Abstract: Two similar representative versions of an eye glass cleaning machine constructed in accordance with the principles of the invention are seen. In each version an enclosure providing a base having a bowl forming an eye glass cavity supports a pair of eye glasses to be cleaned by means of adjustable clips. In the first version of the invention, a heated cleaning fluid and waste fluid tank and a rinse water tank are filled by a two-way drain valve. In the second version, a heated cleaning fluid tank, a rinse water tank and a waste tank are filled by a three-way drain valve. In both versions of the invention, an electronics card controls the operation of a pump, air pump and a solenoid valve, which determines from which tank (cleaning fluid or rinse water) the fluid supplied to spray nozzles will be taken. The electronics also controls heating elements in the cleaning fluid and rinse water tanks.

Abstract: An improved apparatus for cleansing a semiconductor wafer which is capable of separating an inner tub into an upper and lower portion, for thus adjustably forming the inner tub, so that it is possible to fold the upper portion of the inner tub when cleansing the wafer, for thus reducing the cleansing space, whereby it is possible to reduce the amount of the cleansing liquid and increasing the cleansing effect.

Abstract: A wafer cassette through which a sonic wave is evenly transferred to a substrate in a quartz bath, and a cleaning system adopting the wafer cassette are provided. In the wafer cassette, a hole for evenly transferring the sonic wave to the substrate is formed. The cleaning system includes a vibration plate for generating a sonic wave, placed at the lowest portion of the cleaning system, a sink placed on the vibration plate, a quartz bath placed in the sink and spaced from the bottom of the sink, in which a wafer cassette is placed, a plurality of water supplies for supplying a cleaning solution, placed in the bottom of the quartz bath and a water drain for draining the cleaning solution overflown from the quartz bath, placed on the bottom of the sink, opposite to the water supplies, wherein the vibration plate is placed between the water drain and the water supplies.

Abstract: Disclosed is a filter standpipe for a dishwasher filter and sump unit that prevents loss of circulation pump prime due to filter blockage. The filter standpipe preferably comprises a weir tube that projects upwards from the upper surface of the filter to provide a bypass for wash water trapped on the upper surface of a blocked filter.

Abstract: An improved apparatus for cleansing a semiconductor wafer which is capable of reducing the cleansing space by providing an inner tub made of a shape memory alloy and deforming the shape of the inner tub into the shape of the wafer, for thus reducing the cleansing space. The apparatus includes an outer tub having a supply tube for supplying a cleansing liquid and a discharge tube for discharging the cleansing liquid, an inner tub including an upper portion made of a shape memory alloy and disposed within the outer tub, a temperature control member for controlling the temperature of the cleansing liquid, a baffle plate for controlling the flowing amount of the cleansing liquid supplied to a wafer through the supply tube, a pump disposed in the supply tube for supplying the cleansing liquid into the inner tub, and a filter for filtering the cleansing liquid.

Abstract: Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.

Abstract: An apparatus and a method for removing a liquid from a container having a bowl and a flange, the bowl holding the liquid and containing a hydrophilic ophthalmic lens, wherein there is provided a nozzle with a central face and a shoulder around the periphery of the face. The shoulder has a sealing means which is sized to fit on the flange of the container, where it forms a sealed volume above the container bowl, this volume including the volume of the bowl itself. The central face has through it at least one fluid entrance passage and at least one fluid exit passage arranged so that the flow is distributed substantially symmetric about the center axis of the lens so that when the purging fluid is introduced into the sealed volume, there is no migration of the lens. There is connected to the entrance passage a source of purging fluid that has a pressure and flow sufficient to remove substantially all the liquid through the exit passage.

Abstract: A sample probe wash chamber for cleaning the exterior of a sample probe. The probe wash chamber includes an interior threaded passageway between a wash fluid inlet and outlet. The inlet tangentially opens into an annular chamber formed adjacent one end of the threaded passageway. The outlet opens into a second annular chamber formed adjacent the other end of the threaded passageway and has a vacuum applied to it. The outlet can open perpendicularly into the second annular chamber to remove any moisture from the end of the sample probe positioned at the outlet opening. The probe wash chamber and the sample probe are movable with respect to one another and preferably the probe wash chamber is movable over the sample probe for multiple sample aspiration and cleaning operations.

