Abstract: A brushless car wash system includes a wash unit that washes upper surfaces of the vehicle. The height of the wash unit is adjusted based on the contour of the upper surfaces of the vehicle. Adjusting the height of the wash unit results in increased wash performance of the brushless car wash system.

Abstract: A photomask cleaning tool includes various components to automatically remove a particle from a pellicle, such as a multi-jet nozzle to standardize and control the use of a gas to remove the particle, an ultrasonic probe to loosen the particle from the surface of the pellicle, a plurality of multi-jet nozzles to direct gas toward the particle from different directions, a control system to control the automated blower for various sizes and shapes of photomasks and for optimized particle removal techniques, and/or the like. In this way, the photomask cleaning tool is capable of removing a particle from a pellicle of a photomask in a manner that increases the effectiveness of removing the particle and reduces the likelihood of damage to the pellicle, which would otherwise result in expensive and time-consuming photomask rework.

Abstract: A spray device includes a spray assembly. The spray assembly is configured to spray cleaning liquid towards a to-be-cleaned surface of a to-be-processed workpiece. The spray assembly includes a spray head and multiple liquid inlet pipelines. The spray assembly is configured to spray cleaning liquids with different concentrations, temperatures, and/or flow rates corresponding to different positions in a radial direction of the to-be-cleaned surface to cause a cleaning rate of the cleaning liquids at the different positions in the radial direction of the to-be-cleaned surface to be consistent.

Abstract: The present disclosure relates generally to water jet equipment. Specifically, water jet equipment that includes a support frame comprised of a plurality of stackable trolleys that support a plurality of lances as those lances are inserted into and withdrawn from heat exchanger tubes during a cleaning operation of the same. A method of cleaning elongated tubes by positioning and rotating the lances while moving in a first direction is further provided.

Abstract: A method of encapsulating an engineered pellet in a porous membrane is disclosed. The method includes the steps of: (i) dissolving a membrane solute in a membrane solvent to produce a membrane solution; (ii) applying the membrane solution to a pellet to form a pellet encapsulated with the membrane solution; (iii) subjecting the membrane solution that encapsulates the pellet to a phase inversion and; (iv) drying the pellet to form a porous membrane encapsulated pellet. A porous membrane encapsulated pellet is also described.

Abstract: Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.

Abstract: A cleaning method of sufficiently cleaning a workpiece is provided. The cleaning method, including: rotating or swinging a workpiece having a first cleaning surface about a table rotation axis; ejecting cleaning fluid from a nozzle along an ejection axis; and swinging the nozzle about a nozzle rotation axis parallel to the table rotation axis to keep a constant impact angle formed between the ejection axis and the first cleaning surface for cleaning the workpiece.

Abstract: A method for the in-situ reconditioning of a heavy workpiece mounted on the floor. The method comprises assembling a jig mounted on the floor so as to be arranged around the workpiece to be reconditioned, that is also mounted on the floor, the jig supporting a gantry at the two ends of same, on which there is mounted a precision robotic arm carrying at least one machining apparatus. The method also comprises the alignment of the workpiece and the jig using a precision laser alignment tool in order to allow the jig, the gantry and the robotic arm to form a precision machining apparatus. The method also comprises the reconditioning of the workpiece using the precision machining apparatus.

Abstract: The embodiments of the present disclosure provide a substrate bearing assembly and a magnetron sputtering apparatus. The substrate bearing assembly includes: a stage; and a bearing plate provided on the stage for carrying a substrate on which a film is to be formed. A side of the bearing plate is hinged with the stage by a hinge member, and the bearing plate is able to be rotated by the hinge member to be perpendicular to a plane in which the stage is located. The hinge member is able to translate on the stage in a direction perpendicular to a side of the bearing plate connecting with the hinge member.

Abstract: Disclosed herein are systems and methods related to a handling system used to move a semiconductor substrate within a process chamber during treatment. The handling system moves the substrate back-and-forth between two locations in an arc-like motion around a pivot point, while simultaneously rotating the substrate around its own center point.

