Abstract: According to one embodiment, a chuck cleaner includes a support, an adhesive layer, and a support substrate. The support includes a first portion, a second portion, and a third portion provided between the first portion and the second portion. The support substrate is provided between the support and the adhesive layer. The support substrate includes a first region fixed to the first portion, a second region fixed to the second portion, a third region provided between the first region and the second region and having variable distance from the third portion, a fourth region provided between the first region and the third region and separated from the support, and a fifth region provided between the second region and the third region and separated from the support.

Abstract: Among other things, one or more techniques or systems for particle removal from a semiconductor wafer are provided. Particles, contaminating a semiconductor wafer, have the potential to cause defects, such as scratches into a surface of the semiconductor wafer during chemical mechanical polishing or defocusing during a subsequent lithography stage, for the semiconductor wafer. Accordingly, a mechanic particle cleaner component, such as at least one of a sliver brush roller, a pencil brush, a tape polish, a sonic jet, or a liquid spray component, is configured to apply a mechanical force to an edge region of the semiconductor wafer to detach particles. A chemical particle cleaner component is configured to apply a chemical force to the edge region to detach particles. In this way, particles are removed from the semiconductor wafer before or after chemical mechanical polishing.

Abstract: There is provided a substrate cleaning method which optimizes the shape of a roll cleaning member and can efficiently clean a substrate surface with a high degree of cleaning and reduce the number of defects remaining on the substrate surface. The substrate cleaning method performs scrub cleaning of a surface of a substrate with a roll cleaning member, having a large number of nodules on the surface and extending linearly over approximately an entire length of a diameter of the substrate and which forms a cleaning area between it and the substrate surface, by bringing the nodules into contact with the substrate surface while rotating the roll cleaning member and the substrate each in one direction. During this scrub cleaning, the area of contact between the nodules and the substrate surface in the cleaning area is made smaller in a forward-direction cleaning area.

Abstract: A cleaning apparatus; said apparatus combining mechanical combing action and liquid flow to remove detritus from frond-like structures.

Abstract: A universal garbage pick-up tool includes a main body, an inner support tube, at least two guard members positioned between the main body and inner support tube, a pushing rod positioned within the inner support tube, a push button operatively connected to a proximal end of each guard member and a proximal end of the pushing rod, and a plurality of spring claws attached to a distal end of the pushing rod. The spring claws are positioned within the inner support tube, and the guard members and the spring claws are released upon the actuation of the push button, thereby allowing the spring claws to extend axially from a distal end of the main body. An adjustment ring may be attached to the distal end of the main body, including at least two pins circumferentially spaced apart. A magnet may be positioned within the push button of the pick-up tool.

Abstract: A flexible vacuum attachment and method of use is provided for attaching a vacuum section to a vacuum to collect debris from a surface. The vacuum attachment comprises a flexible vacuum nozzle and nozzle opening, An end of the nozzle is attachable to a connector, which is then attachable to a vacuum. The nozzle forms a tube made of flexible material with a suction end. The suction end of the nozzle has a flexible tapered opening that is radially collapsible and foldable in one or more axial directions that can conform to various shapes. The tapered opening may include a rim that extends coplanar to a vacuumable surface. The suction end is capable of beating up and down on a vacuumable surface when operated with a vacuum.

Abstract: A grill rod scraping tool for cleaning the top, sides and bottom side of grill rods. The tool comprises of a neck with concave contours and a U-shaped end that enable the prongs and scraper of the tool to scrape the top, sides, and bottom side of the grid iron rods. The concave contours of the neck also allow both left and right handed individuals to operate and rotate the tool with ease. The prongs are angled away from the neck to enable the tool to be used while the grid iron rods are still hot. The grill tool is applied to the grill rod and pushed and pulled along the length of the grill rod to clean residue from food and hardened char.

Abstract: The present invention relates to a sponge (20) including at least one cavity (22), distinct from the pores of the sponge 5 (20), capable of allowing the introduction of a liquid inside the sponge (20) to impregnate the sponge (20), the cavity (22) preferably having a bottom (24) inside the sponge (20), and emerging on the other hand on a surface (26) of the sponge (20) while forming an opening (28) such that the maximum distance between two points of the contour of the opening (28) is comprised between 3, preferably 5, still more preferably 8, and 25, preferably 20, still more preferably 15 mm or still more preferably 12 mm.

