Abstract: Described is an automated analyzer capable of effectively cleaning a dispensing probe without using a sweeping cleaning member. The automated analyzer includes: a receptacle holding portion for holding a plurality of receptacles in which aliquots of liquid are stored, an immersion cleaning solution holding portion for storing an immersion cleaning solution, an aliquot dispenser equipped with a drive mechanism for holding a dispensing probe operative to collect the aliquots of liquid from the receptacles, a measurement controller for controlling the drive mechanism and the dispensing probe such that the aliquots of liquid are successively collected at given cycles from the receptacles, and an immersion cleaning controller for controlling the drive mechanism and the dispensing probe such that an immersion cleaning operation is carried out for an immersion time that is at least twice as long as the period of each of the given cycles.

Abstract: A portable air filter cleaning device includes a housing configured to receive an air filter to be cleaned, at least one spray mechanism within the housing for spraying fluid onto the air filter to be cleaned within the housing, a cleaning fluid reservoir coupled to at least one spray mechanism for selectively spraying cleaning fluid onto the air filter to be cleaned within the housing, a rinsing fluid reservoir coupled to at least one spray mechanism for selectively spraying rinsing fluid onto the air filter to be cleaned within the housing; and a motor for facilitating cleaning, rinsing and drying of the air filter to be cleaned. The device may be rotational for cylindrical type air filters or designed for cleaning flat plate type air filters. An associated method of cleaning an air filter is disclosed.

Abstract: A cleaning station for an optical element is providing, including: an optical element holder configured to hold the optical element; a first drive configured to rotate the optical element holder around a rotation axis coinciding with an optical axis of the optical element when held by the optical element holder; a cleaning nozzle configured to project a cleaning jet of a cleaning liquid towards the optical element; and a separate drying nozzle configured to project a drying jet towards the optical element, the cleaning nozzle and the drying nozzle being configured to move in order to direct the cleaning jet and the drying jet, respectively, successively to different locations on the optical element.

Abstract: An apparatus and method to desulfurize a biogas containing sulfur. Since biogas is produced by an anaerobic digester from human, animal, kitchen and agriculture's wastes, it is a short term recycled product from the photosynthesis of CO2, and has a net zero carbon emission. The sulfur compounds in the biogas can be removed by the following steps: (1) converting all sulfur compounds into H2S by the hydrogen produced from the biogas over Pt group metal catalysts; (2) adsorbing the H2S at high temperature by the regenerable Pt group metal catalyst and adsorbents. The desulfurized biogas is further converted by an ATR/CPO reformer or a steam generating reformer to produce various reformates.

Abstract: The present disclosure provides a contact lens package containing a contact lens in a compressed state. In one exemplary embodiment, the overall internal depth of the package is less than the natural sagittal depth of the contact lens. Different single-use contact lens package shapes and configurations may be used. In some embodiments, a spring disc is included in the packages to help present the contact lens to the user when the package is opened. The contact lens packages may be adhered or clipped to a card or other carrier sheet, and may be housed in a number of different secondary packages.

Abstract: A distributed Biogas Combined Heat and Power (CHP) Generator can provide automatically hot water and electricity for local applications. Since biogas is produced by an anaerobic digester from human, animal, kitchen and agriculture's wastes, it is a short term recycled product from the photosynthesis of CO2, and has a net zero carbon emission. The sulfur compounds in the biogas can be removed by the following steps: (1), converting all sulfur compounds into H2S by the hydrogen produced from the biogas over Pt group metal catalysts; (2). adsorbing the H2S at high temperature by the regenerable Pt group metal catalyst and adsorbents. The desulfurized biogas is further converted by an ATR/CPO reformer or a steam generating reformer to produce various reformates, which can be connected to a downstream 1C engine/gas turbine, and/or a steam turbine to drive electric generators for generating electricity. The hot reformate and the exhaust gases can be cooled in heat exchangers to produce hot water/hot air.