Abstract: A multiple tube-type heat exchanger (25) is provided with a cylindrical heat exchanger shell (36) and a heat transfer tube unit (38) which is mounted in a removable manner within the heat exchanger shell (36). The heat transfer tube unit (38) is provided with a plurality of heat transfer tubes (50) extending inside the heat exchanger shell (36) in the longitudinal axis direction; a binding member (51 serves also as this binding member) for binding the heat transfer tubes (50); and a plurality of rotary journal sections (51, 52) which are concentric with the center axis (CL) of the heat transfer tube unit (38), are provided at positions located at a distance from each other in the direction of the center axis (CL), and enable the heat transfer tube unit (38) to be supported by predetermined rotation support sections provided outside the heat exchanger shell (36).

Abstract: A dishwasher includes a tub to provide a wash space, a first rack located inside the tub to receive a washing object and a second rack located below the first rack, a flow path tower provided at the second rack to eject wash water to the first rack, an ejection arm including a chamber for introduction of wash water, a first flow path in communication with the chamber, and second and third flow paths in communication with the chamber to eject wash water to the second rack and separated from each other, a tower separable coupler provided inside the ejection arm to connect the first flow path to the flow path tower when wash water is supplied to the first flow path, and a flow path switcher provided inside the chamber to selectively open the first, second and third flow paths according to a pressure inside the chamber.

Abstract: The present invention relates to a method for treating a surface of an object which comprises the steps consisting of bringing the surface to be treated in contact with a diffusion intermediate and then maintaining said surface to be treated in contact with said diffusion intermediate without any movement relatively to each other, said diffusion intermediate being impregnated with a corrosive solution prior to contacting or during said contacting. The present invention also relates to a device implemented during such a method.

Abstract: A substrate processing apparatus includes: a substrate holder to hold a substrate in a horizontal posture while rotating the substrate about a vertical rotary axis passing through the center of a plane of the substrate; a guard member having a shape extending along at least part of a surface peripheral area of the substrate, the guard member being placed in a position close to the surface peripheral area of the substrate held by the substrate holder in a noncontact manner; a cup being a tubular member with an open top end, the cup being provided so as to surround the substrate held by the substrate holder and the guard member together; and a nozzle from which a processing liquid is discharged to the surface peripheral area of the substrate held by the substrate holder. The nozzle is placed on a side opposite the cup with respect to at least part of the guard member.

Abstract: A docking system includes basket and wall conduit systems. The basket conduit system includes a conduit and first and second nozzles mounted to opposite ends of the conduit. The second nozzle has a first funnel shape with a first circumference that decreases from an open end of the second nozzle towards the conduit. The wall conduit system includes front and back housings, a sliding plate, and a third nozzle. A sliding aperture is formed through a front plate of the front housing. A nozzle aperture is formed through a back plate of the back housing. The sliding plate slides within a space formed by the front housing and the back housing. The third nozzle is sized and shaped to slide within the sliding aperture and includes a generally cylindrical shape and a second funnel shape with a second circumference that decreases from the sliding plate towards the generally cylindrical shape.

Abstract: A spray assembly for a dishwasher appliance is provided. The spray assembly includes a base unit and a mounting bracket rotatably mounted to the base unit. A spray arm is selectively secured to the mounting bracket. The mounting bracket includes features for engaging the spray arm and hindering undesired detachment of the spray arm from the mounting bracket.

Abstract: A washer, comprising a washing chamber defined by a pair of side walls, a top wall and a bottom wall, the washing chamber having an opened front face and an opened back face. A first shelf assembly is mounted within the washing chamber having at least one shelf section for receiving and supporting articles to be cleaned during a washing operation. A second shelf assembly is mounted within the washing chamber vertically above the first shelf. The second shelf assembly is mounted to the side walls having at least two shelf sections, at least one of the at least two shelf sections being selectively removable from the washing chamber so that additional space may be provided for larger articles on one side of the first shelf, and so that articles may be inserted into or removed from the washing chamber through the front face or back face of the washing chamber.

