Abstract: Process for pickling stainless steel carried out at a temperature of between 20° and 70° C., with the use of a pickling solution containing the following basic ingredients: H2SO4 (free acid): 50 to 200 g/l HF (free acid): 0 to 60 g/l F− anion (total): 5 to 150 g/l SO42− anion (total): 50 to 350 g/l Total free acidity (H2SO4+HF): between 1 and 7 g. equiv./l where by “free acid” is meant the acid that does not constitute the anion bound in the form of salts or complexes with the metal cations present in the solution; and, in addition: Fe3+ in a quantity of at least 15 g/l chloride anion in a quantity of between 0.1 and 10 g/l, into which solution is fed, during the pickling process, an oxidant that is able to oxidize Fe2+ to Fe3+ in order to maintain the redox potential of the solution at a value of between +230 and +800 mV.

Abstract: The present invention provides a method of removing copper oxide deposits from stator water cooling system piping material surfaces. The present invention disconnects the generator from the stator water cooling system, connects bridging piping to the stator water cooling system at the points from which the generator was disconnected to allow the stator water cooling system to operate without the generator, provides a sufficient amount of an aqueous solution of an agent which dissolves or removes copper oxide deposits from piping material surfaces for a time sufficient to dissolve or remove substantially all copper oxide deposits, and rinses the piping material surfaces with sufficient water until the output water from the rinsing of the piping material surfaces is essentially neutral.

Abstract: Fairly pure metallic nickel may be efficiently dissolved in non-oxidizing acid. If the nickel includes individual pieces longer than 0.5 mm in any linear dimension, oxidizing agent is preferably added from the beginning of dissolution, while if the nickel is powdered so that no single piece has a linear dimension longer than 0.35 mm, oxidizing agent is preferably added only after most of the originally supplied nickel has been dissolved. After oxidizing agent is added, most or all of the remaining undissolved nickeliferous solid will then dissolve. The temperature of the reaction mixture of acid liquid and solid nickel preferably is room temperature at the beginning of dissolution but is raised in steps to a final value of at least 65° C. and maintained at that temperature for several hours.

Abstract: A cleaning unit (A) includes a movable cart (20) which carries a cleaning system for cleaning baked-on residues from walls (10) of a sterilizer chamber (12). The cleaning system includes a lid (80) which is mounted over an opening (82) to the chamber. In one embodiment, the door (232) of the chamber provides the lid. An articulating nozzle (124) extends from the lid into the interior of the chamber. Alkaline and acid cleaning solutions (180, 182), for removing organic and inorganic residues, respectively, from the chamber, are stored in two storage containers (52, 54) carried by the cart. A first pump (60), mounted on the cart, pumps first the alkaline, then the acid cleaning solution to the nozzle. A second pump (62), mounted on the cart, connects with a scavenge fitting (166) in the chamber to return the cleaning fluid to the respective storage container.

Abstract: There is provided a method of efficiently removing polymer stuck to the inside and/or on the surface of packings of a distillation tower, when nitrogen-containing polymerizable monomers (for example, ethyleneimine) are distilled. Said method consists of washing the inside and/or packings of a distillation tower with an acidic liquid (for example, aqueous solution of acetic acid).

Abstract: An aqueous based cleaner containing at least inorganic alkalinizing agents and surfactants is capable of removing long dried paint and thick carbonaceous deposits from used aircraft engines, sometimes without using organic solvents at all and always without using more than a few % of such solvent, thereby greatly reducing pollution potential from this difficult cleaning operation. A preferred cleaner also includes a hydrotroping agent, and the cleaner may also contain corrosion inhibitor, sequestering agent for hard water cations, and other materials.

Abstract: A composition for a removing soil is described. The composition has a carboxylated imino compound and optionally an oxidizing agent. The composition displays excellent cleaning properties on processing equipment such as the equipment found in breweries, dairy plants and carbonated beverage plants. The composition also displays excellent lipid-based and protein-based soil removal.

Abstract: A steel strip is degreased with low power consumption by subjecting the steel strip to electrolytic washing in a degreasing apparatus including an electrolytic washing apparatus in which electrodes confront each other across the steel strip located therebetween, and charge density and current density are maintained within a predetermined range. There is also provided a simple steel strip degreasing apparatus which is especially suitable for the method.

