With Plural Means For Supplying Or Applying Different Fluids At The Same Workstation Patents (Class 134/94.1)
  • Patent number: 10905523
    Abstract: A lubrication information management device includes: a lubrication detector provided to a lubrication unit; an instrument wireless tag provided to an instrument; and a read-write unit which is either an antenna or a reader-writer. Moreover, the read-write unit communicates lubrication information to the instrument wireless tag when the lubrication detector detects any of lubrication of the instrument and an operation for lubrication. This makes it possible to reliably manage the lubrication of a dental instrument.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: February 2, 2021
    Assignee: THE YOSHIDA DENTAL MFG. CO., LTD.
    Inventors: Yoshiki Gotani, Takafumi Sato, Keiichi Kudo
  • Patent number: 10677689
    Abstract: A concentrator, wherein the concentrator comprises an air processor that includes a sampled airflow inlet slot that receives a sampled airflow that contains particles containing target material. A secondary airflow inlet slot that is located downstream from the sampled airflow inlet slot. The sampled airflow inlet slot uses centrifugal force to concentrate particles containing target material into a central portion of the sampled airflow, and produces a non-collimated sampled airflow. The secondary airflow inlet slot is operable to divide a secondary airflow from at least a part of the central portion of the sampled airflow that is received by the secondary airflow inlet slot from the sampled airflow inlet slot, and is operable to divide side primary airflows from the non-collimated sampled airflow produced by the sampled airflow inlet slot. Finally, the secondary airflow flows through the secondary airflow inlet slot.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: June 9, 2020
    Assignee: Research International, Inc.
    Inventors: Elric W. Saaski, Charles C. Jung
  • Patent number: 10563339
    Abstract: Laundry washing machine (1) having an outer casing (2), a washing tub (3), arranged inside the casing (2), a rotatable drum (4), arranged in axially rotating manner inside the washing tub (3) and designed to receive laundry to be washed, and a detergent dispensing assembly (12), designed for supplying laundry detergent into the washing tub (3). The washing machine also has a water softening system (14), designed to receive fresh water from a water mains (13) and reduce the hardness degree of the fresh water in order to supply softened water to the detergent dispensing assembly (12) and/or to the washing tub (3), during one or more softened water laundry washing phases of a laundry washing program.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: February 18, 2020
    Assignee: Electrolux Appliances Aktiebolag
    Inventors: Andrea Zattin, Elisa Stabon
  • Patent number: 10525937
    Abstract: A unitary or one-piece integral image sensor and washing nozzle assembly or module 100, 300, 400 is configured to enclose, protect, and aim multiple image sensors and effectively clean multiple lenses (e.g., 102, 104) simultaneously while using only one nozzle head (e.g., 120, 320 or 420) with at least one optimized spray pattern (e.g., 122). The module includes a housing with a cover or bezel (e.g., 106) that supports and orients the lenses and the nozzle head aims spray at the lenses along a spray axis, with the relative heights and spacings of the nozzle's outlet orifice (e.g., 174) and the surfaces of the lenses (e.g., 102, 104) selected so that a particular spray either glances across and washes a nearest lens (e.g., 102) or impacts and washes over a farthest lens (e.g., 104).
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: January 7, 2020
    Assignee: DLHBOWLES, INC.
