Abstract: A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelleted CO2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

Abstract: A method for cleaning a mirrored glass. The method includes affixing a pad to a portable, power tool; applying a composition containing an abrasive to the pad; applying the pad to the mirrored glass surface; operating the tool in a rotary motion at high speed until the mirrored glass surface is clean; and removing any excess composition from the mirrored glass surface. A composition for use in cleaning mineral deposits off mirrored glass surfaces and includes a non-toxic, biodegradable solution having a pH less than 7.0 in combination with an abrasive selected from the group consisting of ground pumice stone, calcium carbonate, aluminum oxide, and diatomaceous earth. A preferred acid composition has a pH of about 4.0, and contains an abrasive with a particle size between about 3 to about 5 microns.

Abstract: An improved method and/or process for preparing and handling formulations useful in metal treatment baths which includes packaging formulations useful in preparing and/or replenishing aqueous-based baths in water soluble pouches or containers. The present invention includes the selection of components effective in treating metallic surfaces, which may be blended and effectively stored in containers or pouches consisting of polyvinylalcohol film. The present invention reduces the necessity or frequency of personal hand contact by workers with these blends.

Abstract: A method for cleaning surfaces with a mixture containing water and wood chippings, a specific mixture, and the use of said mixture as a cleaner.

Abstract: A cleaning medium for use in cleaning printing forms includes either an acid solution having a pH of from 1 to 4 or a basic solution having a pH of from 10 to 14. A dispersible abrasive agent in a concentration of from 1 to 15 grams per 100 grams of the cleaning composition, a surfactant in a concentration of from 1 to 50 grams per 100 grams of the cleaning composition, an organic solvent in a concentration of from 10 to 50 grams per 100 grams of the cleaning composition, and additional water if needed are added to the acid or basic solution to form the cleaning medium. A cleaning medium in concentrate form is also provided.

Abstract: Glass preforms are cleaned by contacting each preform (11) with supercritical carbon dioxide which dissolves residual index-matching oil on the preform. The liquefied carbon dioxide is then converted to gaseous carbon dioxide which conveniently separates the index-matching oil so that it can be recovered and reused. The gaseous carbon dioxide is likewise recycled for use in cleaning other preforms, and so there is substantially no waste.

Abstract: An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that are substantially equal to the pressure of an adjacent environment. In a preferred embodiment, the processing chamber is pressurized and vented with a source of high purity dry gas that is diffused into the chamber through a diffuser to pressurize the processing chamber after processing of the wafer is completed. A chamber equalization port between the processing chamber and the adjacent environment is opened to maintain the pressure within the chamber at or slightly above the pressure of the adjacent environment, and the chamber valve is then opened. The wafer can then be removed from the processing chamber, and a new wafer can be inserted. The chamber is then sealed by closing the chamber valve and the equalization port, and the atmosphere within the processing chamber is evacuated to a desired level.

Abstract: The present invention relates to cleaning compositions which, as powder or as aqueous formulation, comprise sodium bicarbonate and, as dispersants, polyaspartic acids and/or salts thereof, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces, and also to a method of cleaning surfaces contaminated with deposits using these cleaning compositions.

Abstract: A method is disclosed for removing impurities from an elastomer intended for medical or pharmaceutical use, which includes a step of performing a first solvent extraction process on the elastomer by contacting the elastomer with a first extracting solvent in a non-supercritical state to substantially remove impurities from the elastomer, thereby leaving a residue of said first extracting solvent in the elastomer. The elastomer is there after subjected to a second solvent extraction process, by contacting the elastomer with a second extracting solvent, which is a supercritical fluid or a mixture of super critical fluids, in order to remove substantially reduce the concentration of the residue of the first extracting solvent remaining in the elastomer after the first solvent extraction process.

