Using Sequentially Applied Treating Agents Patents (Class 134/26)
  • Patent number: 11878329
    Abstract: A method for cleaning a silicon wafer includes the steps of: supplying hydrofluoric acid onto a surface of the silicon wafer to treat the silicon wafer while rotating at a first rotational rate, stopping the supply of the hydrofluoric acid and shaking off hydrofluoric acid on the surface of the silicon wafer without supplying pure water onto the surface of the silicon wafer while rotating the silicon wafer at a second rotational rate which is the same as or faster than the first rotational rate, and supplying ozone water onto the surface of the silicon wafer to treat the silicon wafer after shaking the hydrofluoric acid off the surface while rotating at a third rotational rate which is faster than the second rotational rate. This method for cleaning a silicon wafer is capable of suppressing adhesion of water marks and particles and enhancing the wafer quality.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: January 23, 2024
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Kensaku Igarashi, Tatsuo Abe
  • Patent number: 11751746
    Abstract: The invention relates to a method of automatic dishwashing, comprising: placing soiled wares inside a cleaning volume; providing a first cleaning composition comprising a bleach and a second cleaning composition different from the first composition; and delivering the first composition and the second composition separately to the cleaning volume to contact the soiled wares, wherein: the first composition is delivered to the cleaning volume as a mist and the second composition is delivered to the cleaning volume as a jet; and the first and second compositions are delivered to the cleaning volume at a temperature below 100° C. The invention also relates to a dishwasher and a kit for use in the inventive method.
    Type: Grant
    Filed: August 4, 2022
    Date of Patent: September 12, 2023
    Assignee: Reckitt Benckiser Finish B.V.
    Inventors: Alberto Buogo, Callum Couser, Frank Dierkes, Jorg Pflug, Karl-Heinz Mohrhard, Caroline Rigobert
  • Patent number: 11682577
    Abstract: The present disclosure relates to a spin head, apparatus and method for treating a substrate including the spin head. The spin head includes a supporting plate where a substrate is placed and a chuck pin placed on the supporting plate and supporting a lateral portion of the substrate, wherein the chuck pin includes an outer body and an inner body inserted in the outer body and provided with a different material from the outer body, wherein each outer body and the inner body is provided with any one of a first material or a second material, and wherein one material of the first material and the second material is provided with a material having lower heat conductivity and better thermal resistance than another one.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: June 20, 2023
    Assignee: SEMES CO., LTD.
    Inventors: Jihwan Lee, Jungbong Choi, Chan Young Heo, Pil Kyun Heo
  • Patent number: 11634669
    Abstract: A nonflammable aerosol composition for washing various types of car/vehicle is of low toxicity, which has little environmental impact in terms of depletion of the ozone layer and so forth, which has a washability as good as or better than conventional products such as has been unattained by aqueous products or high-flash-point products, which permits achievement of appropriate drying characteristics, and which, while preventing erosion of rubbers and resins, causes dirt components to be moistened and washed off and away therefrom by the detergent composition, and which permits accommodation of mechanization by virtue of its being capable of being sprayed thereonto from a roughly constant distance therefrom, said aerosol composition for washing is made to contain (Z)-1-chloro-3,3,3-trifluoropropene and gas propellant which is N2, compressed air, CO2, argon, or a mixture of two or more thereof.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: April 25, 2023
    Assignee: KOBEGOSEI CO., LTD.
    Inventors: Masanobu Miyaoka, Yuuji Miyaoka
  • Patent number: 11600500
    Abstract: A substrate processing method includes forming, by supplying a chemical liquid onto a central portion of a substrate while rotating a rotary table at a first speed, a liquid film of the chemical liquid having a first thickness; forming, by supplying the chemical liquid onto the central portion while rotating the rotary table at a second speed lower than the first speed after the forming of the liquid film having the first thickness, a liquid film of the chemical liquid having a second thickness larger than the first thickness; and heating, by heating the rotary table in a state that the rotary table is rotated at a third speed lower than the second speed or in a state that the rotating of the rotary table is stopped after the forming of the liquid film having the second thickness, the substrate and the liquid film of the chemical liquid.