Abstract: An oscillator screen cleaning apparatus includes an enclosed housing which forms a cleaning chamber having a plurality of spray nozzles positioned therein to spray a printing screen with cleaning solvent. An oscillating mechanism is mounted within the cleaning chamber to move the screen in an oscillating motion in front of the spray nozzles to provide an efficient and effective cleaning of the printing screen. The spray nozzles are arranged in two opposing grid patterns and the screen is oscillated between the grid patterns to provide complete coverage of the screen with spray cleaning solvent. The sprayed solvent is collected, filtered and resprayed onto the screen, and the high spray rate of the apparatus ensures effective cleaning with the re-used solvent. The entire spray system is enclosed within a housing which is coupled to a vapor recovery system so that solvent and solvent vapors do not escape into the environment.

Abstract: An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.

Abstract: Apparatus and method for cleaning/etching the surface of an article with sonic energy in the megahertz range which employ an anti-reflection mechanism within a recirculation tank. A tank having at least one side wall and a bottom structure holds a cleaning/etching liquid and a megasonic transducer is associated with the tank for projecting megasonic energy into the liquid. The anti-reflection mechanism is disposed within the tank in close association with the at least one sidewall or bottom structure of the tank to thereby minimize reflection of megasonic energy from the associated surface. Preferably, the megasonic transducer is associated with a first tank sidewall which opposes a second tank sidewall, and the anti-reflection mechanism is disposed adjacent the second tank sidewall. By way of example, the anti-reflection mechanism can comprise a stream of gas bubbles, a plurality of anechoic structures, or a combination of both gas bubbles and anechoic structures.

Abstract: A parts washer is provided having a cleaning fluid reservoir and a first mechanism provided with structure for performing a first parts washing function utilizing fluid in the cleaning fluid reservoir with the first parts washing function dissipating the cleaning from the reservoir. A second mechanism is provided for performing a second parts washing function utilizing cleaning fluid that increases the volume of cleaning fluid from a supply. A third mechanism is provided for sensing the volume of cleaning fluid in the reservoir and a) enabling operation of the first mechanism and disabling operation of the second mechanism with the cleaning fluid present in the reservoir in a first predetermined volume and b) disabling operation of the first means and enabling operation of the second means with the cleaning fluid present in the reservoir in a second predetermined volume.

Abstract: A parts washer is provided having a reservoir containing a supply of fluid and a first mechanism for pressurizing fluid from the supply and delivering the pressurized fluid to against a part to be washed with the first mechanism including an inlet for fluid from the reservoir which is at least partially immersed in reservoir fluid so that there is a predetermined fluid pressure at the inlet due to the depth of the fluid. Structure is provided for increasing the pressure of fluid at the inlet without changing fluid depth at the inlet.

Abstract: An improved cleaning apparatus preventing new cleaning chemicals form contamination at the time of exchanging used cleaning chemicals with the new chemicals is provided. The apparatus includes a cleaning chemicals tank storing new chemicals and a cleaning vessel. A first cleaning chemicals supply conduit supplying new chemicals from tank into vessel is coupled to cleaning chemicals tank. A waste fluid conduit externally discharging used cleaning chemicals is provided at the bottom of vessel. Vessel is provided with wetting agent supply means supplying a wetting agent to wet the inner wall surface 8a of vessel.

Abstract: A cleaning apparatus for removing oily waste from articles which includes two tanks located in proximity, preferably in side-by-side relationship, to one another. The upper edge of one end of these tanks is provided with an overflow that causes the light surface fraction of the liquid in the cleaning tank to flow out of the cleaning tank and onto the surface of the liquid in the separating tank. The bottom edge of the opposite end of the separating tank is provided with an outlet through which the dense bottom fraction of the liquid in the separating tank may be withdrawn and pumped back into the cleaning tank. The effect of this top/bottom relationship between outlets and inlets is to establish a density gradient which favors the migration of oily waste from the cleaning tank to the separating tank.

