Abstract: A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface of the proximity head. The substrate is linearly moved under the proximity head. A single wafer cleaning system is also provided.

Abstract: First, an object and an applicator for supplying a solution prepared by dissolving an oil repellent in a volatile solvent are arranged with an end of the applicator and the object substantially away from each other. Then, the solution is supplied from a solution reservoir for storing the solution to the applicator through a solution passage connecting the solution reservoir and the applicator to each other, and thereafter the solution is made to ooze from the end of the applicator while one of the object and the applicator is moved relative to the other. A space between the object and the end of the applicator is filled with the solution and a distance between the object and the end of the applicator is determined to allow the solution to be held in the space by surface tension.

Abstract: An acoustic ceiling removal tool and associated method are provided wherein an elongated tubular handle defines a longitudinal cavity, and a scraping head is connected to a distal end of the handle. The scraping head has a manifold with a proximal end in fluid communication with the longitudinal cavity and an opposing open end defining a comparatively larger cross sectional area than the proximal end, a scraper blade supported by the manifold to dispose an operative scraping edge of the scraper blade adjacent the open end of the manifold, and an elastomeric boot sealingly engaging the proximal end of the manifold and extending therefrom to circumscribe the open end of the manifold.

Abstract: A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O3) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or etching of the semiconductor substrate; even when the substrate has metal layer made of tungsten.

Abstract: Mounting equipment comprises a brush which brushes an edge portion of a liquid crystal cell and removes the contaminating dust attached to this edge portion, an ionizer for injecting an ionized gas toward a portion to contact at least the edge portion of the liquid crystal cell of this brush, and a discharge pipe provided within a cleaning case for absorbing and removing the gas injected toward the brush from this ionizer.

Abstract: This invention relates to an apparatus for cleaning working implements such as drill bits, and a method for using the same, the apparatus comprising a body supporting a plurality of bristles, the body being arranged and adapted so as to support these bristles in a position relative to a sidewall of a pail or bucket shaped container where each bristle extends inwardly of the sidewall of the container so that they will brush against a rotating rotary working implement inserted into the container.

Abstract: A mop bucket that saves, water, cleaning liquid, time and effort includes a bottom, an outer wall inclined to facilitate stacking, and either a T-wall defining three compartments not in communication with each other or an X-wall defining four such compartments. The interior walls have an inverted “V”-shaped cross-section meeting at a rounded edge, the first leg and the second leg rotationally related by a highly acute angle to facilitate stacking. The method involves providing the bucket, placing cleaning liquid into the first clean compartment and fresh water into the one or two rinse compartment, dipping the mop in the cleaning liquid, washing the floor with the mop, and the repeated steps of rinsing the mop in the rinse compartments, draining the mop so that dirty water drains into the drain compartment, dipping the mop in the cleaning liquid, washing the floor with the mop.

Abstract: A cleaning device for cleaning sidewalls of a liquid container. The cleaning device includes a cover that can be removably disposed over a flotation device. The cover has a lower cleaning portion that cleans the sidewalls of the container upon contact with the sidewalls. The cover also has an upper noncleaning portion.

Abstract: An eraser is constituted by an elastic material containing a rubber component or a resin component, and a skeleton structure for reinforcing the elastic material, and the skeleton structure is made from a porous structural material such as from an organic polymer that is broken when rubbed. Void portions in the porous structural material of the skeleton structure contain the elastic material of the eraser composition. Here, the skeleton portions of the skeleton structure may have an average thickness of 1 to 100 ?m, and the void portions may have an average pore size of 10 ?m to 3 mm. The eraser may have a surface hardness of 50 to 80, and also a sticking strength of 1.5 to 20 (kgf).

Abstract: The invention relates to a reusable cleaning implement for cleaning and sanitizing a surface. More specifically, the cleaning implement is made of a tacky polymeric material and an antibacterial agent is distributed within the polymer. The adhesive and antibacterial properties of the cleaning implement are regenerated by contact with a cleansing agent.

Abstract: A multi-pin fiber connector cleaning apparatus and method for cleaning and removal of contamination of multi-pin connectors is disclosed. The apparatus and method includes a handle portion, a tool portion, a specially formulated and disposable foam cleaning pad, a cloth cleaning pad and a cloth cleaning pad container. The apparatus is pushed onto ferrules inside a connector shell wherein the contaminants located on the ferrules adhere to the adhesive nature of the cleaning pads which allows all the ferrules in the connector to be clean in one forward movement on to the ferrules and one withdrawing movement away from the ferrules. The tool portion may have various shapes and sizes such as oval, circular, square or other shapes and sizes in order to accommodate the type of connector to be cleaned.

Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.

Abstract: A system for cleaning semiconductor lithography tools provides for cycling a polished-side down semiconductor wafer through the lithography tool using conventional automated robotics for loading and unloading the wafer from a vacuum chuck of the lithography tool. The vacuum chuck may provide a continuous clamping vacuum feature and may include a vacuum ring that surround the periphery of the vacuum chuck. The chuck and vacuum ring may advantageously be formed of a high accuracy ceramic or plastic such as ZeroDur ceramic. The polished side of the semiconductor wafer includes grooves in a polished surface and which extend inwardly from a peripheral edge of the wafer, the grooves provide gaps between the wafer and chuck allowing the wafer to be released by a slow loss of vacuum-pressure through the gaps. The pristine clean polished surface of the wafer getters contaminating particles from the chuck.

Abstract: Devices and methods of cleaning are described. The methods, and devices formed by the methods have a number of advantages. Embodiments are shown that include cleaning using a supercritical fluid. Advantages include a combination of both chemical and mechanical removal abilities from the supercritical fluid. Mechanical energy for cleaning is transmitted in a homogenous manner throughout a carrier fluid. The mechanical energy provided in methods shown also can also be used with delicate surface features.

Abstract: A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for detecting a distribution of particles adhering to the substrate, a reversing unit for reversing the substrate, and a transport section having a pair of transport units. Cleaning conditions of the front surface cleaning unit or back surface cleaning unit are varied based on the distribution of particles on the substrate after the substrate is cleaned by the front surface cleaning unit or back surface cleaning unit and inspected by the particle inspecting unit.

Abstract: A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or the like, in which the surface of a base material such as metal can be subjected to degreasing treatment and oxide film removing treatment simultaneously, efficiently and rationally, in which productivity can be enhanced and the equipment cost can be reduced, and in which a waste solution can be rationalized so that the solution can be reutilized and the environmental pollution can be prevented. A method for activating the surface of a base material in which the surface of a member to be treated is subjected to degreasing treatment or oxide film removing treatment. Pressurized carbon dioxide is dissolved in a predetermined quantity of water, thereby preparing an oxide film removing solution having a predetermined acidic concentration.

Abstract: A cleaning article in the form of a sponge body for absorbing and retaining a fluid and an encasement membrane attached to the sponge body. The encasement membrane covers a portion of the sponge body being sized to fit within and be held by the hand of a user while leaving exposed, a portion of the sponge body for engaging a surface to be cleaned. As a preferred embodiment, the encasement membrane is further characterized as being a thermal insulator substantially reducing thermal energy contained within the fluid from passing therethrough. The encasement membrane is also characterized as being impervious to water, steam or other gasses to prevent their escape where they could affect the user's hand. The present invention is ideally suited for cleaning a surface by applying a cleaning fluid, such as water with or without a detergent to the sponge body and placing the cleaning article within a microwave oven.

Abstract: A one-piece sponge cleans and removes coating material from the bottom edge, inside and outside surface of a photoreceptor drum. The one-piece sponge has an inner sponge section and an outer sponge section, both with internal channels to remove solvent and dissolved coating material.

Abstract: A method for treating an exposed surface. A treating apparatus is provided having an elongate support and at least one flexible surface contacting element at a distal region of the support. The elongate support is manipulated from a proximal region of the support so as to place the flexible surface contacting element at the exposed surface to be treated. The flexible surface contacting element is caused to be repeatedly moved to effect treatment at the exposed surface.

Abstract: A brush, as well as a method for cleaning a process surface using the brush, having: a hollow cylinder having a closed first end, a closed second end, and a peripheral wall with an internal and external surface; with bristles arranged on the external surface of the peripheral wall thereof; wherein the hollow cylinder has a plurality of apertures formed in the peripheral wall for permitting a gas or liquid to emerge from the interior of the hollow cylinders to the vicinity of the bristles; wherein the apertures are arranged in a staggered multi helical pattern having from about 3 to about 15 helix; and wherein the peripheral wall has a surface area ratio of from about 6 to about 30.

Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle. The system and method utilize a cleaning composition that contains at least one water-soluble or water dispersible copolymer. The method may also include a step of applying to the surface a treating composition which contains non-photoactive nanoparticles.

Abstract: The invention relates to methods of working surfaces of a coating made of hard carbon such as —C or ta-C. In accordance with the object set, a smoothing of the surface of such a coating should be achieved with a low effort and low costs and a working of contoured surfaces should be achieved. In accordance with the invention, bristle-like or plate-like elements made of a metal and connected to a rotating element are brought into point-like or linear contact with the surface of the coating. These bristle-like or plate-like elements are moved along the surface and the surface is thus smoothed.

Abstract: A cleaning apparatus is provided with a plurality of cleaning mechanisms such as a blast unit, a vibration brush unit and a pulse spraying unit. Cleaning of objects with the blast unit and vibration brush unit is conducted within cleaning liquid reserved in a cleaning vessel in order to prevent electrostatic discharge (ESD) breakdown. Cleaning the objects with the pulse spraying unit is conducted after taking out the objects from the cleaning liquid and thereby re-adhesion of contamination remaining in the cleaning liquid to the objects is prevented.

Abstract: A method of deodorizing a textile which comprises providing a solid composition comprising an inorganic salt, at least one of a malodor counteractant, an odor absorbent and an odor-masking agent, and applying the composition to the textile.

Abstract: An object of the present invention is to provide a ceramic susceptor for considerably reducing the count number of metal atoms on the surface of a semiconductor after the semiconductor is treated, specifically to 1×1010 atoms/cm2 or lower. It is provided a ceramic susceptor 2 having a face for mounting semiconductor 2a wherein each of metal elements other than metal element(s) constituting the ceramic material has a count number of 1×1011 atoms/cm2 or lower. It is further provided a method of cleaning a ceramic susceptor 2 having a face 2a for mounting semiconductor, wherein the susceptor is cleaned using a complexing agent capable of forming a complex with a metal element.

Abstract: A method of using an electric stainbrush for cleaning inanimate surfaces is provided. The electric stainbrush includes a handle having a motor disposed therein, a head having a longitudinal axis, and a neck disposed between the handle and the head. First and second bristle holders are associated with the head. The first bristle holder oscillates or rotates. The second bristle holder reciprocates in generally the same direction as the longitudinal axis of the head but does not rotate or oscillate. The motor is operatively connected to the first and second bristle holders.

Abstract: A method is provided, which includes moving a mobile floor cleaning device along a floor; electrochemically activating a liquid on the mobile floor cleaning device, and dispensing the electrochemically activated liquid from the mobile floor cleaning device.

Abstract: A stirring nozzle used in an apparatus for abrasive wire cleaning. The stirring nozzles can be used in series to create multiple cleaning steps wherein fresh cleaning compound contacts the wire to be cleaned. The cleaning apparatus moves both the wire and an abrasive cleaning compound through the interior of the stirring nozzles. At the exit end of each stirring nozzle, cleaning compound is moved outward from the wire path. At the inlet end of each stirring nozzle, cleaning compound is moved inward toward the wire path. The sequential in-and-out movement mixes the cleaning compound.

Abstract: A method is provided, which includes moving a mobile floor cleaning machine along a floor. Onboard the mobile floor cleaning machine, a liquid is sparged by electrolysis. The sparged liquid is dispensed from the mobile floor cleaning machine.

Abstract: A semiconductor substrate cleaning method includes a first cleaning step of cleaning the surface of a semiconductor substrate with the use of a first brush and a second cleaning step of cleaning the surface of the semiconductor substrate with the use of a second brush after the first cleaning step. The second cleaning step is performed under a condition that suppresses recontamination of the surface of the semiconductor substrate in comparison with the first cleaning step.

Abstract: A cleansing product containing: (a) a water insoluble substrate; and (b) a surfactant composition impregnated onto the substrate, the composition containing: (i) at least one lathering surfactant; and (ii) at least about 40% by weight, based on the weight of the composition, of water.

Abstract: A system for recycling reusable resin mold products recovered from discarded apparatuses is disclosed. This recycling system includes a crushing system for crushing resin mold products one kind by one kind into crushed resinous pieces and packing the same in a bag, a classification system for irradiating a light beam to the resin in the bag and classifying the bags into respective kinds of resins based on a reflected beam therefrom, a cleaning system for separately cleaning the respective kind of crushed resinous pieces taken out of the bag to remove foreign matters adhered onto the surfaces of the crushed resinous pieces therefrom, and a recovery system for recovering the cleaned crushed resinous pieces.