    Type: Grant
    Filed: July 9, 2021
    Date of Patent: March 7, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kouzou Tachibana, Katsuhiro Morikawa, Kouichi Mizunaga
  • Patent number: 11530391
    Abstract: The present disclosure relates to biological processes and systems for the production of isopropanol and/or acetone utilizing modified alcohol dehydrogenases that exhibit increased activity with NADH as a cofactor. The disclosure further relates to polynucleotides and polypeptides of the modified alcohol dehydrogenases, and host cells containing the polynucleotides and expressing the polypeptides.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: December 20, 2022
    Assignee: BRASKEM S.A.
    Inventors: Verônica Leite Queiroz, Lucas Pedersen Parizzi, Iuri Estrada Gouvea, Debora Noma Okamoto, Rafael Victório Carvalho Guido, Alessandro Silva Nascimento, Igor Polikarpov
  • Patent number: 11445883
    Abstract: The invention relates to a method of automatic dishwashing, comprising: placing soiled wares inside a cleaning volume; providing a first cleaning composition comprising a bleach and a second cleaning composition different from the first composition; and delivering the first composition and the second composition separately to the cleaning volume to contact the soiled wares, wherein: the first composition is delivered to the cleaning volume as a mist and the second composition is delivered to the cleaning volume as a jet; and the first and second compositions are delivered to the cleaning volume at a temperature below 100° C. The invention also relates to a dishwasher and a kit for use in the inventive method.
    Type: Grant
    Filed: April 20, 2017
    Date of Patent: September 20, 2022
    Assignee: Reckitt Benckiser Finish B.V.
    Inventors: Alberto Buogo, Callum Couser, Frank Dierkes, Jorg Pflug, Karl-Heinz Mohrhard, Caroline Rigobert
  • Patent number: 11441104
    Abstract: An aqueous cleaning formulation is provided including a water; an essential oil, wherein the essential oil is selected from the group consisting of lavender oil, rosemary oil, thyme oil and mixtures thereof; a derivative of castor oil having a formula selected from formula I and formula II; an ethoxylated phenol having formula III; and a cleaning surfactant.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: September 13, 2022
    Assignees: Dow Global Technologies, Rohm and Haas
    Inventors: Daniel S. Miller, Andrea C. Keenan, Scott Backer, Edward D. Daugs, Christopher J. Tucker, Robert Butterick
  • Patent number: 11437251
    Abstract: A substrate processing apparatus includes: a substrate holder configured to hold a substrate; a processing liquid supply part configured to supply a processing liquid to the substrate held by the substrate holder; a chemical liquid supply part configured to supply a chemical liquid as a component of the processing liquid to the processing liquid supply part; a pure water supply part configured to supply pure water as a component of the processing liquid to the processing liquid supply part; a low-dielectric constant solvent supply part configured to supply a low-dielectric constant solvent as a component of the processing liquid to the processing liquid supply part; and a controller configured to control a ratio of the chemical liquid, the pure water, and the low-dielectric constant solvent contained in the processing liquid by controlling the chemical liquid supply part, the pure water supply part, the low-dielectric constant solvent supply part.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: September 6, 2022
    Assignee: TOKYO ELECTRON LIMI TED
    Inventor: Hiroki Sakurai
  • Patent number: 11414681
    Abstract: The present invention refers to lambda integrases comprising at least one amino acid mutation at positions 43, 319 and 336 of the lambda integrase as set forth in SEQ ID NO: 1. The invention further refers to nucleic acid molecules comprising the nucleotide sequence encoding the mutant lambda integrase and to host cells containing these nucleic acid molecules. The invention also refers to methods of recombining a nucleic acid of interest into a target nucleic acid in the presence of the mutant lambda integrase and sequence specific recombination kits.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: August 16, 2022
    Assignee: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: Farid Ghadessy, Jia Wei Siau, Peter Droge, Harshyaa Makhija, Shree Harsh Vijaya Chandra, Sabrina Peter
  • Patent number: 11398391
    Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a plurality of holding members and at least a first injector. The plurality of holding members are configured to hold a substrate. The substrate includes a front surface and a back surface opposite to the front surface. The first injector is below the holding members and is configured to face the back surface of the substrate. The first injector is displaced from a projection of a center of the substrate from a top view perspective. A method for processing a substrate is also provided.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: July 26, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Po-Yuan Wang, Tzu Ang Chiang, Jian-Jou Lian, Yu Shih Wang, Chun-Neng Lin, Ming-Hsi Yeh
  • Patent number: 11370999
    Abstract: A formulation having at least one of a product stabilization solvent, a sequestrant or chelating agent, and an alkalinity agent capable of use in a cleaning operation at a reduced temperature. Optionally, the formulation may additionally comprise any one or more of a degreaser emulsifier solvent, a surfactant, a hydrotrope, a stabilizer, a biocide, and a buffer. An additive formulation of the invention, as defined herein, comprises these stated types of compounds and is combined with an alkalinity agent at the time of the formulations use in a reduced temperature dairy equipment cleaning operation. A full formulation of the invention, as defined herein, additionally comprises an alkalinity agent in addition to the other named compounds. In many cases, the full formulations are used in a reduced temperature dairy equipment cleaning operation without being combined with an additional alkalinity agent.