Abstract: A hard disk drive (HDD) top cover removal tool includes a nest assembly, a clamp, a guide plate, and a purge and vacuum assembly (PAVA). The nest assembly secures an HDD and rotates it from a first to a second position. The clamp presses against a top cover of the HDD such that the top cover maintains contact with a hard drive body of the HDD. A hole defined in the guide plate is aligned with a screw location of the top cover and the hard drive body, and receives a screw driver for removing a screw fastening the top cover to the hard drive body. The PAVA purges and evacuates particles from the screw location of the top cover and the hard drive body of the HDD in the second position. The clamp releases the top cover. The PAVA removes the released top cover from the hard drive body.

Abstract: According to embodiments of the present invention, a dishwasher may include a manifold assembly including a manifold and an attachment assembly. The manifold may provide a fluid connection with a fluid supply and direct fluid from the fluid supply to a spray device. The attachment assembly may couple the manifold to a dish rack. Further, the attachment assembly may facilitate movement of the dish rack relative to the manifold between a retracted position and an extended position while maintaining the fluid connection with the fluid supply. The attachment assembly may include at least one sliding rail and a first plurality of engagement members that couple the sliding rail to the dish rack. Additionally, a second plurality of engagement members may couple the manifold and the sliding rail so as to allow movement along the sliding rail along a major axis of the sliding rail.

Abstract: A conduit for a dishwashing appliance that is height adjustable and can accommodate different vertical positions of a rack assembly. One end of the conduit moves up and down with the rack assembly while maintaining a connection with e.g., a spray arm assembly suspended from the bottom of the rack assembly. The other end of the conduit remains in a relatively fixed vertical position during height adjustments so as to enable connection and reconnection at the fixed position of a main fluid supply conduit.

Abstract: A method of washing a bulk container is provided. The method includes receiving the bulk container on a support surface and rotating the support surface and at least one washer arm relative to one another. The method further includes spraying a fluid from at least one nozzle disposed on the at least one washer arm. Rotating the support surface and the at least one washer arm relative to one another exposes a plurality of portions of an outer surface of the bulk container to the spray.

Abstract: A portable apparatus for sieving, washing, and drying particle samples onsite that are generated from well drill cutting. The apparatus comprises a sievewash chamber to initially remove contaminates from the samples, and a final wash-spin-dry chamber to completely clean and dry the samples for analysis. The two chambers function under the operational control of a computerized system comprising a processor, a user display, and a database storing computer code for operating the apparatus in various cleaning cycles. The sieve-wash chamber comprises two vertically stacked baskets: a coarse basket on top to hold the drill cutting samples; and, a caged basket underneath to catch clean samples as they fall through the coarse mesh screen on the bottom of the coarse basket. The caged basket with the samples is then manually transferred to the wash-spin-dry chamber for processing by motorized rotation of the basket at high rpm's.

Abstract: An apparatus for processing a substrate, comprising: a process chamber having a track; a carrier connected to the track; upper and lower proximity heads in the chamber and positioned along the path, the proximity heads having opposing faces that define a gap in which a meniscus of fluid is formed, the path being defined along the gap between the opposing faces; a first pre-wet dispenser and a second pre-wet dispenser disposed along side of the upper proximity head and directed toward the path; a drive for moving each of the pre-wet dispensers between a center position along the length of the upper proximity head and opposite outer positions near outer ends of the upper proximity head; and a pre-wet controller for causing the drive to move each of the first and second pre-wet dispensers based on a position of the carrier when moved under the first and second pre-wet dispensers.

Abstract: A washer adapted to wash a part with a solution, the washer comprising spaced apart sidewalls, and at least one arm rotatably mounted near its center on at least one of the sidewalls. The arm has one end and another end, a central portion, and an angled portion near the one arm end and angled relative to its adjacent arm central portion. The washer also includes a plurality of nozzles spaced apart along the arm central portion and the arm angled portion between near the one arm end and near the other arm end.

