Abstract: A patient isolation unit including a foldable frame body, a flexible envelope made of a flammable resin sheet which can be attached to the assembled frame body, and an exhauster to discharge or exhaust the air from the envelope. The exhauster includes a UV lamp, an HEPA filter, and a blower.

Abstract: An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a first pattern to first chemically and mechanically remove residual material from the article. At least one of the nozzle assemblies has a second set of nozzles for spraying a cleaning agent onto the article in a second pattern while simultaneously applying a voltage between the second set of nozzles and the article to then chemically and electrolytically remove the remaining residual material from the article.

Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

Abstract: A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a control mechanism, and an open/close valve, provided between the branch line and the pipe, wherein the open/close valve is configured to interrupt emission of hot water from the third nozzle by opening the open/close valve to lower the pressure in the pipe.

Abstract: An apparatus for wet cleaning a substrate includes a clean air supplier for supplying the clean air into a cleaning draft, a humidifier for supplying steam or mist like water drops into the cleaning draft, a hygrometer, connected to the humidifier and positioned at the level of the cleaning solution, an exhaust piping and an exhaust rate control means.

Abstract: An apparatus for processing a microelectronic workpiece is set forth. The apparatus comprises a workpiece support adapted to hold the microelectronic workpiece and a processing container adapted to receive the microelectronic workpiece held by the workpiece support. A drive mechanism is connected to drive the processing container and the workpiece support relative to one another so that the microelectronic workpiece may be moved to a plurality of workpiece processing positions for processing using processing fluid that is provided by first and second chemical delivery systems. The apparatus also includes first and second chemical collector systems that are used to assist in at least partially removing spent processing fluid. In accordance with one embodiment, the apparatus is particularly adapted to execute an immersion process, such as electroplating, and a spraying process, such as an in-situ rinse.

Abstract: A composition and apparatus and method for aqueous spray conditioning of scale on metal surfaces. An aqueous solution having a base composition of an alkali metal hydroxide is used. The aqueous solution may contain additives to improve the performance of the salt. In one embodiment, the solution is used to condition the scale on a strip of stainless steel. The strip of steel is at a temperature between the melting point of the alkali metal hydroxide in anhydrous form and a temperature at which the Leidenfrost effect appears. One or more nozzles is provided to spray the solution, and the heated strip is passed by the nozzle or nozzles where the solution is sprayed on the surface or surfaces of the strip that have the scale or oxide. The invention also includes the apparatus and control thereof for the spraying of the solution.

Abstract: A system for equalizing pressure in a washing chamber in response to changes in pressure inside washing chamber. Gate elements are operable between open and closed positions to regulate pressure conditions inside the washing chamber.

Abstract: A household dishwasher with a bulk wash aid dispenser for metering individual charges of wash aid from a bulk wash aid supply.

Abstract: A cleaning system that includes a cleaning device, a pipeline having a first end, a valve connected between the cleaning device and a second end of the pipeline to enable water flow from the pipeline to the cleaning device when the valve is held at an open position, a limit switch connected to the valve for providing a signal in response to a position of the valve, a controller electrically coupled to the limit switch to receive the signal, and a monitor electrically connected to the controller and operating in response to the signal.

Abstract: A system for liquid cleaning a plurality of dirty open-ended cylindrical internal combustion engine paper air filters by subjecting each filter to a cleaning cycle including successive first, intermediate and final cleaning steps. For each step liquid is pumped from a separate tank to spray heads for rinsing a filter at a cleaning station and effluent with entrained contaminants is collected for transfer away from the cleaning station. First step cleaning pumps an unclean liquid previously collected in a first tank as effluent from the intermediate step of a preceding filter cleaning cycle and first step effluent is disposed of away from the system. Intermediate step cleaning pumps a semi-clean liquid previously collected in a second tank as effluent from the final cleaning step of a preceding filter cleaning cycle and intermediate step effluent is collected and transferred as unclean liquid to the first tank for cleaning use during the first stage of the succeeding filter cleaning cycle.

Abstract: A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.

Abstract: A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substantially centric position with respect to said substrate and via a plurality of second nozzles that are controlled separately from the first nozzle.

Abstract: A vacuum transfer system for transferring food grade products. A biased ball in a cage with a substantially uninterrupted cage wall is utilized as a check valve. The ball may be biased by a weight to float in a predictable orientation relative to the cage. The biased ball assures that a certain portion of the ball will consistently engage with and aperture. The biased ball also minimizes chattering of the ball in the cage under high flow conditions.