    Inventors: Chunling Zhao, Bryan Fung
  • Patent number: 10194782
    Abstract: A dishwasher may include a spray arm arrangement and a washing chamber. The spray arm arrangement may include a spray arm arranged to rotate around a first axis of rotation within said washing chamber. The spray arm may be provided with one or more spray nozzles arranged to spray washing liquid into said washing chamber. The dishwasher may also include a mechanical switch for detecting an angular position of said spray arm. The spray arm arrangement may further include an activating device arranged to rotate with said spray arm, which activating device may include at least one activating structure arranged to cyclically activate said mechanical switch during rotation of said spray arm.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: February 5, 2019
    Assignee: ELECTROLUX APPLIANCES AKTIEBOLAG
    Inventors: Per-Erik Pers, Elianne Lindmark
  • Patent number: 9984904
    Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: May 29, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Masahiro Nakaharada, Yoji Sakata, Akira Miyata, Shinichi Hayashi, Suguru Enokida, Tsunenaga Nakashima
  • Patent number: 9931015
    Abstract: Hydraulically-driven dishwasher diverters are disclosed herein. An example hydraulically-driven dishwasher diverter includes a diverter housing having a plurality of wash zone openings defined therethrough corresponding to respective wash zones of a dishwasher, and a rotating cylindrical diverter valve including a valve outlet to fluidly couple a fluid flowing through the cylindrical diverter valve through one of the wash zone openings, a flexible portion adjacent the valve outlet to seal another one of the wash zone openings in response to fluid pressure in the cylindrical diverter valve while the valve outlet is fluidly flowing the fluid through the one of the wash zone openings.
    Type: Grant
    Filed: January 27, 2015
    Date of Patent: April 3, 2018
    Assignee: Whirlpool Corporation
    Inventors: Juan I. Luciano, Antony M. Rappette, Rodney M. Welch
  • Patent number: 9750831
    Abstract: A decontamination device for medical material, including a support intended to receive and hold said medical material to be decontaminated on a predefined axis, a spraying means, a drying means and an irradiating means, wherein said spraying means is mounted in rotation about said predefined axis and in translation parallel to said predefined axis, in such a way that the spraying is directed towards said predefined axis, said drying means is mounted in translation parallel to said predefined axis, and said irradiating means is mounted in translation parallel to said predefined axis.
    Type: Grant
    Filed: June 10, 2014
    Date of Patent: September 5, 2017
    Assignee: L.B.A. CONSULTING
    Inventors: Christophe Barreau, Eric Bertrand, Philippe Macaire, Jean-Paul Carprieaux
  • Patent number: 9687136
    Abstract: The present invention provides a dishwasher appliance and a diverter for a dishwasher appliance. The diverter uses a turbine powered by a flow of fluid from a pump to switch between different outlet ports. In a dishwasher appliance, fluid from the pump that, e.g., supplies one or more spray assemblies can be used to cause the diverter to switch between different fluid outlets and the different spray assemblies or other fluid-using elements. A separate motor to power the diverter or cycling of the pump to change the position of the diverter is not required, which allows a savings in energy usage, costs, and space.
    Type: Grant
    Filed: September 10, 2014
    Date of Patent: June 27, 2017
    Assignee: Haier US Appliance Solutions, Inc.
    Inventor: Joel Charles Boyer
  • Patent number: 9605895
    Abstract: A liquefied carbon dioxide producing apparatus that can generate high-purity liquid CO2 free from moisture and organic matter such as oil includes: a recirculating system that carries out a recirculating treatment on CO2; and an introduction device that introduces CO2 from an external source of CO2 into the recirculating system. The recirculating system includes at least an evaporator that vaporizes CO2, a condenser that condenses CO2 from an outlet of the evaporator, and a storage tank that stores liquid CO2 generated by the condenser. The liquid CO2 in the storage tank is fed to a point-of-use and to the evaporator. An adsorption device that removes moisture and organic matter (oil) is provided on a line from the external source of CO2 to the condenser at a position where CO2 gas flows.
    Type: Grant
    Filed: May 15, 2012
    Date of Patent: March 28, 2017
    Assignees: ORGANO CORPORATION, SHOWA DENKO GAS PRODUCTS CO., LTD.
    Inventors: Hiroshi Sugawara, Yoshinori Ono, Shingo Tanaka, Takaki Nasu
  • Patent number: 9596976
    Abstract: A dishwasher appliance is provided. The dishwasher appliance includes a rack assembly disposed within a wash chamber of a tub. First and second spray assemblies are positioned adjacent the rack assembly and configured for directing wash fluid towards the rack assembly. The dishwasher appliance also includes features for selectively directing wash fluid from a supply conduit to the second spray assembly.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: March 21, 2017
    Assignee: Haier US Appliance Solutions, Inc.
