Abstract: In a process for removing the paint from plastic components provided with coats of paint, the plastic components are first crushed to a bulk material size of the crushed plastic pieces. The plastic pieces are subsequently mixed with a paint removing agent reducing the adhesion of the coats of paint to the plastic pieces, and circulated by means of a conveyor screw. The paint removing agent is formed in this connection by an emulsion consisting of at least one benzyl-substituted alkanol and an alkyl-glycol acetate or N-alkyl-pyrrolidone with an aqueous lye, which can not be completely mixed. The mixing ratio for mixing the individual components is selected so that it is in the range of a mixing gap. After the paint removing agent has acted upon the painted plastic pieces, a solid substance is added to the paint remover so that the further steps of the method can be carried out in a dry state.

Abstract: A wet cleaning/passivation process for a passivatable metal part including a contaminant-bearing surface. The process includes the steps of: (a) contacting the contaminant-bearing part with an aqueous acid solution effective for pickling the contaminant-bearing surface of the contaminant-bearing part, with such contacting being conducted for sufficient time and at sufficient temperature to achieve pickling of the contaminant-bearing surface; (b) contacting the cleaned surface of the part with a passivating aqueous solution, with such contacting being conducted for sufficient time and at sufficient temperature to passivate the cleaned surface; and (c) CO2 blasting the surface, to remove micron and sub-micron particles from the surface.

Abstract: A system cleans a set of optical connectors. The system includes a fluid source, a vacuum source, a support member which defines a cleaning device edge, and a set of cleaning devices. Each cleaning device includes (i) a fluid intake member which connects to the fluid source, (ii) a fluid output member which connects to the vacuum source, and (iii) a cleaning head which connects to the fluid intake member and the fluid output member. Each cleaning device is disposed along the cleaning device edge of the support member. The set of cleaning devices is configured to (a) align over a set of optical interfaces of the set of optical connectors, (b) direct fluid (e.g., gas, gaseous snow, etc.) from the fluid source toward the set of optical interfaces, and (c) draw the directed fluid away from the set of optical interfaces and toward the vacuum source.

Abstract: The present invention provides a method and apparatus for delivering a cleaning and inspection device to an appropriate position on a backplane having an optical connector. A set of tubes corresponding to the number of optical connectors is attached to the rear of a connector assembly or some other similar device capable of being coupled to a connector housing containing the optical connector. The diameter of the hollow tube large enough to accommodate the insertion of several types of cleaning and inspection devices including optical cleaning swabs and scopes. After the connector assembly is mated with the connector housing, the tubes can provide direct access to each optical connector for cleaning and inspection.

Abstract: A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is retracted substantially into the cover member, and a second configuration wherein the cloth is extended substantially out of the cover member without becoming detached therefrom.

Abstract: The present invention relates to a kit comprising a dishwashing applicator comprising a cavity capable of receiving a unit dose dishwashing composition, and a unit dose dishwashing composition. Preferably the unit dose dishwashing composition is a water-soluble or water-dispersible pouch comprising a hand dishwashing composition.

Abstract: A device for cleaning the polished end faces of fibers of an optical connector having guide pins is provided. The device has a surface with at least one rail disposed on the surface. The rail has a height above the surface sufficient to accommodate guide pins extending from an optical connector. A system for cleaning the polished end faces of fibers of an optical connector is also provided that includes an overlay disposed on the cleaning device. A guide member that is disposed on top of the overlay is also provided for receiving the optical connector. A method for cleaning an optical connector with the disclosed device and system is also provided.

Abstract: A semiconductor wafer is cleaned while a sponge or brush is pressed against the wafer with a constant forced applied utilizing a bias in a constant force pencil. The wafer is cleaned in the state wherein a collapsing portion of the constant force pencil with respect to the cleaning sponge cloth is set in such a way that the cleaning pressure, which is applied from the cleaning sponge to the wafer, can be constant and is adjustable. A method for cleaning wafers using a constant force pencil is also described.