Abstract: Chemical mechanical polishing for removing a hardened surface layer of photoresist in the manufacture of semiconductor devices. The use of chemical mechanical polishing allows for the removal of a hardened surface layer of photoresist that has been hardened through ion beam implantation or plasma etching. The chemical mechanical polishing process places a semiconductor wafer with a photoresist layer on a polishing pad. The photoresist layer is placed close to the polishing pad, so that the hardened surface layer of the photoresist layer is removed. A slurry is added to the polishing pad to aid in the removal of the hardened surface layer of the photoresist layer. Conventional chemical stripping is then used to remove the remaining photoresist layer.

Abstract: A method for cleaning a surface by flooding and thereby cleaning a surface contaminated with deposits with a mixture containing water, wood chippings, and optionally, polyaspartic acid or a derivative of a polyaspartic acid.

Abstract: A corroded superalloy or heat resistant steel part, in particular a gas turbine component like a gas turbine blade, having a surface with products or corrosion is refurbished. The invention the surface is cleaned, in particular mechanically or chemically, and an aluminide coating is applied to the cleaned surface. Subsequently, the aluminide coating is removed, whereby all products of corrosion which have still remained in the part to be refurbished are removed as well.

Abstract: An aerosol assisted chemical cleaning method to remove wall deposition from reaction chambers is provided. The method generates cleaning chemicals in an aerosol state, and then feeds them into the reaction chamber by a carrier gas. The cleaning chemicals interact quickly with unwanted deposits on all internal surfaces of the reaction chamber. By controlling the pressure in the closed reaction chamber, the deposits can be stripped off from the wall and fall into a waste acid collector. The acid collector can then process the waste to prevent contamination.

Abstract: The present invention relates to a method of using a protein-polysaccharide complex composition as an adsorbent and filtering aid for in the processing of fluids or solids to absorb or decompose a variety of separable components including halogenated organic compounds such as PCBs and dioxins.

Abstract: Manufacture of superalloy component wherein the component is blasted with abrasive grit particles at one or more stages during the manufacture, is treated with a chemical grit removal medium effective to dissolve and remove abrasive grit particles from the surface of the component without degradation of the component (substrate), and then is coated with a protective coating such that entrapped grit particles are substantially reduced or eliminated from the coating.

Abstract: A method of removing a diffusion aluminide coating on a component designed for use in a hostile environment, such as superalloy turbine, combustor and augmentor components of a gas turbine engine. The method selectively removes an aluminide coating by stripping aluminum from the coating without causing excessive attack, alloy depletion and gross thinning of the underlying superalloy substrate. Processing steps generally include contacting the coating with a mixture that contains a halogen-containing activator and a metallic powder containing an aluminide-forming metal constituent, such as by pack cementation-type process. The mixture is then heated to a temperature sufficient to vaporize the halogen-containing activator and for a duration sufficient to cause the halogen-containing activator to provide a transfer mechanism for the removal of aluminum from at least a portion of the diffusion aluminide coating, while the metallic powder absorbs the removed aluminum.

Abstract: A method for removing a stain from a surface of a structure which includes the steps of spraying an aggregating agent comprising a cationic linear organic polymer onto the surface of such structure having a stain produced thereon, dissociating the stain particles by use of Coulomb force f generated between the stain particles and the aggregating agent, displacing slightly the stain particles along the surface of the structure to cause peeling thereof from the surface to be cleaned, and simultaneously, aggregating the same for cleaning. Another embodiment includes maintaining water permeability of a road by easily eliminating a stain adhering to the surfaces of granular aggregate particles forming a drainage-type pavement layer of a road without the use of various mechanical tools.

Abstract: A method of grinding a microelectronic device includes a step of preparing an abrasive member by crushing a solid-phase liquid into massive form and by compacting the crushed solid-phase liquid, an abrasive member by compacting a solid-phase gas, or an abrasive member by crushing a solid-phase liquid into massive form, by mixing the crushed solid-phase liquid with a solid-phase gas and by compacting the mixed solid-phase liquid and solid-phase gas, and a step of pressing a surface of the microelectronic device to be ground against the abrasive member.

