Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle. The system and method utilize a cleaning composition that contains at least one water-soluble or water dispersible copolymer. The method may also include a step of applying to the surface a treating composition which contains non-photoactive nanoparticles.

Abstract: This invention relates to a vibrating abrasive cleaning apparatus and method which is powered by at least one electric motor specially fabricated to the cleaning container assembly mounted on a rigid square tubing frame on one side by compression springs, on the opposite side by tension springs. The compression springs and tension springs have a different spring rate which produces better rolling of the media and therefore, faster circulation and cleaning. The specially fabricated electric motor attached to the cleaning container provides for enhanced oscillation and much greater cleaning capabilities thereby reducing the cleaning time. The entire vibrating assembly sits on a base and has a lid operated by a cable and counterweight for ease in loading the container for oscillation of the parts.

Abstract: A method of cleaning a component or a unit of an image forming apparatus which has been contaminated by a toner used for image forming includes the steps of blasting a target surface of the component or unit which has been contaminated by the toner with dry ice, and supplying a detergent to the target surface when the target surface is blasted with dry ice. In addition, a type or concentration of the detergent is adjusted in accordance with a type of the toner used for image forming.

Abstract: A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO2 (dry ice) pellets may be directed at the surface to further clean the component.

Abstract: A method and apparatus of using a dry ice blasting system to clean injection molds in and out of an injection molding machines characterized in that it is easy to use and is particularly well suited to cleaning small mold features such as the vents on molding inserts.

Abstract: A new method and apparatus is provided that can be applied to clean outer edges of semiconductor substrates. Under the first embodiment of the invention, a brush is mounted on the surface of the substrate around the periphery of the substrate, chemicals are fed to the surface that is being cleaned by means of a hollow core on which the cleaning brush is mounted. The surface that is being cleaned rotates at a relatively high speed thereby causing the chemicals that are deposited on this surface (by the brush) to remain in the edge of the surface. Under the second embodiment of the invention, a porous roller is mounted between a chemical reservoir and the surface that is being cleaned, the surface that is being cleaned rotates at a relatively high speed. The chemicals that are deposited by the interfacing porous roller onto the surface that is being cleaned therefore remain at the edge of this surface thereby causing optimum cleaning action of the edge of the surface.

Abstract: A method and apparatus for cleaning the interior of capillary tubes used to dispense 1 to 100 micron diameter liquid droplets by a piezoelectric transducer surrounding each capillary tube. Magnetic particles are aspirated into the capillary tubes and moved by an exterior magnet to cause deposits on the interior walls to be dislodged and subsequently discharged from the capillary tube. In a preferred embodiment, the magnetic particles are coated with a material capable of binding such deposits, e.g., DNA, RNA, and the like.

Abstract: The invention provides novel methods of detoxifying highly toxic chemicals, and treating surfaces contaminated, or potentially contaminated, with toxic chemical agents such as chemical warfare agents and/or industrial toxins. The methods employ silver-exchanged zeolites and sodium zeolites as reactive sorbents to degrade such agents or toxins on contact, in solution or vapor form.

Abstract: An apparatus is disclosed for drying wafer substrates in a process tank having an object supporting member for supporting one or more wafer substrates, the object supporting member having apertures through which “vacuum force” can be applied to essentially remove trace amounts of liquid from object contact points formed by the support of the wafer substrate by the object supporting member. Also disclosed is a method of implementing the disclosed apparatus comprising transferring a wafer substrate from an object transporting member to the object supporting member, providing an aperture at or near each contact point, and applying a “vacuum force” through the apertures to remove any trace amounts of liquid. Also disclosed and claimed are wafer substrates resulting from application of the disclosed drying process and apparatus.