Abstract: A tufted coform nonwoven web prepared from meltblown filaments and at least one secondary material is disclosed. The tufted coform nonwoven web is useful as cleaning pads, wipes, mops, among other articles of manufacture. One surface of the tufted coform nonwoven web has projections which increase the bulk of the nonwoven web. The projections also aid in the scrubbing and cleaning ability of the coform nonwoven web. Also disclosed is the process of producing the tufted coform nonwoven web, method of using the tufted coform nonwoven web as a wipe, mop, and the like, along with cleaning kits containing the coform nonwoven web.

Abstract: A method and apparatus for cleaning the slider air bearing surface of a head gimbal assembly is disclosed. A plurality of carriers may position and hold a plurality of head gimbal assemblies to be polished. A cloth strip may be rubbed against the slider air bearing surface. A movable cylinder unit coupled to the plurality of carriers may move the carriers. A polish tank may provide cleaning solution to the movable cylinder unit. A pump may recirculate the cleaning solution. A filter canister with a filter cartridge may filter the cleaning solution.

Abstract: Cleaning compositions including a photocatalytic material and a sensitiser employ a photocatalytic material and a sensitiser at a locus, for example on a surface. The residue combats soils and/or undesired microorganisms at the locus.

Abstract: Clean room wipe products, methods of preparing them, and methods of using them are described. The clean room wipes are intended for use in cleaning up alkaline contaminants in clean room environments. The wipes contain impregnated acidic solutions, e.g., solutions of organic acids and optionally solvents, which are intended to reduce or eliminate the possibility of spontaneous combustion of the contaminated wipes, that is, when the wipes are used to contain spills of alkaline products such as hydroxylamine-based products and other caustic based formulations.

Abstract: Disclosed is a method of imparting a wobbling motion to a planar surface. In one embodiment the wobbling motion is imparted to a brush which can be used to clean uneven surfaces efficiently and easily. In another embodiment the wobbling motion is imparted to a brush which can be used to clean surfaces in confined spaces and reducing the risk of scratching or marring areas in the confined spaces. In another embodiment a method of cleaning a surface using a wobbling apparatus is disclosed.

Abstract: A sponge mop is fitted with a wringing device. The wringing device includes a sleeve that slidably surrounds the handle of the mop. A roller is attached to the sleeve and is spaced from the sleeve. A drive member is pivotally attached at one end to the mop head and at the other end to a small slide block that slides on a handle-mounted rail. The slide block bears against a portion of the sleeve housing with adequate pressure so that downward movement of the sleeve moves the slide block and thus the drive member, thus effecting the rotation of the mop head by, ultimately, 90 degrees such that the sponge is positioned with its cleaning face parallel to the axis of the handle. Further downward travel of the sleeve allows the roller on the device to expel water held by the sponge. A scrubber/scraper is attached to the mop head at the end which is remote from the handle when the mop head is generally aligned with the handle.

Abstract: A self-propelled floor cleaner is provided having a random motion generator which enhances the maneuverability of the floor cleaner. The random motion generator is rotatably attached to the frame of the cleaner and propels the cleaner across the floor in a random motion. This random motion facilitates cleaning of the floor by making the cleaner easier to manipulate. The random motion generator includes a hollow spherical shell. In the preferred embodiment, the hollow spherical shell houses a weighted motor assembly which is rotatably mounted on a center fixed axle which extends diametrically between the first and second hemispherical halves and is attached thereto. The weighted motor assembly is comprised of a motor housing and a power source, such as batteries or cells. A motor is housed within the motor housing and rotates the motor housing about the center fixed axle.

