Etching Using Radiation (e.g., Laser, Electron-beam, Ion-beam, Etc.) Patents (Class 216/94)
  • Patent number: 11407943
    Abstract: An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: August 9, 2022
    Inventors: Jonghee Park, Kitae Kim, Jinseock Kim, Gyu-Po Kim, Hyun-Cheol Shin, Dae-Woo Lee, Sang-Hyuk Lee
  • Patent number: 11377387
    Abstract: A method for producing microstructures includes introducing modifications by a laser beam into a volume between two opposite outer surfaces of a glass substrate. An etching method is carried out which provides anisotropic material removal in one of the outer surfaces so as to produce recesses that have a conical shape. A layer that is resistant to an etching effect of the etching method is applied as a cover layer to only one outer surface. Then, a further etching method is carried out so that material is removed in the other outer surface until recesses of this other outer surface, which are produced and/or enlarged by the further etching method, have reached the cover layer.
    Type: Grant
    Filed: April 23, 2020
    Date of Patent: July 5, 2022
    Inventors: Roman Ostholt, Norbert Ambrosius
  • Patent number: 10209573
    Abstract: An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: February 19, 2019
    Inventors: Xiaoxiang Zhang, Zheng Liu, Zongjie Guo, Zhichao Zhang, Mingxuan Liu, Xi Chen
  • Patent number: 9437415
    Abstract: Methods for aligning layers more accurately for FinFETs fabrication. An embodiment method includes forming a first pattern in a workpiece using a first photomask, forming a second pattern in the workpiece using a second photomask, the second photomask aligned to the first pattern, and aligning a third pattern to the first and the second patterns by aligning a first feature of the third pattern to a first feature of the first pattern in a first direction, and aligning a second feature of the third pattern to a first feature of the second pattern in a second direction orthogonal to the first direction.
    Type: Grant
    Filed: June 7, 2013
    Date of Patent: September 6, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Feng Shieh, Kuei-Liang Lu
  • Patent number: 9410924
    Abstract: Measurement device (10) for taking a liquid sample, comprising: a measurement portion (15) with a measurement surface (20), for being in use contacted with the liquid surface and a plug portion (40) having a plurality of electrical contacts (50), wherein the plug portion (40) is mountable to a socket (110) of a measurement evaluation apparatus (100).
    Type: Grant
    Filed: May 18, 2007
    Date of Patent: August 9, 2016
    Assignee: CE-MATE B.V.
    Inventors: Steven Selwyn Staal, Jan Floris, Marko Blom, Johannes Oonk
  • Patent number: 9080207
    Abstract: The present technology provides for an apparatus for detecting polynucleotides in samples, particularly from biological samples. The technology more particularly relates to microfluidic systems that carry out PCR on nucleotides of interest within microfluidic channels, and detect those nucleotides. The apparatus includes a microfluidic cartridge that is configured to accept a plurality of samples, and which can carry out PCR on each sample individually, or a group of, or all of the plurality of samples simultaneously.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: July 14, 2015
    Assignee: HandyLab, Inc.
    Inventors: Kalyan Handique, Sundaresh N Brahmasandra, Karthik Ganesan, Jeff Williams
  • Patent number: 9041563
    Abstract: A method for manufacturing keycap includes applying a first coating layer on a surface of a keycap layer, applying a second coating layer on top of the first coating layer, etching at least a portion of the first coating layer to a first depth to form a first etched area, and etching at least a portion of the first etched area to a second depth to form a second etched area.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: May 26, 2015
    Assignee: Apple Inc.
    Inventors: Peter H. Mahowald, Omar Sze Leung
  • Patent number: 9034277
    Abstract: A microfluidic cartridge having a microfluidic channel may have at least one surface that has been roughened, etched or otherwise treated to alter its surface characteristics. In some instances, a microfluidic cartridge may have a microfluidic channel that is configured to provide even distribution of a lysing reagent across the channel. The surface may be roughened or etched using a laser, an abrasive, application of a solvent or in any other suitable manner.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: May 19, 2015
    Assignee: Honeywell International Inc.