Abstract: A method of removing glass particles adhering to an inner wall of a glass cartridge of an injection syringe. A helical brush remover made of polyhexamethylene dodecanediamide or a helical stone remover made of aluminum oxide and titanium oxide is inserted into the inner wall of the glass cartridge. The helical brush or helical stone remover rubs against the inner wall of the glass cartridge to remove glass particles as water is sprayed onto the inner wall of the glass cartridge.

Abstract: A method for removal of hydrocarbon materials from solid particulate soil contaminated with the hydrocarbon materials. The method comprises forming an aqueous slurry of a mixture of a hydrophobic adsorbent selected from foamed synthetic materials or natural materials which entrap gas, with the soil in the presence of water. The adsorbent has a density less than water. The slurry is mixed for a period of time, and a gravity separation of the adsorbent from the aqueous admixture thus obtained is effected.

Abstract: A dry zeolite containing composition is used in a method for removing grease and/or oil stains from the human body is disclosed. In accordance with the method, zeolites having an average particle size of about 0.5 mm or less provide superior performance to remove grease and oil stains from the skin. Stain removing activities of the zeolite compositions may be enhanced by the addition of an imide.

Abstract: A method of repetitively using a sheet or similar toner image carrier produced from an image forming apparatus, and a toner applicable thereto. A toner forming an image on the toner image carrier is removed to erase the image. The toner image carrier is implemented as a synthetic sheet. Use is made of a toner whose adhering force to the sheet is weaker than the adhering force of a conventional toner.

Abstract: Equipment used in the processing of plastic, such as molds and extrusion screws, is cleaned of plastic residue by a combination of thermal cycling and agitation without impact cleaning. A chamber can be heated by an electric radiant heater and cooled by the introduction of liquid nitrogen. A fixture in the chamber receives the equipment to be cleaned and is agitated by a drive motor. The chamber is heated and cooled in the following cycle in which the drive motor agitates the fixture: first to 250-300.degree. F., then to -315.degree. F., then cycled between -50.degree. F. and -10.degree. F., then to 150.degree. F., then to -200.degree. F., then to 100.degree. F., then to ambient temperature. The chamber is controlled by a computer that prompts the operator for the kind of plastic to be cleaned off of the equipment and then controls the heating and cooling automatically.

Abstract: An apparatus and method that enhances removal of contaminating particles from surfaces of a non-electrostatically sensitive components that are cleaned using a carbon dioxide cleaning spray. The apparatus includes a programmable power supply that is connected to ground and to the non-electrostatically sensitive component. The surface charge of the component is determined by cleaning the surface without adding any voltage or charge bias to the component. Then the surface is reversed-biased with a voltage having the opposite polarity by a large amount using the programmable power supply. The surface is then cleaned a second time, which removes the contaminating particles that were bound to the surface by electrostatic forces generated during the first cleaning. Thus, reversing the polarity of the charge on the surface that is to be cleaned removes the strong attraction between the contaminating particles and the surface and enhances removal of the contaminating particles from the surface.

Abstract: A negative pressure ring is formed around the surface to be cleaned and an air flow loaded with solid particles is directed onto the surface, which based on its kinetic energy treats the surface without mechanical support means such as brushes. At overpressure the air flow creates an air-cushion-like volume flow, rotating or travelling along predetermined paths, at negative pressure a volume flow is continuously guided over the surface to be cleaned. By admixing solid particles and cleaning and maintenance agents to the air flow, the substrate can be cleaned and maintained. With the process of the invention it is possible to perform several treatment steps in a single operation. The overpressure process works periodically, the negative pressure process in a complete closed cycle, wherein the solid particles are cleaned in an environmentally friendly manner and recycled into the process.

Abstract: A component (10 or 12) of a flat-panel display is cleaned with a fluid having a mole-fraction dominant constituent. The cleaning operation is performed by subjecting the component to the cleaning fluid while its absolute pressure exceeds the absolute pressure at the triple point of the dominant constituent and is at least 20% of the absolute pressure value at the critical point of the dominant constituent. The temperature and pressure of the cleaning fluid are typically controlled in a direction toward the supercritical state of the dominant constituent.

