Abstract: The present invention can remove particles such as dust by flowing solvent gas such as CO2 through a line filter and eject it from a nozzle so as to be converted to solid particles or liquid droplets and eject to a workpiece to be cleaned so as to clean particles or organic materials. It is possible to make the solvent to a solid particle or liquid droplet by adjusting a gap between the nozzle and the workpiece to be cleaned; thus, it is possible to select the most preferable state according to the extent of the adhesion of organic material to the workpiece to be cleaned. Also, it is possible to remove particles such dust in the solvent by a line filter; thus, it is not necessary to use highly pure expensive solvent, and it is possible to reduce the running cost of the apparatus.

Abstract: Methods and systems for preparing a substrate implementing a surface tension reducing process are provided. In one example, a substrate preparation system includes a chuck which fingers for edge gripping the substrate. The chuck is hollow to provide simultaneous access to both active and backside surfaces of the substrate, and is configured to rotate the substrate. The system includes dispense arms positioned over the substrate surfaces. The dispense arms are capable of moving between a center region and a periphery of the substrate surfaces, and each dispense arm includes a pair of supply lines for delivering fluids over the substrate surfaces. A connection couples the upper dispense arm with the lower dispense arm so that the dispense arms synchronously move between the center region and the periphery of the substrate, and remain aligned on opposite surfaces of the substrate.

Abstract: An improved process for cleaning a semiconductor wafer surface during manufacture to remove metallic contaminants without the use of robotics and without risk of scanning droplets falling from the wafer, in a faster time than with a manual process using a vacuum wand, comprising:

Abstract: Semiconductor wafer (11) are uniformly and thoroughly cleaned of particulate and organic contaminants by sweeping the wafer with a hydraulic broom that sprays cleaning solution onto the wafer. The broom contains an aspirating nozzle (3) for connection to a source of pressurized gas, such as nitrogen, and to a source of cleaning fluid, such as acetone, wherein cleaning fluid aspirated by the gas stream is expressed through the nozzle outlet to impact the surface of the wafer, dislodging particulate matter and dissolving organic contaminants. A programmed controller (9) controls movement of the hydraulic broom relative to the wafer to ensure that the entire surface is cleaned and permits a variety of sweeping patterns.

Abstract: The present invention 10 discloses a device for cleaning and sanitizing objects such as food products 86, cartridge filter elements 64 and other such objects that could benefit from the advantages of being circumferentially sprayed with a fluid or a cleaning solution 119 or preferably a combination thereof. The present invention 10 comprises an inner and outer housing body 24, 44, a cover 26 for the housing body, a rotative central member such as a base, axle or shaft 42, a rotative drive means 60 for selectively rotating the rotative member 42, intake means 16 to introduce one or more fluids 119 or solutions individually or in combination into the interior of the housing body 24 including a means for further pressurizing and peripherally directing the resulting spray 130 towards a central point in a specific array, a containment means 66 for placement of such items therein, and an outlet means 18 to provide for the removal of fluid from the housing.

Abstract: An apparatus for cleaning castings includes a cleaning cabinet having a rotary clamping device which clamps a casting to be cleaned upon a freely rotatable plate in the cabinet. An elongate lance having a high pressure nozzle at its inner end projects into the cabinet and delivers a high pressure water jet against the casting at a pressure of 1,000 psi to 40,000 psi. A spherical bearing pivotally and rotatably mounts the lance on a vertically reciprocal carriage. A pair of pneumatic cylinder and piston units are connected to lance and are differentially operated with respect to actuation times and length of piston stroke to thereby produce random movement of the lance during the cleaning operation.

Abstract: The present invention relates to a solution treatment unit for supplying a treatment solution to a substrate to treat the substrate within a treatment container, and an inner container surrounding an outer periphery of the horizontally held substrate with its upper and lower faces open is provided in the treatment container. An exhaust pipe for exhausting an atmosphere in the treatment container is provided in a bottom portion of the treatment container and inside the inner container. An exhaust port of the exhaust pipe is open at a position higher than the bottom portion. A drain port for draining the treatment solution in the treatment container is provided in the bottom portion. According to the present invention, the drain of a solution and the exhaust of an atmosphere can be performed separately without being mixed, and hence pressure loss of a fan on the factory side which performs an exhaust operation can be reduced, resulting in a reduction in excess power consumption.

