With Work Or Work Parts Movable During Treatment Patents (Class 134/32)
  • Patent number: 10495161
    Abstract: Example methods and apparatus to perform brake sweeping procedures on vehicle brakes are described herein. An example apparatus includes a controller to determine when a vehicle has made a turn, compare an angle at which the vehicle has turned to an angle threshold, and schedule a brake sweeping procedure based on the comparison.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: December 3, 2019
    Assignee: FORD GLOBAL TECHNOLOGIES, LLC
    Inventors: Thomas Salmon, Alex James, Bang Kim Cao, Donald A. Perlick
  • Patent number: 10141205
    Abstract: An apparatus and method for cleaning semiconductor wafer are provided. The apparatus includes a brush module, a swing arm, a rotating actuator and an elevating actuator. The brush module has a brush head for providing mechanical force on a surface of a wafer. An end of the swing arm mounts the brush module. The rotating actuator is connected with the other end of the swing arm. The rotating actuator drives the swing arm to swing across the whole surface of the wafer, which brings the brush head moving across the whole surface of the wafer. The elevating actuator is connected with the other end of the swing arm. The elevating actuator drives the swing arm to rise or descend, which brings the brush module rising or descending. The apparatus cleans the semi-conductor wafer by means of the brush head, which improves the cleaning effect.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: November 27, 2018
    Assignee: ACM Research (Shanghai) Inc.
    Inventors: Xi Wang, Cheng Cheng, Jun Wu, Hui Wang
  • Patent number: 9873074
    Abstract: A cleaning system and method of cleaning filters that removes the ash in the plugged regions is disclosed. The filter is subjected to vibrations, which serve to loosen trapped and packed retentate from the filter. The loosened retentate is then captured by a collection bin. The cleaning system can be integral with the intended application, such as within an automobile. In another embodiment, the cleaning system is a separate cleaning station, where the filter is removing from its intended application, cleaned, and then reinstalled.
    Type: Grant
    Filed: May 1, 2015
    Date of Patent: January 23, 2018
    Assignee: CTS Corporation
    Inventors: Alexander Sappok, Leslie Bromberg
  • Patent number: 9631511
    Abstract: An engine wash system includes a manifold for delivering wash liquid to an engine. The manifold includes an internal engine contour segment shaped to correspond with at least a portion of the engine case at the inlet; a wash delivery segment connected to the internal engine contour segment which follows the engine case curvature in an axial direction and hooks around an outside of the engine case at the inlet; an inlet on the wash delivery segment to receive wash fluid; a nozzle on the wash delivery portion directed to spray into the compressor inlet of the engine; and a guide extending from the pipe and shaped to align the manifold with respect to the engine so that the nozzle sprays into the engine aft of the inlet particle separator.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: April 25, 2017
    Assignee: EcoServices, LLC
    Inventors: Robert M. Rice, Kurt Dorshimer, Sebastian Nordlund, Wayne Zadrick
  • Patent number: 9629701
    Abstract: An endodontic instrument servicing system may comprise a socket-forming member that may include spaced wall members that define a socket. An at least partially open-cell foam body may be secured within the socket that is configured for cleaning contaminated instruments. The body may have an indentation force deflection greater than 120 pounds force (lbf) and be configured to substantially grip a rotating contaminated instrument in contact with the body without tearing the foam body.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: April 25, 2017
    Assignee: Jordco, Inc.
