Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Abstract: A substrate treating apparatus for treating substrates by immersing the substrates in a treating solution includes the following elements. A treating tank for storing the treating solution; a lifter capable of supporting a plurality of substrates, and vertically movable between an upper withdrawn position above the treating tank and a treating position inside the treating tank; a treating solution supply device for supplying the treating solution to the treating tank; a dripping device for dripping a surfactant to a surface of the treating solution stored in the treating tank; and a control device for causing the treating solution supply device to supply the treating solution to the treating tank, causing the lifter to place the substrates in the treating position, and causing the dripping device to drip the surfactant when raising the lifter to the upper withdrawn position after treatment of the substrates with the treating solution.

Abstract: A system using electrochemically-activated water (ECAW) for manufacturing, processing, packaging, and dispensing beverages including: (a) using ECAW to neutralize incompatible residues when transitioning from the production of one beverage to another; (b) using ECAW to rehabilitate and disinfect granular activated charcoal beds used in the feed water purification system; (c) producing a carbonated ECAW product and using the carbonated ECAW for system cleaning or disinfecting; (d) using ECAW solutions in the beverage facility clean-in-place system to achieve improved microbial control while greatly reducing water usage and reducing or eliminating the use of chemical detergents and disinfectants; (e) further reducing biofilm growth in the processing system, and purifying ingredient water without the use of chlorine, by adding an ECAW anolyte to the water ingredient feed stream; and/or (f) washing the beverage product bottles or other packages with one or more ECAW solutions prior to packaging.

Abstract: A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.

Abstract: A sealed storage vessel containing volatile organic vapor over a bottom sludge layer is cleaned by (a) determining the level of free oil in the vessel and then using (b) either a two-stage or one-stage treatment regime, adding a cleaning agent thereto. If the free oil is greater than 2 volume percent the two-stage regime is used where an oil release agent is initially mixed with the sludge to separate the oil from solids in the sludge. The separated oil floats on the surface of water and is removed without substantially exposing the vessel's interior to the atmosphere, leaving within the vessel a mixture of water, solids, and trace amounts of hydrocarbons. Next, a predetermined amount of an emulsifying agent is added to substantially emulsify the trace hydrocarbons, so the level of volatile organic compounds remaining in the interior of the vessel is no greater than 5,000 ppmv, measured as methane, at least one hour after adding the emulsifying agent.

Abstract: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A method for cleaning a shopping cart includes urging the shopping cart up a ramp and into an interior of a wash chamber of a shopping cart cleaner. A main door leading into said interior of the wash chamber may be closed. A cleaning mode of the shopping cart cleaner may be selected from either an automatic cleaning mode or a manual cleaning mode. A sump that is disposed at a bottom of the wash chamber may be filled with a quantity of water. The shopping cart may be washed with the water and a wash detergent. The shopping cart may be rinsed with the water and a rinse chemical. The water may be drained from the sump. The main door may be opened. The shopping cart may be removed from the wash chamber.

Abstract: Disclosed is a method for producing a catalyst, in which physical properties of a dried material or a calcined material in a production process of the catalyst are stable and a change in at least one of a catalyst activity and a selectivity to a target product is small and hence reproducibility of the catalyst is excellent. The present invention is a method for producing a catalyst containing molybdenum, bismuth, and iron, which contains the steps of washing a surface of at least one device equipped in an apparatus for the production of catalyst, to which a solid matter adheres, with a basic solution, and producing the catalyst with the apparatus for the production of catalyst thus washed.

Abstract: A method of cleaning semiconductor wafers using an acid cleaner followed by an alkaline cleaner to clean contaminants from the materials is provided. The acid cleaner removes substantially all of the metal contaminants while the alkaline cleaner removes substantially all of the non-metal contaminants, such as organics and particulate material.

Abstract: Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.

Abstract: A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.

Abstract: The present invention relates to the acidic cleaning in the beer industry, and more particularly an improved process for acidic cleaning of the various elements and vessels that are used in the preparation of beer and other related fermented beverages, said cleaning being carried out by using a formulation comprising at least one alkane sulphonic acid.

Abstract: A novel approach to the method of removing and preventing redeposition of protein soils on surfaces using sugar esters is disclosed. Protein deposition and streaking and spotting are common on machine washed dishes. Applicants have found a new method of recycling a sump water composition in an automatic dish machine from a first cleaning cycle into subsequent cleaning cycles using a protein-removing/anti-redeposition agent that can remove and prevent redeposition of protein soils on ware washed surfaces.