    Inventors: Alex Gu, Mark Washa
  • Publication number: 20150129543
    Abstract: Provided are a method for etching a metal or metal oxide without using a reagent, etc., that affects the environment, a method for smoothing a surface of a metal or metal oxide on an atomic level, and a method for patterning on an atomic level. Etching of a metal or metal oxide, or smoothing of a surface of a metal or metal oxide is possible using ozone water in which only ozone is dissolved. Patterning can also be performed by providing a metal that does not dissolve in the ozone water as a resist on a metal or metal oxide that can be etched by ozone water in which only ozone is dissolved, and etching using the ozone water.
    Type: Application
    Filed: April 25, 2013
    Publication date: May 14, 2015
    Applicant: Japan Science and Technology Agency
    Inventors: Takatoki Yamamoto, Ryuji Hatsuki
  • Patent number: 9023436
    Abstract: Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces are disclosed herein. In one embodiment, a method includes depositing molecules of a gas onto a microfeature workpiece in the reaction chamber and selectively irradiating a first portion of the molecules on the microfeature workpiece in the reaction chamber with a selected radiation without irradiating a second portion of the molecules on the workpiece with the selected radiation. The first portion of the molecules can be irradiated to activate the portion of the molecules or desorb the portion of the molecules from the workpiece. The first portion of the molecules can be selectively irradiated by impinging the first portion of the molecules with a laser beam or other energy source.
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: May 5, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Ross S. Dando, Dan Gealy
  • Publication number: 20150108089
    Abstract: A method for cutting a substrate includes: radiating, as part of a first laser radiating process, a laser towards a surface of the substrate to form a first groove in a substrate. Radiating the laser towards the surface includes radiating, in sequence, the laser towards a first outer point (FOP), a second outer point (SOP), a first intermediate point (FIP), a second intermediate point (SIP), and a first cut point (FCP) of the surface, each of the points being spaced apart from one another by one or more distances. The FCP corresponds to a cut line of the substrate. The FOP and the SOP are respectively disposed at lateral sides of the FCP. The FIP is disposed between the FCP and the FOP. The SIP is disposed between the FCP and the SOP. The same kind and intensity of laser is radiated towards each of the points.
    Type: Application
    Filed: July 7, 2014
    Publication date: April 23, 2015
    Inventors: Il Young JEONG, Tae Yong KIM, Cheol Lae ROH, Je Kil RYU, Jeong Hun WOO, Gyoo Wan HAN, Ki Su HAN, Tae Hyoung CHO, Jong Nam MOON
  • Patent number: 8997335
    Abstract: A method of manufacturing a magnetic head includes the steps of: forming a pole-layer-encasing layer having a pole-layer-encasing section; and forming a pole layer in the pole-layer-encasing section. The pole layer includes a first layer, and a second layer formed thereon. The step of forming the pole layer includes the steps of: forming an initial first layer by physical vapor deposition; etching the surface of the initial first layer by dry etching so that the initial first layer becomes the first layer; and forming the second layer on the first layer.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: April 7, 2015
    Assignee: Headway Technologies, Inc.
    Inventors: Yoshitaka Sasaki, Hiroyuki Itoh, Shigeki Tanemura, Hironori Araki, Kazuo Ishizaki, Takehiro Horinaka
  • Patent number: 8980112
    Abstract: A method for renewing an organic solvent includes an ultraviolet irradiation step in which an organic solvent containing a resin is irradiated with ultraviolet rays so as to enhance the ability of the organic solvent to dissolve the resin. A method for using an organic solvent and a method for producing an inkjet recording head utilize the method for renewing an organic solvent.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: March 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masanori Jinnoh, Masashi Miyagawa
  • Publication number: 20150060403
    Abstract: A method for manufacturing a fuel contacting component that facilitates reducing coke formation on at least one surface of the fuel contacting component is disclosed herein. The method includes applying a slurry composition including a powder including aluminum to the component surface, wherein the fuel contacting component is formed by an additive manufacturing process. The slurry composition is heat treated to diffuse the aluminum into the component surface. The heat treatment comprises forming a diffusion aluminide coating on the component surface, wherein the diffusion coating comprises a diffusion sublayer formed on the component surface and an additive sublayer formed on the diffusion sublayer. The method further comprises removing the additive sublayer of the diffusion aluminide coating with at least one aqueous solution such that the diffusion sublayer and the component surface are substantially unaffected, wherein the diffusion layer facilitates preventing coke formation on component surface.