Abstract: A method of preparing a silicon surface for a subsequent processing said such as thermal oxidation, or metal silicide formation, via use of a novel wet chemical clean procedure, has been developed. The novel wet chemical clean procedure is comprised of three specific stages, with the first stage featuring the removal of organic contaminants and the growth of a native oxide layer on the silicon surface. A second stage features removal of the native oxide layer and removal of metallic contaminants from the silicon surface, while the third stage is used to dry the silicon surface. The novel wet chemical clean procedure is performed in less time, and using less chemicals, then counterpart wet chemical cleans also used for the preparation of silicon surfaces for subsequent processing steps.

Abstract: A method is provided for in situ cleaning of lubricated parts of a machine in which the machine is operated with a lubricating fluid that contains an effective concentration of a cleaning composition comprising a synthetic ester of a naturally occurring fatty acid for an amount of time sufficient to remove from the lubricated parts adhered debris which is not removed by the lubricating fluid conventionally used in the machine.

Abstract: A method and apparatus for removing contaminants from the surface of a metallic article comprises a continuously flowing acid bath whose level of acidity and temperature is controlled and over which a purging gas flows to continuously remove hazardous gases generated during the removal of contaminants from the metallic article.

Abstract: A surface of a light-metal alloy is anodically polarized in a cleaning process. The surface is cleaned with a solution containing phosphoric acid, alcohol, and optionally fluoride. Additionally, the surface is passivated in an oxidizing process using, for example, fluoride ions or an aqueous oxidizing agent. Preferably, the light-metal alloy has a relatively high Al or Mg content. This method is suitable for preparing the surface for a subsequent coating operation.

Abstract: A homogeneous non-aqueous composition containing a fluorinated solvent, ozone, and optionally a co-solvent and the use of these compositions for cleaning and oxidizing substrates is described.

Abstract: In a method for cleaning an engine component, an engine component is provided and is immersed in an acid solution selected from phosphoric acid, citric acid and acetic acid. A cleaning composition for an engine component comprises an agitated acid solution selected from phosphoric acid, citric acid and acetic acid.

Abstract: A process for the wet-chemical surface treatment of a semiconductor wafer following a mechanical surface treatment, in particular following a mechanical surface treatment in a lapping machine, includes a sequence of treatment steps. The process essentially includes a wet-chemical surface cleaning, preferably for neutralizing and eliminating the lapping slurry, an acid etching treatment, preferably for eliminating the mechanically imposed damage and for surface smoothing and removal of metals. There is a final step of drying and rendering the cleaned and etched surface hydrophilic.

Abstract: A surface modification method for an aluminum substrate, which comprises treating a Ni—P plated aluminum substrate with a functional water having a plus or minus oxidation-reduction potential for a predetermined period of time in a washing step after a polishing step of the Ni—P plated aluminum substrate.

Abstract: An environmentally friendly decontaminant solution, which may be disposed of after use without posing significant environmental hazards, is formulated without molybdenum-based corrosion inhibitors and preferably is free of all heavy metals. A zeolite-based buffering system optionally replaces phosphate buffers for maintaining the pH of the decontaminant solution at an appropriate pH for effective antimicrobial decontamination. Molybdenum-free decontaminant solutions containing peracetic acid retain their peracetic acid levels, and thus their antimicrobial effectiveness, for longer periods than comparable solutions formulated with a molybdate corrosion inhibitor.

Abstract: A composition for adding to an aqueous rinse which is applied to a ferrous metal surface after treatment of the ferrous metal surface with an aqueous acid solution is disclosed. The composition includes a base. The base is present in the composition in an amount sufficient to adjust the pH of the aqueous rinse to a value greater than 7.0 after the composition is added to the aqueous rinse. The composition also includes a salt of gluconic acid. The composition further includes a polyquaternium compound. An associated method for inhibiting stain formation on a ferrous metal surface is also disclosed.

