Using Solid Work Treating Agents Patents (Class 134/6)
  • Publication number: 20020108636
    Abstract: A device for cleaning the polished end faces of fibers of an optical connector having guide pins is provided. The device has a surface with at least one rail disposed on the surface. The rail has a height above the surface sufficient to accommodate guide pins extending from an optical connector. A system for cleaning the polished end faces of fibers of an optical connector is also provided that includes an overlay disposed on the cleaning device. A guide member that is disposed on top of the overlay is also provided for receiving the optical connector. A method for cleaning an optical connector with the disclosed device and system is also provided.
    Type: Application
    Filed: April 5, 2002
    Publication date: August 15, 2002
    Inventors: Darrell R. Childers, Jeffrey R. Elledge, Timothy S. Laws, A. John McDonald
  • Publication number: 20020108635
    Abstract: An apparatus and methods are provided for performing maintenance procedures such as washing, cleaning, deicing, and painting to an aircraft. The apparatus according to an embodiment of the present invention preferably has a mobile base having a plurality of wheel members for allowing the mobile base to travel along surfaces and a plurality of support surface registering members for registering the mobile base to a support surface to inhibit movement of the plurality of wheel members. The apparatus also preferably has a boom member having a proximal end portion rotatably mounted to the mobile base and being movable between a retracted position and an extended position and an aircraft maintenance tool rotatably connected to a distal end portion of the boom member.
    Type: Application
    Filed: January 19, 2002
    Publication date: August 15, 2002
    Inventor: Lou Marrero
  • Publication number: 20020108634
    Abstract: Friction force between a scrubbing brush and a substrate during a cleaning process is measured and utilized as a metric in characterizing effectiveness of the cleaning process under a variety of conditions. A friction force setpoint may also be used to perform closed loop control over the cleaning process.
    Type: Application
    Filed: February 15, 2001
    Publication date: August 15, 2002
    Inventor: Daniel McMullen
  • Patent number: 6432212
    Abstract: The substrate washing method of the present invention comprises the steps of holding the substrate substantially horizontally, supplying a cleaning liquid to a surface of the substrate through a film scrub member permeable to liquid and allowing the film scrub member in contact with the surface of the substrate, pressing the film scrub member onto the surface of the substrate in excess of a zero point, which is an initial contact point of the film scrub member with the surface of the substrate, thereby bringing the film scrub member into contact with the surface of the substrate in an overdriving manner and moving the film scrub member relative to the substrate to scrub the surface of the substrate by the film scrub member.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: August 13, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Keizo Hirose, Kenji Sekiguchi
  • Patent number: 6432213
    Abstract: A scraper for removing deposits from the exterior of a tubular member includes elements defining an outer jacket which has an inwardly open circumferential recess and two aligned axial openings, and a scraper element in the form of an elongate resilient wire bent to define a series of integral, concatenated, resilient segments, each pair of adjacent segments being connected through a bend or geniculation. All geniculations are received within the recess, and each segment of wire extends generally along a chord of the aligned axial openings. The positions of the chords are distributed around the circumference of the axial openings such that, in order for the tubular member to be accommodated through the aligned openings, the various segments must be deformed outwardly, whereby the resilience of the thus deformed segment urges it inwardly against the tubular member, and causes it to clean the tubular member as the scraper moves axially.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: August 13, 2002
    Assignee: Photoscience Japan Corporation
    Inventors: Demao Wang, Bill Sotirakos
  • Patent number: 6431185
    Abstract: There is proposed an apparatus and method for cleaning a semiconductor substrate, which make it possible to minimize the adhesion of mist in a cleaning tank at the occasion of cleaning a semiconductor substrate, to realize a high removal effect of residual polishing particles, and to enable to obtain a clean surface. In view of preventing a mist generated by the jet of high pressure water from re-adhering to the substrate during the cleaning of a semiconductor substrate, a cover member is disposed at a mist-generating region so as to prevent the splash of the mist. Additionally, a cavity is caused to generate by contacting a high pressure water with a still water, and high-frequency generated by the generation of the cavity is utilized for removing the residual polishing particles. Alternatively, the ejection of high pressure water against the surface of the substrate is performed in a liquid phase such as ultrapure water, thereby preventing the generation of mist.