    Type: Application
    Filed: September 5, 2013
    Publication date: March 5, 2015
    Applicant: General Electric Company
    Inventors: William Thomas Carter, James Anthony Ruud, Lawrence Bernard Kool, Justin John Gambone, Jr., Christine Mary Furstoss
  • Publication number: 20150059449
    Abstract: A method for removing a high definition nanostructure in a partly free-standing layer, the layer, a sensor comprising said layer, a use of said sensor, and a method of detecting a species, and optional further characteristics thereof, using said sensor. The sensor and method are suited for detecting single ions, molecules, low concentrations thereof, and identifying sequences of base pairs, e.g., in a DNA-strand.
    Type: Application
    Filed: September 5, 2014
    Publication date: March 5, 2015
    Inventors: Qiang Xu, Gregory Schneider, Henny Zandbergen, Mengyue Wu, Bo Song, Cornelis Dekker
  • Patent number: 8940218
    Abstract: Approaches for making a light-transmitting panel are disclosed. A panel is positioned on a support structure, and a stencil is positioned between a surface of the panel and a laser head. The stencil includes a plurality of openings. A defocused laser beam generated by the laser head is scanned over the openings in the stencil. The width of the defocused laser beam at a location at which the laser beam strikes the panel is at least as large as a size of the desired disruption, and the laser head is powered at a level and moved at a rate that creates a disruption in the surface of the panel at each opening.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: January 27, 2015
    Assignee: Automated Assembly Corporation
    Inventors: Scott Lindblad, David Neuman
  • Patent number: 8925192
    Abstract: A method for manufacturing printed wiring board includes irradiating laser on first surface of substrate such that first opening portion having first opening on the first surface and inner diameter decreasing toward the second surface is formed, irradiating laser on second surface of the substrate such that second opening portion having second opening on the second surface and inner diameter decreasing toward the first surface is formed and that the second portion joins the first portion and forms a penetrating hole penetrating through the substrate, forming a first circuit on the first surface, forming a second circuit on the second surface, and filling the hole with plating such that a through-hole conductor which electrically connects the first and second circuits is formed. The first opening has diameter same as or greater than diameter of the second opening, and the first portion has depth less than depth of the second portion.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: January 6, 2015
    Assignee: Ibiden Co., Ltd.
    Inventors: Kota Noda, Tsutomu Yamauchi
  • Publication number: 20150005709
    Abstract: A removable material is deposited or otherwise applied to a flat substrate surface in a pattern corresponding to desired corrugations in a membrane, e.g., a deflection diaphragm. The applied material serves as a scaffold for a polymeric material, which is applied thereover, and following cure or hardening, the polymeric material is removed to form a finished corrugated membrane.
    Type: Application
    Filed: June 27, 2014
    Publication date: January 1, 2015
    Inventors: Changlin Pang, Jason Shih, Fukang Jiang, Changgeng Liu, Sean Caffey, Andrew Urazaki
  • Patent number: 8920660
    Abstract: Methods for manufacturing intravascular stents are disclosed wherein the intravascular stent has its inner surface treated to promote the migration of endothelial cells onto the inner surface of the intravascular stent. In particular, the inner surface of the intravascular stent has at least one groove formed therein.
    Type: Grant
    Filed: August 19, 2013
    Date of Patent: December 30, 2014
    Assignee: Advanced Bio Prosthetic Surfaces, Ltd., a wholly owned subsidiary of Palmaz Scientific Inc.