Abstract: A method of washing a blind including the steps of contracting the blind while inserting offset ring-like portions of a coil-spring-like spacer formed of a wire having a specified diameter between adjacent louvers. The blind is then placed in a washing bath in a state where a gap, corresponding to the diameter of the wire, is formed between adjacent louvers. The blind is then placed on a fine particle layer of a mixed material. A vibration generator is driven to apply a vibration to the mixed material through the washing bath so that the fine particles in the mixed material are liquefied. The blind is then sunk into the fine particle layer due to its own weight through the liquefaction. The dirty materials deposited on the surfaces of the louvers are removed by the brushing action of the fine particles, which move in contact with the surfaces of the louvers.

Abstract: A process for treating a workpiece. The workpiece is cooled by directing toward the workpiece a material that includes a gas and particles of a material that undergoes a phase change when applied to the workpiece. The gas and the particle material are non-reactive with the workpiece during the cooling.

Abstract: Electrostatic discharges that occur during solid CO.sub.2 cleaning of a substrate (10) can be virtually eliminated by chilling the substrate so that moisture in the atmosphere, in the form of water droplets(30), condense on the substrate surface (14), thereby forming a continuous film of water (28). The water in the film (28) reacts with the solid CO.sub.2 (24) to form carbonic acid that dissociates into free ions that neutralize the charge on the solid CO.sub.2.

Abstract: The present invention describes a method of cleaning a substrate wherein the substrate is placed into a first brush station while a chemical solution is delivered to the first brush station at a desired cleaning level. The substrate is then scrubbed in the first brush station. After the substrate is scrubbed in the first brush station the substrate is transferred to a second brush station. The chemical solution used in the first brush station is then delivered to a brush in the second brush station in a ramp up manner in order to clean the brush in the second brush station. The delivery of the chemical solution to the second brush station is then stopped and deionized water is delivered to the second brush station. The substrate is then scrubbed using the deionized water in order to rinse the chemical solution from the substrate prior to transferring the substrate from the second brush station to another processing station.

Abstract: A method of sanitizing the bore of an MRI machine by using a pair of sponge elements attached to an elongated handle. The first sponge element has an arcuate surface which is a segment of a sphere having a radius substantially equal to the radius of the bore, the arcuate surface having a first dimension longer than a second dimension. The first sponge element is mounted on an elongated handle having axis which is transverse to the first dimension of the sponge element when the sponge element is used for sanitizing the ceiling of some bores. According to the method, a second sponge element with a planar surface is used for cleaning the floor or track of the bore and disposable cleaning are provided for mounting on the sponge element.

Abstract: An oil-free, water-based sweeping compound containing sawdust, sand, and water has enhanced performance when an effective amount of a super-absorbent polymer, especially a cellulose/acrylate polymer, is incorporated. The resultant product is comparatively inexpensive, smells pleasant, maintains a desirable moist texture, and resists untimely moisture evaporation.

Abstract: The invention relates to a specialized shoe cleaning method that will clean athletic shoes in such a manner that the newly cleaned shoes resemble brand new shoes. The method or process includes applying a chemical to the outer part of the shoe, agitating the surface dirt via a motorized spinning brush, applying high pressure air to blow off any remaining dirt from the shoe, applying a chemical spray (e.g., for shoes with different type fabric), applying pressurized steam, applying an extraction process, using a specialized tool to extract dirt to clean the interior upper, and applying a drying process to dry the shoes. The application of cleaning solutions, high pressure air and steam in conjunction with the vacuum process is especially suited for the removal of dirt, stains and other foreign matter from the shoes.