Abstract: A method of cleaning equipment such as heat exchangers, evaporators, tanks and other industrial equipment using clean-in-place procedures and a pre-treatment solution prior to the conventional CIP cleaning process. The pre-treatment step improves the degree of softening of the soil, and thus facilitates its removal. The pre-treatment solution can be a strong acidic solution, a strong alkaline solution, or comprise a penetrant. A preferred strong acidic solution is an acid peroxide solution. In some embodiments, the pre-treatment may include no strong alkali or acid ingredient; rather, the penetrant provides acceptable levels of pre-treatment.

Abstract: A method for cleaning a semiconductor wafer composed of silicon directly after a process of chemical mechanical polishing of the semiconductor wafer includes transferring the semiconductor wafer from a polishing plate to a first cleaning module and spraying both side surfaces of the semiconductor wafer with water at a pressure no greater than 1000 Pa at least once while transferring the semiconductor wafer. The semiconductor wafer is then cleaned between rotating rollers with water. The side surfaces of the semiconductor wafer are sprayed with an aqueous solution containing hydrogen fluoride and a surfactant at a pressure no greater than 70,000 Pa. Subsequently, the side surfaces are sprayed with water at a pressure no greater than 20,000 Pa. The wafer is then dipped into an aqueous alkaline cleaning solution, and then cleaned between rotating rollers with a supply of water. The semiconductor wafer is then sprayed with water and dried.

Abstract: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the ware so as to afford a sheeting action in an aqueous rinse step without any added rinse agent.

Abstract: A plating apparatus has a steam treatment chamber configured to perform a steam treatment using steam on a surface of a substrate, and a plating chamber configured to plate the surface of the substrate subjected to the steam treatment. The plating apparatus also has an acid treatment chamber configured to bring the surface of the substrate subjected to the steam treatment into contact with an acid liquid. The plating apparatus includes a frame housing the steam treatment chamber, the acid treatment chamber, and the plating chamber.

Abstract: In a liquid processing apparatus configured to remove, from a substrate including a first film and a second film formed above the first film, the first film and the second film, a first chemical-liquid supply part supplies, to a substrate W, a first liquid for dissolving the first film, a second chemical-liquid supply part supplies a second chemical liquid for weakening the second film, and a fluid supply part serving also as an impact giving part gives a physical impact to the second film so as to break the second film and supplies a fluid for washing away debris of the broken second film. A control device controls the respective parts such that, after the second liquid has been supplied and then the fluid has been supplied from the fluid supply part, the first chemical liquid is supplied.

Abstract: The present invention discloses a sterilizable washing machine using ultraviolet radiation, and a sterilizable washing method in the same. The sterilizable washing machine includes a cabinet (2) having an inlet for putting the laundry into the washing machine, a door (50) installed at the cabinet (2), for opening and closing the inlet of the cabinet (2), a tub (6) installed in the cabinet with a buffing function and containable wash water, a drum (8) rotatably installed inside the tub (6) for performing washing, a gasket G installed between the inlet of the cabinet (2) and the tub (6), for sealing the gap between the door (50) and the tub (6), and an ultraviolet light source (20) installed at the gasket (6), for radiating ultraviolet rays into the drum (8).

Abstract: A process for cleaning a wafer having an uneven pattern at its surface. The process includes at least the steps of: cleaning the wafer with a cleaning liquid; substituting the cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and drying the wafer, wherein the cleaning liquid contains 80 mass % or greater of a solvent having a boiling point of 55 to 200° C., and wherein the water-repellent liquid chemical supplied in the substitution step has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions.

Abstract: A household cleaning appliance includes a bulk dispensing system configured to receive a removable cartridge containing multiple doses of treating chemistry and configured to deliver a charge of treating chemistry from the cartridge to a treating chamber and a water supply configured to be selectively coupled to the bulk dispensing system to flush at least a portion of the bulk dispensing system.

Abstract: The present invention relates to medium chain peroxycarboxylic acid compositions of neutral or alkaline pH, to methods of making these compositions, and to methods employing these compositions. The methods include methods of cleaning. The compositions include cleaning compositions.

Abstract: The invention relates to a hydrophobic and particulate soil removal composition and method for removal of hydrophobic and particulate soil from an article. Stubborn hydrophobic greasy or oily soils, including associated organic particulate soils, such as finely divided elemental carbon, are frequently encountered on hard surfaces including vehicle parts. The composition is selected to provide enhanced soil removal, preferably in vehicle cleaning applications.

Abstract: The invention relates to a method and an apparatus for applying a fluid (32) to items (14) to be cleaned, which items are continuously or intermittently transported in the conveying direction (12) in an automatic cleaning machine, preferably an automatic pass-through dishwasher. At least two, preferably tubular, spray bodies (26.1, 26.2, 26.3, . . . 26.n) which are spaced apart from one another are arranged in at least one spray plane (22, 24) which is oriented parallel to the conveying direction (12) of the items (14) to be cleaned.

