Abstract: The method of cleaning of spills of oil and oil products from different surfaces, including water surface and land, includes treatment by a composite adsorbent--aluminosilicate material exposed to water-repellent treatment. The absorbent (for example, an aluminosilicate material), which is a first waste product, is waste formed at burning dust coal in industrial furnaces with liquid slug removal. Water repellent is a second waste product of oil industry, wood chemistry, containing hydrocarbons, mass relationship of the first and second waste products is approximately between 1:0.001 to 1:0.25. The method for obtaining the absorbent includes a treatment of aluminosilicate material by water emulsion or water solution of water-repelling agent, at mass relationship of aluminosilicate material, water and water repellent 1:1-5:0.001-0.25 respectively, while stirring at temperature 80-85.degree. C. (40-96.degree. C.) for 30 minutes with further drying to constant wight at temperature between 105.degree. C. to 120.

Abstract: A method for the removal of fluorine or chlorine residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with liquid CO.sub.2.

Abstract: The present invention provides a method for cleaning particles from a semiconductor topography that has been polished using a fixed-abrasive polishing process by applying a cleaning solution including either (a) an acid and a peroxide or (b) an acid oxidant to the topography. According to an embodiment, a semiconductor topography is polished by a fixed-abrasive process in which the topography is pressed face-down on a rotating polishing pad having particles embedded in the pad while a liquid absent of particulate matter is dispensed onto the pad. The particles may include, e.g., cerium oxide, cerium dioxide, .alpha. alumina, .gamma. alumina, silicon dioxide, titanium oxide, chromium oxide, or zirconium oxide. A cleaning solution including either (a) an acid and a peroxide, e.g., hydrogen peroxide, or (b) an acid oxidant is applied to the semiconductor topography after the polishing process is completed.

Abstract: In one aspect, foreign material on the surface of a substrate is processed to form a reaction product by: providing a directed flow of a fluid, comprising a reactant, to the vicinity of the foreign material to be processed; and delivering an aerosol of at least partially frozen particles continuously or intermittently to the foreign material to aid the reactant react with the foreign material to form the reaction product. In another aspect, foreign material is processed by: providing a directed flow of a fluid, comprising a reactant, to the foreign material to be processed in a limited area reaction region corresponding to a minor fraction of the total area of the substrate; agitating the foreign material in the limited area reaction region to aid the reactant react with the foreign material to form the reaction product; and providing relative motion between the substrate and the directed flow of fluid to achieve a substantially uniform exposure of the foreign material to fluid flow and the agitation.

Abstract: A substrate may be treated by impinging the substrate with a cryogenic aerosol spray wherein the cryogenic aerosol spray is formed by expanding a pressurized liquid or liquid/gaseous stream of one or more cryogens through a nozzle at a given distance from the substrate into a process chamber with a pressure of about 1.6.times.10.sup.4 Pascal or less so as to form at least substantially solid aerosol particles of said one or more cryogens downstream from the nozzle by the cooling resulting from the expansion and/or evaporation to form an at least substantially solid particle containing aerosol.

Abstract: A method for cleaning jewelry includes dispensing a foamy substance onto an item of jewelry from an aerosol dispenser, using a scrubbing brush to scrub the jewelry item with the foamy substance thereon, in order to cause the foamy substance to become more foamy, thereby to enhance and complete the cleaning process. Thereafter, the item of jewelry is rinsed.

Abstract: A method for cleaning an inner wall of a mold part includes forming a chamber between displaced mold parts by introducing a casing between the mold parts. The casing enclosures a blasting device for introducing a blasting nozzle which directs a cleaning jet at the inner wall. The chamber encapsulates noise and particles which are produced during the cleaning process.

Abstract: A method is provided for cleaning an electronic circuit board having first and second opposing surfaces. The method includes directing a stream of carbon dioxide particles against the first surface. Steam is sprayed toward the first and second surfaces such that condensation of the steam caused by cooling from the CO.sub.2 particles forms a thin film of water on the first surface for conducting electrostatic charge away from the first surface. The CO.sub.2 particles substantially remove residue present on the first surface, thereby cleaning the circuit board.