    Type: Grant
    Filed: January 19, 2018
    Date of Patent: June 28, 2022
    Assignee: Diversey, Inc.
    Inventors: Joerg L. Scheufling, Ingo Mistele, Henry Von Rege
  • Patent number: 11358172
    Abstract: Methods for treating substrates are described. The methods comprise the steps of flowing an aqueous liquid medium through a flow channel and at least one outlet slit onto a substrate to be treated and exposing the aqueous liquid medium to UV-radiation of a specific wavelength at least in a portion of the flow channel immediately adjacent the at least one outlet slit and after the aqueous liquid medium has flown through the outlet opening towards the substrate and thus prior to and while applying the aqueous liquid medium to the surface of the substrate to be treated. In one method, the electrical conductance of the aqueous liquid medium is adjusted to be in the range of 20 to 2000 ?S, by the addition of an additive to the aqueous liquid medium, the aqueous liquid medium prior to the addition of the additive having an electrical conductivity below 20 ?S, prior to or while exposing the same to the UV-radiation.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: June 14, 2022
    Assignee: SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
    Inventors: Davide Dattilo, Uwe Dietze, SherJang Singh
  • Patent number: 11312982
    Abstract: The present invention relates to a novel variant RNA polymerase sigma factor 70 (?70) polypeptide, a polynucleotide encoding the same, a microorganism containing the polypeptide, and a method for producing L-threonine by using the microorganism.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: April 26, 2022
    Assignee: CJ CHEILJEDANG CORPORATION
    Inventors: Ji Sun Lee, Kwang Ho Lee, Hyo Jin Kim, Keun Chul Lee, Young Bin Hwang
  • Patent number: 11289880
    Abstract: A light source package structure is provided. The light source package structure includes a substrate, an upper electrode layer, a surrounding wall, a light emitting unit, an adhesive, and a light permeable element. The surrounding wall is annular with step structure and includes an upper tread surface arranged away from the substrate, an upper riser surface connected to an inner edge of the upper tread surface, a lower tread surface disposed at an inner side of the upper riser surface, an accommodating groove disposed between the lower tread surface and the upper riser surface, and a lower riser surface connected to an inner edge of the lower tread surface and arranged away from the upper tread surface. The lower riser surface and the first surface jointly define a receiving space.
    Type: Grant
    Filed: May 7, 2020
    Date of Patent: March 29, 2022
    Assignees: LITE-ON OPTO TECHNOLOGY (CHANGZHOU) CO., LTD., LITE-ON TECHNOLOGY CORPORATION
    Inventors: Wen Lee, Hsiang-Chih Hung, Shu-Hua Yang, Yu-Hung Su
  • Patent number: 11266289
    Abstract: The invention relates to a method of automatic dishwashing of dishware using wash water, in which, in a first step, a first composition, which comprises an oxygen bleach but substantially no enzyme, is supplied to the wash water, and the dishware is washed in a washing zone with the oxygen bleach-containing wash water; and, in a second step which occurs after the first step, a second composition, which comprises an enzyme but substantially no bleach, is supplied to the wash water, and the dishware is washed in said washing zone with the enzyme-containing wash water. The invention also relates to an automatic dishwasher and a cartridge suitable for use in this method.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: March 8, 2022
    Assignee: RECKITT BENCKISER (BRANDS) LIMITED
    Inventors: Caroline Rigobert, Boris Seitz, Karl-Heinz Mohrhard, Frank Dierkes, Karlheinz Ulrich G. Hahn, Jorg Pflug, Judith Preuschen, Pavlinka Roy, Marco Haag, Dietmar Van Loyen, Stuart Campbell, Helmut Lunz
  • Patent number: 11217451
    Abstract: A method includes rotating a substrate, supplying a first processing liquid from a first nozzle to the substrate during a first period, and supplying a second processing liquid from a second nozzle to the substrate during a second period. First and second liquid columns are formed by the first and second processing liquids during at least partially overlapped period of the first and second periods, respectively. The shapes and arrangements of the first and second liquid columns satisfy that: at least one of first and second central axis lines of the first and second liquid columns is inclined with respect to a rotational axis line of the substrate, first and second cut surfaces obtained by cutting the first and second liquid columns along a horizontal plane at least partially overlap each other, and any point on the first central axis line is located on the second central axis line.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: January 4, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hitoshi Kosugi, Shota Umezaki, Kouzou Tachibana, Ryo Yamamoto
  • Patent number: 11155845
    Abstract: According to the present invention, theanine can efficiently be produced without exogenously adding ethylamine and without accumulation or leftover of ethylamine as a byproduct, by using a microorganism having enhanced activity to produce ethylamine with acetaldehyde and alanine as substrates and having enhanced activity of ?-glutamylmethylamide synthetase or glutaminase.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: October 26, 2021
    Assignee: KYOWA HAKKO BIO CO., LTD.