    Type: Grant
    Filed: September 22, 1999
    Date of Patent: August 13, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Tomita, Soichi Nadahara, Motoyuki Sato
  • Patent number: 6432211
    Abstract: A method of cleaning an imaged printing form having a silicone-based non-printing layer, which includes exerting a defined contact pressure by a cleaning arrangement on a printing-form surface to be cleaned, and moving at least one of the printing form and the cleaning arrangement relative to the other, further includes applying cleaning fluid to the printing-form surface to be cleaned, the cleaning fluid, besides water, containing a cleaning concentrate as a component, the cleaning concentrate having 1 to 30 percent by weight of an anionic surfactant and 1 to 30 percent by weight of a nonionic surfactant; and a cleaning fluid for cleaning a printing form.
    Type: Grant
    Filed: June 24, 1998
    Date of Patent: August 13, 2002
    Assignee: Heidelberger Druckmaschinen A.G.
    Inventors: Dieter Schmitt, Reiner Schmitt
  • Publication number: 20020104551
    Abstract: A dust pan having improved means for facilitating emptying of debris from the dust pan, that is nestable one within another for decreased shipping costs, and that can be easily and inexpensively manufactured as a single piece.
    Type: Application
    Filed: January 23, 2002
    Publication date: August 8, 2002
    Inventor: Raymond Mead
  • Publication number: 20020106478
    Abstract: A cleaning sheet which comprises 10 to 90% by weight of thermoplastic fibers having a fiber length of 2 to 15 mm and a fineness of 10 to 150 dtex and 10 to 90% by weight of cellulosic fibers, and has a large number of tips of the thermoplastic fibers exposed on the surface the cleaning sheet to have capability of scouring or scraping dirt off present on a soiled surface.
    Type: Application
    Filed: November 30, 2001
    Publication date: August 8, 2002
    Inventors: Taeko Hayase, Shusuke Kakiuchi, Kazuo Mori
  • Publication number: 20020100494
    Abstract: Methods and systems for inducing an electric charge in a cleaning sheet for cleaning and removing particles from a surface are disclosed. The systems include a cleaning sheet for collecting and retaining the particles and a charging surface configured to frictionally engage the sheet. The cleaning sheets typically have a basis weight of at least about 30 g/m2. The system may include a container for housing and dispensing the cleaning sheet. When the sheet is passed across the charging surface, the electrical charge in the sheet is generally increased by at least about 500 V. Methods of and kits for cleaning surfaces and collecting and retaining debris are also disclosed.
    Type: Application
    Filed: December 5, 2000
    Publication date: August 1, 2002
    Inventors: Colin W. Brown, Robert D. Iverson
  • Publication number: 20020096191
    Abstract: A semiconductor wafer is cleaned while a sponge or brush is pressed against the wafer with a constant forced applied utilizing a bias in a constant force pencil. The wafer is cleaned in the state wherein a collapsing portion of the constant force pencil with respect to the cleaning sponge cloth is set in such a way that the cleaning pressure, which is applied from the cleaning sponge to the wafer, can be constant and is adjustable. A method for cleaning wafers using a constant force pencil is also described.
    Type: Application
    Filed: January 24, 2001
    Publication date: July 25, 2002
    Applicant: International Business Machines Corporation
    Inventors: Michael F. Lofaro, Marc Mattaroccia, Leonard C. Stevens
  • Publication number: 20020096187
    Abstract: A method for cleaning a capillary tube for use in a wire bonding tool includes the step of applying an ultrasonic wave to the capillary tube, with the tip of the capillary tube being immersed in a cleaning solution, and with a tungsten wire being inserted in the capillary tube. Before the cleaning step, the capillary tube is ground by an abrasive sheet, with the capillary tube being empty.
    Type: Application
    Filed: January 22, 2002
    Publication date: July 25, 2002
    Applicant: NEC Corporation
    Inventors: Kouji Kuwata, Mitsuki Arita
  • Patent number: 6423149
    Abstract: /The present invention provides in one embodiment a method of manufacturing an integrated circuit including cleaning a semiconductor wafer using a cleaning apparatus, wherein the cleaning apparatus includes a roller brush frame and roller brushes cooperatively supported within the roller brush frame and aligned to form a cleaning gradient that is configured to remove particles of different sizes from an object to be cleaned.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: July 23, 2002
    Assignee: Agere Systems Guardian Corp.