Abstract: The fluid-powered scouring whip is a length of flexible tubing composed of rubber or plastic. One or more scouring members, such as bristles or tines, extend outward from the tubing. These scouring members are molded or tooled as integral parts of the tubing, and may be configured in a variety of angles, densities, patterns or lengths. The fluid-powered scouring whip would be attached to a source of rapidly moving fluid. The whip would be introduced into a remote area in need of cleaning, such as an air duct. When fluid was introduced through the fluid-powered scouring whip, the whip would move about rapidly and randomly, scouring the surfaces of the area into which it had been introduced.

Abstract: The cleaning device may clean probe elements. The probe elements may be the probe elements of a probe card testing apparatus for testing semiconductor wafers or semiconductor dies on a semiconductor wafer or the probe elements of a handling/testing apparatus for testing the leads of a packaged integrated circuit. During the cleaning of the probe elements, the probe card or the handler/tester is cleaned during the normal operation of the testing machine without removing the probe card from the prober. The cleaning device may be placed within the prober or tester/handler similar to a wafer containing semiconductor dies to be tested so that the probe elements of the testing machine contact the cleaning medium periodically to remove debris and/or reshape the tips of the probe elements.

Abstract: A writing implement having a forward-positioned eraser, and method. The eraser circumscribes the shaft of the writing implement, and may have an annular or doughnut shape. The eraser may be affixed to the shaft portion, for example where used with a fixed-length writing implement such as a mechanical pencil or erasable pen. The eraser may, alternatively, be slidable along the shaft portion, which would make the eraser useable with a sharpenable pencil, the length of which will be changed as a result of sharpening.

Abstract: A dual texture coform nonwoven web prepared from meltblown filaments and at least one secondary material is disclosed. The dual texture coform nonwoven web is useful as cleaning pads, wipes, mops, among other articles of manufacture. One surface of the dual texture coform nonwoven web contains coarse filaments, which impart an abrasive characteristic to this surface of the nonwoven web and the other surface contains fine filaments, which impart a non-abrasive or soft surface to the nonwoven web. Also disclosed is the process of producing the dual texture coform nonwoven web, method of using the dual texture coform nonwoven web as a wipe, mop, and the like, along with cleaning kits containing the coform nonwoven web.

Abstract: Semiconductor wafer (11) are uniformly and thoroughly cleaned of particulate and organic contaminants by sweeping the wafer with a hydraulic broom that sprays cleaning solution onto the wafer. The broom contains an aspirating nozzle (3) for connection to a source of pressurized gas, such as nitrogen, and to a source of cleaning fluid, such as acetone, wherein cleaning fluid aspirated by the gas stream is expressed through the nozzle outlet to impact the surface of the wafer, dislodging particulate matter and dissolving organic contaminants. A programmed controller (9) controls movement of the hydraulic broom relative to the wafer to ensure that the entire surface is cleaned and permits a variety of sweeping patterns.

Abstract: Method for removing unwanted excess material from a mold section is particularly adapted for removing a monomer ring adhered within a reservoir of a female mold section used to mold a contact lens. The invention involves piercing the monomer ring and rotating the piercing members (e.g., annularly spaced pins) relative to the mold section whereby the monomer ring is sheared from the mold section to which it was adhered while the molded lens is left intact in the mold section.

Abstract: A cleaning apparatus for cleaning solder paste off the bottom side of a printed circuit board stencil includes a container of cleaning solution therein and a blade holder that is movable between a wiping position and the container of cleaning solution. A wiping blade is mounted in the blade holder. The blade holder, with the blade mounted thereon, is reciprocated back and forth when in communication with a stencil to be cleaned. The blade is moved from the wiping position in communication with the stencil into the cleaning solution in the container. A pneumatic piston and rotary actuator provides controlled movement of the wiping blade. The wiping blade may be vibrated during wiping to improve removal of solder paste from the stencil and the cleaning solution may be ultrasonically vibrated to improve removal of solder paste from the wiping blade. The wiping blade may also be pulsed into a sponge to remove excess cleaning solution prior to the next cleaning cycle.

