Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.

Abstract: A brush for use in cleaning teeth, and a method for cleaning teeth using such brush, in which bristles are used in the brush that are prepared from a composition containing a thermoplastic polymeric resin in admixture with a slip agent.

Abstract: A screen cleaning tool including a thin sheet of fiberous material made by a process that includes the steps forming fibers into a lacy pattern, compressing the pattern into a thin sheet, applying a curable adhesive to the fibers, and curing the adhesive and pre-moistening said thin sheet with an aqueous solution of materials selected from the group consisting of propylene glycol, polysorbate, aloe extract, 2-phenoxyethanol, methyl paraben, butyl paraben, ethyl paraben, propyl paraben, isobutyl paraben, and DL-alpha-tocopheryl acetate in order to make it available to be wiped over the surface of a screen.

Abstract: The method of using the mouse pad cleaning apparatus is disclosed and claimed. The method comprises the steps of uncovering the mouse cleaning surface, applying the mouse and ball of the mouse to the cleaning surface, moving the mouse in a rotational pattern on the mouse cleaning surface, removing the mouse form the mouse cleaning surface, washing the cleaning surface, and covering the mouse cleaning surface. A mouse pad cleaning apparatus comprising a plurality of substrates, each said substrate having adhesive thereon, said plurality of substrates residing in and affixed to a receptacle. A single substrate having adhesive, which may be washable or non-washable, thereon may be employed. The washable adhesive may be an organopolysiloxane or gelatinous elastomer.

Abstract: A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is retracted substantially into the cover member, and a second configuration wherein the cloth is extended substantially out of the cover member without becoming detached therefrom.

Abstract: A metal-debris magnetic scavenging tool useable inside a buried, horizontal metallic pipeline through an access opening which has been cut into the upper wall portion of the pipeline overhead where the resulting debris has collected. A raiseable/lowerable and rotatable array of magnets, surface exposed, and operating moveably as a unit, agitate and collect debris principally within an area-footprint which allows for clearance lifting and removal of collected debris through the access opening.

Abstract: A cleaning apparatus of an electronic component of the present invention comprises: means for supplying cleaning water to an object to be cleaned such as alumina titanium carbide wafer, a sponge member for contacting with the object to be cleaned to clean a surface thereof, means for moving the object to be cleaned and the sponge member relative to each other, and means for adjusting the resistivity value of the cleaning water to 10M? or less. Using this apparatus, the object to be cleaned is cleaned using the sponge member while supplying, to the object to be cleaned, cleaning water having the resistivity value of 10M? or less. In this case, the cleaning degree is enhanced by soaking the object to be cleaned in the water having the resistivity value of 10M? or less before cleaning, and by using a dummy substrate.

Abstract: A brush cleaning and storing apparatus, particularly for storing of paint brushes and coating brushes and brushes of like material, in such Manner that the brush can be introduced into a solvent and then rubbed against a plate having a surface which aids in removal of the paint or similar substance. In addition, the apparatus and the method provide for suspending the brush in a housing of the apparatus. In this way, the solvent is contained within the housing, thereby avoiding environmental nuisance problems associated with the disposing of the solvent, and which also enables the reuse thereof.

Abstract: A sterile, absorbent, lint-free, soft, and at least slightly abrasive pad is impregnated with an anti-coagulant. The pad is packaged in a sterile pouch and the pouch is opened to apply the anti-coagulant to an intravenous device such as a catheter or stent device, to clean blood from a used needle or to decontaminate an operating room surface. The anti-coagulant is preferably heparin-benzalkonium chloride formulated in a solution of 1.5% heparin-benzalkonium chloride by weight or volume, containing 850 USP heparin units per milliliter in a solvent such as isopropyl alcohol.

Abstract: The invention is a one-piece ergonomic shielding tool that can be held in one hand to define a boundary against which a surface is processed on one side and protected from processing steps on the opposite side. The invention achieves this utility by providing a handle that is ergonomically fitted for the human hand to allow prolonged use without fatigue or injury to the user. The invention includes a straight edge, or guide edge, for dividing a surface into two regions and a curved handle for ergonomic hand-held use. The ergonomic shielding tool and a paint removal apparatus are useful in combination for scraping paint from one section of a surface and leaving another section protected from the paint removal process. The tool is adapted for use in a method of removing dried paint from a surface in a precise manner.

Abstract: A method of cleaning electric grills including wetting a sheet of fluid-absorbent material constructed to conform to the wave-like contours of the upper and lower heating platters of a typical electric grill, and inserting the wetted material in between the electric grill's heating platters.

Abstract: A scuff mark removal tool used to remove tar, dirt, and rubber scuff marks from an uncarpeted floor surface. The tool has a handle portion and a felt-covered ball attached to the handle portion. The felt-covering on the ball effectively removes the scuff marks when rubbed against the marks without scratching the floor surface.

Abstract: During a washing cycle of a rubber blanket on a blanket cylinder some revolutions of the blanket cylinder are initially performed during which the cleaning element is lifted off the blanket cylinder temporarily when the clamping channel passes under the cleaning element.

Abstract: There are provided an electroless plating apparatus and a post-electroless plating cleaning method which can remove Co or Ni particles, produced upon electroless plating onto Cu interconnects of an electronic circuit substrate and remaining on a silicon oxide film as an interlevel dielectric, without exerting an adverse influence on the Cu interconnects. The electroless plating apparatus for carrying out electroless plating of the surface of interconnects formed in a surface of an electronic circuit substrate having fine circuit patterns of conductive metal interconnects, includes: a substrate transfer device (62, 76, 86); a loading station (58) disposed in association with the substrate transfer device; at least one electroless plating cell (82) disposed in association with the substrate transfer device; and a scrub cleaning device (66a) and/or a solution cleaning device (66c) disposed in association with the substrate transfer device.

Abstract: A method for removing paint from a substrate includes the steps of providing a sponge having a first surface for contact with the substrate, providing ultrasonic transducers in contact with a second surface of the sponge opposite from the first surface, saturating the sponge with water to provide a path of water extending from the transducers to the substrate, and activating the transducers to generate (i) a low frequency acoustic field; and (ii) a high frequency acoustic field; and thereby (iii) micron-sized vapor or cavitation bubbles which impinge upon the paint on the substrate to remove the paint from the substrate.

Abstract: A method for cleaning a wafer with a drip nozzle being configured for use in a drip manifold that is oriented over a brush of a wafer cleaning system is provided. The drip nozzle has a first end and a second end with a passage defined there between where the passage includes a wall that extends longitudinally between the first end and the second end. An orifice is defined within the passage and located at the first end of the drip nozzle. The method includes inputting a fluid into the drip nozzle at an acute angle relative to a longitudinal extension of the wall and reflecting the fluid stream off an internal wall of the drip nozzle at least twice in a direction that is toward the second end. The method further includes outputting at least one substantially uniform drop from the second end of the passage.

Abstract: Powdered compositions comprising in admixture inorganic salts and silica gel, and optionally a fragrance additive, are disclosed. The novel compositions are useful in absorbing and deodorizing liquid waste and for removing such waste from irregular surfaces, such as textiles and carpeting, as well as from smooth hard surfaces. The compositions are effective in absorbing liquid biohazards, such as blood, vomit, urine, and other body fluids. For this application, a halogen-containing compound, such as sodium hypochlorite or calcium hypochlorite is preferably included in the composition. The mixtures can also be utilized for the absorption of oil-based spills and hydrocarbons and are also effective in removing moisture and malodors associated with pet urine and other moisture-related stains encountered in the home. When applied to liquid wastes, the absorbent properties of the compositions contain the spill, creating a solid cohesive matrix that allows for easy disposal.

Abstract: In a method of producing a glass substrate for a magnetic disk, a principal surface of a glass substrate is subjected to polishing in order to impart a texture thereon. Thereafter, a treating liquid is supplied onto the principal surface of the glass substrate. While a tape is pressed against the principal surface of the glass substrate, the principal surface is cleaned.

Abstract: A needlepunched nonwoven wipe containing a flowable product, activated by the addition of water, permits sustained release of the product.

Abstract: A cover (1) for a carpet kicker head (2) that covers the carpet kicker needles (7) on the base of the head. The cover has fastening means (8) on a distal end (17) to connect it around a needle adjustment knob (10) on the top of the kicker head and fastening means on the proximal end (16), which may include tie straps (9), snaps (19) or hook and loop fastening material (18) to secure it around a bar (4) connecting the head and a knee kicking. panel (5) on the other end, during use of the cover on the carpet kicker head to install carpet, carpet fibers (14) which become imbedded between the carpet kicker needles can be easily removed by unfastening the proximal end of the cover and pulling it in a downward direction (15), resulting in the carpet fibers being quickly and easily removed from the teeth on the base of the head, thereby eliminating the need for tedious removal by using one's fingers.