    Inventors: Aaron Matthew McDaniel, John Edward Dries, Gregory Owen Miller, Craig Curtis
  • Patent number: 9527118
    Abstract: Disclosed are systems and methods for treating a substrate. The method may include supplying supercritical carbon dioxide into a chamber to treat a substrate. Here, temperature and pressure of the chamber is maintained to allow carbon dioxide to be directly changed from a gas state to a supercritical state when the carbon dioxide is supplied into the chamber.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: December 27, 2016
    Assignee: Semes Co., Ltd.
    Inventors: Young Hun Lee, Eui Sang Lim, Jae Myoung Lee
  • Patent number: 9494251
    Abstract: A two-way valve with secure structure for dispensing a large bottle of carbonated beverage into a vial comprises a valve body, valve spool, handle and bottle seal ring. The valve body has an inlet with an inner thread which matches an external thread of the large bottle and has an outlet with an inner thread which matches an external thread of the vials. The secure structure is an axial annular groove recessed axially into bottoms of the inner threads of the inlet and outlet of the valve body, one side of the axial recessed annular groove is the inner thread which extends to a bottom of the groove and other side is a groove wall, The bottle secure seal ring is deposited in the annular groove. Since the depth of the axial annular groove is greater than a thickness of the bottle seal ring, the outgoing pressure gas cannot reach the bottle seal ring.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: November 15, 2016
    Inventors: Davy Zide Qian, Benyu Qian, Lequn Lu
  • Patent number: 9396974
    Abstract: A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: July 19, 2016
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Hiroaki Takahashi, Toru Endo, Masahiro Miyagi, Koji Hashimoto
  • Patent number: 9186033
    Abstract: A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: November 17, 2015
    Inventor: Edward Michael Kubasiewicz
  • Patent number: 9010343
    Abstract: A cleaning device for cleaning a substrate adhering to a support film, including a protective film forming measure for forming a protective film on an exposed surface of the support film, wherein the exposed surface is a portion of a surface of the support film to which a first surface of the substrate adheres, but the substrate does not adheres to the exposed surface; and a cleaning measure for cleaning the substrate by use of a cleaning liquid, the substrate adhering to the support film covered with the protective film. The cleaning device can effectively clean a wafer supported by a dicing tape.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: April 21, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Atsushi Miyanari
  • Publication number: 20150075563
    Abstract: The assembly (1) comprises an integrated device (2) for dispensing washing agents, comprising a body (2a) intended to be mounted in an opening (G) of a sheet-like wall (F) which delimits the washing chamber (C) of a dishwashing machine (WD) and which has a peripheral formation (2b) which protrudes towards the outside and is intended to abut against the surface of this wall (F) surrounding the opening (G), on the side of this wall (F) which faces the washing chamber (C); and an ozone-generating device (3), with a housing (3a) which has an outlet opening (39) and contains an electric ozone-flow generator (34, 36) suitable for emitting a flow of ozone towards said outlet opening (39), so as to introduce it into the washing chamber (C) of the machine (WD). In the body (A) of the washing-agent dispensing device (2) there is defined an outlet chamber (13) able to communicate, in the condition of use, with the washing chamber (C) and having an inlet passage (45) accessible from the outside.
    Type: Application
    Filed: April 30, 2013
    Publication date: March 19, 2015
    Applicant: ELBI INTERNATIONAL S.P.A.
