Abstract: Methods for tuning a wavelength of an optical device are provided. According to the method, a core pattern may be formed on a substrate, a dielectric layer may be formed to cover the core pattern, and the dielectric layer may be thermally treated to increase a refractive index of the dielectric layer. The dielectric layer may include a silicon oxynitride layer.

Abstract: In a method of forming a main pole, an initial accommodation layer is etched by RIE using a first etching mask having a first opening, whereby a groove is formed in the initial accommodation layer. Next, a part of the initial accommodation layer including the groove is etched by RIE using a second etching mask having a second opening, so that the groove becomes an accommodation part. The main pole is then formed in the accommodation part. The first etching mask has first and second sidewalls that face the first opening and are opposed to each other at a first distance in a track width direction. The second etching mask has third and fourth sidewalls that face the second opening and are opposed to each other at a second distance greater than the first distance.

Abstract: A blazed grating is disclosed as well as mode hop-free tunable lasers and a process for fabricating gratings of this type. The grating lies in a general plane and includes a plurality of elongate beams carrying mutually parallel respective reflection surfaces spaced apart from one another with a predefined pitch, each of these reflection surfaces having a normal direction inclined at a grating angle ? to the normal direction of the general plane. The grating includes a plurality of resilient suspension arms connected to the beams and intended to be fastened to a grating support. A first pair of comb electrodes is provided for applying a mechanical force to this assembly, being placed on a first side of the grating, along an axis transverse to the beams, and designed so as to allow the pitch of the grating to be modified in response to the application of the mechanical force.

Abstract: An apparatus including a component of a circular polarizer; and conductive interconnect integrated with the component of the circular polarizer.

Abstract: An apparatus including a three dimensional sub-wavelength structure for electromagnetic applications including a surface layer formed of a metal or semiconductor film, one or more additional layers stacked to the surface layer, one or more sub-wavelength apertures in the surface layer, and one or more cavities nearby the one or more sub-wavelength apertures. The size of each aperture is smaller than the wavelength of the electromagnetic field incident upon the three dimensional sub-wavelength structure. The one or more cavities provide accessibility for a dielectric material within and below each aperture. Each cavity may also contain at least one metal or semiconductor sub-wavelength particle. A method of fabricating a three dimensional sub-wavelength structure is also provided.

Abstract: A method of manufacturing the plasmon generator includes the steps of: forming a base part made of a dielectric material; forming a metal film that is to later become the plasmon generator; and forming a filler layer made of a dielectric material. The base part includes a base surface and a protruding part that protrudes from the base surface. The protruding part has a top surface that is different in level from the base surface, and a first sidewall connecting the top surface of the protruding part to the base surface. The metal film includes an adhesion part adhering to the first sidewall. The filler layer has a second sidewall disposed such that the adhesion part is interposed between the first sidewall and the second sidewall.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.

Abstract: A manufacturing method of a light source chip for a thermally assisted head comprises steps of (a) providing a light source bar with a surface coating formed thereon; (b) forming several blind holes on the predetermined positions of the light source bar by etching, the blind hole having a top hollowed on the surface coating and a bottom hollowed on the light source bar, and the blind hole having a first biggest width at its top; (c) cutting the light source bar along every two adjacent blind holes by a cutting machine. The cutting machine has a cutting means with a second biggest width that is smaller than the first biggest width of the blind hole, thereby cutting down an individual light source chip without contacting the side edges of the blind hole.

Abstract: Apparatus (20) for 3D mapping of an object (28) includes an illumination assembly (30), including a coherent light source (32) and a diffuser (33), which are arranged to project a primary speckle pattern on the object. A single image capture assembly (38) is arranged to capture images of the primary speckle pattern on the object from a single, fixed location and angle relative to the illumination assembly. A processor (24) is coupled to process the images of the primary speckle pattern captured at the single, fixed angle so as to derive a 3D map of the object.