Abstract: The present invention provides a processing liquid tank and a processing system which take smaller spaces for the tank and the heat exchanger and can be realized at low costs. The processing liquid tank 100 for storing a prescribed processing liquid comprises an inner cylinder 130 in the processing liquid tank 100. The processing liquid is stored outer of the inner cylinder 130. The pipes 160a, 160b, 160c for passing a heat medium are disposed in the processing liquid. The flow of the heat medium passing through the pipes 160a, 160b, 160c is opposite to the flow of the heat medium. The processing device comprises a processing liquid tank 100, a processing unit for processing objects-to-be-processed and a processing liquid supply line for supplying a processing liquid from the process liquid tank to the processing unit.

Abstract: A method of and system for cleaning semiconductor wafers minimizes the exposure of the wafers to the air by washing, rinsing and drying the wafers in one cleaning chamber. The system includes a wafer support by which a plurality of wafers can be supported in the cleaning chamber as oriented vertically and spaced from each other, and tubular de-ionized water supply nozzles extending longitudinally in the direction in which the wafers are spaced from each other as disposed to the sides of the wafers. Each de-ionized water supply nozzle has an inner nozzle passageway, and a plurality of sets of nozzle holes extending radially through the main body of the nozzle from the inner nozzle passageway. Each such set of nozzle holes subtends an angle of 80˜100° in a vertical plane and is directed towards a surface of a respective wafer W.

Abstract: Disclosed herein is an automatic cleaning apparatus for paint sprayer gun comprising a solvent cleaning tank, cleaning tank, and a check valve. The solvent cleaning tank has a pressurized air inlet, the cleaning tank has a plurality of vertically erected first tubes equipped with at least one nozzle for each tube, a second tube is connected with each first tube to communicate all first tubes one another, and a third tube is used to communicate the air inlet and the solvent cleaning tank and cause the solvent to be ejected from the nozzles. The check valve is for collecting the solvent in the bottom of the solvent tank. With this structure, the cleaning apparatus of the present invention uses compressed air as its power source so as to eliminate hazardous electrostatic induction owing to mechanical friction caused by rotation of apparatus components during the cleaning operation.

Abstract: A combination fluid and air washing apparatus for washing a vehicle's viewing surface. The apparatus includes a housing, where the housing is of a predetermined shape and size, a nozzle assembly, the nozzle assembly includes at least one fluid nozzle, an air nozzle to complement each of the fluid nozzles, and a shaft, the shaft being pivotally attached to the housing by a pivot means, the fluid and air nozzles are adjacently attached to the shaft and pointed towards the vehicle viewing surface, wherein the air nozzle is pointed lower on the vehicle viewing surface than the fluid nozzle. The apparatus also includes at least one fluid reservoir attached to the housing, wherein the fluid reservoir provides fluid to the fluid nozzle through a fluid feed, and an air compressor connected to the fluid reservoir and the air nozzle by a line, wherein said air compressor provides pressured air to the washing apparatus through the line.

Abstract: A cleaner cleans an implement in a controlled environment by performing a two-fold process. A preferred cleaner performs at least two treatments on the implement using one or more fluids. The fluids can include water, steam, gas, as well as detergents and sterilizing agents. A preferred cleaner includes a chamber, a boiler for generating steam, and a sprayer adapted to convey the steam from the boiler onto the implement. Another preferred cleaner includes a chamber, a fluid processor adapted to convey a fluid to the chamber, a sprayer for directing the fluid onto the implement, and a sterilizer for reducing the level of biological contaminants on the implement. The fluid processor may be an electrically driven centrifugal pump that receives a washing liquid.

Abstract: A micro device in which a functional element can be moved between an operating position and a waiting position by the displacement of support means coupled to a substrate. The micro device has a cantilever structure in which one end of support means is made a fixed one fixed to the substrate and the other end to which an active element is provided is made a free end. A spring portion is provided to at least part of the support means, and thus the active element can be greatly displaced by a small stress.

Abstract: An apparatus for washing quartz parts, particularly for process equipment used in semiconductor industries, comprising a process unit that is suitable to perform washing, a unit for managing washing and rinsing fluids, and a control unit, the units being mutually separate, the process unit comprising a bell-shaped element that is suitable to enclose hermetically the quartz parts to be washed, the quartz parts being inserted vertically in the bell-shaped element.

Abstract: A pressure washer includes a chassis as well as a liquid pump, a pump-driving prime mover, plural chemical product containers and a product selecting valve, all supported by the chassis. Each of the containers is attached to a separate valve conduit extending to the valve and the valve is connected to a device conduit extending to the mixing device. A distributor is mounted for movement with respect to the valve body and has a channel for selectively connecting one of the valve conduits to the device conduit. The user may thereby use the pressure washer to dispense any one of plural solutions. A fresh water container facilitates “wash out” of the valve and device conduit before switching to another chemical product.