Abstract: Apparatus and methods for removing particles from a surface of a semiconductor wafer or optical component using a carbon dioxide snow spray directed at the wafer or component while simultaneously irradiating the surface with a laser beam. The apparatus comprises a carbon dioxide jet spray cleaning system disposed within an environmental cleaning station of a processing system that processes the wafer or component. The processing system is a conveyorized system wherein a conveyor belt or web transports wafers or components from processing station to processing station. The cleaning station includes a recirculating blower system, a laminar flow screen, a high efficiency particulate air filter, and a ducting system for recirculating purified air or inert gas. The cleaning station contains a jet spray nozzle that produces a carbon dioxide snow spray. The jet spray nozzle is coupled by way of a manifold to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the jet spray nozzle.

Abstract: A method for cleaning a hard surface using low levels of a cleaning solution includes (i) applying the cleaning solution to the hard surface to be cleaned at a level of not more than about 6 ml of cleaning solution per square foot of hard surface; and (ii) wiping the hard surface with a cleaning implement that includes a handle and a removable cleaning pad having a t.sub.1200 absorbent capacity of at least about 1 g of deionized water per g of the cleaning pad.

Abstract: Stiction in a microstructure may be eliminated by directing a cryogenic aerosol at the portion of the microstructure subject to stiction with sufficient force so as to free the portion of the microstructure.

Abstract: Method [and apparatus ] for quickly and controllably removing chemical residues and particle accumulations from an exposed surface of an object. A slurry, containing a slurry liquid and containing small scrubber particles that optionally have a range of at least two distinct particle sizes, is directed at the exposed surface to remove most or all of the residues and accumulations from the exposed surface. The slurry flow may be pulsed or be relatively constant. The exposed surface of the object is then partly or fully submerged in a rinse liquid that includes a strong base and/or a strong oxidizing agent. The rinse liquid is subjected to ultrasonic wave motion with a chosen wave displacement direction, and the ultrasonic waves have one or more distinct wavelengths, chosen to cover a range of expected sizes of chemical residues, particle accumulations and/or scrubber particles to be removed.

Abstract: Ashes are used when they have the particle size of fly-ash, i.e., when they have just been produced by a combustion process. They can be used, inter alia, for dehydrating and/or stabilizing sewerage plant sludge or sludge from surface treatment plants, for detoxifying liquid, semi-liquid or solid media contaminated by heavy metals and the like, and for removing pollutants from hydrocarbon-containing liquid or semi-liquid media.

Abstract: Blast media for removing coatings from sensitive metal and composite surfaces, and a process useful therewith, the blast media contains water-soluble potassium magnesium sulfate. The media may also contain flow/anti-caking agents and alkali metal salts.

Abstract: A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.

Abstract: Implant intended to be fixed through contact with new grown bone tissue comprising a dense material having an implant surface, and having, at least within a surface portion of the implant surface, surface pores covering at least 5% of the surface portion. The surface pores constitute a contact surface for new grown bone tissue, wherein close to at least a substantial fraction of all of the surface pores has at least one elevation extending over the implant surface which completely or at least partially surrounds an edge of the pore. Each elevation has a rough surface which causes formation of soft tissue when the implant surface is in contact with newly growing bone tissue.

Abstract: A method for treatment of heavy metal contaminated surface coatings, heavy metal contaminated industrial byproducts and industrial effluents utilizing calcium phosphate compounds to render the heavy metal compounds immobile and biologically nonhazardous to humans. In a first embodiment surfaces contaminated with heavy metal compounds are decontaminated in situ during their removal. Solid calcium phosphate material is added to the liquid or chemical paint remover before the paint remover is applied to the heavy metal contaminated painted surface. After application of the paint remover, it is removed by suitable means as scraping or water blasting. The paint and paint remover mixture thus removed is rendered non-toxic with the heavy metal compounds in the paint immobile and biologically nonhazardous. In a second embodiment of the invention, the calcium phosphate compounds are used in a floor sweeping compound to treat the heavy metal contaminated dust generated during industrial processes.

Abstract: This invention relates to a plastics processing equipment cleaning compound comprising a hard outer shell made from a thermoplastic resin and a soft inner core containing a substituted pyrrolidone.