Abstract: The invention is an insert (1) for a tray (28) used for storing or conveying a spectacle lens (34, 35) and a spectacle frame (61). The insert (1) is mounted to engage various outward extensions (25, 26) formed as part of the tray floor (27). The insert (1) includes numerous beveled surfaces (45, 19, 43, 46, 40, 41, 42, 38, 39, 37, 36), at least some of which can engage a spectacle lens placed on the insert. A vulcanized rubber dispersed in a plastic matrix used to construct the insert (1). A frame pillow (60) is formed as a sheet (62) which overlays the tray floor (27), creating a space which reduces or eliminates movement of the spectacle frame (61) during tray transport.

Abstract: An apparatus for cleaning chandeliers includes a hand-held fluid source having a proximal end connected to a source of hot water under positive pressure and a distal end having a spray head for discharging hot water under pressure in a spray pattern. A vacuum shield has at least one vacuum inlet connected to a source of negative pressure. Hot water discharged from the spray head is attracted to the vacuum shield when the spray head and the vacuum shield are disposed in relatively close proximity to one another and the vacuum shield is in fluid communication with the source of negative pressure. An object disposed between the spray head and the vacuum shield is cleansed by the action of hot water under positive pressure impinging against it. The vacuum shield protects objects not disposed between the spray head and the vacuum shield.

Abstract: There are provided an ultrasonic cleaning apparatus and an ultrasonic cleaning method capable of suppressing occurrence of damage on a substrate to be cleaned and capable of performing cleaning at a high cleaning level for highly precise substrates and the like used in an electronics industry. Occurrence of damage on the substrate to be cleaned is suppressed by holding an object to be cleaned so as to be positioned out of a region where perpendiculars extend from an oscillating surface of an ultrasonic transducer to a liquid surface (an ultrasonic-irradiated region) under and in the vicinity of the liquid surface of a cleaning solution, exciting a capillary wave on a surface of the cleaning solution by an ultrasonic wave, and separating particulate contamination of the object to be cleaned by an acoustic pressure generated by the capillary wave without irradiating the object to be cleaned directly with the ultrasonic wave.

Abstract: In conventional apparatuses for measuring blood cells and immunity from whole blood, the CRP cell is used for the final cleaning of a nozzle, and CRP measurement—cleaning of the CRP cell—final cleaning of nozzle are performed in this order in the CRP cell. In contrast, in the present invention, an exclusive cleaning chamber A for immunity measurement is further provided for the cleaning nozzle after completion of dispensing the specimen and the reagent(s) for CRP measurement to the CRP cell. Thus, a configuration is adapted wherein the outer surface and inner surface of the nozzle are cleaned in the cleaning chamber A for immunity measurement while the immunity measurement is performed in CRP cell. Since the final cleaning of the nozzle is performed in parallel with the CRP measurement, the time conventionally necessary for the final cleaning of the nozzle can be shortened.

Abstract: An automatic analyzer cleans dispensing nozzles that dispense a sample or reagent using a rinse tank. The rinse tank includes first and second rinse liquid discharge ports arranged along the bottom and top of the rinse tank, respectively. The first rinse liquid discharge ports face the top of the rinse tank. The second rinse liquid discharge ports supply rinse liquid to flow to an exterior of the dispensing nozzles when aligned therewith. Each dispensing nozzle is rinsed by moving from a first position aligned with one of the first rinse liquid discharge ports to a second position aligned with one of the second rinse liquid discharge ports.

Abstract: An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.

Abstract: An apparatus and method for removing waste from a soiled container that houses laboratory animals and has an opening is disclosed. The apparatus includes a conveyor having a receiving end for receiving containers from a stack of containers. The stack is disposed such that the openings are upwardly oriented. The apparatus also includes a manipulator that aligns with and engages an uppermost container of the stack and causes the uppermost container to be separated from the stack and to be flipped over onto the receiving end of the conveyor such that the opening is downwardly disposed. Waste discarded from the container falls through openings in the conveyor, and a waste receptacle disposed below the conveyor collects the discarded waste. The conveyor advances to transport the container away from the receiving end toward a discharge end of the conveyor.