Abstract: A method for dispensing a first treating agent and a second treating agent into the washing tub of a dishwasher includes providing each of first and second reservoirs with a sensor for monitoring its fill level. After a first dispensing operation, a controller compares the sensor signals and determines whether a ratio of the fill levels deviates from a ratio of the capacities of the reservoirs. The controller elects either a standard or an alternative subsequent dispensing operation based on whether the fill level ratio deviates from the capacity ratio. The controller chooses the standard subsequent dispensing operation if the fill level ratio does not deviate from the capacity ratio and chooses the alternative subsequent dispensing operation if it does. The alternative subsequent dispensing operation includes changing at least one amount dispensed by dispensing devices compared to a corresponding amount dispensed in the first dispensing operation.

Abstract: The present invention relates to a liquid acidic hard surface cleaning composition having a pH of from 2 to 2.9 and comprising formic acid and an alkaline material.

Abstract: This invention relates to a plumbing device made of a copper alloy containing nickel salt, that includes a valve and a tube coupling having at least a liquid-contacting part washed with a cleaning fluid incorporating therein nitric acid and hydrochloric acid as an inhibitor under conditions of a temperature and a duration permitting effective removal of nickel salt, thereby performing nickel salt-removing treatment and causing the hydrochloric acid to form a coating film on the surface of the liquid-contacting part thereby effectively precluding elution of nickel salt from the surface of the liquid-contacting part in the presence of the coating film, wherein the nitric acid has a concentration c in a range of 0.5 wt %<c<7 wt % and the hydrochloric acid has a concentration d in a range of 0.05 wt %<d<0.7 wt % in the cleaning fluid, wherein the temperature is set to 10° C.?x 50° C., and wherein nickel salt is removed with the cleaning fluid.

Abstract: A method, system and device to use a dilute alkaline solution held at sub-critical temperature and pressure conditions to remove rapidly chloride ions from corroded iron artifacts.

Abstract: Methods are provided for descaling metallic component devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a nonionic surfactant and rinsed again with purified water.

Abstract: A composition is provided for use in cleaning a surface of a cementitious material. The composition includes HCI, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone. A method of using the composition includes applying the composition to a surface from which it is desired to clean a cementitious material and removing the composition and released cementitious material from the surface. Methods are also provided for performing hydraulic fracturing of an oil or a gas well; for adjusting a pH of a drilling fluid; for adjusting and maintaining a pH of a process fluid; for solubilizing calcium carbonate in an aqueous suspension or dispersion of calcium carbonate; for removing a foulant in a fluid-handling element; adjusting a pH and lowering a salt level of turf.

Abstract: A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to the surfaces of the equipment to provide a residual film thereon. The rinse solution includes a first nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 12 to about 15, a second nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and a bio-film permeation agent. A total of the first surfactant and the second surfactant in the composition ranges from about 2 to about 20 percent by weight of a total weight of the composition.

Abstract: The invention relates to the use of a cleaning agent that contains surfactants and has a pH value of at least 11 when diluted in an aqueous solution and ready for use. Said cleaning agent is used to destabilize prions during mechanical and manual cleaning and/or disinfection of medical and/or surgical instruments and appliances. It has been recognized that this combination enables a reliable destabilization of prions during the mechanical reconditioning of surgical instruments.

Abstract: The invention relates generally to a cleansing apparatus for a substrate and a cleansing method for cleansing byproducts generated after an etching process of the substrate. The cleansing apparatus comprises: a first cleansing device including a first supply unit for providing a first cleansing fluid to an etched substrate; a second cleansing device including a second supply unit for providing a second cleansing fluid to the substrate cleansed by the first cleansing fluid; and a third cleansing device including a third supply unit for providing a third cleansing fluid to the substrate cleansed by the second cleansing fluid. The first cleansing fluid and the third cleansing fluid are pure water (DI water), and the second cleansing fluid is an alkali solution.

Abstract: The present invention relates to novel sulfoperoxycarboxylic acid compounds, and methods for making and using them. The sulfoperoxycarboxylic compounds of the invention are storage stable, water soluble and have low to no odor. Further, the compounds of the present invention can be formed from non-petroleum based renewable materials. The compounds of the present invention can be used as antimicrobials, and bleaching agents. The compounds of the present invention are also suitable for use as coupling agents.

Abstract: The invention relates to a method of purifying glucose polymers for the production of peritoneal dialysis solutions, characterized in that it includes at least one step of processing activated carbon and/or granular black, at least one sterilizing filtration step, at least one heat treatment step, and at least one ultrafiltration step.

Abstract: A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the dish. The method may include additional steps. Compositions for using with the method are also disclosed. Finally, dish machines that may be used in accordance with the method are disclosed.

