Using Sequentially Applied Treating Agents Patents (Class 134/26)
  • Patent number: 10260024
    Abstract: The present invention relates to compositions comprising protease variants suitable for use in cleaning or detergent compositions, such as laundry detergent compositions and dish wash compositions, including automatic dish wash compositions.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: April 16, 2019
    Assignee: NOVOZYMES A/S
    Inventors: Peter Kamp Hansen, Esben Peter Friis, Torben Vedel Borchert, Lars Lehmann Hylling Christensen, Jens Erik Nielsen, Maria Berggaard Silow
  • Patent number: 10251963
    Abstract: Disclosed is a method for drying endoscope channels, including the following steps: a) connecting the endoscope, particularly via a specific connection, to a plasma drying unit; b) injecting a neutral gas into the endoscope channels for a duration of 10 to 60 seconds, the flow rate of the gas being low, the gas being injected at a temperature of 10° C. to 30° C. such as to eliminate residual water; then c) drying the endoscope channels, for a duration of 30 to 150 seconds, by injecting a gas at a high flow rate, the gas being injected at a temperature of 30° C. to 60° C.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: April 9, 2019
    Assignee: PLASMABIOTICS
    Inventor: Daniel Vinteler
  • Patent number: 10235961
    Abstract: A novel element, a novel formation method of a film, or a novel formation method of an element is provided. Alternatively, a film including graphene is formed at low cost and high yield. A formation method of a film including graphene includes a first step of forming a film including graphene oxide that includes a first region and a second region by application of a dispersion liquid in which graphene oxide is dispersed over a substrate and removal of dispersion medium from the applied dispersion liquid, a second step of forming a film including graphene by light irradiation to the first region to reduce the first region, and a third step of removing the second region by washing.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: March 19, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yohei Momma, Takahiro Kawakami, Junpei Momo
  • Patent number: 10224198
    Abstract: A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: March 5, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Tetsuya Emoto, Atsuro Eitoku, Tomomi Iwata
  • Patent number: 10211075
    Abstract: An apparatus and a method for treating a substrate with liquid are disclosed. The substrate treating apparatus comprises a substrate supporting unit for supporting the substrate, a liquid supply unit for supplying a liquid to the substrate supported on the substrate supporting unit, and a controller for controlling the liquid supply unit, wherein the liquid supply unit comprises a first nozzle for supplying a first liquid and a second nozzle for supplying a second liquid, and a second area where the second liquid is supplied on the substrate is provided within a first area where the first liquid is supplied on the substrate. The first liquid and the second liquid supplied with a hydrophobic film are discharged with different ways from each other. Thereby, particles with various sizes may be removed depending on each discharge methods.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: February 19, 2019
    Assignee: Semes Co., Ltd.
    Inventors: Dae Min Kim, Soyoung Park, Muhyeon Lee
  • Patent number: 10182697
    Abstract: A floor cleaning apparatus, comprises a head, the head having a downward facing cleaning element for downward facing cleaning of a ground surface; and a handle for holding; wherein a portion or a whole of the handle is removably attachable from the head and comprises a spraying system, the spraying system itself comprising a spray outlet; the spraying system operable in a first or a second mode, the portion or a whole of the handle attached to the head in the first mode; and the portion or a whole of the handle removed from the head in the second mode, wherein in the first mode spray is sprayable from the spray outlet upwardly with regard to the ground surface. In an alternate aspect, a floor cleaning apparatus, comprises a head, the head having a downward facing cleaning element for downward facing cleaning of a ground surface; and an upward spraying system, the upward spraying system comprising an upward spraying spray outlet.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: January 22, 2019
    Inventors: Thomas Kenneth Schultheis, Thomas Carey Schultheis
  • Patent number: 10150938
    Abstract: The present invention provides a transparent or translucent, self-standing, automatic dishwashing gel, comprising a water-soluble C14-C22 fatty acid salt, at least 50 wt % liquid non-ionic surfactant, less than 15 wt % water, and optionally a polar organic solvent.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: December 11, 2018
    Assignee: RECKITT BENCKISER (BRANDS) LIMITED
    Inventors: Pavlinka Roy, Claudia Schmaelzle
  • Patent number: 10145061
    Abstract: Foamed, opacifying element comprising a thermal colorant image is prepared using a porous substrate having an opposing external surface and an internal surface, and a dry foamed composition disposed on the internal surface of the porous substrate as a dry opacifying layer that has a light blocking value of at least 4 as well as a luminous reflectance that is greater than 40% as measured by the Y tristimulus value. A thermal colorant image is provided on either the opposing external surface, the dry opacifying layer, or both the opposing external surface and the dry opacifying layer, by thermal colorant transfer from a thermal donor element comprising a colorant donor layer having one or more thermal colorants.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: December 4, 2018