Abstract: Methods for cleaning screw extruder, especially powder-coating extruders, include filling the extruder barrel with a gel purge formulation comprised of a high-boiling pyrrolidone or piperidone (lactam) solvent (most preferably N-methyl pyrrolidone (NMP)), thickened with 5-50 wt. % of a thermoplastic resin thickening agent, most preferably polystyrene (PS). Once the extruder barrel is filled with the gel purge formulation, the screws are stopped and the gel allowed to soak for between about 10 to about 30 minutes. The screws are then restarted and the gel is discharged from the extruder. Immediately after the gel purge formulation exits the machine, a small amount of a thermoplastic “rinse” polymer (e.g., polyethylene) may be added so as to remove any vestigial amount of the gel purge formulation therefrom.

Abstract: In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liquid-crystal mixture is formed, relative motion between the liquid-crystal mixture and the substrate is created to dislodge contaminants adhered to the substrate. In one alternative method, the solution is applied on a pad. In another alternative method, the substrate is place in a bath of the solution. A wafer cleaning module also is described.

Abstract: The present invention provides a cleaning method in accordance with a degree of soiling and a type of contaminant on a surface to be cleaned of a cleaning target. In the method of cleaning a cleaning target, such as an electrical component, with dry ice, during a process of blasting the dry ice toward the surface to be cleaned from a location where the dry ice is stored, a size of the dry ice is adjusted, so cleaning is performed while a cleaning performance of the dry ice is changed in accordance with the type of soiling or contaminant on the surface to be cleaned.

Abstract: Liquid or gel bleaching compositions comprising a diacyl peroxide, thickener, and water are disclosed. Preferred compositions are for use in automatic dishwashing machines. The compositions are effective in removing stains, especially carotenoid stains, from plastics while minimizing deposition.

Abstract: A process for the use of an aqueous cleaning composition to remove organic material from a substrate. The cleaning composition preferably includes a nonionic surfactant and may also include a glycol ether solvent.

Abstract: A scrub washing apparatus comprises a spin chuck for holding a substrate to be processed substantially horizontally, a nozzle for supplying a washing liquid to the substrate mounted on the spin chuck, an arm vertically and horizontally movably supported, an output shaft provided at the arm, a sponge brush connected directly or indirectly to the output shaft, for scrubbing the substrate on the spin chuck in contact therewith, a press mechanism moving the sponge brush downward together with the output shaft, for pressing the sponge brush against the substrate on the spin chuck, and a rotation drive mechanism provided above the press mechanism at a position where the rotation drive mechanism is capable of being engaged with the output shaft, for directly rotating the sponge brush by engaging with the output shaft.

Abstract: A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are introduced into the fluid film on the substrate surface. The ice crystals have a temperature that is lower than the temperature of the fluid such that the fluid changes the ice crystals into a gaseous state to form a pulse generated in the fluid film. The depth of penetration of the ice crystals into the fluid film is controlled such that the ice crystals do not strike the substrate surface. The substrate surface is cleaned with the pulse.

Abstract: A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface by physical force, and another part in which a fluid including a gaseous reactant is directed onto the surface of the substrate while the surface is irradiated to cause a chemical reaction between the reactant and organic contaminants on the surface, to chemically removing the organic contaminants. In the method of cleaning the substrate, the physical and chemical cleaning processes are carried out in a separate manner from one another so that the frozen particles of the aerosol are not exposed to the effects of the light used in irradiating the surface of the substrate. Therefore, the effectiveness of the aerosol in cleaning the substrate is maximized.

Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

Abstract: A blasting medium which has an average grain size of at most 20 &mgr;m and contains at least 90 mass % of a water-soluble inorganic salt, wherein the content of grains having grain sizes of at least 50 &mgr;m is at most 5 mass %.

Abstract: Systems and methods for prevention of condensation of ambient water vapor due to evaporation of frozen carbon dioxide particles used to clean data storage tapes. Various embodiments maintain conditions under which condensation cannot form in the ambient environment immediately surrounding a portion of a rigid surface on which the tape is maintained in thermodynamic contact and under tension (e.g., a metallic capstan around which the tape is wrapped).

