Wear Or Abrasion Resistant Patents (Class 204/192.16)
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Patent number: 6585864Abstract: A method for protecting high temperature stainless steel from coking and corrosion at elevated temperatures in corrosive environments, such as during ethylene production, by coating the stainless steel with an overlay coating of MCrAlX in which M is nickel, cobalt, iron or a mixture thereof and X is yttrium, hafnium, zirconium, lanthanum or combination thereof. The overlay coating and stainless steel substrate are heat-treated to metallurgically bond the overlay coating to the substrate and to form a multiphased microstructure. The overlay coating preferably is aluminized by depositing a layer of aluminum thereon and subjecting the resulting coating to oxidation to form an alumina surface layer. An intermediary aluminum-containing diffusion coating may be deposited directly onto the stainless steel substrate prior to deposition of the overlay coating to form a protective interlayer between the stainless steel substrate and overlay coating.Type: GrantFiled: June 8, 2000Date of Patent: July 1, 2003Assignee: Surface Engineered Products CorporationInventors: Gary Anthony Fisher, Robert Prescott, Yan Chen, Hang Zheng, Chinnia Subramanian, Andrew George Wysiekierski
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Patent number: 6579423Abstract: A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n+1 (n≧1) layers in which at least two dielectric layers and at least one silver layer are alternately laminated, with each other with the dielectric layer being the first to be provided on the transparent substrate, wherein at least one of the dielectric layers is an antistatic metal oxide layer having a refractive index of 1.6 to 2.7 at a wavelength of 550 nm, which is preferably formed by sputtering using a metal oxide, e.g., tin-containing indium oxide, as a target in an atmosphere having a reduced oxygen content. The electromagnetic wave filter has a high visible light transmission and a low near infrared transmission, is free from pin holes or contamination, and exhibits high durability against moist heat, etc.Type: GrantFiled: December 11, 2001Date of Patent: June 17, 2003Assignee: Nippon Sheet Glass Co., Ltd.Inventors: Toshiaki Anzaki, Etsuo Ogino
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Patent number: 6576095Abstract: A magneto-optical disc includes protective overcoats that significantly improve the durability of the disc. In particular, the protective overcoat involves a carbon layer over the magnetic, optical data storage layer. The magnetic, optical data storage layer includes a magnetic metal or alloy with a Curie temperature accessible by optical heating. In preferred embodiments, the carbon coating has a small absorption coefficient for selected optical frequencies.Type: GrantFiled: October 12, 2001Date of Patent: June 10, 2003Assignee: Seagate Technology LLCInventor: Ga-Lane Chen
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Patent number: 6572933Abstract: Process for forming adherent coatings using plasma processing. Plasma Immersion Ion Processing (PIIP) is a process where energetic (hundreds of eV to many tens of keV) metallic and metalloid ions derived from high-vapor-pressure organometallic compounds in a plasma environment are employed to deposit coatings on suitable substrates, which coatings are subsequently relieved of stress using inert ion bombardment, also in a plasma environment, producing thereby strongly adherent coatings having chosen composition, thickness and density. Four processes are utilized: sputter-cleaning, ion implantation, material deposition, and coating stress relief. Targets are placed directly in a plasma and pulse biased to generate a non-line-of-sight deposition without the need for complex fixturing. If the bias is a relatively high negative potential (20 kV-100 kV) ion implantation will result.Type: GrantFiled: September 24, 1998Date of Patent: June 3, 2003Assignee: The Regents of the University of CaliforniaInventors: Michael A. Nastasi, Kevin C. Walter, Donald J. Rej
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Patent number: 6569293Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.Type: GrantFiled: June 9, 1997Date of Patent: May 27, 2003Assignee: The Regents of the University of CaliforniaInventors: Daniel M. Makowiecki, Alan F. Jankowski
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Patent number: 6569294Abstract: Selective deposition of a layer of a material, such as a thick protective overcoat, onto a selected substrate area, such as the inner or CSS landing zone, is achieved using a sputtering target assembly comprising a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield positioned proximate the sputtering surface and surrounding at least a portion of the erosion track area, the collimating shield including an inwardly facing wall, and a blocking shield centrally positioned over the surface of the target/cathode and including an outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall of the central blocking shield form an open-ended collimating channel for directing sputtered particles onto the selected substrate area.Type: GrantFiled: June 20, 2001Date of Patent: May 27, 2003Assignee: Seagate Technology LLCInventors: Alexander Boris Khazanov, Shanghsien Rou, Jie-Ming Yu, Paul Stephen McLeod, Mark Anthony Shows, Kuo-Hsing Hwang, Chung-Yuang Shih