Abstract: Disclosed is an adjustable semiconductor processing apparatus and a control method thereof. The apparatus comprises a micro chamber with an upper chamber portion defining an upper working surface and a lower chamber portion defining a lower working surface that are relatively moveable towards each other between an open position and a closed position. When the chamber is in the closed position, a cavity formed by the upper working surface and the lower working surface defines a gap between the upper working surface, the lower working surface and a semiconductor wafer received in the cavity for flow of a processing fluid. A drive device enables the upper working surface of the upper chamber portion or/and the lower working surface of the lower chamber portion to tilt or deform to control flow of chemical agents within the micro chamber.

Abstract: An anti entrapment fail safe drain having a drain cover for partially covering an influent opening; a pressurized supply line; and a nozzle assembly in communication with the pressurized supply line and mounted within a drain sump. The nozzle assembly is for directing a pressurized liquid in a pattern over a surface of the drain cover when the drain cover and the nozzle are immersed in the liquid such that a portion of the liquid above the pattern or objects suspended in standing liquid can not be pulled directly toward the drain cover through a drain inlet opening. The drain also has an effluent opening for connecting to the drain sump arranged such that the liquid flows into a pipe in a first direction. The pressurized supply line is arranged inside the pipe for returning the liquid to the nozzle assembly in a second direction opposite the first direction.

Abstract: Embodiments of a semiconductor processing apparatus are disclosed. The semiconductor processing apparatus includes a micro chamber for tightly accommodating and processing a semiconductor wafer. The micro chamber includes an upper chamber portion defining an upper working surface and a lower chamber portion defining a lower working surface. The upper chamber portion and the lower chamber portion are relatively movable between an open position for loading and removing the semiconductor wafer and a closed position for tightly accommodating the semiconductor wafer. The semiconductor processing apparatus adopts a modified column device, a lower chamber portion and a balance correction device to achieve easy operation and maintenance, better prevention of chemical processing fluid leakage, and corrosion-resistant design.

Abstract: A movable trash container cleaning system includes a vehicle with a spray booth and a movable access door for enclosing the spray booth. A manipulating arm is provided for engaging and lifting a container disposed outside a vehicle and inverting a container inside the spray booth. A sprayer is provided and disposed for spraying the fluid onto inside surfaces of the inverted container to clean the container and dislodge the solids. A stationary platform is provided for receiving the dislodge solids wash from the inverted container and the ram packer moves to dislodge the solids from the platform into a storage chamber in the vehicle.

Abstract: Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: The invention relates to a method and a device for processing broken glass, to which residues of stickers adhere. According to the invention, an underlay is provided, for example, a closed drum or an open shell, having a delivery point and a discharge point for broken glass particles. In the area of the delivery point, the broken glass particles are set into motion to one another by means of movement of the underlay, whereby mutual friction of the particles occurs. A stream of broken glass particles which is freed of sticker residues travels to the discharge point. A gas stream is oriented opposite to the stream of broken glass particles, which conducts the separated residues of stickers with it, and which simultaneously dries the cleaned glass particles.

Abstract: An improved portable cleaning system for use in cleaning heat exchanger tube bundles, fin-fans, towers and other elongated components. The cleaning system comprises a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.

Abstract: In order to produce a cleaning device which cleans in a particularly effective manner wherein the cleaning device comprises a cleaning chamber for accommodating a workpiece requiring cleaning and a fluid transfer device for transferring at least one fluid into the cleaning chamber and/or out of the cleaning chamber and wherein the fluid transfer device comprises at least one nozzle in the form of a slotted nozzle extending along a slot axis and said fluid is arranged to be fed into the cleaning chamber or fed out of the cleaning chamber by means of said fluid transfer device in a direction transverse to the slot axis, it is proposed that the cleaning device comprise a slotted nozzle moving device for moving at least a part of the slotted nozzle.

Abstract: An apparatus for etching a substrate includes (a) a nozzle system including at least one nozzle through which acid solution containing at least hydrofluoric acid is sprayed onto the substrate, (b) a mover which moves at least one of the nozzle system and the substrate relative to the other in a predetermined direction in such a condition that the substrate and the nozzle system face each other, (c) a filter system which filters off particles out of the acid solution having been sprayed onto the substrate, and (d) a circulation system which circulates the acid solution having been sprayed onto the substrate, to the filter system, and further, to the nozzle system from the filter system.