    Inventors: Kazuhiko Tabata, Shoto Ohno
  • Patent number: 11142755
    Abstract: A mutant glutathione synthetase (GSHB) suitable for generating ?-Glu-Val-Gly, and a method for producing ?-Glu-Val-Gly using the same are provided. ?-Glu-Val-Gly is produced by using a mutant GSHB having a mutation at such a position as V7, N13, I14, N15, K17, F22, F95, M165, N199, Y200, P202, I274, T285, and P287.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: October 12, 2021
    Assignee: AJINOMOTO CO., INC.
    Inventors: Ayako Sato, Eri Higashiura, Misato Okamoto, Takayuki Ito, Erika Watanabe, Uno Tagami, Yuki Oda, Tatsuki Kashiwagi, Masayuki Sugiki
  • Patent number: 11136561
    Abstract: The invention relates to a polypeptide for the enzymatic detoxification of zearalenone, said polypeptide being a monooxygenase which converts the keto group in position 7 of zearalenone into an ester group, the monooxygenase in particular being an amino acid sequence selected from the group comprising sequence ID No. 1, 2 and 3 or a functional variant thereof. The functional variant and at least one of the amino acid sequences has a sequence identity of at least 60%, preferably at least 70%, more preferably at least 80% and most preferably 90%.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: October 5, 2021
    Assignee: ERBER AKTIENGESELLSCHAFT
    Inventors: Juan Antonio Torres Acosta, Gerhard Adam, Elisavet Kunz-Vekiru, Wulf-Dieter Moll, Rudolf Mitterbauer, Clemens Schmeitzl
  • Patent number: 11133176
    Abstract: In a substrate processing method, as a liquid film forming process, a liquid film of a processing liquid covering a surface of a substrate W is formed by supplying the processing liquid onto the surface of the substrate W while rotating the substrate W at a first rotation number. After the liquid film forming process, as a supply stopping process, a rotation number of the substrate W is set to be of a value equal to or less than the first rotation number and a supply of the processing liquid onto the substrate W is stopped. After the supply stopping process, as a liquid amount adjusting process, a liquid amount of the processing liquid forming the liquid film is reduced by setting the rotation number of the substrate W to a rotation number larger than the first rotation number.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: September 28, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kento Tsukano, Gentaro Goshi, Takuro Masuzumi, Hiromi Kiyose, Shogo Fukui
  • Patent number: 11124807
    Abstract: Described herein is a method of producing drimenol and/or drimenol derivatives, the method including contacting at least one polypeptide with farnesyl diphosphate (FPP). The method may be performed in vitro or in vivo. Also described herein are amino acid sequences of polypeptides useful in the methods and nucleic acids encoding the polypeptides described. Also described herein are host cells or organisms genetically modified to express the polypeptides and useful to produce drimenol and/or derivatives of drimenol.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: September 21, 2021
    Assignee: Firmenich SA
    Inventors: Pan Li, Qi Wang, Xiu-Feng He, Olivier Haefliger
  • Patent number: 11081334
    Abstract: In some embodiments, the present disclosure relates to a wafer trimming and cleaning apparatus, which includes a blade that is configured to trim a damaged edge portion of a wafer, thereby defining a new sidewall of the wafer. The wafer trimming and cleaning apparatus further includes water nozzles and an air jet nozzle. The water nozzles are configured to apply deionized water to the new sidewall of the wafer to remove contaminant particles generated by the blade. The air jet nozzle is configured to apply pressurized gas to a first top surface area of the wafer to remove the contaminant particles generated by the blade. The first top surface area overlies the new sidewall of the wafer.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: August 3, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tung-He Chou, Sheng-Chau Chen, Ming-Tung Wu, Hsun-Chung Kuang
  • Patent number: 11072717