    Inventors: Giuseppe Marone, Sergio Damilano
  • Patent number: 8978671
    Abstract: An apparatus comprising: a processing liquid supply unit; a volatile processing liquid supply unit; a substrate heating unit; and a controller to control the volatile processing liquid supply unit and the substrate heating unit, wherein the controller executes a process of supplying the processing liquid to the substrate, a process of heating the substrate on which a liquid film of the processing liquid is formed, a process of supplying a volatile processing liquid, a process of stopping the supply of the volatile processing liquid, and a process of drying the substrate by removing the volatile processing liquid, and wherein the process of heating the substrate starts before the process of supplying the volatile processing liquid, and the substrate heating unit heats the substrate so that the surface temperature of the substrate is higher than a dew point before the surface of the substrate is exposed from the volatile processing liquid.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: March 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Satoru Tanaka, Takehiko Orii, Hirotaka Maruyama, Teruomi Minami, Mitsunori Nakamori
  • Patent number: 8980012
    Abstract: Apparatus and method for removing an ink image from a plastic substrate, particularly a plastic container such as a cup, are provided. A solvent capable of solvating the ink image is utilized in order to de-ink articles so that they can be recycled and re-imprinted thereby reducing waste associated with printing line start up. As the articles may be intended for use with food and beverage products, a safe and non-toxic solvent may be selected. However, to ensure that the article is not contaminated with foreign materials prior to human use, the de-inked article may undergo a rinse and drying operation to remove solvent residues and UV light treatment to eliminate any harmful microorganisms that may be present on the article's surfaces.
    Type: Grant
    Filed: May 2, 2012
    Date of Patent: March 17, 2015
    Inventor: Ron Fuller
  • Patent number: 8978670
    Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: March 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Junya Minamida, Issei Ueda, Yasuhiro Chouno, Osamu Kuroda, Kazuyoshi Eshima, Masahiro Yoshida, Satoshi Morita
  • Patent number: 8955529
    Abstract: In a spin-chuck with plural collector levels, a separate exhaust controller is provided for each level. This permits selectively varying gas flow conditions among the collector levels, so that the ambient pressure at one level does not adversely affect device performance in an adjacent level.
    Type: Grant
    Filed: January 4, 2010
    Date of Patent: February 17, 2015
    Assignee: Lam Research AG
    Inventor: Karl-Heinz Hohenwarter
  • Patent number: 8951359
    Abstract: There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.
    Type: Grant
    Filed: May 13, 2011
    Date of Patent: February 10, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Takao Inada, Naoyuki Okamura, Hidetsugu Yano, Yosuke Hachiya
  • Patent number: 8945315
    Abstract: A dishwasher includes a hot water inlet device for intake of hot water from an external hot water supply and a cold water inlet device for intake of cold water from an external cold water supply. A program control device controls a wash cycle of a selected dishwashing program for cleaning wash items. The program control device is constructed to operate in at least one of first and second operating modes, wherein the first operating mode includes activation of one wash program which, in at least one partial wash cycle of a wash cycle, draws hot water from the external hot water supply, and wherein the second operating mode includes activation of another wash program which, in at least one partial wash cycle of a wash cycle, exclusively draws cold water from the external cold water supply.