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Diane Marie Herrick, Mridula Nair
  • Patent number: 10138342
    Abstract: Foamable aqueous compositions can be foamed and applied to porous substrates to make light-blocking dry opacifying elements. Such compositions have 0.05-15 weight % of porous particles; at least 20 weight % of a binder; at least 0.0001 weight % of additives (including a surfactant); water; and at least 0.001 weight % of an opacifying colorant. Each porous particle includes a continuous polymeric phase and discrete pores; a mode particle size of 2-50 ?m; and a porosity of 20-70 volume %. The continuous polymeric phase Tg is >80° C. and has a polymer viscosity of 80-500 centipoises at an ethyl acetate shear rate of 100 sec?1 at a concentration of 20 weight % at 25° C. The dry opacifying element light blocking value is at least 4 and has a luminous reflectance >40% as measured by the Y tristimulus value. The foamed aqueous composition has a foam density of 0.1-0.5 g/cm3.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: November 27, 2018
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Mridula Nair, Mary Christine Brick, Ellen M. Pyszczek
  • Patent number: 10132031
    Abstract: A foamed, opacifying element has a thermal colorant image on either an opposing external surface and an internal surface of a porous substrate. The internal surface has a dry foamed composition disposed thereon as a dry opacifying layer that comprises: (a) 0.1-40 weight % of porous particles; (b) at least 10 weight % of an at least partially cured binder material; (c) at least 0.2 weight % of one or more additives comprising a surfactant; (d) less than 5 weight % of water; and (e) at least 0.002 weight % of an opacifying colorant different from all of the one or more (c) additives, which opacifying colorant absorbs predetermined electromagnetic radiation. The thermal colorant image is derived from thermal colorant transfer of sublimable colorants from a thermal donor element.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: November 20, 2018
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Mridula Nair, Diane Marie Herrick
  • Patent number: 10115611
    Abstract: A substrate cooling method is for, using a load-lock mechanism for controlling a pressure therein between a first pressure close to an atmospheric pressure and a second pressure in a vacuum state, cooling a substrate transferred from the second module to the first module. The method includes maintaining a pressure in the chamber to the second pressure, allowing the chamber to communicate with a second module, and loading the substrate into the chamber; locating the substrate to a cooling position close to the cooling member; exhausting the chamber such that the pressure in the chamber becomes a third pressure where a region between a surface of the cooling member and a backside of the substrate satisfies a molecular flow condition. The method further includes introducing a purge gas into the chamber to increase the pressure in the chamber to the first pressure, and cooling the substrate by the cooling member.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: October 30, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiromitsu Sakaue, Shinya Okano
  • Patent number: 10087399
    Abstract: The object of the present invention relates to the use of an branched alkoxylated non-ionic surfactant as an additive to an aqueous membrane cleaning composition, wherein the surfactant has an HLBd value of 9 to 12.5 and an average degree of branching Bs?1.5 and wherein the surfactant has the following formula: wherein R is a C8-C18 linear or branched hydrocarbon chain, X is O or N, R1, R2 and R3 independently of one another are hydrogen, methyl, ethyl, propyl, isopropyl, or a mixture of these, n has a value of from 1 to 8, m has a value of from 1 to 8, p has a value of from 0 to 8.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: October 2, 2018
    Assignee: BASF SE
    Inventors: Arend Jouke Kingma, Diana Neumann
  • Patent number: 10066127
    Abstract: The present disclosure provides chemical mechanical polishing (CMP) slurry, including an abrasive, a chelator, an oxidizing agent, and a surface modificator. The surface modificator is configured to modify a surface from hydrophobic to hydrophilic. The present disclosure also provides a method for reducing chemical mechanical polishing (CMP) surface defects. The method includes adding an additive into CMP slurry by at least 0.0001 wt %, wherein the additive modifies a surface to be polished from hydrophobic to hydrophilic.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: September 4, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: An-Dih Yu, Chi-Ming Yang
  • Patent number: 10060063
    Abstract: The present invention relates to a laundry machine and a controlling method, which can remove allergens on the laundry. A controlling method of a laundry machine includes a mite-killing step of supplying seam to a drum to make laundry exposed to a hot environment at or over a temperature and for or over a duration of time, wherein the temperature and the duration are predetermined enough to kill house dust mites on the laundry; a rinsing step of rinsing the laundry; and a spin-drying step of spin-drying the rinsed laundry. The present invention has an advantageous effect of removing allergens including house dust mites, animal hair and pollens efficiently. In addition, if the house dust mites are killed by using steam, energy efficiency is high and an effect of mite-killing is great.