    Inventors: Hal J. Oien, James B. Johnsen
  • Patent number: 9579695
    Abstract: A substrate cleaning apparatus according to an exemplary embodiment of the present disclosure includes a cleaning body head unit, a first load detection unit, and a buoyancy imparting unit. In the cleaning body head unit, a cleaning body, a shaft configured to support the cleaning body, a rotating mechanism configured to rotate the shaft, and a base member are integrally retained by a base member. The first load detection unit includes one end connected to the base member of the cleaning body head unit to detect the load received from the cleaning body head unit. The buoyancy imparting unit is connected to the other end of the first load detection unit and imparts buoyancy to the cleaning body head unit via the first load detection unit.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: February 28, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Kohei Mori, Hirokazu Tanaka
  • Patent number: 9440359
    Abstract: A gripping device is described and includes a holder including a base and a conformable jamming element that has a conformable releasable surface-adhesive element secured onto its surface.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: September 13, 2016
    Assignee: GM Global Technology Operations LLC
    Inventors: John Patrick Spicer, Jianying Shi
  • Patent number: 9122177
    Abstract: Provided is a method and apparatus for cleaning a photomask. The photomask including a first region and a second region surrounding the first region, a pattern to be protected disposed on the first region, and a material to be removed exists on the second region. A cleaning liquid is sprayed from an inside region of the second region toward an outer region of the second region to remove the material, and a gas is blown from the first region toward the second region to protect the pattern.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: September 1, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yun-song Jeong, Hyung-ho Ko, Sung-jae Han, Kyung-noh Kim, Chan-uk Jeon
  • Patent number: 9103286
    Abstract: Methods and systems are provided for use of a windshield wiper fluid having a reformulated composition including one or more non-ionic surfactants. The fluid is delivered to the windshield in response to an operator demand for wiping the windshield. The same fluid is also delivered to a cylinder in response to an indication of abnormal cylinder combustion.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: August 11, 2015
    Assignee: Ford Global Technologies, LLC
    Inventors: David Karl Bidner, Ross Dykstra Pursifull, Gopichandra Surnilla, Mark Allen Dearth
  • Patent number: 9023155
    Abstract: An engine wash system for delivering wash liquid to an engine with a lift fan and a main engine, the lift fan including a plurality of inlet guide vanes and a nose cone, and the main engine connected to the lift fan by a shaft, the engine wash system includes a lift fan manifold to deliver wash liquid to the lift fan; and a main engine manifold to deliver wash liquid to the main engine, wherein the lift fan manifold and the main engine manifold can deliver the wash liquid simultaneously.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: May 5, 2015
    Assignee: EcoServices, LLC
    Inventors: Kurt Dorshimer, Robert M. Rice, Sebastian Nordlund, Wayne Zadrick
  • Publication number: 20150090295
    Abstract: In some embodiments, apparatus and methods are provided for improved handling of lithography masks including a mask inverter that includes a first contact pad dedicated to inverting masks that have not been cleaned; a second contact pad dedicated to inverting masks that have been cleaned; an actuator coupled to the first and second contact pads and operable to invert the first and second contact pads; and a controller coupled to the actuator and operative to control the actuator. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150090294
    Abstract: In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
    Type: Application
    Filed: September 27, 2014
    Publication date: April 2, 2015
    Inventors: Edward Ng, Jeffrey C. Hudgens, Ayan Majumdar, Sushant S. Koshti
  • Publication number: 20150090303
    Abstract: A system includes a plurality of nozzles, a pump configured to pump a fluid through the nozzles, and a manifold configured to arrange the plurality of nozzles to substantially match a shape of a workpiece. Each nozzle of the plurality of nozzles is configured to impinge upon a section of the workpiece with the fluid.
    Type: Application
    Filed: September 28, 2013
    Publication date: April 2, 2015
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Jonathan Matthew Lomas, Michelle Fullerton Simpson
  • Patent number: 8980010
    Abstract: In a piezoelectric device, a first electrode and a second electrode are disposed to be opposed to each other on plate surfaces of the piezoelectric device, a first electrode plane of the piezoelectric device is fixedly bonded to a plate surface of a vibrating plate, a piezoelectric material forming the piezoelectric device is polarized in a direction parallel to the first electrode plane, the piezoelectric device is fixed to a base through a second electrode plane of the piezoelectric device, and the piezoelectric device generates a thickness-shear vibration with the fixed second electrode plane being a reference plane. The piezoelectric vibration generated by the piezoelectric device generates a flexural vibration in the vibrating plate, to thereby remove dust adhering to a surface of the vibrating plate.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshihiro Ifuku, Tatsuo Furuta, Hiroshi Saito, Kenichi Takeda
  • Patent number: 8974604
    Abstract: A sewer pipe is cleaned of collected solids by providing a water supply hose at a first location on the pipe and by driving a jet nozzle head to a second location along the pipe using jets directed along the pipe. At the second location the head is changed for a second head attached to a cable and is pulled back to the first location by the hose. The nozzle is then pulled back to the second location by pulling the cable while nozzles directed along the pipe toward the second location drive the solids forwardly to the second location for extraction.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: March 10, 2015
    Inventor: Slawko Morris Baziuk
  • Patent number: 8968484
    Abstract: Provided is a method of manufacturing a magnetic recording mediums comprising employing a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and drying the substrates, the lifting and drying device including: a hanger mechanism that is inserted through the central hole of the substrates and supports a plurality of the substrates while being hung thereon; an elevation mechanism that elevates the hanger mechanism between a position where the substrates are immersed into the cleaning liquid inside the cleaning tank and a position where the substrates are lifted from the cleaning tank; and an ejection mechanism that is disposed in the cleaning tank and ejects the cleaning liquid from the downside of the hanger mechanism toward the substrate.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: March 3, 2015
    Assignee: Showa Denko K.K.