Abstract: An edge bead removal system and method is provided that employs a nozzle for applying edge bead removal solvent to an edge bead of a photoresist material layer disposed on a wafer. The nozzle eliminates solvent splash by lowering the angle of dispense to less than 20° as well as providing more degrees of freedom to the nozzle arm adjustments. Adjustment screws and a built-in protractor provide precision in setting the application angle. The nozzle includes a clamp design having a nozzle body clamp which holds the nozzle and a main shaft with a protractor assembly for up and down angle adjustments. A support bracket is coupled to the protractor assembly and allows for pivoting and side to side movement of the protractor assembly and the support bracket with respect to one another. A clamp connects a main arm structure that moves the entire edge bead removal nozzle assembly over the wafer.

Abstract: A dishwasher having a wash chamber or tub including a sump and a side wall. A pump is fluidly connected with the sump and a supply tube is supported adjacent the tub side wall and receives wash liquid from the pump, the supply tube has a manifold portion including a plurality of outlet openings. A coupling retainer is connected to the supply tube and has a plurality of funnel shaped coupling ports corresponding in number and spacing to the outlet openings of the supply tube. Each of the coupling ports includes a center opening which is provided with a sealing surface. A valve member supports a plurality of valve elements for sealing the outlet openings and is captured between the coupling retainer and the supply tube such that the valve elements generally align with the coupling ports. At least one adjustable height basket is supported within the tub and a spray arm is associated with the adjustable height basket and has a feed tube extending toward the supply tube.

Abstract: Washing apparatus for one or more fluid dispensers is disclosed. The apparatus includes a container for washing fluid, a support portion to support the fluid dispensers, and a handle which, in the preferred embodiment, may be used to force the support means and dispensers through the washing fluid in a plunging action so that the washing fluid under pressure is forced through the fluid dispensers to clean them.

Abstract: The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.

Abstract: A cleaning device for cleaning a paint roller cover with a cleaning liquid emanating from a liquid pressure supply line. The cleaning device includes a generally elongated casing for receiving the paint roller cover. The casing is provided with a casing slot extending through the casing peripheral. A roller cover support assembly is mounted within the casing for rotatably supporting the paint roller. A liquid discharge assembly is attached to the casing for discharging the cleaning liquid into the casing along a path lying on a chord either of the paint roller cover of a turbine component mounted on a spindle shaft. pport structure is attached to the casing for supporting the latter on a supporting surface in a generally horizontal orientation.

Abstract: A method and apparatus are provided for deacidifying cellulose based materials, especially books, magazines, and other bound or folded cellulose materials having a spine. The method includes contacting the materials with a treating medium and producing relative movement at a predetermined velocity between the materials and the treating medium in a direction generally parallel to the spine of the materials and, preferably simultaneously, directing the treating medium by means of a spray toward the materials in a direction generally perpendicular to the spine of the material for a period of time effective for the treating medium to contact substantially all of the material. Following treatment, any excess treating medium is removed from the material and directing any such removed treating medium to a holding tank for reuse later. The movement in a parallel direction is achieved by reciprocating the materials through a tank filled with treating medium.

Abstract: An improved dishwashing machine is proposed which has a dish-cleaning compartment, a dish-rack rotating mechanism, a re-circulating fluid spraying system, a non re-circulating fluid spraying system, a drainage mechanism, a waste filter tank and a controlling means. The dish-cleaning compartment consists of a cover and a casing, which includes a re-circulating fluid spray arm and a non re-circulating fluid spray arm. Automatic chemical dispenser, hot air dish-drying system and ultraviolet light sterilizer are included as optional features. Dish-cleaning operation starts with a flush cycle and then follows by a wash cycle and a rinse cycle. A dish-drying operation is introduced at the end of the rinse cycle, to dry as well as to sanitize dishes.

Abstract: Rolls of a strip line are cleaned by directing jets of a cleaning liquid thereagainst from nozzles which are mounted so that their distances from the roll to be cleaned can be set or controlled.

Abstract: The present invention relates to an apparatus for cleaning a belt dryer (10) with at least one belt (18) running through a drying space (17) for receiving the products to be dried, and a cleaning nozzle emitting a cleaning agent into the drying space (17) of the belt dryer (10) the apparatus includes at least one nozzle (31, 32, 33; 61) arranged for traveling in the longitudinal direction (22) and/or transverse direction (29) of the belt (18). The invention relates furthermore to a belt dryer, in the drying space (17) of which at least one traveling slide (30, 44) and/or at least one extensible arm (60) is arranged, applied to the slide or arm is at least one nozzle (31, 32, 33; 61).