Abstract: An aqueous tube cleaning system as described herein can be utilized to clean a plurality of tubes having different lengths. The system includes a tower assembly having a wash chamber that houses the tubes during the cleaning cycle. The tower assembly is held in a horizontal load/unload position for loading and unloading of the tubes. The system rotates the tower assembly into a vertical cleaning orientation to accommodate cleaning with cleaning and rinse solutions, which flow through and around the tubes using the force of gravity. After rinsing and draining, the tower assembly is rotated back to the horizontal position for unloading.

Abstract: A liquid treating apparatus comprising a holding device (30) for holding wafers (W) in a substantially vertical attitude and a treating vessel (10) for accommodating the wafers held by the holding device. A treating liquid is supplied into the treating vessel by means of a treating liquid supply system. A rotational drive device (20) is provided for rotating the holding device (30) around a rotational axis passing approximately through the center of the wafers (W) in a state of non-contact with the treating vessel (10).

Abstract: A method of forming a pattern includes forming a resist layer on a substrate, cleaning a surface of the substrate under a control that a shear stress acting on an interface between a cleaning liquid and the substrate during the cleaning becomes larger than a shear stress acting on an interface between an immersion liquid and the substrate during immersion exposure, exposing the resist layer by the immersion exposure to form a latent image on the resist layer, and developing the resist layer to form a resist pattern on the substrate.

Abstract: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid (11), with an outlet port (14) equally provided on the housing (20) to discharge the cleaning fluid (11), and with a filter element (F), said filter element (F) being provided with filter pores for filtering out solid particles, particularly hair particles, and being arranged in a flow area between the inlet port (15) and the outlet port (14), in a manner enabling the pump capacity to be significantly reduced or the service life of a cartridge (K) to be substantially increased. This is accomplished in that the filter element (F) has pores of a size causing part of the particles to penetrate the filter element (F) according to their size.

Abstract: A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, the inner container being communicated to the outer container through the upper opening; a cleaning liquid supply conduit for supplying a cleaning liquid into the inner container; an inner container drain conduit for draining the cleaning liquid from the inner container; a solvent-containing gas supply conduit for supplying a solvent-containing gas into the inner container for drying the substrate; a solvent-resolving gas supply conduit for supplying a solvent-resolving gas into the inner container for resolving a solvent component attached on the substrate; an exhaust pipe for exhausting the gases from the double container, and an outer container drain conduit for draining the liquid spilled from the inner container to the outer container.

Abstract: An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the film constant for dissolving the ion contaminants in the extraction liquid; and collecting the extract solution at the bottom of the sampling chamber.

Abstract: A system for processing a workpiece includes a process head assembly and a base assembly. The process head assembly has a process head and an upper rotor. The base assembly has a base and a lower rotor. The base and lower rotor have magnets wherein the upper rotor is engageable with the lower rotor via a magnetic force created by the magnets. The engaged upper and lower rotors form a process chamber where a semiconductor wafer is positioned for processing. Process fluids for treating the workpiece are introduced into the process chamber, optionally while the processing head spins the workpiece. Additionally, air flow around and through the process chamber is managed to reduce particle adders on the workpiece.

Abstract: An interlocking lid which is suitable for a wet bench tank used in the processing of semiconductor wafer substrates. The interlocking lid includes a pair of lid panels typically provided with a clasp having elements for engaging and interlocking with each other when the lid panels are in a closed position. At least one of the lids may further include a beveled lid shoulder which facilitates runoff of liquids from and hinders pooling of liquids on the exterior surface of the lid.

Abstract: A cleaning device for cleaning an object includes an inner vessel configured to contain a first liquid and the object. The cleaning device also includes an external vessel configured to contain a second liquid and the inner vessel. The second liquid is acoustically coupled to the first liquid. At least one transducer is acoustically coupled to the external vessel and configured to generate acoustical energy which is transferred to the object through the external vessel, a second liquid, the inner vessel and the first liquid. The first liquid has a dissolved gas concentration of a first gas and the second liquid has a dissolved gas concentration of a second gas.