Abstract: A method for separating hydrocarbons from a soil, e.g. to separate bitumen from oil sands, involves mixing the soil thoroughly with water and a supply of buoyant beads having surfaces that are of oleophilic material and coated with a surface layer of hydrocarbon solvent. The beads, soil and water are agitated for a period during which hydrocarbons from the soil become adhered to the solvent coated beads. After the mixture has been allowed to settle the beads separate towards the top and are removed and treated with solvent to recover the adhered hydrocarbons therefrom. Suitable solvents are oil refinery products such as naphtha, kerosine, gasoline, varsol, toluene and diesel fuel.

Abstract: A polishing slurry is formed of a silica-dispersed solution obtained by dispersing, in an aqueous solvent, a fumed silica having an average primary particle size of from 5 to 30 nm, the silica-dispersed solution exhibiting a light scattering index (n) of from 3 to 6 at a silica concentration of 1.5% by weight, and the fumed silica dispersed therein having an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is produced by pulverizing, using a high-pressure homogenizer, a silica-dispersed solution obtained by dispersing a fumed silica in an aqueous solvent, so that the fumed silica possesses an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is used for polishing semiconductor wafers and inter-layer dielectric in an IC process.

Abstract: A method for repairing a thermal barrier coating on an article designed for use in a hostile thermal environment, such as turbine, combustor and augmentor components of a gas turbine engine. The method is particularly suited for the repair of thermal barrier coatings composed of an aluminide bond coat formed on the surface of an article, and an insulating columnar ceramic layer overlaying the bond coat. Processing steps generally include preparing a powder mixture of a halogen-containing activator and an aluminum-containing material, contacting the ceramic layer with the mixture, and then heating the ceramic layer for a duration sufficient to cause the halogen-containing activator to deteriorate the ceramic layer, while the aluminum-containing constituent of the mixture prevents the bond coat from being attacked or otherwise depleted by the halogen-containing activator. A suitable composition for the mixture is about 0.5 to about 1 weight percent of the halogen-containing activator and about 0.

Abstract: An aqueous composition for cleaning contact lenses comprises an aliphatic monohydric alcohol, a surface active agent having cleaning action for contact lens deposits, and an abrasive agent.

Abstract: A squeegee unit is driven to rotate about a rotation axis perpendicular to a glass substrate surface with a motor while a plurality of blades of the squeegee unit contact on the substrate surface. The rotating squeegee unit is moved in a predetermined path on the substrate surface by relatively moving an X-Y stage so that its blades remove foreign materials adhered to the glass substrate surface.

Abstract: The present invention provides a cleaning method in which an object to be cleaned is held such that a surface of the object to be cleaned faces a cleaning body and the object to be cleaned and the cleaning body are moved relative to each other in a state where the cleaning body is in contact with the surface to the object to be cleaned, thereby cleaning the surface of the object to be cleaned, wherein a contact pressure of the cleaning body to the surface of the object to be cleaned is set at most 20 gf/cm.sup.2, when the surface is cleaned.

Abstract: A method for removing etch residue material in which the removing process is simple, and the metal is prevented from being corroded or damaged. The method for removing etch residue materials and photoresist after carrying out a dry etching includes the steps of preparing a dry chemical by using one or more gas compounds, and removing the etch residue materials by raising the dry chemical above a critical point, wherein the dry chemical comprises carbon dioxide gas and one or more gases selected from a group consisting of DMSO (dimethyl sulfoxide), DMFA (dimethyl formamide), and THF (phentydrone).

Abstract: A method and abrasive blast medium for cleaning contaminants from electronic hardware. The abrasive blast medium is a pure, water soluble alkaline salt of bicarbonates and carbonates. The particle size of the alkaline salts range from about 20 to no larger than about 300 microns in diameter. The Mohs hardness of the alkaline salt particles is no greater than about 5.0. The blast cleaning conditions employed to clean the electronic hardware are mild. Blast air pressures range from about 10 to about 50 psi and the medium flow rate ranges from about 1 to about 10 lbs/min.

Abstract: A substrate cleaning assembly (10) and method for removing contaminant substances (11) from a surface (12) of a substrate (13) employed in microelectronics manufacturing. The cleaning assembly (10) includes a substance locator (15) adapted to locate and map at least one contaminant substance (11) on the surface (12) of the substrate (13) and a dispenser (16) formed and dimensioned to accurately dispense a substantially controlled, impinging stream (17) of cleaning agent along a path (18). A controller (20) is coupled to the map device (15) and the dispenser (16), and is adapted to control the impinging stream (17) such that the located contaminant substance (11) is positioned in the path (18) of the impinging stream (17) to enable substantially localized impingement and removal of the substance (11) from the substrate surface (12).