Abstract: A docking system includes basket and wall conduit systems. The basket conduit system includes a conduit and first and second nozzles mounted to opposite ends of the conduit. The second nozzle has a first funnel shape with a first circumference that decreases from an open end of the second nozzle towards the conduit. The wall conduit system includes front and back housings, a sliding plate, and a third nozzle. A sliding aperture is formed through a front plate of the front housing. A nozzle aperture is formed through a back plate of the back housing. The sliding plate slides within a space formed by the front housing and the back housing. The third nozzle is sized and shaped to slide within the sliding aperture and includes a generally cylindrical shape and a second funnel shape with a second circumference that decreases from the sliding plate towards the generally cylindrical shape.

Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.

Abstract: Embodiments of the present invention generally relate to an apparatus and a method for cleaning a semiconductor substrate after a polishing process. Particularly, embodiments of the present invention relates to an apparatus and method for cleaning a substrate using pressurized fluid. One embodiment of the present invention comprises two rollers to support and rotate a substrate in a substantially vertical orientation, a pressure wheel to apply a force to engage the substrate with the two rollers, and a swinging nozzle configured to dispense a pressurized fluid towards the substrate.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be an mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: Disclosed is a substrate liquid processing method. The substrate liquid processing method includes: forming a liquid film of a processing liquid having a diameter smaller than that of the substrate on a surface of a substrate by providing the processing liquid to a central portion of the surface of the substrate from a first nozzle while rotating the substrate around a vertical axis in a horizontal posture; supplying, from a second nozzle, a processing liquid, which is the same as the processing liquid supplied from the first nozzle, to a peripheral edge of the liquid film of the processing liquid formed on the surface by the first nozzle; and moving a position of supplying the processing liquid from the second nozzle to the surface of the substrate toward a peripheral edge of the substrate and as a result, expanding the liquid film of the processing liquid toward the peripheral edge of the substrate.

Abstract: An embodiment of the present invention provides a water wash system that may mix a cleaning fluid with at least one chemical agent to form a cleaning solution. The cleaning solution may reduce the corrosives on components of a compressor. The cleaning solution may be a mildly acidic solution to reduce corrosion of a caustic nature. Alternatively, the cleaning solution may be a mildly basic solution to reduce corrosion of an acidic nature.

Abstract: Disclosed are pre-wetting apparatus designs and methods for cleaning solid contaminants from substrates prior to through resist deposition of metal. In some embodiments, a pre-wetting apparatus includes a process chamber having a substrate holder, and at least one nozzle located directly above the wafer substrate and configured to deliver pre-wetting liquid (e.g., degassed deionized water) onto the substrate at a grazing angle of between about 5 and 45 degrees. In some embodiments the nozzle is a fan nozzle configured to deliver the liquid to the center of the substrate, such that the liquid first impacts the substrate in the vicinity of the center and then flows over the center of the substrate. In some embodiments the substrate is rotated unidirectionally or bidirectionally during pre-wetting with multiple accelerations and decelerations, which facilitate removal of contaminants.

Abstract: A dishwasher includes a rack provided with interior and exterior corner nozzles to direct washing fluid onto interior and exterior surface portions of an object placed in a corner of the rack.

Abstract: A dishwasher includes a shiftable rack provided with multiple, distinct washing fluid spray arms connected to a common, rack supported manifold. When the rack is shifted to a retracted position within a tub of the dishwasher, the manifold mates with a coupling of a fluid distribution system including a multi-tube feed arrangement configured to selectively distribute washing fluid from a pump assembly to the multiple spray arms.

Abstract: A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.

Abstract: Methods and apparatus for removing condensed metal from the surfaces of metal processing chambers, such as, vacuum induction melting (VIM) furnaces having, for example, condensed Mg or Ti, are disclosed. The methods and apparatus provide a robotic arm end positioned in the furnace having a nozzle operatively connected to a source of dry ice. The robotic arm end directs a stream of dry ice particles against the surface of the furnace to displace condensed metal. The displaced metal is collected for reuse or disposal. Aspects of the invention provide a safe and automated process for cleaning process chambers and recovering metal that can typically be dangerous when performed by conventional methods.

