Abstract: Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I), wherein R1 and R2 are alkyl groups of 3-8 carbons and the total number of carbons of R1 and R2 is greater than 6; and 2) a second organic solvent that is a C4 to C10 monovalent alcohol.

Abstract: A park brake systems and methods are disclosed. According to various embodiments, park brake systems comprising a tapered motor shaft having a first diameter and a second diameter, the second diameter being greater than the first diameter, a voice coil disposed at least partially around a circumference of a bobbin, a first one-way clutch housed at least partially within the bobbin, the first one-way clutch disposed coaxial to the tapered motor shaft, and an annular magnet disposed coaxial to the tapered motor shaft and proximal to the first one-way clutch, wherein, in response to a first voltage applied to the voice coil, the first one-way clutch translates axially in a first direction with respect to the tapered motor shaft and engages with the second diameter are disclosed.

Abstract: A clutch adjuster to be used in a manually adjustable clutch is provided for compensating the effect of clutch wear. The clutch adjuster has a substantially flat top plate adapted to be secured to the clutch housing, a fastener, a rotary gear, a locking member and a resilient member. The fastener has a head and a shaft and being captured by an aperture in the substantially flat top plate. The rotary gear is connected to the shaft of the fastener. The locking member is configured below the substantially flat top plate and has at least one protrusion passing upward through the aperture of the substantially flat top plate and projecting therefrom. The protrusion is configured to be in a selective locking engagement with the head of the fastener. The resilient member is configured between the locking member and the rotary gear for resiliently biasing the locking member towards the substantially flat top plate.

Abstract: An adjustment mechanism for rotating an adjusting ring on a clutch is disclosed. The adjustment mechanism includes a support bracket having an opening therein and a a rotation assembly rotatable about an axis relative to the support bracket. The rotation assembly includes a detent mechanism that is configured to cause both rotational and axial movement of the rotation assembly relative to the support bracket when only a rotational force is applied to the rotation assembly.