Abstract: A cleaning kit for use in cleaning surfaces in clean rooms, semiconductor fabrication plants, pharmaceutical manufacturing facilities, etc. A stack of extremely clean wipers is packaged together with a container of cleaning fluid in a liquid-tight outer container. The kit is stored until just before it is to be used. Fluid is released from the inner container into the wipers. In one embodiment, the inner container is frangible and is broken by application of hand pressure to the outside of the outer container. The cleaning liquid is allowed to soak into the wipers, and the wipers are removed from the outer container for use. The container can be resealed to protect the wipers after the package has been opened. This device and method minimize deterioration of the wiper material due to prolonged contact with the cleaning fluid, and minimize the loss of effectiveness of substances such as biocides which might deteriorate due to prolonged contact with the wiper material.

Abstract: A post chemical-mechanical polishing clean-up process. Particles and ionic and metallic contaminants remaining on wafer 32 surface after CMP are removed and scratches are smoothed. The wafer 32 may be subjected to a high pressure/high rotational speed rinse at spindle rinse station 42 followed by buffing of the wafer 32 on a second polishing platen 38. If desired, a second high pressure/high speed rinse at spindle rinse station 42 may be performed after the buffing step. The wafer 32 may then be then transferred to a tank 50 for a megasonic bath and after the megasonic bath, the wafer 32 is transferred to a scrubber 44, which scrubs both surfaces of the wafer 32 with brushes and then spins the wafer 32 dry as spin station 84. All transfers are performed in a solution such as DI water to prevent drying of slurry on the wafer surface.

Abstract: A method of cleaning interior surfaces of fluid delivery systems including (a) passing through the system an abrasive cleaner composition including at least one liquid carrier containing solubilizable abrasive particles, at least some of which are in non-solubilized form, effective to abrade the material to be removed from the interior surfaces, and (b) rinsing the system with at least one fluid effective to (i) displace the carrier and (ii) remove the abrasive particles, at least partially by such chemical means as dissolution or decomposition or neutralization. Optionally, the method can include a first step of contacting the inside surfaces of the fluid delivery system with a pretreatment fluid capable of softening or loosening the material that is to be cleaned from the internal surfaces of the delivery system for a time sufficient to soften or loosen unwanted material. A cleaning kit including the abrasive cleaner and rinsing fluid is also provided.

Abstract: A process for removing dried paint residues from a difficultly accessible surface is provided. The surface is contacted with a slurry of particulate solids such as sodium hydrogen carbonate in a first liquid such as N-methyl pyrrolidone which is a solvent or swellant for the paint residues, followed by a different liquid such as isopropyl alcohol in which the first liquid is soluble (and which may also optionally contain particulate solids).

Abstract: Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and rear access doors for providing access to the inner processing chamber. A blower is disposed in the enclosure for circulating purified gas therethrough. A prefilter disposed prior to an inlet of the blower, and a high purity filter and laminar flow screen are disposed in the inner processing chamber. A heater is provided for heating the purified gas and a temperature controller is coupled to the heater for controlling the temperature of the purified gas. A table is disposed in the inner processing chamber upon which contamination sensitive hardware and testing and assembly apparatus may be placed.

Abstract: A chemical-mechanical polisher (10) includes a mixer section (12) that mixes components of a polishing fluid prior to introducing the polishing fluid into a polishing section (13) of the polisher (10). In one embodiment, components from feed lines (113 and 114) are combined in a manifold (121) and flowed through a static in-line mixer (123) to mix the components to form the polishing fluid. The polishing rate of the polishing fluid is relatively high because the mixing occurs near the point of use. Local concentrations of the components of the polishing fluid near a substrate (134) should be relatively uniform because the polishing fluid is mixed prior to reaching the substrate (134).

Abstract: The process concerns the cleaning of workpieces exhibiting organic residues, with the use of a fluid introduced under pressure into a pressure tank loaded with the workpieces. According to the invention, the fluid is circulated during the cleaning step, using preferably liquefied gases, e.g. carbon dioxde, as the fluid. By the use of a heat exchanger, the temperature of the fluid can be regulated during the process.