    Type: Grant
    Filed: September 7, 2009
    Date of Patent: February 3, 2015
    Assignee: BSH Bosch und Siemens Hausgeraete GmbH
    Inventors: Franz Grüll, Heinz Heiβler, Anton Oblinger, Roland Rieger, Michael Georg Rosenbauer
  • Patent number: 8944077
    Abstract: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: February 3, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kato, Manabu Honma
  • Patent number: 8926764
    Abstract: Embodiments of the present invention include a hose handling system having a hose guide plumbed via a wash line to a fluid delivery device. The hose guide includes a pulley installed on a frame member, and a spray nozzle adapted to dispense a wash mixture. The hose guide is adapted to guide a hose as the hose is inserted into or withdrawn from a manhole, with the hose traversing the pulley. The wash mixture can be delivered through a wash line to the hose guide, which sprays the wash mixture on the hose in order to reduce or eliminate gross contamination or microbial contamination on the hose. The wash mixture typically, but not necessarily, has a freezing point below 32 F and includes: a quaternary ammonium compound, an alcohol or glycol, an alcohol ethoxylate, and a fragrance.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: January 6, 2015
    Inventor: Thomas P. Suiter
  • Patent number: 8925562
    Abstract: A substrate processing apparatus includes a first gas supply system provided with a source gas supply control unit; a second gas supply system provided with a reactive gas supply control unit; a third gas supply system provided with a cleaning gas supply control unit; a shower head unit including a buffer chamber connected to the gas supply systems and a dispersion plate installed at a downstream side of the buffer chamber; a substrate support installed at a downstream side of the dispersion plate and electrically grounded; a process chamber accommodating the substrate support; a plasma generation unit including a power supply and a switch configured to switch plasma generation between the buffer chamber and the process chamber; and a control unit configured to control the source gas supply control unit, the reactive gas supply control unit and the plasma generation unit.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: January 6, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Kazuyuki Toyoda, Tadashi Takasaki, Hiroshi Ashihara, Atsushi Sano, Naonori Akae, Hidehiro Yanai
  • Publication number: 20140373880
    Abstract: Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.
    Type: Application
    Filed: September 8, 2014
    Publication date: December 25, 2014
    Inventors: Nishant Sinha, Stephen J. Kramer, Gurtej S. Sandhu
  • Patent number: 8915102
    Abstract: A clothes-treating apparatus is disclosed. According to the present invention, the clothes-treating apparatus includes a steam spraying unit capable of preventing water condensed from steam from flowing into an accommodating space containing clothes and it has an improved steam spraying unit to enhance work efficiency when a worker assembles parts thereof.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: December 23, 2014
    Assignee: LG Electronics Inc.
    Inventors: Jung Wook Moon, Dae Yun Park, Sog Kie Hong, Jong Seok Kim, Seung Gyu Ryu, Kwang Hee Lee, Hye Yong Park, Chang Gyu Choi
  • Publication number: 20140366917
    Abstract: A cleaning system configured to use a hydrogen peroxide solution to clean contact lenses. The cleaning system includes a reservoir to hold the cleaning solution and a complex base coupled to the reservoir to insure a hermetically closed reservoir environment. The complex base is separated into at least a first and a second segment. A lens holder assembly holds the lenses within the solution and is coupled to the complex base in the first segment. A motor is located in the second segment of the complex base to selectively introduce a catalyst to the cleaning solution. The cleaning system has additional features that permit the system to allow for the storage of the contact lenses by converting a neutralized cleaning solution into a storage solution to prevent recontamination.
    Type: Application
    Filed: October 12, 2012
    Publication date: December 18, 2014
    Inventor: Yoseph YAACOBI
  • Patent number: 8900373
    Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: December 2, 2014
    Assignee: KHS GmbH
    Inventors: Bernd Molitor, Klaus Jendrichowski
  • Patent number: 8887741
    Abstract: Disclosed is a liquid processing apparatus which performs a liquid processing by supplying a chemical liquid from a chemical liquid supplying unit to substrate rotating around a vertical axis, and includes a cover member arranged at an upper surface of substrate to oppose the substrate and have a space therebetween is provided with a gas supplying port, and gas is supplied from gas supplying port toward the space. The gas is discharged from the space through a gap between protrusion at the circumferential edge of cover member protruding downward and the substrate. In addition, lamp heater heating the circumferential edge of substrate is arranged in the space along the circumferential direction of substrate, the chemical liquid supplied from a chemical liquid supplying unit is supplied to a position closer to the circumferential edge side than a position at which lamp heater is provided.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: November 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Jiro Higashijima, Yoshifumi Amano
  • Patent number: 8858731
    Abstract: A disinfecting chemical bottle includes a bottle body including a storing section that stores a chemical used for cleaning/disinfecting an endoscope and a mouth portion including an opening portion from which the chemical freely flows out, a first conductive portion provided so as to be exposed in an inner portion and an outer portion of the bottle body, and a second conductive portion provided at a position different from that of the first conductive portion so as to be exposed in the inner portion and the outer portion of the bottle body, the second conductive portion being electrically connectable to the first conductive portion via the chemical in the bottle body.