    Type: Grant
    Filed: June 20, 2016
    Date of Patent: August 28, 2018
    Assignee: LG ELECTRONICS INC.
    Inventors: Pyoung Hwan Kim, Su Hee Shin, Seong Hae Jeong, Young Soo Kim, Deug Hee Lee
  • Patent number: 10046998
    Abstract: The invention relates to a surface-treated calcium carbonate for binding and bioremediating hydrocarbon-containing compositions, to a method for binding and bioremediating hydrocarbon-containing compositions as well as to the use of surface-treated calcium carbonate for binding and bioremediating hydrocarbon-containing compositions and to a composite material comprising the surface-treated calcium carbonate and a hydrocarbon-containing composition.
    Type: Grant
    Filed: August 3, 2012
    Date of Patent: August 14, 2018
    Assignee: Omya International AG
    Inventors: Nicola Di Maiuta, Patrick Schwarzentruber, Michael Skovby
  • Patent number: 10037901
    Abstract: A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: July 31, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Kazuya Koyama, Hiromi Kiyose, Katsufumi Matsuki, Shuhei Takahashi, Hideki Nishimura, Takashi Uno, Hirotaka Maruyama
  • Patent number: 9982217
    Abstract: The present invention concerns compound of formula in the form of any one of its stereoisomers or a mixture thereof, and wherein R1 and R1?, independently from each other, represent a hydrogen atom or a methyl group provided that one of said groups represent a hydrogen atom and the other a methyl group; R2 and R3, independently from each other, represent substituents of the saturated ring and are a hydrogen atom or a C1-3 alkyl group; and n is an integer varying between 1 and 4; and their use in perfumery to impart odor notes of the floral, rosy type.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: May 29, 2018
    Assignee: Firmenich SA
    Inventors: Julien Coulomb, Nicolas Guichard
  • Patent number: 9964480
    Abstract: The present invention relates to a test film for detecting surface particles in a clean room in order to prevent inferior products by measuring the contamination level of the clean room using the surface particles. The present invention provides a test film for detecting surface particles in a cleanroom, the test film comprising a substrate which has a predetermined thickness and is formed of a transparent synthetic resin material; a first adhesive layer which is formed at one side of the substrate and collects the surface particles; a release film which is adhered to the first adhesive layer and is separated from the first adhesive layer when the surface particles are collected; a second adhesive layer which is formed at the other side of the substrate; and a protective film which is adhered to the second adhesive layer so as to protect the substrate and has gradations indicated thereon.
    Type: Grant
    Filed: July 3, 2015
    Date of Patent: May 8, 2018
    Assignee: JEDEX INC.