Abstract: A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agitated isopropyl alcohol (IPA) solution and rinsed. The silicon electrode is then subjected to an ultrasonic cleaning operation in water following removal from the IPA solution. Contaminants are then removed from the silicon electrode by soaking the silicon electrode in an agitated mixed acid solution comprising hydrofluoric acid, nitric acid, acetic acid, and water. The silicon electrode is subjected to an additional ultrasonic cleaning operation following removal from the mixed acid solution and is subsequently rinsed and dried. In other embodiments of the present disclosure, it is contemplated that the silicon electrode can be soaked in either the agitated aqueous detergent solution, the agitated isopropyl alcohol (IPA) solution, or both.

Abstract: Filters used in the beverage industry fouled by polyphenol-protein complexes and carbohydrate polymers can be cleaned by treating the filters either with the following methods: Solubilization of at least part of the carbohydrate polymers followed by a treatment of the resulting polyphenol protein complex with an oxidative chemical. Treatment of the fouled filters through a back-wash method using an oxidative chemical. In both cases it is not necessary to rinse the membranes after cleaning with a reductive chemical.

Abstract: Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a nonionic surfactant and rinsed again with purified water.

Abstract: Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the surface at an operating pressure that is about 600 PSI or less and an operating flow rate that is about 1 gal/min or less.

Abstract: A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10% by weight, and the water in an amount of from 60 to 99.75% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13; and a remover composition containing an organic amine (A), an organic phosphonic acid (B), a linear sugar alcohol (C) and water, wherein the remover composition contains the component (A) in an amount of from 0.2 to 30% by weight, the component (B) in an amount of from 0.05 to 10% by weight, the component (C) in an amount of from 0.1 to 10% by weight, and the water in an amount of from 50 to 99.65% by weight, and wherein the composition has a pH at 20° C. of from 9 to 13.

Abstract: A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface of the wafer. The cleaning process is conducted by injecting onto the back surface of the wafer an etchant for removing contaminations and simultaneously injecting onto a front surface of the wafer a reductant containing hydrogen.

Abstract: Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and washing the article in an alkaline solution to clean the article.

Abstract: A composition is provided for use in cleaning a surface of a cementitious material. The composition includes HCl, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone. A method of using the composition includes applying the composition to a surface from which it is desired to clean a cementitious material and removing the composition and released cementitious material from the surface.

Abstract: Semiconductor wafers are cleaned using a cleaning solution containing an alkaline ammonium component in an initial composition, wherein the semiconductor wafer is brought into contact with the cleaning solution in an individual-wafer treatment, and in the course of cleaning hydrogen fluoride is added as further component to the cleaning solution, and the cleaning solution has at the end of cleaning, a composition that differs from the initial composition.

Abstract: The present invention relates to compositions comprising tunable polymeric surfactants and methods for enhanced oil recovery.

Abstract: A method to remove deposits containing magnetite and copper from a container, particularly from a steam generator of a nuclear power plant. In a first step, the container is treated using an alkaline cleaning solution containing a complexing agent forming a soluble complex with iron ions, a reducing agent, and an alkalizing agent. In a second step a further complexing agent forming a more stable complex with iron III ions than the complexing agent used in the first step and an oxidant are added to the cleaning solution of the first step present in the container.

Abstract: A surface treatment device (10) is provided for applying a surface treatment medium to an article (60). The device comprises an application member (12, 14) for holding and applying the surface treatment medium to the article. The device has a securing arrangement (40) for securing the application member to the article.

Abstract: A cleaning and sterilizing method for removing organic matter adhered to the surface of an endoscopic camera instrument, and effectively exhibiting bacteria-killing and virus-killing effects of acidic water uses, as a cleaning bath, an alkaline-water-producing electrolysis bath partitioned by a separating membrane and having electrodes on both sides, and conducts preliminary cleaning of an endoscopic camera instrument inserted in the cleaning bath by ultrasonic cleaning with city tap water. Subsequently, saline solution is provided to the electrolysis bath to conduct electrolysis, conduct ultrasonic cleaning with alkaline water obtained by the electrolysis, introduce acidic water in the acidic water generation bath and conduct sterilization-cleaning, and further to conduct ultrasonic cleaning with city tap water. Then, the endoscopic camera instrument is dried with warm air as the case requires.

Abstract: The present invention is directed to a method of cleaning an interior surface of a fluid delivery system. The method comprises introducing a first liquid into the fluid delivery system and contacting the interior surface with the first liquid; forming a slurry by introducing a particulate into the first liquid and contacting the interior surface with the slurry; introducing a second liquid into the fluid delivery system and contacting the interior surface with the second liquid; and introducing a third liquid into the fluid delivery system and contacting the interior surface with the third liquid. The first liquid is substantially soluble or substantially insoluble in the second liquid, the second liquid is substantially insoluble in the third liquid, and the particulate is substantially insoluble in the first and second liquids and substantially soluble in the third liquid.