Abstract: An equipment for conveyance and treatment of garbage in a high building comprises a conveyer, a guide track, gathering barrels, and a cleaning mechanism. The conveyer further comprises a driving motor, a conveyer belt, a driving gear wheel, and a driven gear wheel, wherein the driving motor is to drive the conveyer belt to revolve via the driving gear wheel and the driven gear wheel. A guide track is covered with the conveyer belt for stable revolution, and the gathering barrel attached to the conveyer belt externally is provided with a reception opening for garbage collection of each story. A bracket and cantilevers are supplied to the gathering barrel to keep the same upright when circulating. The gathered garbage is conveyed to base story of a building and ejected through outlet at bottom of the gathering barrel. The used gathering barrel will be cleaned by the cleaning mechanism for immediate subsequent use.

Abstract: A device to clean a transport belt of a machine for manufacturing a material web, in particular paper or cardboard web, is provided which includes at least one nozzle that can impart a medium under pressure and is designed to rotate on a rotational axis. The device is characterized in that the rotational speed of the nozzle for a gentle cleaning of the transport belt lies in the range of from about 2500 rpm to about 4000 rpm, and for an intensive cleaning of the transport belt in the range of from about 1000 rpm to about 2500 rpm.

Abstract: A toothbrush sterilization unit for sterilizing the bristle-head of at least one toothbrush with a disinfectant. The toothbrush sterilization unit includes a housing having an interior compartment. The interior compartment includes a plurality of docking stations for holding in place a plurality of toothbrushes. The housing includes a pumping system assembly for dispensing a disinfectant on the bristle-heads of the toothbrushes during a dispensing cycle. The housing also includes a rotary fan and a heating member for drying the disinfectant on the bristle-heads of the plurality of toothbrushes during a drying cycle.

Abstract: A portable ground soil remediation apparatus and method utilizing a water and biodegradeable soap mixture to result in an safe solution to effectively remove crude or refined oil from the soil, as well as the toxins associated with this type of contamination. The present invention includes at least one elongated, rotatable chamber filled with the soap mixture and having internal lifting means to pick up soil and provide cleansing with the soap mixture. Additionally, a means for injecting fluid is placed within the chamber to provide additional cleansing capability and to replenish the soap mixture. The present invention is adapted to allow effective soil movement through at least one soil cleaning chambers, which minimizes wear due to the lack of internal blades and other moving components.

Abstract: A load station is used in a planarizing machine to perform several useful functions related to handling of a wafer. By centering the wafer with respect to a spindle carrier the load station interrupts the accumulation of positional errors. The load station never makes solid contact with the wafer, but instead the wafer is continually levitated on three cushions of water that are directed upwardly against the lower face of the wafer. The presence of the wafer partially impedes the flow of water from the nozzles used for levitation causing an increase in the water pressure immediately upstream of the nozzles. This increased pressure is sensed and used as an indicator of the presence of a wafer at the load station. The load station further includes a nozzle that directs a stream against the lower side of the wafer so as to elevate the wafer from the load station into the carrier.

Abstract: An apparatus for cleansing and disinfecting surgical instruments is disclosed wherein the apparatus includes a cleansing chamber for containing the instrument while proximate at least two nozzles for directing fluids onto the instrument. The nozzles and the instrument are simultaneously oscillated by separate rotary drives.

Abstract: An apparatus for cleaning both sides of a substrate, incorporating a spin chuck for holding a substrate such that contact with at least a central portion of the substrate is prevented, a motor having a hollow shaft connected to the spin chuck to transmit rotating force to the spin chuck, a front-side cleaning mechanism for cleaning a surface of the substrate held by the spin chuck, and a back-side cleaning mechanism for rinsing a back side of the substrate held by the spin chuck, wherein the back-side cleaning mechanism is disposed to face the back side of the substrate held by the spin chuck through hollow portions of the hollow shaft.

Abstract: A washing method provides a liquid jet washing by jetting a liquid against a rotating thin-plate-shaped workpiece from a nozzle which shifts while being positioned opposite a front or back surface of the workpiece, thus removing dust adhering to the front or back surface and thereby washing the workpiece. The locus of the shifting nozzle is caused to pass in the vicinity of, but not over, the center of rotation of the workpiece. Electronic circuitry present at the central portion of workpiece is prevented from suffering electrostatic breakage caused by collision with washing liquid. At the same time, an appropriate quantity of washing liquid is made to collide with the entire surface of a workpiece, so that the workpiece can be washed satisfactorily.