    Inventor: Jin Ho Kim
  • Patent number: 9956594
    Abstract: A substrate processing method includes a substrate holding step of holding a substrate horizontally, a liquid droplet discharging step wherein liquid droplets of an organic solvent, formed by mixing the organic solvent and a gas, are discharged from a double-fluid nozzle toward a predetermined discharge region within an upper surface of the substrate, and a liquid film forming step, executed before the liquid droplet discharging step, of supplying the organic solvent to the double fluid nozzle without supplying the gas, so as to discharge the organic solvent in a continuous stream mode from the double-fluid nozzle to form a liquid film of the organic solvent covering the discharge region on the upper surface of the substrate.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: May 1, 2018
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Atsuyasu Miura, Naoki Sawazaki
  • Patent number: 9879368
    Abstract: A laundry system can have a washing machine that receives a wash mixture and at least one laundry item to be laundered during a washing operation. The washing machine may wash the at least one laundry item in the wash mixture during the washing operation to separate one or more contaminants from the at least one laundry item. The laundry system also can have an extraction system in communication with the washing machine, which extraction system can include a filtration system with a plurality of filtration stages. Each filtration stage of the plurality of filtration stages may comprise one or more filters that filter at least part of the wash mixture during the washing operation.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: January 30, 2018
    Assignee: Butterworth Industries, Inc.
    Inventor: Frank L. Butterworth, III
  • Patent number: 9833818
    Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: December 5, 2017
    Assignee: INTERNATIONAL TEST SOLUTIONS, INC.
    Inventors: Alan E. Humphrey, Jerry J. Broz, James H. Duvall
  • Patent number: 9805938
    Abstract: A substrate processing apparatus includes a rotating holder for a substrate, a first nozzle used to eject a jet flow, a second nozzle used to discharge a continuous flow, and a nozzle moving unit integrally moving the first and second nozzles. A landing position of the continuous flow is located closer to a rotation center than a landing position of the jet flow is. At least movement paths of the landing positions of the jet flow and the continuous flow or flow directions of the continuous flow and the jet flow are different from each other. The movement paths are made to be different from each other by locating the landing position of the continuous flow downstream of the movement path of the landing position of the jet flow. The flow directions are made to be different from each other by tilting the continuous flow.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: October 31, 2017
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Naozumi Fujiwara, Toru Edo, Yuji Sugahara, Seiji Ano, Jun Sawashima
  • Patent number: 9788711
    Abstract: An endoscope reprocessor includes: an endoscope housing portion; a medicinal solution tank in which a medicinal solution is stored; a medicinal solution transfer portion that transfers the medicinal solution from the medicinal solution tank to the endoscope housing portion; a comparison portion that compares the concentration of the medicinal solution and a first reference concentration; a first adjustment portion that increases a reaction rate of the medicinal solution in a state in which the concentration of the medicinal solution is lower than the first reference concentration; and a control portion to which the comparison portion and the first adjustment portion are connected, and which drives the first adjustment portion in a case where the comparison portion determines that the concentration of the medicinal solution is lower than the first reference concentration.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: October 17, 2017
    Assignee: OLYMPUS CORPORATION
    Inventor: Akihisa Ogawa
  • Patent number: 9777131
    Abstract: A method enabling a used superabsorbent polymer recovered from used absorbent, etc., to be readily and inexpensively recovered without using acids or alkalies. The used superabsorbent polymer is treated with an aqueous solution of a multivalent metal salt such as calcium chloride, etc., the superabsorbent polymer treated with the aqueous solution of a multivalent metal salt is treated with an aqueous solution of an alkali metal salt such as sodium chloride, etc., the superabsorbent polymer treated with the aqueous solution of an alkali metal salt is washed with water, and the superabsorbent polymer washed with water is then dried.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: October 3, 2017
    Assignee: Unicharm Corporation
    Inventors: Naoyuki Funamizu, Ken Ushijima, Nowaki Hijikata, Hiroki Yoshikawa, Takayoshi Konishi, Toru Oba
  • Patent number: 9771493
    Abstract: The invention relates to the use of an acidic aqueous composition for pretreating cans, wherein an inorganic-organic conversion layer is formed in the course of the pretreatment, said conversion layer, as such, offering an excellent adhesive base for wax which improves sliding of the formed can and for the subsequent coating. The invention relates to a wet-chemical pretreatment method in which a can cylinder is first contacted with an acidic aqueous composition that contains water-soluble inorganic compounds of Zr, Ti, Si, Hf or Ce, and water-soluble polymers comprising carboxyl groups or hydroxyl groups; and subsequently is contacted with an aqueous wax dispersion. The invention further relates to an acidic aqueous composition suitable for the pretreatment method comprising water-soluble polymers selected from condensation products of glycoluril and aldehydes. The invention further relates to a method for producing can cylinders, said method including the pretreatment according to the invention.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: September 26, 2017
    Assignee: Henkel AG & Co. KGaA
    Inventor: Joerg Riesop
  • Patent number: 9744569
    Abstract: A method for cleaning piping including the steps of supplying an acid to a cleaning water to prepare a cleaning water having pH of 4 or lower, mixing ozone gas to the cleaning water, and passing the cleaning water through the piping to be cleaned, or a cleaning system for piping, the system including a reservoir which retains cleaning water, an acid providing means supplies an acid to the cleaning water, an ozone generation means which generates ozone gas, a circulation flow path including a circulation pump which connects the reservoir and the ozone generation means in the form of a closed circuit, and circulates the cleaning water between the reservoir and ozone generation means, a conduction flow path including a conveying pump which communicates the reservoir and the piping to be cleaned, and conveys the cleaning water retained in the reservoir through the piping to be cleaned.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: August 29, 2017
    Assignee: HITACHI, LTD.