    Inventors: Christopher E. Banas, Julio C. Palmaz, Eugene A. Sprague
  • Patent number: 8912464
    Abstract: A laser processed hole is formed in a workpiece. The workpiece has a first member formed of a first material bonded to a second member formed of a second material. A value is set representing the minimum number of shots of a pulsed laser beam when the spectral wavelength of plasma has changed from the spectral wavelength inherent in the first material to that of the second material. A maximum shot number is set representing a maximum value of the number of beam shots when the spectral wavelength of the plasma has completely changed. The beam is stopped if the number of shots has reached the minimum value and the spectral wavelength of the plasma has changed whereas the beam is continued until the number of shots reaches the maximum value if the spectral wavelength of the plasma has not changed even after the number of shots has reached the minimum value.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: December 16, 2014
    Assignee: Disco Corporation
    Inventor: Hiroshi Morikazu
  • Publication number: 20140349078
    Abstract: The invention is directed to a patterned aerogel-based layer that serves as a mold for at least part of a microelectromechanical feature. The density of an aerogel is less than that of typical materials used in MEMS fabrication, such as poly-silicon, silicon oxide, single-crystal silicon, metals, metal alloys, and the like. Therefore, one may form structural features in an aerogel-based layer at rates significantly higher than the rates at which structural features can be formed in denser materials. The invention further includes a method of patterning an aerogel-based layer to produce such an aerogel-based mold. The invention further includes a method of fabricating a microelectromechanical feature using an aerogel-based mold. This method includes depositing a dense material layer directly onto the outline of at least part of a microelectromechanical feature that has been formed in the aerogel-based layer.
    Type: Application
    Filed: August 8, 2014
    Publication date: November 27, 2014
    Inventor: Robert Jon Carlson
  • Publication number: 20140332499
    Abstract: A method of manufacturing an endoluminal implantable surface, stent, or graft includes the steps of providing an endoluminal implantable surface, stent, or graft having an inner wall surface, an outer wall surface, and a wall thickness and forming a pattern design into the endoluminal implantable surface, stent, or graft. At least one groove is created in the inner surface of the intravascular stent by applying a laser machining method to the inner surface.
    Type: Application
    Filed: May 13, 2014
    Publication date: November 13, 2014
    Inventors: Julio C. Palmaz, Armando Garza
  • Publication number: 20140318964
    Abstract: Provided is a device comprising a channel through and defined by a plurality of layers surrounding the channel, the channel connecting a first and a second chambers separated by the plurality of layers, wherein the plurality of layers comprise a first layer, a second layer; and a conductive middle layer disposed between the first and second layers, wherein the channel comprises (a) a first region defined by the first layer, denoted as an inlet, that is about 0.5 nm to about 100 nm in diameter and (b) a second region defined by the second layer, denoted as an outlet, wherein the inlet and the outlet are about 10 nm to about 1000 nm apart from each other, and wherein the first and second chambers and the middle layer are connected to a power supply. Also provided are methods of preparing and using the device, in particular for nucleic acid sequencing.
    Type: Application
    Filed: November 13, 2012
    Publication date: October 30, 2014
    Applicants: Brigham Young University, The Regents of the University of California
    Inventors: William Dunbar, Holger Schmidt, Aaron Hawkins
  • Patent number: 8864955
    Abstract: The invention is related to a process to apply a heater function to a plastic glass that was made of a polycarbonate. The process includes a sputtering process that allows producing high performance heater function on a plastic glass. Another aspect of the invention is the plastic glass mirrors produced by the inventive process.
    Type: Grant
    Filed: October 20, 2010
    Date of Patent: October 21, 2014
    Assignee: SMR Patents S.a.r.l.
    Inventors: Gilles Benoit, Farid Manzeh, Christophe Laloup
  • Patent number: 8864959
    Abstract: Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: October 21, 2014
    Assignee: Oerlikon Trading AG, Truebbach
    Inventors: Siegfried Krassnitzer, Oliver Gstoehl, Markus Esselbach
  • Patent number: 8845916
    Abstract: A method for manufacturing a glass plate using laser etching includes a dipping step for dipping a glass plate, which will be etched, into an etching solution, a patterning step for irradiating laser to the glass plate dipped in the etching solution to form a pattern therein, and a washing step for washing the patterned glass plate. This method allows making a plate with a high aspect ratio and fine line widths in comparison to a conventional plate manufacturing method using photoresist for etching, and also ensures more efficient energy consumption and higher etching efficiency rather than an etching method using laser only.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: September 30, 2014
    Assignee: LG Chem, Ltd.