Abstract: This invention provides a cleaning method for removing sediment from the inner wall of the rotary drum of a horizontal drum-type centrifugal separator which comprises charging a plurality of solid cleaning medium pieces such as globules, balls, cubes, rods, springs etc., into the rotary drum, supplying a cleaning liquid to the rotary drum, rotating the drum, and discharging the sediment together with the cleaning liquid. The solid cleaning medium is charged into the rotary drum either before centrifugal separation or at the time of cleaning after centrifugal separation.

Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.

Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle.

Abstract: A portable, diver-operated cryogenic freezing unit cleans surfaces underwater. A housing has a first chamber that contains cryogenic liquid, such as liquid nitrogen, and a second chamber is disposed adjacent to an end portion that fits about contaminating matter on a surface underwater. A valve vents cryogenic liquid from the first chamber to expand as gas in the second chamber. The vented cryogenic liquid and gas freeze a slug of water and the contaminating matter on the surface within the end portion. The housing is bent, twisted or otherwise displaced to break or pry-away and remove the frozen slug of water and contaminating matter from the surface to thereby clean it. A method of cleaning a surface underwater using the cryogenic freezing unit is described.

Abstract: The invention relates to a method for cleaning a metallic or an enameled surface comprising flooding a metallic surface contaminated with deposits with a mixture comprising (i) water, (ii) chippings of woods selected from the group consisting of merantis, bongossis, mahoganies, sipos, khayas, lauans, and sapellis, and (iii) a member selected from the group consisting of polyaspartic acid, salts of polyaspartic acid, and polysuccinimide, and thereby cleaning the surface.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.

Abstract: A portable, diver-operated cryogenic freezing unit cleans surfaces underwater. A housing has a first chamber that contains cryogenic liquid, such as liquid nitrogen, and a second chamber is disposed adjacent to an end portion that fits about contaminating matter on a surface underwater. A valve vents cryogenic liquid from the first chamber to expand as gas in the second chamber. The vented cryogenic liquid and gas freeze a slug of water and the contaminating matter on the surface within the end portion. The housing is bent, twisted or otherwise displaced to break or pry-away and remove the frozen slug of water and contaminating matter from the surface to thereby clean it. A method of cleaning a surface underwater using the cryogenic freezing unit is described.

Abstract: The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle.

Abstract: A copper wiring is desirable for a high-speed logic circuit integrated on a semiconductor substrate, and is patterned through a chemical mechanical polishing, wherein polishing particles are brushed away from the major surface of the resultant semiconductor structure by using aqueous ammonia at 0.0001-0.5 weight percent, catholyte or hydrogen-containing water without damage to the copper wiring, and, thereafter, metallic contaminants such as copper is removed by using washer containing decontaminating agent selected from polycarboxylic acid, ammonium salts thereof and polyaminocarboxylic acid also without damage to the copper wiring.

Abstract: Powdered compositions comprising in admixture inorganic salts and silica gel, and optionally a fragrance additive, are disclosed. The novel compositions are useful in absorbing and deodorizing liquid waste and for removing such waste from irregular surfaces, such as textiles and carpeting, as well as from smooth hard surfaces. The compositions are effective in absorbing liquid biohazards, such as blood, vomit, urine, and other body fluids. For this application, a halogen-containing compound, such as sodium hypochlorite or calcium hypochlorite is preferably included in the composition. The mixtures can also be utilized for the absorption of oil-based spills and hydrocarbons and are also effective in removing moisture and malodors associated with pet urine and other moisture-related stains encountered in the home. When applied to liquid wastes, the absorbent properties of the compositions contain the spill, creating a solid cohesive matrix that allows for easy disposal.

Abstract: This invention includes systems and methods for cleaning ventilation ducts using a dry ice blasting system that is adapted to blast debris from the interior surfaces of ventilation ducts. This invention employs either existing or artificial duct ventilation airflow to evacuate dislodged debris and a filter or filtration system attached to the ventilation system to capture the dislodged debris.

Abstract: Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or carbon dioxide gas through a sand glass-shaped nozzle. The formed neutral cluster is injected at an acute angle with respect to a surface of the specimen, thereby removing particles or organic remnants attached on the surface of the specimen without damaging the surface of the specimen.