Abstract: A brush-cleaning apparatus is disclosed for use in cleaning a semiconductor wafer after polishing. Embodiments of the brush-cleaning apparatus implemented with a multi-branch chemical dispensing unit are applied beneficially to clean semiconductor wafers, post-polish, using a hybrid cleaning method. An exemplary hybrid cleaning method employs a two-chemical sequence in which first and second chemical treatment modules are separate from one another, and are followed by a pH-neutralizing-rinse that occurs in a treatment module separate from the first and second chemical treatment modules. Implementation of such hybrid methods is facilitated by the multi-branch chemical dispensing unit, which provides separate chemical lines to different chemical treatment modules, and dispenses chemical to at least four different areas of each wafer during single-wafer processing in an upright orientation.

Abstract: To provide an apparatus for reclaiming foundry sand and a method for reclaiming foundry sand that can effectively remove binders and so on that attach to returned foundry sand that has been used. Foundry sand that has been used is supplied from a chute for feeding sand 14A to a rotor 16. The rotor 16 is rotated by a driver 20 so that frictional force is generated on the sand in the rotor 16. Then, the sand in the rotor 16 is dropped into the container for washing with water 30 that is located below the rotor 16. In the container for washing with water 30, an agitator 34 is rotated by the driver 20 so that the sand in the container for washing with water 30 is agitated and washed with water.

Abstract: A holder for a cleaning pad or the like can include a base and one or more features to inhibit damage to a surface adjacent a surface being cleaned. For example, the holder can include a lip extending downwardly from an edge of the base along one or more sides to inhibit the pad from being coupled to the holder so that the pad extends beyond the edge of the base. The holder can also include one or more contacting features extending outwardly from the base on the side(s) including the lip to space the base and lip from the adjacent surface during use. The contacting features can be one or more wheels horizontally disposed on a top surface of the base.

Abstract: An apparatus for removing contamination for use with a distance measuring sensor, the apparatus comprising: a distance measuring module mounted inside or outside of a vehicle and configured to measure the distance between the vehicle and objects around the vehicle; a distance-based recognition unit configured to recognize a surround environment of the vehicle based on the distance measured by the distance measuring module; and a contamination removing module configured to measure the level of contamination on the distance measuring module and perform a cleaning with respect to an area where the contamination occurs when the measured level of contamination is above a preset threshold.

Abstract: In an embodiment of the disclosed technology, a toothbrush head formed of a bristled tread is rotatable about at least one vertically disposed sprocket. The toothbrush head has an elongated neck with sprockets extending axially therefrom. Bristles are wrapped around either or both sprockets. The bristles may be on a single belt wrapped around both sprockets. Alternatively, the bristles may extend from two spindles, each fitted around a sprocket. The sprockets rotate circumferentially within an upper head portion of the device. The bristles spin 360 degrees (full rotation) around the sprockets and within the stationary head. The head portion itself is replaceable or changeable, such that a handle portion may be used by multiple users or replaced.

Abstract: A cleaning apparatus for cleaning a semiconductor wafer includes a rotary brush to be positioned to clean the semiconductor wafer, and an optical sensing device associated with the rotary brush to sense a separation distance between a reference position thereon and the semiconductor wafer. An actuator is coupled to the optical sensing device to position the rotary brush based upon the sensed separation distance.

Abstract: A cleaning arrangement for a coater that has a plate cylinder, the cleaning arrangement having a cleaning web, a tangential moving mechanism configured to controllably move the cleaning web in at least one direction in a plane defined by the cleaning web, a radial moving mechanism configured to controllably move the cleaning web in at least one direction out of the plane, and a controller coupled to the tangential and radial moving mechanisms which is configured to control the moving of the cleaning web into and out of contact with the plate cylinder in conformity with input signals received by the controller.