    Inventors: Takaaki Suematsu, Tokuo Kure, Kenji Saito, Eiji Higashi, Tomoyuki Araki
  • Patent number: 9711374
    Abstract: Embodiments of cleaning a surface of a polysilicon layer during a chemical mechanical polishing (CMP) process are provided. The method includes providing a substrate, and forming a gate structure on the substrate, and the gate structure includes a polysilicon layer. The method further includes forming an inter-layer dielectric layer (ILD) over the gate structure. The method also includes performing a CMP process to planarize the inter-layer dielectric layer (ILD) and to expose the polysilicon layer, and the CMP process includes: providing an oxidation solution to a surface of the substrate to perform an oxidation operation to form an oxide layer on the polysilicon layer; and providing a cleaning solution to the surface of the substrate to perform a cleaning operation.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: July 18, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Che-Hao Tu, Chih-Yu Chang, William Weilun Hong, Ying-Tsung Chen
  • Patent number: 9683200
    Abstract: A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: June 20, 2017
    Assignee: Ecolab USA Inc.
    Inventors: Charles A. Hodge, Christopher M. McGuirk, Mark D. Levitt, Dale Larson, Elizabeth R. Kiesel, Amanda R. Blattner
  • Patent number: 9610615
    Abstract: A method for cleaning a semiconductor wafer after a Chemical Mechanical Polishing (CMP) process is provided. The method includes providing the semiconductor wafer into a cleaning module. The method further includes cleaning the semiconductor wafer by rotating a cleaning brush assembly. The method also includes applying an agitated cleaning liquid to clean the cleaning brush assembly.
    Type: Grant
    Filed: March 31, 2015
    Date of Patent: April 4, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Chia-Ying Tien, Chia-Lin Hsueh
  • Patent number: 9609992
    Abstract: It is surprisingly found that when diamond particles are embedded into an alcohol wipe, the cleansing wipe that is formed is extremely useful at cleaning diamond jewellery in the home. It is also surprising that, given the abrasive nature of diamond, the diamond particles result in a satisfactory clean without causing any damage to the surface of the diamond being cleaned. The final result is that the cleaned diamond has recovered most of its original fire, life and brilliance.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: April 4, 2017
    Assignee: FOR YOUR DIAMONDS ONLY LTD
    Inventor: Andrew Coxon
  • Patent number: 9550967
    Abstract: The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: January 24, 2017
    Assignee: HONEYWELL INTERNATIONAL INC.
    Inventors: Ryan Hulse, Kane D Cook
  • Patent number: 9487735
    Abstract: According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures, including below 35° C., and lower pH conditions, including from 5 to 10, from 6 to 9, and from 6 to 8, in comparison to conventional caustic-based adhesive removal compositions.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: November 8, 2016
    Assignee: Ecolab USA Inc.