Abstract: An automatic system is used for controlling the cleaning stage of a strip cleaning line, e.g. an aluminum strip cleaning line. The cleaning line includes a chemical cleaning section and at least one rinse section, with cleaning solution being sprayed onto the top and bottom faces of the aluminum strip as it passes through the cleaning section. A programmable logic controller has a dwell time set point for each coil of aluminum strip, which gives for standard conditions of chemical concentration and temperature the time the strip should be exposed to the spray. The controller receives input signals based on the measured temperature and concentration of the cleaning solution and adjusts the dwell time of the cleaning solution spray on the aluminum strip accordingly.

Abstract: Removing particles and metallic contaminants without corrosing the metallized wirings and without giving adverse effect of planarization on the semiconductor substrate surface can be effectively achieved by use of a cleaning agent which comprises an organic acid having at least one carboxyl group and a complexing agent having chelating ability.

Abstract: This invention relates to a process for removing rust from metal surfaces. The process uses an aqueous solution of a benzoate.

Abstract: The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.

Abstract: Method for removing microbial biofilm from surfaces in contact with an aqueous system is disclosed, which comprises adding to the system a treatment comprising low foaming, ethoxylated anionic surfactant composed of alkyl substituted carboxylated acid or salt thereof and polyoxyethylene-polyoxypropylene block copolymer.

Abstract: A method of cleaning semiconductor wafers before the epitaxial deposition comprising (A) etching silicon wafers with HF; (B) rinsing the etched wafers with ozonated ultrapure water; (C) treating the rinsed wafers with dilute SC1; (D) rinsing the treated wafers; (E) treating the wafers with dilute HF; (F) rinsing the wafers with DI water; (G) drying the wafers with nitrogen and a trace amount of IPA; wherein steps (E) through (G) are conducted in a single dryer chamber and wafers are not removed from the chamber between steps. A system comprising a single tank adapted for cleaning, etching, rinsing, and drying the wafers has means to inject HF into a DI water stream.

Abstract: A method for removing gross soils from a substrate during a multi-step cleaning process comprising the step of flushing the substrate with a pre-rinse solution prior to application of a cleaning solution and/or second rinse solution. The pre-rinse solution comprises water and a partially neutralized anionic polymer.

Abstract: The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release hydrofluoric acid as a brightening agent. The solutions are preferably mixed during application of the brightening composition to a metal surface by mixing the solutions immediately prior to or even during application of the solution. This can be readily accomplished by mixing two solutions, one having a fluoride source and the other having a strong acid to release hydrofluoric acid from the fluoride source, the mixing occurring immediately before spray application, during spraying, or immediately after spraying of the two solutions. Mixing may be done on-site, which means that mixing is performed at the site of use, usually on the same day of use or even within a few (less than 10) minutes of use.

Abstract: The method of manufacturing a hydrogen-absorbing alloy electrode according to this invention comprises the steps of: dissolving a particle surface of said hydrogen-absorbing alloy by a surface-treatment solution; and washing the hydrogen-absorbing alloy with the particle surface dissolved using an alkaline solution at a temperature of 30° C.˜40° C. The metal ions dissolved by the surface-treatment solution can be completely washed away by the alkaline solution so that they will not be precipitated onto the surface of the hydrogen-absorbing alloy again as the hydroxide.

Abstract: A method for treating an electronic component wherein the value of an optical property associated with a process fluid is measured and compared with a threshold value of an optical property. This comparison is used to determine what modification, if needed, should be made to the process fluid to restore it to its threshold value. Also disclosed is a system for treating electronic components with a process fluid.

Abstract: [The present invention] provides a surface treatment method for recorded matter which can improve the weather resistance characteristics such as light resistance, gas resistance and the like of recorded matter in which images are recorded on the recording medium, as well as providing a surface-treated product using this surface treatment method, and a surface treatment apparatus. The surface treatment method of the present invention is characterized in that the surface of recorded matter in which images are recorded on a recording medium is treated using a specified treatment agent. The abovementioned treatment agent is a treatment agent which contains one or more active constituents selected from the group consisting of sulfur compounds, nitrogen compounds,. fluorine compounds, natural resins and synthetic resins, or a treatment agent comprising water or an organic solvent.

