lenses. The cleaning system includes a reservoir to hold the cleaning solution and a complex base coupled to the reservoir to insure a hermetically closed reservoir environment. The complex base is separated into at least a first and a second segment. A lens holder assembly holds the lenses within the solution and is coupled to the complex base in the first segment. A motor is located in the second segment of the complex base to selectively introduce a catalyst to the cleaning solution. The cleaning system has additional features that permit the system to allow for the storage of the contact lenses by converting a neutralized cleaning solution into a storage solution to prevent recontamination.

Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.

Abstract: Disclosed is a liquid processing apparatus which performs a liquid processing by supplying a chemical liquid from a chemical liquid supplying unit to substrate rotating around a vertical axis, and includes a cover member arranged at an upper surface of substrate to oppose the substrate and have a space therebetween is provided with a gas supplying port, and gas is supplied from gas supplying port toward the space. The gas is discharged from the space through a gap between protrusion at the circumferential edge of cover member protruding downward and the substrate. In addition, lamp heater heating the circumferential edge of substrate is arranged in the space along the circumferential direction of substrate, the chemical liquid supplied from a chemical liquid supplying unit is supplied to a position closer to the circumferential edge side than a position at which lamp heater is provided.

Abstract: A disinfecting chemical bottle includes a bottle body including a storing section that stores a chemical used for cleaning/disinfecting an endoscope and a mouth portion including an opening portion from which the chemical freely flows out, a first conductive portion provided so as to be exposed in an inner portion and an outer portion of the bottle body, and a second conductive portion provided at a position different from that of the first conductive portion so as to be exposed in the inner portion and the outer portion of the bottle body, the second conductive portion being electrically connectable to the first conductive portion via the chemical in the bottle body.

Abstract: A beverage can cleaning apparatus for cleaning beverage cans before they are dispensed from vending machines. The apparatus has a can holder, a hinged platform, tubes, a first nozzle, a second nozzle and a sensing block that matches the profile of the can top periphery. The sensing block is depressed a compressed distance, the distance being dependent on the orientation of the can, and cleaning fluid or compressed air is selectively directed through the first or second nozzle. Subsequent to air or cleaning fluid being dispensed against the top of the beverage can, the can holder releases the hinged platform sending the beverage can into the vending machine's dispenser.

Abstract: An article of manufacture suitable for cleaning the top of a vehicle, comprising: at least one blower: and a support for said blower, wherein said support positions the blower to blow snow or debris from the top of a vehicle. This invention improves on prior art by using blowers to remove snow from large vehicles.

Abstract: A device for treating a disc-like article with a fluid, including elements for dispensing a fluid onto the article and a chuck for holding and rotating the article around an axis perpendicular thereto, the chuck including a base body, a drive ring, and gripping members for contacting the article at its edge. The gripping members are eccentrically movable with respect to the center of the article and driven by a drive ring rotatably mounted to the base body so that the drive ring is rotatable against the base body around the axis. The relative rotational movement of the drive ring against the base body is carried out by either holding the base body and rotating the drive ring or by holding the drive ring and rotating the base body, whereby the to-be-held-part (drive ring or base body) is held without touching the respective to-be-held-part by magnetic force.

Abstract: Apparatus, methods and systems for physically confining a liquid medium applied over a semiconductor wafer include a first and a second chemical head that are disposed to cover at least a portion of a top and an underside surface of the semiconductor wafer. Each of the first and the second chemical heads include an angled inlet conduit at a leading edge of the respective chemical heads to deliver liquid chemistry into a pocket of meniscus in a single phase. The pocket of meniscus is defined over the portion of the top and underside surface of the semiconductor wafer covered by the chemical heads and is configured to receive and contain the liquid chemistry applied to the surface of the semiconductor wafer as a meniscus. A step is formed at a leading edge of the first and second chemical heads along an outer periphery of the pocket of meniscus to substantially confine the meniscus of the liquid chemistry within the pocket of meniscus.