    Inventors: Clinton Hunt, Jr., Kim R. Smith, Ralf Krack
  • Patent number: 9452452
    Abstract: A liquid processing apparatus according to the present disclosure includes a substrate holding unit configured to be rotated and hold a substrate from a bottom side thereof with substrate being spaced apart horizontally, a rotation driving unit configured to rotate the substrate holding unit, and an air supply unit provided above the substrate and configured to supply air toward the substrate held by the substrate holding unit. The liquid processing apparatus also includes an air supply path including a suction port that inhales the air supplied from the air supply unit and supplies the air inhaled from the suction port to a space formed between the substrate holding unit and a bottom surface of the substrate held by the substrate holding unit.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: September 27, 2016
    Assignee: Tokyo Electron Limited
    Inventor: Koji Egashira
  • Patent number: 9450115
    Abstract: A method to improve CdTe-based photovoltaic device efficiency is disclosed, the method including steps for removing surface contaminants from a semiconductor absorber layer prior to the deposition or formation of a back contact layer on the semiconductor absorber layer, the surface contaminants removed using at least one of a dry etching process and a wet etching process.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: September 20, 2016
    Assignee: First Solar, Inc.
    Inventors: Scott Christensen, Pawel Mrozek, Gang Xiong, San Yu
  • Patent number: 9447365
    Abstract: A method including immersing a ceramic coated article into a bath including an HF acid solution having NH4F with a molar concentration of about 0.1M to 1.0M for a time period to remove a deposition, and rinsing the ceramic coated article.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: September 20, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Sumanth Banda, Jennifer Y. Sun
  • Patent number: 9394489
    Abstract: Methods for recovering organic heteroatom compounds from a hydrocarbon feedstock include feeding into a contactor a hydrocarbon feedstock and an aqueous solvent to form an extraction mixture of the aqueous solvent with the hydrocarbon feedstock. The hydrocarbon feedstock includes a hydrocarbon and an organic heteroatom compound. The aqueous solvent includes an ionic liquid formed from pressurized carbon dioxide and water. A pressure and temperature of the extraction mixture may be established that together tune the aqueous solvent to selectively form a solvent complex with the at least one organic heteroatom compound. Then, the solvent complex is extracted to a recovery vessel from the extraction mixture in the contactor. By adjustment of a recovery temperature of the recovery vessel, a recovery pressure of the recovery vessel, or both, the solvent complex decomposes into carbon dioxide and the organic heteroatom compound. The organic heteroatom compound is then recovered from the recovery vessel.
    Type: Grant
    Filed: February 9, 2015
    Date of Patent: July 19, 2016
    Assignee: Saudi Arabian Oil Company
    Inventors: Zaki Yusuf, Ahmad D. Hammad, Stamatios Souentie, Bandar Fadhel, Nayif Rasheedi
  • Patent number: 9382652
    Abstract: The present invention relates to a laundry machine and a controlling method, which can remove allergens on the laundry. A controlling method of a laundry machine includes a mite-killing step of supplying seam to a drum to make laundry exposed to a hot environment at or over a temperature and for or over a duration of time, wherein the temperature and the duration are predetermined enough to kill house dust mites on the laundry; a rinsing step of rinsing the laundry; and a spin-drying step of spin-drying the rinsed laundry. The present invention has an advantageous effect of removing allergens including house dust mites, animal hair and pollens efficiently. In addition, if the house dust mites are killed by using steam, energy efficiency is high and an effect of mite-killing is great.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: July 5, 2016
    Assignee: LG ELECTRONICS INC.
    Inventors: Pyoung Hwan Kim, Su Hee Shin, Seong Hae Jeong, Young Soo Kim, Deug Hee Lee
  • Patent number: 9318697
    Abstract: In a method of detecting an etch by-product, the method including forming a magnetic layer including palladium (Pd) on a substrate; etching the magnetic layer to form a magnetic layer pattern; depositing a mixture including an alkyl bromide compound on a surface of the magnetic layer pattern; and measuring a current difference between the substrate and the mixture to detect an etch by-product on the surface of the magnetic layer pattern.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: April 19, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin-Hye Bae, Won-Jun Lee, Sung-Yoon Chung, Taek-Dong Chung
  • Patent number: 9290583
    Abstract: The present invention relates to a process for washing a polysaccharide-based material which has been subjected to oxidation by at least one oxidizing agent, the said process comprising a first stage of washing with a first densified fluid which is inert with regard to the said oxidizing agent, characterized in that the first stage is followed by a second stage of washing with a washing composition comprising at least one second inert densified fluid and at least one alcohol. The said process according to the invention can additionally comprise a third stage of washing with a third inert densified fluid in order to remove the said alcohol deposited on the said polysaccharide-based material during the said second washing stage. Preferably, the said inert densified fluids are supercritical carbon dioxide.