Abstract: A washing apparatus capable of easily performing washing work of varied types for electronic parts, mechanical parts and medical supplies. In an external bath(1), a vertically movable table(10) for articles to be washed is provided and a covering member(13) is disposed upwardly of the table(10). The articles to be cleaned are tightly sealed by the covering member(13), whereby a washing chamber(14) is formed in the external bath(1). Since the washing chamber(14) is tightly sealed by the covering member(13), incombustible gas is filled up in the external bath(1) when a combustible solvent is used, thus preventing ignition. When vapor washing is performed, the washing can be performed with low energy by use of a heating device provided in the external bath(1). Washing solutions of different types can be used in the external bath(1) and the washing chamber(14).

Abstract: Disclosed herein is a washing apparatus comprising a washing chamber, an opening/closing mechanism, and a nozzle. The chamber has an opening and is designed for washing the objects transported from outside through the opening. The opening/closing mechanism is designed to open and close the opening of the washing chamber. The nozzle is used to wash the opening/closing mechanism. The apparatus further comprises a washing vessel filled with a washing liquid, for washing the objects, and also a nozzle for applying a washing liquid to the objects located in the washing vessel when the objects are partly exposed as the washing liquid is discharged from the washing vessel.

Abstract: An artist's brush washing apparatus providing multiple washings of an artist's brush utilizing fresh solvent and facilities for holding contaminated solvent. A top unit includes a washing basin which receives fresh solvent from a solvent reservoir assembly. The top unit overlies a holding pan and a solvent flushing assembly provides for the control and removal of contaminated solvent from the washing basin into the pan and the introduction of fresh solvent into the washing basin from the solvent reservoir assembly.

Abstract: Apparatus for the cleaning of the elongated downwardly extending pendants of a chandelier in situ by ultrasonic cavitation. The pendants are arranged in a plurality of parallel rows and columns of pendants in a rectangular-shaped pattern. The ultrasonic cleaning apparatus has a rectangular-shaped top member open at both ends detachably connected to a rectangular-shaped base member open at the top end. The open top end of the top member can be of different dimensions than the bottom end of the top member, allowing a plurality of pendants in a single row or column of pendants only to be cleaned at one time. Other detachable top members can be provided allowing for the cleaning of a plurality of pendants in a plurality of rows and columns to be cleaned at one time.

Abstract: A device for surface treating of parts which includes a base frame with an elongated channel thereon. The channel includes a first end wall at a first end of the channel and a second wall which defines a crosswise extending dam at a second end of the channel remote from the first end, the dam including an inclined ramp extending from the lowest part of a bottom wall to a top of the dam. A drive device is provided for vibrating the channel to cause parts to travel from the first end wall toward the dam whereby the parts rise to a sufficient level in advance of clearance of the dam. A fluid delivery device is provided for spraying a treatment solution toward either the bottom wall or the inclined ramp. A fluid outlet drain is provided for draining the treatment solution introduced into the channel by the fluid delivery device from the channel, the fluid outlet opening into the channel solely through the aforesaid first end wall.

Abstract: An equipment container is disclosed with a lid for closing off an interior space thereof and having a body member with a space therein for containing items and with a fluid inlet and fluid outlet so that a fluid may be transmitted through the container to clean, wash, rinse or flush the container's interior and/or items(s) therein. Item separator(s) may be provided to maintain distance between items. A drain protector may be used to inhibit clogging or restriction of drain outlet(s). One or more dry compartments through which fluid does not flow may also be provided. A perforated removable compartment disposable in the container may also be provided. In one aspect the container is made of hard solid wall members. In another aspect the container is made of durable fabric and may have an interior equipment containment liner or bladder which communicates with fluid inlet(s) and outlet(s). Such a bladder or liner may be used with a hard-sided container.

Abstract: A centrifugal type, enclosed cleaning apparatus including a housing to hold the parts thereof, a washing container fastened in a hole on the housing, a lifting unit on the housing at the top, a stirrer unit having a base coupled to the lifting arm of the lifting unit and a material carrier with a shaft received inside the washing container and coupled to the transmission shaft of a power device and driven to turn within the washing container in causing a centrifugal effect, a cleaning unit consisted of a chemical pre-wash trough, a chemical trough, an inert air supply pipe assembly, an air compressing pipe assembly, a water trough, a water spray pipe assembly, and a separating trough, a drying unit, and a programmable control unit to control the operation of the lifting unit, the stirrer unit, the cleaning unit, and the drying unit in cleaning the products placed in the material carrier.