Abstract: A nozzle that extends telescopically upward is used to elevate a wafer without contacting the wafer. The nozzle includes a stationary hollow cylinder, closed at its lower end and open at its upper end, within which a spool is disposed to slide vertically. In its lowest position the spool is spaced from the closed bottom of the cylinder, and purified water is supplied under pressure to the space. A passage extends vertically through the spool, and the water is discharged at the upper end of the spool from the passage. As a wafer is lowered toward the upper end of the spool, the wafer partially impedes the discharge, increasing the pressure in the space below the spool. The increased pressure drives the spool and the wafer upward, but the wafer never comes into contact with the wafer because the discharge of water creates a protective cushion between them.

Abstract: Disclosed is an apparatus for removing a coated film from a peripheral portion of a substrate, comprising a section for holding a rectangular substrate horizontal, a surrounding member for surrounding a peripheral portion of the substrate held by the holding section, a discharge section mounted to face an upper peripheral portion of the substrate held by the holding section, rotatable about its longitudinal axis, a supply mechanism for supplying a solvent capable of dissolving the coated film into the solvent discharge section, a discharge rate controller for controlling the discharge rate of the solvent from the discharge section, a rotating mechanism for rotating the discharge section about its longitudinal axis between a first position in which the discharge port faces perpendicularly downward the front surface of the substrate and a second position, a suction mechanism, and control means for controlling the operation of each of the controller and the rotating mechanism.

Abstract: A device to clean a transport belt of a machine for manufacturing a material web, in particular paper or cardboard web, is provided which includes at least one nozzle that can impart a medium under pressure and is designed to rotate on a rotational axis. The device is characterized in that the rotational speed of the nozzle for a gentle cleaning of the transport belt lies in the range of from about 2500 rpm to about 4000 rpm, and for an intensive cleaning of the transport belt in the range of from about 1000 rpm to about 2500 rpm.

Abstract: A device for cleaning a transport belt of a machine for manufacturing a material web, in particular a paper or cardboard web, is provided which includes at least one cleaning nozzle working in conjunction with a suction chamber. Thus, the transport belt can be imparted upon with a cleaning medium; and a suction device that is connected to the suction chamber also acts on the transport belt. The device includes at least one auxiliary nozzle from which a treatment medium, preferably fluid, serving to clean the suction device can be introduced into at least one of the suction chamber and a suction line of the suction device.

Abstract: The invention relates to cleaning equipment for puncture-resistant gloves and the like and to a support, which accommodates one or several holding mechanisms for puncture-resistant gloves, the support being constructed movably, so that each holding mechanism can be brought into the sphere of activity of a washing nozzle, which is connected with a supply of cleaning liquid.

Abstract: A processing apparatus comprises a resist coating machine for coating resist on the surface of a substrate, a resist removing machine for removing the unnecessary resist stuck to the peripheral portion of the substrate carried out of the resist coating machine, and a transport arm for transporting the substrate from the resist coating machine to the resist removing machine, wherein the resist removing machine comprises a substrate table on which the substrate brought in by the transport arm is placed, a nozzle for spraying a solvent on the peripheral portion to remove the unnecessary resist stuck to the peripheral portion of the substrate on the substrate table; a discharge machine for discharging the solvent used to dissolve and remove the unnecessary resist and the dissolved and removed resist, and an exhaust machine for exhausting the atmosphere under the substrate table downward.

Abstract: A method and device for cleaning contaminated surfaces with both water and steam. A water film is applied to the contaminated surface and steam sprayed into the water film while water is continued to be applied to the water film. In this way the steam is directed into the water film and through the water film onto the contaminated surface, whereby contaminates in the contaminated surface are removed.

Abstract: An apparatus for administering treatments to pre-packed boxes of produce, comprising: a main frame defining a space sized and configured to receive a plurality of vertically stacked, pre-packed boxes of produce, each box having at least one pair of through hand holes located in opposing ends thereof, a first injector frame moveably mounted to the main frame opposite one of the two opposing sides of the vertically stacked boxes and a second injector frame moveably mounted to the main frame opposite the other of the opposing sides of the vertically stacked boxes; a plurality of spray injectors in fluid communication with a solution holding tank and with means to pump solutions from said holding tank to said spray injectors, the spray injectors being adjustably mounted on the injector frames, with a spray injector positioned in alignment with each hand hole exposed on each of the two opposing sides of the vertically stacked boxes; means to move the injector frames between a first position in which the spray inje

Abstract: An apparatus and a system for cleaning or sanitizing industrial filling equipment is described. The apparatus is a movable arm spray manifold which is used to position a spray manifold below a filling valve of a filling machine and a clean interior portion of the filling station. The system may couple the movable arm spray manifold with one or more stationary arm spray manifolds to provide a cleaning system for the filling station.