Abstract: In a semiconductor wafer manufacturing apparatus, a rotation module is provided to hold the semiconductor wafer at a plane. The semiconductor wafer is revolved by the rotation module around a first axis. The first axis is substantially perpendicular to the plane. A cleaning module is configured to revolve around a second axis when the cleaning module contacts the surface of the semiconductor wafer. A mechanism is further provided to enable the rotation module and/or the cleaning module to move along a direction substantially perpendicular to the first axis. Consequently, the relative velocities at the contact points between the semiconductor wafer and the cleaning module are changed. Moreover, no relative velocity at any contact point between the semiconductor wafer and the cleaning module is zero or close to zero.

Abstract: A new and novel method for cleaning optical surfaces by incorporating a textile made from activated carbon fibers as previously used for air filtration in industrial applications and neuclear-biological-chemical environments.

Abstract: In an embodiment of the disclosed technology, a toothbrush head formed of a bristled tread is rotatable about at least one vertically disposed sprocket. The toothbrush head has an elongated neck with sprockets extending axially therefrom. Bristles are wrapped around either or both sprockets. The bristles may be on a single belt wrapped around both sprockets. Alternatively, the bristles may extend from two spindles, each fitted around a sprocket. The sprockets rotate circumferentially within an upper head portion of the device. The bristles spin 360 degrees (full rotation) around the sprockets and within the stationary head. The head portion itself is replaceable or changeable, such that a handle portion may be used by multiple users or replaced.

Abstract: In a piezoelectric device, a first electrode and a second electrode are disposed to be opposed to each other on plate surfaces of the piezoelectric device, a first electrode plane of the piezoelectric device is fixedly bonded to a plate surface of a vibrating plate, a piezoelectric material forming the piezoelectric device is polarized in a direction parallel to the first electrode plane, the piezoelectric device is fixed to a base through a second electrode plane of the piezoelectric device, and the piezoelectric device generates a thickness-shear vibration with the fixed second electrode plane being a reference plane. The piezoelectric vibration generated by the piezoelectric device generates a flexural vibration in the vibrating plate, to thereby remove dust adhering to a surface of the vibrating plate.

Abstract: A method of cleaning residue from a surface includes providing a disposable cellulosic wiper including a percentage by weight of pulp-derived papermaking fibers. The pulp-derived papermaking fibers have a characteristic scattering coefficient of less than 50 m2/kg. The wiper also includes a percentage by weight of fibrillated regenerated independent cellulosic microfibers having a number average diameter of less than about 2 microns, and a characteristic Canadian Standard Freeness (CSF) value of less than 175 ml. The microfibers are selected and present in amounts such that the wiper exhibits a scattering coefficient of greater than 50 m2/kg. The wiper is applied, with a predetermined amount of pressure, to a residue-bearing surface, and the surface is wiped, while applying the predetermined amount of pressure, to remove residue from the surface, such that the surface has less than 1 g/m2 of residue after being wiped under the predetermined amount of pressure.

Abstract: An apparatus, system, and method allow for cleaning and brushing irregular-shaped objects automatically. The apparatus includes: an outer portion or a container that can substantially enclose one or more irregular shaped objects, and a plurality of brushes movably coupled to an inner wall of the outer portion or the container. The apparatus can be used to wash irregular-shaped objects such as shoes, utensils, medical devices, etc. An irregular-shaped object can be placed in the apparatus, and the apparatus can be placed in a washing machine for automatic washing. Driven by a flow of water, air, or gas, the brushes can scrub the object. The apparatus can protect the object from potential damages, and/or keep washed-off sand, dirt, or other residues inside the apparatus.

Abstract: A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.

Abstract: A cleaning implement has an abrasive component and an absorbent component bound together. The absorbent component comprises a microfiber fabric. The abrasive component is crocheted from a polyester yarn with embedded abrasive particles such as metallic fibers. The cleaning implement may be manufactured in a wide variety of shapes, colors, sizes, and configurations to meet task-specific needs or personal preference.

Abstract: Device for milling the welding region of spot welding electrodes, including at least one milling tool (21) with a cleaning unit (24) which is configured for cleaning the milling tool and has at least one movable mechanical cleaning element, such as a brush (26).