Abstract: A method for repairing and lustering defects on a hydrophilic coat surface is reported. The method comprises the steps of applying a buffing composition on a hydrophilic coat surface; and buffing the hydrophilic coat surface to which the buffing composition has been applied. The buffing composition is an aqueous composition which comprises water and a water-soluble high-boiling-point liquid organic compound, and further comprises either a combination of abrasive particles and a dispersant, or lustering agent, or the both. The method allows for the removal of defects on a hydrophilic coat surface with good finish after repairing and without deteriorizing the antifouling function of the hydrophilic coat against urban fouling substances.

Abstract: The invention relates to an electrostatic precipitator for collecting liquid or solid particles from a gas stream. The electrostatic precipitator consists of a tube (1), through which the gas to be cleaned flows longitudinally, the internal wall (1A) of the tube forming a precipitating electrode for the particles to be collected. An internal electrode (2) extending in a lengthwise direction is disposed concentrically inside tube (1), a high electrical voltage being present in the space between this internal electrode and the precipitating electrode. On the inlet side, internal electrode (2) has a first section (2A) with a small cross-sectional area, and on the outlet side, a second section (2B) with a comparatively larger cross-sectional area. The function of the first section is essentially to form a corona while that of the second section is essentially to form an electrostatic collecting field.

Abstract: A floor care machine that includes a deck having a motor, a rotatable floor care element for engaging a floor surface, and a handle apparatus pivotally mounted to the deck is provided. Additionally, there are first and second sets of wheels toward the rear of the deck and on opposite sides of handle apparatus pivot attachment points. In addition to the attachment points, the handle apparatus and the deck are coupled together by a rigid handle link which is pivotally attached to the deck at one end and pivotally attached to the handle apparatus at the other end. The handle link communicates deck pivot forces between the deck and the handle apparatus, and in particular, communicates such forces resulting from a compressing or decompressing of a compressible component provided along the length of the handle apparatus.

Abstract: There are provided a solution applying portion 104 disposed opposite to the outer surface of the recording rotational drum 34 such that sliding on the outer surface of the drum is permitted and arranged to apply cleaning solution to the outer surface of the drum; and a scraping portion 108 disposed at a position more forward than the solution applying portion 104 in a direction in which the drum is rotated such that sliding on the outer surface of the drum is permitted and arranged to scrape the applied cleaning solution off the outer surface of the drum so that dust X is removed from the surface of the drum.

Abstract: An arrangement for removing residue from cooking spills from a heated or cold cooking surface. The arrangement includes a scraping device having a blade and a body, which body includes an ergonomically-shaped handgrip portion for a user to hold the scraping device. The user uses the blade to remove or scrape residue from the cooking surface, while minimizing damage to the cooking surface. The blade is held in a blade holder, which blade holder includes a moveable protection cover to protect the user from accidental contact with the blade. The cover can be retracted during use to expose the blade for removing residue. The blade holder and the handgrip portion are made of a duroplastic synthetic-plastic material having a low thermal conductivity.

Abstract: A method of dry cleaning surfaces of a semiconductor wafer includes the steps of placing a processed wafer in a vacuum environment and positioning a pad near each of a front surface and a back surface of the wafer. Cleaning gas is injected into a small clearance formed between each pad and the front and rear surfaces to generate a high-speed gas flow along the surface of the wafer. Particles left at the surfaces of the processed wafer are physically cleaned and removed with the high-speed gas flow. In order to assist this physical cleaning action, it is also possible to apply either a chemical cleaning method or an electrical cleaning method under application of plasma.

Abstract: There is disclosed a scrub cleaning device which can reduce cleaning time and which requires no large-scaled device for transferring a substrate to the next cleaning process.