    Type: Grant
    Filed: September 3, 2010
    Date of Patent: March 22, 2016
    Assignee: Sofradim Production
    Inventors: Suzelei Montanari, Jean Stephane Condoret, Severine Camy, Benjamin Renault
  • Patent number: 9206380
    Abstract: The invention is directed to methods of generating carbonate in situ in a use solution under an enriched CO2 atmosphere. In another aspect, the invention is directed to methods of cleaning food processing surfaces under an enriched CO2 atmosphere comprising contacting a food processing surface with a cleaning composition comprised of an alkalinity source, a surfactant, and water, monitoring the pH during the wash cycle and adjusting the pH by recirculating a use solution, adding a secondary alkalinity source, or both recirculating a use solution and adding a secondary alkalinity source, to generate carbonate in situ in the use solution. In a particular embodiment of the invention the alkalinity source is an alkali metal carbonate and the secondary alkalinity source is an alkali metal hydroxide.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: December 8, 2015
    Assignee: ECOLAB USA INC.
    Inventors: Anthony W. Erickson, Peter J. Fernholz
  • Patent number: 9147573
    Abstract: The substrate processing apparatus includes a process chamber; a susceptor configured to support a wafer; lifter pins configured to support the wafer on the susceptor; a gas supply unit configured to supply a gas into the process chamber; a heating unit configured to heat the wafer; an excitation unit configured to excite the gas supplied into the process chamber; an exhaust unit configured to exhaust the inside of the process chamber; and a controller. The controller controls a reducing gas to be supplied into the process chamber in a state in which the wafer is supported by the lifter pins, and controls the gas supply unit to supply an oxidizing gas and a reducing gas into the process chamber in a state in which the wafer is supported by the susceptor.
    Type: Grant
    Filed: February 18, 2013
    Date of Patent: September 29, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventor: Yasutoshi Tsubota
  • Patent number: 9114442
    Abstract: An apparatus for cleaning chandeliers includes a hand-held tank for holding hot water and a base supporting the hand-held tank. The base has a hollow interior. The tank has sidewalls, at least one of which is transparent. An air and water pump and a battery are mounted in the hollow interior. The battery is in electrical communication with the pump. A first inlet admits ambient air into an inlet of the pump and a second inlet admits water into the inlet. At least one air and water-emitting nozzle is formed in a sidewall of the tank. A pump outlet is in open fluid communication with the at least one water-emitting nozzle. The at least one nozzle discharges agitating water and bubbles into the hot water or above the water line, depending upon the water depth, to help dislodge chemicals and grease from chandelier parts immersed in the hot water.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: August 25, 2015
    Assignee: Inventive Solutions, LLC
    Inventor: Keith S. Campbell
  • Patent number: 9075318
    Abstract: Provided is a method and system for stripping a resist film on a plurality of substrates in a resist removal system comprising a processing chamber coupled to a recirculation system comprising a recycle sub-system and a bypass sub-system. The recycle sub-system includes a recycle line, an inline heater, a ratio monitor and control system, and recirculation injection device. The bypass sub-system comprises a treatment liquid supply line, a first injection line, a mixing device, and a second injection line. The treatment liquid comprises a primary stripping chemical, secondary stripping chemical, tertiary stripping chemical, and one or more reactive products. One or more of the temperatures, concentrations, and/or flow rates of the recirculated treatment liquid and/or injected stripping chemicals are adjusted to meet a target strip rate and selectivity for strip over etch of silicon nitride or silicon oxide.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: July 7, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Ian J. Brown, Wallace P. Printz
  • Patent number: 9028620
    Abstract: Embodiments of the invention generally relate to a method for selectively etching or otherwise removing copper or other metallic contaminants from a substrate, such as a gallium arsenide wafer. In one embodiment, a method for selectively removing metallic contaminants from a substrate surface is provided which includes exposing a substrate to a peroxide clean solution, exposing the substrate to a hydroxide clean solution, and exposing the substrate to a selective etch solution containing potassium iodide, iodine, sulfuric acid, and water during a selective etch process. The substrate generally contains gallium arsenide material, such as crystalline gallium arsenide, and is usually a growth substrate for an epitaxial lift off (ELO) process. The copper or other metallic contaminants disposed on the substrate may be selectively etched at a rate of about 500 times, about 1,000 times, about 2,000 times, or about 4,000 times or greater than the gallium arsenide material.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: May 12, 2015
    Assignee: AWBSCQEMGK, Inc.