Abstract: A cleaning system comprises a cleaning device having a handle portion, the handle portion having a proximal end and a distal end; a cleaning head portion, the cleaning head portion adapted for use with a removable cleaning pad; a cleaning pad; and a cleaning fluid reservoir fluidly coupled to the cleaning head portion such that cleaning fluid is controllably allowed to flow by gravity onto the surface to be cleaned adjacent the cleaning head portion. The cleaning tool further comprises a nozzle portion mounted to the head or handle portions. The head portion of the cleaning system is coupled to the handle portion. A scrubbing portion is operatively coupled to the head portion the scrubbing portion having a scrubbing surface having surface features for providing a scrubbing action to the surface to be cleaned.

Abstract: Process deposits formed on a component of a process chamber are cleaned. In the cleaning method, gas holes in the component are mechanically pinned to clean the process deposits therein. A ceramic portion of the component is then exposed to an acidic solution, such as a solution of hydrofluoric acid and nitric acid. Mechanical pinning of the gas holes may be repeated after the acid cleaning step. The component is then plasma stabilized in a plasma zone by introducing a non-reactive gas into the plasma zone and forming a plasma of the non-reactive gas in the plasma zone. In one version, the component comprises an electrostatic chuck comprising a ceramic covering an electrode and having the gas holes therein.

Abstract: A method for washing eggs using a first feed conveyor for receiving eggs through a housing inlet and conveying them to a second conveyor. The second conveyor transports the eggs through an intermediate egg washing station which can include brushes and dispenses cleaning solution onto the egg surfaces. The eggs are then transferred from the second conveyor to a third conveyor for transporting through a brush and cleaning solution lower washing station for final cleaning. The eggs then exit through an outlet for sanitizing and/or drying. The three conveyors are vertically tiered and preferably the second conveyor will move in a direction immediately below and opposite relative to the first conveyor and the third conveyor will move in the direction similar to the first conveyor but below the second conveyor. A pre-washing step can be included.

Abstract: A cleaning apparatus for a contoured cooking surface is disclosed. Methods of cleaning a cooking system with the cleaning apparatus are also disclosed.

Abstract: An In-Situ Landing Light Cleaning Apparatus is disclosed. Also disclosed is an apparatus that permits the user to easily and thoroughly clean landing light lenses without the need for their removal and transportation to a remote cleaning machine. The apparatus has a cylindrical arrangement of brush bristles directed inwardly from a cylindrical substrate. The cylindrical substrate may be attachable to a conventional power drill or other rotating power tool by a shaft such that the cylinder can be power-rotated. The cylindrical brush member having the brush bristles is detachable so that new bristles can be installed when wear and tear mandates it. The cylindrical substrate further has a closed top end portion having a flat bristle brush insert for cleaning the top surface of the lenses.

Abstract: A composition and process are provided to provide a protective sacrificial film on a substrate. The sacrificial protective film collects environmental contaminants and is removed by application of a solution having a pH greater than 9.0. The protective film is formed by coating the substrate with a polymer having acidic moieties that have been neutralized with a base. A contaminated protective film is readily dissolved by a reapplication of an aqueous dispersion containing the neutralized coating polymer.

Abstract: A semiconductor wafer processing apparatus (10) includes a front-end robot (28), a wafer scrubber/dryer (30), a moisture detector (34) and a load/lock chamber (38, 40). The front-end robot (28) moves a wafer to be processed between the wafer cassette (21-24), the wafer scrubber (30), the moisture detector (34) and the load/lock chamber (38, 40). Optionally, the load/lock chamber (38, 40) may include an additional moisture detector. The load/lock chamber (38, 40) functions as an interface to a vacuum processing chamber (50, 52, 54) for performing various deposition processing steps where introduction of moisture would be destructive to the wafer.

Abstract: A cleaning device including a handle and a pan is provided. The pan has a smooth, continuous inner surface which facilitates cleaning. A ramp portion of a base of the pan has a transitional angle of inclination which facilitates pulling waste into the pan. Spacers and supports are provided to ensure that the front ramp remains in contact with a surface when a downward force is applied to the pan. A method is also provided which, using the aforementioned cleaning device, reduces the time necessary to remove a hazard on a surface.

Abstract: A method of removing iron oxide scale from processed sheet metal, the method includes the steps of: providing a surface conditioning apparatus; and conditioning a surface of the processed sheet metal with the surface conditioning apparatus. In general, the iron oxide scale generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the processed sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. The surface conditioning apparatus has at least one surface conditioning member. The step of conditioning the surface of the processed sheet metal includes bringing the at least one surface conditioning member into engagement with the surface of the sheet metal.

Abstract: A mop head having a sculpted cutout in at least one side surface that corresponds to the shape of floor molding to allow for cleaning of the floor molding and floor together.