    Type: Grant
    Filed: January 8, 2013
    Date of Patent: October 14, 2014
    Assignee: Olympus Medical Systems Corp.
    Inventors: Takaaki Komiya, Tsuyoshi Fujita
  • Patent number: 8858730
    Abstract: A beverage can cleaning apparatus for cleaning beverage cans before they are dispensed from vending machines. The apparatus has a can holder, a hinged platform, tubes, a first nozzle, a second nozzle and a sensing block that matches the profile of the can top periphery. The sensing block is depressed a compressed distance, the distance being dependent on the orientation of the can, and cleaning fluid or compressed air is selectively directed through the first or second nozzle. Subsequent to air or cleaning fluid being dispensed against the top of the beverage can, the can holder releases the hinged platform sending the beverage can into the vending machine's dispenser.
    Type: Grant
    Filed: September 6, 2011
    Date of Patent: October 14, 2014
    Inventor: Peter Chapman
  • Patent number: 8857451
    Abstract: An article of manufacture suitable for cleaning the top of a vehicle, comprising: at least one blower: and a support for said blower, wherein said support positions the blower to blow snow or debris from the top of a vehicle. This invention improves on prior art by using blowers to remove snow from large vehicles.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: October 14, 2014
    Inventor: David Opdyke
  • Patent number: 8833380
    Abstract: A device for treating a disc-like article with a fluid, including elements for dispensing a fluid onto the article and a chuck for holding and rotating the article around an axis perpendicular thereto, the chuck including a base body, a drive ring, and gripping members for contacting the article at its edge. The gripping members are eccentrically movable with respect to the center of the article and driven by a drive ring rotatably mounted to the base body so that the drive ring is rotatable against the base body around the axis. The relative rotational movement of the drive ring against the base body is carried out by either holding the base body and rotating the drive ring or by holding the drive ring and rotating the base body, whereby the to-be-held-part (drive ring or base body) is held without touching the respective to-be-held-part by magnetic force.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: September 16, 2014
    Assignee: Lam Research AG
    Inventors: Rainer Obweger, Franz Kumnig, Thomas Wirnsberger
  • Patent number: 8813764
    Abstract: Apparatus, methods and systems for physically confining a liquid medium applied over a semiconductor wafer include a first and a second chemical head that are disposed to cover at least a portion of a top and an underside surface of the semiconductor wafer. Each of the first and the second chemical heads include an angled inlet conduit at a leading edge of the respective chemical heads to deliver liquid chemistry into a pocket of meniscus in a single phase. The pocket of meniscus is defined over the portion of the top and underside surface of the semiconductor wafer covered by the chemical heads and is configured to receive and contain the liquid chemistry applied to the surface of the semiconductor wafer as a meniscus. A step is formed at a leading edge of the first and second chemical heads along an outer periphery of the pocket of meniscus to substantially confine the meniscus of the liquid chemistry within the pocket of meniscus.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: August 26, 2014
    Assignee: Lam Research Corporation
    Inventors: Enrico Magni, Eric Lenz
  • Publication number: 20140174479
    Abstract: A parts washer assembly including a reservoir that may have a contaminated fluid solution at a level and a cover with an opening formed therein on an open end of the reservoir. A clean rinse module including a flange, a tank, a first pump and a second pump that may be disposed in the reservoir contiguous with the cover so that the tank and the first and second pumps depend from the flange into the reservoir. The tank may include an opening above the level of the contaminated fluid solution. The first pump may be connected to the flange and in fluid communication with the tank.