    Abstract: In the field of consumable materials for automatic analytical instruments, transparent plastic cuvettes having increased scratch resistance and a method for producing same includes contacting exclusively an outer surface of the transparent plastic cuvette with a liquid comprising at least one surfactant or with a triglyceride and subsequently drying the outer surface such that scattered-light optical properties of the transparent plastic are not adversely affected.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: July 27, 2021
    Assignee: Siemens Healthcare Diagnostics Products GmbH
    Inventors: Josef Meindl, Oksana Pryshchepna
  • Patent number: 11069520
    Abstract: A substrate processing method includes: supplying a treatment liquid to a substrate held in a horizontal position; substituting the treatment liquid supplied to the substrate with a solvent having a lower surface tension than the treatment liquid; and drying the substrate by shaking off the solvent on the substrate at a preset rotation number so that an intermediate portion of the substrate located between a central portion and a peripheral portion of the substrate is last dried.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: July 20, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Hiroyuki Suzuki
  • Patent number: 11046935
    Abstract: Intended is to provide a highly practical novel FAD-GDH. A glucose dehydrogenase having the following properties is provided: (1) action: catalyzes the reaction of oxidizing hydroxyl groups of glucose to form glucono-?-lactone in the presence of an electron acceptor; (2) substrate specificity: reactivity to D-xylose is 10% or less when the reactivity to D-glucose is 100%; (3) pH stability: stable at pH 5 to 8; (4) amino acid sequence: including the amino acid sequence set forth in SEQ ID NO: 1, or an amino acid sequence with an identity of 83% or more to the amino acid sequence.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: June 29, 2021
    Assignee: AMANO ENZYME INC.
    Inventors: Kyoichi Nishio, Yuzo Kojima, Shotaro Yamaguchi
  • Patent number: 11049741
    Abstract: Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: June 29, 2021
    Assignee: Elemental Scientific, Inc.
    Inventors: Tyler Yost, Daniel R. Wiederin, Beau Marth, Jared Kaser, Jonathan Hein, Jae Seok Lee, Jae Min Kim, Stephen H. Sudyka
  • Patent number: 11034980
    Abstract: Disclosed herein are engineered cells and cell-free systems, compositions, and methods for conversion of isopentenols to isoprenoid precursors.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: June 15, 2021
    Assignee: Massachusetts Institute of Technology
    Inventors: Steven McBride Edgar, Alkiviadis Orfefs Chatzivasileiou, Valerie Ward, Gregory Stephanopoulos
  • Patent number: 11001745
    Abstract: Compounds, systems and method(s) for removing hydro-carbons from a hydrocarbon-containing reservoir. Various N-alkyl-2-pyrrolidones, such as N-octyl-2-pyrrolidone, alone in hot water or steam, or in conjunction with other surfactants and/or solvents are injected into petroleum reservoirs containing heavy oil or bitumen to accomplish one or more functions: (1) increase rate of petroleum production compared to that produced using steam and/or hot water alone; (2) decrease steam to oil ratio; (3) extend life of a well by recovering more petroleum; (4) recover petroleum from wells that have been declared uneconomic using existing recovery methods; and/or (5) generally increase estimated petroleum reserves by reducing cost of production. The N-alkyl-2-pyrrolidones are most usefully applied in cyclic steam stimulation, steam drive or steam assisted gravity drainage operations after the initial rate of petroleum production has begun to decline.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: May 11, 2021
    Assignee: The Saskatchewan Research Council
    Inventor: Ralph George Jonasson
  • Patent number: 10994311
    Abstract: The disclosure relates to a device for cleaning electronic components and/or circuits. The cleaning device comprises a first vessel containing a liquid, a support for holding the electronic components and/or circuits, a fluid injection system including nozzles allowing the projection of jets of fluid to sweep the surface of the components, and a fluid mixer including a first inlet suitable for receiving a pressurised liquid, a second inlet suitable for receiving a pressurised gas, and an outlet designed to supply the injection system with two-phase fluid. The first inlet is coupled to the outlet by an inner duct, the second inlet is coupled to a pressurised gas supply and to an injector for injecting the gas into the inner duct.