Abstract: A method of processing perforated gypsum boards is disclosed. When the gypsum boards have been perforated the following steps are performed while the boards are being moved individually along a path. The moving boards are sprayed with pressurized water which is directed towards the opposite surfaces of the boards so as to enter apertures or slots formed by the perforation of the boards, and then water is removed from the moving boards by blowing pressurized air against the boards and sucking water therefrom, wherein dust on the boards is entrained into the water and removed from the boards together with the water.

Abstract: This tool applies treatments to surfaces by rubbing. It employs a mildly abrasive body of compacted non-woven fibres to carry and release fluids onto a surface as it cleans and massages the surface. It comprises a spill proof rubbing applicator capable of dispensing chemical substances ranging from low viscosity liquids to fine dry particulate and includes slurries and gels. The tool is provided with means of removing dirty used fibres from its treatment face.

Abstract: The present invention features a combination dustpan and residual dust collection device and method for removing residual dust from a surface after sweeping initial debris into the dustpan collection bin. The combination dustpan and residual dust collection device comprises a unique dusting head strategically positioned preferably on the underside portion of a dustpan. The dusting head is equipped with a dust cloth or dust cover capable of collecting and retaining residual dust typically left on the floor. When dirty, the dusting head material/covering may be replaced and or cleaned.

Abstract: A mop head having a sculpted cutout in at least one side surface that corresponds to the shape of floor molding to allow for cleaning of the floor molding and floor together.

Abstract: The present invention is a method and apparatus for shielding the lens and the field of view of an optical device, such as a camera or an image projector, from obstruction by unwanted contaminants such as dust, dirt, rain, and the like. The invention employs a transparent shield positioned to protect the lens from such contaminants. A wiper is positioned to be in contact with the shield but the wiper is also positioned to not obstruct the field of view. A rotation mechanism is used to cause rotation of the shield. Contaminants that may be deposited upon the shield may be wiped from the shield by the wiper yet the wiper does not obstruct the field of view. Rotation of the shield allows a portion of the shield that is obstructed by a contaminant to be rotated away from the field of view. Rotation of the shield allows a portion of the shield that has been wiped to be rotated into the field of view.

Abstract: Disclosed are apparatus for delivery of a gas, e.g., carbon dioxide and/or chlorine dioxide, and methods of its use and manufacture. The apparatus includes an envelope, and a sachet within the envelope that contains reactant, which generates a gas in the presence of an initiating agent, e.g., water. The envelope allows release of the gas from the envelope. In another embodiment, the apparatus includes an envelope and a partition that separates two reactants within the envelope. The envelope allows an initiating agent into the envelope and release of the gas generated by the reactants in the presence of the initiating agent.

Abstract: This is a dust mop handle and method in which the handle has a plurality of arcuate and straight segments including means to attach a dust mop to one end; unique hand holding means providing for bi-planar holding and movement of the dust mop handle in such manner that the effective force being applied to the dust mop is multiplied and enhanced and strain on the user is reduced.

Abstract: A blade cleaner having a protective holding apparatus is provided. A method for cleaning blades is also provided.

Abstract: A robotic floor cleaning device comprises a chassis (10), motor-driven wheels (11) supporting the chassis (10), a motor-driven suction fan (9), a dirty air inlet (2) and a motor-driven rotatable agitator (4) at the dirty air inlet (2) for agitating the surface. A control system navigates the device around a room and distributes power to the motor-driven wheels (11) and to the agitator (4). The control system detects when the agitator (4) has jammed (100, 102) and, in the event of a jam, attempts to clear the jam (104, 106). After successfully clearing the jam the control system turns the agitator (4) off (114, 116, 118) or navigates the cleaning device around the location at which the jam occurred (119). The cleaning device can store the location of the jam for use in preventing further jams when the cleaning device returns to a similar position in the room.

Abstract: A hand-worn cleaning cloth dimensioned to be secured around a dorsal surface of a hand in order to permit the dorsal surface of the hand to clean glass surfaces with the cloth secured about the hand.