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Patent number: 6565913Abstract: An adherent antimicrobial coating and method of making same comprising hydrogenated amorphous carbon and a dispersion of antimicrobial metal ions adapted to maintain a therapeutically effective zone of inhibition.Type: GrantFiled: July 24, 2001Date of Patent: May 20, 2003Assignee: Southwest Research InstituteInventors: James Arps, Geoffrey Dearnaley
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Patent number: 6565719Abstract: A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second protective carbon layer is very thin, e.g. between 0.1 and 1.0 nm thick. A lubricant layer (e.g. a perfluoropolyether lubricant) is applied to the second protective carbon layer. The second protective carbon layer facilitates improved cooperation between lubricant and the disk.Type: GrantFiled: June 27, 2000Date of Patent: May 20, 2003Assignee: Komag, Inc.Inventors: Bruce Lairson, Ching Jackie Tsoi, Wen Liu, Shigeto Hashimoto, Eric Woo Hock Yong, Tsutomu Tom Yamashita
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Patent number: 6565718Abstract: A magnetic recording medium is formed with dual carbon-containing protective layers having a combined thickness of less than about 100 Å with high corrosion resistance and superior magnetic performance. Embodiments of the present invention include sputter depositing a first protective layer of hydrogenated carbon at a density of at least 1.9 while applying a DC bias of about 250V to about 400V to the substrate, and sputter depositing a second protective layer comprising nitrogen-doped hydrogenated carbon on the first protective layer.Type: GrantFiled: September 6, 2001Date of Patent: May 20, 2003Assignee: Seagate Technology LLCInventors: Kueir-Weei Chour, Liji Huang, Jie-Ming Yu, Kuo-Hsing Hwang, Chung Shih
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Patent number: 6554971Abstract: The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0<x≦1, deposited by Physical Vapor Deposition.Type: GrantFiled: November 13, 2001Date of Patent: April 29, 2003Assignee: Sandvik ABInventors: Olaf Zywitzki, Klaus Goedicke, Fred Fietzke, Siegfried Schiller, Torbjörn Selinder, Mats Ahlgren
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Publication number: 20030057087Abstract: The invention relates to a device for coating an object at a high temperature by means of cathode sputtering, having a vacuum chamber and a sputter source, the sputter source having a sputtering cathode. Inside the vacuum chamber is arranged an inner chamber formed from a heat-resistant material, which completely surrounds the sputtering cathode and the object to be coated, at a small spacing, and which has at least one opening to let a gas in and at least one opening to let a gas out.Type: ApplicationFiled: July 16, 2002Publication date: March 27, 2003Inventor: Thomas Jung
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Patent number: 6537379Abstract: A photocatalytic coating based on titanium dioxide, and certain titanates is applied to the critical external optical spacecraft surfaces to be protected from contamination with polymerized hydrocarbon films. The thickness of the coating is within the range of 5 Angstrom to 2×104 Angstrom and it can be applied using a variety of methods, such as sputtering, electron beam evaporation, or sol-gel processing. A method for cleaning the spacecraft surfaces initiated by a reaction of the coating with a UV-photon, followed by oxidation of the hydrocarbons adsorbed on the protected surfaces thus preventing their polymerization on the surfaces and causing their safe evaporation and dissipation into the environment. At orbital altitudes a stream of H2O2 or oxygen is directed at the surface, possibly continuously, and preferably, periodically, regenerating the original form of titanium in the photocatalytic coating and re-starting the cleaning cycle.Type: GrantFiled: January 13, 2000Date of Patent: March 25, 2003Assignee: HRL Laboratories, LLCInventors: John J. Vajo, Weldon S. Williamson
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Patent number: 6537428Abstract: A method and apparatus for monitoring and controlling reactive sputter deposition, particularly useful for depositing insulating compounds (e.g., metal-oxides, metal-nitrides, etc.). For a given nominal cathode power level, target material, and source gases, the power supplied to the cathode (target) is controlled to stabilize the cathode (target) voltage at a specified value or within a specified range corresponding to a partial pressure or relative flow rate value or range of the reactive gas. Such an operating point or range, characterized by a specified voltage value or range and corresponding reactive gas relative-flow/partial-pressure value or range, may be determined empirically based on measuring the cathode voltage as a function of reactive gas relative-flow/partial-pressure for the given nominal power.Type: GrantFiled: September 2, 1999Date of Patent: March 25, 2003Assignee: Veeco Instruments, Inc.Inventors: Wei Xiong, Subhadra Gupta