    Inventors: Ryuji Sakaguchi, Ryo Tanaka, Norio Oshima
  • Publication number: 20150053242
    Abstract: The cleaning method includes a cleaning step of, in a state in which an upper cleaning liquid 3 is spouted downward from an upper nozzle 2 arranged on an upper side of a work 10 and a lower cleaning liquid 5 is spouted upward from a lower nozzle 4 arranged on a lower side of the work 10, cleaning at least an upper surface of the work 10 among the upper surface of the work and an outer peripheral surface 10b of the work 10 with the upper cleaning liquid 3 and cleaning a lower surface 10c of the work 10 with the lower cleaning liquid 5 by relatively moving the work 10 in a horizontal direction with respect to both the upper nozzle 2 and the lower nozzle 4.
    Type: Application
    Filed: May 17, 2011
    Publication date: February 26, 2015
    Inventors: Tomohiro Watanabe, Michiya Sunazuka, Tutomu Yanagawa
  • Patent number: 8956465
    Abstract: [Problem] To provide a liquid processing method with which, while alleviating a watermark occurring in the surface of a substrate, it is possible to hydrophobize the surface using a hydrophobing gas. [Solution] A substrate (W), retained in substrate retaining parts (21, 22, 23), is rotated and has a liquid compound supplied to the surface thereof, whereby a liquid process is carried out. Next, a rinse liquid is supplied to the surface of the substrate (W) while the substrate (W) is rotated, and the liquid compound is replaced with the rinse liquid. Next, supplying a hydrophobing gas for hydrophobizing the surface of the substrate (W) and supplying the rinse liquid to the surface of the substrate (W) after supplying the hydrophobing gas are repeated alternately, thus hydrophobizing the substrate (W). Next, the rinse liquid is removed by rotating the substrate (W), drying the substrate (W).
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: February 17, 2015
    Assignee: Tokyo Electron Limited
    Inventor: Jun Nonaka
  • Patent number: 8940101
    Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: January 27, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Beung-Hwa Jeong, Kwang-Nam Kim, Gyoo-Chul Jo
  • Patent number: 8940100
    Abstract: Cleaning of a hot dip galvanized steel sheet is conducted by bringing a strip-shaped steel sheet which was treated by surface oxidation in advance into contact with a cleaning liquid for 1 second or more, and then bringing the hot dip galvanized steel sheet into contact with pure water, while continuously transferring the hot dip galvanized steel sheet. The method allows efficiently and fully washing off the acidic solution adhered to the surfaces of the hot dip galvanized steel sheet treated by surface oxidation. The invention also provides an apparatus for cleaning the hot dip galvanized steel sheet to carry out the above cleaning method.
    Type: Grant
    Filed: January 22, 2007
    Date of Patent: January 27, 2015
    Assignee: JFE Steel Corporation
    Inventors: Satoshi Yoneda, Takahiro Sugano
  • Patent number: 8940102
    Abstract: Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: January 27, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Neil Joseph Greeley, Dan Millward, Wayne Huang
  • Patent number: 8932407
    Abstract: A substrate cleaning method is used for performing scrub cleaning of a surface of a substrate. The substrate cleaning method includes rotating a roll cleaning member and a substrate respectively in one direction while keeping the roll cleaning member in contact with the substrate in a cleaning area, and supplying a cleaning liquid to a surface of the substrate to scrub-clean the surface of the substrate in the presence of the cleaning liquid in the cleaning area. The cleaning liquid is supplied initially to an inverse-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively high, and thereafter to a forward-direction cleaning area of the cleaning area where the relative rotational velocity between the roll cleaning member and the substrate is relatively low while the substrate makes one revolution on a central axis thereof.