Abstract: A method for cleaning a silicon wafer by a wet bench method with improved cleaning efficiency and without oxide formation is disclosed. In the method, the wafer may first be cleaned in a first cleaning solution that includes a base or an acid, and then the wafer is rinsed in a second solution that includes DI water and ozone. The ozone concentration in the DI water may be between about 1 ppm and about 20 ppm, and preferably between about 3 ppm and about 10 ppm. A diluted HF cleaning step may be utilized after the ozone/DI water rinsing step to remove any possible oxide formation on the silicon surface before a final rinsing step and drying step.

Abstract: The present invention is directed to methods for cleaning films and particulates from the compressor section and combustion contaminants from the combustion and turbine sections of a combustion turbine. Particulate films and contaminants adhering to the internal components of the compressor section of a turbine are readily removed by forcing a mist comprising a cleaning solution such as an aqueous surfactant solution through the compressor section. Contaminants resulting from fuel combustion and deposited in the combustion and turbine sections are removed by forcing a mist comprising a second cleaning solution through those sections. The second solution typically comprises an aqueous acid solution optionally including a corrosion inhibitor. The compressor section must be isolated from such acid solutions, e.g. by continuing to force the misted surfactant solution through the compressor section prior to and simultaneously with forcing the misted acid solution through the combustion section.

Abstract: A composition and method for the removal of scale from a substrate are disclosed. The composition and method are more specifically utilized for the in situ removal of silicate-containing scale from interior surfaces of boilers and other heat exchange equipment. The silicate-containing scale is deposited in the boilers as silicate-sulfate complexes of calcium, magnesium, aluminum, and other metal atoms that are present in water. The composition, which is circulated throughout the boiler to contact the interior surfaces, such as the boiler tubes, includes a chelating agent having at least two carboxylic acid functional groups, preferably citric acid. The composition also includes an alkali metal hydroxide basic agent. The preferred alkali metal hydroxides are either potassium or sodium hydroxide. The basic agent establishes an overall basic pH of from 7 to 14 in the composition to enable precipitation of the metal atoms from the composition after interaction with the chelating agent.

Abstract: Method for pickling products made of steel, characterized in that within the pickling bath Fe3+ is present, directly added in a controlled concentration, or produced in the pickling bath itself by adding an oxidizing agent such as hydrogen peroxide, ozone, permanganates. persulphates and oxygen.

Abstract: A method for removing radioactive contaminants from a given surface. An acidic solution having a pH of less than 3.0, and preferably less than 1.5, of a complex substituted keto-amine, and a mixture of a saturated and unsaturated lower alcohol (e.g. isopropyl alcohol and propargyl alcohol), and concentrated acid is applied to a contaminated surface. The solution is left on said surface for a time sufficient to remove the radioactive contaminants into the acidic solution and then removed. The acidic solution containing the radioactive contaminants is preferably neuralized by an alkaline material to a pH of between 5.5 and 9.0. Removal of thorium contamination from railcars is one useful application of the invention. The method of the present invention has the effect of removing substantially all of the radioactive contaminants from a previously contaminated surface.

Abstract: A workpiece or substrate is placed in a support in a reaction chamber. A heated process liquid is sprayed onto the substrate. The thickness of the layer of process liquid formed on the substrate is controlled, e.g., by spinning the substrate. Ozone is introduced into the reaction chamber by injection into the liquid or into the reaction chamber, while the temperature of the substrate is controlled, to chemically process the substrate. The substrate is then rinsed and dried.

Abstract: A method of removing deposits of material which are formed in laser machining is described. The deposits are removed by at least one of the methods—pickling method and/or electropolishing method.

Abstract: A method for removing an aluminide coating from a substrate includes the steps of contacting the surface of the substrate with at least one stripping composition to degrade the coating. The stripping composition includes an aliphatic or aromatic sulfonic acid, and at least one additive. The coating is then removed.