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Publication number: 20030042132Abstract: A thin film of a metal compound such as metal oxide, nitride and carbide is formed on a substrate by sputtering a target in vacuum in the presence of an inert gas and a reactive gas. From a curve of an input power supplied from a DC supply to the target versus an input voltage between the target and the substrate, a transition point of input power at which an abrupt change of the input voltage occurs is determined. The input power during sputtering is controlled using the transition point as a reference, thereby controlling the composition or physical properties of the thin film. When a cobalt oxide thin film is formed on a substrate in this way, rubber can be vulcanized thereto to form a firm bond.Type: ApplicationFiled: August 7, 2002Publication date: March 6, 2003Applicant: BRIDGESTONE CORPORATIONInventors: Masato Yoshikawa, Engkean Sim, Hideo Sugiyama, Yukihiro Kusano, Kazuo Naito
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Patent number: 6524381Abstract: Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition processes are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.Type: GrantFiled: March 31, 2000Date of Patent: February 25, 2003Assignee: Flex Products, Inc.Inventors: Roger W. Phillips, Vladimir Raksha
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Publication number: 20030035044Abstract: A method of producing a wear-resistant protective film for a thermal head comprises depositing a wear-resistant protective film by sputtering on a thermal head which includes a substrate, and a heat-developing layer and a pair of electrodes formed on either the substrate or a heat-regenerative layer formed thereon. A layer of the wear resistant protective film is formed under a RF larger bias and another layer without a bias or with a smaller bias. Good step coverage is obtained by the RF sputter layer of the wear-resistant and the protective film prevents the intrusion of water that can cause cracking, and the layer formed under no or smaller bias reduces internal stresses and inhibits the development of cracks due to internal stresses as well as the cracking by RF sputtering.Type: ApplicationFiled: September 30, 2002Publication date: February 20, 2003Applicant: TDK CorporationInventors: Masatoshi Nakayama, Masahiro Nakano, Tsukimi Endo
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Publication number: 20030019973Abstract: Thread guiding element for the guidance of threads, in which a surface of the body (3) of the thread guiding element is provided, at least in the region in which the thread (8) is guided, with a surface coating (5) which has a structure which is formed as a matrix for the reception of a lubricant and/or of a sliding agent.Type: ApplicationFiled: July 19, 2002Publication date: January 30, 2003Applicant: Sulzer Markets and Technology AGInventor: Jorg Krumeich
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Patent number: 6511584Abstract: A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the first power value while in the oxide mode at a second power value.Type: GrantFiled: March 7, 1997Date of Patent: January 28, 2003Assignee: Unaxis Deutschland Holding GmbHInventors: Joachim Szczyrbowski, Götz Teschner, Anton Zmelty, Jürgen Bruch, Dietmar Marquardt
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Publication number: 20030008168Abstract: A film is formed on the surface of a soft metal portion (2) such that the film contains phosphorus and either platinum or palladium, and further, at least one element having homogeneous solubility with platinum or palladium, with the content of the phosphorus being in a range of about 15 to 25 atomic %, or contains boron and iron with the content of the boron being in a range of from about 15 to 25 atomic %. Thus, a soft metal is made up by turning the film into a hard layer (3) made of an amorphous alloy.Type: ApplicationFiled: April 19, 2002Publication date: January 9, 2003Inventors: Yoshitsugu Shibuya, Eigou Hashimoto, Junji Satoh, Masahiro Satoh, Seiichi Hiroe
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Patent number: 6500484Abstract: A thin-film magnetic recording disc for use with a read/write head in a disc drive includes a substrate, a magnetic recording film disposed over the substrate, and a protective overcoat on the recording film. The recording disc has an outer layer that includes a solid fluorocarbon and a perfluoropolyether (PFPE) oil. The disc can be used as a data storage media for a digital computer and, in particular, with a read/write head in a disc drive. The addition of the fluorocarbon layer can improve the tribology of the disc, thereby reducing wear and improving the long-term performance of the magnetic disc.Type: GrantFiled: March 23, 2001Date of Patent: December 31, 2002Assignee: Seagate Technology, Inc.Inventors: Youmin Liu, Vidyadhara K. Gubbi, Chung Y. Shih