    Type: Grant
    Filed: May 14, 2013
    Date of Patent: January 13, 2015
    Assignee: Ebara Corporation
    Inventor: Tomoatsu Ishibashi
  • Patent number: 8920571
    Abstract: The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: December 30, 2014
    Assignee: Entegris, Inc.
    Inventor: Briant Enoch Benson
  • Patent number: 8911561
    Abstract: A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across the substrate towards the edge of the disc, onto the rotated disc, supplying a first gas flow through a first gas supply port onto the disc article to an area whose center has a distance to the center of rotational movement of not more than 20 mm, the area being covered with a liquid layer thereby opening the liquid layer at a discrete area, and supplying a second gas flow through a second gas supply port moved across the substrate towards the edge of the substrate onto the rotated disc wherein the distance of the second gas supply port to the center is lower than the distance of the liquid supply port to the center.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: December 16, 2014
    Assignee: Lam Research AG
    Inventors: Harald Kraus, Axel Wittershagen
  • Publication number: 20140360976
    Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a method for processing a substrate is described. The method includes transferring a substrate to a tank, positioning the substrate between two cylindrical rollers disposed in the tank, moving each of the two cylindrical rollers into a first position where a processing surface of each of the cylindrical rollers contacts major surfaces of the substrate, processing the substrate by providing relative motion between at least one of the two cylindrical rollers and the substrate, moving each of the two cylindrical rollers to a second position that is spaced apart from the major surfaces of the substrate, the second position including contacting the processing surface with a conditioning device, and transferring the substrate out of the tank while conditioning the processing surface.
    Type: Application
    Filed: August 26, 2014
    Publication date: December 11, 2014
    Inventors: Sen-Hou KO, Lakshmanan KARUPPIAH
  • Patent number: 8906165
    Abstract: In a substrate processing method according to the present invention, a substrate is first processed using a chemical liquid. Next, the substrate is rinsed by supplying a rinsing liquid thereto while the substrate is being rotated. Thereafter, the substrate is dried while the substrate is being rotated. The drying of the substrate includes reducing a rotating speed of the substrate to a first rotating speed lower than that of the substrate during the rinsing of the substrate, while supplying the rinsing liquid to a central portion of the substrate; moving, from the central portion of the substrate toward a peripheral edge portion thereof, a rinsing liquid supply position to which the rinsing liquid is supplied, after the rotating speed of the substrate has been reduced to the first rotating speed; and supplying a drying liquid to the substrate, after the rinsing liquid supply position has been moved.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: December 9, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Teruomi Minami, Naoyuki Okamura, Hirotaka Maruyama, Yosuke Kawabuchi
  • Patent number: 8906163
    Abstract: A method of operating one or more back end circuits of a plasma processing system, comprising: prior to a front end module receiving one or more wafers to be processed, receiving preliminary data at a back end circuit, wherein the preliminary data indicates a recipe and a predetermined number, the predetermined number indicating a number of wafers to be processed; determining whether a plasma processing chamber is ready for processing; and if the chamber is ready for processing and via the back end circuit, selecting a load lock, based on the predetermined number, instructing the front end module to pull the one or more wafers into the load lock, enabling the chamber to process a first wafer of the one or more wafers according to the recipe, and subsequent to the processing of the first wafer, instructing the front end module to remove the first wafer from the chamber.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: December 9, 2014
    Assignee: Lam Research Corporation
    Inventors: Chung-Ho Huang, Cheng-Chieh Lin
  • Patent number: 8900373
    Abstract: A method of cleaning containers in a container cleaning machine, in which the containers are moved in receptacles to a cleaning area, where both the containers and the receptacles are at least partially submerged in a dipping bath of liquid cleaning medium. The containers are positioned such that closed portions of the containers are at an equivalent or higher vertical position than mouth portions of the containers. A nozzle arrangement is used to produce a jet of a cleaning medium which impinges the interior of a corresponding container. The jet has a force which is insufficient to move the container from its resting position in its corresponding container receptacle.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: December 2, 2014
    Assignee: KHS GmbH
    Inventors: Bernd Molitor, Klaus Jendrichowski
  • Publication number: 20140338702
    Abstract: A device for washing an array plate having an array of liquid droplets adhered thereto is described. The array of liquid droplets is covered with a hydrophobic medium immiscible with the array of liquid droplets. The device includes a mechanism for draining the hydrophobic medium from the array plate; a mechanism for providing an aqueous wash liquid over the array plate; a mechanism for shaking the array plate in a presence of the aqueous wash liquid; and a mechanism for removing the aqueous wash liquid from the array plate. A method for washing an array plate is also described.