Abstract: A device for removing contaminants from a bus stab of an electrical enclosure is provided. The electrical enclosure includes an electrical bus member disposed in a first plane. The bus stab extends outwardly from the electrical bus member and is disposed in a second plane perpendicular to the first plane. The device includes a gripping assembly and a scraping assembly coupled thereto, the scraping assembly comprising a number of flexible members structured to scrape and thereby clean the bus stab, the device being structured to move in a direction parallel to the second plane when the flexible members scrape the bus stab.

Abstract: The present invention refers to an aqueous composition comprising one or more amphoteric, organic polynitrogen-compounds having at least 3 nitrogen atoms contained in the molecule in the form of an amine and/or amide and one or more types of inorganic nanoparticles, a concentrate comprising said composition and to a method for treating and/or cleaning a surface which uses said composition.

Abstract: Unprocessed, processed or refined hydrocarbon liquids as well as processed vegetable derived oil contaminants may be sequestered from a contaminated surface by applying onto the surface a blend comprising crumb rubber and hydrated magnesium silicate. The contaminated surface may be a solid surface (such as one composed of concrete, cement or asphalt) as well as an aqueous surface.

Abstract: A pallet conveyor includes a conveyor track to guide pallets, and a service station deployed on the conveyor track, the service station to perform a service operation in the pallet conveyor.

Abstract: A wet wiper for cleaning accumulated oral debris from removable dental appliances. The wet wiper comprises a water insoluble substrate and a physiologically acceptable cleansing composition. Methods for cleaning removable dental appliances are provided.

Abstract: A system for extraction of water from air includes a salt plate, a moisture absorption unit and a filter unit. The system further includes a storage unit. A method for extraction of water using the system includes placing the salt plate beneath the moisture absorption unit during a moisture absorption phase and placing the salt plate beneath the filter unit during a water extraction phase. The extracted water is stored in the storage unit for drinking and cleaning purposes. Further, a system for cleaning solar panels includes a moisture absorbing unit, a filter unit, a salt plate, a water storage unit, a solar panel, a wiper mechanism to receive water from the storage unit to clean the solar panel, and support elements to moveably support wiper mechanism.

Abstract: A solar cell cleaning device of an energy storage system, and a method of cleaning solar cells. Solar cells are positioned outside of a protective case only when sunlight is present. The surface of the solar cells is automatically cleaned when the solar cells are positioned outside of a protective case, or when the solar cells are stored in the protective case. The solar cell cleaning device includes a protective case, a rotatable drum coupled to the protective case, and a brush installed on the protective case and closely contacting the drum. A plurality of solar cells are installed on a surface of the drum, and are cleaned by the brush when the drum is rotated.

Abstract: A removable tip oral hygiene device to clean a plurality of soft surfaces within a user's mouth comprising an elongated body, where the elongated body extends between a first end and a second end; a textured tip at the first end; a removable cleaning material attached to the textured tip, where the removable cleaning material cleans the user's gums; and a textured surface at the second end, where the textured surface cleans a tongue of the user. During use, the removable cleaning material is replaced as needed to gently clean the user's gums.

Abstract: Methods and systems for virus inactivation in the production or processing of biological or other sensitive substances are provided. The disclosed methods and systems for virus inactivation involve the key steps of dissolving carbon dioxide into biological or other sensitive substances; and treating the substance with the dissolved carbon dioxide at conditions which are less than critical pressure and temperature for a prescribed treatment time to inactivate at least 80% of the target virus or viruses contained within the biological or other sensitive substances. The disclosed carbon dioxide treatments for virus inactivation may optionally include concurrently or sequentially subjecting the substances with an acid treatment to lower the pH of the substance and inactivate viruses contained within the biological or other sensitive substance.

Abstract: A wafer chuck is cleaned using a cleaning cap to remove processing residue and particulate matter. The cleaning cap is configured to overlie and align with the wafer chuck and includes a base and a first roller connected to the base and having wound therearound a cleaning cloth. The cleaning cap further includes a second roller connected to the base and having attached thereto a free end of the cleaning cloth. During use, the cleaning cloth winds upon the second roller from the first roller when the second roller rotates about its axis. The cleaning cap can be positioned relative the wafer chuck by way of a manipulator to ensure the cleaning cloth contacts the wafer chuck with sufficient force. The cleaning cloth rubs the wafer chuck with both translational motion and rotational motion.