Abstract: Provided is a method of manufacturing a see-through-type integrated solar cell and a method of manufacturing the same. The method comprises forming a first conductive material being apart and strip patterned on a transparent substrate so that the first conductive material comprises a predetermined space for enabling light to directly pass through the transparent substrate, forming a solar cell (semiconductor) layer, obliquely depositing a second conductive material and etching the solar cell layer using the second conductive material layer as a mask.

Abstract: An optical deflector has: a movable plate having a reflecting surface and a side surface; and a support portion that supports the movable plate in such a manner that the movable plate is able to rotate around a predetermined axis, in which the side surface of the movable plate is recessed toward the axis.

Abstract: Disclosed is a method for manufacturing a nano wire grid polarizer, including: applying a curable resin on a glass substrate, and then forming a nano pattern by pressurizing the curable resin with a nano imprint mold; processing a surface of the nano pattern in which an upper part of the nano pattern is hydrophobicized and an inside of the nano pattern is hydrophilicized; filling the inside of the nano pattern with nano metal particles; and forming a nano wire grid polarizer by removing the nano pattern.

Abstract: A liquid crystal display includes a first substrate. A plurality of fine metal lines is disposed on the first substrate. The plurality of fine metal lines including a plurality of small regions. A second substrate is aligned with the first substrate. A light blocking portion is disposed on the second substrate. The light blocking portion is disposed in a region between the small regions of the plurality of small regions of the plurality of fine metal lines.

Abstract: A diffusion sheet includes a light-transmissive substrate, a plurality of structures, and a flat portion. The light-transmissive substrate includes a first main surface, and a second main surface. The plurality of structures have convex shapes and are randomly formed on the first main surface. The flat portion is formed among the plurality of structures on the first main surface and has a surface roughness (Ra) of no less than 0.9 ?m.

Abstract: The invention relates to a particle detector including a substrate (10, 30, 40) made of a semiconductor material, in which at least one through-cavity (11, 31, 41) is formed, defined by an input section (110) and an output section (111), wherein the input section thereof is to be connected to an airflow source, said substrate supporting: an optical means including at least one laser source (12, 32, 42), and at least one waveguide (13, 33, 43) connected to said at least one laser source and leading into the vicinity of the output section of said cavity; and photodetector means (14, 34, 44) located near the output section of said cavity and offset relative to the optical axis of the optical means.

Abstract: A display panel includes; a substrate, and a light blocking structure surrounding an ink filling region on the substrate, the light blocking structure including; a first layer pattern having an ink affinity characteristic disposed on the substrate, and a second layer pattern positioned on the first layer pattern and including an organic material having a light blocking characteristic.

Abstract: In a display glass window processing device and a method thereof, the display glass window processing device includes a worktable for supporting an unprocessed glass, a rotator for rotating the unprocessed glass, and a sprayer for spraying an etchant onto the unprocessed glass. A first protection film attached to one side of the unprocessed glass arranged opposite the sprayer, and a second protection film is attached to another side of the unprocessed glass arranged opposite the worktable. The first protection film exposes an edge of the unprocessed glass so that the edge is etched by the etchant so as to become rounded.

Abstract: A preparation method of the fluorescent powder layer (108, 208) is provided.

Abstract: A passive optical waveguide is solely built on a Si substrate while still maintaining high optical quality. Two side-by-side diamond shaped cavities may be etched into the Si wafer and oxide grown on the inner walls of the cavities until the oxide meets at opposing inner vertices of the diamond shaped cavities. An optical waveguide is formed by the inverted, generally triangular cross-sectional, portion of silicon remaining between the top surface of the wafer and the opposing inner vertices.

Abstract: The disclosure relates to a method for making a grating. The method includes the following steps. First, a substrate is provided. Second, a patterned mask layer is formed on a surface of the substrate. Third, the substrate with the patterned mask layer is placed in a microwave plasma system. Fourth, a plurality of etching gases are guided into the microwave plasma system simultaneously to etch the substrate through three stages. The etching gas includes carbon tetrafluoride (CF4), argon (Ar2), and sulfur hexafluoride (SF6). Finally, the patterned mask layer is removed.