Abstract: A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.

Abstract: A method of removing wall paper which includes the steps of dipping an absorbent fabric into water or a solution of aqueous wall paper remover. Allowing excess solution to drain from the fabric and then placing the fabric in direct contact with the wall paper. The fabric adheres to the wall merely through water cohesion. The fabric is allowed to remain on the wall paper for a period of time to allow the solution to soak into the paper. Once this occurs, the fabric is removed and the paper can be scraped off the wall.

Abstract: The present invention provides a method of removing contaminants from industrial process fabrics relying upon cryogenic techniques, wherein the fabric is impacted with solid particles of carbon dioxide. A cryoblaster projects the carbon dioxide particles at the fabric. The cryoblaster scans over the entirety of the fabric at a scanning rate particle velocity, and particle flow rate in order to insure that the fabric is cleaned without suffering any damage.

Abstract: Method and apparatus for controlling the exit velocity of solid/gas carbon dioxide spray cleaning systems. By increasing the pressure of liquid carbon dioxide in the supply line, typically in the range of 800-875 psi, to greater than 875 psi, preferably 2,000-5,000 psi and above, the velocity of the spray stream exiting the nozzle is increased enabling removal of contamination (oils, fingerprints, particles, graffiti, etc.) not removable with a spray stream using conventional carbon dioxide pressures. The apparatus includes the incorporation of a high-pressure pump in the liquid carbon dioxide supply line in combination with a nozzle having a first or inlet orifice smaller in diameter than the supply line and a second or exit orifice larger in diameter than the inlet orifice.

Abstract: A process for the decontamination of radioactive materials which process comprises the steps of: i) contacting the material to be decontaminated with a dilute carbonate containing solution in the presence of ion exchange particles which either contains or have a chelating function bond to them; and ii) separating the ion exchange particles from the dilute carbonate containing solution. The radioactive materials which are treated may be natural materials, such as soil, or man-made materials such as concrete or steel, which have been subjected to contamination.

Abstract: A dispenser for powdered, granular, pellet, briquette or tablet-like material is provided. The dispenser includes a dispenser head through which the material dissolved in water can be dispensed. A spray device is provided at the head to spray water onto the material provided in the dispenser head. A suspension device is provided to suspend a bag containing the material above the dispenser head. The bag in its suspended orientation has a fastener along the bottom end which closes the bottom end of the bag. The fastener is not, however, releasable until after the bag is mounted in the dispenser. Then the fastener is releasable to allow the contents thereof to fall by gravity onto the dispenser head. The dispenser provides a system, which normally avoids contact of the toxic contents of the bag with the user. At the same time, the only waste is in the form of a bag which may be made of recyclable plastic, hence minimizing waste associated with the system.

Abstract: A semiconductor cleaning method includes scrubbing a semiconductor wafer using a cleaning member made primarily of polyurethane and having micropores in a surface contacting the semiconductor wafer. The micropores have an average diameter ranging from 10 to 200 .mu.m. The cleaning member may be made of either polyurethane foam or non-woven fabric composed of fibers bound together by urethane resin. By this scrubbing step, particles that are strongly attached to the surface of a substrate such as the semiconductor wafer can easily be removed. During cleaning of the substrate, surface irregularities and crystalline protrusions on the surface of a substrate such as a semiconductor wafer can be scraped off to adjust the surface roughness of the semiconductor wafer to a desired degree for making the semiconductor wafer surface flat.

Abstract: Method and composition for selectively removing liquid hydrocarbon from floors and other hard surfaces comprising granular polyisocyanurate foam. The composition desirably includes a particulate material having a bulk density greater than the polyisocyanurate foam for increasing the overall bulk density of the composition and imparting slip resistance to the floor or hard surface. Suitable particulate material includes angular sand and comminuted cellular glass. The granular polyisocyanurate foam and particulate material can be supplied from scrap material to reduce cost and landfill waste.