Abstract: Apparatus is provided for cleaning industrial apparel such as wire mesh safety gloves used in processing meats such as chickens. The apparatus employs a containment chamber within which a conveyor carries the gloves which are mounted upon substantially elevated glove mounts. Within the chamber, high pressure nozzles are rotated to express hot chlorinated water upon the gloves over a residence interval of about one minute. The apparatus employs parallel inputs of hot and cold water, the latter being chlorinated within a range of about 150 to 200 ppm. Cleanability is enhanced through the utilization of facilely removed light weight flat front and side doors and a pivoting forward deck assembly. Bacteria-promoting pockets and the like are minimized through the utilization of sanitary welds and O-ring mounted polymeric bearing blocks.

Abstract: Cleaning methods and apparatus for removing particulate materials from the surfaces of objects are disclosed. Megasonic vibrations are utilized to cause a liquid cleaning fluid in a first reservoir to rise above the upper end of the first reservoir, contact the surface of the object to be cleaned and flow over a weir at the upper end of the first reservoir into a second reservoir. The methods and apparatus are useful to remove small particles, e.g. having a particle size of less than about 1 micron, from flat or curved planar surfaces. The methods and apparatus can be integrated with subsequent processing steps, e.g. applying thin film coatings, without intermediate handling of the objects.

Abstract: A power spray washing machine includes an enclosed wash cabinet positioned above a wash holding tank and a rinse holding tank. Openings are provided through a floor of the wash cabinet directly into the wash and rinse tanks, respectively. Vertical plug valves are associated with each opening to open and close the openings and control the flow of fluids therethrough. Each valve includes a first valve head moveable between a closed position in direct contact with and closing the opening and an open position out of contact with and uncovering the opening. The valve heads retain no fluid between the floor of the wash cabinet and the holding tanks when the valve head is in the closed position. By this arrangement, cross contamination of solutions between the wash and rinse holding tanks is minimized or eliminated.

Abstract: A drain system for adapting the drain/extraction plumbing of a front-loading washing machine which includes an agitator drum mounted for rotation about a generally horizontal axis, means for driving the drum in rotation about the axis during the various cycles of the machine, and a drain pipe extending downward from the agitator drum and disposed to convey a water/suds mixture vacated from the agitator drum away from the drum. The system includes a conduit into which the water/suds mixture is conveyed from the drain pipe. The conduit is oriented generally horizontally with a first end of the conduit intersecting, and being in fluid communication with, the distal end of the drain pipe. The water/suds mixture, as it is channeled through the conduit, separates into a water component and a suds component floating on the water component. The system includes a water scavenger line and a suds duct, both of which diverge and extend from the second end of the conduit.

Abstract: A dishwasher tub includes a bottom wall having a sump basin formed therein for containing a reservoir of washing fluid. The sump basin has an upper rim having a rear portion spaced inwardly from the rear edge of the bottom wall, opposite side portions spaced inwardly from the opposite side edges of the bottom wall, and a front portion spaced inwardly from the front edge of the bottom wall. The rim of the sump forms two spaced apart leg portions of the basin which extend forwardly into close proximity to the front spaced apart corners of the front wall of the tub. In addition to the sump basin, the bottom wall includes front, rear, and opposite side margins sloping upwardly from the rim of the sump basin to the rear, side, and front walls of the dishwasher tub. The resulting sump basin has a horseshoe-shaped configuration.

Abstract: A washing apparatus for washing a probe which is transferred substantially horizontally in a plane during a washing process includes a washing body having a wall structure defining an inner hollow portion, a feed water unit provided for the wall structure of the washing body for feeding water in the inner hollow portion, slits formed in the wall structure of the washing body so as to communicate with the inner hollow portion of the washing body, and at least a first waterway channel having one end connected to a bottom portion of at least one of the slits and a second, free end, wherein the waterway channel is disposed on a level substantially corresponding to a transfer route of a tip of the probe and has a shape so as to substantially correspond with the transfer route of the probe.