    Type: Application
    Filed: July 22, 2014
    Publication date: November 20, 2014
    Inventors: Namyong KIM, Li LI
  • Patent number: 8888925
    Abstract: A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: November 18, 2014
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Masanobu Sato, Hiroyuki Yashiki, Mai Yamakawa, Takayoshi Tanaka, Ayumi Higuchi, Rei Takeaki
  • Patent number: 8882930
    Abstract: Provided is a method including the steps of: carrying out a storage process by causing a processing jig, which has a supply opening for supplying a first processing liquid, to be positioned such that a storage space section into which the supply opening is open is sandwiched by the processing jig and the process-target surface, and by storing the first processing liquid in the storage space section; and carrying out a rotation process by supplying the first processing liquid onto the process-target surface from the supply opening, while supplying a second processing liquid onto the outer peripheral part, in a state where the process-target object is being rotated, in the step for carrying out the rotation process, the processing jig being moved along a direction which is not a direction along which the process-target object is being rotated.
    Type: Grant
    Filed: June 2, 2011
    Date of Patent: November 11, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Atsushi Miyanari
  • Patent number: 8882927
    Abstract: Methods and apparatus are provided for vehicle windshield washing-wiping and wiper de-icing. Primary nozzles provide washing fluid to the windshield during normal operations and secondary nozzles bathe the wiper arms with washing fluid to de-ice the wipers during a de-icing mode. Washing fluid is drawn from a reservoir and delivered to the nozzles by a pump. When the outside air temperature T is greater than Tc, the critical temperature for ice formation, the wipers and washing-wiping proceed normally with washing fluid delivered to the primary nozzles for windshield washing. When T?Tc and the wipers are not moving, a washer fluid supply line valve delivers washing fluid to the secondary nozzles to de-ice the wipers. The wiper motor, washing fluid pump and valve are operated by a controller based on inputs from wiper position and air temperature sensors, using predetermined information stored in on-board memory.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: November 11, 2014
    Assignee: GM Global Technology Operations LLC
    Inventors: Carl E. Fonville, Michael A. Karram
  • Patent number: 8876981
    Abstract: A method of collecting cut hair is disclosed. The steps include providing a vacuum source and a filter assembly having a top piece, a bottom piece, and a filter member. The assembly has a generally circular perimeter. A vacuum is applied to the assembly interior, and the cut hairs are moved through the aperture and into the assembly. The cut hairs are circulated in a collecting vortex and collected on the filter member.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: November 4, 2014
    Assignee: Surgical Site Solutions, Inc.
    Inventor: Larry H. Panzer
  • Patent number: 8865263
    Abstract: Compositions and methods for reduction in adhesion between wet paper web and roll surfaces in papermaking process are disclosed. The method is particularly useful for improvements in press section roll release.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: October 21, 2014
    Assignee: Solenis Technologies, L.P.
    Inventors: Davit E. Sharoyan, Tien-Feng Ling, Scott T. Schnelle
  • Patent number: 8864912
    Abstract: Internal cleaning of inverted cans includes engaging a can's cylindrical wall with a wall-conforming vacuum or adhesive gripper, causing a spraying unit to travel axially in and out of the can's opening while the can is inverted on a circular conveyor, and using a supporting arm or bottom stop to subject the can to a counterforce against a flushing force from sprayed cleaning medium. This prevents the can from being pressed out of a receptacle in which it sits during cleaning.
    Type: Grant
    Filed: May 7, 2010
    Date of Patent: October 21, 2014
    Assignee: KHS GmbH
    Inventors: Timo Jakob, Steffen Kappel, Thomas Stolte
  • Patent number: 8858724
    Abstract: A collapsible and transportable automated carwash includes a bay with a collapsible frame. The collapsible frame has a plurality of collapsible cross-members. The collapsible cross-members are on the bottom and top of the frame connecting the left side of the collapsible frame to the right side of the collapsible frame. The plurality of collapsible cross-members allows the collapsible frame to collapse and reduce the width of the carwash. Whereby, the collapsible and transportable automated carwash is transportable.
    Type: Grant
    Filed: February 1, 2013
    Date of Patent: October 14, 2014
    Inventor: Nathaniel Black, Jr.