    Inventors: Annette M. Crevasse, William G. Easter, John A. Maze, Frank Miceli
  • Publication number: 20020092541
    Abstract: There is disclosed a dry cleaning method capable of totally cleaning and removing particles left at the surfaces of the ultra fine structure of the semiconductor device within the vacuum state without being dependent on a wet cleaning method performed in the surrounding atmosphere. The dry cleaning method of the present invention is carried out such that each of the pads is approached to each of the front surface and the rear surface of a processed item such as the semiconductor wafer and the like, cleaning gas is injected into a fine clearance formed between both of them to generate a high-speed gas flow along the surface of the processed item and the particles left at the surfaces of the processed item are physically cleaned and removed with the high-speed gas flow. In order to assist this physical cleaning action, it is also possible to apply either a chemical cleaning method or an electrical cleaning method under application of plasma.
    Type: Application
    Filed: March 20, 2001
    Publication date: July 18, 2002
    Inventors: Kenetsu Yokogawa, Yoshinori Momonoi, Masaru Izawa, Shinichi Tachi
  • Publication number: 20020092544
    Abstract: In order to perform scrub cleaning of a substrate, two different scrub heads 31 and 32 are employed. The scrub head 31 is superior to the scrub head 32 in terms of a capability of removing contamination. The scrub head 32 has a low level of adhesion to the contamination as compared with the scrub head 31. The scrub heads 31 and 32 are moved such that the scrub head 32 follows the scrub head 31. Consequently, it is possible to clean the substrate without re-applying contamination, which has been once removed from a surface of the substrate, to the surface of the substrate again.
    Type: Application
    Filed: August 29, 2001
    Publication date: July 18, 2002
    Inventor: Kazuyoshi Namba
  • Patent number: 6420891
    Abstract: A wafer prober capable of cleaning probe pins in-line is provided. The wafer prober is used in the wafer probing test system, which includes a test machine and a test head. The wafer prober includes a housing having a probe card holder for holding a probe card, a staging device installed in said housing and moving along a X-Y-Z plane, and a chuck installed on the staging device for holding a wafer to be tested. Additionally, the wafer prober employs at least a nozzle installed at the staging device for cleaning probe pins of the probe card by spraying solid, vapor and liquid material. Since the wafer prober does not need to remove the probe card away to clean, and does not need to position the probe card again, the production downtime can be greatly reduced. Additionally, due to that the wafer prober employs the nozzle to spray out three phases of CO2 to clean the probes, the probes do not be damaged and the lifetime of the probes can be extended.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: July 16, 2002
    Assignee: Powerchip Semiconductor Corporation
    Inventor: Yu-Hsin Liu
  • Patent number: 6416588
    Abstract: A method for cleaning a vehicle (50) includes providing a can of compressed gas (20) having a nozzle (22), and an activating means for causing gas (26) to emanate from the nozzle (22); providing an absorbent member (36); providing a vehicle (50) having an inaccessible location (60) wherein moisture is disposed; pointing nozzle (22) in the direction of inaccessible location (60); activating the activating means causing gas (26) to emanate from nozzle (22) thereby extricating the moisture from the inaccessible location (60); and, using an absorbent member (36) to wipe off extricated moisture from the vehicle (50).
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: July 9, 2002
    Inventor: Alan Boles
  • Publication number: 20020083964
    Abstract: A refill is designed for use with a mop of the type having a mop head with a lower surface and an opposed upper surface interconnected by a leading and a trailing edge. The mop head has a gripper device on its upper surface for retaining a cleaning sheet on the mop head. The refill includes a base layer with a front edge and an opposed rear edge, and a midportion between the front and rear edges. The base layer is designed to be wrapped about the mop head with the midportion adjacent to the lower surface of the mop head and the front and rear edges wrapping onto the upper surface of the mop head so as to be retained by the gripper. Multiple cleaning sheets are each removably supported on the midportion of the base layer in a stacked configuration. Each of the sheets has an outward face for cleaning and an opposed inward face. The outward face of each of the sheets is designed to contact a surface to be cleaned and to thereby become soiled.
    Type: Application
    Filed: November 16, 2001
    Publication date: July 4, 2002
    Inventor: William D. McKay
  • Publication number: 20020083963
    Abstract: A rotary, multi-bladed cleaner provides increased life expectancy, up to 15-25 times the life of a single blade cleaner. Such a cleaner has been found to be highly reliable due to its ability to frequently change brush surfaces and by provision of a redundant system that enables multiple blades to contact the surface to be cleaned at once. The blade cleaner has a paddle-wheel type cross-sectional shape with a plurality of radially extending blades spaced around the periphery thereof. The blades are spaced to be closely adjacent one another such that one and preferably two or more blades contact the residual image at one time. The rotary blade cleaner is preferably rotated at a slow rotation rate with the blades being in contact for only a limited time before being displaced by the next blade(s). Such a rotary cleaner is particularly suited for cleaning residual toners and inks from a photoreceptive surface.