    Type: Application
    Filed: December 20, 2012
    Publication date: June 26, 2014
    Inventor: Rudy Publ
  • Patent number: 8758518
    Abstract: An apparatus includes a counter top sized outer case; first and second electric motors disposed inside of the case. A positive displacement liquid pump with a pulsating output is operatively connected to said first electric motor and has an input and output port. A positive displacement gas pump with a pulsating output is operatively connected to the second electric motor and has an input and output port. A liquid source is fluidly connected to the input port of the liquid pump. The method further includes connecting a medical line or instrument to be cleaned to the output port of the liquid pump and operating the pump until the line or instrument has been cleaned. The line or instrument is then disconnected and connected to the output line of the gas pump. The gas pump is operated until the line or instrument has been cleared of liquid and then disconnected.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: June 24, 2014
    Inventor: Leon C. LaHaye
  • Patent number: 8753580
    Abstract: A disinfectant system for intracavity ultrasound probes in disclosed generally including a housing, a disinfectant chamber positioned in the housing and receiving at least one ultrasound probe, a container for containing a disinfectant solution fluidly coupled to the disinfectant chamber, at least one pump for supplying the disinfection solution from the container to the disinfection chamber and from the disinfection chamber to the container, and a controller for automated operation of the disinfectant system, wherein the disinfectant solution is a multi-use disinfectant solution. A method for disinfecting intracavity ultrasound probes is also disclosed generally including placing at least one ultrasound probe into a disinfectant chamber, supplying a disinfectant solution from a container to the disinfectant chamber via a pump, and returning the solution to the container via the pump, wherein the steps of supplying and returning the disinfectant solution are controlled by a controller.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: June 17, 2014
    Assignee: PCI Medical, Inc.
    Inventor: Philip Coles
  • Patent number: 8746259
    Abstract: Disclosed is a substrate processing apparatus, a substrate processing method and a computer-readable medium capable of recovering an extended amount of discharged solution from a processing unit thereby reducing the amount of deionized water for the processing and the cost. The substrate processing apparatus includes, inter alia, a first and second discharge solution lines each connected to a downstream side of a discharge unit, and the discharged solution from each of the first and second discharge solution lines is independently delivered to the processing solution supply unit as a recovered solution. Also, the substrate processing apparatus includes a converting unit that converts flow of the discharged solution from the discharge unit either to the first discharge solution line or to the second discharge solution line. The processing solution supply unit selectively delivers the recovered solution from the first and second discharge solution lines to the processing unit.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: June 10, 2014
    Assignee: Tokyo Electron Limited
    Inventor: Hideaki Sato
  • Patent number: 8739805
    Abstract: In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: June 3, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Leon Ginzburg, Mark Mandelboym, Gregory A. Tomasch, Anwar Husain
  • Patent number: 8741071
    Abstract: A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate. The acid or base and the water are delivered separately to the surface of the substrate and allowed to mix on the surface, and the water is delivered in pulses. The present invention also provides an apparatus adapted to carry out this process.
    Type: Grant
    Filed: January 9, 2008
    Date of Patent: June 3, 2014
    Assignee: Freescale Semiconductor, Inc.
    Inventor: Tony Vessa
  • Publication number: 20140144465
    Abstract: A substrate cleaning system has a first processing apparatus including a first holding device for holding a substrate, and a treatment solution supply device for supplying onto the entire portion of the front surface of the substrate a treatment solution which includes a volatile component and solidifies or is cured to form a treatment film, and a second processing apparatus including a second holding device for holding the substrate, and a removal-solution supply device for supplying onto the substrate a removal solution which removes the treatment film formed on the front surface of the substrate after the treatment solution supplied by the treatment solution supply device solidifies or is cured.