    Type: Grant
    Filed: October 10, 2018
    Date of Patent: May 4, 2021
    Inventor: Michel Bourdat
  • Patent number: 10988751
    Abstract: A method enables olefin compound production with a high productivity, and an enzyme is used in the method. Mutations involving amino acid substitution are introduced into various sites of diphosphomevalonate decarboxylase (MVD) to prepare multiple MVD variants. Then, these variants are evaluated in terms of catalytic activity for producing an olefin compound such as isoprene, and have found as a result that the catalytic activity is improved when serine at position 153 and threonine at position 209 are each substituted with a different amino acid. In addition, the catalytic activity of the variants is further improved when glycine at position 152 is further substituted with a different amino acid.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: April 27, 2021
    Assignees: RIKEN, ZEON CORPORATION, THE YOKOHAMA RUBBER CO., LTD.
    Inventors: Ryoko Orishimo, Tomokazu Shirai, Kazuhiro Takahashi, Misao Hiza, Yusuke Tanabe
  • Patent number: 10968467
    Abstract: The present invention relates to a novel variant RNA polymerase sigma factor 70 (?70) polypeptide, a polynucleotide encoding the same, a microorganism containing the polypeptide, and a method for producing L-threonine by using the microorganism.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: April 6, 2021
    Assignee: CJ CHEILJEDANG CORPORATION
    Inventors: Ji Sun Lee, Kwang Ho Lee, Hyo Jin Kim, Keun Chul Lee, Young Bin Hwang
  • Patent number: 10961548
    Abstract: Mutations involving amino acid substitution were introduced into various sites of diphosphomevalonate decarboxylase (MVD), thus preparing a large number of MVD variants. Then, the variants were each evaluated in terms of a catalytic activity for production of olefin compounds such as isoprene. As a result, it was found that substitution of glycine at position with a different amino acid resulted in improvement in the catalytic activity. In addition, it was found that the MVD in which arginine at position and threonine at position in addition to the position were further substituted with different amino acids, respectively, also had the high catalytic activity.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: March 30, 2021
    Assignees: RIKEN, ZEON CORPORATION, THE YOKOHAMA RUBBER CO., LTD.
    Inventors: Ryoko Orishimo, Tomokazu Shirai, Kazuhiro Takahashi, Misao Hiza, Yusuke Tanabe
  • Patent number: 10934506
    Abstract: The compositions include a methylated siloxane liquid and a solvent comprising at least one of a ketone or ester each having up to six carbon atoms, a halogenated alkane having up to two carbon atoms, tetrachloroethene, 1-chloro-4-trifluoromethyl benzene, or ethane. The compositions can also include hydrocarbon solvent comprising at least one of toluene, xylene, or a saturated hydrocarbon represented by formula CxH2x+y, wherein x is from 5 to 8, and wherein y is 0 or 2 and/or propellant. The method can include applying the composition to a brake system component to clean the brake system component. The method can also include applying a composition including hexamethyldisiloxane to a brake system component to clean the brake system component.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: March 2, 2021
    Assignee: 3M Innovative Properties Company
    Inventor: Jon P. Nietfeld
  • Patent number: 10927496
    Abstract: A method is provided for recovering pulp fibers having little damage from a used absorbent article that contains pulp fibers and a superabsorbent polymer. The used absorbent article is treated at a temperature of greater than or equal to 80° C. with an organic acid aqueous solution having a pH no greater than 2.5, and the superabsorbent polymer is deactivated. Preferably, the pulp fibers and the deactivated superabsorbent polymer are separated from the used absorbent article after treatment with the organic acid aqueous solution, and further, a mixture including the separated pulp fibers and deactivated superabsorbent polymer is treated with an oxidizing agent, the deactivated superabsorbent polymer is decomposed, reduced in molecular weight and solubilized.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: February 23, 2021
    Assignee: UNICHARM CORPORATION
    Inventors: Takayoshi Konishi, Toshio Hiraoka, Koichi Yamaki, Noritomo Kameda
  • Patent number: 10920206
    Abstract: Provided are acidic thermophilic polygalacturonase TePG28A, encoding gene and application thereof. The amino acid sequence thereof is as shown in SEQ ID NO. 1 or SEQ ID NO. 2. The expressed acidic thermophilic polygalacturonase by means of cloning has advantages such as high enzyme activity and high stability; can adapt to the high temperature environment in the industrial production; has better application prospect; and can effectively degrade pectic substances such as polygalacturonic acid and pectin; and can be effectively applied to the industrial field of feed, food, and textile, etc.