    Type: Application
    Filed: December 28, 2000
    Publication date: July 4, 2002
    Inventors: Rodney B. Proulx, Nero R. Lindblad, Richard L. Carlston, James F. Smith
  • Patent number: 6413323
    Abstract: An improved method for cleaning vertical walls includes providing a vacuum source to adhere the system to the vertical wall. The vacuum source removes fluid and removed material from the wall, and also adheres the system to the wall. A rotating fluid jet is positioned radially inwardly of the vacuum source and impinges high pressurized fluid off of the surface to be cleaned to remove material. In a preferred embodiment, a central portion is provided that mounts both the fluid source and the vacuum source. A base portion mounts motors for driving the system along the wall. The base portion rotates relative to the central portion such that the central portion does not move as the base portion turns on the wall to drive the system along the wall. In a further feature, an additional air flow system is provided to provide supplemental air flow to assist the vacuum when moving the fluid and removed material.
    Type: Grant
    Filed: January 9, 2001
    Date of Patent: July 2, 2002
    Assignee: NLB Corp.
    Inventors: Forrest A. Shook, Matthew O. Herhold
  • Publication number: 20020078976
    Abstract: A method and system for processing a wafer is disclosed. The method includes receiving a wafer having a process side and a backside. The method further includes removing un-wanted particles from the backside of the wafer to prevent gaps from forming between the backside of the wafer and a chucking surface. The method also includes performing a specific processing task on the process side of the wafer after cleaning the backside of the wafer.
    Type: Application
    Filed: December 21, 2000
    Publication date: June 27, 2002
    Inventor: Thomas D. Nguyen
  • Publication number: 20020074016
    Abstract: The present invention provides a semiconductor wafer cleaning brush assembly having an arbor with: (1) an expandable member configured to have a non-expanded position and an expanded position, and (2) a cleaning brush, locatable about the expandable member, having an inner diameter greater than an outer diameter of the expandable member in the non-expanded position and less than an outer diameter of the expandable member in the expanded position. The present invention further provides a method of replacing the cleaning brush of the assembly, and a method of cleaning a semiconductor wafer with such an assembly.
    Type: Application
    Filed: December 15, 2000
    Publication date: June 20, 2002
    Inventors: Annette M. Crevasse, William G. Easter, John A. Maze, Frank Miceli
  • Patent number: 6406549
    Abstract: A method and a device for cleaning the undersurface of footwear and wheels of shopping trolleys and other transport expedients to minimize the amount of dirt and moisture brought into a building by persons entering the building. The objective of the invention is to provide a device which provides sustained high-performance cleaning, even in adverse weather conditions and with heavy use. To this end the invention uses a mat rotated as an endless loop between guide rollers within a floor opening at an entranceway or elsewhere within a building. In a section running in one direction, the mat acts at least partially as a tread surface and absorbs dirt and moisture, while in a section running back in the opposite direction, which has gathered dirt and moisture from its exposure to persons entering the building, the mat is cleaned and reconditioned by mechanical, hydraulic or pneumatic mechanisms within the floor opening.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: June 18, 2002
    Assignee: 2R Reha-Technik GmbH
    Inventors: Gunther Berg, Viola Holtkamp, Dirk Spaltmann
  • Publication number: 20020069896
    Abstract: A self-contained apparatus for cleaning contact lenses comprising a deformable, non-abrasive material having an enzyme enriched layer for contact with the optical surfaces of the lenses. While in contact with the optical surfaces, the contaminants on the lens surfaces are enzymatically removed. Upon separation of the lenses and the deformable material, substantially all of the enzymes are retained on the deformable material, largely eliminating the need to perform additional operations to inactivate the enzymes or otherwise rid the lenses of residual enzymatic matter.