Abstract: Cu metallization is treated to reduce defects and effect passivation, and to reduce leakage between lines, by removing surface defects subsequent to CMP and barrier layer removal. Embodiments include the sequential steps of: CMP and barrier layer removal; buffing with a solution comprising citric acid, ammonium hydroxide and deionized water to remove copper oxide; rinsing with deionized water or an inhibitor solution, e.g., benzotriazole or 5-methyl triazole in deionized water; buffing with an abrasive slurry; and rinsing with deionized water or an inhibitor solution.

Abstract: /The present invention provides in one embodiment a method of manufacturing an integrated circuit including cleaning a semiconductor wafer using a cleaning apparatus, wherein the cleaning apparatus includes a roller brush frame and roller brushes cooperatively supported within the roller brush frame and aligned to form a cleaning gradient that is configured to remove particles of different sizes from an object to be cleaned.

Abstract: A wafer prober capable of cleaning probe pins in-line is provided. The wafer prober is used in the wafer probing test system, which includes a test machine and a test head. The wafer prober includes a housing having a probe card holder for holding a probe card, a staging device installed in said housing and moving along a X-Y-Z plane, and a chuck installed on the staging device for holding a wafer to be tested. Additionally, the wafer prober employs at least a nozzle installed at the staging device for cleaning probe pins of the probe card by spraying solid, vapor and liquid material. Since the wafer prober does not need to remove the probe card away to clean, and does not need to position the probe card again, the production downtime can be greatly reduced. Additionally, due to that the wafer prober employs the nozzle to spray out three phases of CO2 to clean the probes, the probes do not be damaged and the lifetime of the probes can be extended.

Abstract: Equipment used in the processing of plastic, such as molds and extrusion screws, is cleaned of plastic residue by a combination of thermal cycling and agitation without impact cleaning. A chamber can be heated by an electric radiant heater and cooled by the introduction of liquid nitrogen. A fixture in the chamber receives the equipment to be cleaned and is agitated by a drive motor. The chamber is heated and cooled in the following cycle in which the drive motor agitates the fixture: first to 250-300° F., then to −315° F., then cycled between −50° F. and −10° F., then to 150° F., then to −200° F., to 100° F., then to ambient temperature. The chamber is controlled by a computer that prompts the operator for the kind of plastic to be cleaned off of the equipment and then controls the heating and cooling automatically.

Abstract: A method of cleaning the inside surface of a kitchen extraction duct or other grease duct, includes applying solid carbon dioxide under pressure to the inside surface of the duct, so that grease thereon is hardened and dislodged therefrom.

Abstract: The object of this invention is to provide a cleaning method in accordance with the degree of soil and type of contaminant of a surface to be cleaned of a cleaning target. In order to achieve this object, in a method of cleaning a cleaning target, including an electrical component, with dry ice, during a process of blasting dry ice toward a surface to be cleaned from a location where the dry ice is stored, a size of the dry ice is adjusted, so cleaning is performed while a cleaning performance of the dry ice is changed in accordance with a type of soil or contaminant of the surface to be cleaned.

Abstract: A totally biodegradable oil absorption material is utilized to clean up oil spills on both land and water. Particles of coconut coir pith between about one-quarter of an inch and one inch in size are utilized for this purpose. The flakes or granules of coconut coir pith are spread upon the surface of the oil spill. The coconut coir pith readily absorbs the oil and remains in a form that can be easily recovered by scooping or raking. Once recovery is complete, the oil-saturated coconut coir pith can be subjected to squeezing by pressure to liberate the oil collected. Following extraction of the absorbed oil, the coconut coir pith can be reused for subsequent oil cleanup operations. Also, the oil extracted from the coconut coir pith is not contaminated and can be used as well. Coconut coir pith is a byproduct obtained from the husks of coconuts as those husks are processed to make fiber ropes and other articles.

Abstract: An apparatus for spraying a liquid on the surface of assemblies that are moving through wash and rinse stations.