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Publication number: 20020189932Abstract: The present invention provides a method of depositing a film on a surface of a coil that includes depositing a metal from a target onto a surface of a coil to form a first film on the surface and forming a second film over the first film at a low pressure and at a first power at the target that is substantially higher than a first power at the component's surface. The conditioned deposition tool is well suited for manufacturing integrated circuits.Type: ApplicationFiled: April 16, 2001Publication date: December 19, 2002Inventors: Siddhartha Bhowmik, Sailesh M. Merchant, Frank Minardi
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Patent number: 6491798Abstract: A magnetic recording medium includes at least a substrate, a recording layer formed of a non-magnetic underlying layer and a ferromagnetic thin film, deposited on the substrate, a sputtered carbon protective layer and a lubricant layer overlying the recording layer. The sputtered carbon protective layer is laminate layer formed by sputtering alternating first and second carbon layers, wherein a Young's modulus in a head pressing direction is twice or more larger than a Young's modulus in a head running direction. In this way, the durability of the magnetic disk can be significantly improved, and consequently, the protective layer can be made extremely thin, so that it can also contribute to an increased recording density.Type: GrantFiled: October 19, 2001Date of Patent: December 10, 2002Assignee: Hitachi, Ltd.Inventors: Yuuichi Kokaku, Yoshinori Honda, Toshinori Ono
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Publication number: 20020175070Abstract: A target 3, which is composed of a compound material containing a gaseous component element, is subjected to cathode discharge with a cathode 30 while closing a main valve 4 and a gas-introducing valve 9 to tightly close a vacuum chamber 1. The vacuum chamber 1 is not subjected to reduction of pressure with a vacuum pump 5 by opening the main valve 4. Therefore, the gaseous component element, which is contained in the compound material, is not discharged by the vacuum pump 5. Accordingly, almost all of the gaseous component element contained in the compound material is successfully allowed to adhere and deposit onto a substrate 2. Therefore, a thin film, which has a composition extremely close to that of the compound material, is formed on the substrate 2. According to the film formation method as described above, a compound film, which is used as a coating material for an optical element, can be formed in a desired composition on the optical element.Type: ApplicationFiled: July 25, 2002Publication date: November 28, 2002Applicant: Nikon CorporationInventor: Masahiro Furuta
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Patent number: 6485791Abstract: Improved adhesion of thermal barrier coatings to nonmetallic substrates using a dense layer of ceramic on an underlying nonmetallic substrate that includes at least one oxidizable component. The improved adhesion occurs because the application of the dense ceramic layer forms a diffusion barrier for oxygen. This diffusion barrier prevents the oxidizable component of the substrate from decomposing. The present invention applies ceramic by a process that deposits a relatively thick and dense ceramic layer on the underlying substrate. The formation of the dense layer of ceramic avoids the problem of void formation associated with ceramic formation by most prior art thermal decomposition processes. The formation of voids has been associated with premature spalling of thermal barrier layers and other protective layers applied to substrates.Type: GrantFiled: April 6, 2000Date of Patent: November 26, 2002Inventor: Bangalore A. Nagaraj
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Patent number: 6471832Abstract: A method of producing a wear-resistant protective film for a thermal head comprises depositing a wear-resistant protective film by sputtering on a thermal head which includes a substrate, and a heat-developing layer and a pair of electrodes formed on either the substrate or a heat-regenerative layer formed thereon. A layer of the wear resistant protective film is formed under a RF larger bias and another layer without a bias or with a smaller bias. Good step coverage is obtained by the RF sputter layer of the wear-resistant and the protective film prevents the intrusion of water that can cause cracking, and the layer formed under no or smaller bias reduces internal stresses and inhibits the development of cracks due to internal stresses as well as the cracking by RF sputtering.Type: GrantFiled: May 2, 1996Date of Patent: October 29, 2002Assignee: TDK CorporationInventors: Masatoshi Nakayama, Masahiro Nakano, Tsukimi Endo
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Patent number: 6468679Abstract: This invention is related to a metal-based gradient composite material having good lubrication and wear-resistance properties. The composite material comprises a metal (M) matrix and a gradient composite layer of metal sulfide (M[S]) and metal oxide,(M[O]) on the surface of said metal matrix. In the gradient composite layer,, the sum (Ds+Do) of the concentration of metal sulfide (Ds) and the concentration of metal oxide (Do) decreases gradually from the surface to the interior, and the concentration of metal (DM) increases from the surface to the interior. The invention is also related to a process for producing the gradient composite material and the use of the same.Type: GrantFiled: June 20, 2000Date of Patent: October 22, 2002Inventors: Xinhui Zhang, Yifei Zhang
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Patent number: 6468405Abstract: A sputtering target assembly for depositing onto a selected substrate area comprises a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield positioned proximate to the sputtering surface, surrounding at least a portion of the erosion track area, and including an inwardly facing wall, and a blocking shield centrally positioned over the surface of the target/cathode and including an outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall of the central blocking shield form an open-ended channel for directing sputtered particles onto the selected substrate area. A method for utilizing the target assembly for selectively depositing a thicker protective overcoat layer on the inner CSS or landing zone relative to the outer data zone of disk-shaped recording media is provided.Type: GrantFiled: July 13, 2000Date of Patent: October 22, 2002Assignee: Seagate Technology LLCInventors: Shanghsien Rou, Alexander Boris Khazanov, Jie-Ming Yu, Paul Stephen McLeod, Mark Anthony Shows, Kuo-Hsing Hwang, Chung-Yuang Shih
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Patent number: 6468401Abstract: A thin film of a metal compound such as metal oxide, nitride and carbide is formed on a substrate by sputtering a target in vacuum in the presence of an inert gas and a reactive gas. From a curve of an input power supplied from a DC supply to the target versus an input voltage between the target and the substrate, a transition point of input power at which an abrupt change of the input voltage occurs is determined. The input power during sputtering is controlled using the transition point as a reference, thereby controlling the composition or physical properties of the thin film. When a cobalt oxide thin film is formed on a substrate in this way, rubber can be vulcanized thereto to form a firm bond.Type: GrantFiled: April 19, 1996Date of Patent: October 22, 2002Assignee: Bridgestone CorporationInventors: Masato Yoshikawa, EngKean Sim, Hideo Sugiyama, Yukihiro Kusano, Kazuo Naito
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Publication number: 20020131202Abstract: A method employs an RF magnetron sputtering system under specific process conditions for making shield and pole piece ferromagnetic layers of a read write magnetic head wherein the magnetic anisotropy HK of the ferromagnetic layers is substantially maintained without easy axes switching when annealed along their hard axes in the presence of a magnetic field (hard axis annealing).Type: ApplicationFiled: March 16, 2002Publication date: September 19, 2002Inventor: John David Westwood
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Patent number: 6447652Abstract: A Raman spectrum of a thin film which must be formed is measured in a thin-film forming step for forming the thin film on a member to be processed in an atmosphere, the pressure of which has been reduced. Moreover, the conditions under which the thin film is formed are controlled in accordance with a result of measurement of the Raman spectrum. At this time, the measurement of the Raman spectrum is continuously performed in an in-line manner while the thin film is being continuously formed on the elongated-sheet-like member to be processed. The measurement of the Raman spectrum is performed while the focal point of a probe of a Raman spectrometer is being controlled with respect to the member to be processed or while the output of a laser beam from the Raman spectrometer is being controlled. The thin film which must be. formed is, for example, a protective film of a magnetic recording medium. The protective film is, for example, a hard carbon film (a DLC film).Type: GrantFiled: April 5, 2000Date of Patent: September 10, 2002Assignee: Sony CorporationInventors: Shunji Amano, Hiroshi Hayashi, Ryoichi Hiratsuka
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Patent number: 6444100Abstract: A magnetically enhanced hollow cathode sputter source for providing a sputtered particle flux containing an increased proportion of ionized target material comprises a four-sided, box-shaped chamber open at the top and defining an interior space. Each of the interiorly facing surfaces of the chamber comprises the target material and a magnet means extends continuously around the exterior surface of the four vertical sides of the chamber for providing a sputtering plasma generated within the interior space with a racetrack-shaped electron Hall drift current. An electrically biasable substrate is positioned opposite the open top for receiving sputtered particle flux for deposition thereon.Type: GrantFiled: January 30, 2001Date of Patent: September 3, 2002Assignee: Seagate Technology LLCInventor: Paul Stephen McLeod
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Patent number: 6436248Abstract: A method of coating of thin film coated magnetic disks and thin film magnetic disks made thereby is described. In accordance with the invention, a barrier layer is deposited on the substrate before the underlayer film(s) to increase the corrosion resistance of metallic substrate magnetic disks and, in the case of nonmetallic substrates, to reduce the diffusion of water to the substrate and of freely moveable ions from the substrate. Preferably the barrier layer is deposited by medium frequency pulsed sputtering at a frequency of 10 to 200 kHz and a pulse length to pulse pause ratio from 5:1 to 1:10. Aluminum or chromium are the preferred materials for the barrier layer. Additional improvements may be achieved where the sputtering process gas contains a proportion of oxygen and/or nitrogen.Type: GrantFiled: November 5, 1999Date of Patent: August 20, 2002Assignee: International Business Machines CorporationInventors: Heinz Baur, Ralf Bluethner, Hans Buchberger, Klaus Goedicke, Michael Junghaehnel, Karl-Heinz Lehnert, Manfred Mueller, Hans-Herrman Schneider, Torsten Winkler
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Patent number: 6428659Abstract: A process for coating super fine ion particles of multiple elements on the surface of a micro route substrate includes a coating step operated under low temperatures and vacuums. First, raw micro routers are cleaned by electron beams under atmospheric pressures and room temperatures, then the raw micro routers are transferred into a vacuum environment, and the temperature of the environment is increased to a range between 120° C. to 180° C. Next, the surface of the micro route is cleaned by ions, and then a coating process is started. An arc source is used to bombard cations from a target while a filtration net is used to pass small cation particles. An ion assistant device is operated to further refine the filtered particles so that only super fine ion particles are coated on the surface of the micro route substrates.Type: GrantFiled: December 28, 2000Date of Patent: August 6, 2002Assignee: Cosmos Vacuum Technology CorporationInventors: Chung-Lin Chou, Chen-Chun Hsu
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Patent number: 6398925Abstract: Methods are presented for depositing an infrared reflective, e.g., silver, containing multi-layer coating onto a substrate to form a coated article. One or more ceramic cathodes are used to deposit a protective layer over the silver layer. The use of the ceramic cathodes eliminates the need for the metal primer layers common in the prior art. Both the infrared reflective layer and a ceramic layer can be deposited in the same coating zone, this coating zone containing sufficient oxygen to provide a substantially oxidized ceramic coating layer without adversely impacting upon the properties of the infrared reflective layer.Type: GrantFiled: December 18, 1998Date of Patent: June 4, 2002Assignee: PPG Industries Ohio, Inc.Inventors: Mehran Arbab, James J. Finley
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Publication number: 20020063053Abstract: Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is separated by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.Type: ApplicationFiled: September 26, 2001Publication date: May 30, 2002Applicant: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.Inventors: Torsten Winkler, Ralf Bluthner, Klaus Goedicke, Michael Junghahnel, Hans Buchberger, Manfred Muller, Arno Hebgen, Hans-Hermann Schneider
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Publication number: 20020064605Abstract: A method of coating a substrate includes the step of forming a chrome layer on the substrate by using a magnetron sputtering device, and the step of forming a chrome nitride layer on the chrome layer by using an arc type ion plating device while maintaining the temperature of the substrate between 100 and 200° C. A vane used for a vane-type compressor, which is subjected to a surface treatment according to the coating method of the present invention is also provided.Type: ApplicationFiled: May 15, 2001Publication date: May 30, 2002Inventors: Kiyoharu Hatakenaka, Naoyuki Omori
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Publication number: 20020048114Abstract: Magnetic head having a head face (5) and comprising a head structure composed of thin layers and provided with a transducing element (E11), in which different materials occurring in different areas are present in the head face. The head face is provided with a first layer (31) of a material which is more sensitive to corrosion than said materials in the head face, and the first layer is provided with a second layer (33) of a wear-resistant material which is more insensitive to corrosion than the material of the first layer. The second layer constitutes a contact face (35) for cooperation with a magnetic tape (7).Type: ApplicationFiled: November 30, 2001Publication date: April 25, 2002Applicant: U.S. Philips CorporationInventors: Franciscus W.A. Dirne, Victor Zieren, Arnold Broese Van Groenou, Leo-Franciscus M. Van Oorschot, Peter Lasinski, Mathijs De Jongh, Freddy Roozeboom
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Patent number: 6376097Abstract: Sputter-deposited TiW film interposed between a magnetic layer and a nitrogen-containing overcoat of a magnetic recording medium significantly reduces the migration of nitrogen from the overcoat to the magnetic layer, thereby improving the magnetic recording performances of the magnetic recording medium.Type: GrantFiled: August 2, 2000Date of Patent: April 23, 2002Assignee: Seagate Technology LLC.Inventors: Charles Leu, Lin Huang, Qixu David Chen, Rajiv Yadav Ranjan
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Patent number: 6365013Abstract: The invention relates to a coating process, particularly for coating a gas turbine blade (1) having cooling passageways (4) opening out onto the surface (2). During the coating operation, a fluid (6) is directed out of the cooling passageways (4) to prevent blocking of the cooling passageways (4). The invention also relates to an apparatus for implementing this coating process.Type: GrantFiled: July 10, 2000Date of Patent: April 2, 2002Assignee: Siemens AktiengesellschaftInventor: Wolfram Beele
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Patent number: 6365012Abstract: This invention relates to a magnetic recording medium having a structure in which an undercoating film, a magnetic thin film, a protective film, and an organic film are stacked on a substrate in the order named. Since the protective film contains carbon and silicon and a portion of silicon in at least an interface in contact with the organic film consists of a silicon oxide, the surface of the magnetic recording medium is not degraded even by frequent contact with a magnetic head upon driving or stopping of the magnetic recording medium. This invention also relates to a method of manufacturing the same.Type: GrantFiled: May 18, 1995Date of Patent: April 2, 2002Assignee: Nippon Sheet Glass Co., Ltd.Inventors: Toshiyuki Sato, Shinya Katayama
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Patent number: 6355146Abstract: A process and apparatus for coating small particles and fibers. The process involves agitation by vibrating or tumbling the particles or fibers to promote coating uniformly, removing adsorbed gases and static charges from the particles or fibers by an initial plasma cleaning, and coating the particles or fibers with one or more coatings, a first coating being an adhesion coating, and with subsequent coatings being deposited in-situ to prevent contamination at layer interfaces. The first coating is of an adhesion forming element (i.e. W, Zr, Re, Cr, Ti) of a 100-10,000 Å thickness and the second coating or final coating of a multiple (0.1-10 microns) being Cu or Ag, for example for brazing processes, or other desired materials that defines the new surface related properties of the particles. An essential feature of the coating process is the capability to deposit in-situ without interruption to prevent the formation of a contaminated interface that could adversely affect the coating adhesion.Type: GrantFiled: April 3, 1996Date of Patent: March 12, 2002Assignee: The Regents of the University of CaliforniaInventors: Daniel M. Makowiecki, John A. Kerns, Craig S. Alford, Mark A. McKernan
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Publication number: 20020025378Abstract: A method is disclosed for treating the surface of tools made of tool steel, wherein primary carbides are embedded in the tool steel matrix. The thickness of the primary carbides disposed near the surface can be reduced by forming a surface which has point-wise recess; alternatively, the primary carbides can be completely removed. A hard material layer is deposited on this surface. The invention also describes tools made of tool steel, wherein primary carbides are embedded in the tool steel matrix. The primary carbides are significantly recessed, and a hard material layer is deposited thereon.Type: ApplicationFiled: August 13, 2001Publication date: February 28, 2002Inventors: Klaus Keller, Fritz Koch
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Patent number: 6346294Abstract: A process for producing a coating on components having peripheries to be placed in direct contact with vaporous media. Such peripheries are wetted over part or all of their surface with a film of liquid when the vaporous media are changed from the vapor state into the liquid state by phase transition. Such films of liquid increase the thermal resistance, for example, of the components. In order to avoid such wetting, the peripheries of each component are roughened. A coat of a non-wettable, amorphous carbon is then applied to the peripheries, at least in regions thereof.Type: GrantFiled: April 28, 1999Date of Patent: February 12, 2002Assignee: ABB Patent GmbHInventors: Harald Reiss, Manfred Wetzko
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Publication number: 20020009621Abstract: A method and resultant product are disclosed wherein a metal film is deposited by sputtering a metal cathode target in an essentially nonreactive atmosphere comprising inert gas and a reactive gas, wherein the concentration of reactive gas is sufficiently low that the sputtering is accomplished in the metallic mode, i.e. the film is deposited as metal. The metal film of the present invention is harder than a metal film sputtered in an atmosphere consisting of only inert gas. The method and resultant product may further comprise thermal oxidation of the metal film, which proceeds more efficiently than oxidation of a metal film sputtered in an atmosphere consisting of only inert gas.Type: ApplicationFiled: July 28, 1995Publication date: January 24, 2002Inventors: JAMES J. FINELY, MEHRAN ARBAB
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Patent number: 6340521Abstract: A magnetic medium is formed with a barrier layer between the magnetic layer and protective overcoat to prevent degradation of magnetic properties during deposition of the protective overcoat due to poisoning effects by reactive gases on the magnetic layer. Embodiments include sputter depositing a Cr or Cr alloy barrier layer, having a thickness of about 5 Å to about 25 Å, on a magnetic layer and sputter depositing a protective overcoat containing carbon and nitrogen on the barrier layer in a nitrogen-containing environment.Type: GrantFiled: November 9, 1999Date of Patent: January 22, 2002Assignee: Seagate Technology LLCInventors: Phuong Nguyen, Thanh Ha, Elsie Yang Chuang
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Publication number: 20010048095Abstract: A process for forming a thermally stable low-dielectric constant material is provided. A gas mixture is prepared to form a fluorinated amorphous carbon (a-C:F) material. The gas mixture is mixed with a boron-containing gas.Type: ApplicationFiled: July 1, 1998Publication date: December 6, 2001Inventor: STEVEN N. TOWLE
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Patent number: 6322671Abstract: A process is described for forming integral coatings on metal and/or non-metallic substrate surfaces by the method of physical and chemical deposition in a vacuum of metal and/or non-metallic materials. The process, improved so as to obtain a coating with quasi-plasticity behavior, includes an action for depositing material onto substrate surfaces in the shape of multiple separated-in-space deposition zones of predetermined form and dimensions, and, also, an action for continuous migration of these deposition zones over the substrate surface during the whole of the coating formation process, while preserving a uniform coating thickness. In a particular embodiment, a protective high-temperature resistant NiCrAlY system coating is formed on a protected component by physical vapor deposition, which deposition is done through a screen having a series of narrow and long slots.Type: GrantFiled: January 4, 2000Date of Patent: November 27, 2001Assignee: Ionica, LLCInventor: Askar Dzhamilevich Mingazhev
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Patent number: 6315873Abstract: A method for depositing films of a fluorinated compound is disclosed, wherein a reactive sputtering process allows the use of a metal or other non-fluorinated material as the target material. The process developed also utilizes XeF2 as a vapor source, which provides fluorine for the formation of the fluorinated compound. Unlike reactive process gases, such as SF4 and CF4, used in previous experiments attempting reactive sputtering of fluoride compounds, the XeF2 vapor does not result in unwanted contamination due to a reactive gas cation, i.e., inclusions of carbon or sulfur. These, and other considerations, have allowed the development of a process for fabricating dense, optical quality fluoride films. At the same time, the material costs and handling expenses related to the XeF2 source are also relatively low.Type: GrantFiled: May 26, 2000Date of Patent: November 13, 2001Inventors: Gregory Kent Lowe, Donald Bennett Hilliard
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Patent number: 6314764Abstract: A method of manufacturing a 1-inch diameter glass substrate for a magnetic disc in which a plate glass is press molded using a mold formed of a super-hard material and having a surface of a prescribed roughness. Ion implantation using nitrogen ions is performed on the surface of the mold, after which ion implantation using palladium ions, platinum ions, and carbon ions is performed in the order given. Finally, the surface of the mold is coated with a graphite or amorphous diamond-like carbon coating.Type: GrantFiled: February 16, 2001Date of Patent: November 13, 2001Assignee: Saatec Engineering CorporationInventor: Yasuaki Sakamoto
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Patent number: 6314763Abstract: A method of manufacturing a 2-5 inch diameter glass substrate for a magnetic disc in which a plate glass is press molded using a mold formed of a super-hard material and having a surface of a prescribed roughness. Ion implantation using nitrogen ions is performed on the surface of the mold, after which ion implantation using palladium ions, platinum ions, and carbon ions is performed in the order given. Finally, the surface of the mold is coated with a graphite or amorphous diamond-like carbon coating.Type: GrantFiled: February 16, 2001Date of Patent: November 13, 2001Assignee: Saatec Engineering CorporationInventor: Yasuaki Sakamoto