  • Patent number: 8845815
    Abstract: Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: September 30, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Terufumi Wakiyama
  • Patent number: 8834637
    Abstract: There is provided a biochemical analyzer and a method of cleaning fluid components of the same. The biochemical analyzer includes a reagent adding mechanism, a sample adding mechanism, at least one reaction cup, a cleaning mechanism and a waste pipeline connected to the cleaning mechanism. A control system is employed, wherein the control system has a cleaning mode for cleaning fluid components of the biochemical analyzer, having: a) a water injection step; and b) a water discharge. With the cleaning method, the fluid components such as the water drawing device and waste valve on the waste pipeline may be automatically cleaned without manual intervention.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: September 16, 2014
    Assignee: Shenzhen Mindray Bio-Medical Electronics Co., Ltd.
    Inventors: Jiang Xueping, Zhang Tao, Shi Xueyuan
  • Publication number: 20140251387
    Abstract: A filter cleaning device includes a cleaning chamber operable to receive a gas filter to be cleaned, the cleaning chamber having an inlet through which a gas flow can be admitted and an outlet for gas flow leaving the cleaning chamber, the inlet and outlet being arranged such that the airflow is forced to pass through at least a part of the filter when inserted, the filter cleaning device further comprising a mechanical agitation arrangement operable, in one mode of operation, to generate a linear oscillation along an axis of the filter when inserted and, in another mode of operation, to rotate the filter about an axis of rotation.
    Type: Application
    Filed: October 3, 2012
    Publication date: September 11, 2014
    Inventors: John Royce, John Cannon, Roger Turner
  • Patent number: 8815111
    Abstract: The substrate treatment method is for treating a substrate with a chemical liquid in a treatment chamber. The method includes a higher temperature chemical liquid supplying step, and a rinse liquid supplying step after the higher temperature chemical liquid supplying step. The rinse liquid supplying step includes: a peripheral edge portion treating step of supplying the rinse liquid selectively onto a center portion of the front surface of the substrate so that a chemical liquid treatment is inhibited on the center portion while being allowed to proceed on a peripheral edge portion of the front surface of the substrate; and an entire surface rinsing step of spreading the rinse liquid over the entire front surface of the substrate to replace the chemical liquid with the rinse liquid on the entire front surface of the substrate after the peripheral edge portion treating step.
    Type: Grant
    Filed: September 8, 2011
    Date of Patent: August 26, 2014
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Kazuki Nakamura
  • Patent number: 8808465
    Abstract: This disclosure dramatically extends by a factor of 5 to 7, the effective service-life of steel shaving blades by chelating mineral molecules in common tap water, thus preventing them from accumulating and attaching to the blade surfaces.
    Type: Grant
    Filed: June 6, 2013
    Date of Patent: August 19, 2014
    Inventor: James Ronald Darnall
  • Patent number: 8808459
    Abstract: A method for cleaning a post-sputter flat media disk, comprises submerging the disk in a wet conveyor containing a liquid, loading the disk onto a spindle of a spindle system, rotating the disk, engaging the disk on both sides with a pair of rollers such that the disk is wiped on both sides at a disk-roller interface due to the motion of the spindle system, and dispensing a slurry at the disk-roller interface.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: August 19, 2014
    Assignee: WD Media, LLC
    Inventors: Noel A. Guiriba, Curtis L. Westerfield
  • Patent number: 8795436
    Abstract: A cleaning liquid is pressurized and superheated to a condition, in which temperature of the cleaning liquid is above an atmospheric boiling point. A product to be cleaned is interposed between a pair of liquid holding blocks, so that gaps are respectively formed between side surfaces of the product and the liquid holding blocks. The pressurized and superheated liquid is injected to the product so that layers of condensate of vapor of injected cleaning liquid are formed in the gaps. Contamination on the surface of the product is removed by the cleaning liquid and the surface is dried by latent heat of the condensate of the vapor of the cleaning liquid.
    Type: Grant
    Filed: July 18, 2011
    Date of Patent: August 5, 2014
    Assignee: Denso Corporation
    Inventor: Keita Yanagawa
  • Patent number: 8793898
    Abstract: A method for drying substrates using isopropyl alcohol (IPA) includes: a pre-stage in which heated fluid is injected to a bottom surface of a substrate to raise a temperature of the substrate simultaneously to injection of an organic solvent to a top surface of the substrate and injection of a dry gas to the top surface thereof to improve a vaporization power of the organic solvent; and a final stage in which the injection of the heated fluid is stopped and the organic solvent and the dry gas are injected to the top surface of the substrate.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: August 5, 2014
    Assignee: Semes Co., Ltd.