Abstract: Method and composition for selectively removing liquid hydrocarbon from floors and other hard surfaces comprising granular polyisocyanurate foam. The composition desirably includes a particulate material having a bulk density greater than the polyisocyanurate foam for increasing the overall bulk density of the composition and imparting slip resistance to the floor or hard surface. Suitable particulate material includes angular sand and comminuted cellular glass. The granular polyisocyanurate foam and particulate material can be supplied from scrap material to reduce cost and landfill waste.

Abstract: An apparatus and method that enhances removal of contaminating particles from surfaces of a static-sensitive components that are cleaned using a carbon dioxide cleaning spray produced by a jet spray gun. The apparatus has a programmable power supply that is connected to ground, to the static-sensitive component, and to the jet spray gun. The static-sensitive component is cleaned using the cleaning spray and the surface charge generated on the surface of the component or substrate is simultaneously monitored to determine the amount and polarity of the charge that is generated thereon. The programmable power supply then applies a reverse bias to the jet spray gun that is equal to and has the opposite polarity of the charge that is generated on the surface of the static-sensitive component or substrate, which neutralizes the charge generated on the surface of the component.

Abstract: The present invention involves a method of removing paint containing heavy metal from a surface without the production of hazardous wastes. Specifically, this method involves applying a coating preparation to the heavy metal containing paint prior to its removal from its surface. The preparation contains lead reactive chemicals such as phosphates, metal sulfides and organic sulfides. The preparation may also contain buffers such as magnesium oxide and magnesium hydroxide. These chemicals react with the heavy metals rendering them nonhazardous. The invention also involves the coating preparation itself.

Abstract: Many medical implants have roughened surfaces that promote cell, bone or tissue adhesion as well as the adhesion of bone cement, for better affixing of the implants in the body. The roughened surfaces should be free of particulates, such as commonly arise from the blasting of implant surfaces with particulates to produce a desired surface finish. A method of producing implants with implant surfaces free of such particulates is to blast the implant surface with a biocompatible liquid, such as water, under high pressure. Under certain circumstances, a solvent may contain particulates that assist in producing the roughened surface, and the particulates are dissolved, sublimated or vaporized from the implant surface, leaving no particulate residue.

Abstract: A cleaning kit for use in cleaning surfaces in clean rooms, semiconductor fabrication plants, pharmaceutical manufacturing facilities, etc. A stack of extremely clean wipers is packaged together with a container of cleaning fluid in a liquid-tight outer container. The outer container is vacuum-sealed. The kit is stored until just before it is to be used. Fluid is released from the inner container into the wipers, preferably by means of a puncturing device operable to puncture one of the walls of the inner container by the application of pressure in a limited area on the outside of the outer container. The cleaning liquid is allowed to soak into the wipers, and the wipers are removed from the outer container for use. The container can be resealed to protect the wipers after the package has been opened. The puncturing device is located away from the edges of the package to minimize the chances of accidental puncture.

Abstract: An aerosol cleaning apparatus and a method of treating a substrate within such an apparatus prevent contaminant recirculation by controlling the post-impingement exhaust flow through control of the aerodynamic behavior of the contaminant laden exhaust stream. By the present invention, the post-impingement exhaust flow is divided into two streams. A first stream is the main stream flowing initially over the contaminated side of the wafer and carrying most of the suspended contaminants into the exhaust. The second stream flows initially over the cleaned side of the wafer and eventually into the exhaust stream. A flow separator is provided for dividing the post-impingement aerosol spray into plural flow streams.

Abstract: A Method and Apparatus for Chemical Delivery Through the Brush used in semiconductor substrate cleaning processes. The chemical solutions are delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate, reduces the volumes of chemical solutions used in a scrubbing process, and helps maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a scrubber that scrubs both sides of a semiconductor substrate.

Abstract: An improved method for decontamination of lead contaminated surface coatings utilizing calcium phosphate minerals. The method for decontamination of lead contaminated surface coatings uses solid calcium phosphate material added to the abrasive blasting media prior to the structure being abrasive blasted. After removal of the lead contaminated surface coating by abrasive blasting with the calcium phosphate--abrasive blasting media mixture, the blown down surface coating and calcium phosphate--abrasive blasting media mixture are left in-situ to allow a chemical reaction to occur which renders the lead immobile and biologically nonhazardous. The calcium phosphate can be in one of several forms which are readily available and inexpensive.