    Inventor: Bu-Gon Shin
  • Patent number: 8821745
    Abstract: Disclosed are graphene oxide membrane materials of high surface area, which membranes suitably have a surface area of above about 200 ?m and exhibit electrical conductivity in excess of about 200 S/m. Also provided are methods of synthesizing such membranes, as well as devices and sensors that incorporate these novel grapheme materials.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: September 2, 2014
    Assignee: The Trustees Of The University Of Pennsylvania
    Inventors: Zhengtang Luo, Alan T. Johnson
  • Publication number: 20140231390
    Abstract: A method of manufacturing a substrate including a micro hole, includes: setting a scanning rate (?m/sec) of pulsed laser light to 1×103 to 4000×103 ?m/sec; adjusting a repetition rate (Hz) of the laser light so that a pulse pitch (?m) represented by the following Formula (1) is 0.08 to 0.8 ?m; scanning the inside of the substrate with the focal point into which the laser light is collected, thereby forming a modified region having a lowered resistance to etching, at a region through which the focal point passed or at an adjacent region thereof; and forming a micro hole in the substrate by removing the modified region by an etching treatment.
    Type: Application
    Filed: April 30, 2014
    Publication date: August 21, 2014
    Applicant: FUJIKURA LTD.
    Inventors: Osamu NUKAGA, Satoshi YAMAMOTO, Hiroyuki WAKIOKA
  • Patent number: 8793849
    Abstract: A method of fabricating a thickness shear mode (TSM) gas and organic vapor sensor having a visco-elastic polymer coating and a fundamental frequency greater than 20 MHz. The method begins by providing a piezoelectric crystal and milling a central region of the crystal. Milling the crystal creates a central oscillating region of reduced thickness surrounded by a thicker outer region. Two electrodes are then deposited in the oscillating region of the crystal—one on each side of the crystal. The oscillating region on both sides of the crystal and the electrodes are then coated with a polymer coating.
    Type: Grant
    Filed: June 5, 2009
    Date of Patent: August 5, 2014
    Assignee: University of South Florida
    Inventors: Venkat R. Bhethanabotla, Randolph D. Williams
  • Publication number: 20140209567
    Abstract: According to one embodiment, provided is a template including a first pattern that is to be transferred to a processing target and is arranged on a transfer region defined on a first principal surface of a template substrate. The template includes a second pattern that is used to measure a position and arranged on a second principal surface of the template substrate opposite to the first principal surface.
    Type: Application
    Filed: June 18, 2013
    Publication date: July 31, 2014
    Inventors: Hidenori SATO, Yuji KOBAYASHI
  • Patent number: 8790534
    Abstract: A system and method are disclosed for the precision fabrication of Micro-Electro-Mechanical Systems (MEMS), Nano-Electro-Mechanical Systems (NEMS), Microsytems, Nanosystems, Photonics, 3-D integration, heterogeneous integration, and Nanotechology devices and structures. The disclosed system and method can also be used in any fabrication technology to increase the precision and accuracy of the devices and structures being made compared to conventional means of implementation. A platform holds and moves a substrate to be machined during machining and a plurality of lasers and/or ion beams are provided that are capable of achieving predetermined levels of machining resolution and precision and machining rates for a predetermined application. The plurality of lasers and/or ion beams comprises a plurality of the same type of laser and/or ion beam.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: July 29, 2014
    Assignee: Corporation for National Research Initiatives
    Inventor: Michael A. Huff
  • Patent number: 8765000
    Abstract: The present disclosure suggests apparatus and methods that can be used to chemically process microfeature workpieces, e.g., semiconductor wafers. One implementation of the invention provides a method in which a surface of a microfeature workpiece is contacted with an etchant liquid. The wall of the processing chamber may be highly transmissive of an operative wavelength range of radiation, but the etchant liquid is absorptive of the operative wavelength range. The etchant liquid is heated by delivering radiation through the wall of a processing chamber. This permits processing chambers to be formed of materials (e.g., fluoropolymers) that cannot be used in conventional systems that must conduct heat through the wall of the processing chamber.
