Using Solid Work Treating Agents Patents (Class 134/6)
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Publication number: 20020179112Abstract: A method of manufacturing an electronic device, in particular but not exclusively a semiconductor device, in which method a substrate (2) is placed inside a process chamber (1) and a surface (3) of the substrate (2) is subjected to a cleaning process sequence comprises the steps of:Type: ApplicationFiled: May 30, 2002Publication date: December 5, 2002Inventor: Lenardus Cornelus Robertus Winters
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Publication number: 20020179113Abstract: The pickling process of the present invention is designed for pickling electrical steel strip in a continuous fashion. It comprises at least one pickling tank equipped with at one sprayer designed to spray the top and bottom surfaces of a steel strip with a solution comprised of hydrogen peroxide prior to and/or after the strip is immersed in a solution contained in a pickling tank. Upon exiting the final pickling tank, the strip is brushed/scrubbed to loosen any residual scale to form a clean strip.Type: ApplicationFiled: April 9, 2002Publication date: December 5, 2002Inventors: Vijay N. Madi, Jerald W. Leeker, Clayton A. Van Scoy
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Patent number: 6488779Abstract: A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are introduced into the fluid film on the substrate surface. The ice crystals have a temperature that is lower than the temperature of the fluid such that the fluid changes the ice crystals into a gaseous state to form a pulse generated in the fluid film. The depth of penetration of the ice crystals into the fluid film is controlled such that the ice crystals do not strike the substrate surface. The substrate surface is cleaned with the pulse.Type: GrantFiled: December 13, 2001Date of Patent: December 3, 2002Assignee: Steag MicroTech GmbHInventor: Jürgen Lohmüller
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Publication number: 20020174881Abstract: A wheel for a conveyor system for transporting semiconductor wafers includes a first section for supporting a semiconductor wafer at a first level and a second section for supporting the wafer at a second level, with the first level being higher than the second level. In one embodiment, each of the first and second sections is semicircular. The first level may be substantially the same as a level at which the wafer is subjected to a wafer cleaning operation, and the distance the second level is below the first level may be in a range from about one sixteenth of an inch to about three sixteenths of an inch. A conveyor system for transporting wafers and a method for transferring wafers from a conveyor system to a wafer processing station also are described.Type: ApplicationFiled: July 11, 2002Publication date: November 28, 2002Applicant: Lam Research CorporationInventors: Brian M. Bliven, Michael Ravkin
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Publication number: 20020175092Abstract: The present invention relates to a method of cleaning floors and other large surfaces with a cleaning device comprising a handle and a mop head attached thereonto, and a disposable mop wetted with a cleaning composition, said mop being initially at least partially folded and packaged into a box containing a stack of said mops, and said mop being releasably fixed onto said mop head before and while cleaning, said method being characterized in that it comprises the steps of:Type: ApplicationFiled: March 27, 2002Publication date: November 28, 2002Inventors: Marielle Jeannine Coletta Stulens, Rached Menif
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Publication number: 20020173214Abstract: Cleaning articles comprising a nonwoven web or foam, binder, and organic particles.Type: ApplicationFiled: April 12, 2001Publication date: November 21, 2002Applicant: 3M Innovative Properties CompanyInventors: Lawrence J. Mann, Phillip M. Winter
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Publication number: 20020173437Abstract: The present invention relates to methods for cleaning, rinsing, and/or antimicrobial treatment of medical carts, medical cages, and other medical instruments, devices or equipment. The method for cleaning employs a solid alkaline, for example a solid carbonate, cleaning composition for cleaning the medical cart, cage, instrument, device, or equipment. The method for rinsing employs a solid neutral or neutralizing rinse composition for rinsing the medical cart, cage, instrument, device, or equipment. The method for antimicrobial treatment employs a solid, for example a solid quaternary ammonium or solid halogen, antimicrobial composition, for antimicrobial treatment of the medical cart, cage, instrument, device, or equipment.Type: ApplicationFiled: March 23, 2001Publication date: November 21, 2002Inventors: Reid Rabon, Sally K. Swart, Denise Chandler, Terrence P. Everson