Abstract: A system for processing wafers includes a robot moveable within an enclosure to load and unload workpieces into and out of workpiece processors. A processor includes an upper rotor having alignment pins, and a lower rotor having one or more openings for receiving the alignment pins to form a processing chamber around the workpiece. The alignment pins center the workpiece relative to a rotor spin axis and to an etch or drain groove in the upper rotor. A first fluid outlet delivers processing fluid to a central region of the workpiece. The processing fluid is distributed across the workpiece surface via centrifugal force generated by spinning the processing chamber. Purge gas is optionally delivered into the processing chamber through an annular opening around the first fluid outlet to help remove processing fluid from the processing chamber.

Abstract: A device for wet processing of a semiconductor-containing substrate that addresses contamination in the wet process by removing undesired sources of gas contamination, the method involving pumping a processing liquid through a degasifier, exposing the semiconductor wafer, in a vessel, to the degasified processing liquid; and optionally recirculating the processing liquid through the degasifier and back into the vessel.

Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.

Abstract: A liquid waste disposal and canister flushing system for a medical canister including a press-fit canister lid, features a cabinet with an opening and a sink with a drain positioned therein. A mounting bracket is affixed to the cabinet and includes a shaft connected to the canister bracket for rotating the canister and a shaft connected to the lid removal bracket for removing the canister lid from the canister. The canister is secured within the canister bracket and is rotated from an initial position to a drainage position. The canister lid is positioned on the removal bracket and is rotated from an initial position to a removal position. Once the canister is rotated into the drainage position, the pressurized and diluted cleaning solution source is activated to flush the contents out of the canister and into the sink and drain. After the canister is sanitized it may be removed from the system and reused.

Abstract: A cleaning apparatus for medical and/or dental tool provides a possibility to clean the burrs and brushes (files) of the remained tooth material on them after operation on patient. An improved cleaning apparatus for medical and/or dental tool includes a container, comprising a neck with an opening and at least one of a plurality of apertures located in the lower part of the neck, a fluid stream reflector of a lid, which includes a connector comprising a fluid inlet pipe which is coupled by a tubular means with a fluid line via controllable valve, and a cylindrical stand connected to the base, providing a stable position of the container during cleaning process.

Abstract: An apparatus for the treatment of semi-conductor wafers is provided. The apparatus has a first valve mechanism for introducing different treatment fluids into a treatment tank from different reservoirs. At least one collection device is provided for collecting a treatment fluid after treatment of wafers therewith in the treatment tank. A second valve mechanism is provided for conveying at least a portion of the treatment fluid out of the collection device and to a respective reservoir. A rinsing mechanism is provided for rinsing the collection device.

Abstract: Provided is a wafer rotary holding apparatus by which a reduced pressure is created on an upper surface of a rotary disk by a simple and easy-to-make mechanism with no need of any of a vacuum source apparatus, a compressed air supply apparatus, a compressed gas supply apparatus and other apparatuses in use; a wafer can be held while rotating with no contact to a rear surface thereof; a degree of pressure reduction can be adjusted with ease and even a thin wafer (of 0.1 mm or less in thickness) can be held while rotating with no deformation; and the wafer with a bowing can be held while rotating with no correction of the bowing. A wafer rotary holding apparatus includes: a rotary disk on which a fluid flow path is formed; a through hole formed in a central section of the rotary disk; and a plurality of wafer rests provided on an upper surface of the rotary disk.

Abstract: Disclosed is a dishwasher having an improved inlet valve assembly. The present invention includes a housing, a tub in the housing to hold tableware, an injector assembly for injecting water on the tableware in the tub, and an inlet valve assembly. And, the inlet valve assembly includes a case installed at an inlet passage for supplying the water to the tub, the case having an inlet opening via which the water flows in and an outlet opening via which the water is discharged, a first valve provided to the case to selectively open/close a passage in the case, and a second valve closing the passage in the case in case that the water leaks.

Abstract: An apparatus for cleaning re-usable filters, the re-usable filter having an axis, the apparatus. The apparatus includes a source of cleaning fluid; a receptacle for dirty cleaning fluid; a mount for holding the re-usable filter, the mount spinning about the filter's axis; a nozzle for directing a spray of cleaning fluid against the filter; a pump for delivering cleaning fluid from the source of cleaning fluid to the nozzle; and a cover for enclosing the apparatus.