Abstract: A compact machine for cleaning floors includes a solution tank and dispensing system for dispensing solution onto the surface to be cleaned, a deck assembly for guiding dirty solution to a recovery pickup point, a mechanically operated pump for collecting the dirty solution from the recovery pickup point, and a recovery tank for receiving the collected fluid.

Abstract: Pressure equalization between upper and lower surfaces of PV modules of an array of PV modules can be enhanced in several ways. Air gaps opening into the air volume, defined between the PV modules and the support surface, should be provided between adjacent PV modules and along the periphery of the array. The ratio of this air volume to the total area of the air gaps should be minimized. Peripheral wind deflectors should be used to minimize aerodynamic drag forces on the PV modules. The time to equalize pressure between the upper and lower surfaces of the PV modules should be maintained below, for example, 10-20 milliseconds. The displacement created by wind gusts should be limited to, for example, 2-5 millimeters or less. For inclined PV modules, rear air deflectors are advised for each PV module and side air deflectors are advised for the periphery of the array.

Abstract: A method for cleaning a substrate is provided. The method initiates with disposing a fluid layer having solid components therein to a surface of the substrate. A shear force directed substantially parallel to the surface of the substrate and toward an outer edge of the substrate is then created. The shear force may result from a normal or tangential component of a force applied to a solid body in contact with the fluid layer in one embodiment. The surface of the substrate is rinsed to remove the fluid layer. A cleaning system and apparatus are also provided.

Abstract: A one time use cleansing device for inhibiting catheter associated urinary tract infections. An absorbent body includes a plurality of fingerlings extending outwardly from a front side of the absorbent body. First and second wings extend from a back side of the absorbent body. One or more liquid containing frangible vials are disposed between the first and second wings such that squeezing the wings together causes the vials to rupture, thereby releasing the contents of the vials into the absorbent body. The absorbent body and/or the one or more vials contain a cleansing agent of castile soap and tea tree oil designed to aid in the inhibition and/or prevention of catheter associated urinary tract infections (CAUTIs).

Abstract: A reusable cleaning sheet for removing debris from a surface comprises a main body having a top surface and a bottom surface and scrubbing elements affixed on the top surface. The scrubbing elements are defined as protruded dots spaced closely apart and disposed uniformly throughout the top surface of the main body. The protruded dots are adaptable for scrubbing the debris due to friction created by the protruded dots and the main body is capable of absorbing the debris released by protruded dots without scratching the surface. The protruded dots provide lubrication to permit greater movement through the hard surface when the main body is wet. The bottom surface is free of scrubbing elements and is used to remove dust from dry surfaces and moisture from damp surfaces. The cleaning sheet can be removably attached to a cleaning device. The cleaning sheet can be used in both wet and dry surfaces.

Abstract: A cleaning apparatus including a mop and a cleaning device, wherein: the mop includes: a mop material carrying member for holding mop material; and a mop abutment member, the cleaning device is for cleaning mop material which freely depends from the mop material carrying member of the mop, the cleaning device includes: one or more cleaning arrangements for cleaning mop material; and a pair of abutment members located with respect to the one or more cleaning arrangements and at least partially defining an access aperture through which access to the one or more cleaning arrangements is provided, and the mop abutment member and the pair of abutment members of the cleaning device are configured for abutment in use to limit movement of the mop material carrying member through the access aperture towards the one or more cleaning arrangements.

Abstract: An embodiment prevents equipment fouling (deposition of unwanted material) in an oil recovery system via implementing passivation of metallic components. By preventing or at least slowing or inhibiting corrosion of equipment or components via passivation, such as passivating heat exchangers, metallic piping, and the like, an embodiment in turn reduces fouling thereof. Other embodiments are described and claimed.