Abstract: A paint roller cleaner consists of a tubular body holding a paint roller covered, with a traversing nozzle spraying a liquid whereby the roller is cleaned after use.

Abstract: Apparatus and method are provided for improved washing and drying of semiconductor wafers utilizing an enhanced "Marangoni effect" flow of liquid off of the wafers for superior prevention of watermarks (water spots) on integrated circuits (ICs) on the wafers. The apparatus includes a housing 12 which may be hermetically sealed, an open-top wash tank 60 within a lower part of the housing, a moveable rack 16 for holding the wafers either in the tank for washing or in an upper part of the housing for drying, apparatus 34 for supplying chilled (near freezing) de-ionized water (DIW) to a lower part of the tank, the DIW flowing within the tank and overflowing the top thereof, a pump 20 for draining overflowing DIW from the housing, and apparatus 40 for supplying to the housing organic vapor such as isopropyl alcohol (IPA) in a dry gas such as nitrogen. During wafer drying operation of the apparatus the pressure within the housing is kept at about one Torr or less.

Abstract: An apparatus for cleansing and disinfecting surgical instruments is disclosed wherein the apparatus includes a cleansing chamber for containing the instrument while proximate at least two nozzles for directing fluids onto the instrument. The nozzles and the instrument are simultaneously oscillated by separate rotary drives.

Abstract: A cleaning apparatus is disclosed which is capable of simultaneously and precisely cleaning two sides of a substrate required to be cleaned, such as a silicon wafer. The cleaning apparatus has a holding unit for horizontally holding a substrate required to be cleaned, a rotating unit for rotating the holding unit, a first cleaning-fluid injection unit disposed above the holding unit and arranged to inject cleaning fluid with high-frequency acoustic waves to the surface of the substrate supported by the holding unit and a second cleaning-fluid injection unit disposed below the holding unit and arranged to inject cleaning fluid to the reverse side of the substrate supported by the holding unit.

Abstract: A megasonic cleaning system includes a transducer on which a substrate to be cleaned is placed. An oscillating electrically energy source is coupled to the transducer for driving the transducer to produce acoustical energy at substantially megasonic frequencies to vibrate the substrate. A blower assembly is arranged over the substrate, and the blower assembly contains a hollow elongate member having a plurality of nozzles spaced along a length thereof. A drive mechanism is connected to the blower assembly such that the blower assembly is horizontally movable relative to the surface of the substrate. A source of cleaning fluid is in flow communication with the nozzles, and the nozzles are arranged such that a flow path of cleaning fluid through the nozzles is inclined toward an upper surface of the substrate to be cleaned. A vacuum source is in flow communication with the substrate for vacuum-adhering the substrate on the transducer via a vacuum force.

Abstract: A cleaning device for cutlery, includes a cleaning chamber with a spraying device acting in the cleaning chamber, the cleaning chamber being disposed so that it can be removed from the cleaning device. Also in a method for cleaning and disinfecting cutlery, the disinfecting and the cleaning are carried out consecutively in this or in the reverse order in the same cleaning chamber.

Abstract: Apparatus for cleaning disks during processing. The apparatus is used with a disk processing system having a conveyor belt for transporting a disk carrier containing disks. The conveyor belt and the disk carrier have openings therein. A cleaning station is disposed above the conveyor belt and has an opening therein that isolates the cleaning station from the processing system. The cleaning station has a recirculating blower system, a laminar flow screen, a HEPA filter, and a ducting system for recirculating purified air or inert gas. A carbon dioxide jet spray cleaning system is provided that has a plurality of sets of jet spray nozzles disposed in the cleaning station that are coupled by way of manifolds to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the nozzles.

Abstract: A substrate spin cleaning apparatus includes a nozzle attached through a first and second support brackets to support shaft that is rotatable about a vertical axis. The nozzle delivers a cleaning liquid to the surface of a spinning substrate in a pin-point mode and under high pressure, while moving a liquid application point on the substrate surface between the substrate spin center and peripheral edge of the substrate. The first support bracket defines an arcuate slot extending within a plane including the spin center and a tip of the nozzle and along an imaginary circle about the spin center. The nozzle is attached to the second support bracket connected to the first support bracket which in turn is through the arcuate slot, to deliver the cleaning liquid to the spin center. The application point is movable through the spin center regardless of the inclination angle of the nozzle relative to the substrate surface.