    Type: Grant
    Filed: July 9, 2010
    Date of Patent: July 1, 2014
    Assignee: Micron Technology, Inc.
    Inventors: David A. Palsulich, Ronald F. Baldner
  • Publication number: 20140151336
    Abstract: A manufacturing method of a liquid discharging head includes: preparing a substrate having an energy-generating element and a resin layer on a first face side; irradiating a laser beam on the substrate so as to pass through the resin layer to form a hole serving as a liquid supply port in the substrate; removing a portion of the resin layer including a region which the laser beam has passed through, thereby forming a portion from which the resin layer has been removed as a channel, and forming a portion in which the resin layer remains as a side wall; and forming a discharge port forming member on a far side from the substrate of the side wall, and to form the channel forming member using the side wall and the discharge port forming member.
    Type: Application
    Filed: November 25, 2013
    Publication date: June 5, 2014
    Inventors: Koji Sasaki, Shuji Koyama, Keiji Matsumoto, Seiichiro Yaginuma
  • Publication number: 20140151335
    Abstract: Methods of dispensing a small amount of liquid onto a work piece includes in some embodiments known providing a microscopic channel for the liquid to flow from the nanodispenser. In some embodiments, dispensing the liquid includes dispensing the liquid using a nanodispenser have at least one slit extending to the tip. Some methods include controlling the rate of evaporation or the rate of liquid flow to establish an equilibrium producing a bubble of a desired size.
    Type: Application
    Filed: December 4, 2012
    Publication date: June 5, 2014
    Inventors: Aurélien Philipp Jean Maclou Botman, Steven Randolph, Mark W. Utlaut
  • Patent number: 8739554
    Abstract: The present invention discloses a thermal block unit for thermal treatment of samples comprising temperature regulating units, temperature sensors for measuring temperature at different locations of the thermal block unit, a converter for converting signals from the temperature sensors into digital signals and a thermal block interface for communicating with an instrument.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: June 3, 2014
    Assignee: Roche Molecular Systems, Inc.
    Inventor: Paul Federer
  • Patent number: 8741167
    Abstract: This invention provides a method of making a photovoltaic cell. The method uses an etching composition comprising one or more onium salts selected from the group consisting of iodonium salts and sulfonium and an organic medium to etch the anti-reflection coating. Also provided is a photovoltaic cell made by this method.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: June 3, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Angel R Cartagena, Feng Gao, Haixin Yang, Lei Zhang
  • Patent number: 8734661
    Abstract: A flattening method, by utilizing the advantages of the CARE method and making up for the disadvantages, can perform removal processing of a surface of a workpiece at a sufficient processing rate and can provide a processed surface having enhanced flatness without leaving damage in the processed surface. A flattening method comprises at least two surface removal steps and at least two cleaning steps, the final surface removal step being a catalyst-referred etching step comprising immersing a workpiece in a processing solution containing at least one of hydrohalic acid, hydrogen peroxide water and ozone water, and bringing a surface of a catalyst platen into contact with or close proximity to a surface to be processed of the workpiece to process the surface, said catalyst platen having in a surface a catalyst selected from the group consisting of platinum, gold, a ceramic solid catalyst, a transition metal, glass, and an acidic or basic solid catalyst.
    Type: Grant
    Filed: October 14, 2008
    Date of Patent: May 27, 2014
    Assignee: Ebara Corporation
    Inventors: Kazuto Yamauchi, Yasuhisa Sano, Hideyuki Hara, Junji Murata, Keita Yagi
  • Patent number: 8728286
    Abstract: A method of manufacturing a sample for an atom probe analysis of the invention is made one going through a step of manufacturing a concave/convex structure in both of a base needle and a transplantation sample piece by an etching working of an FIB, a step of jointing mutual members, and a step of bonding such that the concave/convex structure becomes a mesh form by a deposition working of the FIB.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: May 20, 2014
    Assignee: SII Nano Technology Inc.