Abstract: The disclosure relates to a method for making a grating. The method includes the following steps. First, a substrate is provided. Second, a photoresist film is formed on a surface of the substrate. Third, a nano-pattern is formed on the photoresist film by nano-imprint lithography. Fourth, the photoresist film is etched to form a patterned photoresist layer. Fifth, a mask layer is covered on the patterned photoresist layer and the surface of the substrate exposed to the patterned photoresist layer. Sixth, the patterned photoresist layer and the mask layer thereon are removed to form a patterned mask layer. Seventh, the substrate is etched through the patterned mask layer by reactive ion etching, wherein etching gases includes carbon tetrafluoride (CF4), sulfur hexafluoride (SF6) and argon (Ar2). Finally, the patterned mask layer is removed.

Abstract: A glass article including: at least one anti-glare surface having haze, distinctness-of-image, surface roughness, uniformity properties and sparkle properties, as defined herein. A method of making the glass article includes, for example, slot coating a suspension of particles on at least one surface of the article to provide a particulated mask covering from about 40 to 92% of the coated surface area; contacting the at least one surface of the article having the particulated mask and an etchant to form the anti-glare surface, and optionally continuously polishing the suspension of particles just prior to slot coating. A display system that incorporates the glass article, as defined herein, is also disclosed.

Abstract: An optical system, such as an integrated monolithic optical bench, includes a three-dimensional curved optical element etched in a substrate such that the optical axis of the optical system lies within the substrate and is parallel to the plane of the substrate.

Abstract: This disclosure provides systems, methods and apparatus for providing illumination by using light turning features in a light guide. In an aspect, an illumination system is provided with a light guide configured to support propagation of light along the length of the light guide. The light guide includes a light turning feature formed by an indentation in the light guide. A coating layer is disposed along surfaces of the indentation and the volume of the indentation over the coating is filled with a filler. The filler substantially fills the indentation to an upper surface of the light turning feature and is spaced apart from the light guide. The light guide is configured to provide total internal reflection of light at the upper surface of the light guide. Light from a light source can be injected into the light guide and then redirected by the turning features to illuminate a display.

Abstract: A laser device is disclosed that provides at least an ultraviolet laser beam and preferably both an ultraviolet laser beam and a visible laser beam. The laser device includes a semiconductor laser device (e.g. a laser diode) to generate visible laser light which is coupled into a frequency doubling crystal taking the form of a single crystal thin film frequency-doubling waveguide structure. The single crystal thin film frequency-doubling waveguide converts a portion of the visible light emitted by the laser diode into ultraviolet light. Both visible and ultraviolet laser light is emitted from the waveguide. As an example, the single crystal thin film frequency-doubling frequency doubling waveguide includes a frequency doubling crystal region composed of ?-BaB2O4 (?-BBO), a cladding region composed of materials that are transparent or nearly transparent at the wavelength of the ultraviolet laser light beam and a supporting substrate composed of any material.

Abstract: Provided are a structure color of photonic crystals in which a new structure of a structure color of photonic crystals is provided so that a nanoimprint process can be performed and mass productivity is improved, a method of manufacturing thereof, and a manufacturing apparatus thereof. The method of manufacturing a structure color of photonic crystals includes: forming a plurality of basic element layers by using nanoimprinting, the plurality of basic element layers comprising a plurality of basic unit bodies each having a symmetrical cross-section and thin film connecting portions connecting the basic unit bodies! sequentially stacking the basic element layers! removing the thin film connecting portions by using etching; and determining whether the structure color of photonic crystals is completed, wherein, when it is determined that the structure color of photonic crystals is not completed, the forming, the stacking, and the removing are repeatedly performed.

Abstract: A surface emitting photonic device including a substrate; and a waveguide structure on the substrate. The waveguide structure includes an active region along its longitudinal axis and the active region is for generating light. The waveguide structure also has a trench formed therein transverse to the active region and defining a first wall forming an angled facet at one end of the active region, the first wall having a normal that is at a non-parallel angle relative to the longitudinal axis of the waveguide structure. The trench also defines a second wall located opposite the first wall.

Abstract: An antireflection structure that can be formed in a desired shape, and a method for manufacturing the same are provided. An antireflection structure 100 includes a resin layer 200 formed in a desired shape, and inorganic material fine particles 201 dispersed inside the resin layer. A plurality of fine concaves 202 having an average inner diameter shorter than or equal to the minimum wavelength of light whose reflection should be suppressed are formed at the surface of the antireflection structure 100, thereby reducing the equivalent refractive index at the surface of the resin layer 200. The fine concaves 202 are formed by, after forming a composite material in which the nanosized inorganic material fine particles 201 are dispersed in the resin layer, dissolving the inorganic material fine particles 201 dispersed at the surface of the resin layer 200, using a solvent that dissolves only the inorganic material fine particles 201.

Abstract: A method of forming double-sided patterns in a touch panel circuit is disclosed. A first conductive layer and a second conductive layer are respectively formed on both sides of a substrate. A blocking layer is formed on a top surface of the first conductive layer for blocking ultraviolet (UV) light. A first photoresist layer is formed on a top surface of the blocking layer, and a second photoresist layer is formed on a bottom surface of the second conductive layer. Accordingly, two sides of the substrate may be exposed, developed and etched at the same time, thereby substantially simplifying the process of manufacturing the touch panel circuit.

Abstract: Disclosed herein is a method for fabricating an optical device that includes depositing an etch stop material to form an etch stop layer, wherein the etch stop material has a refractive index in the infrared wavelength range, n1; depositing a core material to form a core layer, wherein the core material has a refractive index in the infrared wavelength range, n2; and etching the core layer using a halide based etch process, wherein the etch stop material has an etch rate in the halide based etch process and the core material has an etch rate in the halide based etch process, wherein the etch rate of the core material is at least about five times higher than the etch rate of the etch stop material, and wherein n1 is not greater than n2.

Abstract: A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.

Abstract: A method for cleaning the surface of a silicon substrate, covered by a layer of silicon oxide includes: a) exposing the surface for 60 to 900 seconds to a radiofrequency plasma, generated from a fluorinated gas, to strip the silicon oxide layer and induce the adsorption of fluorinated elements on the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the fluorinated gas pressure being 10 mTorrs to 200 mTorrs, and the substrate temperature being lower than or equal to 300° C.; and b) exposing the surface including the fluorinated elements for 5 to 120 seconds to a hydrogen radiofrequency plasma, to remove the fluorinated elements from the substrate surface, the power density generated using the plasma being 10 mW/cm2 to 350 mW/cm2, the hydrogen pressure being 10 mTorrs to 1 Torr, and the substrate temperature being lower than or equal to 300° C.

Abstract: A method of manufacturing the plasmon generator includes the steps of: forming a base part made of a dielectric material; forming a metal film that is to later become the plasmon generator; and forming a filler layer made of a dielectric material. The base part includes a base surface and a protruding part that protrudes from the base surface. The protruding part has a top surface that is different in level from the base surface, and a first sidewall connecting the top surface of the protruding part to the base surface. The metal film includes an adhesion part adhering to the first sidewall. The filler layer has a second sidewall disposed such that the adhesion part is interposed between the first sidewall and the second sidewall.

Abstract: A method for designing a first optical filter, exhibiting a first filter performance satisfying a first preset criterion, and a second optical filter, exhibiting a second filter performance satisfying a second preset criterion, includes providing initial first and second filter designs for the first and second optical filters, respectively, as first and second ordered stacks of layers, respectively. A pair of layers, including a first layer, characterized by a first thickness, and a second layer, characterized by a second thickness, is selected from the first and second ordered stacks of layers. The first thickness is constrained to a first constrained thickness that is a positive integer multiple of the second thickness to yield a constrained first filter design. A predicted performance of the constrained first filter design is determined and compared with the first preset criterion for one of accepting and rejecting the constrained first filter design.

Abstract: A method is provided for forming an opening in a layer of a selected material. The method comprises, forming a polymer resist layer over said selected material and plasticising areas of the resist where openings are to be formed. The plasticising is performed by depositing a first solution onto the surface of said polymer resist layer, where the first solution is a plasticiser selected to increase permeability of the polymer resist layer to a second solution, in an area which has absorbed the first solution. The second solution is selected to be an etchant or solvent for the selected material. After the resist layer has been selectively plasticised, it is contacted with the second solution, which permeates the polymer resist layer in the area of increased permeability and forms an opening in the selected material.

Abstract: A plasmonic transducer includes at least two metal elements with a gap therebetween. The metal elements are elongated along a plasmon-enhanced, near-field radiation delivery axis. Cross sections of the metal elements in a plane normal to the delivery axis vary in shape along the delivery axis. A waveguide is disposed along an elongated side of the plasmonic transducer. The waveguide is optically coupled to the plasmonic transducer along the elongated side.

Abstract: The present invention relates to a method of manufacturing optical waveguide devices. The order of patterning/etch in the method is first a deeper etching then shallow etching. In some embodiments, the first etching forms a mesa and the second etching removes a portion of material that comprises the mesa. In addition, there can be a planarization step. The deeper trenches are desirably conducive to filling. The method may use a cross-lithography method to reduce alignment errors between multiple patterning/etching steps. The method may use an oxidation and stripping off process to smooth a surface of the waveguide and/or reduce an initial dimension of the waveguide.

Abstract: There is provided an optical element including first and second substrates that are disposed to face each other; a pair of wall portions that are erected on an inner surface of the first substrate facing the second substrate to be adjacent to each other in a first direction and extend in a second direction different from the first direction; first and second electrodes that are disposed on wall surfaces of the pair of wall portions to be insulated from each other and face each other and are provided to be apart from the first substrate; an insulating film that covers the first and second electrodes; a third electrode that is provided on an inner surface of the second substrate facing the first substrate; and a polar liquid and a non-polar liquid that are sealed between the first substrate and the second substrate and have different refractive indexes.

Abstract: The present invention provides a method for creating an optical feature, including: providing a substrate; creating one or more volumetric periodic/non-periodic structures on the substrate; and micromachining the one or more volumetric periodic/non-periodic structures on the substrate to create the optical feature. Optionally, the substrate is a photomaterial. The one or more volumetric periodic/non-periodic structures are aligned one or more of substantially perpendicular to, substantially parallel to, and substantially at an angle to the substrate. The one or more volumetric periodic/non-periodic structures have a predetermined frequency, orientation, and angle. Optionally, different portions of the one or more volumetric periodic/non-periodic structures are subjected to different degrees and/or shapes of micromachining.

Abstract: A waveguide coupler includes a first waveguide and a second waveguide. The waveguide coupler also includes a connecting waveguide disposed between the first waveguide and the second waveguide. The connecting waveguide includes a first material having a first index of refraction and a second material having a second index of refraction higher than the first index of refraction.

Abstract: An optical device includes a substrate and a first optical waveguide including a mesa. The mesa includes a first lower clad layer portion, a first core layer portion, and a first upper clad layer portion. The first lower clad layer portion, the first core layer portion, and the first upper clad layer portion are disposed in this order from the substrate side. The optical device also includes a first etch stop layer configured to stop etching when the first optical waveguide is formed. The first etch stop layer being laminated over the substrate. The first optical waveguide is laminated on the first etch stop layer.

Abstract: System and methods for a nanofabricated optical circular polarizer are provided. In one embodiment, a nanofabricated circular polarizer comprises a quarter wave plate; and a linear polarizer formed on a surface of the quarter wave plate.

Abstract: A micromechanical component having a displaceable part connected to a residual substrate by at least one spring, and including first and second subunits, between which an insulating intermediate layer and at least one semiconductor boundary layer is formed; an inner region of the first subunit, which inner region is aligned with the second subunit, being patterned out of a substrate using at least one cavity etched in a first etching direction; an outer region of the first subunit of the displaceable part, which outer region faces away from the second subunit, being patterned out of the substrate using at least one hollowed-out section etched in a second etching direction; the second subunit being patterned out of a semiconductor layer deposited onto the insulating intermediate layer and/or on the at least one semiconductor boundary layer using at least one continuous separating trench. Also described is a related manufacturing method.

Abstract: High quantum yield InP nanocrystals are used in the bio-technology, bio-medical, and photovoltaic, specifically IV, III-V and III-VI nanocrystal technological applications. InP nanocrystals typically require post-generation HF treatment. Combining microwave methodologies with the presence of a fluorinated ionic liquid allows Fluorine ion etching without the hazards accompanying HF. Growing the InP nanocrystals in the presence of the ionic liquid allows in-situ etching to be achieved. The optimization of the PL QY is achieved by balancing growth and etching rates in the reaction.

Abstract: This is structure and method for providing a textured surfaced that can be used in a plurality of systems including ink jet printing. In ink jet printing, the textured surface of this invention controls ink drawback and significantly improves image quality. The textured surface has an average roughness, Ra, of about 0.2 to 1.5 microns, a texture density of about 104-107 pits per cm2, a texture size of about 0.5-5 microns, and a texture depth of about 0.5-10 microns.

Abstract: The present invention uses externally applied electromagnetic stimulus to control and heat porous magnetic particles and material associated with the particles. The particles contain magnetic material, such as superparamagnetic iron oxide and are infused with a material. Application of a DC magnetic field allows them to be moved with their infused material, and application of an AC RF electromagnetic field allows them to be heated with their infused material. The material can be infused into pores of the particles and the particles can also adhere to an aqueous droplet. The present invention also provides a multi-layer porous magnetic particle. The particle includes a host layer having pores sized to accept magnetic nanoparticles. Magnetic nanoparticles are infused within pores of the host layer. An encoding layer includes pores that define a spectral code. The pores in the encoding layer are sized to substantially exclude the magnetic nanoparticles.

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

Abstract: A photonic crystal (PC) device including one or more resonant optical structures defined by the photonic crystal structure is affixed to the end face of an optical fiber. The PC device is fabricated on a separate substrate, and then affixed to the fiber end face. This transfer can be facilitated by device templates which are laterally supported by tabs after an undercut etch. The tabs can be designed to break during transfer to the fiber, thereby facilitating transfer. Registration marks and/or the use of device templates having the same diameter as the fiber can be used to provide lateral alignment of the fiber to the resonant optical structures. Such alignment may be needed to provide optical coupling between the fiber and the resonant optical structures.

Abstract: The present invention is a method for producing a light-emitting body containing silicon fine particles that emit visible light, comprising: a baking step of baking a mixture containing a silicon source and a carbon source in an inert atmosphere; a rapid cooling step of rapidly cooling a gas generated by baking the mixture to obtain a composite powder; and a removing step of removing a portion of the composite powder, wherein in the removing step, a portion of silicon monoxide and a portion of silicon dioxide are removed from the composite powder containing silicon fine particles, silicon monoxide, and silicon dioxide.

Abstract: Embodiments of the invention provide silicon-based nanoparticle composites, where the silicon nanoparticles are highly luminescent. Preferred embodiments of the invention are Si—O solid composite networks, e.g., glass, having a homogenous distribution of luminescent hydrogen terminated silicon nanoparticles in a homogenous distribution throughout the solid. Embodiments of the invention also provide fabrication processes for silicon-based silicon nanoparticle composites. A preferred method for forming a silicon-based nanoparticle composite disperses hydrogen terminated silicon nanoparticles and an inorganic precursor of an organosilicon gel in an aprotic solvent to form a sol. A catalyst is mixed into the sol. The sol is then permitted to dry into a gel of the silicon-based nanoparticle composite.