Abstract: A process for producing a composite material comprising the steps of: providing mm-sized particles comprising at least particles of a porous optionally at least partially compressed open-cell melamine formaldehyde resin and mm-sized particles of at least one non-rigid foamed resin; mixing said particles with at least one reactive adhesive in a concentration of 6 to 18 g of reactive adhesive per 100 g of mm-sized particles; reacting said reactive adhesive with said particles in the presence of aerial moisture thereby bonding said particles together during said mixing process; transporting said mixture into a mould; and irreversibly compressing said mixture to a block in a mould without additional heat to a density greater than 50 kg/m3 to form a block of said composite material; a composite material obtainable by this process; and the use of this composite material for polishing and/or cleaning applications with a liquid.

Abstract: An absorbent cleaning device for use during a surgical procedure is disclosed. The absorbent cleaning device may comprise a substantially non-fibrous or non-particulate absorbent material and at least one opening. The opening may comprise a slit or channel and be configured to accommodate a portion of a medical appliance or an elongate medical device. The absorbent cleaning device may be configured to clean the medical appliance or the elongate medical device. The absorbent cleaning device may also be configured to retain or secure a medical appliance or elongate medical device during a surgical procedure.

Abstract: A substrate cleaning apparatus capable of quickly removing cleaning liquid that has been used in cleaning of a substrate with a roll cleaning tool from the substrate. The substrate cleaning apparatus includes a substrate holder configured to hold and rotate a substrate; a cleaning-liquid supply nozzle configured to supply cleaning liquid onto a first region of the substrate; a roll cleaning tool configured to be placed in sliding contact with the substrate in the presence of the cleaning liquid to thereby clean the substrate; and a fluid supply nozzle configured to supply fluid, which is constituted by pure water or chemical liquid, onto a second region of the substrate. The second region is located at an opposite side of the first region with respect to the roll cleaning tool, and a supply direction of the fluid is a direction from a central side toward a peripheral side of the substrate.

Abstract: A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.

Abstract: A fiber optic connector cleaner including a base, a brush-like subsurface with a top surface, including a plurality of bristles, connected to said base, and a fiber optic connector cleaning material on said top surface of said brush-line subsurface, wherein said bristles are movable to allow gaps to be created, while still maintaining a top surface.

Abstract: A reversible brush cleaning device having alternate, reversible orientations is disclosed. The device includes first and second brush treatment textures defined in first and second surface regions, respectively. The reversible orientations alternately present the first and second surface regions on the exterior and interior of the flexible body, respectively. The textures are differently configured, in order to provide for alternate brush treatments when each is individually presented on the exterior, in each of the reversible orientations.

Abstract: A window cleaning robot according to the present embodiment comprises a first cleaning unit and a second cleaning unit, which are respectively attached to and move on both surfaces of a window by magnetic force. The window cleaning robot further comprises: a first magnetic module included in the first cleaning unit; a second magnetic module included in the second cleaning unit; a magnetic force sensing part for sensing magnetic force between the first magnetic module and the second magnetic module; and a magnetic force controller for controlling the magnetic force between the first magnetic module and the second magnetic module, wherein the first magnetic module comprises a first magnet which is rotationally mounted, and a second magnet and a third magnet disposed on both sides of the first magnet, and the magnetic force controller rotates the first magnet so as to control the magnetic force between the first magnetic module and the second magnetic module.

Abstract: There are provided first and second cleaning members which are configured to clean a central zone in a rear surface of a wafer when the wafer held by an absorption pad is horizontally held, and configured to clean a peripheral zone in the rear surface of the wafer when the wafer is held by the spin chuck. Due to the provision of the first and second cleaning members, detergency can be improved as compared with a case in which only one cleaning member is used. The first and second cleaning members are configured to be horizontally turned by a common turning shaft. When the central zone in the rear surface of the wafer is cleaned, the turning shaft is located to be overlapped with the wafer. Since the turning shaft is located by using the moving area of the wafer, a size of an apparatus can be reduced.

Abstract: A brush cleaning device includes a flexible body having first and second opposed surfaces defining a top and a bottom. A plurality of different brush treatment surfaces are provided on the top of the flexible body, variously configured for washing and rinsing bristles of brushes having different sizes. A positioning element is provided on the bottom of the flexible body, configured to maintain a position of the device with respect to a work area such as a wash basin, tub or sink. A drain hole extends through the flexible body, configured to drain water from the top through the bottom of the flexible body.