Abstract: An improved method for scrubbing a substrate, the method including the step of scrubbing one face of the substrate with a cylindrical rotary brush while applying back pressure to the substrate by jetting a fluid for generating back pressure against the other face of the substrate.

Abstract: A film layer not susceptible to aerosol cleaning is removed from a surface by converting the film layer into a film susceptible to aerosol cleaning, and aerosol jet cleaning the converted film and any contaminants. The aerosol jet can be moved in relation to the surface to provide thorough cleaning.

Abstract: A system is provided for removing material from a structure having at least one layer of the material formed on a substrate. The system includes a radiant energy source, such as a flashlamp, with an actively cooled reflector for irradiating a target area of a structure with radiant energy, preferably sufficiently intense in at least the visible and ultraviolet, to break or weaken chemical bonds in the material, and an abrasive blaster for impinging the material after irradiation with a cool particle stream, preferably including of CO.sub.2 particles, to remove the irradiated material and cool the substrate. The system may also include light sensors used in a feedback loop to control the removal process by varying the speed at which the radiant energy source is moved along the structure, the repetition rate of the source, the intensity of the source, the pulse width of the source and/or the distance between the source and the structure.

Abstract: Solution and process for cleaning and conditioning marble and similar substances whereby a first mixture formed from zinc sulfate solution, an abrasive, and a thickener is used to mechanically and chemically clean and prepare the marble for the reception of a second aqueous solution formed of fluorosilicates of the group consisting of the alkaline earth metals and zinc, and a monocarboxylic aliphatic organic acid, such as acetic, and a third mixture formed by the addition of fumed silica and an organic filler such as acrylic or shellac to the second aqueous solution. The first mixture is applied with buffing means, completely flushed with water, and removed. The second solution is applied and partially removed with buffing means, and the third solution is applied and partially removed in the same manner. As a result of these steps, the surface of the treated substance is given a brilliant glass-like finish with increased surface traction.

Abstract: In the measurement of internal transmittance of optical pieces, a standard is set for the piece for measuring the transmittance and a method of making the piece is provided. In the piece for measuring the transmittance of optical materials having two opposing polished surfaces, their surface roughness rms is set to 10 .ANG. or less, thereby making it possible to accurately measure the internal transmittance in the short wavelength region of 300 nm or less where the intensity of the light source of spectrophotometer begins to decrease.

Abstract: An organic insulating film is polished utilizing a polishing agent containing cerium oxide particles (a ceria slurry). The ceria slurry is composed of cerium oxide powder containing a total concentration of Na, Ca, Fe, and Cr of less than 10 ppm. Fragile inorganic and organic insulating films formed at relatively low temperatures can be polished without degrading characteristics of a semiconductor element having such films thereon, due to, e.g., Na diffusion.

Abstract: A method of cleaning an integrated circuit chip module prior to attaching wire bonds thereto. The method involves disposing a module containing an integrated circuit chip and IC bond pads without wire bonds in an environmental process enclosure. A carbon dioxide jet spray cleaning system having a spray nozzle and orifice assembly is disposed the environmental process enclosure. A jet spray of carbon dioxide is generated using the jet spray cleaning system. The carbon dioxide jet spray is directed onto the surface of the module such that the spray impacts the IC bond pads and module bond pads to clean unwanted adhesive from the surface of the module and thus clean the IC and module bond pads.

Abstract: Apparatus and method are described for polishing a ductile metal surface, such as the gold surface of a mirror, by impacting the surface with a stream of microscopic particles of carbon dioxide from a jet spray nozzle at a velocity and duration sufficient to polish the surface.

Abstract: The invention provides methods for wiping metal contaminants from a surface, especially a circuit board assembly, or other surface exposed to solder paste, and solubilizing the wiping material. Metal contaminants are then easily and safely removed from the solubilized material for safe recycling and/or disposal.

Abstract: In a process for cleaning a glass window of a motor vehicle with a wiper apparatus having a wiper, including applying a washer fluid including a cleaning agent and water to the glass window from a container located in the motor vehicle, and moving the wiper over the glass window with the wiper apparatus to at least partially clean the glass window with the washer fluid, the improvement includes spraying or blowing a polishing composition containing a metal oxide powder on the glass window, advantageously from a container located in the motor vehicle, and cleaning the glass window with the polishing composition containing the metal oxide powder by action of the wiper together with the polishing composition, so that, when present on the glass window, a hydrophobic dirt layer formed on the glass window is removed. The metal oxide powder advantageously has a particle size from 10 nm to 1 micrometer and is cerium oxide.