    Type: Application
    Filed: July 27, 2001
    Publication date: June 13, 2002
    Inventor: Mark L. Pankow
  • Patent number: 6402853
    Abstract: Equipment used in the processing of plastic, such as molds and extrusion screws, is cleaned of plastic residue by a combination of thermal cycling and agitation without impact cleaning. A chamber can be heated by an electric radiant heater and cooled by the introduction of liquid nitrogen. A fixture in the chamber receives the equipment to be cleaned and is agitated by a drive motor. The chamber is heated and cooled in the following cycle in which the drive motor agitates the fixture: first to 250-300° F., then to −315° F., then cycled between −50° F. and −10° F., then to 150° F., then to −200° F., to 100° F., then to ambient temperature. The chamber is controlled by a computer that prompts the operator for the kind of plastic to be cleaned off of the equipment and then controls the heating and cooling automatically.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: June 11, 2002
    Assignee: SPN Tech LLC
    Inventor: J. Drake Carlisle
  • Patent number: 6402851
    Abstract: A method and product for computer disk drives. Glass substrates are provided having low content of residual polishing particles on the surfaces thereof. An exemplary method includes reduction of residual polishing particle content by immersion of the glass substrate in an acid bath containing nitric acid, hydrogen peroxide and an organic acid having a carboxylic acid group.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: June 11, 2002
    Assignee: International Business Machines Corporation
    Inventor: Douglas Howard Piltingsrud
  • Patent number: 6402854
    Abstract: A method of cleaning the inside surface of a kitchen extraction duct or other grease duct, includes applying solid carbon dioxide under pressure to the inside surface of the duct, so that grease thereon is hardened and dislodged therefrom.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: June 11, 2002
    Assignee: System Hygienics Limited
    Inventor: Graham Horridge
  • Patent number: 6403489
    Abstract: An object of the invention is to provide a preventive maintenance for effectively removing polymer stacked on a lower electrode within a reaction chamber of etching equipment during the process of dry etching of a silicon oxide layer. First, the lower electrode is preferably set at 0° C., and then the reaction chamber is pre-cleaned preferably 20 times by a pump/purge cleaning manner. After the pre-cleaning, nitrogen or inert gas is supplied into the reaction chamber such that the internal pressure is equal to atmospheric pressure. Subsequently, the reaction chamber is opened preferably for 10 minutes, and the lower electrode is kept at 0° C. during this moment. Afterwards, the surface of the lower electrode is wiped by a piece of clean cloth to peel off the polymer. Finally, the lower electrode is preferably set at 25° C. and is wiped several times by using de-ionized water, isopropanol (IPA), ethanol, a solution of hydrogen peroxide in water, or Cleaner 5060 produced by the 3M corporation.
    Type: Grant
    Filed: June 21, 2000
    Date of Patent: June 11, 2002
    Assignee: Mosel Vitelic Inc.
    Inventors: Tien-min Yuan, Kuang-yung Wu, Shih-chi Lai, Kuo-tsai Kao
  • Patent number: 6401733
    Abstract: A dispenser for a dishwasher is proposed containing a housing 1 partially projecting in the installed condition through a door recess into the interior of the door of the automatic dishwasher and located partially within the wash area. The housing consists of two housing sections which preclude housing leaks into the interior of the door. This is achieved by providing an inner section located only partially within the interior of the door and projecting into the wash area, and an outer section located completely on the side of the wash area.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: June 11, 2002
    Assignee: Aweco Appliance Systems GmbH & Co. KG
    Inventors: Harald Schrott, Guenter Biechele
  • Publication number: 20020066467
    Abstract: The apparatus of claim 30, further comprising a container having said brush and said cleaning element dispersed and an apparatus brush cleans the inside surface of a cylindrical photoreceptor substrate such as used in xerography. The substrate can be in a cleaning solution and brushes can also be located both inside and outside the substrate. There is relative motion, e.g., rotation, translation, a combination of both, etc., between the brushes and the substrate. A photoreceptor coating is directly applied after the cleaning without intervening processing steps.
    Type: Application
    Filed: December 5, 2000
    Publication date: June 6, 2002
    Inventors: Paul De Ruijter, Eugene A. Swain, Robert E. McCumiskey, James Hoemer, Richard C. Petralia
  • Publication number: 20020066149
    Abstract: A self-propelled bare floor cleaner is provided having a random motion generator which enhances the maneuverability of the bare floor cleaner. The random motion generator is rotatably attached to the frame of the cleaner and propels the cleaner across the floor in a random motion. This random motion facilitates cleaning of the floor by making the cleaner easier to manipulate. The random motion generator includes a hollow spherical shell. In the preferred embodiment, the hollow spherical shell houses a weighted motor assembly which is rotatably mounted on a center fixed axle which extends diametrically between the first and second hemispherical halves and is attached thereto. The weighted motor assembly is comprised of a motor housing and a power source, such as batteries or cells. A motor is housed within the motor housing and rotates the motor housing about the center fixed axle.