Abstract: A substrate holder is defined to support a substrate. A rotating mechanism is defined to rotate the substrate holder. An applicator is defined to extend over the substrate holder to dispense a cleaning material onto a surface of the substrate when present on the substrate holder. The applicator is defined to apply a downward force to the cleaning material on the surface of the substrate. In one embodiment the cleaning material is gelatinous.

Abstract: A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.

Abstract: A valve is closed while a cleaning liquid is fed into a tubular body of a cleaning nozzle, and a piezoelectric element applies vibrations to the cleaning liquid. This causes droplets of the cleaning liquid to be produced and discharged from a plurality of discharge holes. The droplet diameter of the discharged droplets is in the range from 15 to 200 ?m, and the distribution of the droplet diameter is such that the value of where a value of 3? does not exceed 10% of the average droplet diameter. The droplet speed is in the range from 20 to 100 meters per second, and the distribution of the droplet speed is such that the value of where a value of 3? does not exceed 10% of the average droplet speed. The droplet flow rate is not less than 10 milliliters per minute. Discharging the droplets of the cleaning liquid from the cleaning nozzle toward a substrate while satisfying these discharge conditions improves cleaning efficiency without damages to the substrate.

Abstract: The invention relates to a method for cleaning filters (22) which are designed as solid bodies having pores and/or having channels which are open towards the surface, by blasting using a blasting medium, characterised in that the blasting medium is gaseous and contains solid or liquid blasting agents, if appropriate in the form of substances having a boiling point of no more than 140° C., the blasting medium is accelerated in a jet nozzle (16, 18) so that it strikes the filter (22) at least at almost the speed of sound, and during blasting the filter (22) is disposed in front of an intake opening (34, 34?) which draws in the blasting medium as well as ambient air.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: A wafer scrubber is disclosed, including a chamber, and a holder connecting to a spindle disposed in the chamber, wherein the holder supports a wafer, and the wafer spins to remove water on the wafer, and a mashed inner cup comprising a plurality of through holes disposed between the holder and a wall of the chamber, wherein the mashed inner cup receives water from a surface of the wafer and rotates around the spindle to release the water through the through holes.

Abstract: A hose reel assembly, system and method for cleaning tubes, particularly heat exchanger tubes, which system includes independently rotatable inner and outer drums. The inner drum is rotated in a first or second direction by a first motor assembly to wind a hose disposed in a gap between the drums, off of or onto the inner drum. A second motor rotates the outer drum causing rotation of a nozzle on the hose about the hose's longitudinal axis and at speeds of about 100 to about 1600 rpm. The nozzle delivers a water jet at pressures of up to about 55,000 psi to cut through deposits in the bores of the exchanger tubes. The nozzle is mounted on an indexer movable within the heat exchanger and a camera and joystick on a remote console enables an operator to view the cleaning operations and manipulate the nozzle in relative safety.

Abstract: An agricultural seed box washing device and method includes a modular enclosure having a washing area having a stationary first spray array and a second spray array movable transverse to the path of travel of the seed box for washing all six geometric sides of the seed box. The device includes a two-directional conveyor that allows the seed box to cycle back and further through the first spray array for multiple passes through the spray arrays.

Abstract: A clean and purge tool (CAPT) is provided and includes a nest assembly that stows an open hard disk drive (HDD). The nest assembly is rotated from an upward facing position to a downward facing position to dislodge particles from a media clamp of the HDD. The CAPT also includes a cover hingedly attached to the nest assembly and encloses the HDD. The CAPT also includes a spindle clamp assembly (SCA) mounted on the cover and has a vacuum tube configured to encapsulate the media clamp. The SCA includes an air purge nozzle extending into the vacuum tube. The CAPT dislodges particles from the media clamp when pulses of compressed gas are applied to the media clamp by a compressed gas source via the air purge nozzle and evacuates the particles from the vacuum tube when a vacuum is applied to the vacuum tube by a vacuum source.