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Publication number: 20020170572Abstract: There is proposed an apparatus and method for cleaning a semiconductor substrate, which make it possible to minimize the adhesion of mist in a cleaning tank at the occasion of cleaning a semiconductor substrate, to realize a-high removal effect of residual polishing particles, and to enable to obtain a clean surface. In view of preventing a mist generated by the jet of high pressure water from re-adhering to the substrate during the cleaning of a semiconductor substrate, a cover member is disposed at a mist-generating region so as-to prevent the splash of the mist. Additionally, a cavity is caused to generate by contacting a high pressure water with a still water, and high-frequency generated by the generation of the cavity is utilized for removing the residual polishing particles. Alternatively, the ejection of high pressure water against the surface of the substrate is performed in a liquid phase such-as ultrapure water, thereby preventing the generation of mist.Type: ApplicationFiled: June 26, 2002Publication date: November 21, 2002Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hiroshi Tomita, Soichi Nadahara, Motoyuki Sato
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Publication number: 20020170574Abstract: The invention provides a method for differentially applying cleaning chemistries to a silicon wafer that has undergone a polishing process whether chemical mechanical polishing or polishing with a fixed abrasive material. In accordance with the invention, cleaning fluid with a specific chemistry designed for cleaning the front side of the wafer is applied to the front side; while different chemistry specifically selected for more effectively cleaning the rear side of the wafer is applied to that side. This application of different chemistries to the two sides of the wafer is referred to as “differential cleaning”.Type: ApplicationFiled: May 21, 2001Publication date: November 21, 2002Applicant: SpeedFam-IPEC CorporationInventor: Justin M. Quarantello
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Publication number: 20020166573Abstract: Cleaning compositions, pads, wipes, and implements provide effective cleaning of hard surfaces.Type: ApplicationFiled: March 8, 2002Publication date: November 14, 2002Applicant: The Procter & Gamble CompanyInventors: Nicola John Policicchio, Preston James Rhamy, Michael William Dusing, Kenneth William Willman, Rhonda Jean Jackson
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Publication number: 20020168867Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.Type: ApplicationFiled: February 19, 2002Publication date: November 14, 2002Inventors: Andrew G. Haerle, Gerald S. Meder
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Patent number: 6478878Abstract: A blasting medium which has an average grain size of at most 20 &mgr;m and contains at least 90 mass % of a water-soluble inorganic salt, wherein the content of grains having grain sizes of at least 50 &mgr;m is at most 5 mass %.Type: GrantFiled: March 28, 2000Date of Patent: November 12, 2002Assignee: Asahi Glass Company, LimitedInventors: Masaharu Tanaka, Hachiro Hirano, Makoto Yoshida
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Patent number: 6478879Abstract: Systems and methods for prevention of condensation of ambient water vapor due to evaporation of frozen carbon dioxide particles used to clean data storage tapes. Various embodiments maintain conditions under which condensation cannot form in the ambient environment immediately surrounding a portion of a rigid surface on which the tape is maintained in thermodynamic contact and under tension (e.g., a metallic capstan around which the tape is wrapped).Type: GrantFiled: September 13, 2000Date of Patent: November 12, 2002Assignee: Imation Corp.Inventor: Robert S. Jackson
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Publication number: 20020162572Abstract: The present invention provides a method of removing residual particles from a polished surface. The method comprises the steps of: providing a substrate, forming a dielectric layer on the substrate, brush-cleaning and etching the dielectric layer on the substrate with a liquid when residual particles are trapped therein, whereby the residual particles are loosened and then relocated to the dielectric layer, and finally cleaning the dielectric layer to remove the relocated residual particles.Type: ApplicationFiled: May 4, 2001Publication date: November 7, 2002Inventors: Hou-Hong Chou, Jiun-Fang Wang
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Publication number: 20020162573Abstract: A sponge mop is fitted with a wringing device. The wringing device includes a sleeve that slidably surrounds the handle of the mop. A roller is attached to the sleeve and is spaced from the sleeve. A rod is pivotally attached at one end to the mop head and at the other end to a small slide block that slides on a handle-mounted rail. The slide block bears against a portion of the sleeve housing with adequate pressure so that downward movement of the sleeve moves the slide block and thus the rod, thus effecting the rotation of the mop head by, ultimately, 90 degrees such that the sponge is positioned with its cleaning face parallel to the axis of the handle. Further downward travel of the sleeve allows the roller on the device to expel water held by the sponge. A scrubber/scraper is attached to the mop head at the end which is remote from the handle when mop head is generally aligned with the handle.Type: ApplicationFiled: May 4, 2001Publication date: November 7, 2002Applicant: Products of Tomorrow, Inc.Inventor: Juan Fernandez
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Patent number: 6475293Abstract: An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.Type: GrantFiled: November 16, 2000Date of Patent: November 5, 2002Assignee: Intel CorporationInventors: Monsour Moinpour, Ilan Berman, Young C. Park
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Publication number: 20020157687Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.Type: ApplicationFiled: April 25, 2001Publication date: October 31, 2002Inventors: Wei-Hsu Wang, Tsan-Chi Chu, Cheng-Yuan Yao, Wei-Hao Lee, Ping-Chung Chung
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Publication number: 20020160224Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle.Type: ApplicationFiled: December 13, 2001Publication date: October 31, 2002Applicant: The Procter & Gamble CompanyInventors: Bruce Barger, Thomas George Crowe, Robert Henry Rohrbaugh, Alan Scott Goldstein, Michael Ray McDonald, Helen Frances O'Connor, Morgan Thomas Leahy
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Publication number: 20020157199Abstract: A method and product for computer disk drives. Glass substrates are provided having low content of residual polishing particles on the surfaces thereof. An exemplary method includes reduction of residual polishing particle content by immersion of the glass substrate in an acid bath containing nitric acid, hydrogen peroxide and an organic acid having a carboxylic acid group.Type: ApplicationFiled: May 1, 2002Publication date: October 31, 2002Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventor: Douglas Howard Piltingsrud
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Publication number: 20020153026Abstract: A washer includes driving and scrubbing rollers that press against the opposing surfaces of a substrate, which may be, e.g., a small form factor disk. The driving rollers and scrubbing rollers are approximately aligned along two different radii of the substrate that are separated by 180 degrees. The driving rollers rotate in opposite directions as do the scrubbing rollers. During the scrub cycle, the driving rollers cause the substrate to rotate, while the scrubbing rollers scrub the opposing surfaces of the substrate. Outside diameter rollers that are orthogonally positioned relative to the driving rollers and the scrubbing rollers, and which may be free spinning, contact the outside diameter of the substrate and hold the substrate in position during the scrub cycle. The substrate is loaded into the washer by lifting the substrate, via a lifting arm, to the driving and scrubbing rollers.Type: ApplicationFiled: June 14, 2002Publication date: October 24, 2002Inventors: Joseph L. Ritchey, Johann F. Adam, Evan F. Cromwell
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Publication number: 20020153025Abstract: A cleaning apparatus (9) for cleaning a peripheral part of a substrate holds a peripheral part of a substrate (1) between the elastic porous member (29) of an upper cleaning roller (16) and an elastic porous member (30) of a lower cleaning roller (17). The power of a drive motor (13) is transmitted through a drive pulley (18), a belt (26) and a driven pulley (24) to a rotating shaft (17a) to rotate the lower cleaning roller (17), and is transmitted through a drive pulley (22), a belt (25) and a driven pulley (23) to a rotating shaft (16a) to rotate the upper cleaning roller (16) in a direction opposite the direction in which the lower cleaning roller (17) is rotated. A cleaning liquid is supplied through cleaning liquid supply nozzles (31) and cleaning liquid supply pipes (31a) into core members (27, 28). Then the cleaning liquid flows through connecting holes (35) formed in the circumferential walls of the core members (27, 28) and permeates the elastic porous members (29, 30).Type: ApplicationFiled: September 27, 2001Publication date: October 24, 2002Inventors: Takashi Yoshimura, Shoichi Murakami, Takeshi Sekiguchi, Nobunari Nadamoto
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Patent number: 6468358Abstract: A portable, diver-operated cryogenic freezing unit cleans surfaces underwater. A housing has a first chamber that contains cryogenic liquid, such as liquid nitrogen, and a second chamber is disposed adjacent to an end portion that fits about contaminating matter on a surface underwater. A valve vents cryogenic liquid from the first chamber to expand as gas in the second chamber. The vented cryogenic liquid and gas freeze a slug of water and the contaminating matter on the surface within the end portion. The housing is bent, twisted or otherwise displaced to break or pry-away and remove the frozen slug of water and contaminating matter from the surface to thereby clean it. A method of cleaning a surface underwater using the cryogenic freezing unit is described.Type: GrantFiled: November 14, 2000Date of Patent: October 22, 2002Assignee: The United States of America as represented by the Secretary of the NavyInventors: Billy Courson, John Shelburne
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Patent number: 6468359Abstract: The invention relates to a method for cleaning a metallic or an enameled surface comprising flooding a metallic surface contaminated with deposits with a mixture comprising (i) water, (ii) chippings of woods selected from the group consisting of merantis, bongossis, mahoganies, sipos, khayas, lauans, and sapellis, and (iii) a member selected from the group consisting of polyaspartic acid, salts of polyaspartic acid, and polysuccinimide, and thereby cleaning the surface.Type: GrantFiled: March 16, 2001Date of Patent: October 22, 2002Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann
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Patent number: 6463938Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.Type: GrantFiled: September 13, 2001Date of Patent: October 15, 2002Assignee: Verteq, Inc.Inventor: Mario E. Bran
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Patent number: 6464796Abstract: A method of applying a fluid to a brush is provided. The method includes outputting a flow of fluid from a shaft to an area between the shaft and a distributor where the flow of fluid is restricted by the distributor to generate a uniform pressure buildup inside of the distributor. The method further includes delivering the fluid from the area through at least one opening in the distributor to an outer surface of the distributor where the outer surface of the distributor abuts an inner surface of a housing. The method additionally includes dispensing the fluid from between the outer surface of the distributor and the inner surface of the housing to an outer surface of the housing through at least one perforation in the housing, the housing being attached to a brush. The method also includes applying the fluid through the brush where the fluid is received from the outer surface of the housing.Type: GrantFiled: May 25, 2001Date of Patent: October 15, 2002Assignee: Lam Research CorporationInventors: Jim Vail, Mike Wallis
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Patent number: 6463942Abstract: A portable, diver-operated cryogenic freezing unit cleans surfaces underwater. A housing has a first chamber that contains cryogenic liquid, such as liquid nitrogen, and a second chamber is disposed adjacent to an end portion that fits about contaminating matter on a surface underwater. A valve vents cryogenic liquid from the first chamber to expand as gas in the second chamber. The vented cryogenic liquid and gas freeze a slug of water and the contaminating matter on the surface within the end portion. The housing is bent, twisted or otherwise displaced to break or pry-away and remove the frozen slug of water and contaminating matter from the surface to thereby clean it. A method of cleaning a surface underwater using the cryogenic freezing unit is described.Type: GrantFiled: October 2, 2001Date of Patent: October 15, 2002Assignee: The United States of America as represented by the Secretary of the NavyInventors: Billy Courson, John Shelburne
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Publication number: 20020144712Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle.Type: ApplicationFiled: October 5, 2001Publication date: October 10, 2002Inventors: Bruce Barger, Thomas Geroge Crowe, Robert Henry Rohrbaugh, Alan Scott Goldstein, Michael Ray McDonald, Helen Frances O'Connor, Morgan Thomas Leahy
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Publication number: 20020144710Abstract: A copper wiring is desirable for a high-speed logic circuit integrated on a semiconductor substrate, and is patterned through a chemical mechanical polishing, wherein polishing particles are brushed away from the major surface of the resultant semiconductor structure by using aqueous ammonia at 0.0001-0.5 weight percent, catholyte or hydrogen-containing water without damage to the copper wiring, and, thereafter, metallic contaminants such as copper is removed by using washer containing decontaminating agent selected from polycarboxylic acid, ammonium salts thereof and polyaminocarboxylic acid also without damage to the copper wiring.Type: ApplicationFiled: February 13, 2002Publication date: October 10, 2002Applicant: NEC CorporationInventors: Hidemitsu Aoki, Shinya Yamasaki
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Publication number: 20020144711Abstract: A cleaning device for the anus including a cylindrical portion comprised of a flexible material. The cylindrical portion has an open upper end, a closed lower end, and a cylindrical side wall therebetween. The closed lower end is concave defining a central alignment point.Type: ApplicationFiled: April 9, 2001Publication date: October 10, 2002Inventor: Steven Tung
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Patent number: 6461441Abstract: The cleaning pads (102, 104) that are used to clean work pieces (200), such as semiconductor wafers, are cyclically compressed against one another and rinsed with a rinsing fluid. By cyclically compressing the cleaning pads (102, 104) together and rinsing them, the debris that the cleaning pads remove from the work pieces (200) and that becomes embedded in, and adhered to, the cleaning pads (102, 104) is subsequently removed therefrom.Type: GrantFiled: May 9, 2001Date of Patent: October 8, 2002Assignee: SpeedFam-IPEC CorporationInventors: Yakov Epshteyn, Frank Krupa, Ellis Harvey