Abstract: A method for CMP of, illustratively, tungsten is disclosed. Hydroxylamine or hydroxylamine sulfate are employed to oxidize the metal, while gamma (.gamma.) alumina is employed to abrade the oxidized metal.

Abstract: The invention pertains to a cleaning mixture for use in cleaning concrete pads. The mixture consists of two components and each of the two components has two ingredients. The first ingredient of the first component consists of an OIL-DRI -type all purpose absorbent clay material while the second ingredient is a cat litter or an addapolgite-type clay. Both of the ingredients of the first component are of a granular material. The second component also has two ingredients, the first is a Kaolin-type clay and the second ingredient is a finely ground clay dust. The first component, when applied to the surface of a contaminated concrete, will loosen and break up the hardened oil or grease deposit while the ingredients of the second component, when applied to the concrete surface after the the residue of the first component has been removed will absorb the oil from the pores and crevices of the concrete and apply a whitening effect to the concrete and also will seal the pores and the crevices of the concrete.

Abstract: A process for removing scale from stainless steel using an aqueous solution containing hydrogen peroxide. A hot rolled or annealed stainless steel strip (10) covered with scale is immersed into hot sulfuric acid contained within tanks (12) and (14). Thereafter, the strip may have residual amounts of tightly adherent scale (11). This scale is activated by the aqueous solution containing hydrogen peroxide applied to the strip such as by a spray header (16) extending completely transversely across and positioned above the strip and another spray header (18) extending completely transversely across and positioned below the strip. Any peroxide spray dripping from the, strip is collected on a catch pan (30) and flowed into a tank (28). Preferably, the peroxide solution is a dilute concentration of the acid in tanks (12) and (14). The hydrochloric acid removes smut from the strip formed by the sulfuric acid to improve the cleanliness of the pickled strip.

Abstract: A cryogenic aerosol separator/classifier for separating and selectively removing particles from a stream of aerosol. The aerosol stream is produced by a cryogenic aerosol generator comprising a reservoir containing a cryogenic gas-liquid mixture at a first pressure, a delivery line coupled to the reservoir, and a nozzle. The nozzle has at least one exit opening which allows the cryogenic gas-liquid mixture to expand from the first pressure to a lower pressure and, thus, to produce cryogenic aerosol. A separator is coupled to the nozzle, such that the light particles having high mobility are removed from the stream, thereby producing a stream of cryogenic flow with particles having a controlled size to clean a contaminated surface. The apparatus is enhanced by utilizing a magnetic field and/or specially designed flow fields to fully take advantage of the enhanced mobilities of light particles.

Abstract: Methods of detoxifying chemical warfare agents and decontaminating surfaces which have been exposed to chemical warfare agents are disclosed. The methods include contacting a composition confining a chemical warfare agent or contaminated surface with a sufficient amount of a sorbent which contains an activated aluminum oxide for a sufficient time and under conditions which are sufficient to produce a reaction product which is less toxic than the chemical warfare agent and/or to reduce the contamination of the surface by the chemical warfare agent.

Abstract: A method for removing deposited material from vacuum deposition equipment is disclosed. The method utilizes a low temperature bath, between 40-50 degrees F., to strip sputter depositions, followed by an acid etch step using a low concentration of hydrofluoride acid to remove trace contamination from the surface. Following removal of deposited material, surface texturing of the components is provided.

Abstract: An object (12) may be cleaned by CO.sub.2 reduced ESD by directing a first water mist (23) at a surface (14) of the object while imparting a relative motion between the object board and the mist to form a film of water on the object surface. As the relative motion is imparted between the board and the first mist (23), a second water mist (32) is injected into a stream (30) of solid CO.sub.2 particles (27) directed at the object surface downstream of the first mist. Water droplets in the second mist in the second mist combine with the CO.sub.2 particles to create carbonic acid that disassociates into charged ions that increase the conductivity of the water film, allowing for increased charge dissipation, thus reducing the incidence of ESD.