Abstract: An apparatus for removing labels from a housing is provided. The apparatus includes a tank for storing a medium at a pressure above ambient pressure. The apparatus also includes a medium conduit in communication with the tank for transporting the medium therefrom. The conduit defines a opening therein. The medium exiting the conduit at the opening is adapted to remove labels from the housing.

Abstract: A method and apparatus for cleaning a tire mold with frozen CO2 cleaning material wherein a portable frame is positioned on a bottom mold of a tire press and has a rotatable frame on which a nozzle support is mounted for swivel action to clean the upper mold half and the lower mold half as the nozzle support is moved radially and circumferentially of the tire mold.

Abstract: A cleaning compound additive for adding to water or windshield wiper fluid to aid removal of insect splatters from a windshield. The cleaning compound additive includes the combination of effective amounts of anhydrous ammonia, alkoxylated linear alcohols sold under the trade name SURFONIC, dry particulate sodium bicarbonate, dry particulate polyvinyl pyrrolidone, dry particulate orange dye, and dry particulate citrus orange scent.

Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelletized CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

Abstract: A method for removing products of hot corrosion and oxidation from selective portions of surfaces of a gas turbine engine, such as coatings and substrates, following exposure of the surfaces to hot oxidative gases of the turbine exhaust. The method involves a high temperature chemical reaction and has no detrimental effect on adjacent coatings and substrates that have not been attacked by the hot exhaust gases.

Abstract: A pipeline-cleaning method and device thereof is built and applied by firstly forming a sealing circuit including a pipeline pending cleaning, a pressure control device, and two units of pipeline-cleaning device A, A′. A storage tank filled with rigid granules in each pipeline-cleaning device A, A′ is provided with a filter net unit at its lower portion and a filter unit at its upper portion. When cleaning, a pressurized liquid is supplied by the pressure control device to drive the granules circulating the circuit and thereby remove dirt and sediment deposited on the pipe wall by collision and rubbing of the granules to the pipeline inner wall.

Abstract: In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liquid-crystal mixture is formed, relative motion between the liquid-crystal mixture and the substrate is created to dislodge contaminants adhered to the substrate. In one alternative method, the solution is applied on a pad. In another alternative method, the substrate is place in a bath of the solution. A wafer cleaning module also is described.

Abstract: A method for removing a stain from a surface of a structure which includes the steps of spraying an aggregating agent comprising a cationic linear organic polymer onto the surface of such structure having a stain produced thereon, dissociating the stain particles by use of Coulomb force f generated between the stain particles and the aggregating agent, displacing slightly the stain particles along the surface of the structure to cause peeling thereof from the surface to be cleaned, and simultaneously, aggregating the same for cleaning. Another embodiment includes maintaining water permeability of a road by easily eliminating a stain adhering to the surfaces of granular aggregate particles forming a drainage-type pavement layer of a road without the use of various mechanical tools.

Abstract: A system for cleaning a substrate according to the present invention comprises an apparatus for producing a sherbet-like composition consisting of snow ice grains and a chemical agent, holder means for holding a substrate to be cleaned, supply means for supplying to the substrate the sherbet-like composition for cleaning the substrate, and means for moving the sherbet-like composition being supplied relative to at least one of the surfaces of the substrate.

Abstract: Semiconductor wafers are cleaned using megasonic energy to agitate cleaning fluid applied to the wafer. A source of energy vibrates an elongated probe which transmits the acoustic energy into the fluid. The probe has a solid cleaning rod and a flared or stepped rear base. In one form, the probe is made of one piece, and in another, the rod fits into a socket in the base. This enables a rod to be made of material which is compatible with the cleaning solution, while the base may be of a different material. A heat transfer member acoustically coupled to the probe base and to a transducer conducts heat away from the transducer. A housing for the heat transfer member and the transducer supports those components and provides means for conducting coolant through the housing to control the temperature of the transducer. In another arrangement, an end of the housing is coupled between the transducer and the probe.