    Type: Grant
    Filed: December 15, 2016
    Date of Patent: February 16, 2021
    Assignee: FEED RESEARCH INSTITUTE, CHINESE ACADEMY OF Agricultural Sciences
    Inventors: Bin Yao, Huiying Luo, Yeqing Li, Yuan Wang, Tao Tu, Huoqing Huang, Yingguo Bai, Yaru Wang, Xiaoyun Su
  • Patent number: 10910213
    Abstract: A low surface tension liquid is supplied from a low surface tension liquid supplying unit to a heated substrate to replace a processing liquid by the low surface tension liquid. The heating of the substrate is weakened and the low surface tension liquid is supplied from the low surface tension liquid supplying unit to the substrate, so that a liquid film of the low surface tension liquid is formed. The liquid film on the substrate is removed by strengthening the heating of the substrate without supplying the low surface tension liquid from the low surface tension liquid supplying unit to a central region of the substrate.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: February 2, 2021
    Inventors: Tetsuya Emoto, Atsuro Eitoku, Tomomi Iwata
  • Patent number: 10892176
    Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a substrate holder, a top plate portion, a gas supply unit, and an arm. The substrate holder holds a substrate. The top plate is installed to face the substrate held on the substrate holder, and has a through hole formed therethrough at a position facing the center of the substrate. The gas supply supplies an atmosphere adjustment gas to a space between the substrate holder and the top plate. The processing liquid nozzle ejects a liquid to the substrate. The arm holds the processing liquid nozzle and moves the processing liquid nozzle between a processing position where the processing liquid is ejected from the processing liquid nozzle through the through hole and a standby position outside the substrate.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: January 12, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yoshinori Ikeda, Shota Umezaki, Kenji Nishi
  • Patent number: 10865393
    Abstract: Disclosed herein are glucosyltransferases with modified amino acid sequences. Such engineered enzymes exhibit improved alpha-glucan product yields and/or lower leucrose yields, for example. Further disclosed are reactions and methods in which engineered glucosyltransferases are used to produce alpha-glucan.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: December 15, 2020
    Assignee: DUPONT INDUSTRIAL BIOSCIENCES USA, LLC
    Inventors: Yougen Li, Ellen D. Semke, Qiong Cheng, Jian Ping Lai
  • Patent number: 10840083
    Abstract: Provided is a substrate cleaning method for cleaning a substrate having an oxide film on the surface thereof. The method includes a partial etching step of etching the oxide film to a predetermined film thickness, and a physical cleaning step of executing physical cleaning on the surface of the substrate after the partial etching step. The oxide film may be a natural oxide film with particles at least partially taken into the film. In this case, the partial etching step may either expose the particles from the natural oxide film or increase the exposed portion from the natural oxide film. The physical cleaning may remove, by physical action, the particles exposed from the natural oxide film while leaving the natural oxide film on the surface of the substrate.
    Type: Grant
    Filed: September 4, 2017
    Date of Patent: November 17, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Ayumi Higuchi, Kana Komori
  • Patent number: 10835885
    Abstract: The invention relates to a method for producing microcapsules, comprising the following steps: (a) providing a first aqueous preparation containing at least one prepolymer; (b) providing a second non-aqueous preparation containing the active substance to be encapsulated; (c) mixing the aqueous and the non-aqueous phases in the presence of at least one emulsifier and/or stabilizer in order to form an emulsion; (d) polymerizing the at least one prepolymer contained in the emulsion from step (c) in order to obtain a dispersion of microcapsules that enclose the active substance; (e) hardening and cross-linking the microcapsules obtained in step (d); and optionally (f) removing the microcapsules from the dispersion and drying the microcapsules, the method being characterized in that the emulsion is formed in the presence of at least one 1,2-diol in step (c).