Abstract: A method for cleaning a surface using a tool with both a cleaning head and a cleaning fluid reservoir housing coupled to an elongated handle, the method comprising the following steps: attaching a cleaning pad to the cleaning head; inserting a replaceable cleaning fluid reservoir into the housing; fluidically coupling the cleaning fluid reservoir to the cleaning head; dispensing controlled amounts of cleaning fluid from the reservoir onto a surface; and distributing the cleaning fluid evenly over the surface with the cleaning pad.

Abstract: A method and a system are provided for cleaning a surface of a wafer. The method starts by scrubbing the surface of the wafer with a cleaning brush that applies a chemical solution to the surface of the wafer. In one example, the cleaning brush implements a through the brush (TTB) technique to apply the chemicals. The scrubbing is generally performed in a brush box, with a top cleaning brush and a bottom cleaning brush. The top cleaning brush is then removed from contact with the surface of the wafer. The chemical concentration in the top brush may be maintained at substantially the same concentration that was in the brush during the scrubbing operation. Next, a flow of water (preferably de-ionized water) is delivered to the surface of the wafer. The delivery of water is preferably configured to remove substantially all of the chemical solution from the surface of the wafer before proceeding to a next cleaning operation.

Abstract: A cleaning implement comprising a handle and a removable cleaning pad. The removable cleaning pad is capable of absorbing at least 10 g deionized water per g of cleaning pad in 20 minutes, under a confining pressure of 0.09 psi. These implements provide the convenience of disposable cleaning implements and the cleaning ability of conventional mops.

Abstract: A system of cleaning a CMP pad used for removing copper from a substrate, the system comprising an abrasive cleaning pad, a cleaning solution delivery system that delivers a cleaning solution, an analyzing system that monitors the characteristics of the cleaning solution optically and chemically, and a carriage that allows the analyzing system to monitor the cleaning solution at a plurality of locations on the CMP pad. The use of the abrasive cleaning pad and the cleaning solution removes contaminants from the CMP pad, and the contaminants are dissolved in the cleaning solution. By measuring the concentration of contaminants in the cleaning solution, the condition of the CMP pad can be monitored. To measure the concentration of the contaminants, changes in the refractive index and absorption of light in the cleaning solution are measured, wherein the refractive index and absorption depend on the concentration of the contaminants.

Abstract: A method of surface cleaning and controlled oxidation of superalloys is described. The method provides a thin homogeneous layer of relatively pure alpha alumina which is suited to receive and adhere to a subsequent vapor deposited coating.

Abstract: Embodiments of the invention provide a method for removing contaminant particles from a substrate surface, where the method includes supporting a substrate in a face up position on a substrate support member and imparting a broadband impulse to the substrate support member in a direction that is substantially perpendicular to a surface of the substrate. The broadband impulse applied to the substrate support is calculated to be of sufficient magnitude to dislodge contamination particles from the surface of the substrate. The method further includes removing dislodged particles from an area proximate the substrate surface.

Abstract: This invention teaches both the means and the method for removing dirt and germs from a person's shoes before they enter a home or business. The invention uses four systems. The first system provides the method for initiating and replenishing fluids that contain a disinfectant. The second system presents the method of providing a new dampened wiping surface each time the device is ready for use. The third system provides a means of removing solid particulants from the wiping surface after it has been used. The fourth system provides the method of collecting the previously removed solids.

Abstract: In a procedure for cleaning floors by hand with the help of flat cleaning mops, mops provided with a certain quantity of cleaning solution are used. In this case, at least one mop is removed from a storage container (1), and saturated with solution before or during removal; the solution is applied onto the surface of the mop; the mops are stored as is after use in a holding container (2) up to their disposal for purposes of regeneration. A device for fitting and preparing a larger number of flat cleaning mops consists of a storage container, which has a removal opening (5) for removing mops, and is provided inside with a feeding device (11) for prior saturating the removed mops with cleaning solution.

Abstract: A method of removing iron oxide scale from processed sheet metal comprises the steps of: providing a surface conditioning apparatus; and conditioning a surface of the processed sheet metal with the surface conditioning apparatus. In general, the iron oxide scale generally comprises three layers prior to surface conditioning: a wustite layer, a magnetite layer, and a hematite layer. The wustite layer is bonded to a base metal substrate of the processed sheet metal. The magnetite layer is bonded to the wustite layer, and the hematite layer is bonded to the magnetite layer. The surface conditioning apparatus has at least one surface conditioning member. The step of conditioning the surface of the processed sheet metal includes bringing the at least one surface conditioning member into engagement with the surface of the sheet metal.

Abstract: An apparatus and method is provided for processing an electronic device, particularly the molding and cleaning of the device. Molding means encapsulate the electronic device with a molding compound. Thereafter, stain from one or more surfaces of the electronic device is removed by a stain removal device adapted to impact the electronic device with a polishing agent. A residue removal system then removes residue from the one or more surfaces of the electronic device.

Abstract: An apparatus and a method for the cleaning of magnetic tape cartridge drive, particularly such as removable data-storage media tapes, and especially an arrangement and method of providing a disposable cartridge retention spring cleaning tool.

Abstract: A cleaning element comprises a leader and a brush. The leader allows the brush to be pulled through a surgical instrument or lumen. The brush allows for beneficial cleaning of surgical lumens. Also, a method for cleaning surgical instruments by pulling a brush through a surgical instrument is disclosed.

Abstract: A solidifier for a liquid, the solidifier comprising a mixture of absorbents having different apparent densities whereby at least one absorbent is negatively buoyant and at least one absorbent is positively buoyant relative to the liquid sought to be solidified. Packaging for the solidifier is disclosed for effecting selective dispersal of the solidifier within the liquid sought to be solidified.

Abstract: A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which may contain one or more transducers) and is rotated such that successive portions of the disk edge are scanned through the trough or past the swab. To prevent etchant from contacting the major surface of the substrate, and/or to prevent excessive etching, the edge of the disk is contacted with a rinsing fluid (e.g., a rinsing fluid nozzle or a trough filled with rinsing fluid). In a further embodiment material such as residue or particles may be removed via a trough containing sonically energized rinsing fluid.

Abstract: The present invention involves a solvent vapor transfer device for holding an absorbent pad, which receives and disperses solvent vapors over a lacquer-based residue on a textile. A solvent is poured or dripped into an absorbent pad portion of the vapor transfer box, from which solvent vapors are released. The solvent vapors pass through the vapor transfer box and concentrate in a vapor chamber over the lacquer-based residue and textile. As the solvent vapors come into continuous contact with the lacquer-based residue, the residue begins to dissolve and soften. Upon sufficient dissolution, minute quantities of the liquid solvent may be applied directly to the partially dissolved residue and quickly suctioned into an extraction vacuum. This process may be repeated as necessary to achieve complete removal of the residue.

Abstract: To provide a cleaning sheet that can remove foreign matter adhering on a probe needle without wearing the probe needle and that does not allow the foreign matter to re-adhere on the probe needle, the cleaning sheet has a cleaning layer on at least one surface thereof, the cleaning layer containing a urethane polymer and a vinyl monomer.

Abstract: A cleaning system includes a cleaning head with a generally spherical outer contour formed of a deformable and resilient foam-like material. A handle extends from the head. A plurality of disposable cleaning covers each have an inward face and an opposed outer face. Each cover has an installed position, wherein the inward face is disposed against the outer contour of the cleaning head and the cover is wrapped about the cleaning head. A retaining device selectively retains one of the sheets in the installed position, such that the cleanable surface may be cleaned with the outer face of the sheet.

Abstract: The present invention is directed to a scraper suitable for use in removing material adhering to flat surfaces, e.g. paint. In the presently preferred embodiment, the scraper comprises a blade body, a scraping surface and a handle. The scraping surface extends longitudinally along a bottom edge of the blade body while the handle is affixed to a top edge of the blade body. The blade body comprises an elongate, flat body constructed of a rigid, yet flexible material, e.g. steel. The blade is characterized by a pair of angular bends dividing the blade into a center portion and two end portions, each portion being in a different plane. The bends are preferably positioned on opposite sides of the handle, more preferably equidistant from each end of the blade body. The end portions are angled to opposite sides of the center portion so that the angles are complementary, resulting in the end portions being generally parallel.

Abstract: There is provided a method of cleaning completely a deposit on the surface of the member to be cleaned, of a plasma processing apparatus without any damage of the coating which has been formed anodized coating or sprayed coating on the surface of the member to cleaned. The method of cleaning comprises a chemical cleaning step of dipping in an organic solvent (e.g. acetone) (a); and then a step blowing pressurized air so as to remove the deposit which has been peeled from a buffer plate (14) treated chemically (b); and then, of removing physically the deposit remained at the edges of the buffer plate (14) by blasting by using a CO2 blast apparatus (105), and f steps of dipping the buffer plate (14) in pure water (104), and imparting supersonic vibration to remove the deposit remaining on a buffer plate (14).

Abstract: A passive vehicle surface preparation apparatus includes a mounting assembly and a support arm assembly having support arms pivotally connected to the mounting assembly. The vehicle preparation apparatus further includes a first wiper assembly having a stationary preparation surface for wiping the top surfaces of a vehicle. The vehicle preparation apparatus may also include vertical wiper assemblies for wiping the side panels of the vehicle.