Abstract: A dipping type wafer treatment apparatus includes a treatment solution bath capable of forming a uniform rising flow of a treatment solution inside from an inlet to an outlet, a treatment solution supplying unit for supplying a treatment solution at a constant velocity to the inlet of the treatment solution bath to form a uniform rising flow of the treatment solution inside the treatment solution bath and a device for dipping and retrieving the wafer into and out of the uniform flow of the treatment solution. The treatment solution is supplied from the inlet in the treatment solution bath and drown off through an outlet of the treatment solution bath. Accordingly, the treatment solution can be rapidly substituted, and the wafers to no experience contact with air during replacement of the treatment solutions.

Abstract: A dishwasher whose drying system works by condensation, having a washtub (3) in heat-exchange contact with a duct (8) that may be closed by a non-return valve and having a fan (14) suitable for causing a flow of cooling air to circulate. The dishwasher also includes a circulation pump (4) and a discharge pump (5), whose rotors are connected to the driveshaft (6) of a reversible motor (7), to pump water to their corresponding force ducts when the shaft is rotating in one direction or the other, respectively. The valve plug (15) is pneumatically switchable by the fan (14) between a closed position and an open position of the duct (8) when the shaft (6) rotates in one direction or the other, so that the flow of air circulates only when the discharge pump (5) is operating.

Abstract: A wafer surface treatment apparatus and method used in the apparatus including a treatment tank with a cylindrical inside with a bottom, a circular recess formed in the bottom of the tank, a plurality of lower fluid holes opened in the recess, and a horizontally long opening provided at lower part of the side wall of the tank. A movable wall is tightly but slidably installed in the cylindrical inside of the tank so that the movable wall forms a closed room with the recess when it comes into contact with the bottom of the tank. Also, a plurality of upper fluid holes are provided so as to communicate with the closed room, and a rinsing water and washing liquid supply/discharge device is connected to the upper and lower fluid holes.

Abstract: A cleaning device comprises a cleaning tub, holding means for holding a plurality of objects substantially vertically at regular intervals, cleaning solution supplying means for supplying a cleaning solution to the cleaning tub through the bottom thereof, and distributing means for uniformly distributing the cleaning solution to the objects.

Abstract: A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

Abstract: A dip washing machine for machined parts including transfer bar for the parts and at least one washing station in which the part is dipped in a bath of washing liquid. The bath is formed by a generally cubical casing, the surfaces of which are formed by a side wall and a bottom, attached to the machine frame, and by a complementary shell including a front surface, a rear surface, a side surface and a top wall. The bottom is provided with an aperture for the passage of the transfer bars and the side surface is provided with a port for the quick filling of the bath. The shell moves upwardly and downwardly, so that it alternately opens and closes the port and the bath, at the same time as it allows for the loading and discharging of the parts.

Abstract: A probe washing vessel for sucking in and dispensing blood plasma, blood cells, blood serum, or body fluid and the like comprises a washing reservoir, a washing chamber in a form of a hole which formed in the washing reservoir and in which a probe is inserted, and a bypass flow path formed in the washing reservoir and having one end communicating with the washing chamber and the other end opened to the atmosphere.

Abstract: A wafer processing apparatus including a head defining an etching chamber, the sidewall of the head being slidable along the base so that the sidewall and base will normally define an etch chamber; and the sidewall may be moved upwardly to open a discharge passage for rinsing water, and a deflecting surface for deflecting the rinsing water downwardly and draining the rinsing water from the passage. The housing is separable above the deflector ring to provide access to the wafer for inserting the wafer and replacing it.

Abstract: A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

Abstract: A fluid cup is provided for use with a cup support having a cup-receiving receptacle and a drain. The cup is adapted for use with a pipette probe which may introduce contaminants into the fluid, for example a dilutant fluid, in the cup. The cup has a lower cup portion and a cap, with a notch or other overflow element being provided near the top of the lower cup portion. Diluent fluid is introduced near the bottom of the lower cup portion after each probe entry, creating a fluid flow pattern which flushes any contaminant from the cup through the notch without requiring the use of a large fluid volume.