Abstract: A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and held by a tape bonded to a surface of the frame and a non-joint surface of the processing target substrate, the cleaning method including: a placement step of placing a cleaning jig to face the processing target substrate such that a supply surface of the cleaning jig for supplying a solvent for the adhesive onto the joint surface of the processing target substrate covers the joint surface and a distance between the supply surface and the joint surface is a predetermined distance; and a cleaning step of then supplying the solvent between the supply surface and the joint surface and diffusing the supplied solvent over the joint surface by a surface tension.

Abstract: A substrate processing method includes jetting at least one fluid from a fluid nozzle toward a rotating substrate surface while moving the fluid nozzle from a center toward a periphery of the rotating substrate. The fluid nozzle is moved from the center of the substrate to a predetermined point at a constant initial movement speed. The fluid nozzle is subsequently moved from the predetermined point at a movement speed V(r) which satisfies the following relational expression: V(r)×r?=C (constant), where V(r) represents the movement speed of the fluid nozzle when it passes a position corresponding to a position on the substrate surface at a distance “r” from the center of the substrate, and ? represents a power index.

Abstract: A surface of a substrate can be dried cleanly after liquid-processed by a liquid processing method and a liquid processing apparatus. The liquid processing method includes forming a liquid film of a rinse solution on an entire surface of a substrate having thereon a hydrophobic region by supplying, onto a central portion of the surface of the substrate, the rinse solution for rinsing a chemical liquid supplied on the substrate at a first flow rate while rotating the substrate at a first rotation speed; forming a stripe-shaped flow of the rinse solution on the surface of the substrate by breaking the liquid film formed on the entire surface of the substrate; and moving a discharge unit configured to supply the rinse solution toward a periphery of the substrate until the stripe-shaped flow of the rinse solution is moved outside the surface of the substrate.

Abstract: Dishwasher, in particular domestic dishwasher, comprising a crockery basket which comprises a, in particular rotating, washing arm which is supplied with water by a water transferring pipe (1), wherein the water transferring pipe (1) is connected with the crockery basket and coupling means (2) are provided for hydraulic coupling of the water transferring pipe (1) to a water supply pipe (3) which is arranged in a wall or in a corner of the washing cavity, wherein the crockery basket is adjustable in its height relatively to the washing cavity of the dishwasher and the coupling means (2) allow hydraulic coupling of the water transferring pipe (1) to the water supply pipe (3) in at least two different height positions of the crockery basket, wherein the coupling means (2) comprise a bellow that is elastically deformable, wherein the bellow (4) is connected to the water supply pipe (3) and comprises an open axial end (5) that is adapted for releasable sealing contact with the water transferring pipe (1), wherein

Abstract: A compact robotic wash system is provided for cleaning a work piece. The robotic wash system includes an enclosed wash chamber. A robot is fully disposed inside the wash chamber. The robot has a maximum horizontal reach that is at least 40% of the maximum horizontal linear dimension of the wash chamber. The robot may hold a work piece and move the work piece around a plurality of spray devices. Alternately, the robot may hold one or more spray devices, while a work piece is supported on a movable table.

Abstract: An object of the present is to uniform particle diameters and speeds of liquid droplets in a two-fluid nozzle for cleaning substrates which mixes gas and liquid internally and injects liquid droplets with gas so as to clean a substrate. The two-fluid nozzle for cleaning substrates has a gas supply passage for supplying gas, a liquid supply passage for supplying liquid, and a lead-out passage for leading out internally-formed liquid droplets, wherein an injection port for injecting liquid droplets to the outside is formed at the front end of the lead-out passage, and wherein a cross-sectional area Sb of the injection port is formed smaller than a cross-sectional area Sa of the lead-out passage, and a cross sectional area Sc of an exit of the gas supply passage is formed smaller than the cross-sectional area Sa of the lead-out passage.