Abstract: An automatic control system is provided for acid concentration in an aluminum strip cleaning line wherein an aluminum strip is contacted with an acid solution while passing through an acid cleaning bath and the concentration of the acid in the bath is adjusted by adding either concentrated acid or water to the bath. A conductivity probe is provided in the acid bath and generates a first signal approximately proportional to the free acid concentration of the bath. An on-line process titrator periodically samples the acid bath and by a dual endpoint titration obtains the free acid concentration and total acid concentration of the bath and thereby generates a second signal indicative of the actual free acid concentration and the total acid concentration. These first and second signals are fed to a programmable logic controller, which based on the signal from the titrator calculates a correction factor for the signal from the conductivity probe to thereby obtain a corrected value for free acid concentration.

Abstract: The pickling process of the present invention is designed for pickling electrical steel strip in a continuous fashion. It comprises at least one pickling tank equipped with at one sprayer designed to spray the top and bottom surfaces of a steel strip with a solution comprised of hydrogen peroxide prior to and/or after the strip is immersed in a solution contained in a pickling tank. Upon exiting the final pickling tank, the strip is brushed/scrubbed to loosen any residual scale to form a clean strip.

Abstract: This invention relates to a method to facilitate the removal of adherent polymeric films from a hard surface occasioned by the evaporation of solvent from compositions containing an anionic acrylates copolymer, the method comprising incorporating a phosphate ester surfactant into the compositions, and washing the film from the surface to which it adheres.

Abstract: The present invention relates to a process for pickling hot rolled, hot rolled & annealed, and cold rolled & annealed stainless steel strip in a continuous fashion. The process comprises a series of pre-pickling tanks and pickling tanks, and optionally includes a scrubber-brush tank, a de-smutting tank, a filtration unit and a heat exchanger.

Abstract: Compositions for removing deposits from the interior surfaces of oil refining equipment are provided. The compositions include an organic oil-soluble or oil-miscible acid and a multi-polyether-headed surfactant (MPEHS). Methods of removing these deposits from the interior surfaces of oil refining equipment and removing mud deposits from the bottom of desalters, while the equipment is online, are also disclosed.

Abstract: Thus use of a post detergent step for removing aqueous residue from ware combined with a subsequent step using a potable rinse or a dilute solution of an aqueous food grade rinse aid to rinse alkaline washed ware provides significant advantages. The two step rinse method insures complete and sanitary cleaning of ware while permitting the use of different formulations in the post detergent step and the subsequent rinse step. Such process conditions permit the use of differing times and temperatures in the post detergent step and in the rinse step and permits the use of different formulations in the post detergent step and in the rinse step.

Abstract: Organic acid components are used to increase the solubility of ozone in aqueous solutions for use in removing organic materials, such as polymeric resist and/or post-etch residues, from the surface of an integrated circuit device during fabrication. Each organic acid component is preferably chosen for its metal-passivating effect. Such solutions can have significantly lower corrosion rates when compared to ozonated aqueous solutions using common inorganic acids for ozone solubility enhancement due to the passivating effect of the organic acid component.

Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

Abstract: The present invention provides a method of removing residual particles from a polished surface. The method comprises the steps of: providing a substrate, forming a dielectric layer on the substrate, brush-cleaning and etching the dielectric layer on the substrate with a liquid when residual particles are trapped therein, whereby the residual particles are loosened and then relocated to the dielectric layer, and finally cleaning the dielectric layer to remove the relocated residual particles.

Abstract: The present invention relates to a degreasing composition, to a liquid, to a gel and to a degreasing foam which comprise said composition. The composition according to the invention comprises a base, a polyethoxylated fatty alcohol, saturated or unsaturated, a copolymer of ethylene oxide and propylene oxide, and water. The invention also relates to a degreasing and/or decontamination process of a surface using said composition, said liquid, said gel, and/or said degreasing foam.

Abstract: This invention relates to a method to facilitate the removal of adherent polymeric films from a hard surface occasioned by the evaporation of solvent from compositions containing an anionic amphiphilic polymer, the method comprising incorporating a phosphate ester surfactant into the compositions, and washing the film from the surface to which it adheres.

Abstract: A method and product for computer disk drives. Glass substrates are provided having low content of residual polishing particles on the surfaces thereof. An exemplary method includes reduction of residual polishing particle content by immersion of the glass substrate in an acid bath containing nitric acid, hydrogen peroxide and an organic acid having a carboxylic acid group.

Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.