Abstract: Rinser dryer system for rising process chemical from silicon or gallium arsenide wafers, substrates, masks or disks and drying of silicon or gallium arsenide wafers, substrates, masks or disks positioned in a wafer cassette. A wafer cassette is positioned in a rotor assembly and the rotor assembly positioned within a removable heated chamber bowl. The wafer cassette rotates past rising and drying manifold nozzles. The removable chamber bowl is secured to a rinser mounting plate by quick disconnect hardware for removal and for external cleansing. A broken chip collector in a lower portion of an exhaust manifold assembly removes small broken chip remains. An acidity sensor is positioned in a bottom portion of the exhaust manifold assembly for monitoring rinse effluent during the rising process. A gated exhaust valve in an exhaust gas manifold of the exhaust manifold assembly provides for gases to exhaust to an external location.

Abstract: An automatic analyzing apparatus includes a drainage line for conveying a reaction liquid which has been subjected to an analysis and water used to clean a reaction vessel from the reaction vessel to a waste liquid reservoir. The drainage line includes a vacuum tank, a vacuum pump for sucking a gas separated from a liquid within the vacuum tank and containing suspended particles, and a filter for filtering the gas discharged from the vacuum pump and thereby preventing discharge of an infectious aerosol from the apparatus. The waste liquid reservoir is provided with a sterilizing liquid supply bottle for supplying a sterilizer or a disinfectant into the reservoir.

Abstract: This invention relates to an apparatus that provides, in combination, a multi-spray counterflow rinse system that is interconnected to a plating barrel which includes an internal spray nozzle so as to spray rinse a multiplicity of chemically treated workpieces which are supported within the plating barrel. The plating barrel is rotatably carried by a superstructure from one process station to another so as to be positioned within a single in-line rinse tank that is employed during the steps of an electroplating process. The invention includes two embodiments of a self-aligning coupling device defined by first and second coupling members that are interposed in a rinse-solution supply line. One coupling member is secured to the superstructure and the other coupling member is mounted to the rinse tank, whereby the two coupling members are coupled together as the superstructure and barrel are lowered into the rinse tank for the rinsing process.

Abstract: A liquid level control arrangement for a dishwasher. The dishwasher comprises a tub (10) on which dishes are to be placed and in which liquid is to be circulated by means of a circulation pump (27). The circulation pump (27) communicates via a tube-shaped connection (26) with an inlet (25) which is placed in the lower part of a chamber (23) situated at the bottom of the tub. The chamber is at least partly separated from the tub by means of a filter (20) or the like, and also comprises a heating source (31) for warming the liquid. The connection (26), in addition to said inlet (25), has an opening (32) which at least partly is placed above or at the same level as the heat-emitting parts of the heating source (31). The opening (32) has a shape and size such that the surface thereof exposed to the chamber increases when the liquid level in the chamber sinks.

Abstract: With a cleaning device that uses high-voltage discharges in liquids, it is possible to safely clean even clusters of precision castings if a tubular processing chamber serves as shock wave reflector and the position of the component and of the electrode are variable. Casting elements encrusted both with thin ceramic layers and with more ductile deposits are safely cleaned after they are lowered into the tubular chamber with sealable apertures on both sides, and after shock waves have been generated via the electrode positioned in the chamber. The tubular configuration of the chamber, which is preferably positioned endwise, makes it possible in particular to utilize the reflection waves to clean the individual components. By way of a hoist, the component configured as a cluster as well as any other configured component is passed by the electrode, turned, and if necessary swivelled in order to thus ensure a uniform and rapid cleaning.

Abstract: A soil separator for a dishwasher is provided in which the recirculating wash liquid flow through the dishwasher is divided into two flow streams and the soil separator is positioned in one of the flow streams. A screen blocks passage of large soil particles and directs then into the flow stream leading to the soil separator. An elevated dam in the soil separator blocks passage of lighter-than-water particles and a weir blocks passage of heavier-than-water particles. A V-shaped notch in the weir permits flow from the soil separator to rejoin the other flow stream.

Abstract: Rinser dryer system for rising process chemical from silicon or gallium arsenide wafers, substrates, masks or disks and drying of silicon or gallium arsenide wafers, substrates, masks or disks positioned in a wafer cassette. A wafer cassette is positioned in a rotor assembly and the rotor assembly positioned within a removable heated chamber bowl. The wafer cassette rotates past rising and drying manifold nozzles. The removable chamber bowl is secured to a rinser dryer mounting plate by quick disconnect hardware for removal and for external cleansing. A broken chip collector in a lower portion of an exhaust manifold assembly removes small broken chip remains. An acidity sensor is positioned in a bottom portion of the exhaust manifold assembly for monitoring rinse effluent during the rising process. A gated exhaust valve in an exhaust gas manifold of the exhaust manifold assembly provides for gases to exhaust to an external location.

Abstract: An apparatus for cleaning disks includes an enclosed housing with an operable door therein adapted to permit access to the interior of the housing. A rack is removably mounted within the housing, and will retain a plurality of disks in parallel spaced-apart relation within a disk-retaining cradle within the housing. The disk-retaining cradle is operably mounted so as to rotate about an axis passing through the centers of all of the disks. A spray bar projects within the housing and through all of the central openings in each of the disks, and has a plurality of spray nozzles therein to spray fluid radially outwardly therefrom to cover all of the disks, as they rotate in the cradle. A method for cleaning disks includes the initial step of providing a housing with an operable door and a cradle therein adapted to rotate a plurality of disks. The disks to be cleaned are then loaded in a rack which retains the disks in parallel spaced-apart orientation, which is loaded in the cradle within the housing.

Abstract: The present invention is directed to an improved cleaner for a paint roller in which the cleaner includes a container with an opening for receiving a paint roller and a groove in the side wall thereof for releasably mounting the frame of the paint roller to the container, whereupon the roller is in a fixed location to be struck by water streams from a manifold within the interior of the body. The manifold is connected to a handle outside the container, and the handle is pivotally mounted so that the manifold can rotate through a limited arc to change the angle of impingement of the water streams from the manifold onto the paint roller to be cleaned. The handle of the container body has a serrated structure for releasably locking the handle to the body with a manifold in any one of a number of positions.

Abstract: Rinser dryer system for rinsing process chemical from silicon or gallium arsenide wafers, substrates, masks or disks and drying os silicon or gallium arsenide wafers, substrate, masks or disks positioned in a wafer cassette. A wafer cassette is positioned in a rotor assembly and the rotor assembly positioned within a removable heated chamber bowl. The wafer cassette rotates past rinsing and drying manifold nozzles. The removable chamber bowl is secured to a rinser dryer mounting plate by quick disconnect hardware for removal and for external cleansing. A broken chip collector in a lower portion of an exhaust manifold assembly removes small broken chip remains. An acidity sensor is positioned in a bottom portion of the exhaust manifold assembly for monitoring rinse effluent during the rinsing process. A gated exhaust valve in an exhaust gas manifold of the exhaust manifold assembly provides for gases to exhaust to an external location.

Abstract: Apparatus suitable for processing semiconductor slices, comprises a tank (1) for receiving a jig carrying semiconductor slices, a first supply line (2) for supplying a processing liquid to the tank (1), a supply valve (3) for controlling liquid supply through the first supply line (2), the supply valve (3) being operable in response to changes in fluid pressure at a control port (4) of the supply valve (3) and a second supply line (5) for supplying fluid to the control port (4) to control operation of the supply valve (3). The second supply line (5) communicates with an inlet (8) of the tank (1) via a control valve (7) which is operable in response to changes within the tank to control the fluid pressure at the control port (4) and so control operation of the supply valve (3).In the arrangement shown in FIG. 1, a valve member (7a) of the valve (7) is carried by a platform (9) pivotally mounted within the tank (1).

Abstract: A device is disclosed for etching silicon wafers, with a support (1) for the silicon wafers, an annular nozzle (8) being provided in the surface (9, 10) of this support that faces the silicon wafer (11), the nozzle being chargeable with compressed gas for the formation of a gas cushion between the support (1) and the silicon wafer (11), the gas exiting between the wafer (11) and the support (1) preventing passage of treatment fluid onto the underside of the wafer (11). The support (1) is located within the interior (21) of an annular tank (20) wherein at least two annular ducts (25, 26, 27) are provided which are open toward the interior (21) of this tank. Furthermore, means are included for lifting and for lowering the support (1) with respect to the tank (20) and for setting the support (1) into rotation about its axis (14) which latter is congruent with the central axis of the tank (20).