    Inventor: Takashi Kaito
  • Patent number: 8728849
    Abstract: A method of laser cutting through dissimilar materials separated by a metal foil. A material stack includes a semiconductor layer or film, with a metal foil layer attached to the back surface. The metal foil layer is attached to an insulative support material layer. A laser parameter is selected and optimized for the material stack. A laser beam creates a kerf in the material stack down to the metal foil layer. The laser beam removes metal through the kerf primarily by gasification rather than melting. Kerf formation continues after optimization of the laser parameter for removal of material from the remaining layers. A debris field resulting from the laser cutting of the metal layer is reduced and/or a portion of the debris is removed in an assisted manner as the beam cuts. The materials are diced by cutting the kerf through all materials.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: May 20, 2014
    Assignee: Alta Devices, Inc.
    Inventors: Laila Mattos, Daniel G. Patterson
  • Publication number: 20140131315
    Abstract: A method for generating a smooth surface in a material-specimen includes generating a substantially smooth, first surface region by removing a first material-volume by particle beam etching. The first material-volume is partially defined by the first surface region. An angle between a beam direction and a surface normal of the first surface region is greater than 80° and less than 90°. The method also includes generating a substantially smooth, second surface region by removing a second material-volume. The second material-volume is partially defined by the first surface region and is partially defined by the second surface region. An angle between the beam direction and a surface normal of the second surface region is less than 60°.
    Type: Application
    Filed: November 12, 2013
    Publication date: May 15, 2014
    Inventor: Roland Salzer
  • Patent number: 8709271
    Abstract: The invention relates to a method for the laser marking of a support having a body and a cover sheet. A laser beam is used to etch the body of the support through the thickness of the cover sheet. The support is laminated either during or after the laser marking in order to reduce or prevent deformations in the cover sheet resulting from etching.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: April 29, 2014
    Assignee: Gemalto SA
    Inventor: Jean-Luc Lesur
  • Patent number: 8703362
    Abstract: A sintered electrolyte sheet comprising: a body of no more than 45 ?m thick and laser machined features with at least one edge surface having at least 10% ablation. A method of micromachining the electrolyte sheet includes the steps of: (i) supporting a sintered electrolyte sheet; (ii) micromachining said sheet with a laser, wherein said laser has a wavelength of less than 2 ?m, fluence of less than 200 Joules/cm2, repetition rate (RR) of between 30 Hz and 1 MHz, and cutting speed of preferably over 30 mm/sec.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: April 22, 2014
    Assignee: Corning Incorporated
    Inventors: William Cortez Blanchard, Sean Matthew Garner, Thomas Dale Ketcham, Xinghua Li
  • Publication number: 20140107779
    Abstract: The present invention relates to a silicon breast implant which minimizes stress concentration applied thereto after being inserted into the human body to maximize the resistance of same to fatigue-induced rupture, thereby improving the durability of the implant. The breast implant may include an elegant patch-adhesion portion having a thin thickness so as to provide superior overall feel and improve the appearance of the product. Further, the breast implant has a silicon shell defining an outer wall thereof and the patch adhesion portion for closing, from the outside, a hole formed in a bottom surface of the silicon shell so that the patch adhesion portion is increased in strength to maximize adhesion durability, safety of use, and effectiveness. The silicon shell has a uniform overall thickness, and the patch adhesion portion comprises a patch hole through which a patch adheres to a lower end of the silicon shell using an adhesive material.