Abstract: A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and third nozzles supplying a nitrogen gas for preventing the cleaning liquid from moving into a center portion of the semiconductor substrate. The cleaning liquid supplied to the edge section flows from the edge section towards a side section of the semiconductor substrate due to the rotation of the semiconductor substrate. An ultrasonic wave generator is provided above the edge section for generating ultrasonic waves. The ultrasonic waves are applied to the cleaning liquid supplied onto the edge and bottom sections, thereby improving the cleaning efficiency. The cleaning apparatus has a guide to guide the cleaning liquid supplied to the edge section toward the side section.

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a loader of a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution, while the rotor is spinning. The chelating agent solution removes metallic contamination from the containers. The containers are then sprayed with a rinsing liquid, such as deionized water and a surfactant while the rotor is spinning and heat is applied. The containers are then dried by applying heat, hot air movement and spinning the rotor.

Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.

Abstract: A fluid delivery module for use in preparing a substrate is provided. The fluid delivery module includes a process bowl designed to contain a substrate to be prepared. The process bowl has a bottom wall and a sidewall. The fluid delivery module further includes a fluid delivery ring configured to be attached to the sidewall of the process bowl. The fluid delivery ring includes a plurality of inlet and outlet pairs. Each of the plurality of inlet and outlet pairs is defined in the fluid ring and is designed to receive a respective supply tube. Each respective supply tube has an end that terminates at each of the outlets of the fluid delivery ring and is configured to direct fluid onto a surface of the substrate.

Abstract: A processing apparatus is provided for cleaning a wafer W. In the apparatus, a carbonated solution in the form of mist is ejected onto the wafer W through a nozzle 41, so that the film of carbonated solution, i.e., a conductive liquid film is formed on the wafer W. Next, a pure water highly pressurized by a jet pump 47 is ejected on the wafer W for cleaning it. The film of carbonated solution prevents devices built on the wafer W from being broken electrostatically. A liquid passage 52 from a supply source 51 of the carbonated solution up to the nozzle 41 is made of material which does not dissolve its metallic components into the carbonated solution in spite of the contact of the liquid passage 52 with the carbonated solution.

Abstract: The present invention provides an apparatus for preventing the re-adherence of particles in wafer cleaning process, which comprises a tank containing dissolved high pressure gas water, a cleaning bath for cleaning wafer, and a pipeline connecting the tank and the cleaning bath, such that the high pressure gas water forms a plurality of bubbles on the surface of the wafer and particles after the high pressure gas water in the tank introduction into the cleaning bath, in which the particles near the wafer is push away from the wafer by the bubbles and the particles away from the wafer will not re-adhere to the surface of wafer for the repulsion of the bubbles. The present invention simultaneously provides a method for preventing particle re-adhering in wafer cleaning process, which comprises first providing a tank, a cleaning bath, and a pipeline connecting the tank and the cleaning bath. Then, a dissolved high pressure gas water is provided in the tank.

Abstract: Method and apparatus for cleaning semiconductor devices and other workpieces using an aqueous rinse solution which is de-oxygenated by passing the aqueous rinse solution and a carrier gas through an osmotic membrane degasifier. A cleaning chamber is also disclosed for carrying out the cleaning method.

Abstract: An industrial sponge device and a method of manufacturing the same. The sponge is made from a polyvinyl acetal material with a process in which the pores are formed by gas to provide an open pore structure having no fibrils. Additionally, the sponge is purified by an extracting process which includes alternating exposure of the partially cross-linked sponge to solutions of high pH and low pH. The sponge is sterilized by electron beam radiation to destroy micro organisms that can cause contamination of the final product. The resulting sponge material is formed into an industrial sponge having a cylindrical body and a plurality of projections extending from the body. The projections are tapered truncated cones having a cross-sectional radius that decreases with distance from the body. The extracting process permits residual amounts of calcium, zinc, and other elements to be 2 ppm or less preferably 1 ppm or less.

Abstract: An apparatus of cleaning a nozzle comprising a mounting table for mounting a substrate to be processed, a process liquid nozzle having a liquid output portion for outputting a process liquid toward the substrate mounted on the table, a nozzle cleaning mechanism having a fluid spray portion for spraying a cleaning fluid onto the liquid output portion of the process liquid nozzle to remove an attached material from the liquid output portion by the cleaning fluid sprayed from the fluid spray portion, and a nozzle moving mechanism for moving the process liquid nozzle between the mounting table and the nozzle cleaning mechanism.