    Inventor: Melissa Archer
  • Patent number: 9028747
    Abstract: Water treatment compositions are provided that are effective for mitigating corrosion or fouling of surfaces in contact with aqueous systems. The water treatment compositions can include one or more azole compounds, one or more transition metals, and one or more dispersants, in addition to various other additives. The water treatment compositions can exclude phosphorus and still be effective. Methods for mitigating corrosion or fouling of a surface in an aqueous system are also provided.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: May 12, 2015
    Assignee: Ecolab USA Inc.
    Inventor: Jasbir S. Gill
  • Patent number: 9017487
    Abstract: A method for cleaning a deposition chamber includes forming a deposited layer over an interior surface of the deposition chamber, wherein the deposited layer has a deposited layer stress and a deposited layer modulus; forming a cleaning layer over the deposited layer, wherein a material comprising the cleaning layer is selected such that the cleaning layer adheres to the deposited layer, and has a cleaning layer stress and a cleaning layer modulus, wherein the cleaning layer stress is higher than the deposited layer stress, and wherein the cleaning layer modulus is higher than the deposited layer modulus; and removing the deposited layer and the cleaning layer from the interior of the deposition chamber.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: April 28, 2015
    Assignee: International Business Machines Corporation
    Inventors: Tien-Jen J. Cheng, Zhengwen Li, Keith Kwong Hon Wong
  • Patent number: 9017485
    Abstract: An ice dispensing system includes an ice hopper structure including a plurality of walls having inner surfaces that define an inner volume storing ice therein. The ice hopper may include a drain. A cleaning structure is coupled to the ice hopper structure. The cleaning structure includes a pump linked to a spray mechanism positioned within the inner volume of the ice hopper structure. The spray mechanism disperses a liquid on an inner surface of the ice hopper structure during a cleaning cycle of the ice dispensing mechanism.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: April 28, 2015
    Assignee: Cornelius, Inc.
    Inventors: Vittal Murthy, Jayateertha Malagi, Servesh Adderi Raganath, Matthew Kampert, Chris Zemko
  • Patent number: 9017486
    Abstract: A method for cleaning a deposition chamber includes forming a deposited layer over an interior surface of the deposition chamber, wherein the deposited layer has a deposited layer stress and a deposited layer modulus; forming a cleaning layer over the deposited layer, wherein a material comprising the cleaning layer is selected such that the cleaning layer adheres to the deposited layer, and has a cleaning layer stress and a cleaning layer modulus, wherein the cleaning layer stress is higher than the deposited layer stress, and wherein the cleaning layer modulus is higher than the deposited layer modulus; and removing the deposited layer and the cleaning layer from the interior of the deposition chamber.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: April 28, 2015
    Assignee: International Business Machines Corporation
    Inventors: Tien-Jen Cheng, Zhengwen Li, Keith Kwong Hon Wong
  • Publication number: 20150107631
    Abstract: A liquid processing method is provided for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution. In the intermediate process, an intermediate processing solution having a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution is supplied only to a rear surface of the substrate.
    Type: Application
    Filed: December 23, 2014
    Publication date: April 23, 2015
    Inventors: Takao Inada, Naoyuki Okamura, Hidetsugu Yano, Yosuke Hachiya
  • Publication number: 20150101643
    Abstract: A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent.
    Type: Application
    Filed: December 18, 2014
    Publication date: April 16, 2015
    Inventors: Soichi KUMON, Masanori SAITO, Takashi SAIO, Hidehisa NANAI, Yoshinori AKAMATSU