    Type: Application
    Filed: December 1, 2000
    Publication date: June 6, 2002
    Inventors: Douglas E. Gerber, Kevin L. Thomas
  • Publication number: 20020068511
    Abstract: The object of this invention is to clean a machine and device soiled in accordance with an atmosphere, where it has been used, to make it be suitable for recycle. In order to achieve this object, a cleaning target such as a unit or component including an electrical component is cleaned while dry ice and a detergent simultaneously act on a surface to be cleaned of the cleaning target.
    Type: Application
    Filed: November 29, 2001
    Publication date: June 6, 2002
    Inventors: Masaki Okazawa, Hideo Iwama
  • Publication number: 20020066466
    Abstract: A system and method are provided for using an organic solvent to clean chamber parts used in semiconductor manufacturing. The chamber parts are exposed to the solvent using a dipping system or a vapor contact system in order to soften or dissolve the organic polymers. The solvent may be heated up to a temperature of 100° C. The organic cleaning solvent may be a pyrrole-based, amine-based, fluoro/ether-based or ether-based solvent. Additionally, a system and method are provided for establishing criteria to verify that the chamber parts are clean with respect to organic, metallic and particulate impurities and establishing criteria to verify that the physical surface morphology remains intact.
    Type: Application
    Filed: August 31, 2001
    Publication date: June 6, 2002
    Inventor: Samantha Tan
  • Publication number: 20020068162
    Abstract: A composite doctor blade is provided that is suitable for use in the manufacture of paper, particularly for use in calenders. The composite doctor blade includes multiple layers of composite material in which a substantial proportion of the fibers are aligned in a direction substantially parallel to the long axis of the doctor blade.
    Type: Application
    Filed: December 1, 2000
    Publication date: June 6, 2002
    Inventor: Gordon Eugene Carrier
  • Publication number: 20020066469
    Abstract: This invention relates to a device for maintaining the take-up rollers of document feeders of a folding/insertion machine, comprising a sheet imbibed with a liquid maintenance product and intended to be entrained inside the machine by the take-up rollers, this self-cleaning sheet comprising retaining means for stopping its advance in the machine and allowing its withdrawal once the take-up rollers of the feeder are stopped.
    Type: Application
    Filed: November 27, 2001
    Publication date: June 6, 2002
    Applicant: NEOPOST INDUSTRIE
    Inventors: Marek Krasuski, Patrice Montigny
  • Publication number: 20020066468
    Abstract: A brush assembly includes a distributor having a slot matrix formed in an outer surface of the distributor, the slot matrix including a plurality of longitudinal slots intersecting a plurality of annular slots. The brush assembly further includes a housing having an inner surface abutting the outer surface of the distributor, a brush mounted on the housing and a shaft. During use, the flow of liquid from the shaft to the housing flows through the longitudinal slots and annular slots of the distributor. By appropriately selecting the dimensions and numbers of these slots, the flow of liquid from the shaft to the housing is readily redistributed. For example, the flow of liquid is redistributed to provide a greater amount of liquid to the ends of the brush than to the center of the brush.
    Type: Application
    Filed: May 25, 2001
    Publication date: June 6, 2002
    Applicant: Lam Research Corporation
    Inventors: Jim Vail, Mike Wallis
  • Publication number: 20020062842
    Abstract: A method and a system are provided for cleaning a surface of a wafer, The method starts by scrubbing the surface of the wafer with a cleaning brush that applies a chemical solution to the surface of the wafer. In one example, the cleaning brush implements a through the brush (TTB) technique to apply the chemicals. The scrubbing is generally performed in a brush box, with a top cleaning brush and a bottom cleaning brush. The top cleaning brush is then removed from contact with the surface of the wafer. The chemical concentration in the top brush may be maintained at substantially the same concentration that was in the brush during the scrubbing operation. Next, a flow of water (preferably de-ionized water) is delivered to the surface of the wafer. The delivery of water is preferably configured to remove substantially all of the chemical solution from the surface of the wafer before proceeding to a next cleaning operation.