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Publication number: 20020139392Abstract: Powdered compositions comprising in admixture inorganic salts and silica gel, and optionally a fragrance additive, are disclosed. The novel compositions are useful in absorbing and deodorizing liquid waste and for removing such waste from irregular surfaces, such as textiles and carpeting, as well as from smooth hard surfaces. The compositions are effective in absorbing liquid biohazards, such as blood, vomit, urine, and other body fluids. For this application, a halogen-containing compound, such as sodium hypochlorite or calcium hypochlorite is preferably included in the composition. The mixtures can also be utilized for the absorption of oil-based spills and hydrocarbons and are also effective in removing moisture and malodors associated with pet urine and other moisture-related stains encountered in the home. When applied to liquid wastes, the absorbent properties of the compositions contain the spill, creating a solid cohesive matrix that allows for easy disposal.Type: ApplicationFiled: March 15, 2002Publication date: October 3, 2002Inventors: Ronald N. Cervero, Matthew W. Gower
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Publication number: 20020139393Abstract: The present invention provides a wafer cleaning apparatus. In an advantageous embodiment, the wafer cleaning apparatus includes cleaning brushes mounted within a brush box and a sensor associated with at least one of the cleaning brushes and configured to detect a degree of wetness of the at least one of the cleaning brushes. In most cases, the cleaning brushes are comprised of an absorbent material, such as polyvinyl alcohol, that becomes more compressible as the cleaning brushes become more wetted with a solution. Thus, a degree of compressibility can be related to a degree of wetness of a cleaning brush, which provides data that allows an operator to determine when the cleaning brushes are wet enough to send a wafer through the cleaning apparatus without incurring unnecessary damage.Type: ApplicationFiled: March 29, 2001Publication date: October 3, 2002Inventors: Annette M. Crevasse, William G. Easter, John A. Maze, Frank Miceli
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Publication number: 20020139389Abstract: A wafer preparation module is provided. The wafer preparation module includes an enclosure, which contains wafer engaging rollers. The wafer engaging rollers are oriented at an angle and are designed to spin a wafer at an angle during preparation.Type: ApplicationFiled: March 30, 2001Publication date: October 3, 2002Inventor: Randolph E. Treur
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Publication number: 20020139394Abstract: The present invention is a method and apparatus for shielding the lens and the field of view of an optical device, such as a camera or an image projector, from obstruction by unwanted contaminants such as dust, dirt, rain, and the like. The invention employs a transparent shield positioned to protect the lens from such contaminants. A wiper is positioned to be in contact with the shield but the wiper is also positioned to not obstruct the field of view. A rotation mechanism is used to cause rotation of the shield. Contaminants that may be deposited upon the shield may be wiped from the shield by the wiper yet the wiper does not obstruct the field of view. Rotation of the shield allows a portion of the shield that is obstructed by a contaminant to be rotated away from the field of view. Rotation of the shield allows a portion of the shield that has been wiped to be rotated into the field of view.Type: ApplicationFiled: April 3, 2001Publication date: October 3, 2002Inventor: Barry Bronson
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Publication number: 20020134407Abstract: In order to keep satisfactory the state of contact between a magnetic tape and a magnetic head, dust having accumulated between bumps of a magnetic head having a plurality of bumps is to be removed.Type: ApplicationFiled: March 18, 2002Publication date: September 26, 2002Applicant: NEC CORPORATIONInventor: Haruo Urai
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Publication number: 20020134401Abstract: The invention is based on a method for cleaning vehicle windows by means of a wiper with a wiper strip (12), whose wiper lip (16) rests against the vehicle window.Type: ApplicationFiled: March 8, 2002Publication date: September 26, 2002Inventor: Ralf Schmid
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Publication number: 20020134399Abstract: A method for collection of lunar dust particles includes the steps of providing a magnetic field source for attracting lunar dust particles, providing magnetic proximity between the lunar dust particles and the magnetic field source, and collecting lunar dust particles by the magnetic field source. An apparatus for the collection of lunar dust particles includes a magnetic field source, a structure for providing magnetic proximity between lunar dust particles and the magnetic field source, and a structure for collecting lunar dust particles by the magnetic field source. The apparatus can be utilized with a lunar living facility, such as a spaceship or lunar base. A self-cleaning solar cell includes at least one solar panel and a movable structure having a magnetic field source adapted for translation over the solar panel to collect accumulated particles.Type: ApplicationFiled: March 21, 2001Publication date: September 26, 2002Inventor: Lawrence A. Taylor
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Patent number: 6453497Abstract: An oral care device includes a handle, a head extending from the handle, and one or more oral care elements extending from the head. The device also includes a drive for engaging a base portion of each of the one or more oral care elements and for positioning each oral care element relative to that portion of the head from which the oral care element projects based on the motion of the oral care device. In a preferred embodiment of the invention, each oral care element is a tuft of one or more bristles.Type: GrantFiled: March 16, 2000Date of Patent: September 24, 2002Assignee: The Gillette CompanyInventors: Casper Wein-Tien Chiang, Andy Yang, Ben Wang
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Publication number: 20020129835Abstract: A hand-held scrubbing device for cleaning a surface has a waterproof casing having an interior area and an exterior area. The interior area has an electromechanical motor and a battery joined to the electromechanical motor. The exterior area has a scrubbing surface removably joined to the electromechanical motor which provides a mechanical action to the scrubbing surface. The scrubbing surface is impregnated with a cleaning composition. A kit has a hand-held scrubbing device, while a method of use employs such a hand-held scrubbing device. A disposable scrubbing surface impregnated with a cleaning composition is designed for use with a hand-held scrubbing device.Type: ApplicationFiled: December 21, 2001Publication date: September 19, 2002Applicant: The Procter & Gambie CompanyInventors: Lucio Pieroni, Peter Robert Foley
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Publication number: 20020129834Abstract: A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and having troughs interspersed therebetween, a second surface opposite the first surface, and a thickness. The troughs, which may contain polishing/cleaning chemicals, are divided into first and second groups of substantially parallel troughs. The groups of troughs are arranged at an angle to one another forming a hatch pattern. The pad can be formed to make roller brushes, circular brushes or manual wipes. For the circular brushes the nubs are arranged adjacent each other forming laterally alternating concentric circles of nubs. Micropores are interspersed within the pad having a gradient of pores with smaller pores towards the first surface and larger pores towards the second. There are no sharp edges or corners in/on the pad.Type: ApplicationFiled: March 13, 2001Publication date: September 19, 2002Inventor: Harald A. Bailey
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Publication number: 20020121290Abstract: A hydrophobic wafer is cleaned, rinsed with a low concentration surfactant (e.g., a solution containing approximately 1 to 400 parts per million of surfactant) and then dried (e.g., a via spin drier or an IPA drier). The cleaning rinsing and drying steps may be performed in one or more apparatuses.Type: ApplicationFiled: April 16, 2002Publication date: September 5, 2002Applicant: Applied Materials, Inc.Inventors: Jianshe Tang, Yufei Chen, Brian J. Brown, Wei-Yung Hsu
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Publication number: 20020121289Abstract: Methods and apparatus are provided for precisely and repeatably positioning spray bar. In accordance with a first aspect, an apparatus is provided that includes (1) a spray bar having an alignment mark and one or more openings, the spray bar configured to output a fluid spray from the one or more openings; (2) a mounting device having an alignment mark, the mounting device configured to support the spray bar; and (3) a substrate support configured to support a substrate. The alignment mark of the spray bar and the alignment mark of the mounting device may be aligned so as to position a fluid spray output by the spray bar toward a substrate supported by the substrate support. Numerous other methods and apparatus also are provided.Type: ApplicationFiled: February 27, 2002Publication date: September 5, 2002Applicant: Applied Materials, Inc.Inventors: Brian J. Brown, David G. Andeen
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Publication number: 20020121288Abstract: An apparatus and methods are provided for performing maintenance procedures such as washing, cleaning, deicing, and painting to an aircraft. The apparatus according to an embodiment of the present invention preferably has a mobile base having a plurality of wheel members for allowing the mobile base to travel along surfaces and a plurality of support surface registering members for registering the mobile base to a support surface to inhibit movement of the plurality of wheel members.Type: ApplicationFiled: January 19, 2002Publication date: September 5, 2002Inventor: Lou Marrero
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Patent number: 6444255Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.Type: GrantFiled: February 13, 2001Date of Patent: September 3, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiyuki Nagahara, Naoya Hayamizu, Naoaki Sakurai, Noriko Okoshi, Toshitaka Nonaka, Hiroaki Furuya