Abstract: A cleaning implement comprises a modified open-cell foam with a density in the range from about 5 to about 1,000 kg/m3 and with an average pore diameter in the range from about 1 ?m to about 1 mm, comprising an amount in the range from about 1 to about 2,500% by weight, based on the weight of the unmodified open-cell foam, of at least about one water-insoluble polymer (b), selected from polystyrene, styrene copolymers, polybutadiene, butadiene copolymers, polyvinylesters, polyvinylethers, copolymers from (meth)acrylic acid with at least one (meth)acrylate, and polyurethanes, with the proviso that styrene-acrylonitrile-C1-C10-alkyl (meth)acrylate terpolymers, styrene-butadiene-n-butyl acrylate terpolymers, and styrene-maleic anhydride copolymers are excluded.

Abstract: Disclosed are an apparatus and a method for cleaning a nozzle, which can automatically clean pollutant of the nozzle. The nozzle cleaning apparatus comprises the nozzle in a polluted state, a nozzle cleaning unit to clean a pollutant material from the nozzle by use of an absorbing member, and an absorbing member cleaning unit to clean a pollutant material from the absorbing member. With this configuration, the nozzle cleaning apparatus can clean the polluted nozzle by use of the absorbing member and in turn, can clean the polluted absorbing member by use of cleaning liquid, whereby automatic cleaning of the nozzle can be accomplished. Automatic cleaning of the polluted nozzle has the effect of reducing cleaning labor and time, and improving productivity.

Abstract: A glass sheet washing machine comprising a conveyor for moving a glass sheet along a path of travel at a controlled linear speed and a brush rotatable at a controlled rotational speed positioned along said path of travel such that said brush contacts the glass sheet moves along said path of travel wherein the linear speed of the conveyor and the rotational speed of the brush are variable and one of the linear speed and the rotational speed is dependent on any other of the linear speed and the rotational speed.

Abstract: In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.

Abstract: A cleaning method preventing foreign matter attached to a brush from being transferred back to a magnetic transfer carrier by removing foreign matter attached to a cleaning tool such as the brush with a dummy carrier having a recess equivalent to that on a surface of the magnetic transfer carrier.

Abstract: A method of cleaning a head of a printer when the printer is in a normally-engaged position is disclosed. A step of the method includes providing a base a material with a leading end and trailing end. Another step includes providing an abrasive cleaning sheet which has distal and proximal ends. The abrasive cleaning sheet is located proximate to the leading end of the base material. At least the proximal end of the abrasive cleaning sheet is adhered to the base material. The next method step includes feeding the base material into a printing path of a printer and then moving the base material at least partially through the printer so the abrasive cleaning sheet contacts at least a head of the printer.

Abstract: Apparatuses and methods for cleaning test probes used in a semiconductor testing machine of the type having a plurality of test probes configured to contact the surface of a semiconductor wafer to test one or more dies formed thereon. In one embodiment, the apparatus includes a roller-support arm and a cylindrical roller supported by the roller-support arm. The roller has an outer surface comprising a sticky material. Debris on the probes will adhere to the sticky material as roller is rolled across tips of the probes. The probes are thereby cleaned.

Abstract: Many prior art processes for cleaning predominantly organic hard surfaces have been found to be considerably less effective in removing very fine particles on such surfaces than are the best cleaners for metallic surfaces. However, it has been found, and forms the basis of this invention, that fine particles can be removed effectively from organic surfaces by an indirect process of first forming a thin solid coating over the surface and then removing the solid coating, into which the fine particles that formerly contaminated the surface to be cleaned have presumably become incorporated. Substantially hydrolyzed poly(vinyl acetate) has been found particularly useful for forming the thin solid coating when this coating is to be removed by treatment with an acidic aqueous solution; acrylate polymers are preferred if the solid coating is to be removed by an alkaline aqueous solution.