    Type: Application
    Filed: June 10, 1999
    Publication date: May 30, 2002
    Inventors: KATRINA A. MIKHAYLICH, MIKE RAVKIN, DON E. ANDERSON
  • Publication number: 20020062839
    Abstract: A method and apparatus for processing a wafer is described. According to the present invention a wafer is placed on a substrate support. A liquid is then fed through a conduit having an output opening over the wafer. A gas is dissolved in the liquid prior to the liquid reaching the output over the wafer by flowing a gas into the conduit through a venturi opening formed in the conduit. The liquid with dissolved gas is then fed through the opening and onto the wafer where it can be used to etch, clean, or rinse a wafer.
    Type: Application
    Filed: June 25, 2001
    Publication date: May 30, 2002
    Inventors: Steven Verhaverbeke, J. Kelly Truman
  • Publication number: 20020062843
    Abstract: A cleaning apparatus of an electronic component of the present invention comprises: means for supplying cleaning water to an object to be cleaned such as alumina titanium carbide wafer, a sponge member for contacting with the object to be cleaned to clean a surface thereof, means for moving the object to be cleaned and the sponge member relative to each other, and means for adjusting the resistivity value of the cleaning water to 10M&OHgr; or less. Using this apparatus, the object to be cleaned is cleaned using the sponge member while supplying, to the object to be cleaned, cleaning water having the resistivity value of 10M&OHgr; or less. In this case, the cleaning degree is enhanced by soaking the object to be cleaned in the water having the resistivity value of 10M&OHgr; or less before cleaning, and by using a dummy substrate.
    Type: Application
    Filed: June 22, 1999
    Publication date: May 30, 2002
    Inventors: TAISUKE HIROOKA, HIDETAKA SAKUMICHI
  • Patent number: 6383303
    Abstract: An apparatus for spraying a liquid on the surface of assemblies that are moving through wash and rinse stations.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: May 7, 2002
    Assignee: St Assembly Test Services Pte Ltd
    Inventors: Hwee Nam Wee, Peter Hock Ming Ng, Sean Shiao Shiong Chong
  • Publication number: 20020050280
    Abstract: The paintbrush-cleaning device includes a housing with an open top, a bottom drain and a means to hold paintbrushes into the housing's central space, which has paintbrush-cleaning liquid therein. A pair of rotatable radial brushes brackets the paintbrushes in the central space and are powered by an electric motor connected to the housing. A number of spaced upwardly directed jet nozzles are disposed in the central space for directing streams of cleaning liquid under pressure upwards towards the paintbrushes. An impeller pump may be connected to a manifold in the central space, from which manifold the jet nozzles extend. Two radial brushes may be used, with the members disposed opposite each other adjacent the sides of the top opening.
    Type: Application
    Filed: November 1, 2001
    Publication date: May 2, 2002
    Inventors: Ted J. Brackett, C. Martin Smith, Mark Anderson
  • Patent number: 6380151
    Abstract: A detergent composition for use with a cleaning pad comprising an effective amount of a superabsorbent material, said pad preferably being part of a cleaning implement comprising a handle and said cleaning pad preferably being removable. The detergent composition contains a limited amount of a detergent surfactant, preferably linear in structure and relatively hydrophilic, the level of hydrophobic materials being kept below about 0.5%, and the pH being maintained above about 9, to allow the superabsorbent material to be readily absorbed by the superabsorbent material. The process of using the detergent composition with such a cleaning pad, and the provision of a kit containing both detergent composition and cleaning pad are disclosed.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: April 30, 2002
    Assignee: The Procter & Gamble Company
    Inventors: Ronald Anthony Masters, Nicola John Policicchio, Alan Edward Sherry
  • Patent number: 6379469
    Abstract: A substrate washing apparatus, comprising a spin chuck for holding and rotating a substrate W, a brushing section including a scrubbing member which is brought into contact with a washing surface of the substrate held on the spin chuck and revolved on its own axis together with rotation of the spin chuck, a washing liquid supply mechanism for supplying a washing liquid through the brushing section onto the washing surface of the substrate, a pressure control mechanism for controlling a pressing force of the scrubbing member against the washing surface of the substrate, and a moving means for moving the scrubbing member relative to the substrate in a radial direction of the substrate, wherein the scrubbing member includes an abutting portion which is brought into contact with the washing surface of the substrate, and a non-contact peripheral portion positioned about the abutting portion and formed not to contact the washing surface of the substrate when the abutting portion is in contact with the washing surfa
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: April 30, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Hideya Tanaka, Kenichi Miyamoto, Minoru Kubota, Walter Swanson
  • Patent number: 6379468
    Abstract: A method for cleaning thin gauge metal foil strip material using a plurality of wiper (12, 16, 20) and solvent application (14, 18) stages. The solvent used in the solvent application stages is an aliphatic petroleum type which is applied using low pressure to avoid atomization or separation of solvent components. The wipers of a first wiping station are made of a solid bar of polymer impregnated fiber material. The wipers of the second wiping station are spaced apart blades of urethane-based elastomer material.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: April 30, 2002
    Assignee: Engineered Materials Solutions, Inc.