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Publication number: 20020117185Abstract: A bath brush assembly is detachably mountable to a wall of a shower or bathtub. The bath brush assembly includes a frame and a bore extending therethrough. A sponge or a plurality of bristles are attached to the frame and extend into the bore such that a stroke victim or handicapped person may clean one of their appendages by moving their appendage against the sponge.Type: ApplicationFiled: February 12, 2002Publication date: August 29, 2002Inventors: James S. Simon, Joan Knowles
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Patent number: 6440225Abstract: A method is provided for stripping a polymer film from a floor surface, comprising the steps of: (a) applying a concentrated alkaline stripper solution including an alkaline agent and a solvent, to the polymer film; (b) allowing this concentrated alkaline solution to chemically act on the polymer film during a contact time of at least 5 seconds; (c) scrubbing the polymer film with a scrubbing device while diluting the concentrated alkaline solution with water, so as to obtain a sludge; (d) vacuum cleaning the floor surface by suction of the sludge, whereby this method is carried out using one floor treating machine. This method is an integrated floor stripping procedure which is considerably more effective than known stripping methods of the prior art.Type: GrantFiled: February 16, 2000Date of Patent: August 27, 2002Assignee: Diversey Lever, Inc.Inventors: Michael Van Den Burg, Josef Jans, Frederik Jan Schepers, Rolf Semmler, Pieter Van Der Vlist
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Patent number: 6439245Abstract: A wheel for a conveyor system for transporting semiconductor wafers includes a first section for supporting a semiconductor wafer at a first level and a second section for supporting the wafer at a second level, with the first level being higher than the second level. In one embodiment, each of the first and second sections is semicircular. The first level may be substantially the same as a level at which the wafer is subjected to a wafer cleaning operation, and the distance the second level is below the first level may be in a range from about one sixteenth of an inch to about three sixteenths of an inch. A conveyor system for transporting wafers and a method for transferring wafers from a conveyor system to a wafer processing station also are described.Type: GrantFiled: June 30, 2000Date of Patent: August 27, 2002Assignee: Lam Research CorporationInventors: Brian M. Bliven, Michael Ravkin
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Publication number: 20020112741Abstract: A hand-held scrubbing device for cleaning a surface includes a waterproof casing having an interior area and an exterior area. The interior area has an electromechanical motor, a battery joined to the electromechanical motor, and a dispensing chamber joined to a dispensing mechanism. The exterior area has an orifice joined to the dispensing mechanism, a dispensing activator joined to the dispensing mechanism, and a scrubbing surface joined to the electromechanical motor. When the dispensing chamber is filled with a cleaning composition and when the dispensing activator is activated, the dispensing mechanism expels a portion of the cleaning composition from the waterproof casing, via the orifice. Furthermore, the electromechanical motor provides a mechanical action to the scrubbing surface. A method for cleaning an item employs such a hand-held scrubbing device. A cleaning kit includes such a hand-held scrubbing device and a cleaning composition.Type: ApplicationFiled: December 21, 2001Publication date: August 22, 2002Inventors: Lucio Pieroni, Peter Robert Foley
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Patent number: 6436197Abstract: A process for removing the coating and any metals from polymeric substrates such as compact discs (CDs) and digital video discs (DVDs) by applying high shear conditions to fluidized particulates of the polymeric substrate optionally in the presence of an accelerant.Type: GrantFiled: September 5, 2000Date of Patent: August 20, 2002Assignee: METSS CorporationInventors: Richard Sapienza, Kenneth J. Heater, R. Mark Hodge, Joshua R. Michaels, J. Michael Grubb
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Patent number: 6435953Abstract: A coin cleaning and grinding apparatus includes a conveyor for conveying coins, two drive rollers of urethane sponge having a urethane hardness between 70 and 90 degrees, and a pair of primary grinding rollers and a pair of secondary grinding rollers of urethane sponge. The primary grinding rollers are supported rotatably and downstream from the conveyor. One of the primary grinding rollers is positioned lower than the other. The lower primary grinding roller is in compressive contact with the higher primary grinding roller and one of the drive rollers. The secondary grinding rollers are supported rotatably and downstream from the primary grinding rollers. One of the secondary grinding rollers is positioned lower than the other. The lower secondary grinding roller is in compressive contact with the higher secondary grinding roller and the other drive roller. A sprinkling plate is positioned at an angle above the grinding rollers.Type: GrantFiled: June 1, 2001Date of Patent: August 20, 2002Assignee: Kabushiki Kaisha J. BoxInventor: Katuhiro Ogawa