    Type: Grant
    Filed: April 22, 2017
    Date of Patent: November 17, 2020
    Assignee: Symrise AG
    Inventors: Benjamin Rost, Ralf Bertram, Daniela Gregor, Jan Peter Ebbecke, Sabine Lange
  • Patent number: 10829746
    Abstract: A bacterium of the species Corynebacterium glutamicum has the ability to excrete L-lysine, and contains in its chromosome a polynucleotide encoding a mutated polypeptide having the assumed function of an acyltransferase, hydrolase, alpha/beta hydrolase or of a pimeloyl-ACP methyl ester esterase. Also, a method is used for producing L-lysine using such bacterium.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: November 10, 2020
    Assignee: Evonik Operations GmbH
    Inventors: Frank Schneider, Georg Thierbach, Kornelia Voß, Thomas Bekel
  • Patent number: 10752800
    Abstract: Provided is a latex-based composition capable of being applied to a surface to form a strippable coating on the surface that can encapsulate substances. The composition may include a latex polymer component and an anti-freeze component, and have a viscosity of less than or equal to about 90 cP. The composition may be delivered as an aerosol spray or a misting agent.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: August 25, 2020
    Assignee: Tru BLOC LLC
    Inventors: Thomas J. Nachtman, John A. Kelton
  • Patent number: 10682656
    Abstract: Wash hood for washing contaminants from heat exchange media, and a method of washing media. The wash hood may include a housing containing a flow distributor such as a perforated member that facilitates uniform dispersing of fluid from the wash hood. The wash hood may include a fluid inlet for connection to a fluid source, such as water under pressure, and an outlet for dispersing or spraying the water towards the media to be cleaned.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: June 16, 2020
    Assignee: Durr Systems, Inc.
    Inventors: Justin Peterson, Timothy Golden
  • Patent number: 10665479
    Abstract: A substrate processing apparatus includes a rotating unit rotating a substrate around a predetermined first rotational axis passing through a central portion of a major surface of the substrate, a nozzle provided to be circumrotatable around a predetermined second rotational axis, discharging a processing fluid toward the major surface of the substrate, and having a plurality of discharge ports disposed at positions separated from the second rotational axis, a processing fluid supplying unit supplying the processing fluid to the plurality of discharge ports, and a nozzle moving unit moving the nozzle between a central portion processing position and a peripheral edge portion.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: May 26, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Akio Hashizume
  • Patent number: 10573523
    Abstract: A substrate processing device includes: a substrate holding member which horizontally holds a substrate; a first supply unit which has a first opening opposed to a lower surface of the substrate held by the substrate holding member and supplies fluid from the first opening toward the lower surface of the substrate; an opposing part having an upper surface opposed to the lower surface of the substrate held by the substrate holding member; and a second supply unit which supplies rinsing liquid from a second opening to a concave surface which is recessed on a central side in the upper surface of the opposing part. A height of the first opening is higher than a height of a liquid surface, of the rinsing liquid supplied to the concave surface, when the rinsing liquid overflows the opposing part. Therefore, the opposing part can be highly accurately cleaned.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: February 25, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Noriyuki Kikumoto
  • Patent number: 10552557
    Abstract: The present invention relates to freshening compositions and devices comprising same that comprise a composition having a viscosity of from about 1 mPa·s to about 50,000 mPa·s comprising malodor reduction compositions and methods of making and using such compositions. The disclosed malodor reduction compositions do not unduely interfere with the scent of the freshening compositions and devices that comprise such technologies and the perfumed or unperfumed situs that is treated with such freshening compositions and devices.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: February 4, 2020
    Assignee: The Procter & Gamble Company
    Inventors: Gayle Marie Frankenbach, Judith Ann Hollingshead, Steven Anthony Horenziak
  • Patent number: 10459353
    Abstract: The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: October 29, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu, Chia-Hao Yu, Shih-Ming Chang, Anthony Yen
  • Patent number: 10446416
    Abstract: A method for drying wafer-shaped articles comprises rotating a wafer-shaped article of a predetermined diameter on a rotary chuck, and dispensing a drying liquid onto one side of the wafer-shaped article. The drying liquid comprises greater than 50 mass % of an organic solvent. During at least part of the dispensing step, the wafer-shaped article is heated with a heating assembly. During at least part of the dispensing step a fluorine-containing compound is present in the drying liquid or in a gas that surrounds the drying liquid as the drying liquid contacts the wafer-shaped article.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: October 15, 2019
    Assignee: LAM RESEARCH AG
    Inventors: David Mui, Nathan Musselwhite, Michael Ravkin
  • Patent number: 10406568
    Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: September 10, 2019
    Assignee: International Test Solutions, Inc.
    Inventors: Alan Humphrey, Jerry Broz, James H. Duvall