Abstract: The wipe-dispensing device comprises a dispenser or container that keeps wipes isolated from the exterior of the device. The wipes are kept in the interior compartment of the dispenser or container. The top or lid of the device isolates the wipes in the interior compartment from the exterior of the device. This top or lid also secures the container from air, and seals the interior and exterior compartments of the device. Wipes are exposed when user manually presses a button on the lid or activates a sliding door which in turn shall expose the wiping surface of the wipe inside of the container. Therefore, the rest of the wipes are not exposed to the exterior, only the wipe that is in use. User may manually handle the device, expose the wipe for cleaning the desired surface, and thereafter user may pull the wipe and detach it from the device by tearing it off with a cutter slot of the device.

Abstract: Disclosed is a cleaning agent for heater tubes, which is capable of eliminating deposits such as soot particulates in tubes installed in industrial heaters that typically use oil, coal or gas. The cleaning agent of the present invention is prepared by formulating a chemical composition comprising ammonium nitrate into pellets. Also, the present invention discloses a method of cleaning heater tubes using the cleaning agent. When being utilized for cleaning the heater tubes, the cleaning agent can improve mechanical and chemical cleaning effects, thus shortening of working time and reducing a required amount of the chemical composition, as well as preventing rapid evaporation of the chemical composition, thus increasing cleaning effect. In addition, the cleaning agent can eliminate the cementing effect of sulfur oxides or vanadic oxides in the heater tubes and thus control stably emission of NOx, by selectively containing other additives including magnesium and urea.

Abstract: Methods and compositions for on-line cleaning of internal surfaces of selected sections of a hydrocarbon fuel burning gas turbine and associated heat recovery equipment, during operation. Cleaning solutions containing graphite and/or molybdenum-based particles and oil soluble corrosion inhibitors, aromatic solvents, and surfactants are selectively introduced directly into the combustion chamber (combustor) of the gas turbine, into the fuel stream, water washing system, or the combustion air system (hot gas path). The cleaning process dislodges unwanted ash deposit buildup and, thereby restores the gas turbine to rated power. When introduced into the compressor section, the particles impinge on the metal surfaces, cleaning them prior to entering the hot gas section where the process may be repeated. They may also be carried through the exhaust to additionally clean attendant heat recovery equipment, if present.

Abstract: Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed system. Greater efficiency is obtained by minimizing the volume of gas, e.g., air, requiring moisture extraction.

Abstract: A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasive particles, and cleaning a polished surface of the substrate by supplying a cleaning liquid having substantially the same pH as the abrasive liquid or similar pH to the abrasive liquid so that a pH of the abrasive liquid attached to the polished surface of the substrate is not rapidly changed.

Abstract: There is disclosed a scrub cleaning device which can reduce cleaning time and which requires no large-scaled device for transferring a substrate to the next cleaning process.

Abstract: A method of removing iron oxide scale from processed sheet metal comprises the steps of: providing a surface conditioning apparatus; and conditioning a surface of the processed sheet metal with the surface conditioning apparatus. In general, the iron oxide scale generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the processed sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. The surface conditioning apparatus has at least one surface conditioning member. The step of conditioning the surface of the processed sheet metal includes bringing the at least one surface conditioning member into engagement with the surface of the sheet metal.

Abstract: An extraction cleaning machine comprising dispensing and recovery systems, the dispensing system including a system for generating heat with an exothermic reaction upon activation for heating the cleaning solution prior to dispensing of the cleaning solution onto a surface. The cleaning solution dispensing system comprises a cleaning solution reservoir to which the heat of the exothermic reaction can be added and a dispenser. The heat of the exothermic reaction can also be added in line to the cleaning solution between the cleaning solution reservoir and the dispenser. The recovery system includes a suction nozzle, a recovery tank and a vacuum source for drawing recovered liquid from the suction nozzle into the recovery tank. A method of cleaning a surface comprises the steps of heating a cleaning solution by an exothermic chemical reaction, applying the cleaning solution to the surface and recovering the cleaning solution from the surface.

Abstract: A transparent windshield wiper assembly is disclosed. The construction details of the assembly are similar to the construction of conventional available wipers but the assembly is fabricated from transparent plastic materials. The wiper blade and wiper arm are also provided with a photochromic dye to reduce glare on sunny days.

Abstract: A seismic streamer cleaning device includes a means for converting motion of water past a seismic streamer into movement of the device as the streamer is towed through the water. A cleaning element is cooperatively engaged with the device and an exterior surface of the streamer. In one embodiment, the cleaning element includes brush bristles.