    Inventors: Young-Ju Jeong, Bok-Kyu Lee, Sun-Kyu Hwang, Jeong-Yong Bae, Soo-Bin Yong
  • Patent number: 8790467
    Abstract: An apparatus for cleaning an article may include a cleaning head. The cleaning head may have a lower edge and may include an annular steam chamber and a steam nozzle. The annular steam chamber may define a vacuum chamber that may be configured to receive the article therewithin. The annular steam chamber may have a plurality of discrete apertures positioned in vertically spaced relation to the lower edge. The steam nozzle may be configured to provide steam to the annular steam chamber for discharge through the apertures into the vacuum chamber.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: July 29, 2014
    Assignee: The Boeing Company
    Inventor: Sergey G. Ponomarev
  • Patent number: 8784570
    Abstract: Method for cleaning a steam nozzle (7) of a beverage preparation machine comprising a rinsing container (12) having a top opening (22) and a draining device (23) for evacuating the liquid contained therein; a feed device for feeding the nozzle with liquid; a device (13) for moving the nozzle vertically so that its free end (7a) enters the container (12); and a control unit for controlling the moving and feeding devices. It includes a rinsing sequence with the following steps: the lowering of the nozzle (7) into the rinsing position inside the container; the filling of the container (12) with liquid by the nozzle; and the draining of the container (12) activated by the control unit connected to the moving and feeding devices.
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: July 22, 2014
    Assignee: SEB S.A.
    Inventors: Gilles Morin, Laurent Gagnon, Vincent Crosville
  • Patent number: 8778087
    Abstract: A cleaning device for cleaning a substrate is provided. In one aspect, the cleaning device includes a brush including a first end, a second end opposed to the first end, an outer surface, and a hollow bore defined in the brush about a central axis of the brush. The brush defines a first cross-sectional area near the first end and a second cross-sectional area near the second end. Both the first and second cross-sectional areas are generally perpendicular to the central axis and the second cross-sectional area is greater than the first cross-sectional area.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 15, 2014
    Assignee: Illinois Tool Works Inc.
    Inventors: Jeffrey J. Tyrrell, Bradley S. Withers
  • Patent number: 8778092
    Abstract: There is provided a substrate processing method including cleaning a substrate by immersing the substrate in a cleaning solution in a longitudinal direction while the cleaning solution is supplied to a cleaning tank; transferring the substrate picked up from the cleaning tank to a drying chamber while holding the substrate in a longitudinal direction; and drying the substrate in the drying chamber communicating with an upper area of the cleaning tank by alternately supplying a first drying gas containing vapor of a solvent for removing a liquid and a second drying gas without containing the vapor of the solvent for removing the liquid to an area where the substrate is exposed between the upper area of the cleaning tank and the drying chamber after an upper end of the cleaned substrate is picked up from a liquid surface of the cleaning solution.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: July 15, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Tanaka, Hironobu Hyakutake, Takashi Uno
  • Patent number: 8778088
    Abstract: A foreign matter removal device 10 preliminary cleans the work 50 in a bucket 12 housed in an input tank 15, then further cleans the work 50 in buckets 13, 14 housed in cleaning tanks 16, 17 by agitating cleaning liquid while inverting the buckets to transfer the work to a subsequent bucket. Particularly, the bottom of the cleaning tank is formed such that the nearer to a center of the bottom, the deeper the bottom becomes. The cleaning liquid overflowing from the cleaning tanks are stored in auxiliary tanks 22, 23. First and second ejection units 29a, 29b are arranged at different heights in the cleaning tank to generate a circulating flow in the cleaning liquid.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: July 15, 2014
    Assignees: Itoham Foods Inc., Mayekawa Mfg, Co., Ltd, Hosoda Kogyo Co., Ltd
    Inventors: Takeshi Nishimoto, Masaya Ichihara, Yo Komatsu, Satoshi Mashiba, Suguru Sakuramoto, Shinji Shimamura, Ryuzo Urakami
  • Patent number: 8771430
    Abstract: A method for drying a workpiece using an apparatus comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: July 8, 2014
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang