Abstract: An industrial parts washer includes a stand adapted to support a part, a chamber selectively movable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is positioned within the chamber to supply pressurized fluid for cleaning the part. The industrial parts washer may include a washing station positioned adjacent a drying station where each of the washing and drying stations include chambers selectively movable to enclose the part.

Abstract: A warewash machine includes a housing at least in part defining a washing chamber having an access opening and a door mounted for movement between a closed position for washing and an open position for inlet/outlet of wares through the access opening. At least one nozzle is included for emitting liquid into the washing chamber. A table is connected to the machine for movement between a load/unload position and a storage position.

Abstract: The present invention generally relates to a cleaning agent for a spray gun and a method and apparatus for cleaning the spray gun, and more specifically, to the agent and method of use thereof for cleaning a water-based spray gun using a novel cleaning agent comprising a solvent of n-butanol, a solvent of n-propanol, a surfactant of ethoxylated nonylphenol, and water. The cleaning agent may also be used under specific pH conditions and an emulsifier or a foam suppressor may be used. What is also contemplated is the use of a spray gun having smooth interior and exterior surfaces. The method contemplates the contacting of the cleaning agent with the spray gun, the recovering of the cleaning agent, the separating of the cleaning agent and the reuse of the cleaning agent. What is also contemplated is the use of the cleaning agent in an automatic washing apparatus and the use of the cleaning agent as part of a fluid supply to an automated spray gun to clean the spray gun access.

Abstract: An industrial parts washer includes a stand adapted to support a part, a chamber selectively moveable from a first position clear of the part to a second position engaging the stand where the chamber forms a closed volume encapsulating the part. A nozzle is positioned within the chamber to supply pressurized fluid for cleaning the part. The industrial parts washer may include a washing station positioned adjacent a drying station where each of the washing and drying stations include chambers selectively moveable to enclose the part.

Abstract: A dishwasher includes a frontal frame, a tub having a plurality of walls collectively define a washing chamber, and a door pivotally mounted to the frontal frame for sealing the washing chamber. During a washing operation, sound generated by operation of a mechanical pump escapes from below the dishwasher. To minimize sound from escaping and to provide a more enjoyable environment, a sound sealing system is mounted at a bottom portion of the dishwasher door. The sound seal system includes a sound tray that extends across the frontal frame below a bottom edge portion of the door. The sound tray can be directly, pivotally attached to the door, or an additional flexible seal is employed to span and seal a gap between the sound tray and the bottom portion of the door.

Abstract: The invention relates to a dishwasher with a spray manifold fixedly mounted to one of the walls and having multiple circular nozzles, each circular nozzle having multiple openings configured to direct a spray of wash liquid laterally to provide a first wash zone.

Abstract: A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in order to perform a liquid process. The nozzles 54, 56 are respectively equipped with a plurality of ejecting orifices 53, 55 capable of ejecting the processing liquid in a plane manner, allowing the substrates W to be processed uniformly and effectively.

Abstract: The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion.

Abstract: A washing machine including a casing provided with an opening for introducing laundry into the washing machine; a tub supportably installed in the casing; a drum rotatably located in the tub; driving means for rotating the drum; and a door installed at the casing for opening and closing the opening of the casing, and provided with air suction ports for drawing external air into the drum. The washing machine dries a small quantity of the laundry without application of any additional drying pipe or heater.

Abstract: An apparatus is disclosed for performing high-pressure processing of a workpiece having a top face and a bottom face. The apparatus comprises a processing chamber and a holder for securing the workpiece within the processing chamber so that a substantial portion of the top face and a substantial portion of the bottom face is exposed to a processing material introduced into the processing chamber. In one embodiment, the holder comprises an upper segment and a lower segment. The lower segment contacts the workpiece at or near an edge of the workpiece, thus supporting the workpiece in a first vertical direction and securing it in a horizontal plane. The upper segment contacts the workpiece at or near an edge of the workpiece, securing it in a second vertical direction.

Abstract: A dishwasher includes a main body having an open front, a washer tub being extracted from and retracted into the main body through the open front, the washer tub having an open top, a lid for closing the open top of the washer tub when the washer tub is fully retracted to be accommodated in the main body, and an extension member extending backward from a top rear portion of the washer tub. When the washer tub is fully extracted from the main body, a rear end of an inner wall of the washer tub is located in front of a front end of the main body and a free end of the extension member is placed under the lid.

Abstract: An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.

Abstract: A dishwasher includes a wash and rinse system that operates to dislodge soil particles that adhere to internal surfaces of a washing chamber. During wash and rinse cycles, the washing chamber is initially filled to a first level with washing fluid. The washing fluid is drawn into a wash system through operation of a pump, that causes the washing fluid in the washing chamber to fall to a second level, and directed to a spray arm that sprays jets of washing fluid onto the kitchenware. Thereafter, the wash system enters a pause period during which the washing fluid is caused to return to the first level in the washing chamber to loosen particles from walls of the chamber. After the pause period, the trajectory of the jets of washing fluid is varied to further clean the kitchenware and the internal surfaces of the washing chamber.

Abstract: An apparatus for monitoring a cleaning process for a medical device includes a cleaning chamber for receiving and cleaning the instrument with a cleaning liquid, a receiving well within the cleaning chamber, a removable soil standard receivable within the receiving well whereby to be exposed to the cleaning process within the cleaning chamber; and a soil detector coupled to the cleaning chamber and adapted to provide an indication of the amount of the soil on the soil standard while the soil standard is received within the receiving well.

Abstract: The present invention is a method, apparatus and process for an improved substrate mounting and processing technique for various substrate treatments comprising cleaning, dicing, sawing, polishing, and planarization, among others.

Abstract: A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a seal energizer. The seal energizer is configured to maintain the upper element against the lower element to maintain a processing volume. The seal energizer is further configured to generate a sealing pressure in a seal-energizing cavity that varies non-linearly with a processing pressure generated within the processing volume. In one embodiment, the seal energizer is configured to minimize a non-negative net force against one of the upper element and the lower element above a threshold value. The net force follows the equation P2*A2?P1*A1, where P2 equals the sealing pressure, P1 equals the processing pressure, A2 equals a cross-sectional area of the seal-energizing cavity, and A1 equals a cross-sectional area of the processing volume.

Abstract: A dishwasher includes a main body being generally of a box shape with an open front, a washer tub being slidably extracted from and retracted into the main body through the open front, the washer tub having an open top, and a covering member for blocking a gap to be opened between the washer tub and the main body when the washer tub is fully extracted from the main body. Therefore, when the washer tub is fully extracted from the main body, a rear end of an inner wall of the washer tub is located in front of a front end of the main body to open the gap and the opened gap is covered by the covering member.

Abstract: A cleansing apparatus comprising: a table 3 for supporting a semiconductor substrate 30 horizontally; a high frequency solution injector 20 capable of injecting a solution to the upper surface 30a and the side surface 30c of the semiconductor substrate 30 supported by the table 3 with the application of vibration at high frequency; a cover 2 capable of tightly enclosing the semiconductor substrate 30 supported by the table 3; and pressure reducing means 18 for reducing the pressure in a space, in which the semiconductor substrate 30 is enclosed with the cover 2. The semiconductor substrate can be cleansed efficiently at a low cost and kept in clean state after the cleansing until it is dried.

Abstract: In a dishwasher having a washing chamber capable of accommodating upper and lower racks, a detergent dispensing assembly includes a housing defining a compartment for receiving detergent. A lid is pivotally connected to the housing for selectively pivoting between closed and dispensing positions. A shield, which is spaced away from the lid, extends in front of the lid to ensure that an object within the washing chamber does not prevent the lid from freely moving between the closed and dispensing positions during a wash cycle.

Abstract: A dishwasher includes a cabinet having arranged therein a central cavity. Slidably supported within the second cavity are first and second dish support rack systems. The first dish support rack system is defined by first and second upper dish support racks with the first upper dish support rack having a first width and the second dish support rack having a second width, substantially smaller than the first width. The second dish support rack system includes first and second lower dish support racks, each being substantially similar in construction to the first and second upper dish support racks. The dishwasher includes a first wash zone defined by the first upper and lower racks and a second wash zone defined by the second upper and lower racks. A control can selectively direct pressurized wash water through an associated spray arm member to the first and second wash zones either singly or collectively.

Abstract: An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to particulate contamination present on the wafer surface. Energy imparted to particulate contamination via the high-frequency acoustic energy and supercritical fluid is used to dislodge and remove the particulate contamination from the wafer. Additionally, the wafer cleaning process benefits from the supercritical fluid properties of near zero surface tension, high diffusivity, high density, and chemical mixing capability.

Abstract: An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an acoustically induced cavitation in a liquid contained within a wafer cleaning apparatus, wherein the cavitation is defined by an amount and a size of gas bubbles. An increase in a pressure within the wafer cleaning apparatus results in a suppression of the cavitation. Conversely, a decrease in the pressure within the wafer cleaning apparatus results in an enhancement of the cavitation. Thus, independent control of the cavitation is provided without regard to the acoustic energy or a chemistry of the liquid. Controlling the cavitation allows for a safe and efficient wafer cleaning operation that can be customized to address specific requirements dictated by a particular wafer configuration.

Abstract: A dishwasher (200) is dislosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to the cavity. Also disclosed are a number of embodiments relating to mechanisms for closing the lid (217) on the retractable drawer wash system and various methods for sealing the lid onto the wash drawer.

Abstract: An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around a common pivot axis. A linear mechanical actuator controls the blade movement, moving the top-most blade, which in turn, moves an adjacent lower blade. Each upper blade is interconnected to an adjacent lower blade by upper and lower ledges, a pivot boss and interlocking cut, and a curved ledge on each blade's body surface. The interconnecting features allow the blades to move one another out for extension or in for retraction. The interlocking blades are inclined above one another, forming grooves to redirect the rinse water away from the chemical bath.

Abstract: A dish rack includes a base rack of a wire framework and at least one rack side element that is releasably connected to the base rack and, as seen by a user who is loading the dish rack with items which are to be washed, is fitted laterally thereto. A cutlery-accommodating device is integrated in the rack side element to produce an integral dish rack the allows, on one hand, the straightforward construction of the base rack—preferably in the form of a U—and, on the other hand, the releasable fastening of the rack side element to an integrated cutlery-accommodating device.

Abstract: A particle capture system includes a container sized to receive a structural disc drive component. A fixture is able to maintain the disc drive component within a spray zone in the container, and a first nozzle in the container is connected to a fluid source and is oriented to direct fluid at the spray zone. A particle trap is connected to a fluid outlet of the container and is able to trap particles from fluid exiting the container through the fluid outlet.

Abstract: A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.

Abstract: A dish-cleaning appliance comprising a sink defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. The lid is mounted to the sink and is movable to selectively cover the open top of the bowl. A latch is provided to hold the lid in the closed position. The latch comprises a catch and a strike, with the strike having an integrated handle resulting in a small form factor.

Abstract: The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.

Abstract: The present invention relates to a multipurpose system for the automatic washing and drying of industrial containers and appliances, in controlled environmental conditions.

Abstract: A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a sealing means that tightly holds the lower element to the upper element to define a processing volume that is maintained using the minimum pressure necessary. The processing chamber comprises a plate having a first face that forms the processing volume and a second, opposing face that forms a seal-energizing cavity. In one embodiment, a surface area of the first face is smaller than a surface area of the second face. When the same pressure is applied against both the first face and the second face, the force on the second face is greater than the force on the first face, resulting in a sealing force exceeding a processing force generated within the processing volume.

Abstract: A method for detecting the energy and water consumption of dishwashers, whereby an energy/water consumption rating can be optimized for dishwashers. The amount of energy and water required to operate dishwashers containing at least two separate washing systems, each having a separate closable washing container, is detected separately for each washing system, and the energy/water consumption is rated on the basis of the amount of energy and water detected for each washing system. A dishwasher preferably is provided with at least two separate washing systems, each having a separate closable washing container, in which the energy and water consumption is detected and rated according to the method in order to optimize the energy/water consumption rating.

Abstract: A movement reversal device is used in a dishwasher. The dishwasher has a washing receptacle and a hydraulic assembly provided with at least two spraying devices impinging upon goods to be washed with a fluid transported via a circulating pump. The transported fluid flows through the movement reversal device that contains at least two outlets for feeding different spraying devices. The outlets are opened or closed by a positioning element such that one or several or all outlets are open or closed one after another and/or continuously. In order to better influence the course of the wash cycle and to obtain an optimal washing effect corresponding to the degree of dirtiness of the goods to be washed, the characteristics of the hydraulic assembly and the characteristics of the circulating pump are simultaneously or alternately changed by the movement reversal device.

Abstract: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid onto the dish rack to effect the cleaning of any dishes along the rack. The lid is mounted to the sink and is movable to selectively cover the open top of the bowl. The lid includes a sound absorber and a sound dampener for reducing the transfer of sound from the wash chamber through the lid.

Abstract: An improved dishwasher is provided with a lower rack, a middle rack, and an upper rack. Each rack has a spray arm associated therewith. A fourth spray arm may also be provided for enhanced cleaning of objects in the racks. The lower rack is a low profile tineless rack for holding flat and shallow objects. The middle and upper racks have bottom portions sloping in opposite directions so as to accommodate larger items, such as dinner plates, in each rack. The middle and upper racks are independently vertically adjustable with respect to one another.

Abstract: Apparatus for pressure processing components is disclosed which includes an improved closure system that minimizes dust-generating parts and allows easy access to the chamber. Ports are provided for introducing and releasing pressurized gases and fluids to and from the processing space. The heating system of the apparatus heats both the cover and the stage inside the pressurized chamber such that cycle time to equilibrate heated, pressurized fluids such as supercritical carbon dioxide inside the chamber are decreased. The apparatus includes a mechanism that raises the stage inside the chamber, pressing it against the fixed cover and sealing the inside of the pressure vessel. In one embodiment a screw-type jack is used to move the component-loaded stage fitted with a deformable o-ring seal a short travel distance to seat against the lid and seal the pressure chamber. In a related embodiment a computer and an electronic stepper motor are used to drive the pressing means in an automated fashion.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: The dishwashing machine has at least two washing vessels (10–12) that are separated from each other and are part of a structural assembly (3) that is capable of being pulled out as a whole from a casing (1) in which it is housed. Each such washing vessel (10–12) has at least a loading lid or door (17) that can be opened when the structural assembly (3) is in its pulled-out position.

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract: A gas-heated dishwasher includes a gas burner for heating the rinsing liquid and drying dishes, which is suitable for drying dishes and heating the rinsing liquid in an efficient way, while, at the same time, making it possible for a worktop to be placed on top of the dishwasher, the gas burner is embodied and disposed in the motor chamber so that it heats at least one closed tubular heating body filled with a fluid during a sub-program dry section and heats the rinsing fluid during the sub-program sections when the rinsing fluid is used.

Abstract: The present invention relates to a loading system in a washing installation comprising a plurality of dishwashers arranged essentially in parallel. The loading system comprises a dish holder to be loaded with goods to be washed, and a traveller which is adapted to convey the dish holder to a selected dishwasher, into which loading is to take place, the traveller being displaceably arranged along the dishwashers arranged in parallel. The invention also relates to a washing installation and a method therefor. The installation comprises a plurality of essentially parallel dishwashers of a straight-way type, which are essentially built into a separating wall portion to form an inlet side and an outlet side. The installation has two mutually independent loading systems for loading of goods to be washed on the inlet side and unloading of washed goods on the outlet side.

Abstract: Device for linking a door to a case in a drum type washing machine including a bracket having one end to be inserted in a pass through hole formed in the vicinity of the laundry opening in a washing machine case, and the other end fixed to an outside wall of the case, and a foldable link member having a first link rotatably fitted to the one end of the bracket, a second link exposed to an outside through the pass through hole and rotatably fitted to the door, and a hinge connecting the first link and the second link, thereby permitting an easy assembly, and improving convenience of a user.

Abstract: A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.

Abstract: The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.

Abstract: A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplying unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.

Abstract: A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed. The semiconductor substrate with the photoresist or the photoresist residue on a surface of the semiconductor substrate is placed within a pressure chamber. The pressure chamber is then pressurized. Supercritical carbon dioxide and a stripper chemical are introduced to the pressure chamber. The supercritical carbon dioxide and the stripper chemical are maintained in contact with the photoresist or the photoresist residue until the photoresist or the photoresist residue is removed from the semiconductor substrate. The pressure chamber is then flushed and vented.

Abstract: A megasonic module for substrate processing is provided. Embodiments of the present invention include a tank configured to hold processing fluids in which the substrate is submerged, and a lid configured to mate with and seal the tank. At least two megasonic transducers are positioned within the megasonic module to direct megasonic energy to each of an active surface and a backside surface of the substrate. A pair of drive wheels are configured to receive an edge of the substrate to support and rotate the substrate in a horizontal orientation between the at least two megasonic transducers. The substrate is supported against the pair of drive wheels by a substrate stabilizing arm/wheel which also allows the rotation of the substrate. A drive motor is configured to rotate the pair of drive wheels, and a fluid recirculation system provides for temperature control and use of a plurality of processing fluids.

Abstract: A cleaning equipment for a spraying paint gun includes a container, a branch sum up, a pipeline structure, an auxiliary rock set, a coth-hook set, and a buckle structure. The pipeline structure is settled inside the container whereas the auxiliary rock set is fixed and settled on the pipeline structure. The cloth-hook set is settled on the branch sum up of the fixed container whereas the buckle structure is used to fix the brake shaft and the handle of the spraying paint gun so that inside the pipeline of the spraying paint gun it is open.

Abstract: This invention relates to a metal part and other surface modification method suitable for the machining industry in which shot peening is typically used to refine the surface of a metal part (to introduce compressive residual stresses, to enhance fatigue strength, to harden the workpiece) and for fields in which parts need be cleaned. According to the present invention, workpiece W is placed within a first vessel which is filled with a fluid. The first vessel is pressurized by controlling the flow rate of the fluid flowing in the first vessel from nozzle 4 distant from said workpiece on the surface and of the fluid flowing from first vessel. Thus, the collapsing impact force of cavitation bubbles is increased so that the machined part will have its surface strengthened and cleaned by applying a peening effect to the surface of the part with said impact force.