    Type: Application
    Filed: May 8, 2012
    Publication date: April 17, 2014
    Inventor: Won Seok Yu
  • Patent number: 8686313
    Abstract: Systems and methods for forming apertures in microfeature workpieces are disclosed herein. In one embodiment, a method includes directing a laser beam toward a microfeature workpiece to form an aperture and sensing the laser beam pass through the microfeature workpiece in real time. The method can further include determining a number of pulses of the laser beam and/or an elapsed time to form the aperture and controlling the laser beam based on the determined number of pulses and/or the determined elapsed time to form a second aperture in the microfeature workpiece.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: April 1, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Charles M. Watkins, William M. Hiatt
  • Patent number: 8673168
    Abstract: An object and project of the present invention is to provide a method for producing silicon fine particles and a method for controlling a particle diameter of silicon fine particles which enable efficient production of silicon fine particles having a uniform particle diameter. A the characteristics of the present invention is producing silicon fine particles having a smaller particle diameter than silicon particles and controlling a particle diameter of silicon fine particles by immersing the silicon particles into an etching solution and irradiating the silicon particles immersed in the etching solution with light having a larger energy than a band gap energy of the silicon particles.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: March 18, 2014
    Assignee: Bridgestone Corporation
    Inventors: Seiichi Sato, Mari Miyano, Shigeki Endo, Osamu Shiino, Shingo Ono, Masato Yoshikawa
  • Patent number: 8673167
    Abstract: A laser processing method for forming a hole in a sheet-like object to be processed made of silicon comprises a depression forming step of forming a depression in a part corresponding to the hole on a laser light entrance surface side of the object, the depression opening to the laser light entrance surface; a modified region forming step of forming a modified region along a part corresponding to the hole in the object by converging a laser light at the object after the depression forming step; and an etching step of anisotropically etching the object after the modified region forming step so as to advance the etching selectively along the modified region and form the hole in the object; wherein the modified region forming step exposes the modified region or a fracture extending from the modified region to an inner face of the depression.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: March 18, 2014
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Hideki Shimoi, Hiroyuki Kyushima, Keisuke Araki
  • Patent number: 8658004
    Abstract: A system includes a collimated beam source within a vacuum chamber, a condensable barrier gas, cooling material, a pump, and isolation chambers cooled by the cooling material to condense the barrier gas. Pressure levels of each isolation chamber are substantially greater than in the vacuum chamber. Coaxially-aligned orifices connect a working chamber, the isolation chambers, and the vacuum chamber. The pump evacuates uncondensed barrier gas. The barrier gas blocks entry of atmospheric vapor from the working chamber into the isolation chambers, and undergoes supersonic flow expansion upon entering each isolation chamber. A method includes connecting the isolation chambers to the vacuum chamber, directing vapor to a boundary with the working chamber, and supersonically expanding the vapor as it enters the isolation chambers via the orifices. The vapor condenses in each isolation chamber using the cooling material, and uncondensed vapor is pumped out of the isolation chambers via the pump.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: February 25, 2014
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Leonard M. Weinstein, Karen M. Taminger
  • Patent number: 8648316
    Abstract: The invention relates to a cooling apparatus (101) for a sample in an ion beam etching process, including, a sample stage (102) for arranging the sample, a coolant receptacle (120) containing a coolant, at least one thermal conduction element (106a, 106b) that connects the sample stage (102) to the coolant, a cooling finger (105) connected to the thermal conduction element (106a, 106b), the cooling finger (105) comprising a conduit (130, 131) through which coolant can flow and which is connectable to the coolant receptacle (120). The invention further relates to a method of adjusting the temperature of a sample in an ion beam etching process, including mounting a sample on a coolable sample stage (102), aligning the sample on the sample stage (102), and cooling the sample by coolant directed through a conduit (130, 131) of a cooling finger.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: February 11, 2014
    Assignee: Leica Mikrosysteme GmbH
    Inventors: Thomas Pfeifer, Rainer Wogritsch
  • Patent number: 8640413
    Abstract: A method is provided of laser marking a graphic design in an unassembled multi-component structure. A graphic design to be laser marked in a multi-component structure is partitioned into a plurality of graphic design sections, with each of the graphic design sections being assigned to a corresponding component of the multi-component structure. The graphic design sections are laser marked in their corresponding components of the multi-component structure while the multi-component structure is in an unassembled state. The laser-marked components are adapted for assembly together into an assembled state in which the multi-component structure has a viewable expansive surface with the graphic design sections collectively simulating an overall appearance of a graphic design spanning across the corresponding components of the multi-component structure. A kit for assembling laser-marked components into a multi-component structure is also provided.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: February 4, 2014
    Assignee: Masonite Corporation
    Inventors: Mark Ruggie, Henry Coghlan, Hallie Heuser, Chase Carter
  • Patent number: 8637409
    Abstract: An etching method includes: applying a radiation to an etching aqueous solution; and etching a material to be etched by using the etching aqueous solution irradiated with the radiation.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: January 28, 2014
    Assignee: Fujitsu Limited
    Inventors: Shirou Ozaki, Masayuki Takeda