    Inventors: Chen-Chung S. Chang, Bijendra Jha, Wayne R. Bachand, John J. Duprey
  • Patent number: 6375755
    Abstract: The present invention provides advantages as a method of cleaning movie screens, such as vinyl screens, enhanced screens, painted screens, taurus screens, rear projection screens, and silver screens. In one embodiment, the present invention is a method of cleaning a movie screen by applying a cleaning chemical to the movie screen, wiping the movie screen with a first towel, applying a neutralizer to the movie screen, wiping the movie screen with a second towel, and drying the movie screen.
    Type: Grant
    Filed: January 26, 2000
    Date of Patent: April 23, 2002
    Inventor: David Stuck
  • Publication number: 20020040724
    Abstract: In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liquid-crystal mixture is formed, relative motion between the liquid-crystal mixture and the substrate is created to dislodge contaminants adhered to the substrate. In one alternative method, the solution is applied on a pad. In another alternative method, the substrate is place in a bath of the solution. A wafer cleaning module also is described.
    Type: Application
    Filed: October 12, 2001
    Publication date: April 11, 2002
    Applicant: Lam Research Corporation
    Inventor: Yehiel Gotkis
  • Patent number: 6368416
    Abstract: A method for validating pre-process adjustments to a wafer cleaning system includes the operations of (a) making pre-process adjustments to a wafer cleaning system, (b) loading a substantially transparent wafer into the wafer cleaning system, and (c) observing the substantially transparent wafer as the substantially transparent wafer moves along a wafer transfer path in the wafer cleaning system. In the event undesirable contact between the substantially transparent wafer and components of the wafer cleaning system is observed, the method further includes (d) making adjustments to the wafer cleaning system formulated to avoid undesirable contact between semiconductor wafers to be processed and components of the wafer cleaning system, and (e) repeating operations (b) through (d) until the substantially transparent wafer moves along the wafer transfer path without undesirable contact with components of the wafer cleaning system.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: April 9, 2002
    Assignee: Lam Research Corporation
    Inventor: Larry Ping-Kwan Wong
  • Patent number: 6368417
    Abstract: A method and apparatus for cleaning a tire mold with frozen CO2 cleaning material wherein a portable frame is positioned on a bottom mold of a tire press and has a rotatable frame on which a nozzle support is mounted for swivel action to clean the upper mold half and the lower mold half as the nozzle support is moved radially and circumferentially of the tire mold.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 9, 2002
    Assignee: The Goodyear Tire & Rubber Company
    Inventor: David Joseph Weber
  • Publication number: 20020039877
    Abstract: A method and a system are provided for cleaning a CMP pad. The method starts by applying chemicals onto the surface of the CMP pad. The chemicals are then allowed to react with a residue that may be on the pad to produce by-products. Next, the pad surface is rinsed to substantially remove the by-products. A mechanical conditioning operation is then performed on the surface of the pad. In one example, the wafer surface can be a metal, such as copper. Where the wafer surface is copper, the chemical is most preferably HCl, and a solution includes HCl and DI water. Where the wafer surface is oxide, the chemical is most preferably NH4OH, and the solution includes NH4OH and DI water. Generally, the CMP pad can be in the form of a linear belt, in the form of an round disk, or in any other mechanical or physical configuration.
    Type: Application
    Filed: October 30, 2001
    Publication date: April 4, 2002
    Inventors: Julia S. Svirchevski, Katrina A. Mikhaylich
  • Patent number: 6361615
    Abstract: A cleaning compound additive for adding to water or windshield wiper fluid to aid removal of insect splatters from a windshield. The cleaning compound additive includes the combination of effective amounts of anhydrous ammonia, alkoxylated linear alcohols sold under the trade name SURFONIC, dry particulate sodium bicarbonate, dry particulate polyvinyl pyrrolidone, dry particulate orange dye, and dry particulate citrus orange scent.
    Type: Grant
    Filed: March 4, 1999
    Date of Patent: March 26, 2002
    Inventor: Michael L. Callahan