Abstract: A method for cleaning a soiled textile product by using a heated cleaning composition. The method includes providing a hand-holdable single vessel with a hand-operable dispenser and a single aqueous non-effervescent cleaning composition within the vessel. The vessel bearing the cleaning composition is placed into a microwave oven and heated for a specified time period to be about 90-160 degrees F., whereupon a quantity of the cleaning composition is dispensed via spraying on the soiled area. Finally, the treated area is blotted by hand with a fibrous towel for removal of cleaning composition and soil.

Abstract: An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.

Abstract: Disclosed are apparatus for delivery of a gas, e.g., carbon dioxide and/or chlorine dioxide, and methods of its use and manufacture. The apparatus includes an envelope, and a sachet within the envelope that contains reactant, which generates a gas in the presence of an initiating agent, e.g., water. In another embodiment, the apparatus includes a barrier layer, a sachet layer disposed adjacent to the barrier layer, a reactant disposed between the barrier layer and the sachet layer that generates a gas in the presence of an initiating agent, and an envelope layer disposed adjacent to the sachet layer.

Abstract: A method for treating a moving surface, such as a rotating roller (11) or a moving belt (42), according to which method surface treatment elements (12), such as metallic brushes (12), are pressed against the surface to clean and smooth it. The brushes are cleaned at the edge of the surface. The brushes are connected to an endless chain (16) on which the brushes are moved in a transverse direction by a moving means (17). The apparatus may be mounted in conjunction with a roller or belt or connected to it via a doctor frame (31) or some other supporting structure (47).

Abstract: A new apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface.

Abstract: A system is provided for use in semiconductor wafer cleaning operations. The cleaning system has a top cap and a bottom cap. The top cap seals on a top surface contact ring of a wafer, and the bottom cap seals on a bottom surface contact ring of the wafer. The wafer is held between the top cap and the bottom cap. An edge clean roller is used for cleaning an edge of the wafer. A drive roller is configured to rotate the wafer, the top cap, and the bottom cap. The edge clean roller rotates at a first velocity and the drive roller rotates at a second velocity so as to facilitate an edge cleaning of the wafer by the edge clean roller.

Abstract: A method for removing the circumferential edge of a dielectric layer on a semiconductor wafer is disclosed. First, a semiconductor wafer having a dielectric layer on its upper surface is provided. Second, the semiconductor wafer is placed and secured on a susceptor. Third, the circumferential edge of the dielectric layer is removed by a ring cutter. Then, the semiconductor wafer is cleaned from its central portion to its edge portion by water jets.

Abstract: The cones used to position poultry carcasses on poultry processing lines must be cleaned frequently. In order to clean the cones, a cone cleaning device is provided. A stainless steel frame holds four rotating cylindrical brushes in position so that the cones can be passed between the brushes. Nozzles spray water on the cones as they pass between the rotating brushes. The brushes are rotated with motors mounted on the frame.

Abstract: A device made of flexible material for cleaning sharp-tipped dental instruments in a way that protects the practitioner against puncture wounds or cuts. The device contains a) a finger rest, b) a stem, and c) an open container having a textured exterior surface, an interior surface, and a top. The exterior surface has a girth near the top. The interior surface contains a plurality of prongs. The top has a protective rim. For use, gauze is put into the container and the gauze is contacted with the sharp tip of the dental instrument. Pressure is applied to the container to help create a firm contact between the gauze and the instrument. The prongs help to keep the gauze in place while the instrument is being removed. The use of this device helps prevent puncture wounds or cuts caused by the dental instrument and the accompanying possibility of infection.

Abstract: Heretofore, a wafer cleaning device used for CMP and others cannot adjust parallelism between a wafer and a roll brush quantitatively and cannot grasp the change of the parallelism.

Abstract: A process of removing holefill residue from a surface of an electronic substrate in which the holefill residue is contacted with a swelling agent followed by planarizing of the surface in the presence of an agent no stronger than a liquid having a pH of about 6 to about 8.