Abstract: A pressure processing device including a vessel having a body and an opening/closing member. A seal member is provided on a joining surface between the body and the opening/closing member, and a non-sliding joining surface is provided which is not slidably moved when the member is opened and closed. A device is provided including a diaphragm for housing an object to be processed, and a fluid introducing passage to the vessel provided so that a greater part of a fluid flowing into the vessel flows into the diaphragm. The diaphragm can be formed of heat insulating material, and a filter can be provided for removing particles installed on the side of the diaphragm into which a fluid flows. A plate having a labyrinth construction can be provided for trapping particles by parts on a surface thereof. A pressure processing device in which an object may be washed is also provided.

Abstract: A system for processing a workpiece includes an inner chamber pivotably supported within an outer chamber. The inner chamber has an opening to allow liquid to drain out. A motor pivots the inner chamber to bring the opening at or below the level of liquid in the inner chamber. As the inner chamber turns, liquid drains out. Workpieces within the inner chamber are supported on a holder or a rotor, which may be fixed or rotating. Multi processes may be performed within the inner chamber, reducing the need to move the workpieces between various apparatus and reducing risk of contamination.

Abstract: The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel. In an embodiment of the present invention, a semiconductor structure is placed into a first treatment vessel and chemically treated. Following the chemical treatment, the semiconductor structure is transferred directly to a second treatment vessel where it is rinsed with DI water and then dried. The second treatment vessel is flooded with both DI water and a gas that is inert to the ambient, such as nitrogen, to form a DI water bath upon which an inert atmosphere is maintained during rinsing. Next, an inert gas carrier laden with IPA vapor is fed into the second treatment vessel. After sufficient time, a layer of IPA has formed upon the surface of the DI water bath to form an IPA-DI water interface.

Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.

Abstract: This simple non-electric produce washer is a devise designed to dislodge and gently wash away unhealthy and often time's life threatening impurities from any number of fruits and vegetables without causing bruising or damage. The unit is designed for both residential and/or commercial use. Its unique design employs a non-electrical, three part system, which consists of a reservoir (4) for holding a continuous stream of water, a sieved basket (16), and a waste outlet.

Abstract: The invention relates to a diffuser for wet processing systems involved in the manufacturing of semiconductor wafers. The diffuser includes a plenum section and a slitted section. Pressurized fluid from the plenum section is forced through the slitted section and across a plurality of wafers mounted in the wet processing system. One advantage is that by “diffusing” pressurized fluid through the slitted section, a generally uniform and/or laminar flow is achieved. Desirably, the diffuser provides a more reliable, and hence more cost-effective, technology for wet processing fabrication of semiconductor wafers.

Abstract: Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor within a process chamber. The process chamber has a horizontal drain opening in its cylindrical wall. The chamber is closed via a door. A process or rinsing liquid is introduced into the chamber. The liquid rises to a level so that the workpieces are immersed in the liquid. The chamber slowly pivots or rotates to move the drain opening down to the level of the liquid. The liquid drains out through the drain opening. The drain opening is kept near the surface of the liquid to drain off liquid at a uniform rate. An organic solvent vapor is introduced above the liquid to help prevent droplets of liquid from remaining on the workpieces as the liquid drains off. The rotor spins the workpieces to help to remove any remaining droplets by centrifugal force.

Abstract: A liquid waste disposal and canister flushing system for a medical canister including a press-fit canister lid, features a cabinet with an opening and a sink with a drain positioned therein. A mounting bracket is affixed to the cabinet and includes a shaft connected to the canister bracket for rotating the canister and a shaft connected to the lid removal bracket for removing the canister lid from the canister. The canister is secured within the canister bracket and is rotated from an initial position to a drainage position. The canister lid is positioned on the removal bracket and is rotated from an initial position to a removal position. Once the canister is rotated into the drainage position, the pressurized and diluted cleaning solution source is activated to flush the contents out of the canister and into the sink and drain. After the canister is sanitized it may be removed from the system and reused.

Abstract: A cleaning apparatus for electric shaver components has a removable basket that fits inside a compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is collected in one compartment of a reservoir. The level of the water in the reservoir is maintained and controlled by the provision of an overflow pipe.