Abstract: A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.

Abstract: An apparatus and method are provided for washing machining debris from machined parts. The apparatus includes a machine transfer housing with front and rear sidewalls, a top, a bottom, an entrance sidewall defining an entrance, and an exit sidewall defining an exit. A transfer line enters the housing at the entrance, extends through the housing and exits the housing at the exit to transport the machined parts through the housing. A header is attached to the top housing wall for delivering a wash solution to the housing. A solenoid valve controls the flow of the wash solution in the header. One or more rotating nozzles are connected to the header for spraying the wash solution in the housing to remove machining debris from the machined parts and the housing walls.

Abstract: A quick disconnect supply riser for the nozzles of a can washing apparatus includes a bayonet connector and a riser support which provide inherent nozzle alignment when the risers are locked in connected position. Operator access to the capped opposite ends of the risers allows easy disconnection and reconnection via convenient openings in one side wall of the housing. The demountable connectors are attached to riser supply manifolds adjacent the opposite side wall thereby eliminating a large amount of excess piping.

Abstract: A device for cleaning rollers in paper producing machines such as those used to calendar paper in the process of manufacturing paper from pulp. The device cleans rollers in paper producing machines with a high pressure hydrospray, while the rollers remain in the machine, thus, eliminating the need to remove the rollers from the machine in order to clean them.

Abstract: Produce, whether vegetable and/or fruit, is supported upon a basket suspended within a closed cabinet. Each of a plurality of nozzles disposed about the basket emits a droplet permeated cone of washing liquid to scour the produce and to dislodge by agitation and flotation debris therefrom. A motive device provides motion to the basket to enhance exposure of the produce to the plurality of nozzles. After filtering the washing fluid through a screen in the cabinet, the washing fluid is recycled by a pump pumping the washing fluid from a collection trough to the plurality of nozzles. Preferably, the washing fluid is slightly acidic. The produce may be subjected to a rinsing fluid after washing is completed.

Abstract: A multi-screw press for dewatering waste materials including a plurality of fixed filtering cylinders and a plurality of revolving filtering cylinders connected to the fixed filtering cylinders are installed within a single outer casing, and a plurality of tapered screws are located within the fixed and revolving filtering cylinders. The screws and the revolving filtering cylinders are driven by a single motor, so that the waste materials within the filtering cylinders are pressed by the screws and dewatered. A pressure adjusting device is located on the outlet of the screw press and is hydraulically driven. Any residue adhering to the filtering cylinders can be effectively washed away by the use of spray tubes.

Abstract: A plurality of engine-run components are fixtured on a cleaning fluid manifold disposed in a cleaning chamber with the internal passage of each component communicated to a respective fluid spray nozzle on the cleaning fluid manifold, a heated caustic cleaning fluid is pumped to the manifold for flow through the nozzle and then the internal passage of each component for a time to remove the deposits, and the heated cleaning fluid is discharged from each component into the cleaning chamber.

Abstract: An apparatus for automatically cleaning baby bottles inside and out comprising a base in a generally rectangular configuration having a floor, a drain thereabove and offset from parallel therewith for water run off and parallel side walls therebetween; a centrally-located cylindrical manifold extending upwardly through the drain to a location thereabove; a plurality of baby bottle holders rotatably mounted for rotation above the drain, the bottle holders being annular in configuration with an upstanding cylindrical side wall and internal threads for receiving the upper extent of inverted baby bottles to be washed, the holders having apertures in the lower extents of their walls for the draining of water therefrom; a peripheral tube extending upwardly for rotation and with apertures therein for spraying the insides of bottles; and a drive gear beneath the drain, the drive gear including a central gear for acting through a motion imparting assembly for rotating the manifold and a plurality of upper peripheral g

Abstract: Described is an apparatus and method, particularly applicable to a brush bed conveyor system, by which objects, typically citrus fruit, are washed or sprayed. A moveable high pressure spray manifold is contained within a manifold carriage and is disposed within the conveyor chassis such that it is moved along above a brush bed by a conveyor chain. Separation bars extend from the conveyor chain to segregate the objects into queues retained within the spray pattern of the manifold. When the manifold reaches a predetermined end position, a release latch is decoupled from the separation bars to disconnect the separation bars and conveyor chain from the manifold carriage. The predetermined end position is sensed and the manifold carriage is quickly returned to its initial position by means of a selectively activated pneumatic piston assembly.