    Type: Application
    Filed: September 12, 2013
    Publication date: May 29, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Miyako KANEKO, Takehiko Orii, Itaru Kanno
  • Patent number: 8721985
    Abstract: The device is suitable in particular for treating medical endoscopes. At least one treatment fluid is fed through a conduit system (3) to a channel attachment (4), to which a channel of the instrument to be treated can be attached. The conduit system has a fluid attachment (39), which can be connected to a source of treatment fluid. With the aid of a measuring device, the flow of the treatment fluid in the conduit system, and thus the permeability of the attached channel, can be measured. The measurement is effected with the aid of a measurement section (6) in which a flow sensor (7, 7?) is arranged. All the treatment steps are carried out via the conduit system and in particular also via the measurement section. In this way, the conduit system is subjected to the same process as the instrument to be treated, and a flow measurement can be carried out in each individual treatment step.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: May 13, 2014
    Assignee: Belimed AG
    Inventor: Antonio Medici
  • Patent number: 8714166
    Abstract: Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: May 6, 2014
    Assignee: Quantum Global Technologies, LLC
    Inventors: Joseph F. Sommers, Jiansheng Wang, David Do, Satyanarayana Adamala, Ronald Trahan
  • Patent number: 8696825
    Abstract: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 15, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Katsuhiko Miya, Akira Izumi
  • Patent number: 8684014
    Abstract: Disclosed is a liquid processing apparatus and a liquid processing method, which can process an entire wafer at a sufficiently high temperature and can sufficiently suppress adhesion of particles on a surface of the wafer, when the peripheral portion of the wafer is processed. The liquid processing apparatus includes a holding part to hold the substrate, a rotation driving part to rotate the holding part, and a shield unit. The shield unit includes an opposed plate opposed to the substrate held by the holding part, a heating part to heat the substrate through the opposed plate, and a heated gas supplying part to supply heated gas to a surface of the substrate held by the holding part.
    Type: Grant
    Filed: August 3, 2010
    Date of Patent: April 1, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Yoshifumi Amano, Tsuyoshi Mizuno
  • Patent number: 8671961
    Abstract: An apparatus for cleaning and conditioning the surface of a semiconductor substrate such as wafer includes a rotatable chuck, a chamber, a rotatable tray for collecting cleaning solution with one or more drain outlets, multiple receptors for collecting multiple cleaning solutions, a first motor to drive chuck, and a second motor to drive the tray. The drain outlet in the tray can be positioned directly above its designated receptor located under the drain outlet. The cleaning solution collected by the tray can be guided into designated receptor. One characteristic of the apparatus is having a robust and precisely controlled cleaning solution recycle with minimum cross contamination.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: March 18, 2014
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Voha Nuch, David Wang, Yue Ma, Fufa Chen, Jian Wang, Yunwen Huang, Liangzhi Xie, Chuan He
  • Publication number: 20140060584
    Abstract: A part washing device includes an air inlet; a first valve to regulate air coming into the washing device through the air inlet; a liquid inlet; a second valve to regulate liquid entering the washing device through the liquid inlet; a connector to receive air and liquid from the first valve and the second valve; and a tube to receive the liquid and/or air from the connector and direct the air and/or liquid towards a portion of the part.
    Type: Application
    Filed: September 6, 2012
    Publication date: March 6, 2014
    Applicant: UNITED TECHNOLOGIES CORPORATION
    Inventors: Guy P. Boucher, William C. Whitley
  • Patent number: 8651121
    Abstract: A substrate processing apparatus includes a chamber configured to dispose a substrate to be processed with a substrate holder, a spin chuck to rotate the substrate, a gas discharging head configured to discharge a dehumidified gas to the substrate, a processing liquid supply nozzle, an IPA supply nozzle, and a driving device configured to move the gas discharging head between a retreat position of an upper part of the chamber and an approach position near the substrate. In particular, the gas discharging head is positioned at the approach position when the IPA is supplied to the substrate so that the dehumidified gas is supplied from the gas discharging head to the substrate when the IPA is supplied to the substrate.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: February 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Takehiko Orii, Kenji Sekiguchi